WO2025069264A1 - Mask case, transport carriage, mask buffer, and conveyance device - Google Patents

Abstract

This mask case comprises: a case body that houses a mask and has at least a portion thereof possessing conductivity; a conductive member that guides static electricity charged on the mask to the conductive portion of the case body; and a first static elimination member that is electrically connected to the conductive portion and that eliminates the static electricity charged on the conductive portion.

Description

Mask case, transport cart, mask buffer, and transport device

　Related to mask cases, transport carts, mask buffers, and transport devices.

In the photolithography process for manufacturing semiconductor elements and liquid crystal display elements, etc., a step-and-repeat type projection exposure apparatus (known as a stepper) or a step-and-scan type projection exposure apparatus (known as a scanning stepper, also called a scanner) is mainly used to transfer a pattern formed on a mask or reticle onto a glass substrate or wafer, etc., via a projection optical system.

In such exposure apparatus, various anti-static measures are taken to remove static electricity that has built up on the substrate and mask (for example, Patent Document 1).

Japanese Patent Application Publication No. 8-137112

According to the disclosed embodiment, the mask case comprises a case body, at least a portion of which is conductive, that houses the mask, a conductive member that directs static electricity charged to the mask to the conductive portion of the case body, and a first static elimination member that is electrically connected to the conductive portion and that eliminates static electricity charged to the conductive portion.

According to another disclosed aspect, the transport cart is a transport cart for transporting the above-mentioned mask case, and includes a placement section on which the mask case is placed, and a static elimination mechanism for eliminating static electricity charged to the mask case placed on the placement section.

According to another disclosed aspect, the mask buffer is capable of storing a plurality of the above-mentioned mask cases, and includes a shelf portion on which the mask cases are placed, and a static elimination mechanism that eliminates static electricity charged to the mask cases placed on the shelf portion.

According to another disclosed aspect, the transport device is a transport device that transports mask cases out of and into a mask buffer that stores mask cases, and includes an arm section that drives in a first direction parallel to the surface of the mask to remove the mask case from and insert the mask case into the mask buffer, and a static elimination mechanism that eliminates static electricity charged to the arm section, and the arm section is electrically connected to the mask case while holding the mask case.

The configuration of the embodiments described below may be modified as appropriate, and at least a portion may be replaced with other components. Furthermore, components that are not specifically limited in their placement may be placed in any position that achieves their function, not limited to the placement disclosed in the embodiments.

FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus according to an embodiment. FIG. 2A is a schematic diagram of the main body and the substrate transport device as viewed from above, and FIG. 2B is a schematic diagram of the main body and the substrate transport device as viewed from the side. FIG. 3A is a top view of a substrate tray, and FIG. 3B is a side view of the substrate tray with a substrate placed on the upper surface. FIG. 4 is a view of the transport mechanism as seen from the +X side. FIG. 5A is a diagram for explaining the relationship between the substrate holder, the transport mechanism, and the static electricity removal brush, and FIG. 5B is a diagram for explaining the relationship between the static electricity removal brush and the substrate tray. FIG. 6 is a diagram for explaining another example of the installation location of the static electricity eliminating brush. 7A to 7C are diagrams for explaining a robot hand according to a modified example of this embodiment. FIG. 8 is a diagram (part 1) for explaining the configuration of the mask loader. FIG. 9 is a diagram (part 2) for explaining the configuration of the mask loader. FIG. 10 is a flowchart showing a series of processes up to mounting the mask on the mask stage. FIG. 11 is a flow chart showing a series of processes after the mask is removed from the mask stage. FIG. 12 is a cross-sectional view for explaining the configuration of the mask case. FIG. 13 is a cross-sectional view showing another example of the configuration of the mask case. FIG. 14A is a diagram showing an outline of the transport cart, and FIG. 14B is an enlarged view of the mechanical stopper. 15A and 15B are diagrams for explaining the structure of the static elimination mechanism provided in the transport cart. 16A is a schematic diagram of the shelf portion of the mask buffer as viewed from the +Z direction, and FIG. 16B is a cross-sectional view taken along line AA of FIG. 16A. FIG. 17 is a schematic diagram showing the configuration of the buffer arm. FIG. 18A is a diagram showing the appearance of a mask transport mechanism according to an embodiment, and FIG. 18B is a schematic diagram showing the configuration of the mask transport mechanism.

Below, an exposure apparatus EX according to one embodiment will be described with reference to Figures 1 to 18(B). Figure 1 is a schematic diagram showing the configuration of an exposure apparatus EX according to one embodiment.

The exposure device EX is used, for example, when manufacturing an organic EL display, to form a TP (Touch Panel) circuit or a CF (Color Filter) circuit on the upper surface of a substrate P. The substrate P is, for example, a glass plate on which TFTs (Thin Film Transistors) are formed by deposition or the like and then sealed, but is not limited to this.

As shown in FIG. 1, the exposure apparatus EX includes a main body 100, a substrate transport device 200, and a mask loader 300.

In the following description, the direction in which the mask M and substrate P (described later) are scanned relative to the projection optical system 116 during exposure is defined as the X-axis direction, the direction perpendicular to the X-axis in the horizontal plane is defined as the Y-axis direction, and the direction perpendicular to the X-axis and Y-axis is defined as the Z-axis direction. Additionally, the directions of rotation (tilt) around the X-axis, Y-axis, and Z-axis are defined as the θx, θy, and θz directions, respectively.

FIG. 2(A) is a schematic diagram of the main body 100 and the substrate transport device 200 viewed from above, and FIG. 2(B) is a schematic diagram of the main body 100 and the substrate transport device 200 viewed from the side. As shown in FIG. 1, FIG. 2(A) and FIG. 2(B), the substrate transport device 200 is disposed on the +X side of the main body 100. Note that the substrate transport device 200 may also be disposed on the -X side of the main body 100.

<Substrate transport device 200>
The substrate transport device 200 transfers the substrate P between an external device 1000 (see FIG. 2A ) such as a coater/developer and the main body 100. The external device 1000 has, for example, a fork-shaped robot hand RH, and can transport the substrate P placed on the robot hand RH from the external device 1000 into the substrate transport device 200.

The substrate transport device 200 includes a substrate tray (substrate support member) 201, a transport mechanism 202, an alignment mechanism 203, and a stand unit 204.

The substrate tray 201 is placed on the stand 204. The substrate P placed on the robot hand RH is transported from the external device 1000 into the substrate transport device 200 and placed on the substrate tray 201 placed on the stand 204.

The substrate tray 201 is a carrier used when transporting and installing the substrate P inside the main body 100, and the substrate P is placed on its upper surface. Fig. 3(A) is a top view of the substrate tray 201, and Fig. 3(B) is a side view of the substrate tray 201 with the substrate P placed on its upper surface.

As shown in Fig. 3A, the substrate tray 201 is, for example, a lattice-shaped member. The substrate tray 201 includes a base member 201a and a support member 201b that is provided on the base member 201a and supports the substrate P. In this embodiment, the base member 201a and the support member 201b are conductive, and the base member 201a and the support member 201b are electrically connected. In this specification, "having conductivity" or "conductive" means having either electrostatic conductivity or electrostatic dissipation. The electrostatic conductive material is a material having a surface resistance value of 1 x ¹⁰² < Rs < 1 x ¹⁰⁴ Ω, and the electrostatic dissipation material is a material having a surface resistance value of 1 x ¹⁰⁴ < Rs < 1 x ¹⁰¹¹ Ω.

In this embodiment, the substrate tray 201 is provided with a discharge mechanism 210 for removing static electricity charged to the substrate P.

The static electricity removal mechanism 210 includes a static electricity removal brush 210a and a discharge cord 210b. The static electricity removal brush 210a has conductive bristles (conductive fibers). The static electricity removal brush 210a is electrically connected to the base member 201a, and guides the static electricity charged on the substrate P supported by the support member 201b to the base member 201a. In this embodiment, the support member 201b is also conductive and electrically connected to the base member 201a, so that the support member 201b also guides the static electricity charged on the substrate P to the base member 201a, but the support member 201b may be non-conductive.

