WO2026066469A1 - Hall current sensor and preparation method therefor - Google Patents

Hall current sensor and preparation method therefor

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Publication number
WO2026066469A1
WO2026066469A1 PCT/CN2025/106366 CN2025106366W WO2026066469A1 WO 2026066469 A1 WO2026066469 A1 WO 2026066469A1 CN 2025106366 W CN2025106366 W CN 2025106366W WO 2026066469 A1 WO2026066469 A1 WO 2026066469A1
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current
frame
hall
magnetic concentrator
region
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French (fr)
Chinese (zh)
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文忠
朱忻
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Matrix Opto Co Ltd
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Matrix Opto Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R15/00Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
    • G01R15/14Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
    • G01R15/20Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
    • G01R15/202Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using Hall-effect devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0092Measuring current only
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Hall/Mr Elements (AREA)

Abstract

A Hall current sensor and a preparation method therefor, which relate to the technical field of sensors. The method comprises: preparing a substrate (1), wherein the substrate (1) has a first region (11) and a second region (12), the thickness of the substrate (1) corresponding to the first region (11) is greater than the thickness of the substrate (1) corresponding to the second region (12); cutting the substrate (1) to form a frame (2), wherein the frame (2) comprises a current-carrying pin frame (21) formed in the first region (11) and a signal pin (22) formed in the second region (12); providing, at one end of the signal pin (22), a Hall chip (3) that is electrically connected to the signal pin (22); providing a magnetic concentrator (4) on the current-carrying pin frame (21), such that the magnetic concentrator (4) covers the Hall chip (3); and performing injection molding processing on the region of the magnetic concentrator (4) in the frame (2), so as to encapsulate the magnetic concentrator (4), the Hall chip (3), a portion of the current-carrying pin frame (21) and a portion of the signal pin (22). The substrate (1) having different thicknesses is used, and the frame (2) comprising the current-carrying pin frame (21) and the signal pin (22) is formed in a single cutting operation, thereby meeting the production requirements of one-shot injection molding of high-current Hall sensors, improving the accuracy of the relative position between the current-carrying pin frame (21) and the Hall chip (3), and saving on the costs.

Description

霍尔电流传感器及其制备方法Hall current sensor and its fabrication method

相关申请的交叉引用Cross-references to related applications

本申请要求于2024年9月27日提交中国专利局的申请号为2024113587898、名称为“霍尔电流传感器及其制备方法”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to Chinese Patent Application No. 2024113587898, filed on September 27, 2024, entitled "Hall Current Sensor and Method for Fabrication Thereof", the entire contents of which are incorporated herein by reference.

技术领域Technical Field

本申请涉及传感器技术领域,具体涉及一种霍尔电流传感器及其制备方法。This application relates to the field of sensor technology, specifically to a Hall current sensor and its fabrication method.

背景技术Background Technology

目前市场上集成的霍尔电流传感器包括小电流传感器和大电流传感器,其中,大电流传感器使用较广泛,它的工作原理是:当载流引脚框中有电流通过时,会在其周围产生一个磁场,套设在载流引脚框上的磁集中器将磁场聚集起来,最后通过镶嵌于磁集中器中间的霍尔芯片来检测磁场强度大小,之后信号引脚输出信号,达到检测载流引脚框中电流大小的目的。Currently, integrated Hall current sensors on the market include small current sensors and large current sensors. Among them, large current sensors are more widely used. Their working principle is as follows: when current flows through the current-carrying pin frame, a magnetic field is generated around it. The magnetic concentrator set on the current-carrying pin frame concentrates the magnetic field. Finally, the Hall chip embedded in the middle of the magnetic concentrator detects the magnitude of the magnetic field strength. Then, the signal pin outputs a signal to achieve the purpose of detecting the magnitude of the current in the current-carrying pin frame.

大电流传感器制造方法通常是:首先加工载流引脚框,然后手动或自动套入磁集中器,再将封装好的霍尔芯片与信号引脚组装后安装于磁集中器内,最后将载流引脚框、磁集中器和霍尔芯片包覆在一起。The manufacturing method of high current sensors is usually as follows: First, the current-carrying pin frame is processed, then the magnetic concentrator is manually or automatically fitted in, then the packaged Hall chip and signal pins are assembled and installed in the magnetic concentrator, and finally the current-carrying pin frame, magnetic concentrator and Hall chip are wrapped together.

但是,在这个制造过程中,组装霍尔芯片与信号引脚时会进行第一次注塑,包覆载流引脚框、磁集中器和霍尔芯片时会进行第二次注塑;也即生产工艺流程存在两次注塑过程,制造周期长,工艺步骤繁琐,而且需要投入两套注塑模具,模具成本较高;此外在霍尔芯片和信号引脚安装于磁集中器的过程中,载流引脚框和霍尔芯片相对位置容易产生较大误差,使得霍尔芯片里面的霍尔敏感元件与载流引脚框位置产生偏差,进而影响产品性能。However, in this manufacturing process, the first injection molding is performed when assembling the Hall chip and signal pins, and the second injection molding is performed when covering the current-carrying pin frame, magnetic concentrator, and Hall chip. That is, there are two injection molding processes in the production process, which makes the manufacturing cycle long, the process steps cumbersome, and requires the investment of two sets of injection molds, resulting in high mold costs. In addition, during the process of installing the Hall chip and signal pins into the magnetic concentrator, the relative position of the current-carrying pin frame and the Hall chip is prone to large errors, causing the Hall sensing element inside the Hall chip to deviate from the position of the current-carrying pin frame, thus affecting the product performance.

申请内容Application content

有鉴于此,本申请提供了一种霍尔电流传感器及其制备方法,以解决现有大电流霍尔传感器存在两次注塑过程且载流引脚框和霍尔芯片相对位置容易出现偏差,进而影响生产效率和产品性能的问题。In view of this, this application provides a Hall current sensor and its fabrication method to solve the problem that existing high-current Hall sensors have two injection molding processes and the relative positions of the current-carrying pin frame and the Hall chip are prone to deviation, which in turn affects production efficiency and product performance.

第一方面,本申请提供了一种霍尔电流传感器的制备方法,包括:In a first aspect, this application provides a method for fabricating a Hall current sensor, comprising:

制备基材,基材具有第一区域和第二区域,第一区域对应基材的厚度大于第二区域对应基材的厚度;Prepare a substrate having a first region and a second region, wherein the thickness of the substrate corresponding to the first region is greater than the thickness of the substrate corresponding to the second region;

切割基材形成框架,框架包括在第一区域形成的载流引脚框,以及在第二区域形成的信号引脚;A frame is formed by cutting a substrate, the frame including a current-carrying pin frame formed in a first region and signal pins formed in a second region;

在信号引脚的一端设置霍尔芯片,霍尔芯片与信号引脚电连接;A Hall chip is placed at one end of the signal pin, and the Hall chip is electrically connected to the signal pin.

将磁集中器设置于载流引脚框上,使磁集中器覆盖霍尔芯片;Place the magnetic concentrator on the current-carrying pin frame so that the magnetic concentrator covers the Hall chip;

对框架内的磁集中器所在区域进行注塑处理,以封装磁集中器、霍尔芯片、部分载流引脚框以及部分信号引脚。The area containing the magnetic concentrator within the frame is injection molded to encapsulate the magnetic concentrator, Hall effect chip, part of the current-carrying pin frame, and part of the signal pins.

有益效果:本申请的霍尔电流传感器的制备方法,采用具有不同厚度的基材,通过一次切割成型包括载流引脚框和信号引脚的框架,满足载流引脚框和信号引脚对材料厚度的不同需求,进而满足大电流霍尔传感器一次注塑的生产需求,而且相较特制手工治具安装,框架一次成型还能够定位载流引脚框和信号引脚的相对位置,有助于提高载流引脚框和霍尔芯片相对位置的精度,提高产品一致性,霍尔芯片无需精准安装到载流引脚框,也即不需要额外定制霍尔芯片组装设备,有助于节约成本,简化工艺。Beneficial effects: The method for fabricating the Hall current sensor of this application uses substrates with different thicknesses and forms a frame including the current-carrying pin frame and the signal pin in one step by cutting and molding. This satisfies the different material thickness requirements of the current-carrying pin frame and the signal pin, thereby meeting the production requirements of high-current Hall sensors by one-step injection molding. Moreover, compared with the installation of specially made manual jigs, the one-step molding of the frame can also position the relative positions of the current-carrying pin frame and the signal pin, which helps to improve the accuracy of the relative positions of the current-carrying pin frame and the Hall chip, improve product consistency, and the Hall chip does not need to be precisely installed onto the current-carrying pin frame, that is, no additional customized Hall chip assembly equipment is required, which helps to save costs and simplify the process.

