Radiopaque resists for two-photon lithography to enable submicron 3D imaging of polymer parts via X-ray computed tomography
ACS applied materials & interfaces, Jan 24, 2017
Two-photon lithography (TPL) is high-resolution additive manufacturing (AM) technique capable of ... more Two-photon lithography (TPL) is high-resolution additive manufacturing (AM) technique capable of producing arbitrarily complex 3D micro-structures with features two to three orders of magnitude finer than a human hair. This process finds numerous applications as a direct route towards the fabrication of novel optical and mechanical metamaterials, miniaturized optics, microfluidics, biological scaffolds and various other intricate 3D parts. As TPL matures, metrology and inspection become a crucial step in the manufacturing process to ensure that the geometric form of the end-product meets design specifications. X-ray based computed tomography (CT) is a non-destructive technique that can provide this inspection capability for evaluation of complex internal 3D structure. However, polymeric photoresists commonly used for TPL, as well as other forms of stereolithography, poorly attenuate X-rays due to the low atomic number (Z) of their constituent elements and therefore appear relatively...
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Papers by Juergen Biener