The discharge cord 210b is electrically connected to the base member 201a. The discharge cord 210b is also called a static discharger, and discharges the static electricity introduced to the base member 201a into the air. This makes it possible to remove the static electricity that has built up on the substrate P placed on the substrate tray 201, thereby preventing devices such as TFTs formed on the substrate P from being destroyed by the static electricity discharge phenomenon.

The substrate tray 201 is large enough to accommodate, for example, a substrate P of G6 (1850×1500 mm) size without it protruding from the substrate tray 201. In other words, the substrate tray 201 is large enough to accommodate two substrates P of G6 half size, which are substrates P of G6 (1850×1500 mm) size divided in half. The size of the substrate P placed on the substrate tray 201 is not limited to G6 size, and may be larger or smaller than G6 size. When the size of the substrate P placed on the substrate tray 201 is larger than G6 size, the size of the substrate tray 201 is designed so that the substrate P can be placed without protruding from the substrate tray 201. The number of substrates P placed on the substrate tray 201 is not limited to one or two, and may be three or more.

The alignment mechanism 203 positions the substrate P relative to the substrate tray 201 based on the position of the substrate P detected by a position detection sensor (not shown). The substrate P is transported into the main body 100 while placed on the substrate tray 201. As the alignment mechanism 203, for example, the configuration described in Japanese Patent Application No. 2022-058723 can be used, but other configurations may also be used.

The transport mechanism 202 transports the substrate tray 201 holding the positioned substrate P to the main body 100. The transport mechanism 202 also removes the substrate tray 201 arranged inside the main body 100 from the main body 100.

FIG. 4 is a view of the transport mechanism 202 as seen from the +X side. The transport mechanism 202 has a transport arm 202a. The transport arm 202a, for example, grips the substrate tray 201 from both sides in the Y-axis direction. In this state, the transport mechanism 202 moves along the X-axis direction by a moving mechanism (not shown). In this way, the substrate tray 201 is transported by the transport mechanism 202.

A conductive part 202b is attached to the transport arm 202a, and the conductive part 202b is grounded via wiring. As shown in FIG. 4, when the transport arm 202a is gripping the substrate tray 201, the conductive part 202b comes into contact with the base member 201a of the substrate tray 201. This electrically connects the conductive part 202b and the substrate tray 201, and the static electricity conducted to the base member 201a is removed. This prevents the substrate P from being charged with static electricity while being transported by the transport mechanism 202, and prevents devices such as TFTs formed on the substrate P from being destroyed by the static electricity discharge phenomenon.

<Main body 100>
Next, a description will be given of the configuration of the main body 100. As shown in Fig. 2B, the main body 100 includes an illumination system 112, a mask stage 114 that holds a mask M on which a circuit pattern or the like is formed, a projection optical system 116, an optical base 118, and a substrate stage device 120 that holds a substrate P.

The illumination system 112 is configured in the same manner as the illumination system disclosed in, for example, U.S. Patent No. 5,729,331. The illumination system 112 irradiates the mask M with light emitted from a light source (e.g., a mercury lamp) (not shown) via a reflector, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, etc. (not shown), as exposure illumination light (illumination light) IL.

The mask stage 114 holds a light-transmitting mask M. The mask stage 114 drives the mask M in the X-axis direction (scanning direction) relative to the illumination system 112 (illumination light IL) at a predetermined stroke via a drive system (not shown) including, for example, a linear motor, and also drives it slightly in the Y-axis direction and the θz direction. Position information of the mask M in the horizontal plane is obtained by a mask stage position measurement system (not shown) including, for example, a laser interferometer or an encoder.

The projection optical system 116 is disposed below the mask stage 114. The projection optical system 116 is a so-called multi-lens projection optical system with a configuration similar to that of the projection optical system disclosed in, for example, U.S. Patent No. 6,552,775, and is equipped with multiple optical systems that form an erect image, for example, in a double-telecentric, life-size system.

In the main body 100, when an illumination area on the mask M is illuminated by illumination light IL from the illumination system 112, the illumination light that passes through the mask M forms a projected image (partial upright image) of the circuit pattern of the mask M in that illumination area via the projection optical system 116 in an illumination light irradiation area (exposure area) conjugate to the illumination area on the substrate P. Then, as the mask M moves relative to the illumination area (illumination light IL) in the scanning direction and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction, scanning exposure of one shot area on the substrate P is performed and the pattern formed on the mask M is transferred to that shot area.

The optical base 118 supports the mask stage 114 and the projection optical system 116.

The substrate stage device 120 is used to position the substrate P with high precision relative to the projection optical system 116 (illumination light IL), and includes a substrate holder 121 that holds the substrate P, and a substrate stage 122.

As shown in FIG. 2(A), the substrate holder 121 has an accommodation portion 121a. The accommodation portion 121a is a groove provided in the substrate holder 121, and accommodates the substrate tray 201. As a result, when the substrate tray 201 holding the substrate P is accommodated in the accommodation portion 121a, the substrate P is positioned on the upper surface of the substrate holder 121.

The substrate stage 122 is driven by a drive device (not shown) at a predetermined stroke along the horizontal plane (X-axis direction and Y-axis direction) and is also finely driven in six degrees of freedom. The configuration of the substrate stage device 120 is not particularly limited, but it is preferable to use a stage device with a so-called coarse and fine movement configuration that includes a gantry-type two-dimensional coarse movement stage and a fine movement stage that is finely driven relative to the two-dimensional coarse movement stage, as disclosed in, for example, JP 2004-14915 A or US Patent Application Publication No. 2012/0057140 A.

As shown in FIG. 2(A), an X-moving mirror (bar mirror) 124X with a reflective surface perpendicular to the X-axis is fixed to the -X side of the substrate stage 122, and a Y-moving mirror 124Y with a reflective surface perpendicular to the Y-axis is fixed to the +Y side.

First and second laser interferometers (not shown) are attached to the optical table 118 to measure the X-axis and Y-axis positions, respectively, of the substrate holder 121 that holds the substrate P.

The first laser interferometer irradiates a measurement beam onto the X movable mirror 124X and an X fixed mirror (not shown) fixed near the projection optical system 116. The first laser interferometer measures the position information of the substrate holder 121 in the X axis direction based on the position of the X fixed mirror.

The second laser interferometer also irradiates a measurement beam onto the Y movable mirror 124Y and a Y fixed mirror (not shown) fixed near the projection optical system 116. The second laser interferometer measures the position information of the substrate holder 121 in the Y axis direction based on the position of the Y fixed mirror.

A control device (not shown) drives the substrate stage 122 based on the position information (including rotation information (yawing amount (amount of rotation in the θz direction θz), pitching amount (amount of rotation in the θy direction θy), and rolling amount (amount of rotation in the θx direction θx))) of the substrate stage 122 in the XY plane measured by the first laser interferometer and the second laser interferometer.

In the main body 100, alignment measurement (e.g., EGA, etc.) is performed prior to exposure, and the results are used to expose the substrate P in the following procedure. First, the mask stage 114 and the substrate stage 122 are synchronously driven in the X-axis direction according to instructions from a control device (not shown). This performs scanning exposure on the first shot area on the substrate P. When scanning exposure on the first shot area is completed, the control device (not shown) moves (steps) the substrate stage 122 to a position corresponding to the second shot area. Then, scanning exposure is performed on the second shot area. The control device (not shown) similarly repeats stepping between shot areas of the substrate P and scanning exposure on the shot areas to transfer the pattern of the mask M to all shot areas on the substrate P.

In the exposure apparatus EX according to this embodiment, an X-ray ionizer is provided in the main body 100 to remove static electricity that has built up on the substrate P placed on the substrate holder 121. Also, an X-ray ionizer is provided in the substrate transport device 200 to remove static electricity that has built up on the substrate P placed on the substrate tray 201 held on the stand 204. Note that an X-ray ionizer may be provided in either the main body 100 or the substrate transport device 200.

However, if static electricity builds up on the substrate P while the transport mechanism 202 is transporting the substrate P between the stand 204 and the substrate holder 121, and the static electricity is then discharged, there is a risk that devices such as TFTs formed on the substrate P may be destroyed by the discharge phenomenon. Therefore, in this embodiment, as shown in FIG. 2(B), a static elimination brush 500 is provided so that the static electricity built up on the substrate P can be removed even while the substrate P is moving between the substrate holder 121 (first region) and the stand 204 (second region), more specifically, so that the static electricity led from the substrate P to the substrate tray 201 can be removed.

