CN110186563A - Light splitting light guide module and integrated spectrometer and production method based on cylindrical grating - Google Patents
Light splitting light guide module and integrated spectrometer and production method based on cylindrical grating Download PDFInfo
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- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
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- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
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Abstract
本发明公开了一种基于柱面光栅的集成光谱仪及其制作方法。光谱仪包括布置在一个箱体里的入射狭缝、分光波导模块和线阵探测器。分光波导模块包括平板波导和柱形出入射端、柱面光栅。基于柱面光栅的分光波导模块采用机械加工法和基于电子束3D灰度曝光光刻法结合整体加工而成。平板波导采用高折射率材料,能有效减少光谱仪的整体厚度,并能提高光谱仪的数值孔径,具有较高的光通量。使用3D灰度曝光光刻和刻蚀技术制作柱面光栅,可以制作几十纳米线宽的光栅,加工精度高、刻蚀后结构表面较为光滑,易于制作微型光谱仪。本发明具有高光通量、轻薄、高分辨率且系统更加紧凑、性能更稳定等优点。
The invention discloses an integrated spectrometer based on cylindrical gratings and a manufacturing method thereof. The spectrometer includes an incident slit arranged in a box, a light splitting waveguide module and a linear array detector. The light splitting waveguide module includes a slab waveguide, a cylindrical entrance and exit end, and a cylindrical grating. The spectroscopic waveguide module based on the cylindrical grating is processed as a whole by combining the mechanical processing method and the 3D grayscale exposure photolithography method based on the electron beam. The slab waveguide adopts high-refractive-index materials, which can effectively reduce the overall thickness of the spectrometer, increase the numerical aperture of the spectrometer, and have higher luminous flux. Using 3D grayscale exposure lithography and etching technology to make cylindrical gratings, gratings with a line width of tens of nanometers can be made, with high processing precision and smooth surface after etching, which is easy to make micro spectrometers. The invention has the advantages of high luminous flux, thinness, high resolution, more compact system, more stable performance and the like.
Description
技术领域technical field
本发明涉及基于柱面光栅的分光波导模块和集成光谱仪及制作方法,特别涉及小型化、高集成的光谱仪及其制作方法,属于光谱技术领域。The invention relates to a spectroscopic waveguide module based on a cylindrical grating, an integrated spectrometer and a manufacturing method thereof, in particular to a miniaturized and highly integrated spectrometer and a manufacturing method thereof, and belongs to the technical field of spectroscopy.
背景技术Background technique
光谱仪在环境检测、食品安全以及实时安检等众多领域有重要应用。其中光栅色散型光谱仪由于具有色散均匀、光谱分辨率高等优点受到广泛关注。Spectrometers have important applications in many fields such as environmental detection, food safety, and real-time security inspection. Among them, the grating dispersion spectrometer has attracted extensive attention because of its advantages of uniform dispersion and high spectral resolution.
目前市场上光栅色散型光谱分析仪器向着小型化集成化的方向发展,通常是通过缩小光学元件的尺寸,对传统结构进行空间上的优化,带来的后果是组装更加困难,性能快速下降。At present, grating dispersion spectroscopic analysis instruments on the market are developing towards miniaturization and integration, usually by reducing the size of optical components and optimizing the space of traditional structures, resulting in more difficult assembly and rapid performance degradation.
有学者提出用波导压缩光束以便更好的小型化。如Foster-Miller公司研制的ZnSe波导红外光谱仪,采用Rowland结构,波导为ZnSe楔形波导,凹面光栅粘在波导的一端,线阵探测器放置在波导的另一端。光线由入射光纤引入,经凹面光栅分光会聚后成像在探测器上。凹面全息光栅在两个方向曲率半径一样,设计光路时不容易匹配像差,而且光栅粘在ZnSe波导上,无法避免定位偏差。Some scholars have proposed to use waveguides to compress light beams for better miniaturization. For example, the ZnSe waveguide infrared spectrometer developed by Foster-Miller uses a Rowland structure, the waveguide is a ZnSe wedge-shaped waveguide, the concave grating is glued to one end of the waveguide, and the linear array detector is placed at the other end of the waveguide. The light is introduced by the incident optical fiber, and is imaged on the detector after being split and converged by the concave grating. The radius of curvature of the concave holographic grating is the same in both directions, so it is not easy to match the aberration when designing the optical path, and the grating is glued to the ZnSe waveguide, so positioning deviation cannot be avoided.
