KR101092067B1 - Chemical Bath Deposition apparatus of in-line type for manufacturing solar cell - Google Patents

Abstract

The present invention relates to a CBD device for manufacturing a solar cell, comprising a substrate conveying means, a chemical storage tank, a shower head for discharging the chemical liquid, and a substrate loading portion, wherein the shower head is provided to stir and discharge the chemical liquid. In addition, the substrate loading unit includes a discharge pipe for discharging the chemical liquid to the outside, thereby adopting an inline type chemical liquid showerhead method, not only to supply an appropriate amount of chemical liquid but also to improve process efficiency, The in-line sun can prevent clogging and solidification through agitation and connect post-treatment means that can clean and dry the substrate. It is about a CD device for battery manufacturing.

Board, Solar Cell, Shower Head

Description

Chemical Bath Deposition apparatus of in-line type for manufacturing solar cell

The present invention relates to a CD device for manufacturing a solar cell, by adopting an inline type showerhead method that can agitate the chemical liquid and discharged onto the substrate, and by connecting the post-treatment means for cleaning and drying the substrate In addition, it is easy to supply the proper amount of chemical liquid, and it is easy to maintain the shower head, and also it can be used for the in-line solar cell manufacturing device which can improve the process efficiency as well as rapid cleaning and preventing external leakage of the chemical liquid. will be.

In general, a solar cell is a semiconductor device that converts light energy directly into electrical energy, and silicon-based solar cells and compounds, such as polycrystalline and single crystal silicon solar cells or amorphous silicon solar cells. It is largely classified into semiconductor solar cells.

Such solar cells generate electric energy by configuring an array of solar cells composed of a plurality of modules and a solar panel for power generation.

In general, silicon-based solar cells process silicon wafers to bond N (negative) and P (positive) semiconductors of different polarities having electrons and holes, respectively, and form electrodes. As a result, it is a photovoltaic cell that produces electrical energy through the movement of electrons by light energy using the principle of photovoltaic power generation by PN junction.

On the other hand, as one of compound semiconductor solar cells, CIGS-based solar cells have a light absorption layer having a high light absorption coefficient composed of elements such as copper (Cu), indium (In), gallium (Ga), and selenium (Se). It is a solar cell that produces electrical energy by depositing on a substrate such as polymer. It is possible to manufacture solar cell with high efficiency even with thin film of 1 ~ 2㎛ thickness, and also has excellent electrical and optical stability. It is possible to form an absorber layer and is being researched as a low cost and high efficiency solar cell material.

In the compound semiconductor solar cell as described above, a thin film layer such as a back electrode, a light absorption layer, a buffer layer, a transparent electrode layer, an antireflection film, and a grid is generally stacked on a substrate to form one unit thin film, thereby forming the thin film layer. It is manufactured through a number of treatment processes, such as a sputter deposition process or an evaporator deposition process.

Therefore, in the conventional solar cell manufacturing process, a plurality of equipments for performing respective processes, such as a sputter deposition chamber, an evaporator deposition chamber, a buffer layer deposition chamber, and a heat treatment chamber, for forming the thin film layer as described above, are used. It is made by a number of process performing equipment, such as equipment, drying equipment, conveying equipment.

The buffer layer deposition chamber is a CBD device that performs a deposition process to form a buffer layer on the substrate. After the chemical liquid (CdS sulfide solution) is introduced into the chamber, the substrate is submerged in the chemical liquid. The buffer layer is deposited on the substrate.

However, the conventional CD device as described above has the following problems.

First, there is a problem that not only the structure of the stirring device is complicated, but also the equipment cost is significantly increased by providing a stirring device that causes vibration of the entire chamber to stir the chemical liquid, and second, the substrate in the bath in which the chemical liquid is stored. By placing the substrate in the chemical solution for a certain period of time, the loading and unloading of the substrate is not easy, and the process efficiency is notably reduced, and the washing of the bath is not easy, and third, the cleaning process of the substrate is performed separately. In addition, it is difficult to quickly clean, there was a problem that the chemical liquid can leak to the outside.

The present invention has been made to solve the above problems, the object of the present invention by adopting the in-line showerhead method in the supply of the chemical solution, it is easy to supply the appropriate amount of the chemical liquid and through a simple structure stirring method It is possible to significantly reduce the equipment cost.

