CN109085701A - Beam splitting system and manufacturing method and spectrum detection instrument and manufacturing method comprising it - Google Patents

Beam splitting system and manufacturing method and spectrum detection instrument and manufacturing method comprising it Download PDF

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Publication number
CN109085701A
CN109085701A CN201810836353.3A CN201810836353A CN109085701A CN 109085701 A CN109085701 A CN 109085701A CN 201810836353 A CN201810836353 A CN 201810836353A CN 109085701 A CN109085701 A CN 109085701A
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Prior art keywords
grating
substrate
axis
light
spectroscopic system
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CN201810836353.3A
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Inventor
孟宪芹
孟宪东
王方舟
王维
谭纪风
高健
陈小川
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN201810836353.3A priority Critical patent/CN109085701A/en
Publication of CN109085701A publication Critical patent/CN109085701A/en
Priority to US16/495,050 priority patent/US11344882B2/en
Priority to PCT/CN2019/085526 priority patent/WO2020019809A1/en
Priority to US16/617,696 priority patent/US11344884B2/en
Priority to PCT/CN2019/085562 priority patent/WO2020019812A1/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/1006Beam splitting or combining systems for splitting or combining different wavelengths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10Beam splitting or combining systems
    • G02B27/1086Beam splitting or combining systems operating by diffraction only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1814Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819Plural gratings positioned on the same surface, e.g. array of gratings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/32Holograms used as optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B2005/1804Transmission gratings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

本公开涉及一种分光系统及制造方法以及包含其的光谱检测仪及制造方法。该分光系统包括:透明的第一基板,其具有相对设置的第一表面和第二表面;光源,设置在第一基板的第一表面上;全息光栅,设置在第一基板的与第一表面相对的第二表面上,全息光栅配置为接收来自光源的透射穿过第一基板的光并反射衍射不同波长的光返回第一基板的第一表面上分离的不同区域;数个透射光学器件,其分别设置在第一基板的第一表面上各个分离的区域上,并配置为:准直或汇聚从全息光栅反射衍射的光,并使其从第一基板出射。该分光系统能够应用于非准直宽光谱的光源,能够实现高精度分色,以较低成本满足多波长的一次性、快速、高精度的光谱检测的需求。

The disclosure relates to a spectroscopic system and a manufacturing method, as well as a spectroscopic detector including the same and a manufacturing method. The spectroscopic system includes: a transparent first substrate, which has a first surface and a second surface opposite to each other; a light source, arranged on the first surface of the first substrate; a holographic grating, arranged on the first surface of the first substrate and the first surface On the opposite second surface, the holographic grating is configured to receive light from the light source transmitted through the first substrate and reflect and diffract light of different wavelengths back to separate different regions on the first surface of the first substrate; a plurality of transmissive optics, They are respectively disposed on separate regions on the first surface of the first substrate, and are configured to: collimate or converge light reflected and diffracted from the holographic grating, and make it exit the first substrate. The spectroscopic system can be applied to non-collimated wide-spectrum light sources, can achieve high-precision color separation, and meets the needs of one-time, fast, and high-precision spectral detection of multiple wavelengths at a low cost.

Description

Beam splitting system and manufacturing method and spectrum detection instrument and manufacturing method comprising it
Technical field
This disclosure relates to a kind of beam splitting system and its manufacturing method, and further relate to the spectral detection comprising the beam splitting system Instrument and its manufacturing method.
Background technique
Currently, spectrum detection instrument is in physics, biology such as species analysis, calibration, molecular diagnosis, food quarantine and division bacterias It is widely used in chemical field.In some applications it is desirable to under the effect of light of single or multiple wavelength into Row physically or chemically reacts the cell of (such as dyeing) or substance is detected or collected.Although introducing grating color separation, But it can only generally realize basic color separation, final Color separating accuracy is lower.In order to improve transmission or reflecting light precision and Intensity requires that incident light is the light source of high collimation at present, and light source collimation directly affects the precision of transmission or reflecting light And intensity.And the cost and manufacture difficulty of spectrum detection instrument are increased for the dependence of the light source of height collimation.
Therefore, it is necessary to a kind of beam splitting system, which can be applied to non-collimated and wide spectrum (such as white light) Light source, and can be realized the micro spectral detector of high-precision color separation, to meet species analysis at lower cost, calibration, to divide Son diagnosis, food quarantine and the physics such as division bacteria, more substances of multi-wavelength in biological and chemical field it is disposable, quickly and The needs of the spectral detection of several other precision of wavelength level.
Summary of the invention
According to the first scheme of the disclosure, a kind of beam splitting system is provided, the beam splitting system includes:
Transparent first substrate has the first surface and second surface being oppositely arranged;
Light source is arranged on the first surface of first substrate;
Holographic grating is arranged on the second surface of the first substrate, and the holographic grating is configured to receive and come from The light for being transmitted through first substrate of the light source and the light of reflection diffraction different wave length return to the first table of the first substrate The different zones separated on face;
Several transmission optics are separately positioned on each isolated region on the first surface of the first substrate On, and it is configured that the light of collimation or convergence from the holographic grating reflection diffraction, and be emitted it from the first substrate.
In some embodiments, the holographic grating includes multiple grating regions, and each grating region is emitted The light of respective wavelength to the first substrate first surface corresponding region.
In some embodiments, the holographic grating includes multiple grating regions, and the multiple grating region is arranged In groups so as to same group grating region outgoing phase co-wavelength light to the first substrate first surface corresponding region.
In some embodiments, the transmission optics are transmission gratings, are configured to transmission diffraction from the holography The light of optical grating reflection diffraction, and collimated and take out the first substrate.
In some embodiments, the transmission optics are miniature convex lenses.
