JPH05101750A - Manufacture of electrode material - Google Patents
Manufacture of electrode materialInfo
- Publication number
- JPH05101750A JPH05101750A JP3257681A JP25768191A JPH05101750A JP H05101750 A JPH05101750 A JP H05101750A JP 3257681 A JP3257681 A JP 3257681A JP 25768191 A JP25768191 A JP 25768191A JP H05101750 A JPH05101750 A JP H05101750A
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- copper
- container
- alloy
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007772 electrode material Substances 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000011651 chromium Substances 0.000 claims abstract description 36
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000010949 copper Substances 0.000 claims abstract description 30
- 229910052802 copper Inorganic materials 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000000843 powder Substances 0.000 claims abstract description 24
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 6
- 239000000956 alloy Substances 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 238000001125 extrusion Methods 0.000 claims 1
- 229910000599 Cr alloy Inorganic materials 0.000 abstract description 25
- 239000000788 chromium alloy Substances 0.000 abstract description 23
- GXDVEXJTVGRLNW-UHFFFAOYSA-N [Cr].[Cu] Chemical compound [Cr].[Cu] GXDVEXJTVGRLNW-UHFFFAOYSA-N 0.000 abstract description 21
- 239000011159 matrix material Substances 0.000 abstract description 12
- 239000002245 particle Substances 0.000 abstract description 12
- 239000002775 capsule Substances 0.000 abstract description 6
- 229910001209 Low-carbon steel Inorganic materials 0.000 abstract description 5
- 238000011049 filling Methods 0.000 abstract description 2
- 229910000881 Cu alloy Inorganic materials 0.000 abstract 2
- 239000000203 mixture Substances 0.000 description 5
- 238000010298 pulverizing process Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000001192 hot extrusion Methods 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000009770 conventional sintering Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009689 gas atomisation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010299 mechanically pulverizing process Methods 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/0203—Contacts characterised by the material thereof specially adapted for vacuum switches
Landscapes
- Manufacture Of Switches (AREA)
- High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
- Contacts (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、アトマイズ法による銅
−クロム合金の微粉末を原料とする電極材料の製造方法
に関し、特に真空インタラプタの電極に用いて好適であ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an electrode material using a fine powder of copper-chromium alloy as a raw material by an atomizing method, and is particularly suitable for use as an electrode of a vacuum interrupter.
【０００２】[0002]
【従来の技術】真空インタラプタの電極材料として要求
される重要な性能の一つに電流遮断性能の高いことが挙
げられる。2. Description of the Related Art One of the important performances required for a vacuum interrupter electrode material is that it has a high current interruption performance.
【０００３】銅(Cu)−クロム(Cr)合金は、この電流遮断
性能が非常に優れている電極材料として知られており、
従来では電解法等により製造された銅の粉体と、粉砕法
等により製造されたクロムの粉体とを混合したものを圧
縮加圧成形し、これを高温で焼結する粉末冶金法による
製造方法が一般的である。A copper (Cu) -chromium (Cr) alloy is known as an electrode material having an extremely excellent current cutoff performance.
Conventionally, a powder metallurgical method is used, in which a mixture of copper powder produced by the electrolytic method and chromium powder produced by the pulverization method is compression-pressed and sintered at high temperature. The method is common.
【０００４】この他、圧縮加圧成形した銅の粉体の空隙
部分にクロムを溶浸させる溶浸法や、或いは銅とクロム
との混合粉体を圧縮加圧成形し、これを低温で焼結した
後、その空隙部分に銅を溶浸させるようにした方法、或
いは鋳造による方法等も試みられている。In addition, an infiltration method in which chromium is infiltrated into the voids of the compressed and compressed copper powder, or a mixed powder of copper and chromium is compression and pressed, and this is baked at a low temperature. After bonding, a method of infiltrating copper into the void portion, a method of casting, or the like has also been attempted.