Another object of the present invention is to not only facilitate the cleaning of the shower head through the stirring action of the shower head itself, but also to prevent clogging or solidification of the chemical solution, thereby reducing process defects.

Another object of the present invention is to prevent the external leakage of the chemical liquid as well as to significantly improve the process efficiency because the CD process and the cleaning process can be performed in a continuous process.

In order to achieve the above object, the present invention provides a transport means for transporting a substrate, a chemical liquid storage tank in which a chemical liquid for forming a buffer layer is formed on the substrate, and a chemical liquid stored in the chemical liquid storage tank so as to be supplied on the substrate. A shower head for agitating and discharging the chemical liquid, and a substrate loading portion having a discharge pipe for supporting the substrate but discharge the chemical liquid introduced from the shower head.

The shower head of the present invention has a hollow inside and penetrates a slit for discharging the chemical liquid on an outer circumferential surface thereof, and may include a rotatable rotary cylindrical roller.

In addition, the shower head of the present invention may be formed in a container shape of a predetermined depth with an empty inside and an open top, and may be configured as a rotatable rotary container.

Meanwhile, the discharge pipe of the substrate loading unit may be connected to the chemical storage tank so that the chemical liquid may be recovered to the chemical storage tank so that the chemical liquid may be recycled.

In addition, the substrate loading unit may be provided with a heating means for heating the substrate.

In addition, it is preferable that the conveying means is further provided with post-treatment means for cleaning and drying the substrate on which the chemical liquid processing is completed.

At this time, the post-treatment means may be composed of a cleaning nozzle for spraying the cleaning liquid on the upper surface of the substrate and the air gun for drying the substrate.

As described above, the present invention, firstly, by adopting a simple showerhead method capable of agitating action, it is easy to supply the appropriate amount of chemical liquid, and can reduce the cost of equipment, and secondly, the cleaning of the showerhead Not only is it easy to prevent clogging or coagulation of the chemical solution, but also reduces the process defects, thereby improving productivity. Third, it is possible to perform the continuous process of the CD process and the cleaning process, thereby significantly improving the process efficiency. It has an effect.

Hereinafter, the present invention will be described in detail with reference to the drawings.

1 shows a schematic configuration diagram of a CD device for manufacturing an inline solar cell of the present invention.

The present invention is a CBD (Chemical Bath Deposition) device for depositing a buffer layer formed between a light absorption layer and a transparent conductive film (TCO layer) of a CIGS-based solar cell by a chemical solution growth method, the upper surface of the substrate A buffer layer is laminated on the deposited light absorbing layer (copper (Cu), indium (In), copper gallium (Cu / Ga) and selenide compound deposition layer).

As shown, the present invention comprises a conveying means (110, 120), chemical storage tank 10, shower head 30, and the substrate loading portion 40

The conveying means (110, 120) is for transporting the substrate 100, may be composed of a plurality of conveying rollers or conveyor belts, the substrate 100 is easily loaded or unloaded to the substrate loading portion 40 to be described later It is installed adjacent to both sides of the substrate loading portion 40 so as to be loaded.

Meanwhile, the chemical storage tank 10 is a portion in which the chemical liquid (Cds solution) 200 for forming the buffer layer is stored on the substrate 100, and may be installed at the lower side of the substrate loading part 40.

The chemical liquid storage tank 10 is a portion in which the chemical liquid 200 supplied to the shower head 30 is stored. The chemical liquid storage tank 10 may be provided in a conventional hermetically sealed container, and the chemical liquid supply pipe 12 is installed at one side. And the other side is provided with a chemical solution supply unit 60.

In this case, the chemical liquid supply pipe 12 is connected to the shower head 30 so that the chemical liquid 200 can be supplied to the shower head 30, and a valve (not shown) for adjusting the input of the chemical liquid 200 may be installed. Could be.

In addition, the chemical storage tank 10 may be provided with a pump (not shown) for transmitting the chemical liquid 200 to the shower head 30 through the chemical liquid supply pipe 12, it can also measure the PH of the chemical liquid 200 It is preferable that the PH meter 15 is installed.

On the other hand, the lower side of the chemical storage tank 10 is provided with a discharge port 17 for discharging the chemical solution 200 or the cleaning solution described below to the outside.

