Tip-based nanofabrication

Nanofluidic channels have promising applications in biomolecule manipulation and sensing. While several different methods of fabrication have been demonstrated for nanofluidic channels, a rapid, low-cost fabrication method that can fabricate arbitrary shapes of nanofluidic channels is still in demand. Here, we report a tip-based nanofabrication (TBN) method for fabricating nanofluidic channels using a heated atomic force microscopy (AFM) tip. The heated AFM tip deposits polymer nanowires where needed to serve as etch mask to fabricate silicon molds through one step of etching. PDMS nanofluidic channels are easily fabricated through replicate molding using the silicon molds. Various shapes of nanofluidic channels with either straight or curvilinear features are demonstrated. The width of the nanofluidic channels is 500 nm, and is determined by the deposited polymer nanowire width. The height of the channel is 400 nm determined by the silicon etching time. Ion conductance measurement ...

In this paper, we propose an approach to enable the use of low power femtosecond laser in tip-based nanofabrication (TBN) without thermal damage. One major challenge in laser-assisted TBN is in maintaining precision control of the tip-surface positioning throughout the fabrication process. An advanced iterative learning control technique is exploited to overcome this challenge in achieving high-quality patterning of arbitrary shape on a metal surface. The experimental results are analyzed to understand the ablation mechanism involved. Specifically, the near-field radiation enhancement is examined via the surface-enhanced Raman scattering effect, and it was revealed the near-field enhanced plasma-mediated ablation. Moreover, silicon nitride tip is utilized to alleviate the adverse thermal damage. Experiment results including line patterns fabricated under different writing speeds and an "R" pattern are presented. The fabrication quality with regard to the line width, depth, and uniformity is characterized to demonstrate the efficacy of the proposed approach.

With the technological advancement in micro-electro-mechanical systems (MEMS), microfabrication processes along with digital electronics together have opened novel avenues to the development of small-scale smart sensing devices capable of improved sensitivity with a lower cost of fabrication and relatively small power consumption. This article aims to provide the overview of the recent work carried out on the fabrication methodologies adopted to develop silicon based resonant sensors. A detailed discussion has been carried out to understand critical steps involved in the fabrication of the silicon-based MEMS resonator. Some challenges starting from the materials selection to the final phase of obtaining a compact MEMS resonator device for its fabrication have also been explored critically.

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

The widespread use of nanotechnology in different application fields, resulting in the integration of nanostructures in a plethora of devices, has addressed the research toward novel and easy-to-setup nanofabrication techniques to realize nanostructures with high spatial resolution and reproducibility. Owing to countless applications in molecular electronics, data storage, nanoelectromechanical, and systems for the Internet of Things, in recent decades, the scientific community has focused on developing methods suitable for nanopattern polymers. To this purpose, Atomic Force Microscopy-based nanolithographic techniques are effective methods that are relatively less complex and inexpensive than equally resolute and accurate techniques, such as Electron Beam lithography and Focused Ion Beam lithography. In this work, we propose an evolution of nanoindentation, named Pulse-Atomic Force Microscopy, to obtain continuous structures with a controlled depth profile, either constant or varia...

An experimental MEMS paddle resonator was made using focused ion beam (FIB) fabrication from a 200-nm-thick silicon nitride membrane and investigated using a laser vibrometer for resonant frequency detection. The fundamental mode was found to be torsional, as required, with resonant frequency of 1.38 MHz and Q of 1070 at a test pressure of 20µbar. The mass sensitivity was 55ag/Hz, close to the results of analytical and FEA modelling, demonstrating proof of principle.

Nanomechanical resonators based on nanowires and nanotubes have emerged as promising candidates for mass sensors 1-6 . When the resonator is clamped at one end and the atoms or molecules being measured land on the other end (which is free to vibrate), the resonance frequency of the device decreases by an amount that is proportional to the mass of the atoms or molecules. However, deposition on the free end is a situation not frequently found, and many biomolecules have sizes that are comparable to the size of the resonator, so the relationship between the added mass and the frequency shift breaks down 7-10 . Moreover, whereas a resonator fabricated by top-down methods can vibrate in just one dimension because it is shaped like a diving board, a perfectly axisymmetric one-dimensional nanoresonator such as a nanowire or nanotube can support vibrations with same amplitude and frequency in two dimensions 11 . Here we propose a new approach to mass sensing and stiffness spectroscopy based on the fact that a molecule landing on a such a nanoresonator will break this symmetry and the vibration will become a superposition of two orthogonal vibrations with different frequencies. The measurement of the frequency degeneration breakage enables the determination of the adsorbate's mass and stiffness, and the azimuthal direction from which the adsorbate arrives. We experimentally demonstrate such sensing paradigm with resonant silicon nanowires, which serves to add kPa resolution in Young's modulus determination to their zeptogram mass sensitivity.