In some embodiments, the light source includes appointing in micro-led light source and semiconductor laser chip What is a kind of.
In some embodiments, the beam splitting system further includes convergence device, is configured to collapse the light source towards institute State the radiation angle of first substrate.
In some embodiments, the convergence device includes reflecting mirror, and the separate of the light source is arranged in its reflecting surface The side of the first substrate, so that the radiation angle by the light source towards the first substrate is collapsed into preset range.
In some embodiments, the range that the preset range is -30 ° to+30 °.
In some embodiments, the holographic grating is three-dimensional grating, and three-dimensional includes three x-axis, y-axis and z axis dimensions, Wherein x-axis and y-axis are the axis in two dimensions in the plane of the holographic grating respectively, and z-axis is on the plane normal direction Axis,
Each grating region of the holographic grating is calculated for the period of x-axis according to formula (2):
Each grating region of the holographic grating is calculated for the period of y-axis according to formula (3):
The period of each grating region of the holographic grating calculates according to formula (4):
Also, the grating arragement direction of each grating region of the holographic grating is calculated according to formula (5):
θg=arc tan (Λyx) formula (5),
Wherein, Λ is the period of each grating region of the holographic grating, ΛxFor each grating of the holographic grating Region is directed to the period of x-axis, ΛyThe period of y-axis, θ are directed to for each grating region of the holographic gratinggFor the holographic optical The grating arragement direction of each grating region of grid, niFor the refractive index of incident medium, θiBetween the vector and z-axis of incident light Angle,For the angle between the vector projection and x-axis on the x-y plane of incident light, m is diffraction time, and λ is incident light Wavelength, θdFor diffraction outgoing light vector and z-axis between angle,For diffraction outgoing light vector on the x-y plane Projection and x-axis between angle and ndFor the refractive index of emergent medium.
In some embodiments, for each transmission grating for three-dimensional grating and including multiple grating regions, three-dimensional includes x-axis, y Three dimensions of axis and z-axis, wherein x-axis and y-axis are the axis in two dimensions in the plane of the transmission grating respectively, and z-axis is Axis on the plane normal direction,
Each grating region of the transmission grating is calculated for the period of x-axis according to formula (6):
Each grating region of the transmission grating is calculated for the period of y-axis according to formula (7):
The period of each grating region of the transmission grating calculates according to formula (4):
Also, the grating arragement direction of each grating region of the transmission grating is calculated according to formula (5):
θg=arc tan (Λyx) formula (5),
Wherein, Λ is the period of each grating region of the transmission grating, ΛxFor each grating of the transmission grating Region is directed to the period of x-axis, ΛyThe period of y-axis, θ are directed to for each grating region of the transmission gratinggFor the transmitted light The grating arragement direction of each grating region of grid, niFor the refractive index of incident medium, θiBetween the vector and z-axis of incident light Angle,For angle of the vector between the projection and x-axis in x-y plane of incident light, m is diffraction time, and λ is incidence Optical wavelength.
According to the alternative plan of the disclosure, a kind of spectrum detection instrument is provided comprising: above-mentioned any light splitting system System;The second substrate is arranged on the side opposite with the holographic grating of the beam splitting system;Determinand channel, sets It sets in the second substrate on the side of the beam splitting system;And detector, with several transmission optics The corresponding mode of device, be arranged in the determinand channel on the side of the beam splitting system.
In some embodiments, the determinand channel is microchannel.
According to the third program of the disclosure, provide it is a kind of manufacture it is above-mentioned using transmission grating as transmission optics The method of beam splitting system, which comprises
The first substrate is provided;
The spin coating photoresist on the second surface of the first substrate;
The figure of the holographic grating and its alignment mark is formed on the photoresist on the second surface of the first substrate Case;
The holographic grating and its register guide are etched on the second surface of the first substrate using dry etching Note, and coat protective layer protects the holographic grating and its alignment mark;
The spin coating photoresist on the first surface of the first substrate;
The figure of the transmission grating and its alignment mark is formed on the photoresist on the first surface of the first substrate Case;
The transmission grating and its register guide are etched on the first surface of the first substrate using dry etching Note;And
Remove the photoresist.
In some embodiments, the method includes the methods of the above any manufacture beam splitting system and as follows Step:
Cleaning and dry obtained beam splitting system;
The second substrate formed on the side of the beam splitting system determinand channel and it is described to That surveys object channel is arranged the detector on the side of the beam splitting system;And
By the first substrate and the second substrate contraposition fitting.
Detailed description of the invention
In the attached drawing being not drawn necessarily to scale, identical appended drawing reference can describe similar in different views Component.Same reference numerals with letter suffix or different letter suffix can indicate the different instances of similar component.Attached drawing Generally through citing rather than the mode of limitation shows various embodiments, and reinstates with specification and claims one It is illustrated in the disclosed embodiments.In due course, make to be referred to identical reference in all the appended drawings same One or similar part.Such embodiment is illustrative, and is not intended as the exhaustive or exclusive of the present apparatus or method Embodiment.
Fig. 1 shows the structural diagrams of the beam splitting system according to the first embodiment of the present disclosure;
Fig. 2 shows the structural diagrams according to the spectrum detection instrument of the second embodiment of the present disclosure;
Fig. 3 (a) shows the angular spectrum distribution of incident light in the beam splitting system in spectrum detection instrument shown in Fig. 2;
Fig. 3 (b) shows radiation area of the light source on holographic grating in the beam splitting system in spectrum detection instrument shown in Fig. 2 The division of the surface of intensity distribution and grating region on domain illustrates;
Fig. 4 shows the grating arragement direction of the transmission grating in the beam splitting system according to the third embodiment of the present disclosure, transmission The distribution map of the orientation of diffraction light and reflection diffracting light;
Fig. 5 shows the flow chart of the manufacturing method of the beam splitting system according to the fourth embodiment of the present disclosure;
Fig. 6 (a) shows the holographic optical in the manufacturing process of beam splitting system shown in Fig. 5 on the second surface of first substrate The arrangement of grid and the diagram of alignment mark position;
Fig. 6 (b) shows the transmitted light in the manufacturing process of beam splitting system shown in Fig. 5 on the first surface of first substrate The arrangement of grid and the diagram of alignment mark position;And
Fig. 7 shows the structural diagrams of the spectral investigator according to fifth embodiment of the present disclosure.