【０００５】[0005]
【発明が解決しようとする課題】この銅−クロム合金
は、銅のマトリックス中にクロムが分散したものである
が、電極材料としての電気的特性に着目した場合、微細
なクロムが銅マトリックス中に均一に分散している方が
好ましい。This copper-chromium alloy is one in which chromium is dispersed in a copper matrix. However, when attention is paid to the electrical characteristics as an electrode material, fine chromium is contained in the copper matrix. It is preferable that they are uniformly dispersed.
【０００６】ところが、粉末冶金法により製造される従
来の銅−クロム合金の場合、粉砕法により機械的に粉砕
して得られるクロム粉末の粒度分布の幅が非常に大き
く、しかもその平均粒径が４０μｍ程度にも達するた
め、銅の粉体とクロムの粉体とを混合する際にこれらの
比重差や粉体の粒度、或いは粒度分布の相違により、均
一に混合され難い欠点を有する。この結果、焼結後にお
ける銅マトリックス中のクロムが微細且つ均一に分散せ
ず、その電気的特性が期待できるほど良好ではなかっ
た。However, in the case of the conventional copper-chromium alloy produced by the powder metallurgy method, the width of the grain size distribution of the chromium powder obtained by mechanically pulverizing by the pulverizing method is very large, and the average grain size thereof is large. Since it reaches about 40 μm, when the copper powder and the chromium powder are mixed, there is a drawback that it is difficult to mix them uniformly due to the difference in specific gravity, the particle size of the powder, or the difference in particle size distribution. As a result, the chromium in the copper matrix after sintering was not finely and uniformly dispersed, and its electrical characteristics were not so good as expected.
【０００７】そこで、クロム粉末を更に機械的に粉砕し
てその粒径を小さくすることが考えられるが、この場合
には粉砕の過程及び保管時にクロム粉体の表面が酸化が
進行し、酸素含有量の増加に伴って焼結性が低下してし
まう問題も生ずる。又、粉砕法により得られるクロム粉
末をふるいで分級し、微細径のクロム粉末のみを使用す
ることも考えられるが、この方法では歩留りが極めて悪
くなってしまい、製造コストが嵩む原因となる。Therefore, it is conceivable to further mechanically pulverize the chrome powder to reduce its particle size. In this case, the surface of the chrome powder is oxidized during the pulverization process and storage, so that the oxygen content is increased. There is also a problem that the sinterability decreases as the amount increases. It is also conceivable to classify the chrome powder obtained by the pulverizing method by sieving and use only the chrome powder having a fine diameter. However, this method causes extremely low yield and causes an increase in manufacturing cost.
【０００８】一方、溶浸法により製造される従来の銅−
クロム合金の場合、クロム粉体は酸化し易いため、その
品質管理を徹底する必要がある上、表面が酸化したクロ
ムの粉末は銅との濡れ性が悪く、溶浸ができなくなる欠
点を有する。On the other hand, the conventional copper produced by the infiltration method
In the case of a chromium alloy, since chromium powder is easily oxidized, it is necessary to thoroughly control the quality thereof, and the surface-oxidized chromium powder has poor wettability with copper and has a drawback that it cannot be infiltrated.
【０００９】又、鋳造法により製造される従来の銅−ク
ロム合金の場合、凝固時の冷却速度が遅いため、銅のマ
トリックス中のクロム粒子が成長してしまい、均一で微
細なクロムの分散が困難となる上、凝固偏析が生じ易い
ことから得られる銅−クロム合金の品質にばらつきが生
じ易い欠点を有する。Further, in the case of the conventional copper-chromium alloy produced by the casting method, since the cooling rate during solidification is slow, the chromium particles grow in the copper matrix, resulting in a uniform and fine dispersion of chromium. In addition to the difficulty, solidification segregation is likely to occur, which causes a drawback that the quality of the copper-chromium alloy obtained tends to vary.
【００１０】[0010]
【発明の目的】本発明は、微細なクロムが銅マトリック
ス中に均一に分散した高品質な銅−クロム合金の電極材
料を製造し得る方法を提供することを目的とする。OBJECTS OF THE INVENTION It is an object of the present invention to provide a method capable of producing a high quality copper-chromium alloy electrode material in which fine chromium is uniformly dispersed in a copper matrix.