The chemical liquid 200 includes Cds ₄ and Cs (NH ₃ ) ₂ and A mixed solution of NH ₄ OH may be used, and the gas component of the chemical liquid 200 may be supplied by installing a separate gas supply unit 65 in the chemical liquid supply pipe 12.

Meanwhile, the shower head 30 is positioned above the substrate loading part 40 to supply the chemical liquid 200 onto the substrate 100, and is rotatably installed with respect to the central axis.

Hereinafter, an embodiment of the showerheads 30 and 30 'will be described with reference to FIGS. 2 and 3.

2 and 3 are perspective views showing one embodiment of the showerheads 30 and 30 ', respectively.

As shown in FIG. 2, the shower head 30 is formed in the shape of a rotating cylindrical roller having a predetermined length, and the rotating shaft 32 serving as a central axis is protruded from both ends.

In addition, the outer circumferential surface of the shower head 30 is formed with a slit 35 for discharging the chemical liquid 200 introduced therein through the longitudinal direction.

Meanwhile, the chemical liquid supply pipe 12 may be connected to the rotating shaft 32 protruding from one end of the shower head 30. At this time, the end of the chemical liquid supply pipe 12 is inserted into the rotating shaft 32 and the shower head 30 is installed. The connection hole 33 is formed to communicate with the inside of the through.

At this time, the rotating shaft 32 is to be extrapolated to the end of the chemical liquid supply pipe 12 is rotatably installed.

On the other hand, a bearing may be provided inside the connection hole 33 to allow the shower head 30 to rotate smoothly, and a sealing member such as an O-ring to block external leakage of the chemical liquid 200. Is preferably installed.

The shower head 30 rotatably couples the rotating shaft 32 to a separate support frame (not shown), and the conventional rotating force transmitting means (not shown) such as a gear or a belt connected to the rotating shaft 32 with the driving motor. Can be installed to rotate.

In this case, by installing a vibrator (vibrator) or the like capable of vibrating the shower head 30 at a predetermined amplitude on one side of the shower head 30, the chemical liquid 200 therein may be uniformly stirred. .

Therefore, the chemical liquid 200 is introduced into the shower head 30 from the chemical liquid storage tank 10 through the chemical liquid supply pipe 12, and then stirred by the vibration of the shower head 30, after which the shower head 30 is rotated. When the slit 35 is placed on the lower side, the slit 35 is discharged to the upper portion of the substrate 100 loaded on the substrate loading part 40 through the slit 35.

Meanwhile, FIG. 3 illustrates another type of shower head 30 '. As shown, the shower head 30' is formed in the shape of a rectangular container having a predetermined depth with an empty inside and an open top.

At this time, the shower head 30 'is similar to the shower head 30 of the embodiment of FIG. 2, and the rotating shaft 32' protrudes from both sides, and the rotating shaft 32 'of one side is extrapolated to the end of the chemical liquid supply pipe 12 A connecting hole 33 ′ rotatably coupled is formed, and a vibrator (vibrator) is installed to vibrate the shower head 30 ′ at a predetermined amplitude.

That is, the shower head 30 ′ is provided in the form of a rotatable rotary container by allowing the chemical liquid 200 introduced therein through the chemical liquid supply pipe 12 to be uniformly stirred and rotatably installed.

Therefore, the chemical liquid 200 is introduced into the shower head 30 'from the chemical liquid storage tank 10 through the chemical liquid supply pipe 12, and then stirred by the vibration of the shower head 30', and then the shower head 30 ' When rotated so that the upper side is downward, it is poured into the upper portion of the substrate 100 loaded on the substrate loading portion 40 is discharged.

The shower heads 30 and 30 'may be separately connected to a cleaning solution supply device (not shown) capable of supplying the cleaning solution for cleaning.

Hereinafter, the substrate loading unit 40 will be described in detail with reference to FIG. 4.

4 shows a side view of the substrate loading part 40.

The substrate loading part 40 is a part on which the substrate 100 is seated, and is formed to have a predetermined thickness to support the bottom surface of the substrate 100, and the chemical liquid 200 discharged from the shower head 30 is constant around the substrate loading part 40. The inclined surface 45 is provided to be inclined upward in the outward direction so as to be accommodated as high.

Accordingly, the shower head 30 discharges the chemical liquid 200 to the substrate loading part 40 by a height such that the substrate 100 is completely locked.