FIG. 5(A) is a diagram for explaining the relationship between the substrate holder 121, the transport mechanism 202, and the static electricity removal brush 500, and FIG. 5(B) is a diagram for explaining the relationship between the static electricity removal brush 500 and the substrate tray 201.

As shown in FIG. 5(A), the static electricity removal brush 500 is provided in the region between the main body 100 and the stand 204 in the X-axis direction. As shown in FIG. 5(B), the static electricity removal brush 500 extends in a direction (Y-axis direction) perpendicular to the movement direction (X-axis direction) of the substrate tray 201. The static electricity removal brush 500 is also provided so as to face the surface of the substrate tray 201 opposite the surface holding the substrate P while the substrate tray 201 is moving between the stand 204 and the substrate holder 121. The static electricity removal brush 500 is also grounded.

The static electricity removal brush 500 has conductive bristles 502 that extend (extend in the +Z direction) toward the substrate tray 201 when the substrate tray 201 is above the static electricity removal brush 500, and removes static electricity conducted from the substrate P to the base member 201a of the substrate tray 201. This makes it possible to prevent devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P while the transport mechanism 202 is transporting the substrate P between the stand 204 and the substrate holder 121.

As shown in FIG. 5B, the antistatic brush 500 is arranged so that the conductive bristle bundle 502 does not come into contact with the lower surface of the base member 201a of the substrate tray 201 (the surface opposite to the surface of the substrate tray 201 that supports the substrate P). The substrate tray 201 and the substrate P transported by the transport mechanism 202 bend under their own weight. Therefore, the center portions of the substrate tray 201 and the substrate P in the Y-axis direction are located lower than both ends. Therefore, the conductive bristle bundle 502 of the antistatic brush 500 is short in the center portion in the Y-axis direction and becomes longer as it approaches both ends. This prevents the conductive bristle bundle 502 of the antistatic brush 500 from coming into contact with the substrate tray 201. If the bristle bundle 502 comes into contact with the substrate tray 201 and wears, dust may be generated in the exposure apparatus EX due to the wear, and the dust may cause poor exposure. By configuring the length of the conductive bristle bundles 502 of the static electricity removal brush 500 as described above, the occurrence of poor exposure can be suppressed.

In addition to the static electricity removal brush 500, or instead of the static electricity removal brush 500, a grounded static electricity removal brush 500A may be provided on the substrate stage 122 as shown in FIG. 6. In this case, the static electricity removal brush 500A extends in a direction (Y-axis direction) perpendicular to the moving direction (X-axis direction) of the substrate tray 201, and is provided so as to face the surface of the substrate tray 201 opposite the surface that holds the substrate P while the substrate tray 201 is moving between the stand 204 and the substrate holder 121. In order to avoid contact with the substrate tray 201, the conductive bristles of the static electricity removal brush 500A may be short in the center in the Y-axis direction and become longer as they approach both ends.

In addition, instead of the substrate tray 201, the substrate P may be transported to the substrate holder 121 by, for example, a fork-type robot hand RH as shown in FIG. 2(A). When the substrate P is transported to the substrate holder 121 by the robot hand RH, the substrate transport device 200 is omitted.

FIGS. 7(A) to 7(C) are diagrams for explaining a robot hand RH-A according to a modified example of this embodiment. FIG. 7(A) is a diagram of the robot hand RH-A viewed from the +Z direction, FIG. 7(B) is a diagram of the robot hand RH-A with substrate P placed thereon viewed from the +Z direction, and FIG. 7(C) is a diagram of the robot hand RH-A with substrate P placed thereon viewed from the +Z direction.

As shown in Figures 7(A) and 7(C), the robot hand RH-A comprises a conductive base member 801, a conductive support member 802 provided on the base member 801, and a static electricity removal brush 803. The support member 802 is electrically connected to the base member 801. The static electricity removal brush 803 has a conductive tuft of bristles that is electrically connected to the base member 801. As a result, the static electricity charged to the substrate P is conducted to the base member 801 via the support member 802 and the static electricity removal brush 803.

The static electricity removal brush 500 is placed on the path that the robot hand RH-A takes to transport the substrate P to the main body 100, and on the path that the robot hand RH-A takes to transport the substrate P from the main body 100 to a predetermined position. This allows static electricity guided to the base member 801 to be released to the ground via the static electricity removal brush 500. This makes it possible to prevent devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P.

The support member 802 may be non-conductive. A discharge cable may also be provided that electrically connects to the base member 801 of the robot hand RH-A.

<Mask Loader 300>
8 and 9 are diagrams for explaining the configuration of the mask loader 300. Note that Fig. 8 shows a cross-sectional view of part of the configuration.

As shown in Figures 8 and 9, the mask loader 300 includes a mask buffer 310, a pellicle foreign substance inspection unit (hereinafter referred to as PPD) 390, a buffer arm 330, a relay table 350, and a mask transport mechanism 370.

The mask buffer 310 temporarily stores the mask case 600 in which the mask M is stored. The mask buffer 310 has multiple slots SLT for storing the mask case 600.

PPD390 is disposed above mask buffer 310. PPD390 inspects whether there is any foreign matter adhering to the pellicle PLCL (see FIG. 12) of mask M, and whether there is any foreign matter adhering to the surface of mask M opposite to the surface on which the pellicle PLCL is provided. PPD390 has a PPD arm 391.

The relay table 350 temporarily holds the mask M being transported when the mask M is replaced. The relay table 350 has a table (not shown) for placing the mask M to be loaded onto the mask stage 114 of the main body 100, and a table (not shown) for placing the mask M unloaded from the mask stage 114 of the main body 100.

The buffer arm 330 loads and unloads and transports the mask case 600 from the mask buffer 310. The mask transport mechanism 370 transports the mask M from the relay table 350 to the main body 100, and vice versa. The mask transport mechanism 370 also transports the mask M to the PPD arm 391 and receives the mask M from the PPD arm 391. The mask transport mechanism 370 also hands over the mask M to the buffer arm 330.

The processing executed by the mask loader 300 will be described with reference to Figures 10 and 11. Figure 10 is a flowchart showing a series of processing steps up to mounting the mask M on the mask stage 114, and Figure 11 is a flowchart showing a series of processing steps after removing the mask M from the mask stage 114.

In the process shown in FIG. 10, first, the mask M on which the pattern is formed is stored in the mask case 600 described below (step S11). Next, the mask case 600 storing the mask M is loaded onto the transport cart 700 described below (step S13). The transport cart 700 on which the mask case 600 is placed is inserted into the mask buffer 310 (step S15). This causes the mask case 600 to be inserted into the mask buffer 310.

The mask case 600 inserted into the mask buffer 310 is stored in each slot SLT of the mask buffer 310 (step S17).

When using the mask M housed in the mask case 600 stored in the mask buffer 310, the mask M is transported together with the mask case 600 by the buffer arm 330 (step S19).

The mask transport mechanism 370 removes and transports the mask M from the mask case 600 transported by the buffer arm 330 (step S20). The mask M is handed over to the PPD arm 391 of the PPD 390, where the presence or absence of foreign matter adhering to the pellicle PLCL of the mask M and the presence or absence of foreign matter adhering to the surface of the mask M opposite the surface on which the pellicle PLCL is provided are inspected (step S21).

When the inspection by the PPD 390 is completed, the mask M is transported by the mask transport mechanism 370 via the relay table 350 to the mask stage 114 (step S23). After that, the mask M is mounted on the mask stage 114 (step S25), and the process of FIG. 10 is completed.

On the other hand, the process in FIG. 11 begins when exposure of the substrate P is completed. First, the mask M is removed from the mask stage 114 (step S31).

Then, the removed mask M is transported by the mask transport mechanism 370 (step S33). The mask M transported by the mask transport mechanism 370 is stored in the mask case 600 (step S35).

The mask case 600 is transported by the buffer arm 330 and stored in the mask buffer 310 (step S37).