在一种可选的实施方式中,制备基材,包括:In one alternative embodiment, the preparation of the substrate includes:

提供第一初始基材,第一初始基材各处厚度一致;A first initial substrate is provided, wherein the thickness of the first initial substrate is uniform throughout;

对第一初始基材进行热轧,以形成第一区域和第二区域,第一区域对应基材的厚度小于等于第一初始基材的厚度。The first initial substrate is hot-rolled to form a first region and a second region, wherein the thickness of the substrate corresponding to the first region is less than or equal to the thickness of the first initial substrate.

有益效果:选用厚度大于或等于载流引脚框厚度的第一初始基材,诸如具有良好的热延展性的铜材,通过将第一初始基材热轧得到厚薄相间的基材,再通过机械冲压即可一次形成较厚的载流引脚框和较薄的信号引脚,制备简单便捷,有助于批量化制备。Beneficial effects: By selecting a first initial substrate with a thickness greater than or equal to the thickness of the current-carrying pin frame, such as copper with good thermal ductility, the first initial substrate is hot-rolled to obtain a substrate with alternating thick and thin layers. Then, a thicker current-carrying pin frame and a thinner signal pin can be formed in one step by mechanical stamping. The preparation is simple and convenient, which is conducive to mass production.

在一种可选的实施方式中,制备基材,包括:In one alternative embodiment, the preparation of the substrate includes:

提供第二初始基材;Provide a second initial substrate;

在第二初始基材的一端进行弯折处理;One end of the second initial substrate is bent.

将弯折的部分与第二初始基材进行堆叠固定,以在堆叠的区域形成第一区域,其余的区域为第二区域,第二区域对应基材的厚度与第二初始基材的厚度相等。The bent portion is stacked and fixed with the second initial substrate to form a first region in the stacked area, and the remaining area is the second region. The thickness of the substrate corresponding to the second region is equal to the thickness of the second initial substrate.

有益效果:选用厚度与较薄的信号引脚相同的第二初始基材,利用铜材的可塑性,将其在一端进行弯折并堆叠固定在原有的第二初始基材上,堆叠加厚的区域形成第一区域以成型载流引脚框,原有单层铜材的区域为第二区域以形成信号引脚。采用同一厚度的较薄铜材,不需要对铜材本身进行额外的工艺处理,弯折堆叠后即可形成厚薄不同的基材,而且堆叠加厚的部分电流内阻小,发热也小,有助于进一步降低功耗。Beneficial effects: By selecting a second initial substrate with the same thickness as the thinner signal pins, and utilizing the plasticity of copper, one end is bent and stacked onto the original second initial substrate. The thickened stacked area forms the first region to shape the current-carrying pin frame, while the original single-layer copper area forms the second region to shape the signal pins. Using thinner copper of the same thickness eliminates the need for additional processing of the copper itself; bending and stacking create substrates of varying thicknesses. Furthermore, the thickened stacked portion has lower current resistance and less heat generation, further contributing to reduced power consumption.

在一种可选的实施方式中,在第二初始基材的一端进行弯折处理包括:In one alternative embodiment, bending one end of the second initial substrate includes:

在第二初始基材的一端进行第一次弯折;The first bend is performed at one end of the second initial substrate;

将第一次弯折的部分进行第二次弯折,第二次弯折将第一次弯折的部分进行对折。The first bend is then folded a second time, and the second bend folds the first bend in half.

有益效果:将第二初始基材进行两次弯折,较厚的第一区域由三层第二初始基材组成,其中弯折的两层大小相等,较薄的第二区域由单层的第二初始基材组成,经过两次弯折形成具有两种厚度的基材,工艺简单易操作。Beneficial effects: The second initial substrate is bent twice. The thicker first region consists of three layers of the second initial substrate, of which the two bent layers are of equal size. The thinner second region consists of a single layer of the second initial substrate. The two bending processes form a substrate with two different thicknesses. The process is simple and easy to operate.

在一种可选的实施方式中,将弯折的部分与第二初始基材进行堆叠固定包括:采用铆接或者焊接的方式将弯折的部分与第二初始基材堆叠固定在一起。In one alternative embodiment, stacking and fixing the bent portion to the second initial substrate includes: stacking and fixing the bent portion to the second initial substrate together by riveting or welding.

有益效果:焊接可采用激光电焊,通过多点固定的方式形成具有不同厚度的稳定基材结构。Beneficial effects: Laser welding can be used to form stable substrate structures with different thicknesses through multi-point fixing.

在一种可选的实施方式中,磁集中器具有开口,载流引脚框呈现为U形;将磁集中器安装于载流引脚框上,使磁集中器覆盖霍尔芯片包括:In one alternative implementation, the magnetic concentrator has an opening, and the current-carrying pin frame is U-shaped; mounting the magnetic concentrator on the current-carrying pin frame such that the magnetic concentrator covers the Hall chip includes:

在载流引脚框靠近霍尔芯片的一端设置胶点;A glue dot is placed at one end of the current-carrying pin frame near the Hall chip;

将磁集中器放置于U形的载流引脚框内,磁集中器的开口朝向胶点所在一侧;Place the magnetic concentrator inside the U-shaped current-carrying pin frame, with the opening of the magnetic concentrator facing the side where the glue dot is located.

推动磁集中器由载流引脚框一侧朝向信号引脚一侧移动,以至少将霍尔芯片置于磁集中器的开口内;The magnetic concentrator is moved from the current-carrying pin frame side toward the signal pin side to at least place the Hall chip within the opening of the magnetic concentrator;

在胶点处将磁集中器固定在载流引脚框上。Secure the magnetic concentrator to the current-carrying pin frame at the glue dot.

有益效果:采用具有点胶、吸取和纵向推进功能的设备,通过自动化组装的方式将磁集中器精准推进固定于载流引脚框上,安装稳定快速,有助于批量化生产从而提高生产效率,降低成本。Beneficial effects: Using equipment with dispensing, suction and vertical advance functions, the magnetic concentrator is precisely pushed and fixed onto the current-carrying pin frame through automated assembly. The installation is stable and fast, which helps to improve production efficiency and reduce costs in mass production.

在一种可选的实施方式中,磁集中器的开口的高度L大于载流引脚框的厚度H,高度L与厚度H的差值范围为0.1mm~0.2mm。In one alternative implementation, the height L of the opening of the magnetic concentrator is greater than the thickness H of the current-carrying pin frame, and the difference between the height L and the thickness H ranges from 0.1 mm to 0.2 mm.

有益效果:设置磁集中器的开口高度与载流引脚框的厚度具有0.1mm~0.2mm的间距,便于安装磁集中器的同时不至于产生较大晃动,也能够确保在安装过程中,磁集中器有足够的冗余不会碰到霍尔芯片的焊线,进而提高磁集中器安装的精确性,从而提升产品性能一致性。Beneficial effects: Setting the opening height of the magnetic concentrator to have a gap of 0.1mm to 0.2mm between it and the thickness of the current-carrying pin frame facilitates the installation of the magnetic concentrator without causing excessive shaking. It also ensures that the magnetic concentrator has sufficient redundancy during installation and will not touch the bonding wires of the Hall chip, thereby improving the accuracy of the magnetic concentrator installation and thus enhancing the consistency of product performance.

在一种可选的实施方式中,框架还包括:连接载流引脚框和信号引脚的连接部,以限位载流引脚框和信号引脚的相对位置。In one alternative implementation, the frame further includes a connection portion that connects the current-carrying pin frame and the signal pin to limit the relative position of the current-carrying pin frame and the signal pin.

有益效果:在第一区域和第二区域设置连接部来连接载流引脚框和信号引脚,有效避免载流引脚框和信号引脚之间出现相对位移,进而保证霍尔芯片以及磁集中器的精准安装。Beneficial effects: The connection part is set in the first and second regions to connect the current-carrying pin frame and the signal pin, which effectively avoids relative displacement between the current-carrying pin frame and the signal pin, thereby ensuring the accurate installation of the Hall chip and the magnetic concentrator.

在一种可选的实施方式中,切割基材中,在第一区域形成多个载流引脚框,在第二区域形成相对应的多个信号引脚;In one alternative embodiment, in the cutting substrate, a plurality of current-carrying pin frames are formed in a first region, and a corresponding plurality of signal pins are formed in a second region;

对框架内磁集中器所在的区域进行注塑处理之后,还包括:After injection molding the area where the magnetic concentrator is located within the frame, the process also includes:

对框架的连接部进行切割,得到多个单独的霍尔电流传感器单元,任一霍尔电流传感器单元包括载流引脚框、磁集中器、霍尔芯片、信号引脚以及塑封结构;The connecting part of the frame is cut to obtain multiple individual Hall current sensor units. Each Hall current sensor unit includes a current-carrying pin frame, a magnetic concentrator, a Hall chip, a signal pin, and a plastic package structure.