发明内容Contents of the invention
本发明旨在提供一种基于柱面光栅的分光波导模块和集成光谱仪及制作方法,利用一片固体导光介质,将光波导、透镜、光栅等的制备全在其上完成,一体成型无需拼接和调节,具有效果稳定可靠和微型的特点。The present invention aims to provide a spectroscopic waveguide module based on a cylindrical grating, an integrated spectrometer and a manufacturing method. A piece of solid light-guiding medium is used to complete the preparation of optical waveguides, lenses, gratings, etc. on it, and the integral formation does not require splicing and Adjustment, with the characteristics of stable and reliable effect and miniature.
本发明通过以下技术方案实现:The present invention is realized through the following technical solutions:
基于柱面光栅的分光波导模块,包括光波导单元和光栅分光单元,所述光波导单元包括平板波导和柱形出入射端,所述光栅分光单元包括柱面光栅,所述柱面光栅和柱形出入射端分别设置在所述平板波导的两端,且与所述平板波导为一体式结构;所述柱面光栅表面镀有高反膜。The light splitting waveguide module based on the cylindrical grating includes an optical waveguide unit and a grating light splitting unit. The output and incident ends are respectively arranged at both ends of the slab waveguide, and are integrated with the slab waveguide; the surface of the cylindrical grating is coated with a high reflection film.
上述技术方案中,所述平板波导选用高折射率材料,所述高折射率材料包括SiO2、ZnSe或玻璃。In the above technical solution, the slab waveguide is made of high-refractive-index material, and the high-refractive-index material includes SiO 2 , ZnSe or glass.
上述技术方案中,所述高反膜选用金膜。In the above technical solution, the high reflection film is made of gold film.
上述技术方案中,所述柱面光栅包括若干连续刻槽,总体呈圆弧柱状结构,其在水平方向面的曲率半径为R,20mm≤R≤120mm。In the above technical solution, the cylindrical grating includes several continuous grooves, which are generally in the shape of an arc columnar structure, and its curvature radius in the horizontal direction is R, and 20mm≤R≤120mm.
基于柱面光栅的集成光谱仪,包括入射狭缝、分光波导模块和线阵探测器;所述入射狭缝用于接收外界光信号并将该光信号入射到所述光谱仪内部;所述分光波导模块包括光波导单元和光栅分光单元,所述光波导单元包括平板波导和柱形出入射端,所述光栅分光单元包括柱面光栅,所述柱形出入射端用于将光信号在垂直方向上压缩使其限制在波导内传输,并将反射到其上的光信号聚焦到所述线阵探测器;所述柱面光栅用于将入射光线分光并反射到柱形出入射端;所述入射狭缝和所述线阵探测器靠近所述分光波导模块的柱形出入射端设置。An integrated spectrometer based on a cylindrical grating, including an incident slit, a light-splitting waveguide module and a linear array detector; the incident slit is used to receive an external light signal and inject the light signal into the inside of the spectrometer; the light-splitting waveguide module It includes an optical waveguide unit and a grating light splitting unit, the light waveguide unit includes a slab waveguide and a cylindrical entrance and exit end, the grating light separation unit includes a cylindrical grating, and the cylindrical entrance and exit end is used to split the optical signal in the vertical direction compress to limit transmission in the waveguide, and focus the optical signal reflected on it to the line array detector; the cylindrical grating is used to split the incident light and reflect it to the cylindrical exit and entrance; the incident The slit and the linear array detector are arranged close to the cylindrical entrance and exit end of the light splitting waveguide module.