Specific embodiment
To make those skilled in the art better understand the technical solution of the disclosure, with reference to the accompanying drawing and specific embodiment party Formula elaborates to the disclosure.Embodiment of the disclosure work is further retouched in detail in the following with reference to the drawings and specific embodiments It states, but not as the restriction to the disclosure.
" first ", " second " used in the disclosure and similar word are not offered as any sequence, quantity or again The property wanted, and be used only to distinguish different parts.The similar word such as " comprising " or "comprising" means the element before the word Cover the element enumerated after the word, it is not excluded that be also covered by the possibility of other element."upper", "lower", "left", "right" etc. are only used In indicating relative positional relationship, after the absolute position for being described object changes, then the relative positional relationship may also be correspondingly Change.
In the disclosure, when being described to certain device between the first device and the second device, in the certain device There may be devices between two parties between the first device or the second device, and device between two parties can also be not present.When being described to specific device When part connects other devices, which can be directly connected to without device between two parties with the other devices, can also be with It is not directly connected to the other devices and there is device between two parties.
All terms (including technical term or scientific term) that the disclosure uses are common with disclosure fields The meaning that technical staff understands is identical, unless otherwise specifically defined.It is also understood that in term such as defined in the general dictionary The meaning consistent with their meanings in the context of the relevant technologies should be interpreted as having, without application idealization or The meaning of extremely formalization explains, unless being clearly defined herein.
Technology, method and apparatus known to person of ordinary skill in the relevant may be not discussed in detail, but suitable In the case of, the technology, method and apparatus should be considered as part of specification.
Fig. 1 shows the structural diagrams of the beam splitting system according to the first embodiment of the present disclosure.As shown in Figure 1, the beam splitting system Include: transparent first substrate 101, there are the first surface and second surface being oppositely arranged;Light source 102, setting is the On the first surface of one substrate 101;Opposite with first surface of the first substrate 101 is arranged in holographic grating 103 On two surfaces, the holographic grating 103 is configured to receive the light for being transmitted through first substrate 101 from the light source and anti- The light for penetrating diffraction different wave length (such as returns to the difference separated on the first surface of the first substrate 101 with special angle γ) Region;Several transmission optics 104 are separately positioned on each isolated area on the first surface of the first substrate 101 On domain, and it is configured that collimation (as shown in Figure 1) or the convergence light of (as shown in Figure 7) from 103 reflection diffraction of holographic grating, And it is emitted it from the first substrate 101.
Note that special angle γ can be the same or different for the light of different wave length.In some embodiments, energy Enough using holographic grating 103 by the laser accunputure of specific wavelength to incidence angles degree with special angle γ reflection diffraction, institute as shown in figure 1 Show, so that the light of specific wavelength reaches corresponding each region of the separation on the upper surface of first substrate 1, recycles it Each transmission optics 104 of upper setting collimate or convergence is taken out, so as to test substance (such as under test gas or micro- Fluid) carry out physics or chemical reaction.Collimation takes out or convergence takes out and can be improved Color separating accuracy and and determinand The light intensity of the light of qualitative response, it is higher that the light intensity that convergence takes out on obtained test substance certain area compares collimation taking-up.
In some embodiments, the holographic grating includes multiple grating regions, can allow the wave of grating region and outgoing It is long to correspond so that each grating region be emitted the light of corresponding specific wavelength to the first substrate first surface phase Answer region.
In some embodiments, grating region can also be arranged in groups, so as to the wavelength one of one group of grating region and outgoing One is corresponding, so that the corresponding region of first surface of the light of the grating region outgoing phase co-wavelength of same group to the first substrate.
In some embodiments, above-mentioned grating region is such as, but not limited to square grid shown in Fig. 2, each rectangular grid Lattice enter angular difference, and each square grid or several square grids are as one group, so that same group of square grid is emitted The same area of first surface of the light of same wavelength ranges (such as with a wavelength) to the first substrate 101.Wherein, each light The light-emitting angle of gate region can be emitted to the positioning in the region on first surface according to the positioning and intention of each grating region Design, and the period of each grating region can by light that needs are emitted wavelength, go out, the refractive index of incident material, enter optic angle Degree and the light-emitting angle of design codetermine.
In some embodiments, the transmission optics 104 are transmission gratings, are configured to transmission diffraction from described complete The light of 103 reflection diffraction of grating is ceased, and is collimated and takes out the first substrate 101.In some embodiments, the transmitted light Learning device 104 is miniature convex lens.The parameter of transmission grating or miniature convex lens is required to the wavelength according to the light to be transmitted Special design, in contrast, the difficulty of processing of multiple miniature convex lenses is larger, and it is also larger to align difficulty.
The beam splitting system of the disclosure can be realized as higher Color separating accuracy using non-collimated light source, to significantly reduce Manufacturing cost.The light source of beam splitting system suitable for the disclosure includes that various cheap common non-collimated and wide spectrums are (such as white Light) light source, any one of including but not limited to micro-led light source and semiconductor laser chip.