A comprehensive theoretical analysis of photo-induced forces in an illuminated nanojunction, formed between an atomic force microscopy tip and a sample, is presented. The formalism is valid within the dipolar approximation and includes multiple scattering effects between the tip, sample and a planar substrate through a dyadic Green's function approach. This physically intuitive description allows a detailed look at the quantitative contribution of multiple scattering effects to the measured photo-induced force, effects that are typically unaccounted for in simpler analytical models. Our findings show that the presence of the planar substrate and anisotropy of the tip have a substantial effect on the magnitude and the spectral response of the photo-induced force exerted on the tip. Unlike previous models, our calculations predict photo-induced forces that are within range of experimentally measured values in photo-induced force microscopy (PiFM) experiments.

The widespread use of nanotechnology in different application fields, resulting in the integration of nanostructures in a plethora of devices, has addressed the research toward novel and easy-to-setup nanofabrication techniques to realize nanostructures with high spatial resolution and reproducibility. Owing to countless applications in molecular electronics, data storage, nanoelectromechanical, and systems for the Internet of Things, in recent decades, the scientific community has focused on developing methods suitable for nanopattern polymers. To this purpose, Atomic Force Microscopy-based nanolithographic techniques are effective methods that are relatively less complex and inexpensive than equally resolute and accurate techniques, such as Electron Beam lithography and Focused Ion Beam lithography. In this work, we propose an evolution of nanoindentation, named Pulse-Atomic Force Microscopy, to obtain continuous structures with a controlled depth profile, either constant or varia...

Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope (SNOM). A laser diode with a wavelength of 450 nm and a power of 250 mW as the light source and an aluminum coated nanoprobe with a 70 nm aperture at the tip apex have been employed. A neutral density filter has been used to control the exposure power of the photoresist. It is found that the changes induced by light in the photoresist can be detected by in situ shear force microscopy (ShFM), before the development of the photoresist. Scanning electron microscope (SEM) images of the developed photoresist have been used to optimize the scanning speed and the power required for exposure, in order to minimize the final line width. It is shown that nanometric lines with a minimum width of 33 nm can be achieved with a scanning speed of 75 m/s and a laser power of 113 mW. It is also revealed that the overexposure of the photoresist by continuous wave laser generated heat can be prevented by means of proper photoresist selection. In addition, the effects of multiple exposures of nanopatterns on their width and depth are investigated.

The trend of integrating nanostructure to elevate the MEMS capability is becoming a trend in microelectronic sensor field. Critical functional element of sensors in the scale of 10-6 and 10-9 m in any dimension being incorporated with appropriate nanostructure as part of the sensor systems through two basic approaches: topdown and bottom up. The techniques and methods of both approaches will be explicitly discussed to provide a strong fundamental understanding and overview of the nanostructure fabrication and development process. The significant factors that influence the structure will be revealed as well as the potential application area and limitations of such structure. On top of that, examples of the established integration of nanostructure in MEMS will also be presented. In the conclusions, this paper will emphasize the promising and potential of nanostructure function in the developing ultra sensitive and exceptional accuracy MEMS sensor to reconcile with the future requirements.

The authors report fabrication of arbitrary shapes of silicon and silicon oxide nanostructures using tip-based nanofabrication (TBN). A heated atomic force microscope (AFM) tip deposits molten polymer on a substrate to form polymer nanostructures that serve as etch mask to fabricate silicon or silicon oxide nanostructures. The authors demonstrate how TBN can be combined with conventional wet etching as well as metal-assisted chemical etching, in order to fabricate these nanostructures. The size of the TBN-fabricated silicon nanostructures is around 200 nm. Silicon nanostructures fabricated using metal-assisted chemical etch can have very smooth sidewalls with, roughness as small as 2 nm. The authors show fabrication of arbitrary shapes of silicon and silicon oxide nanostructures including those with curved and circular shapes. Our results show that TBN using a heated AFM tip can function as an additive nanolithography technique with minimum contamination, and is compatible with existing nanofabrication methods.

This paper reports on a low-cost top-down approach to the nano-precision fabrication of nanobeams on single-crystalline silicon using only conventional micromachining technology. The fabrication technique takes advantage of the crystalline structure of silicon for controllable feature size reduction of nanobeams with atomically smooth surfaces and sharp edges. Applying a deliberate rotational misalignment in a 2 μm resolution standard lithography process, followed by anisotropic wet etching of the silicon, nanobeams with well uniform widths as small as ∼85 nm are fabricated on thin SOI substrates. As a proof of concept for the incorporation of such nanobeams within electromechancial structures, we successfully demonstrate thermally actuated resonators that show very high frequencies (close to 50 MHz).

