KR100815265B1 - 마이크로 히터 및 도가니 제조 방법, 그리고 이들을 구비한유기물 진공 증착 장치 - Google Patents
마이크로 히터 및 도가니 제조 방법, 그리고 이들을 구비한유기물 진공 증착 장치 Download PDFInfo
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- KR100815265B1 KR100815265B1 KR1020060081918A KR20060081918A KR100815265B1 KR 100815265 B1 KR100815265 B1 KR 100815265B1 KR 1020060081918 A KR1020060081918 A KR 1020060081918A KR 20060081918 A KR20060081918 A KR 20060081918A KR 100815265 B1 KR100815265 B1 KR 100815265B1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (11)
- 진공 챔버;상기 진공 챔버 내의 하부에 배치되고, 기판의 픽셀 영역의 크기 및 간격에 상응하는 패턴을 가지며, 그 내부에 유기물이 채워지는 도가니;상기 패턴의 상면을 제외한 상기 도가니 전면에 형성되며, 상기 도가니를 가열시켜 상기 도가니 내부에 채워진 상기 유기물을 상기 패턴의 상면으로 증발시키기 위한 마이크로 히터;상기 도가니 상부에 배치되며, 상기 마이크로 히터에 의해 가열되어 증발되는 상기 유기물을 투과시키기 위한 투과부와, 상기 유기물을 차단시키기 위한 차단부로 구성되는 마스크; 및상기 마이크로 히터가 형성된 상기 도가니 하부에 설치되며, 상기 마스크의 투과부를 통해 증발되는 상기 유기물이 상기 기판의 픽셀 영역에 정확하게 얼라인먼트될 수 있도록 상기 도가니를 정밀하게 시프트시켜 주는 나노 스테이지를 포함하는 유기물 진공 증착 장치.
- 제1항에 있어서,상기 도가니의 패턴은 상기 마스크의 투과부와 대응되는 위치에 형성되는 것을 특징으로 하는 유기물 진공 증착 장치.
- 제1항에 있어서,상기 마이크로 히터가 형성된 상기 도가니의 측면 및 하면에 형성되어 상기 마이크로 히터에 의해 가열된 상기 도가니를 단열시켜주기 위한 단열층을 더 포함하는 것을 특징으로 하는 유기물 진공 증착 장치.
- 제3항에 있어서,상기 단열층 안쪽에는 상기 도가니가 열에 의해 팽창 및 변형되는 것을 방지하기 위한 질소 가스가 주입되는 것을 특징으로 하는 유기물 진공 증착 장치.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060081918A KR100815265B1 (ko) | 2006-08-28 | 2006-08-28 | 마이크로 히터 및 도가니 제조 방법, 그리고 이들을 구비한유기물 진공 증착 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060081918A KR100815265B1 (ko) | 2006-08-28 | 2006-08-28 | 마이크로 히터 및 도가니 제조 방법, 그리고 이들을 구비한유기물 진공 증착 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20070050793A KR20070050793A (ko) | 2007-05-16 |
| KR100815265B1 true KR100815265B1 (ko) | 2008-03-19 |
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| KR1020060081918A Expired - Fee Related KR100815265B1 (ko) | 2006-08-28 | 2006-08-28 | 마이크로 히터 및 도가니 제조 방법, 그리고 이들을 구비한유기물 진공 증착 장치 |
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| US8859043B2 (en) | 2011-05-25 | 2014-10-14 | Samsung Display Co., Ltd. | Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
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| KR102108361B1 (ko) | 2013-06-24 | 2020-05-11 | 삼성디스플레이 주식회사 | 증착률 모니터링 장치, 이를 구비하는 유기층 증착 장치, 증착률 모니터링 방법, 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
| KR102162797B1 (ko) | 2013-12-23 | 2020-10-08 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치의 제조 방법 |
| KR20210082783A (ko) | 2019-12-26 | 2021-07-06 | 주식회사 선익시스템 | 박막 증착용 도가니장치 및 상기 도가니장치의 절연 가이드링 |
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| KR20070013441A (ko) * | 2005-07-26 | 2007-01-31 | 주성엔지니어링(주) | 쉐도우 마스크 및 이를 이용한 박막 증착 방법 |
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