【００１１】[0011]
【課題を解決するための手段】本発明者らは、微細化が
困難で表面酸化の問題を抱えたクロムの機械的粉砕法を
採用せず、アトマイズ法により銅−クロム合金の微粉末
を製造し、これを焼結して電極材料の製造が可能である
か否かを調べた。DISCLOSURE OF THE INVENTION The present inventors have manufactured a fine powder of a copper-chromium alloy by an atomization method without adopting the mechanical pulverization method of chromium, which has a problem of surface oxidation, which is difficult to make fine. Then, it was examined whether or not the electrode material could be manufactured by sintering this.
【００１２】そこで、銅とクロムとの混合物を真空等の
非酸化性雰囲気にて溶融し、その溶湯を５〜８ＭPa（メ
ガパスカル）の圧力のアルゴン(Ar)ガスを用いたガスア
トマイズ法により急冷凝固させて微粉末化し、銅マトリ
ックス中にクロムが分散した銅−クロム合金の微粉末を
得るようにした。Therefore, a mixture of copper and chromium is melted in a non-oxidizing atmosphere such as a vacuum, and the molten metal is rapidly solidified by a gas atomizing method using argon (Ar) gas at a pressure of 5-8 MPa (megapascal). The powder was finely powdered to obtain a fine powder of a copper-chromium alloy in which chromium was dispersed in a copper matrix.
【００１３】上記方法を実施するに際し、溶融前の銅と
クロムとの混合物における銅とクロムとの重量割合を
４：１に設定した。なお、クロムの重量割合がこれより
も多くなると、クロムのマトリックス中に銅が分散した
ものが生成してしまい、目標とする銅−クロム合金粉末
が得られない。In carrying out the above method, the weight ratio of copper to chromium in the mixture of copper and chromium before melting was set to 4: 1. If the weight ratio of chromium is higher than this, copper dispersed in the chromium matrix is generated, and the target copper-chromium alloy powder cannot be obtained.
【００１４】又、銅とクロムとの混合物を溶融する際に
は、溶湯の酸素含有量を低減するために酸素含有量の低
い銅及びクロムを選定する一方、上述した非酸化性雰囲
気にて溶融するか、或いは脱酸して酸素含有量を１００
０ppm以下に抑えた。この場合、原料等に混入している
不可避の不純物、例えば鉄(Fe)やニッケル(Ni)等の存在
は許容した。When melting a mixture of copper and chromium, copper and chromium having a low oxygen content are selected in order to reduce the oxygen content of the molten metal, while melting in the non-oxidizing atmosphere described above. Or deoxidize the oxygen content to 100
It was kept below 0 ppm. In this case, the presence of inevitable impurities, such as iron (Fe) and nickel (Ni), mixed in the raw materials was allowed.
【００１５】これにより得られた銅−クロム合金微粉末
の粒径は１５０μｍ以下であり、その成分割合も元の銅
とクロムとの混合物の割合と同等であった。又、この銅
−クロム合金微粉末を電子顕微鏡にて観察した結果、５
μｍ以下のクロム粒子が銅マトリックス中に均一に分散
していることを確認できた。The particle size of the copper-chromium alloy fine powder thus obtained was 150 μm or less, and the ratio of its components was the same as the ratio of the original mixture of copper and chromium. In addition, as a result of observing this copper-chromium alloy fine powder with an electron microscope, 5
It was confirmed that chromium particles having a size of μm or less were uniformly dispersed in the copper matrix.