" substrate " herein, the second substrate including the first substrate 101 that is mentioned above and hereinafter mentioned 108, can use glass substrate, the preferable resin of stability or petchem can also be selected, can also with paper etc. its His substrate;The thickness of the substrate can determine according to actual needs.
In some embodiments, the holographic grating 103 is the optical grating construction of half-wavelength, to reflection diffraction target wavelength Light return first substrate 101.In some embodiments, the duty ratio of the holographic grating 103 is generally 0.5, but in reality This value can be deviateed in product design and (for example for the intensity for adjusting out light, balance the difference of display panel different location brightness The purpose of).In some embodiments, the height of the holographic grating 103, according to requiring some wavelength or certain several wavelength The intensity of light determines, can be several hundred nanometers, is also possible to micron order.In some embodiments, the holographic grating 103 can be with Including dielectric grating, material can include but is not limited to SiNx、SiO2, in polymethyl methacrylate (PMMA) and resin It is any one or more of, preferably SiNxOr SiO2.In some embodiments, the holographic grating 103 may include metal light Grid, material can include but is not limited to any one of metal Al, Ag or the metal material of other similar characteristics or more It plants, herein preferred metal Ag.
In some embodiments, the holographic grating 103 can also be substituted with other filtering structures, can be according to optical filtering Special wavelength and light-emitting angle require to design the filtering structure, which can include but is not limited to built-in micro- anti- Penetrate mirror or other micro optical structures etc..
In some embodiments, also it is the grating of half-wavelength as the transmission grating of transmission optics 104, is spread out with transmission It penetrates for the purpose of the light for taking out each region, while can also play the role of filtering the light of other wavelength.
In some embodiments, the beam splitting system further includes convergence device 105, is configured to collapse the light source 102 Towards the radiation angle of the first substrate, so as to collapse the collimation angle that light source 102 emits light, and then Color separating accuracy is improved And alleviate the collimation or convergence burden of transmission optics 104.In some embodiments, which can use micro- Any one or combination of type convex lens and reflecting mirror.In some embodiments, the convergence device 105 includes reflecting mirror, And the side far from the first substrate 101 of the light source 102 is arranged in its reflecting surface, so as to by 102 direction of light source The radiation angle of the first substrate 101 is collapsed into preset range.The case where mutually less using reflecting mirror, by above-mentioned reflecting mirror packet It can not only play the role of collapsing collimation angle containing convergence device 105 inside, additionally it is possible to stop the radiation from light source 102 Light is just directly emitted without color separation and contact measured substance, to avoid its interference and adverse effect to measurement accuracy;And And the radius without color separation can be reflected back to the second surface of first substrate 101, to improve the utilization rate of light simultaneously Enhance light intensity.In some embodiments, the range that the preset range is -30 ° to+30 °.
In some embodiments, the beam splitting system further include be arranged in first substrate 101 together with holographic grating 103 with Reflection protecting layer 106 on the opposite side of first surface, thus protect beam splitting system from polluting and destroying on the side, and It can be improved the utilization rate of light and enhance light intensity.In some embodiments, the beam splitting system can also include being arranged in the The packaging plastic 107 on the periphery of one substrate 101, which is used to cooperate with reflection protecting layer 106, by entire beam splitting system In being encapsulated in, to protected from pollution and destruction, and convenient packaging, storage and transport.
Fig. 2 shows the structural diagrams according to the spectrum detection instrument of the second embodiment of the present disclosure, as shown in Fig. 2, the spectrum is examined Surveying instrument includes: any beam splitting system above-mentioned as shown in Figure 1;The second substrate 108 is arranged in the beam splitting system The side opposite with the holographic grating 103 on;Determinand channel 109, the second substrate 108 is arranged in faces institute It states on the side of beam splitting system;And detector 110, in a manner of corresponding with several transmission optics 104, setting In the determinand channel 109 on the side of the beam splitting system.In this way, the different wavelength range that collimation takes out Light reaches 109 surface of determinand channel, is reacted with the corresponding test substance arranged thereon, to reflect that test substance is believed The detector 110 that the light of breath is correspondingly arranged detects, and completes to demarcate.This is particularly suitable for some test substance or test substance Some characteristic need using specific wavelength light carry out physically or chemically reaction come the case where identifying.As an example, the light Spectrometer can open different determinand channels 109 to the position of each self-aggregation of different wave length;It can also be to different waves Different test substances is placed in the position of long each self-aggregation, to realize to the disposable, quick of more substances or more substance characteristics And the detection and calibration of precision.
Particularly, determinand can be microfluid, be also possible to gas.In some embodiments, the determinand is logical Road 109 can include but is not limited to microchannel, to detect the characteristic of the test substance under different miniflow states.It is logical in miniflow In the case that road is used as Micro Fluid Transfer channel, according to practical application, the width and height in the channel can be Nanoscale channels, It can also be than big or small.Specifically, microchannel can be formed by various lithographic methods (including but not limited to photoetching) In silicon, glass, polymer (such as dimethyl silicone polymer (PDMS) or PMMA) or on other materials.In some embodiments, The inner wall of microchannel can be surface-treated to realize required mobile performance.For example, can according to actual demand, It is coated on the inner wall of microchannel and dredges/hydrophilic membrane (such as TeflonTMThe hydrophobic layer of AF material), make microfluid in microchannel It inside flows or of short duration delay according to actual needs, so that miniflow be made to be not adhere in microchannel as far as possible.
In some embodiments, detector 110 is photosensitive detector, it is desirable to each transmission optics as light outlet Device 104 corresponds, precision and photodetector between the two away from the light direction dependent on light coupling structure (array) Signal-to-noise ratio demand, fitted closely preferably with the two.As an example, also may include buffering film layer etc. between the two.Some In embodiment, detector can be using charge-coupled device (CCD), complementary mos device (CMOS) and probe Any one or more of (PIN).