基于柱面光栅的分光波导模块的制作方法,所述方法采用机械加工法制作模块轮廓结构,并基于电子束3D灰度曝光光刻法制作柱面光栅;所述方法包括:A method for manufacturing a spectroscopic waveguide module based on a cylindrical grating, the method adopts a mechanical processing method to make a module outline structure, and makes a cylindrical grating based on an electron beam 3D grayscale exposure photolithography method; the method includes:
选用大小适宜的高折射率材料作为平板波导基底;Choose a high refractive index material with a suitable size as the slab waveguide substrate;
通过机械加工将所述平板波导基底加工成模块轮廓结构,所述模块轮廓结构为一端平直另一端呈圆弧面的板块式结构,所述板式结构包括如上所述的平板波导和柱形出入射端,以及用于制作柱面光栅的圆弧柱面;The slab waveguide substrate is processed into a module profile structure by machining, and the module profile structure is a plate structure with one end straight and the other end forming an arc surface, and the plate structure includes the above-mentioned slab waveguide and cylindrical out The incident end, and the arc cylinder used to make the cylindrical grating;
将圆弧柱面清洗并烘干,通过HMDS(六甲基二硅胺)蒸气淀积使圆弧柱面表面具有疏水性;Clean and dry the arc cylinder, and make the surface of the arc cylinder hydrophobic by HMDS (hexamethyldisilamine) vapor deposition;
根据刻蚀比将适量光刻胶旋涂到所述圆弧柱面;并使用真空热板对所述圆弧柱面进行软烘,并将所述圆弧柱面边缘的光刻胶去除;According to the etching ratio, an appropriate amount of photoresist is spin-coated on the arc cylinder; and the arc cylinder is soft-baked using a vacuum hot plate, and the photoresist on the edge of the arc cylinder is removed;
使电子束对准所述圆弧柱面并精准定位,并根据BMP灰度文件进行电子束曝光,所述BMP灰度文件包括与光刻胶对应的柱面光栅的曝光能量和焦距数据;将经过电子束曝光后的圆弧柱面浸入显影溶剂使其柱面光栅结构显影,并将其通过110~300℃热板后烘去除其上未曝光光刻胶,得到分光波导模块粗产品;Align the electron beam with the arc cylinder and precisely position it, and perform electron beam exposure according to the BMP grayscale file, and the BMP grayscale file includes the exposure energy and focal length data of the cylindrical grating corresponding to the photoresist; After electron beam exposure, the circular arc cylindrical surface is immersed in a developing solvent to develop the cylindrical grating structure, and then baked on a hot plate at 110~300°C to remove the unexposed photoresist to obtain the crude product of the spectroscopic waveguide module;
将所述分光波导模块粗产品通过100-130℃热板硬烘1-2min,使用干法刻蚀技术对硬烘后的分光波导模块粗产品的柱面光栅结构进行ICP(电感耦合等离子体)刻蚀,并将经过电子束灰度曝光的光刻胶从所述柱面光栅结构上去除,清洗后得到柱面光栅。Hard-bake the rough product of the splitting waveguide module through a hot plate at 100-130°C for 1-2 minutes, and use dry etching technology to perform ICP (inductively coupled plasma) on the cylindrical grating structure of the rough product of the splitting waveguide module after hard-baking etching, and removing the photoresist exposed by the electron beam grayscale from the cylindrical grating structure, and obtaining the cylindrical grating after cleaning.
将所述柱面光栅表面镀上高反膜,即得到所述分光波导模块。The spectroscopic waveguide module is obtained by coating the surface of the cylindrical grating with a high reflection film.
上述技术方案中,所述柱面光栅包括若干连续刻槽形成的光栅,所述光栅线宽能够达到几十纳米。In the above technical solution, the cylindrical grating includes a grating formed by several continuous grooves, and the line width of the grating can reach tens of nanometers.
上述技术方案中,平板波导基底尺寸为20mm×15mm×2mm~120mm×100mm×10 mm。In the above technical solution, the size of the slab waveguide base is 20mm×15mm×2mm~120mm×100mm×10 mm.
本发明具有以下优点及有益效果:The present invention has the following advantages and beneficial effects:
1)光信号在固体平板波导中传播没有杂散光影响,结构简单,平板波导材料折射率越大发散角越小,光束尺寸越小,整体尺寸也越小,且入射端为柱面结构可以进一步使光束汇聚,从而减小光谱仪的尺寸。更小的发散角在保证分辨率的同时提高信号强度;1) The optical signal propagates in the solid slab waveguide without the influence of stray light, and the structure is simple. The larger the refractive index of the slab waveguide material, the smaller the divergence angle, the smaller the beam size, and the smaller the overall size, and the cylindrical structure at the incident end can further The beams are converged, thereby reducing the size of the spectrometer. Smaller divergence angle improves signal strength while ensuring resolution;
2)实现真正意义上的片上集成,而不是通过粘黏的方式组装光学零件。减少了光谱仪中各种光阑,没有活动部件,提高了整个系统的稳定性。在减小光谱仪尺寸的同时提高了分辨率,可应用于多种领域,特别是对分辨率要求高的领域。2) Realize on-chip integration in the true sense, rather than assembling optical components by sticking. Various apertures in the spectrometer are reduced, and there are no moving parts, which improves the stability of the entire system. The resolution is improved while reducing the size of the spectrometer, and can be applied in various fields, especially the fields requiring high resolution.