【００１６】本発明による電極材料の製造方法は、かか
る知見に鑑みてなされたものであり、上述したアトマイ
ズ法により得られる銅とクロムとの合金微粉末を１００
０℃以下で溶融しない軟質の金属製の容器に充填し、こ
の容器毎９５０±５０℃の加熱温度にて熱間押出加工を
行った後、前記容器の部分を除去するようにしたことを
特徴とするものである。The method for producing the electrode material according to the present invention has been made in view of the above findings, and the fine alloy powder of copper and chromium obtained by the atomizing method described above is used as 100
It is characterized in that it is filled in a soft metal container that does not melt at 0 ° C. or lower, and hot extruding is performed at a heating temperature of 950 ± 50 ° C. for each container, and then the container portion is removed. It is what
【００１７】ここで、１０００℃以下で溶融しない軟質
の金属としては、軟鋼やステンレス鋼或いは銅等を使用
することができる。Here, as the soft metal which does not melt at 1000 ° C. or lower, mild steel, stainless steel, copper or the like can be used.
【００１８】[0018]
【作用】アトマイズ法によって得られる銅−クロム合金
微粉末は、銅マトリックス中に微小な粒径のクロムが均
一に分散している。これを１０００℃以下で溶融しない
軟質の金属製の容器に充填し、この容器毎９５０±５０
℃の加熱温度にて熱間押出加工を行うことにより、合金
粉末が焼結して高密度に一体化される。しかる後、容器
の部分を除去して焼結した銅−クロム合金を取り出す。In the fine copper-chromium alloy powder obtained by the atomizing method, chromium having a fine particle size is uniformly dispersed in the copper matrix. This is filled in a soft metal container that does not melt below 1000 ° C., and each container is 950 ± 50
By performing hot extrusion processing at a heating temperature of ° C, the alloy powder is sintered and integrated with high density. Then, the container is removed and the sintered copper-chromium alloy is taken out.
【００１９】[0019]
【実施例】真空インタラプタは、その概略構造の一例を
表す図１に示すようなものであり、相互に一直線状をな
す一対のリード棒１１,１２の対向端面には、それぞれ
電極１３,１４が図示しないろう材を介して一体的に設
けてある。これら電極１３,１４を囲む筒状のシールド
１５の外周中央部は、このシールド１５を囲む一対の絶
縁筒１６,１７の間に挟まれた状態で保持されている。
一方の前記リード棒１１は、一方の絶縁筒１６の一端に
接合された金属端板１８を気密に貫通した状態で、この
金属端板１８に一体的に固定されている。図示しない駆
動装置に連結される他方のリード棒１２は、他方の絶縁
筒１７の他端に気密に接合された他方の金属端板１９に
ベローズ２０を介して連結され、駆動装置の作動に伴っ
て電極１３,１４の対向方向に往復動可能に可動側の電
極１４が固定側の電極１３に対して開閉動作するように
なっている。DESCRIPTION OF THE PREFERRED EMBODIMENTS A vacuum interrupter is as shown in FIG. 1 showing an example of a schematic structure thereof, and electrodes 13 and 14 are provided on opposite end faces of a pair of lead rods 11 and 12 which are in a straight line with each other. It is integrally provided via a brazing material (not shown). A central portion of the outer circumference of a cylindrical shield 15 that surrounds the electrodes 13 and 14 is held in a state of being sandwiched between a pair of insulating cylinders 16 and 17 that surrounds the shield 15.
One of the lead rods 11 is integrally fixed to the metal end plate 18 in a state where the metal end plate 18 joined to one end of the one insulating cylinder 16 penetrates airtightly. The other lead rod 12 connected to the drive device (not shown) is connected to the other metal end plate 19 that is airtightly joined to the other end of the other insulating cylinder 17 via the bellows 20, and is accompanied by the operation of the drive device. The movable electrode 14 is opened and closed with respect to the fixed electrode 13 so that the electrodes 13 and 14 can reciprocate in opposite directions.
【００２０】本実施例における前記電極１３,１４は、
アトマイズ法による原料を軟質の金属容器に充填し、こ
の容器毎９５０±５０℃の加熱温度にて熱間押出加工
し、これによって得られる銅−クロム合金の焼結体で主
要部が構成される。The electrodes 13 and 14 in this embodiment are
A soft metal container is filled with the raw material obtained by the atomizing method, and each container is hot extruded at a heating temperature of 950 ± 50 ° C., and the main part is composed of a sintered body of a copper-chromium alloy obtained by this. ..