The mask case 600 stored in the mask buffer 310 is removed from the mask buffer 310 and loaded onto the transport cart 700 (step S39). The mask case 600 is transported to a predetermined location by the transport cart 700 and removed from the transport cart 700 (step S41). The mask M is removed from the mask case 600 removed from the transport cart 700 (step S43), and the process of FIG. 11 is completed.

In the series of processes related to the mask M shown in Figures 10 and 11, when the mask M is carried into the PPD 390 (Figure 10: step S21), when the mask M is mounted on the mask stage 114 (Figure 10: step S25), when the mask M is removed from the mask stage 114 (Figure 11: step S31), and when the mask M is taken out of the mask case 600 (Figure 11: step S43), static electricity charged to the mask M is conventionally removed using an X-ray ionizer or the like. In this embodiment, static electricity charged to the mask M is also removed in other steps, thereby further preventing the pattern formed on the mask M from being destroyed by the static electricity discharge phenomenon.

<Mask case 600>
Next, a description will be given of the mask case 600 according to this embodiment. Fig. 12 is a cross-sectional view for explaining the structure of the mask case 600. Note that in Fig. 12, hatching of some elements is omitted.

As shown in FIG. 12, the mask case 600 includes a case body 601 that houses the mask and a discharge cord 602.

The case body 601 includes a first case part 601a having a bottom surface BS, and a second case part 601b that is detachably provided to the first case part 601a and has a ceiling surface CS that is disposed opposite the bottom surface BS. The first case part 601a and the second case part 601b are conductive.

The first case part 601a has legs 610, and a mask case support part 611 is attached to the legs 610. The mask case support part 611 is conductive and is electrically connected to the first case part 601a (legs 610).

A mask support member 603 that supports the mask M is provided on the bottom surface BS of the first case part 601a. The mask support member 603 supports the mask M so that the pellicle PLCL that protects the area where a pattern is formed on the mask M does not come into contact with the bottom surface BS. The mask support member 603 is conductive and is electrically connected to the first case part 601a. Therefore, the mask support member 603 and the mask case support part 611 are electrically connected.

The discharge cord 602 is electrically connected to the first case portion 601a. Therefore, the mask support member 603 and the discharge cord 602 are electrically connected. As a result, the static electricity charged on the mask M is guided by the mask support member 603 to the conductive first case portion 601a, and the static electricity charged on the first case portion 601a is discharged by the discharge cord 602. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of the static electricity charged on the mask M.

A static elimination brush 604 having conductive bristles is provided on the ceiling surface CS of the second case part 601b. The static elimination brush 604 is electrically connected to the second case part 601b. The static elimination brush 604 faces the mask M supported by the mask support member 603, and guides the static electricity charged on the mask M to the second case part 601b.

When the second case part 601b is attached to the first case part 601a, the first case part 601a and the second case part 601b are electrically connected. As a result, static electricity conducted from the mask M to the second case part 601b is conducted by the first case part 601a to the discharge cord 602 and discharged from the discharge cord 602. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of the static electricity charged on the mask M.

The first case part 601a and the second case part 601b are made of aluminum, for example, and have a non-conductive coating (such as an anti-rust coating) formed on their surfaces. Therefore, in this embodiment, when the second case part 601b is attached to the first case part 601a, the coating is removed from the portion where the first case part 601a and the second case part 601b come into contact. Also, the coating is removed from the portion of the first case part 601a where the mask support member 603 is attached. Also, the coating is removed from the portion of the first case part 601a where the mask case support part 611 is attached. Also, the coating is removed from the portion of the second case part 601b where the anti-static brush 604 is positioned. This ensures electrical connection. In FIG. 12, the portion of the first case part 601a where the coating has been removed is shown as coating removal area 615a, and the portion of the second case part 601b where the coating has been removed is shown as coating removal area 615b.

In addition, instead of removing the coating, a conductive electrode member such as a bus bar may be provided. Figure 13 is a cross-sectional view showing another example of the configuration of the mask case 600.

In the mask case 600 shown in FIG. 13, an electrode member 605a such as a bus bar is provided on a part of the bottom surface BS of the first case part 601a, and the mask support member 603 is electrically connected to the electrode member 605a. In addition, an electrode member 605b such as a bus bar is provided to electrically connect the electrode member 605a provided on the first case part 601a and the discharge cord 602.

In addition, an electrode member 605c such as a bus bar is provided on the ceiling surface CS of the second case part 601b, and the static electricity removal brush 604 is electrically connected to the electrode member 605c. An electrode member 605d such as a bus bar is provided to electrically connect the electrode member 605c and the electrode member 605a when the second case part 601b is attached to the first case part 601a. The electrode member 605d has elasticity, which ensures a reliable electrical connection between the electrode member 605c and the electrode member 605a.

Furthermore, an electrode member 605e such as a bus bar is provided on the leg portion 610 of the first case portion 601a, and the mask case support portion 611 is electrically connected to the electrode member 605e. In this way, the electrode member can be used to realize electrical connection between the various components, and static electricity charged to the mask M can be discharged from the discharge cord 602.

The mask case 600 containing the mask M is transported by the transport cart 700 to the mask buffer 310 and stored in the mask buffer 310.

<Transport Cart 700>
Fig. 14(A) is a diagram showing an overview of the transport cart 700. As shown in Fig. 14(A), the transport cart 700 includes a mounting section 701 on which the mask case 600 is mounted, wheels 702 attached to the mounting section 701, a handle section 703 that an operator grips when moving the transport cart 700, and a mechanical stopper 704 disposed on the front side of the mounting section 701. The transport cart 700 further includes a static elimination mechanism 710 that eliminates static electricity charged on the mask case 600 mounted on the mounting section 701.

The static elimination mechanism 710 includes a first electrode part 711, a discharge cable 712, and an electrode member 713.

FIGS. 15(A) and 15(B) are diagrams for explaining the structure of the static electricity removal mechanism 710.

The first electrode part 711 is, for example, a contact probe, and as shown in FIG. 15(A), is biased upward by a biasing member 715 such as a compression spring. As a result, the tip of the first electrode part 711 protrudes beyond the contact surface 701a of the mounting part 701 that contacts the mask case support part 611 of the mask case 600.

As shown in FIG. 15(B), when the mask case 600 is placed on the placement portion 701, the first electrode part 711 and the mask case support portion 611 come into contact with each other and are electrically connected.

The first electrode part 711 is electrically connected to the discharge cord 712. This allows the static electricity charged on the mask case 600 to be guided to the discharge cord 712 by the first electrode part 711 and discharged from the discharge cord 712. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of the static electricity charged on the mask M while the mask case 600 containing the mask M is being transported on the transport cart 700.

The first electrode part 711 is also electrically connected to an electrode member 713 provided on the front side of the mechanical stopper 704. The electrode member 713 is a conductive member, for example, a bus bar.

As shown in FIG. 9, when storing the mask case 600 in the mask buffer 310, the transport cart 700 is positioned by riding on the positioning frame 311 provided on the mask buffer 310. The positioning frame 311 is provided with a mechanical stopper 315 as shown in FIG. 14(A). The transport cart 700 is positioned on the positioning frame 311 by the mechanical stopper 704 of the transport cart 700 coming into contact with the mechanical stopper 315 of the positioning frame 311.

FIG. 14(B) is an enlarged view of the mechanical stopper 315. The mechanical stopper 315 is provided with a second electrode part 312 and a shock absorbing part 313 such as a shock absorber.

The shock absorbing part 313 absorbs the shock when the mechanical stopper 704 of the transport cart 700 comes into contact with the mechanical stopper 315.

The second electrode part 312 is, for example, a contact probe, and is electrically connected to the electrode member 713 of the transport cart 700 when the transport cart 700 is positioned on the positioning frame 311. In this embodiment, the second electrode part 312 is biased by a biasing member 316 such as a compression spring so that the tip of the second electrode part 312 protrudes beyond the mechanical stopper surface 315a. As a result, when the mechanical stopper 315 and the mechanical stopper 704 come into contact with each other and the transport cart 700 stops, even if the transport cart 700 is pushed back by the reaction force of the shock absorbing part 313, the contact (electrical connection) between the second electrode part 312 and the electrode member 713 can be maintained.