对霍尔电流传感器单元中,载流引脚框远离磁集中器的一端进行弯折处理,对信号引脚远离磁集中器的一端进行弯折处理。In the Hall current sensor unit, the end of the current-carrying pin frame away from the magnetic concentrator is bent, and the end of the signal pin away from the magnetic concentrator is also bent.

第二方面,本申请还提供一种霍尔电流传感器,采用上述的霍尔电流传感器的制备方法制得,包括:载流引脚框、信号引脚、霍尔芯片、磁集中器和塑封结构,信号引脚与载流引脚框间隔设置,信号引脚的厚度小于载流引脚框的厚度;霍尔芯片设置于信号引脚靠近载流引脚框的一端,且与载流引脚框间隔设置,霍尔芯片与信号引脚电连接;磁集中器设置于载流引脚框靠近信号引脚的一端,磁集中器至少覆盖霍尔芯片;塑封结构设置于磁集中器所在位置,以封装磁集中器、霍尔芯片、部分载流引脚框以及部分信号引脚。Secondly, this application also provides a Hall current sensor, fabricated using the aforementioned method, comprising: a current-carrying pin frame, a signal pin, a Hall chip, a magnetic concentrator, and a plastic encapsulation structure. The signal pin is spaced apart from the current-carrying pin frame, and the thickness of the signal pin is less than the thickness of the current-carrying pin frame. The Hall chip is disposed at one end of the signal pin near the current-carrying pin frame and spaced apart from the current-carrying pin frame, and is electrically connected to the signal pin. The magnetic concentrator is disposed at one end of the current-carrying pin frame near the signal pin and at least covers the Hall chip. The plastic encapsulation structure is disposed at the location of the magnetic concentrator to encapsulate the magnetic concentrator, the Hall chip, part of the current-carrying pin frame, and part of the signal pin.

有益效果:本申请的霍尔电流传感器,具有不同厚度的载流引脚框和信号引脚通过一次切割成型,载流引脚框和信号引脚之间相对位置稳定,进而保证安装于信号引脚一端的霍尔芯片与载流引脚框之间相对位置的精准度,以及磁集中器安装的稳定性和精确性,提高产品一致性;同时塑封结构一次注塑完成封装,制备简单,且有助于节约成本。Beneficial effects: The Hall current sensor of this application has current-carrying pin frames and signal pins of different thicknesses that are cut and formed in one step. The relative position between the current-carrying pin frames and signal pins is stable, thereby ensuring the accuracy of the relative position between the Hall chip installed at one end of the signal pin and the current-carrying pin frame, as well as the stability and accuracy of the magnetic concentrator installation, and improving product consistency. At the same time, the plastic encapsulation structure completes the packaging in one injection molding, which is simple to manufacture and helps to save costs.

附图说明Attached Figure Description

为了更清楚地说明本申请具体实施方式或现有技术中的技术方案,下面将对具体实施方式或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图是本申请的一些实施方式,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。To more clearly illustrate the technical solutions in the specific embodiments of this application or the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

图1是本申请实施例的霍尔电流传感器的制备方法的流程示意图;Figure 1 is a schematic flowchart of the fabrication method of the Hall current sensor according to an embodiment of this application;

图2是本申请实施例的一种形式的基材的俯视示意图;Figure 2 is a top view of a substrate according to an embodiment of this application;

图3是本申请实施例的第一初始基材的正视示意图;Figure 3 is a front view schematic diagram of the first initial substrate according to an embodiment of this application;

图4是本申请实施例的一种形式的基材的侧视示意图;Figure 4 is a side view of a substrate according to an embodiment of this application;

图5是本申请实施例的第二初始基材的正视示意图;Figure 5 is a front view schematic diagram of the second initial substrate according to an embodiment of this application;

图6是本申请实施例的在弯折第二初始基材时的示意图;Figure 6 is a schematic diagram of bending the second initial substrate according to an embodiment of this application;

图7是本申请实施例的另一种形式的基材的正视示意图;Figure 7 is a front view schematic diagram of a substrate in another form according to an embodiment of this application;

图8是本申请实施例的框架的俯视示意图;Figure 8 is a top view of the framework of an embodiment of this application;

图9是本申请实施例的载流引脚框和信号引脚的俯视示意图;Figure 9 is a top view of the current-carrying pin frame and signal pins according to an embodiment of this application;

图10是本申请实施例的磁集中器的侧视示意图;Figure 10 is a side view of a magnetic concentrator according to an embodiment of this application;

图11是本申请实施例的磁集中器的俯视示意图;Figure 11 is a top view of a magnetic concentrator according to an embodiment of this application;

图12是本申请实施例的磁集中器的正视示意图;Figure 12 is a front view schematic diagram of the magnetic concentrator according to an embodiment of this application;

图13是本申请实施例的磁集中器套设于在载流引脚框上的侧视示意图;Figure 13 is a side view of a magnetic concentrator sleeved on a current-carrying pin frame according to an embodiment of this application.

图14是本申请实施例的磁集中器套设于在载流引脚框上的俯视示意图;Figure 14 is a top view of a magnetic concentrator sleeved on a current-carrying pin frame according to an embodiment of this application;

图15是本申请实施例的在载流引脚框上设置胶点后的俯视示意图;Figure 15 is a top view of an embodiment of this application after adhesive dots are set on the current-carrying pin frame;

图16是本申请实施例的将磁集中器放置于在载流引脚框U形空间后的俯视示意图;Figure 16 is a top view of an embodiment of this application showing the magnetic concentrator placed in the U-shaped space of the current-carrying pin frame;

图17是本申请实施例的推动磁集中器至套设于载流引脚框的俯视示意图;Figure 17 is a top view of an embodiment of this application, showing the magnetic concentrator being pushed onto the current-carrying pin frame;

图18是本申请实施例的在磁集中器所在区域进行塑封处理后的侧视示意图;Figure 18 is a side view of the area where the magnetic concentrator is located after plastic sealing according to an embodiment of this application.

图19是本申请实施例的在磁集中器所在区域进行塑封处理后的俯视示意图;Figure 19 is a top view of the area where the magnetic concentrator is located after plastic sealing according to an embodiment of this application;

图20是本申请实施例的将载流引脚框和信号引脚弯折后的侧视示意图;Figure 20 is a side view of an embodiment of this application after bending the current-carrying pin frame and the signal pin;

图21是本申请实施例的将载流引脚框和信号引脚弯折后的俯视示意图。Figure 21 is a top view of an embodiment of this application after the current-carrying pin frame and signal pin are bent.

附图标记说明:
10-第一初始基材;100、第二初始基材;
1、基材;11、第一区域;12、第二区域;
2、框架;21、载流引脚框;22、信号引脚;23、连接部;
3、霍尔芯片;31、芯片本体;32、焊线;
4、磁集中器;41、开口;42、斜面;
5、塑封结构;
6、胶点。
Explanation of reference numerals in the attached figures:
10 - First initial substrate; 100 - Second initial substrate;
1. Substrate; 11. First region; 12. Second region;
2. Frame; 21. Current-carrying pin frame; 22. Signal pin; 23. Connector;
3. Hall effect chip; 31. Chip body; 32. Bonding wire;
4. Magnetic concentrator; 41. Opening; 42. Inclined surface;
5. Plastic-encapsulated structure;
6. Adhesive dots.

具体实施方式Detailed Implementation

下面结合附图和实施例对本申请作进一步的详细说明。可理解的是,此处所描述的具体实施例仅仅用于解释本申请,而非对本申请的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与本申请相关的部分而非全部结构。在以下说明中,省略了对公知结构和技术的描述,以避免不必要地混淆本申请的概念。在附图中示出了根据本申请实施例的各种结构示意图。这些图并非是按比例绘制的,其中为了清楚表达的目的,放大了某些细节,并且可能省略了某些细节。图中所示出的各种区域、层的形状以及它们之间的相对大小、位置关系仅是示例性的,实际中可能由于制造公差或技术限制而有所偏差,并且本领域技术人员根据实际所需可以另外设计具有不同形状、大小、相对位置的区域/层。在本申请的上下文中,当将一层/元件称作位于另一层/元件“上”时,该层/元件可以直接位于该另一层/元件上,或者它们之间可以存在居中层/元件。另外,如果在一种朝向中一层/元件位于另一层/元件“上”,那么当调转朝向时,该层/元件可以位于该另一层/元件“下”。The present application will be further described in detail below with reference to the accompanying drawings and embodiments. It is understood that the specific embodiments described herein are merely illustrative of the present application and not intended to limit it. It should also be noted that, for ease of description, only the parts relevant to the present application are shown in the drawings, not all structures. In the following description, descriptions of well-known structures and technologies are omitted to avoid unnecessarily obscuring the concepts of the present application. The accompanying drawings show various structural schematic diagrams according to embodiments of the present application. These drawings are not drawn to scale, and some details are enlarged for clarity and may be omitted. The shapes of the various regions and layers shown in the drawings, as well as their relative sizes and positional relationships, are merely exemplary and may deviate in practice due to manufacturing tolerances or technical limitations. Furthermore, those skilled in the art can design regions/layers with different shapes, sizes, and relative positions as needed. In the context of this application, when a layer/element is referred to as being "on" another layer/element, the layer/element may be directly on the other layer/element, or there may be an intermediate layer/element between them. Additionally, if one layer/component is "above" another layer/component in one orientation, then when the orientation is reversed, that layer/component can be "below" that other layer/component.