Below using micro-led as light source 102, to illustrate in spectrum detection instrument shown in Fig. 2 The design method of holographic grating 103 and transmission grating 107 in beam splitting system.
In some embodiments, the holographic grating 103 is embodied as three-dimensional grating, and three-dimensional includes x-axis, y-axis and z-axis three A dimension, wherein x-axis and y-axis are the axis in two dimensions in the plane of the holographic grating 103 respectively, and z-axis is the plane Normal direction on axis.
Collimation angle of the light that light source 102 is launched after convergence device 105 collapses is in -30 ° to+30 ° of model In enclosing (referring to Fig. 3 (a)), and it is transferred into for example with this collimation angle with a thickness of in the first substrate of 2mm 101, using for example Radiation areas that lighting design software LightTools is detected such as a circle is shown on the left of Fig. 3 (b), intermediate light intensity compared with It is strong and the light intensity of surrounding is weaker.
If Fig. 3 (b) is shown, radiation areas shown in left side can be divided into multiple grating regions, each grating region (such as shown in small cube on the right side of Fig. 3 (b)) is with the radiation angle at its centerIt identifies, radiation angle θ indicates light Angle between the vector and z-axis of (such as incident ray or emergent ray), radiation angleIndicate light (such as incident ray or Emergent ray) vector projection and x-axis on the x-y plane between angle.Hereinafter, Λ is the holographic grating 103 The period of each grating region, ΛxThe period of x-axis, Λ are directed to for each grating region of the holographic grating 103yIt is described complete The each grating region 103 for ceasing grating is directed to the period of y-axis, θgFor the grating of each grating region of the holographic grating 103 Arragement direction, niFor the refractive index of incident medium, θiFor the angle between the vector and z-axis of incident light,For the vector of incident light The angle between projection and x-axis on the x-y plane, m are diffraction time, and λ is lambda1-wavelength, θdFor the light of diffraction outgoing Angle between vector and z-axis,For the angle between the vector projection and x-axis on the x-y plane of the light of diffraction outgoing, And ndFor the refractive index of emergent medium.
It is embodied as the diffraction formula of the holographic grating 103 of three-dimensional grating are as follows:
Based on formula (1), it can derive that each grating region of the holographic grating 103 is directed to the meter in the period of x-axis Calculate formula:
Based on formula (1), it is also theorized that each grating region of the holographic grating 103 is directed to the period root of y axis It is calculated according to formula (3):
The period of the holographic grating 103 calculates according to formula (4) as a result:
Also, the grating arragement direction of each grating region of the holographic grating 103 is calculated according to formula (5):
θg=arc tan (Λyx) formula (5).
In some embodiments, the first-order diffraction that a grating region only reflects a wavelength is set, other wavelength are by light Grid are returned through perhaps absorbing or first-order diffraction light of the adjacent several grating regions as one wavelength of a group reflection diffraction A corresponding position on the first surface of first substrate 101 is returned to, the emergent light of all wavelengths is all the of first substrate 101 It is taken out by the transmission grating collimation diffraction as transmission optics 104 on one surface.Based on such setting, m=1 is enabled.
For example, the grating region design grating to be identified in Fig. 3 (b) with small cube.Firstly, determining the grating region Central point coordinate be (608 μm, 203 μm), calculate it is corresponding enter angularFor (18 °, 42 °).Assuming that all Light is all with identical light-emitting angleThe light of a certain wavelength of reflection diffraction reaches the phase on the first surface of first substrate 101 The region that should be separated.If the green light that this grating region is 580nm just for wavelength, incident medium and emergent medium are using empty Gas and glass, and light-emitting angleHolographic grating can be determined then according to above formula (2)-(5) for (60 °, 0) The periods lambda of 103 corresponding grating region is 570nm, grating arragement direction θgIt is 72 degree.In some embodiments, light out AngleIt can be according to the position of the central point of the grating region and the location information in determinand channel 109 come true in advance It is fixed, and determine therefrom that each Grating Design parameter of the light of other each wavelength, including but not limited to period and grating arrangement side To.
The above-mentioned design principle phase of the design principle of transmission grating as transmission optics 104 and holographic grating 103 With, this will not be repeated here.The difference is that entering angular for transmission gratingMade according to matched The light-emitting angle of the corresponding grating region of holographic grating 103 determines, as long as there is known the light-emitting angle of transmission gratingPeriod and the grating arragement direction of the corresponding grating region of transmission grating can be calculated.Transmission grating goes out light AngleThe collimation for the transmission diffraction light along-z-axis that can be realized according to it takes out effect to determine.Such as figure Shown in 4, via transmission grating institute transmission diffraction light exit direction along-z-axis, and from the light of transmission grating institute reflection diffraction Exit direction along-y-axis, that is to say, that θdFor 180 degree.Each grating region of the transmission grating is directed to x-axis as a result, Period calculated according to formula (6):
Each grating region of the transmission grating is calculated for the period of y-axis according to formula (7):
The period of each grating region of the transmission grating calculates according to formula (4):
Also, the grating arragement direction of each grating region of the transmission grating is calculated according to formula (5):
θg=arc tan (Λyx) formula (5),
Still come with the angle and wavelength of 1 grade of diffraction light of Fig. 3 (b) grating region reflection diffraction identified for 580nm It calculates, then the period of the corresponding grating region of transmission grating is 441nm, and the grating arragement direction of the corresponding grating region is 180 ° (angle relative to y-axis is 180 °, as shown in Figure 4).
