WO2025261700A3 - Arrangement, installation and method for generating euv radiation or for conducting nuclear fusion, and production method for producing microchips or semiconductor intermediate products for producing microchips - Google Patents

Arrangement, installation and method for generating euv radiation or for conducting nuclear fusion, and production method for producing microchips or semiconductor intermediate products for producing microchips

Info

Publication number
WO2025261700A3
WO2025261700A3 PCT/EP2025/063987 EP2025063987W WO2025261700A3 WO 2025261700 A3 WO2025261700 A3 WO 2025261700A3 EP 2025063987 W EP2025063987 W EP 2025063987W WO 2025261700 A3 WO2025261700 A3 WO 2025261700A3
Authority
WO
WIPO (PCT)
Prior art keywords
arrangement
microchips
producing
producing microchips
euv radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/EP2025/063987
Other languages
German (de)
French (fr)
Other versions
WO2025261700A2 (en
Inventor
Jens Brunne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trumpf Lasersystems For Semiconductor Manufacturing Se
Original Assignee
Trumpf Lasersystems For Semiconductor Manufacturing Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Lasersystems For Semiconductor Manufacturing Se filed Critical Trumpf Lasersystems For Semiconductor Manufacturing Se
Publication of WO2025261700A2 publication Critical patent/WO2025261700A2/en
Publication of WO2025261700A3 publication Critical patent/WO2025261700A3/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0084—Control of the laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An arrangement (26) for generating EUV radiation or for conducting nuclear fusion by irradiating a target material (28) with a plurality of laser beams (20, 22, 24). The arrangement (26) comprises a target chamber (32) having an interior (34) with a target area (36) for irradiating the target material (28) with the plurality of laser beams (20, 22, 24), an introduction device (38) for introducing the target material (28) into the target area (36), and a manipulation device (46) for shaping and/or positioning the target material (28) within the target area (36).
PCT/EP2025/063987 2024-06-20 2025-05-21 Arrangement, installation and method for generating euv radiation or for conducting nuclear fusion, and production method for producing microchips or semiconductor intermediate products for producing microchips Pending WO2025261700A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102024117484.6 2024-06-20
DE102024117484.6A DE102024117484A1 (en) 2024-06-20 2024-06-20 Arrangement, system and method for generating EUV radiation or for operating nuclear fusion, as well as manufacturing methods for producing microchips or semiconductor intermediates for producing microchips

Publications (2)

Publication Number Publication Date
WO2025261700A2 WO2025261700A2 (en) 2025-12-26
WO2025261700A3 true WO2025261700A3 (en) 2026-03-12

Family

ID=95939403

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2025/063987 Pending WO2025261700A2 (en) 2024-06-20 2025-05-21 Arrangement, installation and method for generating euv radiation or for conducting nuclear fusion, and production method for producing microchips or semiconductor intermediate products for producing microchips

Country Status (2)

Country Link
DE (1) DE102024117484A1 (en)
WO (1) WO2025261700A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026077838A1 (en) * 2024-10-08 2026-04-16 Asml Netherlands B.V. Systems and methods for generating euv radiation from laser-produced plasmas

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1492394A2 (en) * 2003-06-26 2004-12-29 Northrop Grumman Corporation Laser-produced plasma EUV light source with pre-pulse enhancement
DE102004028943A1 (en) * 2004-06-11 2005-12-29 Xtreme Technologies Gmbh Device for stable generation of EUV radiation by means of a laser-induced plasma
DE102005014433B3 (en) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Method and device for the efficient generation of short-wave radiation based on a laser-generated plasma
US20220201831A1 (en) * 2019-04-04 2022-06-23 Asml Netherlands B.V. Radiation system
US20220260927A1 (en) * 2020-05-22 2022-08-18 Taiwan Semiconductor Manufacturing Co., Ltd. Method for controlling extreme ultraviolet light

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004005242B4 (en) * 2004-01-30 2006-04-20 Xtreme Technologies Gmbh Method and apparatus for the plasma-based generation of intense short-wave radiation
IL312370A (en) * 2021-10-25 2025-01-01 Trumpf Lasersystems Semiconductor Mfg Gmbh Euv light source having a beam-position adjustment device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1492394A2 (en) * 2003-06-26 2004-12-29 Northrop Grumman Corporation Laser-produced plasma EUV light source with pre-pulse enhancement
DE102004028943A1 (en) * 2004-06-11 2005-12-29 Xtreme Technologies Gmbh Device for stable generation of EUV radiation by means of a laser-induced plasma
DE102005014433B3 (en) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Method and device for the efficient generation of short-wave radiation based on a laser-generated plasma
US20220201831A1 (en) * 2019-04-04 2022-06-23 Asml Netherlands B.V. Radiation system
US20220260927A1 (en) * 2020-05-22 2022-08-18 Taiwan Semiconductor Manufacturing Co., Ltd. Method for controlling extreme ultraviolet light

Also Published As

Publication number Publication date
WO2025261700A2 (en) 2025-12-26
DE102024117484A1 (en) 2025-12-24

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