相关技术中,对一次注塑成型的大电流霍尔传感器而言,为了尽量增大检测电流大小,同时减少发热问题,通常需要较厚的材料做载流引脚框。但是较厚的材料做框架,材料间的间隙(材料做成框架后中间的隔断距离,类似于信号引脚之间的间距)因加工性会受到限制(一般间隙要求大于一倍铜材厚度),并且信号引脚也不适用较厚的材料;如果使用较薄的材料做载流引脚框,载流引脚框承受的最大电流又会受到限制,这就导致产品的可加工性和测量范围存在不可调和的矛盾。当然,小电流霍尔传感器无需较厚的载流引脚框,也即不存在这样的问题。In related technologies, for high-current Hall effect sensors manufactured in a single injection molding process, a thicker material is typically needed for the current-carrying lead frame to maximize the detection current while minimizing heat generation. However, using a thicker frame limits the manufacturability of the gaps between materials (the spacing between the material segments in the frame, similar to the spacing between signal pins) (generally requiring a gap greater than twice the thickness of the copper material), and thicker materials are also unsuitable for the signal pins. Conversely, using a thinner material for the current-carrying lead frame limits the maximum current it can withstand. This creates an irreconcilable conflict between product manufacturability and measurement range. Of course, low-current Hall effect sensors do not require a thicker current-carrying lead frame, thus avoiding this problem.

为了解决大电流霍尔电流传感器的这一矛盾,本实施例提供一种霍尔电流传感器的制备方法,参考图1至图21,该制备方法包括如下步骤:To address this contradiction in high-current Hall current sensors, this embodiment provides a method for fabricating a Hall current sensor. Referring to Figures 1 to 21, the fabrication method includes the following steps:

S101,制备基材1,基材1具有第一区域11和第二区域12,第一区域11对应基材1的厚度大于第二区域12对应基材1的厚度。S101, Prepare substrate 1. Substrate 1 has a first region 11 and a second region 12. The thickness of substrate 1 corresponding to the first region 11 is greater than the thickness of substrate 1 corresponding to the second region 12.

参考图2,本实施例的基材1为厚薄不同的材料,具体可选用铜材,导电性能优越,可选高导电性耐热铜合金(KFC),在图2的纵向方向也即基材1的宽度方向上具有厚薄相间的区域,较厚区域为第一区域11,较薄区域为第二区域12,同一基材1具有不同厚度便于制造不同厚度要求的结构。Referring to Figure 2, the substrate 1 in this embodiment is a material of varying thickness, specifically copper, which has excellent electrical conductivity. A high-conductivity heat-resistant copper alloy (KFC) can be selected. In the longitudinal direction of Figure 2, that is, in the width direction of the substrate 1, there are regions with alternating thicknesses. The thicker region is the first region 11, and the thinner region is the second region 12. The same substrate 1 has different thicknesses, which facilitates the manufacture of structures with different thickness requirements.

S102,切割基材1形成框架2,框架2包括在第一区域11形成的载流引脚框21,以及在第二区域12形成的信号引脚22。S102, the substrate 1 is cut to form a frame 2, the frame 2 including a current-carrying pin frame 21 formed in a first region 11 and a signal pin 22 formed in a second region 12.

示例性地,将厚薄相间的基材1利用冲切模具做成厚薄集成的框架2,如图8所示。对应较厚的第一区域11被冲切为载流引脚框21,较薄的第二区域12被冲切为信号引脚22。For example, a thick and thin substrate 1 is formed into a frame 2 with integrated thickness using a punching die, as shown in FIG8. The thicker first region 11 is punched into a current-carrying pin frame 21, and the thinner second region 12 is punched into a signal pin 22.

S103,在信号引脚22的一端设置霍尔芯片3,霍尔芯片3与信号引脚22电连接。S103, a Hall chip 3 is provided at one end of the signal pin 22, and the Hall chip 3 is electrically connected to the signal pin 22.

参考图9,在信号引脚22靠近载流引脚框21的一端安装霍尔芯片3,实现霍尔芯片3与载流引脚框21的电连接,便于霍尔芯片3将信号通过信号引脚22导出。霍尔芯片3是根据霍尔效应制作的一种磁场传感器,可以将磁场信息转换成电信号;霍尔芯片3通常包括集成在芯片本体31中的磁场系统、霍尔元件和信号处理电路,以及配置成输出电信号的焊线32,磁场系统可以把输入信号转化为磁场信号,霍尔元件把磁场信号转换为电信号,信号处理电路把霍尔元件输出信号转换为满足应用的信号。可以理解为,本实施例的霍尔芯片3为具有霍尔效应的集成电路(IC)芯片。Referring to Figure 9, a Hall chip 3 is mounted at the end of signal pin 22 near the current-carrying pin frame 21, establishing an electrical connection between the Hall chip 3 and the current-carrying pin frame 21, facilitating the output of signals from the Hall chip 3 through signal pin 22. The Hall chip 3 is a magnetic field sensor based on the Hall effect, capable of converting magnetic field information into electrical signals. The Hall chip 3 typically includes a magnetic field system, a Hall element, and a signal processing circuit integrated into the chip body 31, as well as bonding wires 32 configured to output electrical signals. The magnetic field system converts the input signal into a magnetic field signal, the Hall element converts the magnetic field signal into an electrical signal, and the signal processing circuit converts the Hall element's output signal into a signal suitable for the application. In this embodiment, the Hall chip 3 is an integrated circuit (IC) chip exhibiting the Hall effect.

S104,将磁集中器4设置于载流引脚框21上,使磁集中器4覆盖霍尔芯片3。S104, the magnetic concentrator 4 is placed on the current-carrying pin frame 21, so that the magnetic concentrator 4 covers the Hall chip 3.

参考图10至图14,将磁集中器4套设在载流引脚框21上,以在载流引脚框21内通过电流时,在载流引脚框21周围产生一个磁场,磁集中器4将这个磁场聚集起来,然后通过覆盖的霍尔芯片3检测磁场强度的大小,进而得到通过载流引脚框21的电流的大小,最后通过信号引脚22输出,实现对载流引脚框21内所通过电流大小的检测。Referring to Figures 10 to 14, a magnetic concentrator 4 is fitted onto the current-carrying pin frame 21 so that when current flows through the current-carrying pin frame 21, a magnetic field is generated around the current-carrying pin frame 21. The magnetic concentrator 4 concentrates this magnetic field, and then the magnitude of the magnetic field strength is detected by the covered Hall chip 3, thereby obtaining the magnitude of the current passing through the current-carrying pin frame 21. Finally, the signal is output through the signal pin 22 to realize the detection of the magnitude of the current passing through the current-carrying pin frame 21.

S105,对框架2内的磁集中器4所在区域进行注塑处理,以封装磁集中器4、霍尔芯片3、部分载流引脚框21以及部分信号引脚22。S105, injection molding is performed on the area where the magnetic concentrator 4 is located within the frame 2 to encapsulate the magnetic concentrator 4, Hall chip 3, part of the current-carrying pin frame 21, and part of the signal pin 22.

参考图18和图19,对磁集中器4所在的区域进行塑封,一次注塑即可实现霍尔电流传感器主要功能部分的封装,实现高效漏电防护,保证霍尔电流传感器正常运行。Referring to Figures 18 and 19, the area where the magnetic concentrator 4 is located is encapsulated. The main functional parts of the Hall current sensor can be encapsulated in one injection molding process, achieving efficient leakage protection and ensuring the normal operation of the Hall current sensor.

本实施例的霍尔电流传感器的制备方法,采用具有不同厚度的基材1,通过一次切割成型包括载流引脚框21和信号引脚22的框架2,满足载流引脚框21和信号引脚22对材料厚度的不同需求,进而满足大电流霍尔传感器一次注塑的生产需求,而且相较特制手工治具安装,框架2一次成型还能够定位载流引脚框21和信号引脚22的相对位置,有助于提高载流引脚框21和霍尔芯片3相对位置的精度,提高产品一致性,霍尔芯片3无需精准安装到载流引脚框21,也即不需要额外定制霍尔芯片3组装设备,有助于节约成本,简化工艺。The method for fabricating the Hall current sensor in this embodiment uses a substrate 1 with different thicknesses. A frame 2, including a current-carrying pin frame 21 and a signal pin 22, is formed by cutting and molding in one step. This satisfies the different material thickness requirements of the current-carrying pin frame 21 and the signal pin 22, thereby meeting the production requirements of a high-current Hall sensor through one-step injection molding. Moreover, compared with the installation of a specially made manual jig, the one-step molding of the frame 2 can also position the relative positions of the current-carrying pin frame 21 and the signal pin 22, which helps to improve the accuracy of the relative positions of the current-carrying pin frame 21 and the Hall chip 3, and improve product consistency. The Hall chip 3 does not need to be precisely installed onto the current-carrying pin frame 21, that is, no additional customized Hall chip 3 assembly equipment is required, which helps to save costs and simplify the process.