On the other hand, one side of the bottom surface of the substrate loading part 40 is provided with a discharge pipe 50 for naturally discharging the chemical liquid 200 is complete reaction with the substrate 100 to the outside.

In this case, the discharge pipe 50 may be connected to the chemical storage tank 10 to recover the chemical liquid 200 if necessary and recycle it to the shower head 30, thereby recycling the chemical liquid 200.

The conveying means 110 and 120 installed adjacent to both side portions of the substrate loading part 40 may be installed at the same slope as the inclined surface 45 of the substrate loading part 40 to facilitate loading and unloading of the substrate 100. desirable.

In addition, the substrate loading unit 40 is provided with a heating means for heating the substrate 100 to a predetermined temperature.

The heating means is a deposition reaction proceeds at about 40 ℃ ~ 80 ℃ to heat the substrate loading portion 40 so that the substrate 100 seated on the top is maintained at the temperature during the process.

At this time, the heating means may be configured by installing a conventional heating line.

In addition, by installing a conveyor belt (not shown), both sides of which are connected to the conveying means 110 and 120, respectively, the substrate loading part 40 may be configured to continuously load and unload the substrate 100.

On the other hand, the post-processing means 70 may be installed on the upper portion of the transfer means 120 for transporting the substrate 100 is completed deposition.

The post-treatment means 70 is for cleaning and drying the substrate 100 on which the deposition of the buffer layer is completed, and may include a cleaning nozzle 71 and an air gun 75.

The cleaning nozzle 71 and the air gun 75 are sequentially installed on the upper side of the conveying means 120 along the conveying direction of the substrate 100, thereby sequentially cleaning liquid and drying air on the conveyed substrate 100. To be sprayed.

At this time, the conveying means 120 is provided with a drainage path (not shown) so as to be connected to the upper end of the inclined surface 45 of the substrate loading portion 40 so that the cleaning liquid flows down to the substrate loading portion 40, the cleaning liquid is conveying means ( After flowing down to the substrate loading part 40 through the drainage path of 120 may be discharged through the discharge pipe (50).

Hereinafter, the operation of the present invention will be described in detail with reference to FIG. 5.

5 is a flowchart showing the operation of the present invention.

First, when the substrate 100 is seated on the substrate loading part 40 by the conveying means 110 and the substrate loading S10 is completed, the chemical liquid supply S20 is performed from the chemical storage tank 10 to the shower head 30. .

When the chemical liquid 200 is injected into the shower head 30, the chemical liquid 200 is uniformly agitated by the vibration of the shower head 30 and at the same time, the substrate loading part is rotated through the slit 35 by the shower head rotation S30. By being discharged to 40, the chemical liquid discharge (S40) process is in progress.

At this time, the chemical liquid supply pipe 12 and the shower head 30 is preferably maintained to 3 ℃ ~ 5 ℃.

In addition, the gas supply unit 65 may supply the gas component necessary for the reaction to the substrate loading unit 40 through the shower head 30.

Meanwhile, when the chemical liquid discharge (S40) is completed, the substrate 100 reacts with the chemical liquid 200 to deposit a buffer layer (S50) on the surface.

When the buffer layer deposition S50 is completed, the substrate unloading S60 is performed by the transfer means 120.

At this time, the chemical liquid 200 accommodated in the substrate loading unit 40 is moved to the chemical storage tank 10 through the discharge pipe 50, and then discharged to the outside through the discharge port 17 of the chemical storage tank 10 or the shower head ( 30 may be recycled and recycled.

Meanwhile, the cleaning solution supply means connected to the shower head 30 separately supplies the cleaning solution to the shower head 30 so that the cleaning solution is discharged through the discharge hole 35, thereby cleaning the shower head 30 and cleaning the substrate loading part. S70) may be performed sequentially, after which the cleaning liquid is discharged to the outside through the outlet 17 after moving to the chemical storage tank (10).

In this case, the substrate 100 transferred by the transfer means 120 is sequentially cleaned and dried (S80) by the cleaning nozzle 71 and the air gun 75 of the post-treatment means 70. It flows down to the substrate loading part 40 and is discharged to the outside through the discharge port 50 of the discharge pipe 50 and the chemical storage tank 10.

