Key research themes
1. How can complementary CNTFET architectures be optimized for scalable, high-performance integrated circuits?
This theme focuses on the development of complementary metal-oxide-semiconductor (CMOS)-like architectures using carbon nanotube field-effect transistors (CNTFETs) to achieve high uniformity, symmetry, and scalability in both n- and p-type devices for medium-scale integrated circuits (ICs). It addresses challenges such as doping-free polarity control, contact engineering, device stability, and yield in wafer-scale CNT films, enabling the fabrication of functional logic gates and sequential circuits that match the performance metrics of silicon technology.
2. What are the critical electrostatic and physical factors influencing CNTFET device scalability and electrical performance?
This area explores the fundamental physical and electrostatic mechanisms affecting CNTFET behavior, including 3D electrostatic coupling in aligned nanotube arrays, gate bias stress effects, the influence of device geometry (tube diameter, density, gate overlap), threshold voltage dependence on chirality, and environmental factors such as temperature and dielectric properties. Understanding these interrelated effects is vital for accurate device modeling, device reliability, and for translating intrinsic CNT transport advantages to amplified circuit-level performance.
3. How do environmental and operational conditions affect CNTFET electrical characteristics and reliability?
This theme investigates the influence of external factors such as temperature changes, dielectric constant variations, gate bias stress, and device modeling accuracy on the electrical behavior and long-term stability of CNTFETs. By understanding these dependencies, researchers aim to optimize device operation under realistic scenarios and improve CNTFET-based sensor and memory applications.