作为可选的一种实施方式,上述制备基材1的步骤S101包括:As an optional implementation, step S101 of preparing the substrate 1 includes:

S1011a,提供第一初始基材10,第一初始基材10各处厚度一致;S1011a, a first initial substrate 10 is provided, the first initial substrate 10 having a uniform thickness throughout;

S1012a,对第一初始基材10进行热轧,以形成第一区域11和第二区域12,第一区域11对应基材1的厚度小于等于第一初始基材10的厚度。S1012a, the first initial substrate 10 is hot-rolled to form a first region 11 and a second region 12, wherein the thickness of the first region 11 corresponding to the substrate 1 is less than or equal to the thickness of the first initial substrate 10.

也即选用厚度大于或等于载流引脚框21厚度的第一初始基材10,诸如铜材,利用其良好的热延展性,通过将第一初始基材10热轧得到如图3所示的厚薄相间的基材1,进而机械冲压一次形成较厚的载流引脚框21和较薄的信号引脚22,制备简单便捷,有助于批量化制备。That is, a first initial substrate 10 with a thickness greater than or equal to the thickness of the current-carrying pin frame 21, such as copper, is selected. Taking advantage of its good thermal ductility, the first initial substrate 10 is hot-rolled to obtain a substrate 1 with alternating thick and thin layers as shown in Figure 3. Then, it is mechanically stamped once to form a thicker current-carrying pin frame 21 and a thinner signal pin 22. The preparation is simple and convenient, which is conducive to mass production.

作为可选的另一种实施方式,如图5至图7所示,上述制备基材1的步骤S101也可以是包括:As an optional implementation, as shown in Figures 5 to 7, step S101 of preparing the substrate 1 may also include:

S1011b,提供第二初始基材100;S1011b, providing a second initial substrate 100;

S1012b,在第二初始基材100的一端进行弯折处理;S1012b, one end of the second initial substrate 100 is bent;

S1013b,将弯折的部分与第二初始基材100进行堆叠固定,以在堆叠的区域形成第一区域11,其余的区域为第二区域12,第二区域12对应基材1的厚度与第二初始基材100的厚度相等。S1013b, the bent portion is stacked and fixed with the second initial substrate 100 to form a first region 11 in the stacked area, and the remaining area is a second region 12. The thickness of the second region 12 corresponding to the substrate 1 is equal to the thickness of the second initial substrate 100.

也即选用厚度与较薄的信号引脚22相同的第二初始基材100,利用铜材的可塑性,将其在一端进行弯折并堆叠固定在原有的第二初始基材100上,堆叠加厚的区域形成第一区域11以成型载流引脚框21,原有单层铜材的区域为第二区域12以形成信号引脚22。采用同一厚度的较薄铜材,不需要对铜材本身进行额外的工艺处理,弯折堆叠后即可形成厚薄不同的基材1,而且堆叠加厚的部分电流内阻小,发热也小,有助于进一步降低功耗。That is, a second initial substrate 100 with the same thickness as the thinner signal pin 22 is selected. Taking advantage of the plasticity of copper, it is bent at one end and stacked and fixed on the original second initial substrate 100. The stacked and thickened area forms the first area 11 to form the current-carrying pin frame 21, and the area of the original single-layer copper material is the second area 12 to form the signal pin 22. By using a thinner copper material of the same thickness, no additional processing is required on the copper material itself. After bending and stacking, a substrate 1 of different thicknesses can be formed. Moreover, the stacked and thickened part has low current resistance and low heat generation, which helps to further reduce power consumption.

在一个实施例中,参考图6,步骤S1012b在第二初始基材100的一端进行弯折处理包括:In one embodiment, referring to FIG6, step S1012b of bending one end of the second initial substrate 100 includes:

在第二初始基材100的一端进行第一次弯折;The first bend is performed at one end of the second initial substrate 100;

将第一次弯折的部分进行第二次弯折,第二次弯折将第一次弯折的部分进行对折。The first bend is then folded a second time, and the second bend folds the first bend in half.

也即将第二初始基材100进行两次弯折,较厚的第一区域11由三层第二初始基材100组成,其中弯折的两层大小相等,图6中箭头所示方向为冲压弯折的施力方向。具体地,单层的第二初始基材100选用厚度为0.5mm的铜板,经过两次弯折后,形成具有1.5mm和0.5mm两种厚度的基材1。This means that the second initial substrate 100 is bent twice. The thicker first region 11 consists of three layers of the second initial substrate 100, of which the two bent layers are of equal size. The arrows in Figure 6 indicate the direction of the force applied during the stamping and bending. Specifically, the single-layer second initial substrate 100 is made of copper plate with a thickness of 0.5 mm. After two bends, substrates 1 with two thicknesses of 1.5 mm and 0.5 mm are formed.

在一个实施例中,参考图7,步骤S1013b中将弯折的部分与第二初始基材100进行堆叠固定包括:采用铆接或者焊接的方式将弯折的部分与第二初始基材100堆叠固定在一起,焊接可选用激光电焊的方式,以最终形成较厚的第一区域11和较薄的第二区域12,图7中箭头所示为铆接或激光点焊的方向。In one embodiment, referring to FIG7, the step S1013b of stacking and fixing the bent portion with the second initial substrate 100 includes: stacking and fixing the bent portion with the second initial substrate 100 together by riveting or welding. The welding can be laser welding to ultimately form a thicker first region 11 and a thinner second region 12. The arrows in FIG7 indicate the direction of riveting or laser spot welding.

参考图10至图17,本实施例的磁集中器4具有开口41,载流引脚框21呈现为U形;则上述的步骤S104将磁集中器4安装于载流引脚框21上,使磁集中器4覆盖霍尔芯片3可以通过具有点胶、吸取和纵向推进功能的设备来自动化组装,包括如下步骤:Referring to Figures 10 to 17, the magnetic concentrator 4 in this embodiment has an opening 41, and the current-carrying pin frame 21 is U-shaped. Step S104 above, which mounts the magnetic concentrator 4 onto the current-carrying pin frame 21, allows the magnetic concentrator 4 to cover the Hall chip 3. This assembly can be automated using equipment with dispensing, pick-up, and longitudinal advance functions, including the following steps:

S1041,在载流引脚框21靠近霍尔芯片3的一端设置胶点6。S1041, glue dots 6 are set at one end of the current-carrying pin frame 21 near the Hall chip 3.

如图15所示,U形的载流引脚框21包括位于两侧竖直的输入端和输出端,以及中间位置水平的检测端。本实施例中位于中间的检测端上适于设置磁集中器4检测电流,因此在中间的检测端部分点胶,形成胶点6,便于固定磁集中器4。As shown in Figure 15, the U-shaped current-carrying pin frame 21 includes vertical input and output terminals on both sides, and a horizontal detection terminal in the middle. In this embodiment, the detection terminal in the middle is suitable for setting the magnetic concentrator 4 to detect the current. Therefore, adhesive is applied to the middle detection terminal to form adhesive dots 6, which facilitates the fixation of the magnetic concentrator 4.

S1042,将磁集中器4放置于U形的载流引脚框21内,磁集中器4的开口41朝向胶点6所在一侧。S1042, place the magnetic concentrator 4 inside the U-shaped current-carrying pin frame 21, with the opening 41 of the magnetic concentrator 4 facing the side where the glue point 6 is located.

如图16所示,通过机械吸取的方式,将磁集中器4放入载流引脚框21的输入端和输出端之间的空白区域,并且使磁集中器4的开口41与检测端相对,便于将磁集中器4开口41相对检测端推入,避免磕碰损伤。As shown in Figure 16, the magnetic concentrator 4 is placed in the blank area between the input and output ends of the current-carrying pin frame 21 by mechanical suction, and the opening 41 of the magnetic concentrator 4 is aligned with the detection end, so as to push the opening 41 of the magnetic concentrator 4 into the detection end and avoid bumping and damage.

S1043,推动磁集中器4由载流引脚框21一侧朝向信号引脚22一侧移动,以至少将霍尔芯片3置于磁集中器4的开口41内。S1043, the magnetic concentrator 4 is moved from the side of the current-carrying pin frame 21 toward the side of the signal pin 22 so as to place the Hall chip 3 at least within the opening 41 of the magnetic concentrator 4.