When the cleaning is completed as described above, the chemical solution supply unit 60 again inputs an appropriate amount of the chemical solution 200 to the chemical storage tank 10, and the chemical solution 200 passes through the chemical solution supply pipe 12 and the shower head 30 again. To be circulated to the substrate loading part 40.

At this time, the substrate loading unit cleaning (S70) and the substrate cleaning and drying (S80) may be performed at the same time.

On the other hand, when the chemical liquid 200 is to be recycled, the cleaning liquid generated during substrate cleaning and drying (S80) is not discharged to the substrate loading part 40, but is immediately discharged from the conveying means 120 to the chemical liquid 200. What is necessary is to recycle the chemical storage tank 10, the shower head 30 and the substrate loading portion 40.

Therefore, the present invention adopts an inline type showerhead method in supplying the chemical liquid 200, and it is possible to significantly reduce the installation cost through supplying an appropriate amount of the chemical liquid 200 as well as a simple rotating method or agitating method. In addition, through the stirring action of the shower heads 30 and 30 'itself, the shower head 30'30' can be easily cleaned, and clogging or solidification of the chemical liquid 200 can be prevented, thereby reducing process defects. In addition, the deposition process and the cleaning process may be performed continuously, thereby preventing external leakage of the chemical liquid 200 and significantly improving the process efficiency.

As described above, the above embodiments are merely described as examples for convenience of description and are not intended to limit the scope of the claims.

1 is a schematic configuration diagram of a CD device for manufacturing an inline solar cell of the present invention;

2 is a perspective view of one embodiment of a showerhead of the present invention;

3 is a perspective view of another embodiment of the showerhead of the present invention;

Figure 4 is a flow chart showing the operation of the CD device for manufacturing an inline solar cell of the present invention.

Explanation of symbols on the main parts of the drawings

10: chemical liquid storage tank 12: chemical liquid supply pipe

15 PH measuring unit 17 outlet

30,30 ': Shower head 32,32': Rotating shaft

33,33 ': Connector 35: Slit

40: substrate loading portion 45: inclined surface

50: discharge pipe 60: chemical supply unit

65 gas supply unit 70 post-treatment means

71: cleaning nozzle 75: air gun

100: substrate 110, 120: conveying means

200: solution 300: chamber

S10: substrate loading S20: chemical supply

S30: rotation of the shower head S40: chemical liquid discharge

S50: buffer layer deposition S60: substrate unloading

S70: Clean the substrate loading part S80: Clean the substrate / dry

Claims (7)

Conveying means for conveying the substrate; A chemical storage tank for storing a chemical solution for forming a buffer layer on the substrate; A shower head installed to receive the chemical solution from the chemical storage tank and to supply the chemical liquid to the substrate, while stirring and discharging the chemical liquid; And A substrate loading part supporting the substrate and having a discharge pipe for discharging the chemical liquid introduced from the shower head; Including but not limited to The shower head has an empty inside and through the slit for discharging the chemical liquid on the outer peripheral surface, the in-line type solar cell manufacturing CD device, characterized in that consisting of a rotatable rotary cylindrical roller. delete Conveying means for conveying the substrate; A chemical storage tank for storing a chemical solution for forming a buffer layer on the substrate; A shower head installed to receive the chemical solution from the chemical storage tank and to supply the chemical liquid to the substrate, while stirring and discharging the chemical liquid; And A substrate loading part supporting the substrate and having a discharge pipe for discharging the chemical liquid introduced from the shower head; Including but not limited to The shower head is empty in the inside, the upper portion is formed in the form of a container having a predetermined depth, in-line solar cell manufacturing CD device, characterized in that consisting of a rotatable rotary container. The method of claim 1, The substrate loading unit discharge pipe is connected to the chemical storage tank so that the chemical liquid is recovered to the chemical storage tank is an in-line type solar cell apparatus for manufacturing a CD device. 5. The method of claim 4, The substrate loading unit is a CD device for manufacturing an inline solar cell, characterized in that the heating means for heating the substrate is provided. The method according to any one of claims 1 and 3 to 5, In-line solar cell production of the CD device, characterized in that the conveying means is further provided with post-treatment means for cleaning and drying the substrate on which the chemical liquid treatment is completed. The method of claim 6, The after-treatment means is a CD device for manufacturing an inline solar cell, characterized in that the cleaning nozzle for spraying the cleaning liquid to the upper surface of the substrate and the substrate drying air gun.

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