附图说明Description of drawings
图1为本发明所涉及的基于柱面光栅的集成光谱仪光路示意图。FIG. 1 is a schematic diagram of the optical path of an integrated spectrometer based on cylindrical gratings involved in the present invention.
图2为本发明所涉及的基于柱面光栅的分光波导模块结构示意图。FIG. 2 is a schematic structural diagram of a cylindrical grating-based optical splitting waveguide module involved in the present invention.
图3为本发明所涉及的基于柱面光栅的分光波导模块制作步骤示意图。FIG. 3 is a schematic diagram of the manufacturing steps of the optical splitting waveguide module based on cylindrical gratings involved in the present invention.
图4为本发明所涉及的柱面光栅结构示意图。FIG. 4 is a schematic diagram of a structure of a cylindrical grating involved in the present invention.
图5为实例1的尺寸示意图:(a)俯视图;(b)侧视图。Fig. 5 is a schematic diagram of the dimensions of Example 1: (a) top view; (b) side view.
图中:1–入射光线;2–柱形出入射端面;3–入射光线;4–柱面光栅;5–出射光线;6–线阵探测器;7–平板波导;8–入射狭缝。In the figure: 1—incident light; 2—cylindrical entrance and exit facet; 3—incident light; 4—cylindrical grating; 5—exit light; 6—linear array detector; 7—slab waveguide; 8—entrance slit.
具体实施方式Detailed ways
下面结合附图对本发明的具体实施方式及工作过程作进一步的说明。The specific embodiment of the present invention and working process will be further described below in conjunction with accompanying drawing.
本申请文件中的上、下、左、右、前和后等方位用语是基于附图所示的位置关系而建立的。附图不同,则相应的位置关系也有可能随之发生变化,故不能以此理解为对保护范围的限定。The orientation terms such as up, down, left, right, front and rear in this application document are established based on the positional relationship shown in the drawings. If the drawings are different, the corresponding positional relationship may also change accordingly, so this should not be understood as limiting the scope of protection.
如图1所示,基于柱面光栅的集成光谱仪,包括入射狭缝8、分光波导模块和线阵探测器6。本发明所述的光谱仪结构实际上是设置在作为光谱仪的仪器箱体中的内部结构,本领域一般技术人员均能理解和想象。仪器箱体一侧设有光信号入口,其光信号入口即为本发明所述的入射狭缝8。仪器箱体中的线阵探测器6具体位置则需要根据光谱仪的具体参数进行校准。入射狭缝8用于接收外界光信号并将该光信号入射到光谱仪(分光波导模块)内部。As shown in FIG. 1 , an integrated spectrometer based on a cylindrical grating includes an incident slit 8 , a light splitting waveguide module and a linear array detector 6 . The spectrometer structure described in the present invention is actually an internal structure arranged in the instrument case of the spectrometer, which can be understood and imagined by those skilled in the art. One side of the instrument box is provided with an optical signal entrance, and the optical signal entrance is the incident slit 8 described in the present invention. The specific position of the linear array detector 6 in the instrument box needs to be calibrated according to the specific parameters of the spectrometer. The incident slit 8 is used to receive external optical signals and inject the optical signals into the inside of the spectrometer (light-splitting waveguide module).