如图17所示,沿箭头所示方向,利用纵向推力结构将聚磁集中器4推入载流引脚框21中,使得磁集中器4覆盖载流引脚框21的检测端和霍尔芯片3,以使磁集中器4增强的磁场信号充分传输至霍尔芯片3,并转化成电信号输出。As shown in Figure 17, the magnetic concentrator 4 is pushed into the current-carrying pin frame 21 by the longitudinal thrust structure along the direction indicated by the arrow, so that the magnetic concentrator 4 covers the detection end of the current-carrying pin frame 21 and the Hall chip 3, so that the magnetic field signal enhanced by the magnetic concentrator 4 can be fully transmitted to the Hall chip 3 and converted into an electrical signal output.

S1044,在胶点6处将磁集中器4固定在载流引脚框21上。S1044, fix the magnetic concentrator 4 to the current-carrying pin frame 21 at glue point 6.

为了便于磁集中器4的顺利推进,通常设置磁集中器4的开口41尺寸略大于载流引脚框21厚度,因此,需要向下移动磁集中器4使其与胶点6接触,之后通过诸如紫外固化或者热固化等方式固化胶点6,增强磁集中器4和载流引脚框21的稳定性,也能够确保磁集中器4有足够的冗余不会碰到霍尔芯片3的焊线32上,保证信号顺利输出。To facilitate the smooth advancement of the magnetic concentrator 4, the opening 41 of the magnetic concentrator 4 is usually set to be slightly larger than the thickness of the current-carrying pin frame 21. Therefore, the magnetic concentrator 4 needs to be moved downwards to make contact with the adhesive dot 6. Then, the adhesive dot 6 is cured by means such as ultraviolet curing or thermal curing to enhance the stability of the magnetic concentrator 4 and the current-carrying pin frame 21. This also ensures that the magnetic concentrator 4 has sufficient redundancy and will not touch the bonding wire 32 of the Hall chip 3, thus ensuring smooth signal output.

通过上述自动化组装的方式将磁集中器4精准固定于载流引脚框21上,有助于批量化生产,从而提高生产效率,降低成本。The above-mentioned automated assembly method precisely fixes the magnetic concentrator 4 onto the current-carrying pin frame 21, which helps to mass production, thereby improving production efficiency and reducing costs.

参考图10和图13,本实施例中,磁集中器4的开口41的高度L大于载流引脚框21的厚度H,高度L与厚度H的差值范围为0.1mm~0.2mm。Referring to Figures 10 and 13, in this embodiment, the height L of the opening 41 of the magnetic concentrator 4 is greater than the thickness H of the current-carrying pin frame 21, and the difference between the height L and the thickness H ranges from 0.1 mm to 0.2 mm.

磁集中器4开口41的高度尺寸与框架2中较厚的载流引脚框21的厚度接近,本实施例中设置其具有0.1mm~0.2mm的间距,便于安装磁集中器4的同时不至于产生较大晃动,进而提高磁集中器4安装的精确性,从而提升产品性能一致性。如果间距小于0.1mm,则磁集中器4难以卡进载流引脚框21;如果间距大于0.2mm,容易造成卡不紧的问题,从而产生上下晃动。The height of the opening 41 of the magnetic concentrator 4 is close to the thickness of the thicker current-carrying pin frame 21 in the frame 2. In this embodiment, a spacing of 0.1mm to 0.2mm is provided to facilitate the installation of the magnetic concentrator 4 without causing significant shaking, thereby improving the installation accuracy of the magnetic concentrator 4 and enhancing product performance consistency. If the spacing is less than 0.1mm, the magnetic concentrator 4 will be difficult to fit into the current-carrying pin frame 21; if the spacing is greater than 0.2mm, it is easy to cause a problem of not being able to fit tightly, resulting in up-and-down shaking.

此外,参考图10和图11,磁集中器4的开口41外壁面还成型有斜面42,便于磁集中器4推进组装,同时避免尖锐的直角结构对其他结构的损伤。In addition, referring to Figures 10 and 11, the outer wall of the opening 41 of the magnetic concentrator 4 is also formed with a bevel 42, which facilitates the advancement and assembly of the magnetic concentrator 4, while avoiding damage to other structures by sharp right-angle structures.

参考图8,框架2还包括连接载流引脚框21和信号引脚22的连接部23,以限位载流引脚框21和信号引脚22的相对位置。Referring to Figure 8, the frame 2 also includes a connecting portion 23 that connects the current-carrying pin frame 21 and the signal pin 22 to limit the relative position of the current-carrying pin frame 21 and the signal pin 22.

可以知道的是,通过基材1加工框架2形成载流引脚框21和信号引脚22时,在最终的产品中两者之间无需电性连接。本实施例中在第一区域11和第二区域12均设置线状结构的连接部23来连接载流引脚框21和信号引脚22,有效避免载流引脚框21和信号引脚22之间出现相对位移,进而保证霍尔芯片3以及磁集中器4的精准安装。在安装完成后可通过切割去除所述连接部23,以保证载流引脚框21和信号引脚22的相对隔离。It is understood that when the current-carrying pin frame 21 and signal pin 22 are formed by processing the frame 2 through the substrate 1, no electrical connection is required between the two in the final product. In this embodiment, a linear connecting portion 23 is provided in both the first region 11 and the second region 12 to connect the current-carrying pin frame 21 and the signal pin 22, effectively avoiding relative displacement between the current-carrying pin frame 21 and the signal pin 22, thereby ensuring the accurate installation of the Hall chip 3 and the magnetic concentrator 4. After installation, the connecting portion 23 can be removed by cutting to ensure the relative isolation between the current-carrying pin frame 21 and the signal pin 22.

在一个实施例中,切割基材1的步骤S102中,在第一区域11形成多个载流引脚框21,在第二区域12形成相对应的多个信号引脚22;则在S105对框架2内磁集中器4所在的区域进行注塑处理的步骤之后,还包括:In one embodiment, in step S102 of cutting the substrate 1, a plurality of current-carrying pin frames 21 are formed in the first region 11, and a plurality of corresponding signal pins 22 are formed in the second region 12; then, after step S105 of injection molding the region where the magnetic concentrator 4 is located within the frame 2, the method further includes:

S106,对框架2的连接部23进行切割,得到多个单独的霍尔电流传感器单元,任一霍尔电流传感器单元包括载流引脚框21、磁集中器4、霍尔芯片3、信号引脚22以及塑封结构5;S106, the connecting part 23 of the frame 2 is cut to obtain multiple individual Hall current sensor units. Each Hall current sensor unit includes a current-carrying pin frame 21, a magnetic concentrator 4, a Hall chip 3, a signal pin 22, and a plastic encapsulation structure 5.

S107,对每个霍尔电流传感器单元中,载流引脚框21远离磁集中器4的一端进行弯折处理,对信号引脚22远离磁集中器4的一端进行弯折处理。S107, in each Hall current sensor unit, the end of the current-carrying pin frame 21 away from the magnetic concentrator 4 is bent, and the end of the signal pin 22 away from the magnetic concentrator 4 is bent.

具体地,再用切筋成型设备将注塑后的框架2进行切筋,也即从连接部23的位置进行切割将其去除,之后将得到的每个霍尔电流传感器单元中,载流引脚框21的输入端和输出端,以及信号引脚22的自由端进行弯折,参考图20和图21,得到单颗霍尔电流传感器产品。Specifically, the injection-molded frame 2 is then cut using a rib-cutting and forming equipment, that is, cut and removed from the connection part 23. Then, the input and output ends of the current-carrying pin frame 21 and the free end of the signal pin 22 in each Hall current sensor unit are bent. Referring to Figures 20 and 21, a single Hall current sensor product is obtained.

本实施例还提供一种霍尔电流传感器,采用上述的霍尔电流传感器的制备方法制得,包括:载流引脚框21、信号引脚22、霍尔芯片3、磁集中器4和塑封结构5;信号引脚22与载流引脚框21间隔设置,信号引脚22的厚度小于载流引脚框21的厚度;霍尔芯片3设置于信号引脚22靠近载流引脚框21的一端,且与载流引脚框21间隔设置,霍尔芯片3与信号引脚22电连接;磁集中器4设置于载流引脚框21靠近信号引脚22的一端,磁集中器4至少覆盖霍尔芯片3;塑封结构5设置于磁集中器4所在位置,以封装磁集中器4、霍尔芯片3、部分载流引脚框21以及部分信号引脚22。This embodiment also provides a Hall current sensor, which is fabricated using the above-described method for preparing a Hall current sensor. The sensor includes: a current-carrying pin frame 21, a signal pin 22, a Hall chip 3, a magnetic concentrator 4, and a plastic encapsulation structure 5. The signal pin 22 is spaced apart from the current-carrying pin frame 21, and the thickness of the signal pin 22 is less than the thickness of the current-carrying pin frame 21. The Hall chip 3 is disposed at one end of the signal pin 22 near the current-carrying pin frame 21 and spaced apart from the current-carrying pin frame 21; the Hall chip 3 is electrically connected to the signal pin 22. The magnetic concentrator 4 is disposed at one end of the current-carrying pin frame 21 near the signal pin 22, and the magnetic concentrator 4 at least covers the Hall chip 3. The plastic encapsulation structure 5 is disposed at the location of the magnetic concentrator 4 to encapsulate the magnetic concentrator 4, the Hall chip 3, part of the current-carrying pin frame 21, and part of the signal pin 22.

