WO2009068010A1 - Laminated power electronics subassembly - Google Patents
Laminated power electronics subassembly Download PDFInfo
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- WO2009068010A1 WO2009068010A1 PCT/DE2008/001963 DE2008001963W WO2009068010A1 WO 2009068010 A1 WO2009068010 A1 WO 2009068010A1 DE 2008001963 W DE2008001963 W DE 2008001963W WO 2009068010 A1 WO2009068010 A1 WO 2009068010A1
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- WIPO (PCT)
- Prior art keywords
- semiconductor device
- film
- polymer
- metal strip
- metal
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/60—Strap connectors, e.g. thick copper clips for grounding of power devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/01—Manufacture or treatment
- H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
- H10W70/093—Connecting or disconnecting other interconnections thereto or therefrom, e.g. connecting bond wires or bumps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
- H10W74/144—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed the encapsulations comprising foils
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07531—Techniques
- H10W72/07532—Compression bonding, e.g. thermocompression bonding
- H10W72/07533—Ultrasonic bonding, e.g. thermosonic bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/076—Connecting or disconnecting of strap connectors
- H10W72/07631—Techniques
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/60—Strap connectors, e.g. thick copper clips for grounding of power devices
- H10W72/651—Materials of strap connectors
- H10W72/652—Materials of strap connectors comprising metals or metalloids, e.g. silver
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/761—Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors
- H10W90/764—Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors between a chip and a stacked insulating package substrate, interposer or RDL
Definitions
- the invention relates to a semiconductor module for the power electronics, which is assembled in a one-step pressure contact method and at the same time laminated at the same time.
- a semiconductor component in which the upper side makes electrical contact with a metallization by means of an electrically insulating polymer film which tightly encloses the element.
- DE 101 21 970 Al describes a similar device whose metallizations are part of a flexible printed circuit board.
- DE 10 2006 014 582 A1 and DE 10 2005 031 836 A1 relate to semiconductor components which are provided with a metal strip serving as a contact element.
- Semiconductor modules for power electronics typically comprise a plurality of semiconductor components on a circuit-wise prestructured substrate and an arrangement of connecting elements on the upper sides of the components.
- the connection or the contact elements usually consist of a plurality of parallel bonding wires, which are rubbed by a suitable Verbmdungstechnik, for example, micro-O-welding or ultrasonic bonding in the semiconductor surfaces. This goes with a considerable deformation the wires and is with respect to the cycle load of the assembly with currents of the order of 100 A proved to be disadvantageous for the durability of the bonds.
- the semiconductor devices themselves are according to the teaching of DE 34 14 065 Al preferably via pressure sintering technology (in particular with silver) connected flat to the substrate.
- Common substrates are industrial ceramics with double-sided metallization layers, of which at least the side facing the semiconductor components is prestructured.
- the pre-structuring implements a circuit-compatible arrangement of mutually insulated interconnects via which the interconnection of the semiconductor components sintered onto the interconnects takes place from the underside.
- the metal cushion between the component and the substrate, which is produced by the pressure of the beads, serves, in addition to the attachment, also to realize a low electrical contact resistance as well as a small heat transfer resistance.
- the assembly of the assembly with the side of the substrate facing away from the components onto a heat sink is also state of the art.
- a power assembly in multi-layer construction is known, in the production of the same time the electrical contact between the substrate and semiconductor devices and between components and connecting elements circuit in a single step, such as by isostatic pressurization with heating (sintering step) can take place.
- the potting compound is hereby replaced by prefabricated, in particular provided with local recesses Isoliermaterialfolien, so-called PrePregs (PRE inPREGnated sheet material).
- PrePregs PRE inPREGnated sheet material
- These are flexible insulator sheets (e.g., a polymer) with double-sided resin coating, whereby the resin can be brought into its final solid form by hot pressing.
- a flexible printed circuit board e.g., polyimide with incorporated copper traces
- Topsides and bottoms of the semiconductor devices are already provided with sintering paste during assembly.
- the components are held in place by adhesion to the pressure sintering on the substrate.
- the entire "sandwich" of substrate, pre-mounted components, prepreg and flexible circuit board can then be pressed into a finished laminated assembly with a single pressurization.
- the currently used pressure range for the pressure sintering step is 10 MPa to 60 MPa.