如图2所示,分光波导模块包括光波导单元和光栅分光单元。光波导单元包括平板波导7和柱形出入射端2。平板波导为平直的长方体状结构,选用高折射率材料,高折射率材料包括SiO2、ZnSe或玻璃,能有效降低系统的整体高度,并提高系统的数值孔径,获得较高的光通量,更适用于拉曼光谱等弱信号检测领域。As shown in FIG. 2 , the optical splitting waveguide module includes an optical waveguide unit and a grating splitting unit. The optical waveguide unit includes a slab waveguide 7 and a cylindrical incident end 2 . The slab waveguide is a straight rectangular parallelepiped structure, and high refractive index materials are selected, including SiO 2 , ZnSe or glass, which can effectively reduce the overall height of the system, increase the numerical aperture of the system, obtain higher luminous flux, and more It is suitable for weak signal detection fields such as Raman spectroscopy.
光栅分光单元包括柱面光栅4,本发明所用柱面光栅为反射光栅。柱面光栅4呈圆弧柱状结构,该圆弧柱状结构为与所述平板波导等高且上下平面水平平行、光栅面在水平俯视方向呈圆弧状。柱面光栅4在水平方向面的曲率半径为R,20mm≤R≤120mm。柱面光栅4包括若干连续的刻槽,这些刻槽即为光栅。光栅的闪耀角固定且线宽相同,如图4所示。柱面光栅的闪耀角由光谱仪波长决定,通常为5°~40°。本发明的光栅线宽能够达到几十纳米的量级。柱面光栅4和柱形出入射端2分别设置在平板波导7的两端,且与平板波导7为一体式结构。柱形出入射端2为柱形透镜,如图2和图5b的侧视图所示,其曲率往往就是平板波导的厚度。柱形出入射端2用于将光信号在垂直方向上压缩使其限制在波导内传输,并将反射到其上的光信号聚焦到线阵探测器6。柱面光栅4表面(与柱形出入射端相对的一面)镀有高反膜,高反膜选用金(Au)膜,用于将入射光线分光并反射到柱形出入射端2。The grating light splitting unit includes a cylindrical grating 4, and the cylindrical grating used in the present invention is a reflective grating. The cylindrical grating 4 has an arc-shaped columnar structure, the arc-shaped columnar structure is equal in height to the slab waveguide and the upper and lower planes are horizontally parallel, and the grating surface is arc-shaped in a horizontal plan view direction. The radius of curvature of the cylindrical grating 4 in the horizontal direction is R, and 20mm≤R≤120mm. The cylindrical grating 4 includes several continuous grooves, and these grooves are gratings. The blaze angle of the grating is fixed and the line width is the same, as shown in Figure 4. The blaze angle of the cylindrical grating is determined by the wavelength of the spectrometer, usually 5°~40°. The grating line width of the present invention can reach the order of tens of nanometers. The cylindrical grating 4 and the cylindrical incident and exit ports 2 are respectively arranged at both ends of the slab waveguide 7 , and are integrated with the slab waveguide 7 . The cylindrical entrance and exit end 2 is a cylindrical lens, as shown in the side views of Fig. 2 and Fig. 5b, and its curvature is often the thickness of the slab waveguide. The cylindrical input and output end 2 is used to compress the optical signal in the vertical direction so that it is limited to be transmitted in the waveguide, and to focus the optical signal reflected thereon to the linear array detector 6 . The surface of the cylindrical grating 4 (the side opposite to the cylindrical entrance-exit end) is coated with a high-reflection film, and the high-reflection film is gold (Au) film, which is used to split the incident light and reflect it to the cylindrical entrance-exit end 2 .
入射狭缝8和线阵探测器6靠近分光波导模块的柱形出入射端2设置。The incident slit 8 and the linear array detector 6 are arranged close to the cylindrical entrance and exit end 2 of the light splitting waveguide module.
基于柱面光栅的分光波导模块的制作方法,采用机械加工法制作模块轮廓结构,并基于电子束3D灰度曝光光刻法制作柱面光栅。The manufacturing method of the spectroscopic waveguide module based on the cylindrical grating adopts the mechanical processing method to manufacture the module outline structure, and the cylindrical grating is manufactured based on the electron beam 3D grayscale exposure photolithography method.
选用大小适宜的高折射率材料作为平板波导基底,高折射率材料包括SiO2、ZnSe或玻璃。平板波导基底的尺寸为20mm×15mm×2mm~120mm×100mm×10mm。A high-refractive-index material with a suitable size is selected as the flat waveguide substrate, and the high-refractive-index material includes SiO 2 , ZnSe or glass. The size of the slab waveguide substrate is 20mm×15mm×2mm~120mm×100mm×10mm.