Fig. 5 shows the flow chart of the manufacturing method of the beam splitting system according to the fourth embodiment of the present disclosure, wherein the light splitting system System is using transmission grating as transmission optics.As shown in figure 5, the manufacturing method of the beam splitting system includes the following steps: to mention For the first substrate 101 (501);The spin coating photoresist (502) on the second surface of the first substrate 101;Described The pattern (503) of the holographic grating 103 and its alignment mark is formed on photoresist on the second surface of one substrate 101;Benefit The holographic grating 103 and its alignment mark are etched on the second surface of the first substrate 101 with dry etching, and Coat protective layer protects the holographic grating 103 and its alignment mark (504);In the first surface of the first substrate 101 Upper spin coating photoresist (505);The transmission grating 104 is formed on the photoresist on the first surface of the first substrate 101 And its pattern (506) of alignment mark;It is etched on the first surface of the first substrate 101 using dry etching described Transmission grating 104 and its alignment mark (507);And the removal photoresist (508).In above-mentioned process, step 502- step Rapid 504 for fabricating holographic grating 103, and step 505-508 is for fabricating transmission grating 104.
In some embodiments, electron-beam direct writing (EBL) or nanometer pressure be can use in step 503 and step 506 The mode of (NIP) is printed to form corresponding pattern.In some embodiments, above-mentioned dry etching includes but is not limited to inductance Coupled plasma etches (ICP) or reactive ion etching (NIP), and the holographic grating 103 that is etched by step 504 and Shown in its alignment mark such as Fig. 6 (a), the transmission grating 104 etched by step 507 and its alignment mark such as Fig. 6 (b) institute Show, wherein the right angle of black indicates alignment mark.
In some embodiments, the manufacturing method further include: cleaning and dry obtained beam splitting system;And by institute State first substrate 101 and the contraposition fitting of the second substrate 108.Particularly, obtained beam splitting system can be sequentially placed into It is cleaned in acetone, alcohol and deionized water, places into vibration in supersonic wave cleaning machine and wash several minutes, clean time-consuming root It is determined according to the coating thickness of photoresist.After cleaning up photoresist, with being dried with nitrogen.In some embodiments, the system Make method further include: the determinand channel 109 is formed on the side of the beam splitting system in the second substrate 108 And the detector 110 is set on the side of the beam splitting system in the determinand channel 109;And by described One substrate 101 and the contraposition fitting of the second substrate 108, so complete the processing of entire micro spectral tester.
Fig. 7 shows the structural diagrams of the spectral investigator according to fifth embodiment of the present disclosure, with light shown in Fig. 2 The difference of spectrum tester is that transmission optics 104 use miniature convex lens 104 ' rather than transmission grating.In this way, holographic optical The first-order diffraction of several grating regions is returned to the first surface of first substrate 101, therefore this by grid 103 with a special angle γ The first-order diffraction of a certain wavelength of several grating regions all returns first surface with directional light reflection diffraction, then covers first surface Miniature convex lens is arranged in all region of some wavelength, by all diffraction lights convergences of this wavelength and be just radiated to The lower surface in object channel 109 is surveyed, and is corresponded with the detector of the second substrate 108 109.It compares shown in Fig. 2 using transmission Embodiment of the grating as transmission optics 104, the light intensity which finally converges is relatively high, still, miniature convex lens Difficulty of processing itself and processing cost are larger, and different wave length needs to design different miniature convex lenses, further increase processing Difficulty and cost, and it is also bigger to align difficulty.
In addition, range includes any and all based on this public affairs although exemplary embodiment has been described herein That opens has equivalent element, modification, omission, combination (for example, scheme that various embodiments are intersected), reorganization or the implementation changed Example.Element in claims will be construed broadly as based on the language used in claim, however it is not limited in this explanation Described example, example are to be interpreted as nonexcludability in book or during the implementation of the application.Therefore, this specification and Example is intended to be to be considered only as example, and real scope and spirit are by following following claims and the full scope of its equivalent institute Instruction.
Above description is intended to illustrative rather than restrictive.For example, above-mentioned example (or one or more side Case) it can be in combination with one another.Such as other embodiments can be used when reading foregoing description in those of ordinary skill in the art. In addition, various features can be grouped together to simplify the disclosure in above-mentioned specific embodiment.This should not be construed as A kind of not claimed disclosed feature is necessary intention for any claim.On the contrary, subject of the present invention can be with Less than whole features of specific disclosed embodiment.To which following claims is incorporated to herein as example or embodiment In specific embodiment, wherein each claim is independently as individual embodiment, and consider that these embodiments can be with It is combined with each other with various combinations or arrangement.The scope of the present invention should refer to appended claims and these claims are entitled The full scope of equivalent form determines.
Above embodiments are only exemplary embodiment of the present invention, are not used in the limitation present invention, protection scope of the present invention It is defined by the claims.Those skilled in the art can within the spirit and scope of the present invention make respectively the present invention Kind modification or equivalent replacement, this modification or equivalent replacement also should be regarded as being within the scope of the present invention.