- DE 196 17 055 Cl there is therefore the risk of mechanical destruction, in particular of the edge regions of the semiconductor components.
- DE 10 2005 047 567 B3 therefore teaches to replace the PrePreg with an insulating molded body which initially projects beyond the height of the semiconductor components and has recesses for the components which are longer and wider than the component dimensions. By pressing the height of the insulating molding is reduced, at the same time it expands laterally and the components then surrounds flush from all sides. In this way, a more even pressure distribution during the pressure sintering is achieved.
- the insulating moldings of DE 10 2005 047 567 B3 have, in addition to the electrical insulation and the pressure distribution, the advantage of a relatively flush leveling of the upper sides of components and moldings during the pressing process.
- the applied flexible printed circuit board is thereby exposed under the high pressure only minor differences in level. In particular, it is not bent over the edges of the components away by pressing, which can damage the conductor tracks in the circuit board.
- the laminated assembly still consists of the four structured construction levels mentioned above, which must all be accurately fitted together prior to pressure sintering.
- the starting point of the invention is a structured substrate with prefabricated, circuitally positioned semiconductor devices according to the prior art.
- a sintered metal paste arranged, which is solidified by pressure sintering only in the final, at the same laminating pressing process.
- the film should consist of PTFE or a silicone polymer, since these materials are good electrical insulators and at the same time flowable under pressure. The latter is not the case, in particular for polyimide, from which conventional flexible circuit boards are made.
- the inventive, flowable under pressure film has a structuring, with the aid of which metallic contact elements can be fixed in a circuit-oriented arrangement therein.
- the contact elements are relatively thick (300 ⁇ m-500 ⁇ m) metal strips, preferably of copper, with lengths in the centimeter range.
- the film thickness is also preferably selected to be 300 ⁇ m - 500 ⁇ m, but thicker films may also be used.
- the film has slits through which the metal strips are guided. Portions of the contact bands then each run on one of the two sides of the film.
- tapes can be electrically isolated from each other cross over, if they are arranged in the region of the intersection on different sides of the film. The specific arrangement of the slits and contact strips results in the individual case from the intended interconnection of the upper sides of the semiconductor components.
- the side of the film which is facing the semiconductor components during assembly should be referred to as the inside of the film.
- the outside of the invention slotted and equipped with metal strips polymer film initially has blank metal contact surfaces. These could in principle be used to bring about a further interconnection of these areas with each other or with external contacts. However, any such desired interconnection can also be achieved via the film inside, so that preferably on the outside Another, unstructured polymer film - preferably the same material - is adhered to completely isolate said metal contact surfaces.
- Sint-metal paste is applied to the exposed metal contact surfaces of the film inside or alternatively to the surfaces to be contacted with these on the upper side of the semiconductor components, and the polymer film according to the invention, which is flowable under pressure and equipped with metal strips, becomes in a single pressure sintering step Pressed prepared substrate with components arranged thereon pressed to produce a laminated power assembly.
- the thick polymer film acts both electrically insulating and distributing pressure.
- On a height leveling of the assembly as achieved with the known insulating moldings is, however, omitted. Consequently, the metal bands are bent over the edges of the components during pressure sintering and then run following the profile. A sharp bending of the bands in the region of the edges is avoided by the cushion effect of the polymer film, which is arranged there between the metal strip and the component.
- the thickness of the bands also ensures that the contact bands are not interrupted even in the area of severe deformation.
- the metal bands may have approximately longitudinal slots along which thin metal strips have been removed. For example, these strips are already punched out during production at regular intervals. This weakens on the one hand the internal mechanical structure of the metal bands, so that they have an increased mobility, for example against compressive forces, and on the other hand creates a "within the metal strip itself provided space" for receiving a temperature-induced increase in volume. It is particularly advantageous that metal strips in the form of a braid of metal wires also aur run the desired mobility and the internal space for receiving material expansions, and that these are already available, for example as Entlötlitzen on the market. Therefore, it is proposed as a particularly preferred embodiment of the invention to equip the polymer film of the invention from the outset with Metallflechtb sectionn as contact elements.
- Figure 1 is a cross-section through a laminated power assembly made in accordance with the present invention just prior to assembly and pressure sintering.