The second electrode part 312 is grounded. Therefore, when the transport cart 700 is positioned on the positioning frame 311, the static electricity charged in the mask case 600 can be released to the ground via the first electrode part 711, the electrode member 713, and the second electrode part 312. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the static electricity discharge phenomenon.

When the transport cart 700 is positioned on the positioning frame 311, the mask case 600 placed on the placement section 701 is transported into the mask buffer 310.

<Mask Buffer 310>
As shown in FIG. 8, the mask buffer 310 includes a plurality of slots SLT in which the mask cases 600 are stored, and each slot SLT is provided with a shelf portion 320 on which the mask case 600 is placed.

FIGS. 16(A) and 16(B) are diagrams for explaining the configuration of each shelf portion 320, with FIG. 16(A) being a schematic diagram of the shelf portion 320 of the mask buffer 310 as viewed from the +Z direction, and FIG. 16(B) being a cross-sectional view along line A-A in FIG. 16(A).

As shown in Figures 16(A) and 16(B), the shelf portion 320 has a pair of support portions 320a that support the mask case 600, and a frame portion 320b to which the support portions 320a are fixed.

The pair of support parts 320a are spaced apart in the Y-axis direction, and each support part 320a extends in the X-axis direction. Each support part 320a is provided with a plurality of case support members 320c that contact the mask case support part 611 of the first case part 601a of the mask case 600 and support the mask case 600 from below.

The support portion 320a, the frame portion 320b, and the case support member 320c are conductive. The support portion 320a and the frame portion 320b are electrically connected, and the case support member 320c and the support portion 320a are electrically connected. This electrically connects the case support member 320c and the frame portion 320b. In this embodiment, a non-conductive coating (e.g., a rust-prevention coating, etc.) is formed on the surface of the support portion 320a and the surface of the frame portion 320b. Therefore, the coating is removed from the electrically connected portions of the support portion 320a and the frame portion 320b. In FIG. 16B, the portion of the support portion 320a where the coating is removed is shown as the coating removal area 321a, and the portion of the frame portion 320b where the coating is removed is shown as the coating removal area 321b.

The frame portion 320b is grounded. As a result, when the mask case 600 is placed on the shelf portion 320, the static electricity charged on the mask case 600 is guided to the frame portion 320b via the case support member 320c and the support portion 320a and is released to the ground. This makes it possible to prevent the mask M contained in the mask case 600 and the pattern formed on the mask M from being destroyed by the discharge phenomenon of the static electricity charged on the mask case 600. That is, in the mask buffer 310, the case support member 320c that contacts the mask case 600, the support portion 320a that is electrically connected to the case support member 320c, and the frame portion 320b that is electrically connected to the support portion 320a and is grounded function as a static elimination mechanism that eliminates the static electricity charged on the mask case 600.

For example, a static elimination brush having conductive bristles extending towards the mask case 600 may be provided on the surface of the support part 320a facing the mask case 600 (the surface on the +Z side). In this case, the conductive bristles are electrically connected to the support part 320a. This allows the static elimination brush to guide the static electricity charged on the mask case 600 to the frame part 320b. When a static elimination brush is provided, the case support member 320c may be non-conductive.

<Buffer arm 330>
The mask cases 600 stored in the mask buffer 310 are carried in and out by the buffer arm 330. Fig. 17 is a schematic diagram showing the configuration of the buffer arm 330. The buffer arm 330 includes an arm portion 331 that is driven in the X-axis direction to remove the mask case 600 from the mask buffer 310 (more specifically, the shelf portion 320) and to insert the mask case 600 into the mask buffer 310, and a static elimination mechanism 340 that eliminates static electricity charged to the arm portion 331.

The arm portion 331 includes a conductive main body portion 331a, a positioning mechanism 331b, and a base portion 331c. The base portion 331c supports the mask case support portion 611 of the mask case 600. The positioning mechanism 331b engages with a recess 612a provided in a positioning portion 612 of the mask case 600, and determines the position of the mask case 600 relative to the buffer arm 330 so that the mask case support portion 611 is supported by the base portion 331c. The positioning portion 612 is conductive and electrically connected to the first case portion 601a of the mask case 600.

The arm portion 331 is driven in the X-axis direction as shown by the arrow AR31 by a first drive mechanism 333 such as a linear guide held by a conductive first frame 332. This allows the arm portion 331 to enter the slot SLT. The first frame 332 is driven in the Z-axis direction as shown by the arrow AR32 by a second drive mechanism 335 such as a linear guide held by a conductive second frame 334. This allows the mask case 600 to be removed from each slot SLT located at a different position in the Z-axis direction. When removing the mask M from the slot SLT, the second case portion 601b remains in the slot SLT, and only the first case portion 601a containing the mask M is removed by the arm portion 331.

The static elimination mechanism 340 includes a third electrode part 341, a first static elimination brush 342, and a second static elimination brush 343.

The third electrode part 341 is, for example, a contact probe, and contacts the mask case 600 (positioning part 612) when the mask case 600 is placed on the arm part 331. This electrically connects the mask case 600 and the third electrode part 341. The third electrode part 341 is biased by a biasing member 345 such as a compression spring so that the tip of the third electrode part 341 is located above the position where the positioning part 612 of the mask case 600 is located when the mask case 600 is placed on the arm part 331. This makes it possible to more reliably ensure electrical continuity between the mask case 600 and the third electrode part 341. The third electrode part 341 is electrically connected to the main body part 331a. This makes it possible to guide the static electricity charged in the mask case 600 to the main body part 331a.

The first static electricity removal brush 342 has conductive bristles extending toward the main body 331a. The first static electricity removal brush 342 is electrically connected to the first frame 332. In this embodiment, a non-conductive coating is formed on the surface of the main body 331a of the arm portion 331, but the coating is removed in the portion shown by dotted hatching in FIG. 17. Specifically, the coating is removed from the underside of the end on the -X side and the underside near the center of the main body 331a, exposing the material of the main body 331a. If the area where the coating is removed on the underside of the end on the -X side is called the coating removal area 336a and the area where the coating is removed on the underside near the center is called the coating removal area 336b, the first static electricity removal brush 342 can guide the static electricity charged on the main body 331a to the first frame 332 when facing the coating removal area 336a and the coating removal area 336b. In other words, the first charge removal brush 342 guides the static electricity charged on the main body 331a (arm portion 331) to the first frame 332 when the arm portion 331 is positioned closest to the mask buffer 310 in the X-axis direction and when it is positioned closest to the second frame 334 in the X-axis direction.

The second static electricity removal brush 343 has conductive bristles extending toward the first frame 332. The second static electricity removal brush 343 is electrically connected to the second frame 334. In this embodiment, a non-conductive coating is formed on the surface of the first frame 332, but the coating has been removed from the area indicated by dotted hatching in FIG. 17. Specifically, the coating has been removed from the end of the first frame 332 on the -Z side, exposing the material of the first frame 332. If the area of the first frame 332 from which the coating has been removed is referred to as the coating removal area 332a, then the second static electricity removal brush 343, when facing the coating removal area 332a, can guide the static electricity charged on the first frame 332 to the second frame 334. Although FIG. 17 illustrates one second static elimination brush 343, in this embodiment, the second static elimination brush 343 is provided in at least two locations so as to face the coating removal area 332a of the first frame 332 when the first frame 332 is at its highest position and its lowest position in the Z-axis direction.

The second static electricity removal brush 343 may be provided to face the coating removal area 332a of the first frame 332 at least one of the times when the first frame 332 is at the highest position or the lowest position in the Z-axis direction. The second static electricity removal brush 343 may also be provided at multiple locations spaced apart in the Z-axis direction to correspond to the stopping positions of the arm portion 331 in the Z-axis direction (positions corresponding to each slot SLT).