通过机械加工将平板波导基底加工成模块轮廓结构,模块轮廓结构为一端平直另一端呈圆弧面的板块式结构(如图3a所示),板块式结构包括平板波导7和柱形出入射端2以及用于制作柱面光栅的圆弧柱面。The slab waveguide substrate is processed into a module profile structure by machining. The module profile structure is a plate structure with one end straight and the other end arc-shaped (as shown in Figure 3a). The plate structure includes a slab waveguide 7 and a cylindrical incident End 2 and the arc cylinder used to make the cylinder grating.
将圆弧柱面清洗并烘干,去除表面污染物和水蒸气,使基底表面由亲水性变为憎水性,增强表面的粘附性;通过HMDS(六甲基二硅胺)蒸气淀积,气相成底膜,使圆弧柱面表面具有疏水性,增强圆弧柱面表面与光刻胶的粘附性。Clean and dry the arc cylindrical surface to remove surface pollutants and water vapor, change the surface of the substrate from hydrophilic to hydrophobic, and enhance the adhesion of the surface; through HMDS (hexamethyldisilamine) vapor deposition , forming a base film in the vapor phase, making the surface of the arc cylindrical surface hydrophobic, and enhancing the adhesion between the arc cylindrical surface and the photoresist.
根据刻蚀比将适量光刻胶旋涂到圆弧柱面,如图3b所示。并使用真空热板对圆弧柱面进行软烘,除去溶剂(4~7%),增强黏附性,释放光刻胶膜内的应力,防止光刻胶玷污设备;并将圆弧柱面边缘的光刻胶去除。According to the etching ratio, an appropriate amount of photoresist is spin-coated onto the arc cylinder, as shown in Figure 3b. And use a vacuum hot plate to soft bake the arc cylinder to remove the solvent (4-7%), enhance the adhesion, release the stress in the photoresist film, and prevent the photoresist from contaminating the equipment; photoresist removal.
使电子束对准所述圆弧柱面并精准定位。对准,主要包括激光自动对准功能进行预对准和通过对准标志进行精准定位,如图3c所示。并根据BMP灰度文件进行电子束曝光,如图3d所示。BMP灰度文件包括与光刻胶对应的柱面光栅的曝光能量和焦距数据,通过实验获得。The electron beam is aimed at the arc cylinder and positioned precisely. Alignment mainly includes pre-alignment by laser automatic alignment function and precise positioning by alignment marks, as shown in Figure 3c. And perform electron beam exposure according to the BMP grayscale file, as shown in Figure 3d. The BMP grayscale file includes the exposure energy and focal length data of the cylindrical grating corresponding to the photoresist, which is obtained through experiments.
图3中虚线部分为电子束光刻的原理,在真空条件下,利用电子枪中产生的低能量密度电子经加速、聚焦后照射高分子材料,使材料分子链被切断或重新组合,引起分子量的变化即产生潜象,再将其浸入溶剂中将其显影出来。The dotted line in Figure 3 is the principle of electron beam lithography. Under vacuum conditions, the low-energy density electrons generated in the electron gun are used to accelerate and focus the polymer material to irradiate the polymer material, so that the molecular chain of the material is cut or recombined, causing the molecular weight to change. The change creates a latent image, which is then developed by immersing it in a solvent.
并将其通过110~300℃热板后烘,减少驻波效应,激发化学增强光刻胶的PAG产生的酸与光刻胶上的保护基团发生反应并移除基团使之能溶解于显影液。显影,使光刻胶具有柱面光栅的结构,去除其上未曝光光刻胶,得到分光波导模块粗产品,如图3e所示。And post-baking it through a hot plate at 110~300°C to reduce the standing wave effect, stimulate the acid generated by the PAG of the chemically amplified photoresist to react with the protective group on the photoresist and remove the group so that it can be dissolved in developer. Develop to make the photoresist have a cylindrical grating structure, remove the unexposed photoresist on it, and obtain the crude product of the splitting waveguide module, as shown in Figure 3e.