本实施例的霍尔电流传感器,具有不同厚度的载流引脚框21和信号引脚22通过一次切割成型,载流引脚框21和信号引脚22之间相对位置稳定,进而保证安装于信号引脚22一端的霍尔芯片3与载流引脚框21之间相对位置的精准度,以及磁集中器4安装的稳定性和精确性,提高产品一致性;同时塑封结构5一次注塑完成封装,制备简单,且有助于节约成本。In this embodiment, the Hall current sensor has current-carrying pin frame 21 and signal pin 22 of different thicknesses, which are formed by cutting in one step. The relative position between the current-carrying pin frame 21 and the signal pin 22 is stable, thereby ensuring the accuracy of the relative position between the Hall chip 3 installed at one end of the signal pin 22 and the current-carrying pin frame 21, as well as the stability and accuracy of the installation of the magnetic concentrator 4, and improving product consistency. At the same time, the plastic encapsulation structure 5 completes the encapsulation in one injection molding, which is simple to manufacture and helps to save costs.

在以上的描述中,对于各层的构图、刻蚀等技术细节并没有做出详细的说明。但是本领域技术人员应当理解,可以通过各种技术手段,来形成所需形状的层、区域等。另外,为了形成同一结构,本领域技术人员还可以设计出与以上描述的方法并不完全相同的方法。另外,尽管在以上分别描述了各实施例,但是这并不意味着各个实施例中的措施不能有利地结合使用。The above description does not provide detailed explanations of the technical aspects of each layer's patterning, etching, etc. However, those skilled in the art should understand that various technical means can be used to form layers and regions of the desired shape. Furthermore, to form the same structure, those skilled in the art can also design methods that are not entirely identical to those described above. Additionally, although various embodiments have been described above, this does not mean that the measures in the various embodiments cannot be used advantageously in combination.

虽然结合附图描述了本申请的实施例,但是本领域技术人员可以在不脱离本申请的精神和范围的情况下做出各种修改和变型,这样的修改和变型均落入由所附权利要求所限定的范围之内。Although embodiments of this application have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of this application, and all such modifications and variations fall within the scope defined by the appended claims.

Claims (10)

一种霍尔电流传感器的制备方法,其特征在于,包括:A method for fabricating a Hall current sensor, characterized by comprising: 制备基材(1),所述基材(1)具有第一区域(11)和第二区域(12),所述第一区域(11)对应基材(1)的厚度大于所述第二区域(12)对应基材(1)的厚度;Prepare a substrate (1) having a first region (11) and a second region (12), wherein the thickness of the substrate (1) corresponding to the first region (11) is greater than the thickness of the substrate (1) corresponding to the second region (12); 切割所述基材(1)形成框架(2),所述框架(2)包括在所述第一区域(11)形成的载流引脚框(21),以及在所述第二区域(12)形成的信号引脚(22);The substrate (1) is cut to form a frame (2), the frame (2) including a current-carrying pin frame (21) formed in the first region (11) and a signal pin (22) formed in the second region (12); 在所述信号引脚(22)的一端设置霍尔芯片(3),所述霍尔芯片(3)与所述信号引脚(22)电连接;A Hall chip (3) is provided at one end of the signal pin (22), and the Hall chip (3) is electrically connected to the signal pin (22); 将磁集中器(4)设置于所述载流引脚框(21)上,使所述磁集中器(4)覆盖所述霍尔芯片(3);The magnetic concentrator (4) is placed on the current-carrying pin frame (21) so that the magnetic concentrator (4) covers the Hall chip (3); 对所述框架(2)内的所述磁集中器(4)所在区域进行注塑处理,以封装所述磁集中器(4)、所述霍尔芯片(3)、部分所述载流引脚框(21)以及部分所述信号引脚(22)。The area containing the magnetic concentrator (4) within the frame (2) is injection molded to encapsulate the magnetic concentrator (4), the Hall chip (3), part of the current-carrying pin frame (21), and part of the signal pin (22). 根据权利要求1所述的霍尔电流传感器的制备方法,其特征在于,所述制备基材(1),包括:The method for fabricating a Hall current sensor according to claim 1, characterized in that the substrate (1) comprises: 提供第一初始基材(10),所述第一初始基材(10)各处厚度一致;A first initial substrate (10) is provided, wherein the thickness of the first initial substrate (10) is uniform throughout; 对所述第一初始基材(10)进行热轧,以形成第一区域(11)和第二区域(12),所述第一区域(11)对应基材(1)的厚度小于等于所述第一初始基材(10)的厚度。The first initial substrate (10) is hot-rolled to form a first region (11) and a second region (12), wherein the thickness of the first region (11) corresponding to the substrate (1) is less than or equal to the thickness of the first initial substrate (10). 根据权利要求1所述的霍尔电流传感器的制备方法,其特征在于,所述制备基材(1),包括:The method for fabricating a Hall current sensor according to claim 1, characterized in that the substrate (1) comprises: 提供第二初始基材(100);Provide a second initial substrate (100); 在所述第二初始基材(100)的一端进行弯折处理;One end of the second initial substrate (100) is bent; 将弯折的部分与所述第二初始基材(100)进行堆叠固定,以在堆叠的区域形成第一区域(11),其余的区域为第二区域(12),所述第二区域(12)对应基材(1)的厚度与所述第二初始基材(100)的厚度相等。The bent portion is stacked and fixed with the second initial substrate (100) to form a first region (11) in the stacked area, and the remaining area is a second region (12). The thickness of the second region (12) corresponding to the substrate (1) is equal to the thickness of the second initial substrate (100). 根据权利要求3所述的霍尔电流传感器的制备方法,其特征在于,所述在所述第二初始基材(100)的一端进行弯折处理包括:The method for fabricating a Hall current sensor according to claim 3, characterized in that the bending process at one end of the second initial substrate (100) includes: 在所述第二初始基材(100)的一端进行第一次弯折;A first bend is made at one end of the second initial substrate (100); 将第一次弯折的部分进行第二次弯折,第二次弯折将第一次弯折的部分进行对折。The first bend is then folded a second time, and the second bend folds the first bend in half. 根据权利要求4所述的霍尔电流传感器的制备方法,其特征在于,所述将弯折的部分与所述第二初始基材(100)进行堆叠固定包括:采用铆接或者焊接的方式将弯折的部分与所述第二初始基材(100)堆叠固定在一起。The method for preparing a Hall current sensor according to claim 4 is characterized in that the step of stacking and fixing the bent portion with the second initial substrate (100) includes: stacking and fixing the bent portion with the second initial substrate (100) together by riveting or welding. 根据权利要求1所述的霍尔电流传感器的制备方法,其特征在于,所述磁集中器(4)具有开口(41),所述载流引脚框(21)呈现为U形;所述将磁集中器(4)安装于所述载流引脚框(21)上,使所述磁集中器(4)覆盖所述霍尔芯片(3)包括:The method for fabricating a Hall current sensor according to claim 1 is characterized in that the magnetic concentrator (4) has an opening (41), and the current-carrying pin frame (21) is U-shaped; the step of mounting the magnetic concentrator (4) on the current-carrying pin frame (21) so that the magnetic concentrator (4) covers the Hall chip (3) includes: 在所述载流引脚框(21)靠近所述霍尔芯片(3)的一端设置胶点(6);A glue dot (6) is provided at one end of the current-carrying pin frame (21) near the Hall chip (3); 将所述磁集中器(4)放置于所述U形的载流引脚框(21)内,所述磁集中器(4)的开口(41)朝向所述胶点(6)所在一侧;The magnetic concentrator (4) is placed inside the U-shaped current-carrying pin frame (21), with the opening (41) of the magnetic concentrator (4) facing the side where the glue dot (6) is located. 推动所述磁集中器(4)由所述载流引脚框(21)一侧朝向所述信号引脚(22)一侧移动,以至少将所述霍尔芯片(3)置于所述磁集中器(4)的所述开口(41)内;The magnetic concentrator (4) is moved from the side of the current-carrying pin frame (21) toward the side of the signal pin (22) to at least place the Hall chip (3) within the opening (41) of the magnetic concentrator (4); 在所述胶点(6)处将所述磁集中器(4)固定在所述载流引脚框(21)上。The magnetic concentrator (4) is fixed to the current-carrying pin frame (21) at the glue point (6). 根据权利要求6所述的霍尔电流传感器的制备方法,其特征在于,所述磁集中器(4)的所述开口(41)的高度L大于所述载流引脚框(21)的厚度H,所述高度L与所述厚度H的差值范围为0.1mm~0.2mm。According to the method for preparing the Hall current sensor according to claim 6, the height L of the opening (41) of the magnetic concentrator (4) is greater than the thickness H of the current-carrying pin frame (21), and the difference between the height L and the thickness H is in the range of 0.1 mm to 0.2 mm. 根据权利要求1-7中任意一项所述的霍尔电流传感器的制备方法,其特征在于,所述框架(2)还包括:The method for fabricating a Hall current sensor according to any one of claims 1-7, characterized in that the frame (2) further comprises: 连接所述载流引脚框(21)和所述信号引脚(22)的连接部(23),以限位所述载流引脚框(21)和所述信号引脚(22)的相对位置。A connection portion (23) connects the current-carrying pin frame (21) and the signal pin (22) to limit the relative position of the current-carrying pin frame (21) and the signal pin (22). 根据权利要求8所述的霍尔电流传感器的制备方法,其特征在于,所述切割所述基材(1)中,在所述第一区域(11)形成多个载流引脚框(21),在所述第二区域(12)形成相对应的多个信号引脚(22);The method for fabricating a Hall current sensor according to claim 8 is characterized in that, in the cutting of the substrate (1), a plurality of current-carrying pin frames (21) are formed in the first region (11), and a plurality of corresponding signal pins (22) are formed in the second region (12); 对所述框架(2)内所述磁集中器(4)所在的区域进行注塑处理之后,还包括:After injection molding the area where the magnetic concentrator (4) is located within the frame (2), the process further includes: 对所述框架(2)的连接部(23)进行切割,得到多个单独的霍尔电流传感器单元,任一所述霍尔电流传感器单元包括载流引脚框(21)、磁集中器(4)、霍尔芯片(3)、信号引脚(22)以及塑封结构(5);Cut the connecting part (23) of the frame (2) to obtain multiple individual Hall current sensor units. Each Hall current sensor unit includes a current-carrying pin frame (21), a magnetic concentrator (4), a Hall chip (3), a signal pin (22), and a plastic encapsulation structure (5). 对所述霍尔电流传感器单元中,所述载流引脚框(21)远离所述磁集中器(4)的一端进行弯折处理,对所述信号引脚(22)远离所述磁集中器(4)的一端进行弯折处理。In the Hall current sensor unit, the end of the current-carrying pin frame (21) away from the magnetic concentrator (4) is bent, and the end of the signal pin (22) away from the magnetic concentrator (4) is bent. 一种霍尔电流传感器,采用权利要求1-9中任意一项所述的霍尔电流传感器的制备方法制得,其特征在于,包括:A Hall current sensor, fabricated using the method for preparing a Hall current sensor according to any one of claims 1-9, is characterized by comprising: 载流引脚框(21);Current-carrying pin frame (21); 信号引脚(22),与所述载流引脚框(21)间隔设置;所述信号引脚(22)的厚度小于所述载流引脚框(21)的厚度;The signal pin (22) is spaced apart from the current-carrying pin frame (21); the thickness of the signal pin (22) is less than the thickness of the current-carrying pin frame (21); 霍尔芯片(3),设置于所述信号引脚(22)靠近所述载流引脚框(21)的一端,且与所述载流引脚框(21)间隔设置,所述霍尔芯片(3)与所述信号引脚(22)电连接;A Hall chip (3) is disposed at one end of the signal pin (22) near the current-carrying pin frame (21) and spaced apart from the current-carrying pin frame (21). The Hall chip (3) is electrically connected to the signal pin (22). 磁集中器(4),设置于所述载流引脚框(21)靠近所述信号引脚(22)的一端,所述磁集中器(4)至少覆盖所述霍尔芯片(3);A magnetic concentrator (4) is disposed at one end of the current-carrying pin frame (21) near the signal pin (22), and the magnetic concentrator (4) at least covers the Hall chip (3); 塑封结构(5),设置于所述磁集中器(4)所在位置,以封装所述磁集中器(4)、所述霍尔芯片(3)、部分所述载流引脚框(21)以及部分所述信号引脚(22)。A plastic encapsulation structure (5) is disposed at the location of the magnetic concentrator (4) to encapsulate the magnetic concentrator (4), the Hall chip (3), part of the current-carrying pin frame (21), and part of the signal pins (22).
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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118884013B (en) * 2024-09-27 2024-12-31 苏州矩阵光电有限公司 Hall current sensor and preparation method thereof