The second frame 334 is grounded. This allows static electricity charged on the mask case 600 to escape to the ground via the third electrode part 341, the main body 331a, the first charge-removing brush 342, the first frame 332, the second charge-removing brush 343, and the second frame 334. As described above, the first charge-removing brush 342 guides the static electricity charged on the main body 331a (arm 331) to the first frame 332 when the arm 331 is positioned closest to the mask buffer 310 in the X-axis direction and when the arm 331 is positioned closest to the second frame 334 in the X-axis direction. Therefore, when the mask case 600 is removed from the shelf 320 and when the mask case 600 is returned to the shelf 320, the static electricity charged on the mask case 600 can be removed.

The mask M housed in the first case part 601a, which has been transported by the buffer arm 330 to a predetermined position in the Z-axis direction, is taken out of the mask case 600 (first case part 601a) by the mask transport mechanism 370. The PPD arm 391 moves to below the mask transport mechanism 370, and the mask M is transferred from the mask transport mechanism 370 to the PPD arm 391. The PPD arm 391 carrying the mask M moves into the PPD 390. In the PPD 390, the presence or absence of foreign matter adhering to the pellicle PLCL of the mask M and the presence or absence of foreign matter adhering to the surface of the mask M opposite the surface on which the pellicle PLCL is provided are inspected. After the foreign matter inspection is completed, the PPD arm 391 carrying the mask M moves below the mask transport mechanism 370, and the mask M is transferred from the PPD arm 391 to the mask transport mechanism 370.

The mask transport mechanism 370 holding the mask M moves the mask M to the mask stage 114 of the main body 100.

<Mask transport mechanism 370>
Fig. 18(A) is a diagram showing the appearance of a mask transport mechanism 370 according to this embodiment, and Fig. 18(B) is a schematic diagram showing the configuration of the mask transport mechanism 370. As shown in Fig. 18(A) and Fig. 18(B), the mask transport mechanism 370 includes a pair of holders 371 that hold a mask M, and a static electricity removal mechanism 380 that removes static electricity charged to the holders 371. Note that Fig. 18(B) illustrates one of the pair of holders 371.

The holding portion 371 includes a conductive support portion 371a that contacts and supports the mask M, and an arm portion 371b to which the support portion 371a is connected and which can be driven in the Y-axis direction. A portion of the arm portion 371b is housed within the housing 372. The arm portion 371b is driven in the Y-axis direction by an actuator 373, such as a guided cylinder. The actuator 373 is also housed within the housing 372.

The support portion 371a and the arm portion 371b are conductive. The static electricity removal mechanism 380 includes a connection portion 381 that electrically connects the support portion 371a and the arm portion 371b and guides the static electricity charged on the support portion 371a to the arm portion 371b, and a static electricity removal brush 382 that guides the static electricity charged on the arm portion 371b to the housing 372.

In this embodiment, the support portion 371a is rotatable around the axis 371c, as indicated by the arrow AR41. Therefore, the connection portion 381 has elasticity to ensure electrical connection between the support portion 371a and the arm portion 371b. For example, a metal leaf spring can be used as the connection portion 381. The arm portion 371b has a conductive material with a non-conductive coating formed on its surface, but the coating is removed from the portion 371e to which the connection portion 381 is connected. This allows the connection portion 381 to conduct static electricity charged on the support portion 371a to the arm portion 371b.

Also, for example, the coating of the arm portion 371b is removed from the portion 371f that faces the discharging brush 382 when the support portion 371a is holding the mask M. This allows the static electricity charged on the arm portion 371b to be conducted to the housing 372 when the support portion 371a is holding the mask M.

The housing 372 is conductive and grounded. Therefore, while the mask transport mechanism 370 is transporting the mask M, the static electricity charged to the mask M can be guided to the housing 372 via the support portion 371a, the arm portion 371b, and the static electricity removal brush 382, and then released from the housing 372 to the ground. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge of the static electricity charged to the mask M. Note that when the arm portion 371b is made up of multiple components, the coating is removed at the connection portions of the multiple components to achieve electrical connection.

As described above in detail, according to this embodiment, the exposure apparatus EX is equipped with a discharging brush 500 that dissipates static electricity charged on the substrate tray 201 while the substrate tray 201 supporting the substrate P is moving. The substrate tray 201 has a conductive base member 201a, a discharging brush 210a that faces the substrate P supported by the substrate tray 201 and guides the static electricity charged on the substrate P to the base member 201a, and a conductive support member 201b, and the discharging brush 500 dissipates the static electricity guided to the base member 201a. This makes it possible to prevent devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of the static electricity charged on the substrate P while the substrate P is being transported using the substrate tray 201.

In addition, in this embodiment, the static electricity removal brush 500 is provided in an area located between the main body 100, which removes static electricity from the substrate P, and the stand 204, and removes static electricity from the substrate tray 201 while the substrate tray 201 moves through this area. In this embodiment, the substrate P placed on the substrate holder 121 is removed by an X-ray ionizer provided in the main body 100, but if the static electricity removal brush 500 is not provided, there is no means for dissipating the static electricity (static electricity charged to the substrate tray 201) charged to the substrate P while the substrate P is being transported between the main body 100 and the stand 204, and there is a risk that devices such as TFTs formed on the substrate P will be destroyed by the discharge phenomenon of the static electricity charged to the substrate P. By providing the static electricity removal brush 500 in the area between the main body 100 and the stand 204, it is possible to remove static electricity conducted from the substrate P to the substrate tray 201 while the substrate P is being transported between the main body 100 and the stand 204, thereby preventing devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P.

In addition, in this embodiment, the discharging brush 500 is provided to face the surface of the substrate tray 201 opposite the surface that holds the substrate P. Because the surface of the substrate tray 201 that holds the substrate P is covered by the substrate P, even if the discharging brush 500 is provided to face the surface that holds the substrate P, there is a risk that the static electricity charged to the substrate tray 201 may not be sufficiently removed. By providing the discharging brush 500 to face the surface of the substrate tray 201 opposite the surface that holds the substrate P, the static electricity charged to the substrate tray 201 can be more reliably removed compared to the case where the discharging brush 500 is provided to face the surface that holds the substrate P.

In addition, in this embodiment, the static electricity removal brush 500 does not come into contact with the substrate tray 201. If the static electricity removal brush 500 comes into contact with the substrate tray 201 and wears down, dust may be generated inside the exposure apparatus EX due to wear, and this dust may cause exposure defects. Because the static electricity removal brush 500 does not come into contact with the substrate tray 201, dust may be generated inside the exposure apparatus EX due to wear, and this dust may cause exposure defects.

The static electricity removal brush 500 also extends in a direction (Y-axis direction) that intersects with the direction of movement of the substrate tray 201 (X-axis direction). This makes it possible to reduce the area that the static electricity removal brush 500 occupies in the X-axis direction, so that static electricity charged on the substrate tray 201 can be removed without increasing the size of the exposure apparatus EX.

In addition, in this embodiment, the substrate tray 201 is provided with a discharge cord 210b electrically connected to the base member 201a. This allows the discharge cord 210b to discharge the static electricity charged on the substrate tray 201 into the air even at times when the static electricity charged on the substrate tray 201 cannot be removed by the static electricity removal brush 500.

Furthermore, according to this embodiment, the substrate tray 201 supports the substrate P to be moved, and includes a conductive base member 201a, a discharging brush 210a that faces the substrate P and directs static electricity charged on the substrate P to the base member 201a, and a discharge cord 210b electrically connected to the base member 201a. As a result, while the substrate P is supported by the substrate tray 201, the static electricity charged on the substrate P can be directed to the base member 201a by the discharging brush 210a and discharged by the discharge cord 210b, so that devices such as TFTs formed on the substrate P can be prevented from being destroyed by the discharge phenomenon of the static electricity charged on the substrate P.

Furthermore, according to this embodiment, the mask case 600 includes a case body 601, at least a portion of which is conductive, for housing the mask M, a mask support member 603 and a discharging brush 604 for directing static electricity charged to the mask M to the conductive portion of the case body 601, and a discharge cord 602 that is electrically connected to the conductive portion and discharges static electricity charged to the conductive portion. As a result, while the mask M is stored in the mask case 600 (step S11 in FIG. 10, step S35 in FIG. 11, step S41 in FIG. 11), the static electricity charged to the mask M can be directed to the case body 601 by the mask support member 603 and the discharging brush 604 and discharged by the discharge cord 602, so that the pattern formed on the mask M can be prevented from being destroyed by the discharge phenomenon of the static electricity charged to the mask M.