将所述分光波导模块粗产品通过100℃-130℃热板硬烘1-2min,全蒸发掉光刻胶里面的溶剂,提高光刻胶在离子注入或刻蚀中保护下表面的能力,进一步增强光刻胶与基底表面之间的黏附性,减少驻波效应。使用干法刻蚀技术对硬烘后的分光波导模块粗产品的柱面光栅结构进行ICP刻蚀,并将经过电子束灰度曝光的光刻胶从所述柱面光栅结构上去除,清洗后得到柱面光栅,如图3f所示。柱面光栅包括若干上下贯通的刻槽,这些即为光栅。光栅的闪耀角固定且线宽相同,如图4所示。并且,通过本方法制作的柱面光栅线宽能够达到几十纳米。The crude product of the optical splitter waveguide module is hard-baked on a hot plate at 100°C-130°C for 1-2min, and the solvent in the photoresist is completely evaporated, so as to improve the ability of the photoresist to protect the lower surface during ion implantation or etching, and further Enhances the adhesion between the photoresist and the substrate surface and reduces the standing wave effect. Use dry etching technology to perform ICP etching on the cylindrical grating structure of the hard-baked spectroscopic waveguide module rough product, and remove the photoresist exposed by the electron beam gray scale from the cylindrical grating structure, after cleaning A cylindrical grating is obtained, as shown in Figure 3f. Cylindrical gratings include several vertical grooves, which are called gratings. The blaze angle of the grating is fixed and the line width is the same, as shown in Figure 4. Moreover, the line width of the cylindrical grating fabricated by this method can reach tens of nanometers.
将柱面光栅的表面镀上高反膜,即得到分光波导模块。The surface of the cylindrical grating is coated with a high-reflection film to obtain a splitting waveguide module.
光栅是光谱仪的核心元件,选用柱面光栅具有如下显著的优势:The grating is the core component of the spectrometer, and the selection of a cylindrical grating has the following significant advantages:
1)与平面闪耀光栅相比更利于集成,从而实现其微型化。这是由于使用平面光栅时,需同时增加准直、聚焦透镜,增大集成难度。同时由于光线的发散做作用,如果只在一个方向上准直,如光入射和出射处的柱面结构,最终得到的光谱仪的尺寸远远大于本发明尺寸。若将光入射和出射处的柱面结构改为球面结构,则加大了加工难度。1) Compared with the planar blazed grating, it is more conducive to integration, so as to realize its miniaturization. This is because when using a planar grating, it is necessary to add collimating and focusing lenses at the same time, which increases the difficulty of integration. At the same time, due to the divergence of the light, if it is only collimated in one direction, such as the cylindrical structure of the light incident and exit, the final size of the spectrometer is much larger than the size of the present invention. If the cylindrical structure at the light incident and exit is changed to a spherical structure, the processing difficulty will be increased.
2)与全息凹面光栅相比,柱面光栅可以降低光谱中球差等像差,因为全息凹面光栅在两个方向曲率半径一样,设计光路时不容易匹配像差,对设计和制作要求更高。2) Compared with the holographic concave grating, the cylindrical grating can reduce aberrations such as spherical aberration in the spectrum, because the curvature radius of the holographic concave grating is the same in both directions, it is not easy to match the aberration when designing the optical path, and the design and production requirements are higher. .
目前制作柱面光栅的主要方式是机械加工,因此,往往受限制于机械加工的精度及光谱仪设计的整体尺寸。一般机械加工的加工精度很难高于1μm,其制作的光栅很难用于高精度光谱分光。At present, the main way to manufacture cylindrical gratings is machining, so it is often limited by the precision of machining and the overall size of spectrometer design. The machining accuracy of general machining is difficult to be higher than 1 μm, and the grating produced by it is difficult to be used for high-precision spectral spectroscopy.
激光加工是目前很常用的一种加工方法,飞秒激光加工精度可以达到100nm,但是其加工深度一般仅为10μm,无法垂直于上表面加工深度为4mm的光栅。若垂直于侧面加工,无法实现高精度对准。且激光在加工过程中会产生热量,限制加工材料的种类,激光加工后的结构表面相比于刻蚀法更为粗糙。Laser processing is a very commonly used processing method at present. The femtosecond laser processing accuracy can reach 100nm, but its processing depth is generally only 10μm, and it is impossible to process a grating with a depth of 4mm perpendicular to the upper surface. High-precision alignment cannot be achieved if it is machined perpendicular to the sides. Moreover, the laser will generate heat during processing, which limits the types of processed materials. The surface of the structure after laser processing is rougher than that of etching.