【００２１】本発明によるこの電極１３,１４の製造方
法の一例を以下に記すと、銅に対して２０重量％の割合
のクロムを有するアトマイズ粉末（粒径が１５０μｍ以
下でクロムの平均粒径が３.５μｍ）を長さが１７０mm
で外径が７０mm、肉厚が３mmの軟鋼製カプセルに充填し
た後、この軟鋼製カプセルを９５０℃にて熱間押出加工
し、直径を４５mmに絞って内部のアトマイズ粉末を焼結
一体化した。次いで、カプセル部分を除去すべくこれを
長さが１６０mmで直径が３６mmのビレットに加工した
後、図１に示す如き所定の電極形状に機械加工した。An example of a method of manufacturing the electrodes 13 and 14 according to the present invention will be described below. Atomized powder having a chromium content of 20% by weight relative to copper (having a particle diameter of 150 μm or less and an average particle diameter of chromium of less than 150 μm) Length of 3.5mm) is 170mm
After filling into a mild steel capsule having an outer diameter of 70 mm and a wall thickness of 3 mm, the mild steel capsule was hot extruded at 950 ° C., the diameter was reduced to 45 mm, and the atomized powder inside was sintered and integrated. .. Then, in order to remove the capsule portion, this was processed into a billet having a length of 160 mm and a diameter of 36 mm, and then machined into a predetermined electrode shape as shown in FIG.
【００２２】このようにして得られたクロムが２０重量
％含まれる銅−クロム合金中に占めるクロムの平均粒径
は１０μｍでその粒径の分布幅も狭く、均一に分散して
いることを確認した。又、その導電率（ＩＡＣＳ）は６
０％であり、密度充填率は９９％であった。なお、この
密度充填率は単位体積当たりの銅−クロム合金の実際の
質量を、気泡等を含まない理想的な銅−クロム合金にお
ける単位体積当たりの理論的な質量で除算し、これに１
００を乗算した値である。It was confirmed that the average particle size of chromium in the copper-chromium alloy containing 20% by weight of the thus obtained chromium was 10 μm, the distribution width of the particle size was narrow, and the particles were uniformly dispersed. did. Also, its conductivity (IACS) is 6
It was 0% and the density packing rate was 99%. The density packing ratio is obtained by dividing the actual mass of the copper-chromium alloy per unit volume by the theoretical mass per unit volume of an ideal copper-chromium alloy containing no bubbles and the like.
It is a value obtained by multiplying by 00.
【００２３】この銅−クロム合金を所定の電極形状に機
械加工し、図１に示す真空インタラプタに組み込んで従
来のものと比較した結果、クロムが均一に分散されてい
ることにより、発生したアークの拡散がスムーズに行わ
れ、しゃ断性能が向上したことが判った。又、クロムの
微細化に伴って接触抵抗が低下し、これに伴って耐溶着
力も低下させることができた。This copper-chromium alloy was machined into a predetermined electrode shape and was incorporated into the vacuum interrupter shown in FIG. 1 and compared with the conventional one. As a result, it was found that chromium was uniformly dispersed and arc generated It was found that the diffusion was performed smoothly and the blocking performance was improved. Further, the contact resistance was lowered with the miniaturization of chromium, and the welding resistance could be lowered accordingly.