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040056647A1 (en) * 2002-09-20 2004-03-25 Jason Stauth Integrated current sensor
JP2012202720A (en) * 2011-03-23 2012-10-22 Asahi Kasei Electronics Co Ltd Current sensor and method for manufacturing current sensor
CN112526192A (en) * 2020-11-23 2021-03-19 宁波中车时代传感技术有限公司 Integrated chip type current sensor and manufacturing method thereof
CN214225264U (en) * 2021-01-26 2021-09-17 云茂电子(南通)有限公司 Large-current sensor structure
CN215118942U (en) * 2021-05-21 2021-12-10 江苏兴宙微电子有限公司 Hall current sensor packaging structure
CN116068239A (en) * 2023-03-30 2023-05-05 宁波中车时代传感技术有限公司 Packaging structure and packaging process of current sensor
CN116373209A (en) * 2023-06-05 2023-07-04 宁波中车时代传感技术有限公司 Manufacturing method of plastic package current detection device and plastic package current detection device
CN117500363A (en) * 2023-11-02 2024-02-02 江苏兴宙微电子有限公司 Hall current sensor and packaging method thereof
CN117665360A (en) * 2024-01-23 2024-03-08 上海兴感半导体有限公司 Closed loop current sensor
CN118688488A (en) * 2024-08-23 2024-09-24 宁波中车时代传感技术有限公司 Method for manufacturing a current sensor chip
CN118884013A (en) * 2024-09-27 2024-11-01 苏州矩阵光电有限公司 Hall current sensor and preparation method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004021862B4 (en) * 2004-05-04 2014-08-07 Infineon Technologies Ag current Senor
JP4685969B2 (en) * 2010-08-30 2011-05-18 旭化成株式会社 Current detection device and manufacturing method thereof
DE102012202179B4 (en) * 2012-02-14 2021-09-23 Robert Bosch Gmbh Magnetic field sensor and method for producing a magnetic field sensor
DE102015117651A1 (en) * 2015-10-16 2017-04-20 Harting Electric Gmbh & Co. Kg Sensor assembly for a current sensor, current sensor with such a sensor assembly, holder for such a current sensor and method for mounting a current sensor
CN114137280A (en) * 2021-11-26 2022-03-04 成都芯进电子有限公司 A hall effect current sensor
CN116110797A (en) * 2022-11-16 2023-05-12 成都芯进电子有限公司 Packaging method and chip structure of Hall current sensor chip
CN116153897A (en) * 2023-03-30 2023-05-23 成都芯进电子有限公司 Lead frame structure, package structure and method of Hall current sensor chip

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040056647A1 (en) * 2002-09-20 2004-03-25 Jason Stauth Integrated current sensor
JP2012202720A (en) * 2011-03-23 2012-10-22 Asahi Kasei Electronics Co Ltd Current sensor and method for manufacturing current sensor
CN112526192A (en) * 2020-11-23 2021-03-19 宁波中车时代传感技术有限公司 Integrated chip type current sensor and manufacturing method thereof
CN214225264U (en) * 2021-01-26 2021-09-17 云茂电子(南通)有限公司 Large-current sensor structure
CN215118942U (en) * 2021-05-21 2021-12-10 江苏兴宙微电子有限公司 Hall current sensor packaging structure
CN116068239A (en) * 2023-03-30 2023-05-05 宁波中车时代传感技术有限公司 Packaging structure and packaging process of current sensor
CN116373209A (en) * 2023-06-05 2023-07-04 宁波中车时代传感技术有限公司 Manufacturing method of plastic package current detection device and plastic package current detection device
CN117500363A (en) * 2023-11-02 2024-02-02 江苏兴宙微电子有限公司 Hall current sensor and packaging method thereof
CN117665360A (en) * 2024-01-23 2024-03-08 上海兴感半导体有限公司 Closed loop current sensor
CN118688488A (en) * 2024-08-23 2024-09-24 宁波中车时代传感技术有限公司 Method for manufacturing a current sensor chip
CN118884013A (en) * 2024-09-27 2024-11-01 苏州矩阵光电有限公司 Hall current sensor and preparation method thereof

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