Claims (15)

1.一种分光系统,其特征在于,所述分光系统包括:1. A spectroscopic system, characterized in that, the spectroscopic system comprises: 透明的第一基板,其具有相对设置的第一表面和第二表面;a transparent first substrate having oppositely disposed first and second surfaces; 光源,其设置在第一基板的第一表面上;a light source disposed on the first surface of the first substrate; 全息光栅,其设置在所述第一基板的所述第二表面上,所述全息光栅配置为接收来自所述光源的透射穿过第一基板的光并反射衍射不同波长的光返回所述第一基板的第一表面上分离的不同区域;a holographic grating disposed on the second surface of the first substrate, the holographic grating configured to receive light transmitted through the first substrate from the light source and reflect and diffract light of different wavelengths back to the first substrate separate distinct regions on the first surface of a substrate; 数个透射光学器件,其分别设置在所述第一基板的第一表面上各个分离的区域上,并配置为:准直或汇聚从所述全息光栅反射衍射的光,并使其从所述第一基板出射。a plurality of transmissive optical devices, which are respectively disposed on separate regions on the first surface of the first substrate, and are configured to: collimate or converge light reflected and diffracted from the holographic grating, and make it pass from the The first substrate emerges. 2.根据权利要求1所述的分光系统,其特征在于,所述全息光栅包括多个光栅区域,并且所述各个光栅区域出射相应波长的光到所述第一基板的第一表面的相应区域。2. The spectroscopic system according to claim 1, wherein the holographic grating comprises a plurality of grating regions, and each grating region emits light of a corresponding wavelength to a corresponding region of the first surface of the first substrate . 3.根据权利要求1所述的分光系统,其特征在于,所述全息光栅包括多个光栅区域,并且所述多个光栅区域布置成组以便同组的光栅区域出射相同波长的光到所述第一基板的第一表面的相应区域。3. The spectroscopic system according to claim 1, wherein the holographic grating comprises a plurality of grating regions, and the plurality of grating regions are arranged in groups so that the grating regions of the same group emit light of the same wavelength to the corresponding regions of the first surface of the first substrate. 4.根据权利要求1所述的分光系统,其特征在于,所述透射光学器件是透射光栅,其配置为透射衍射从所述全息光栅反射衍射的光,并将其准直取出所述第一基板。4. The spectroscopic system according to claim 1, wherein the transmissive optical device is a transmissive grating configured to transmit and diffract light reflected and diffracted from the holographic grating and collimate it out of the first substrate. 5.根据权利要求1所述的分光系统,其特征在于,所述透射光学器件是微型凸透镜。5. The spectroscopic system according to claim 1, wherein the transmission optical device is a miniature convex lens. 6.根据权利要求1所述的分光系统,其特征在于,所述光源包括微型发光二极管光源和半导体激光器芯片中的任何一种。6. The spectroscopic system according to claim 1, wherein the light source comprises any one of a micro light emitting diode light source and a semiconductor laser chip. 7.根据权利要求1所述的分光系统,其特征在于,所述分光系统还包括汇聚器件,其配置为收拢所述光源朝向所述第一基板的辐射角。7. The spectroscopic system according to claim 1, characterized in that the spectroscopic system further comprises a converging device configured to converge the radiation angle of the light source towards the first substrate. 8.根据权利要求7所述的分光系统,其特征在于,所述汇聚器件包含反射镜,且其反射面设置在所述光源的远离所述第一基板的一侧,以便将所述光源朝向所述第一基板的辐射角收拢到预定范围内。8. The spectroscopic system according to claim 7, wherein the converging device comprises a reflector, and its reflective surface is arranged on the side of the light source away from the first substrate, so as to direct the light source toward The radiation angle of the first substrate converges within a predetermined range. 9.根据权利要求8所述的分光系统,其特征在于,所述预定范围为-30°到+30°的范围。9. The spectroscopic system according to claim 8, wherein the predetermined range is a range from -30° to +30°. 10.根据权利要求2或3所述的分光系统,其特征在于,所述全息光栅为三维光栅,三维包括x轴、y轴和z轴三个维度,其中x轴和y轴分别是所述全息光栅的平面内的两个维度上的轴,z轴是该平面法线方向上的轴,10. The spectroscopic system according to claim 2 or 3, wherein the holographic grating is a three-dimensional grating, and the three dimensions include three dimensions of x-axis, y-axis and z-axis, wherein the x-axis and y-axis are respectively the The axes in two dimensions in the plane of the holographic grating, the z-axis is the axis in the normal direction of the plane, 所述全息光栅的各个光栅区域针对x轴的周期根据公式(2)来计算:Each grating area of the holographic grating is calculated according to the formula (2) for the period of the x-axis: 所述全息光栅的各个光栅区域针对y轴的周期根据公式(3)来计算:Each grating area of the holographic grating is calculated according to the formula (3) for the period of the y-axis: 所述全息光栅的各个光栅区域的周期根据公式(4)来计算:The period of each grating area of the holographic grating is calculated according to formula (4): 并且,所述全息光栅的各个光栅区域的光栅排布方向根据公式(5)来计算:And, the grating arrangement direction of each grating region of the holographic grating is calculated according to formula (5): θg=arc tan(Λyx) 公式(5),θ g =arc tan(Λ yx ) Formula (5), 其中,Λ为所述全息光栅的各个光栅区域的周期,Λx为所述全息光栅的各个光栅区域针对x轴的周期,Λy为所述全息光栅的各个光栅区域针对y轴的周期,θg为所述全息光栅的各个光栅区域的光栅排布方向,ni为入射介质的折射率,θi为入射光的矢量与z轴之间的夹角,为入射光的矢量在x-y平面上的投影与x轴之间的夹角,m为衍射级次,λ为入射光波长,θd为衍射出射的光的矢量与z轴之间的夹角,为衍射出射的光的矢量在x-y平面上的投影与x轴之间的夹角,以及nd为出射介质的折射率。Wherein, Λ is the period of each grating area of the holographic grating, Λ x is the period of each grating area of the holographic grating for the x-axis, Λ y is the period of each grating area of the holographic grating for the y-axis, θ g is the grating arrangement direction of each grating area of the holographic grating, n i is the refractive index of the incident medium, θ i is the angle between the vector of the incident light and the z axis, is the angle between the projection of the vector of the incident light on the xy plane and the x-axis, m is the diffraction order, λ is the wavelength of the incident light, and θ d is the angle between the vector of the diffracted light and the z-axis, is the angle between the projection of the vector of the diffracted outgoing light on the xy plane and the x-axis, and n d is the refractive index of the exiting medium. 