- FIG. 2 shows a plan view of the substrate, the polymer film according to the invention with threaded metal strips and the superposition of the two as in FIG. 1.
- a common substrate (10) consisting of an industrial ceramic with metal coating on both sides, wherein the metal layer of the top has a structuring in mutually insulated conductor tracks.
- substrate pressure sintered material (20) in particular silver sintering paste, is arranged at suitable locations, which serves for the formation of solid, flat contact connections with the semiconductor components (30) and the metal strips (40) according to the invention.
- the metal strip is liier Kupferflechtband (or strand), which preferably still with a precious metal (eg gold, silver, palladium) coated (eg galvanized) is.
- the film (50) according to the invention consists of a polymer which is flowable under pressure (for example polytetrafluoroethylene, PTFE) and, in this example, has slots and recesses.
- the illustrated left metal band (40) runs, for example, first on the inside of the film (50), passes through a slot on the outside and covered there an area with a recess. A contacting should take place in the regions of the recess and the inner foil course, for which purpose a further arrangement of pressure sintering paste (60) on the upper side of the semiconductor component (30) is provided in addition to the pressure sintering paste (20).
- Fig. 2 illustrates this by omitting the representation of the pressure sintering paste (20, 60).
- the left picture shows the substrate (10) with the semiconductor components (30) on the structured metal layer (coarsely hatched).
- the polymer film (50) is shown, which is provided with a total of four slots for the passage of two rectangular metal bands (40). In this case, each metal band extends partially below (41) and above (42) the image plane, i. the polymer film.
- the metal strip portions (41) can be contacted with the components (30) and the external terminals.
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- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Die Bonding (AREA)
Abstract
Description
P 5684τ>va7045 P 5684t> va7045
Fachhochschule Kiel Sokratesplatz 1University of Applied Sciences Kiel Sokratesplatz 1
D-24149 KielD-24149 Kiel
Laminierte LeistungselektronikbaugrappeLaminated power electronic bauble
Die Erfindung betrifft eine Halbleiterbaugruppe für die Leistungselektronik, die in einem Ein- Schritt-Druckkontaktverfahren zusammengefügt und dabei zugleich laminiert wird.The invention relates to a semiconductor module for the power electronics, which is assembled in a one-step pressure contact method and at the same time laminated at the same time.
Aus der DE 10 2004 057 494 Al ist eine Halbleiterbauelement bekannt, bei dem die Oberseite durch eine das Element dicht umschließende, elektrisch isolierende Polymerfolie hindurch mittel einer Metallisierung elektrische kontaktiert. Die DE 101 21 970 Al beschreibt eine ähnliche Vorrichtung, deren Metallisierungen Bestandteil einer flexiblen Leiterplatte sind. Die DE 10 2006 014 582 Al und die DE 10 2005 031 836 Al betreffen Halbleiterbaugruppen, die mit einem als Kontaktelement dienenden Metallband versehen sind.From DE 10 2004 057 494 A1, a semiconductor component is known, in which the upper side makes electrical contact with a metallization by means of an electrically insulating polymer film which tightly encloses the element. DE 101 21 970 Al describes a similar device whose metallizations are part of a flexible printed circuit board. DE 10 2006 014 582 A1 and DE 10 2005 031 836 A1 relate to semiconductor components which are provided with a metal strip serving as a contact element.
Halbleiterbaugruppen für die Leistungselektronik umfassen typisch eine Mehrzahl von Halbleiterbauelementen auf einem schaltungsgerecht vorstrukturierten Substrat sowie eine Anordnung von Verbindungselementen auf den Oberseiten der Bauelemente. Die Verbindungs- o- der Kontaktelemente bestehen gewöhnlich aus einer Mehrzahl paralleler Bonddrähte, die durch eine geeignete Verbmdungstechnik, z.B. Mikroreibschweißen bzw. Ultraschall-Bonden, in die Halbleiteroberflächen gerieben werden. Dies geht mit einer erheblichen Verformung der Drähte einher und ist hinsichtlich der Zyklenbelastung der Baugruppe mit Strömen der Größenordnung 100 A nachweislich von Nachteil für die Haltbarkeit der Bonds.Semiconductor modules for power electronics typically comprise a plurality of semiconductor components on a circuit-wise prestructured substrate and an arrangement of connecting elements on the upper sides of the components. The connection or the contact elements usually consist of a plurality of parallel bonding wires, which are rubbed by a suitable Verbmdungstechnik, for example, micro-O-welding or ultrasonic bonding in the semiconductor surfaces. This goes with a considerable deformation the wires and is with respect to the cycle load of the assembly with currents of the order of 100 A proved to be disadvantageous for the durability of the bonds.