In this embodiment, the case body 601 includes a first case part 601a having a bottom surface BS, and a second case part 601b detachably provided to the first case part 601a and having a ceiling surface CS arranged opposite the bottom surface BS. The first case part 601a is conductive, and the mask support member 603 is provided on the bottom surface BS so as to face the mask M, and guides the static electricity charged on the mask M to the first case part 601a. The discharge cord 602 is provided on the outside of the first case part 601a, and removes (discharges) the static electricity charged on the first case part 601a. As a result, while the mask M is stored in the mask case 600, the static electricity charged on the mask M can be guided to the first case part 601a by the mask support member 603 and discharged by the discharge cord 602, so that the pattern formed on the mask M can be prevented from being destroyed by the discharge phenomenon of the static electricity charged on the mask M.

In addition, in this embodiment, the second case part 601b is conductive, and the discharge brush 604 is provided on the ceiling surface CS of the second case part 601b, faces the mask M, and guides the static electricity charged on the mask M to the second case part 601b. The first case part 601a and the second case part 601b are electrically connected when the second case part 601b is attached to the first case part 601a. This allows the static electricity charged on the mask M to be guided to the second case part 601b by the discharge brush 604, and discharged from the discharge cord 602 via the second case part 601b and the first case part 601a.

Furthermore, in this embodiment, the transport cart 700 that transports the mask case 600 includes a mounting section 701 on which the mask case 600 is placed, and a static electricity removal mechanism 710 that removes static electricity from the mask case 600 placed on the mounting section 701. As a result, while the mask case 600 is being transported (step S13 in FIG. 10, step S39 in FIG. 11), the static electricity that has been charged to the mask case 600 can be removed, thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

In addition, in this embodiment, the static elimination mechanism 710 includes a first electrode part 711 that is electrically connected to a conductive part (mask case support part 611) of the mask case 600, and a discharge cord 712 that is electrically connected to the first electrode part 711 and eliminates static electricity charged to the mask case 600. As a result, the static electricity charged to the mask case 600 can be discharged by the discharge cord 712 while the mask case 600 is being transported.

In addition, in this embodiment, the static elimination mechanism 710 includes an electrode member 713 electrically connected to the first electrode part 711, and when the transport cart 700 is positioned on the positioning frame 311, the electrode member 713 is arranged on the positioning frame 311 and is electrically connected to the grounded second electrode part 312. This allows the static electricity charged on the mask case 600 to be released to the ground when the transport cart 700 is positioned on the positioning frame 311 (step S15 in FIG. 10).

In this embodiment, the mask buffer 310 capable of storing a plurality of mask cases 600 includes a shelf portion 320 on which the mask cases 600 are placed, and a static electricity removal mechanism that removes static electricity from the mask cases 600 placed on the shelf portion 320. Specifically, the shelf portion 320 includes a conductive case support member 320c that contacts a conductive portion (mask case support portion 611) of the mask case 600 and supports the mask case 600 from below, and a conductive frame portion 320b to which the case support member 320c is fixed. The static electricity removal mechanism electrically connects the case support member 320c to the frame portion 320b and grounds the frame portion 320b to remove static electricity from the mask case 600. This allows the static electricity charged on the mask case 600 to be discharged while the mask case 600 is housed in the mask buffer 310 (step S17 in FIG. 10, step S37 in FIG. 11), thereby preventing the pattern formed on the mask M housed in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

In this embodiment, the buffer arm 330, which carries the mask case 600 out of the mask buffer 310 that stores the mask case 600 and carries the mask case 600 into the mask buffer 310, is provided with an arm section 331 that drives in a direction parallel to the surface of the mask M to take out the mask case 600 from the mask buffer 310 and insert the mask case 600 into the mask buffer 310, and a static electricity removal mechanism 340 that removes static electricity from the arm section 331. The arm section 331 is electrically connected to the mask case 600 while holding the mask case 600. This allows the static electricity charged to the mask case 600 to be removed while the mask case 600 is being transported by the buffer arm 330 (step S19 in FIG. 10), so that the pattern formed on the mask M stored in the mask case 600 can be prevented from being destroyed by the static electricity discharge phenomenon.

In addition, in this embodiment, the arm portion 331 includes a conductive main body portion 331a and a base portion 331c that is electrically connected to the main body portion 331a and supports the mask case 600. The static electricity removal mechanism 340 includes a third electrode part 341 that is electrically connected to the main body portion 331a and contacts a conductive portion (positioning portion 612) of the mask case 600 supported by the base portion 331c to guide static electricity charged on the mask case 600 to the main body portion 331a. This allows the static electricity charged on the mask case 600 to be guided to the main body portion 331a while the arm portion 331 supports the mask case 600.

In this embodiment, the buffer arm 330 includes a first frame 332 that holds a first drive mechanism 333 that drives the arm portion 331 in the X-axis direction, and a second frame 334 that holds a second drive mechanism 335 that drives the first frame 332 in the Y-axis direction that is approximately perpendicular to the surface of the mask M. The charge removal mechanism 340 includes a first charge removal brush 342 that faces the arm portion 331 and guides static electricity charged on the arm portion 331 (main body portion 331a) to the first frame 332, and a second charge removal brush 343 that faces the first frame 332 and guides static electricity charged on the first frame 332 to the second frame 334, and the second frame 334 is grounded. This allows static electricity guided from the mask case 600 to the main body portion 331a to be released to the ground via the first charge removal brush 342, the first frame 332, the second charge removal brush 343, and the second frame 334.

In addition, in this embodiment, the first static electricity removal brush 342 guides the static electricity charged on the arm portion 331 to the first frame 332 when the arm portion 331 is positioned closest to the mask buffer 310 in the X-axis direction, and when the arm portion 331 is positioned closest to the second frame 334 in the X-axis direction. This makes it possible to remove the static electricity charged on the mask case 600 when the mask case 600 is removed from the mask buffer 310 and when the mask case 600 is returned to the mask buffer 310.

Furthermore, according to this embodiment, the mask transport mechanism 370 that transports the mask M to the main body 100 includes a holding portion 371 that holds the mask M, and a static electricity removal mechanism 380 that removes static electricity from the holding portion 371. As a result, while the mask M is being transported by the mask transport mechanism 370 (steps S20 and S23 in FIG. 10, step S33 in FIG. 11), the static electricity that has been charged to the mask case 600 can be removed, thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

In the series of processes related to the mask M shown in FIG. 10 and FIG. 11, when the mask M is carried into the PPD 390 (FIG. 10: step S21), when the mask M is mounted on the mask stage 114 (FIG. 10: step S25), when the mask M is removed from the mask stage 114 (FIG. 11: step S31), and when the mask M is taken out of the mask case 600 (FIG. 11: step S43), static electricity charged on the mask M has been conventionally removed using an X-ray ionizer or the like, but no process for removing static electricity charged on the mask M has been performed in other steps. According to this embodiment, measures are taken to remove static electricity charged on the mask M in each step other than step S21 in FIG. 10, step S25 in FIG. 10, step S31 in FIG. 11, and step S43 in FIG. 11, so that the pattern formed on the mask M can be more effectively prevented from being destroyed by the discharge phenomenon of static electricity.

In the above embodiment, an X-ray ionizer may be provided instead of the static electricity removal brush 500. In this case, the X-ray ionizer is provided so that X-rays are irradiated onto the surface of the substrate tray 201 opposite to the surface that holds the substrate P.

In the above embodiment, the first case part 601a is provided with a conductive mask support member 603, and the second case part 601b is provided with a static electricity removal brush 604. However, for example, the static electricity removal brush 604 may be omitted. Alternatively, if the static electricity removal brush 604 is provided, the mask support member 603 may be non-conductive.

In addition, in the above embodiment, the first case portion 601a may be provided with an anti-static brush having conductive bristles that are electrically connected to the first case portion 601a and extend toward the mask M.

In addition, in the buffer arm 330 of the above embodiment, the third electrode part 341 is electrically connected to the positioning portion 612 of the mask case 600, but this is not limited to the above. For example, the third electrode part 341 may be provided on the base portion 331c and electrically connected to the mask case support portion 611 of the mask case 600.