【００２４】[0024]
【発明の効果】本発明の電極材料の製造方法によると、
アトマイズ法により得られる銅−クロム合金の微粉末を
１０００℃以下で溶融しない軟質の金属製の容器に充填
し、この容器毎９５０±５０℃の加熱温度にて熱間押出
加工を行った後、前記容器の部分を除去するようにした
ので、銅マトリックス中に微細な粒径のクロムが均一に
分散した高品質の銅−クロム合金を得ることができ、従
来の焼結冶金法等による銅−クロム合金と比べて、しゃ
断電流値や接触抵抗値、或いは耐溶着性等の優れた電極
材料を提供することができる。According to the method for producing an electrode material of the present invention,
The copper-chromium alloy fine powder obtained by the atomizing method is filled in a soft metal container that does not melt at 1000 ° C. or less, and hot extrusion is performed at a heating temperature of 950 ± 50 ° C. for each container, Since the container portion is removed, it is possible to obtain a high quality copper-chromium alloy in which chromium having a fine particle size is uniformly dispersed in a copper matrix, and copper by a conventional sintering metallurgy method is used. It is possible to provide an electrode material having excellent breaking current value, contact resistance value, welding resistance, etc., as compared with a chromium alloy.
【図１】真空インタラプタの一例を表す断面図である。FIG. 1 is a cross-sectional view showing an example of a vacuum interrupter.
１１,１２はリード棒、１３,１４は電極である。 Reference numerals 11 and 12 are lead rods, and 13 and 14 are electrodes.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 深井 利真 東京都品川区大崎二丁目１番17号 株式会 社明電舍内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshina Fukai 2-1-1-17 Osaki, Shinagawa-ku, Tokyo Stock Exchange
Claims (1)
との合金微粉末を１０００℃以下で溶融しない軟質の金
属製の容器に充填し、この容器毎９５０±５０℃の加熱
温度にて熱間押出加工を行った後、前記容器の部分を除
去するようにしたことを特徴とする電極材料の製造方
法。1. An alloy fine powder of copper and chromium obtained by an atomizing method is filled in a soft metal container that does not melt at 1000 ° C. or less, and each container is hot-heated at a heating temperature of 950 ± 50 ° C. A method for producing an electrode material, characterized in that after the extrusion processing, a portion of the container is removed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3257681A JP3067318B2 (en) | 1991-10-04 | 1991-10-04 | Manufacturing method of electrode material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3257681A JP3067318B2 (en) | 1991-10-04 | 1991-10-04 | Manufacturing method of electrode material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05101750A true JPH05101750A (en) | 1993-04-23 |
| JP3067318B2 JP3067318B2 (en) | 2000-07-17 |
Family
ID=17309630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3257681A Expired - Lifetime JP3067318B2 (en) | 1991-10-04 | 1991-10-04 | Manufacturing method of electrode material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3067318B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002070762A1 (en) * | 2001-03-06 | 2002-09-12 | Kiyohito Ishida | Member having separation structure and method for manufacture thereof |
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| CA131031S (en) | 2008-12-18 | 2010-07-30 | Tomy Co Ltd | Toy top |
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| CA132315S (en) | 2009-04-20 | 2010-05-03 | Tomy Co Ltd | Toy top |
| USD629469S1 (en) | 2009-09-28 | 2010-12-21 | Tomy Company, Ltd. | Toy top |
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| CA134562S (en) | 2009-11-26 | 2010-10-22 | Tomy Co Ltd | Toy top |
| CA135269S (en) | 2009-12-26 | 2011-05-12 | Tomy Co Ltd | Toy top |
| TWD141542S1 (en) | 2010-04-15 | 2011-07-11 | 多美股份有限公司 | Winder for toy top spinners |
| USD646729S1 (en) | 2010-07-14 | 2011-10-11 | Tomy Company, Ltd. | Toy top |
| USD660918S1 (en) | 2010-07-14 | 2012-05-29 | Tomy Company, Ltd. | Toy top |
| JP3164823U (en) | 2010-10-06 | 2010-12-16 | 株式会社タカラトミー | Top toy launcher |
| JP5793631B1 (en) | 2015-03-27 | 2015-10-14 | 株式会社タカラトミー | Top toy |
-
1991
- 1991-10-04 JP JP3257681A patent/JP3067318B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002070762A1 (en) * | 2001-03-06 | 2002-09-12 | Kiyohito Ishida | Member having separation structure and method for manufacture thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3067318B2 (en) | 2000-07-17 |
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