11.根据权利要求4所述的分光系统,其特征在于,各个透射光栅为三维光栅且包括多个光栅区域,三维包括x轴、y轴和z轴三个维度,其中x轴和y轴分别是所述透射光栅的平面内的两个维度上的轴,z轴是该平面法线方向上的轴,11. The spectroscopic system according to claim 4, wherein each transmission grating is a three-dimensional grating and includes a plurality of grating regions, and the three-dimensional includes three dimensions of x-axis, y-axis and z-axis, wherein x-axis and y-axis are respectively is the axis on the two dimensions in the plane of the transmission grating, and the z axis is the axis on the normal direction of the plane, 所述透射光栅的各个光栅区域针对x轴的周期根据公式(6)来计算:Each grating area of the transmission grating is calculated according to the formula (6) for the period of the x-axis: 所述透射光栅的各个光栅区域针对y轴的周期根据公式(7)来计算:Each grating area of the transmission grating is calculated according to the formula (7) for the period of the y-axis: 所述透射光栅的各个光栅区域的周期根据公式(4)来计算:The period of each grating area of the transmission grating is calculated according to formula (4): 并且,所述透射光栅的各个光栅区域的光栅排布方向根据公式(5)来计算:And, the grating arrangement direction of each grating area of the transmission grating is calculated according to formula (5): θg=arc tan(Λyx) 公式(5),θ g =arc tan(Λ yx ) Formula (5), 其中,Λ为所述透射光栅的各个光栅区域的周期,Λx为所述透射光栅的各个光栅区域针对x轴的周期,Λy为所述透射光栅的各个光栅区域针对y轴的周期,θg为所述透射光栅的各个光栅区域的光栅排布方向,ni为入射介质的折射率,θi为入射光的矢量与z轴之间的夹角,为入射光的矢量在x-y平面上的投影与x轴之间的夹角,m为衍射级次,λ为入射光波长。Wherein, Λ is the period of each grating area of the transmission grating, Λ x is the period of each grating area of the transmission grating for the x-axis, Λ y is the period of each grating area of the transmission grating for the y-axis, θ g is the grating arrangement direction of each grating area of the transmission grating, n i is the refractive index of the incident medium, θ i is the angle between the vector of the incident light and the z axis, is the angle between the projection of the vector of the incident light on the xy plane and the x-axis, m is the diffraction order, and λ is the wavelength of the incident light. 12.一种光谱检测仪,其特征在于包括:12. A spectral detector, characterized in that it comprises: 根据权利要求1-11中任何一项所述的分光系统;A spectroscopic system according to any one of claims 1-11; 第二基板,其设置在所述分光系统的与所述全息光栅相反的一侧上;a second substrate disposed on a side of the spectroscopic system opposite to the holographic grating; 待测物通道,其设置在所述第二基板的面对所述分光系统的一侧上;以及an analyte channel disposed on a side of the second substrate facing the spectroscopic system; and 检测器,其以与所述数个透射光学器件对应的方式,设置在所述待测物通道的背离所述分光系统的一侧上。A detector is arranged on a side of the analyte channel away from the spectroscopic system in a manner corresponding to the plurality of transmission optical devices. 13.根据权利要求12所述的光谱检测仪,其特征在于,所述待测物通道为微流通道。13. The spectroscopic detector according to claim 12, wherein the analyte channel is a microfluidic channel. 14.一种制造根据权利要求4所述的分光系统的方法,其特征在于,所述方法包括:14. A method of manufacturing the spectroscopic system according to claim 4, characterized in that the method comprises: 提供所述第一基板;providing the first substrate; 在所述第一基板的第二表面上旋涂光刻胶;spin-coating photoresist on the second surface of the first substrate; 在所述第一基板的第二表面上的光刻胶上形成所述全息光栅及其对位标记的图案;forming a pattern of the holographic grating and its alignment mark on the photoresist on the second surface of the first substrate; 利用干法蚀刻法在所述第一基板的第二表面上刻蚀出所述全息光栅及其对位标记,并涂布保护层来保护所述全息光栅及其对位标记;Etching the holographic grating and its alignment marks on the second surface of the first substrate by dry etching, and coating a protective layer to protect the holographic grating and its alignment marks; 在所述第一基板的第一表面上旋涂光刻胶;spin-coating photoresist on the first surface of the first substrate; 在所述第一基板的第一表面上的光刻胶上形成所述透射光栅及其对位标记的图案;forming patterns of the transmission grating and its alignment marks on the photoresist on the first surface of the first substrate; 利用干法蚀刻法在所述第一基板的第一表面上刻蚀出所述透射光栅及其对位标记;以及etching the transmission grating and its alignment marks on the first surface of the first substrate by dry etching; and 去除所述光刻胶。The photoresist is removed. 15.一种制造根据权利要求12所述的光谱检测仪的方法,其特征在于,所述方法包括:15. A method of manufacturing the spectral detector according to claim 12, characterized in that the method comprises: 根据权利要求14所述的制造分光系统的方法;The method of manufacturing a spectroscopic system according to claim 14; 清洗和干燥所得到的分光系统;cleaning and drying the resulting spectroscopic system; 在所述第二基板的面对所述分光系统的一侧上形成所述待测物通道并在所述待测物通道的背离所述分光系统的一侧上设置所述检测器;以及forming the analyte channel on a side of the second substrate facing the spectroscopic system and disposing the detector on a side of the analyte channel away from the spectroscopic system; and 将所述第一基板和所述第二基板对位贴合。The first substrate and the second substrate are bonded in position.
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WO2020019812A1 (en) * 2018-07-26 2020-01-30 Boe Technology Group Co., Ltd. Microfluidic apparatus, and method of detecting substance in microfluidic apparatus

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