In addition, in the above embodiment, the exposure apparatus EX has been described as an exposure apparatus that uses a mask M, but the mechanism for removing static electricity from the substrate P can also be applied to a so-called maskless exposure apparatus that forms a pattern using, for example, a spatial light modulator instead of the mask M.

In addition, in the above embodiment, some of the static elimination mechanisms may be omitted.

In addition, in the above embodiment, a discharge cable may be provided on the grounded member so that it is not grounded.

In the above embodiment, the exposure apparatus EX is described as an exposure apparatus that transfers the pattern of the mask M onto the substrate P, but the exposure apparatus EX may also be, for example, a semiconductor exposure apparatus that forms a pattern formed on a reticle onto a wafer.

The above-described embodiment is a preferred example of the present invention. However, the present invention is not limited to this embodiment, and various modifications are possible without departing from the spirit of the present invention.

The following supplementary notes are further disclosed regarding the above-described embodiment.
[Appendix 1]
A transport device that transports a mask to an exposure apparatus body,
A holder for holding the mask;
a static elimination mechanism that eliminates static electricity charged to the holding portion;
A conveying device comprising:
[Appendix 2]
the holding portion includes a conductive support portion that contacts the mask and supports the mask,
The static electricity removal mechanism removes static electricity from the holding portion by guiding the static electricity from the supporting portion to another grounded member.
2. The conveying device of claim 1.
[Appendix 3]
the holding unit includes an arm unit to which the support unit is fixed and which is movable in a first direction parallel to a surface of the mask,
The static elimination mechanism includes:
a connection portion that electrically connects the support portion and the arm portion and guides static electricity charged on the support portion to the arm portion;
a sixth static elimination member that guides static electricity charged on the arm portion to a grounded housing that houses the arm portion;
3. The conveying device of claim 2, comprising:
[Appendix 4]
The connection portion is an elastic plate-like member.
4. The conveying apparatus of claim 3.
[Appendix 5]
the sixth charge removing member guides static electricity charged in the arm portion to the housing when the holding portion holds the mask.
5. The conveying device according to claim 3 or 4.
[Appendix 6]
The sixth charge removing member is a charge removing brush having a conductive bristle bundle.
6. A conveying device according to any one of claims 3 to 5.

100 Main body 114 Mask stage 310 Mask buffer 312 Second electrode part 320 Shelf part 320a Support part 320b Frame part 330 Buffer arm 331 Arm part 331a Main body part 331c Pedestal part 332 First frame 333 First driving mechanism 334 Second frame 335 Second driving mechanism 340 Discharge mechanism 341 Third electrode part 600 Mask case 601 Case main body 601a First case part 601b Second case part 602 Discharge cord 603 Mask support member 604 Discharge brush 605a to 605e Electrode member 700 Transport cart 701 Placement part 710 Discharge mechanism 711 First electrode part 712 Discharge cord 713 Electrode member BS Bottom surface CS Ceiling surface EX Exposure device

Claims (22)

A case body having at least a portion thereof electrically conductive and housing the mask;
a conductive member for guiding the static electricity charged on the mask to the conductive portion of the case body;
a first static elimination member electrically connected to the conductive portion and configured to eliminate static electricity charged on the conductive portion;
A mask case equipped with: The first charge removing member is a discharge cord.
The mask case according to claim 1. The case body includes:
a first case portion having a bottom surface;
a second case portion that is detachably provided with respect to the first case portion and has a ceiling surface that faces the bottom surface;
Including,
At least one of the first case portion and the second case portion has the conductive portion.
The mask case according to claim 1 or 2. the first case portion is conductive,
the conductive member includes a first conductive member provided on the bottom surface to face the mask and configured to guide static electricity charged on the mask to the first case portion;
The first charge removing member is provided outside the first case portion and removes static electricity charged to the first case portion.
The mask case according to claim 3. the first conductive member is electrically connected to the first case portion and includes a plurality of conductive support members that contact the mask and support the mask.
The mask case according to claim 4. a first electrode member electrically connecting the plurality of conductive support members and the first case portion;
a second electrode member electrically connecting the first case portion and the first charge removing member;
The mask case according to claim 5 . The first conductive member is electrically connected to the first case portion and includes a static elimination brush having a conductive bristle bundle extending toward the mask.
The mask case according to any one of claims 4 to 6. The mask case according to claim 7, further comprising a third electrode member that electrically connects the static elimination brush and the first case portion. the second case portion is conductive,
the conductive member includes a second conductive member that is provided on the ceiling surface of the second case portion, faces the mask, and guides static electricity charged on the mask to the second case portion;
The first case portion and the second case portion are electrically connected to each other in a state in which the second case portion is attached to the first case portion.
The mask case according to any one of claims 4 to 8. a fourth electrode member electrically connecting the second case portion and the second conductive member;
a fifth electrode member that electrically connects the first case portion and the second case portion;
The mask case according to claim 9 . The second conductive member is a static elimination brush having a conductive bristle bundle extending toward the first case portion.
The mask case according to claim 9 or 10. A transport cart for transporting the mask case according to any one of claims 1 to 11,
A placement portion on which the mask case is placed;
a static elimination mechanism that eliminates static electricity charged on the mask case placed on the placement section;
A transport cart equipped with the above. The static elimination mechanism includes:
a first electrode part electrically connected to the conductive portion of the mask case;
a third charge removing member electrically connected to the first electrode part and configured to remove static electricity charged on the mask case;
13. The transport dolly of claim 12, comprising: the static elimination mechanism includes a fifth electrode member electrically connected to the first electrode component,
When the transport cart is positioned at a predetermined location, the fifth electrode member is disposed at the predetermined location and is electrically connected to a grounded second electrode component.
14. A transport dolly according to claim 13. A mask buffer capable of storing a plurality of mask cases according to any one of claims 1 to 11,
A shelf portion on which the mask case is placed;
a static elimination mechanism that eliminates static electricity charged on the mask case placed on the shelf;
A mask buffer comprising: The shelf portion is
a conductive case support part that contacts the conductive part of the mask case and supports the mask case from below;
a conductive frame portion to which the case support portion is fixed;
Equipped with
the static elimination mechanism electrically connects the case support portion and the frame portion and grounds the frame portion to eliminate static electricity charged on the mask case.
16. The mask buffer of claim 15. 12. A conveying device that carries out a mask case from a mask buffer that stocks the mask case according to any one of claims 1 to 11 and carries the mask case into the mask buffer,
an arm portion that is driven in a first direction parallel to a surface of the mask to remove the mask case from the mask buffer and insert the mask case into the mask buffer;
a static elimination mechanism that eliminates static electricity charged to the arm portion;
Equipped with
The arm portion is electrically connected to the mask case while holding the mask case.
Conveying device. The arm portion is
A conductive body portion;
A support member for supporting the mask case;
Equipped with
The static elimination mechanism includes a third electrode part that is electrically connected to the main body and contacts the conductive portion of the mask case supported by the support member to guide static electricity charged on the mask case to the main body part.
20. The transport device of claim 17. a first frame that holds a first drive mechanism that drives the arm portion in the first direction;
a second frame holding a second drive mechanism that drives the first frame in a second direction substantially perpendicular to a surface of the mask;
Equipped with
The static elimination mechanism includes:
a fourth static elimination member that faces the arm portion and guides static electricity charged on the arm portion to the first frame;
a fifth static elimination member that faces the first frame and guides static electricity charged on the first frame to the second frame;
Including,
The second frame is grounded.
A conveying device according to claim 17 or 18. the fourth charge removing member guides static electricity charged in the arm portion to the first frame when the arm portion is positioned closest to the mask buffer in the first direction and when the arm portion is positioned closest to the second frame in the first direction.
20. The transport device of claim 19. the fifth charge removing member guides static electricity charged on the first frame to the second frame at at least one of a timing when the first frame is at the highest position and a timing when the first frame is at the lowest position in the second direction;
A conveying device according to claim 19 or 20. The fourth charge eliminating member and the fifth charge eliminating member are charge eliminating brushes having conductive bristles.
A conveying device according to any one of claims 19 to 21.

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