1995 2000 2005 2010 2015 2020 1 ... C h a ra cte ristic L ... MPU High Performance CMOS Gate Length - Printed MPU High Performance CMOS Gate Length - Physical ... Z. Moktadir, S. Boden, H. Mizuta and H. Rutt, University of Southampton, School of Electronics and ...

The process of tip-enhanced Raman scattering (TERS) depends critically on the morphology near the apex of the tip used in the experiment. Many tip designs have focused on optimization of electromagnetic enhancement in the near-field, which is controlled to a large extent by subtle details at the nanoscale that remain difficult to reproduce in the tip fabrication process. The use of focused ion beams (FIB) permit modification of larger features on the tip in a reproducible manner, yet this approach cannot produce sub-20-nm structures important for optimum near-field enhancement. Nonetheless, FIB milling offers excellent opportunities for improving the far-field radiation properties of the tip-antenna, a feature that has received relatively little attention in the TERS research community. In this work, we use finite-difference time-domain (FDTD) simulations to study both the near-field and far-field radiation efficiency of several tip-antenna systems that can be constructed with FIB techniques in a feasible manner. Starting from blunt etched tips, we find that excellent overall enhancement of the TERS signal can be obtained with pillar-type tips. Furthermore, by applying vertical grooves on the tip's shaft, the overall efficiency can be improved even more, producing TERS signals that are up to 10-fold stronger than signals obtained from an ideal (unmodified) sharp tip of 10-nm radius. The proposed designs constitute a feasible route toward a tip fabrication process that not only yields more reproducible tips but also promises much stronger TERS signals.

Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates.

We present the fabrication, operation, and CMOS integration of arrays of suspended silicon nanowires (SiNWs). The functional structures are obtained by a top-down fabrication approach consisting in a resistless process based on focused ion beam irradiation, causing local gallium implantation and silicon amorphization, plus selective silicon etching by tetramethylammonium hydroxide, and a thermal annealing process in a boron rich atmosphere. The last step enables the electrical functionality of the irradiated material. Doubly clamped silicon beams are fabricated by this method. The electrical readout of their mechanical response can be addressed by a frequency down-mixing detection technique thanks to an enhanced piezoresistive transduction mechanism. Three specific aspects are discussed: i) the engineering of mechanically coupled SiNWs, by making use of the nanometer scale overhang that it is inherently-generated with this fabrication process, ii) the statistical distribution of pat...

One-dimensional nanomechanical resonators based on nanowires and nanotubes have emerged as promising candidates for mass sensors 1-6 . When the resonator is clamped at one end and the atoms or molecules being measured land on the other end (which is free to vibrate), the resonance frequency of the device decreases by an amount that is proportional to the mass of the atoms or molecules. However, atoms and molecules can land at any position along the resonator, and many biomolecules have sizes that are comparable to the size of the resonator, so the relationship between the added mass and the frequency shift breaks down 7-10 . Moreover, whereas resonators fabricated by top-down methods tend to vibrate in just one dimension because they are usually shaped like diving boards, perfectly axisymmetric one-dimensional nanoresonators can support flexural vibrations with the same amplitude and frequency in two dimensions 11 . Here, we propose a new approach to mass sensing and stiffness spectroscopy based on the fact that the nanoresonator will enter a superposition state of two orthogonal vibrations with different frequencies when this symmetry is broken. Measuring these frequencies allows the mass, stiffness and azimuthal arrival direction of the adsorbate to be determined.

One-dimensional nanomechanical resonators based on nanowires and nanotubes have emerged as promising candidates for mass sensors 1-6 . When the resonator is clamped at one end and the atoms or molecules being measured land on the other end (which is free to vibrate), the resonance frequency of the device decreases by an amount that is proportional to the mass of the atoms or molecules. However, atoms and molecules can land at any position along the resonator, and many biomolecules have sizes that are comparable to the size of the resonator, so the relationship between the added mass and the frequency shift breaks down 7-10 . Moreover, whereas resonators fabricated by top-down methods tend to vibrate in just one dimension because they are usually shaped like diving boards, perfectly axisymmetric one-dimensional nanoresonators can support flexural vibrations with the same amplitude and frequency in two dimensions 11 . Here, we propose a new approach to mass sensing and stiffness spectroscopy based on the fact that the nanoresonator will enter a superposition state of two orthogonal vibrations with different frequencies when this symmetry is broken. Measuring these frequencies allows the mass, stiffness and azimuthal arrival direction of the adsorbate to be determined.