使用3D灰度曝光光刻和刻蚀技术制作柱面光栅,可以制作几十纳米线宽的光栅,加工精度高、刻蚀后结构表面较为光滑。Using 3D grayscale exposure lithography and etching technology to produce cylindrical gratings, gratings with a line width of tens of nanometers can be produced, with high processing precision and smooth surface after etching.
实施例一:Embodiment one:
选定大小合适的高折射率平板波导K9玻璃,其折射率约为1.517,相比空气传输(折射率1)可以使光谱仪的分辨率更高。如图5所示,经过机械加工后,平板波导轮廓尺寸为70mm× 60mm × 4mm。入射狭缝8宽度为0.05mm,高度为0.5mm,可以保证平板波导内有足够的光强。平板波导7的厚度为4mm,柱形出入射端2柱面曲率半径约为4mm,可以使光线发散角很小,保证光线在平板波导中水平传播,减少像差。从狭缝8到柱形出入射端2的距离为6mm,从柱形出入射端2至柱面光栅4的距离为70mm,从柱面光栅4至柱形出入射端2的距离69mm,从柱形出入射端2至线阵探测器6的距离为8mm。The selected high-refractive index slab waveguide K9 glass with a suitable size has a refractive index of about 1.517, which can make the resolution of the spectrometer higher than that of air transmission (refractive index 1). As shown in Figure 5, after machining, the outline size of the slab waveguide is 70mm × 60mm × 4mm. The incident slit 8 has a width of 0.05 mm and a height of 0.5 mm, which can ensure sufficient light intensity in the slab waveguide. The thickness of the slab waveguide 7 is 4 mm, and the radius of curvature of the cylindrical entrance and exit end 2 is about 4 mm, which can make the light divergence angle small, ensure that the light propagates horizontally in the slab waveguide, and reduce aberrations. The distance from the slit 8 to the cylindrical incident end 2 is 6 mm, the distance from the cylindrical incident end 2 to the cylindrical grating 4 is 70 mm, and the distance from the cylindrical grating 4 to the cylindrical incident end 2 is 69 mm. The distance from the cylindrical incident end 2 to the linear array detector 6 is 8mm.
使用3D灰度曝光光刻技术制作的柱面光栅曲率半径为87mm,刻线数为600/mm,闪耀角β为14.7°。最终制作的光栅线宽为1.66μm,高度为0.4μm。平板光谱仪的上下两个面是平行的,柱面光栅同时与两个面垂直,垂直高度为4mm。在完成光栅的刻蚀后在外表面镀高反射膜-Au膜,使线阵探测器探测到的信号更强。柱面光栅4垂线与水平线的夹角为13°,柱形出入射端2垂线与水平线夹角为6.5°,线阵探测器6与水平线的夹角为3°。线阵探测器6选用CCD(Charged Coupled Device)图像传感器,单个像元大小为14μm×14μm。光路图如图1所示,光谱范围为800-900nm,光谱分辨率为0.6纳米。The radius of curvature of the cylindrical grating produced by 3D grayscale exposure lithography technology is 87mm, the number of grooves is 600/mm, and the blaze angle β is 14.7°. The final grating has a line width of 1.66 μm and a height of 0.4 μm. The upper and lower surfaces of the flat-panel spectrometer are parallel, and the cylindrical grating is perpendicular to the two surfaces at the same time, and the vertical height is 4mm. After the grating is etched, the outer surface is coated with a highly reflective film-Au film, so that the signal detected by the linear array detector is stronger. The angle between the vertical line and the horizontal line of the cylindrical grating 4 is 13°, the angle between the vertical line and the horizontal line of the cylindrical incident end 2 is 6.5°, and the angle between the linear array detector 6 and the horizontal line is 3°. The linear array detector 6 is a CCD (Charged Coupled Device) image sensor, and the size of a single pixel is 14 μm×14 μm. The optical path diagram is shown in Figure 1, the spectral range is 800-900nm, and the spectral resolution is 0.6nm.
以上所述仅为本发明的优选实施例而已,并不用于限制本发明,对于本领域的技术人员来说,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.
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Application publication date: 20190830 |