Recent developments of tip-based nanofabrication (TBN) are reviewed. In TBN, a functionalized cantilevered-tip is the common basic apparatus for performing the tasks of nanofabrication. The nanofabrication applications of three major techniques under the TBN family: atomic force microscopy (AFM), dip-pen nanolithography (DPN), and scanning near-field optical microscopy (SNOM), are studied with the focus on their manipulability over the size, orientation, and position of the nanostructures fabricated. The nanostructures made by these techniques are selectively presented in order to illustrate the versatility and advancement of these tip-based techniques. The information reviewed and illustrated is extrapolated to form the basis for the assessment of the needs and challenges facing the TBN community in the future. A preliminary roadmap over the next seven years is then developed. The prospective approaches and focusing areas for future research and development are also discussed.

The authors report fabrication of arbitrary shapes of silicon and silicon oxide nanostructures using tip-based nanofabrication (TBN). A heated atomic force microscope (AFM) tip deposits molten polymer on a substrate to form polymer nanostructures that serve as etch mask to fabricate silicon or silicon oxide nanostructures. The authors demonstrate how TBN can be combined with conventional wet etching as well as metal-assisted chemical etching, in order to fabricate these nanostructures. The size of the TBN-fabricated silicon nanostructures is around 200 nm. Silicon nanostructures fabricated using metal-assisted chemical etch can have very smooth sidewalls with, roughness as small as 2 nm. The authors show fabrication of arbitrary shapes of silicon and silicon oxide nanostructures including those with curved and circular shapes. Our results show that TBN using a heated AFM tip can function as an additive nanolithography technique with minimum contamination, and is compatible with existing nanofabrication methods.

We present measurements on nanoelectromechanical systems fabricated in semiconductor materials suited for operating frequencies in the radio band. We demonstrate how to achieve parametric frequency tuning of nanoelectromechanical resonators required for radio frequency sensor and communication applications.

The newly emerging field of carbonbased MEMS (C-MEMS) attempts to utilize the diverse properties of carbon to push the performance of MEMS devices beyond what is currently achievable. Our design employs a carbon-carbon composite using nano-materials to build a new class of MEMS accelerometer that is hyper-sensitive over a dynamic range from micro-G to hundreds of G's -far surpassing the capabilities of currently available commercial MEMS accelerometers. Validating single cantilever beams of a 10:1 aspect ratio has shown only a 2% error from predicted to actual deflection calculations, while a clamped-clamped U-beam with 5% multiwalled carbon nanotubes describes a nearly 30% increase in Young's modulus and begins demonstrating tunable material properties through nano-material loading in MEMS devices.

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on ptype (10 15 cm -3 ) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.

We study optical back-action effects associated with confined electromagnetic modes in silicon nanowire resonators interacting with a laser beam used for interferometric read-out of the nanowire vibrations. Our analysis describes the resonance frequency shift produced in the nanowires by two different mechanisms: the temperature dependence of the nanowire's Young's modulus and the effect of radiation pressure. We find different regimes in which each effect dominates depending on the nanowire morphology and dimensions, resulting in either positive or negative frequency shifts. Our results also show that in some cases bolometric and radiation pressure effects can have opposite contributions so that their overall effect is greatly reduced. We conclude that Si nanowire resonators can be engineered for harnessing back-action effects for either optimizing frequency stability or exploiting dynamic phenomena such as parametric amplification.

One-dimensional nanomechanical resonators based on nanowires and nanotubes have emerged as promising candidates for mass sensors 1-6 . When the resonator is clamped at one end and the atoms or molecules being measured land on the other end (which is free to vibrate), the resonance frequency of the device decreases by an amount that is proportional to the mass of the atoms or molecules. However, atoms and molecules can land at any position along the resonator, and many biomolecules have sizes that are comparable to the size of the resonator, so the relationship between the added mass and the frequency shift breaks down 7-10 . Moreover, whereas resonators fabricated by top-down methods tend to vibrate in just one dimension because they are usually shaped like diving boards, perfectly axisymmetric one-dimensional nanoresonators can support flexural vibrations with the same amplitude and frequency in two dimensions 11 . Here, we propose a new approach to mass sensing and stiffness spectroscopy based on the fact that the nanoresonator will enter a superposition state of two orthogonal vibrations with different frequencies when this symmetry is broken. Measuring these frequencies allows the mass, stiffness and azimuthal arrival direction of the adsorbate to be determined.

The Dip-Pen Nanolithography (DPN) process uses a chemically coated scanning probe tip (the "pen") to directly deposit a material ("ink") with nanometer precision onto a substrate. Several experimental parameters have been observed to influence the ink transport in DPN. Among these, viscosity and density of the ink are the two important parameters which play a crucial role in ink transport in DPN. It is necessary to understand and control these parameters in order to optimize DPN processes for a particular application. Here we report on studies employing Atomic Force Microscopy (AFM) to measure the viscosity of DOPC used as ink for DPN. It is difficult to measure the viscosity of this ink using standard processes of measuring viscosity because the DOPC is not dissolved into some organic solution while writing. Therefore, we have employed the shift in resonance frequency of a vibrating cantilever in air and in DOPC to measure the viscosity of the DOPC ink as used in DPN.

One-dimensional nanomechanical resonators based on nanowires and nanotubes have emerged as promising candidates for mass sensors 1-6 . When the resonator is clamped at one end and the atoms or molecules being measured land on the other end (which is free to vibrate), the resonance frequency of the device decreases by an amount that is proportional to the mass of the atoms or molecules. However, atoms and molecules can land at any position along the resonator, and many biomolecules have sizes that are comparable to the size of the resonator, so the relationship between the added mass and the frequency shift breaks down 7-10 . Moreover, whereas resonators fabricated by top-down methods tend to vibrate in just one dimension because they are usually shaped like diving boards, perfectly axisymmetric one-dimensional nanoresonators can support flexural vibrations with the same amplitude and frequency in two dimensions 11 . Here, we propose a new approach to mass sensing and stiffness spectroscopy based on the fact that the nanoresonator will enter a superposition state of two orthogonal vibrations with different frequencies when this symmetry is broken. Measuring these frequencies allows the mass, stiffness and azimuthal arrival direction of the adsorbate to be determined.

NEMS or nano electro mechanical systems are similar to MEMS or micro electro mechanical systems but smaller. They hold promise to improve abilities to measure small displacements and forces at a molecular scale, and are related scale. Nanoelectromechanical systems, or NEMS, are MEMS scaled to submicron dimensions . In this size regime, it is possible to attain extremely high fundamental frequencies while simultaneously preserving very high mechanical responsivity (small force constants). This powerful combination of attributes translates directly into high force sensitivity, operability at ultralow power, and the ability to induce usable nonlinearity with quite modest control forces. The possibility of simple, low cost fabrication, made possible by developments in Nano Imprint Lithography (NIL). This paper discusses the manufacturing aspects of NEMS considering the latest trends in miniaturization with the attention on materials used for nanoscale components. Further it overviews the current applications in the engineering, military, medical applications. The paper also gives the various design aspects like modeling, characterization, simulation, and control for some of the applications along with the packaging aspects nanoscale systems and its components. This paper also provides the environmental impacts of Nano Electro Mechanical Systems.

The authors report fabrication of arbitrary shapes of silicon and silicon oxide nanostructures using tip-based nanofabrication (TBN). A heated atomic force microscope (AFM) tip deposits molten polymer on a substrate to form polymer nanostructures that serve as etch mask to fabricate silicon or silicon oxide nanostructures. The authors demonstrate how TBN can be combined with conventional wet etching as well as metal-assisted chemical etching, in order to fabricate these nanostructures. The size of the TBN-fabricated silicon nanostructures is around 200 nm. Silicon nanostructures fabricated using metal-assisted chemical etch can have very smooth sidewalls with, roughness as small as 2 nm. The authors show fabrication of arbitrary shapes of silicon and silicon oxide nanostructures including those with curved and circular shapes. Our results show that TBN using a heated AFM tip can function as an additive nanolithography technique with minimum contamination, and is compatible with existing nanofabrication methods.

We report fabrication of silicon nano-mechanical resonators where the key nanolithography step is performed by using tip-based nanofabrication (TBN). Specifically, a heated atomic force microscope tip deposited polystyrene nanowires that were used together with a lithographically patterned aluminum to serve as an etch mask for silicon resonators their anchors. Using this nanofabrication technique, we demonstrate the fabrication of different types of silicon nano-mechanical resonator devices, including those that are either singly or doubly clamped and having either straight or curvilinear features. Typical dimensions for the width and thickness of these devices is in the range of several hundred nanometers. We characterized the mechanical resonance properties of these devices by using laser Doppler vibrometry and compared the measured response with finite element simulations. Typical resonance frequency values ranged from 1 to 3 MHz and typical quality factor values ranged from 100 to 150. The combination of TBN along with conventional microfabrication processes could help to realize new types of nano-devices.