Die Halbleiterbauelemente selbst sind nach der Lehre der DE 34 14 065 Al vorzugsweise über Drucksintertechnik (insbesondere mit Silber) flächig mit dem Substrat verbunden. Gängige Substrate sind Industriekeramiken mit beidseitigen Metallisierungsschichten, von denen wenigstens die den Halbleiterbauelementen zugewandte Seite vorstrukturiert ist. Die Vor- strukturierung realisiert eine schaltungsgerechte Anordnung von gegeneinander isolierten Leiterbahnen, über die die Verschaltung der auf die Leiterbahnen gesinterten Halbleiterbauelemente von der Unterseite her erfolgt. Das durch Dracksintern erzeugte Metallkissen zwischen Bauelement und Substrat dient neben der Befestigung auch der Realisierung eines geringen elektrischen Übergangswiderstandes sowie eines kleinen Wärmetransportwiderstandes. Die Montage der Baugruppe mit der den Bauelementen abgewandten Seite des Substrats auf einen Kühlkörper (z.B. Wasserkühlung) ist ebenfalls Stand der Technik.The semiconductor devices themselves are according to the teaching of DE 34 14 065 Al preferably via pressure sintering technology (in particular with silver) connected flat to the substrate. Common substrates are industrial ceramics with double-sided metallization layers, of which at least the side facing the semiconductor components is prestructured. The pre-structuring implements a circuit-compatible arrangement of mutually insulated interconnects via which the interconnection of the semiconductor components sintered onto the interconnects takes place from the underside. The metal cushion between the component and the substrate, which is produced by the pressure of the beads, serves, in addition to the attachment, also to realize a low electrical contact resistance as well as a small heat transfer resistance. The assembly of the assembly with the side of the substrate facing away from the components onto a heat sink (for example water cooling) is also state of the art.
Das Problem des Bondings der Kontaktelemente wird eingehend in der Arbeit von Amro et al., „Double-Sided Low-Temperature Joining Technique for Power Cycling Capability at High Temperature" (Proc. EPE2005, Dresden 11-14 Sept.2005) untersucht. Die Arbeit kommt zu der Erkenntnis, dass die Lebensdauer von Leistungsbaugruppen erheblich gesteigert werden kann, wenn auch die Kontaktelemente auf den Oberseiten der Halbleiterbauelemente über eine Sintertechnik befestigt werden. Statt der nachteiligen Verformung der Kontaktelemente selbst wird die Sintermasse (z.B. Silberpulver-haltige Paste) unter Druck und Wärme geformt und zur festen Einbettung der Kontaktelemente veranlasst.The problem of bonding the contact elements is examined in detail in the work of Amro et al., "Double-Sided Low-Temperature Joining Technique for Power Cycling Capability at High Temperature" (Proc. EPE2005, Dresden 11-14 Sept.2005) Work comes to the realization that the service life of power assemblies can be significantly increased, even if the contact elements are attached to the tops of the semiconductor devices via a sintering technique instead of the adverse deformation of the contact elements themselves, the sintered mass (eg silver powder-containing paste) under pressure and heat formed and causes the fixed embedding of the contact elements.
Da für die Drucksinterverbindung eine flächige Befestigung gegenüber der punktuellen des Drahtbonding zu bevorzugen ist, kommen in Amro et al. anstelle mehrerer parallel verlaufender Bonddrähte auch einzelne Metallbändchen („ribbon") z.B. aus Silber zum Einsatz. Diese sind durch ihre große Querschnittsfläche gut für den Transport großer Ströme geeignet.Since the pressure sintered connection is to be preferred to a planar fastening in relation to the punctiform one of the wire bonding, Amro et al. Instead of a plurality of parallel bonding wires, individual metal ribbons ("ribbon"), for example made of silver, are also used, which, due to their large cross-sectional area, are well suited for the transport of large currents.
Aufgrund der erheblichen Unterschiede in den Wärmeausdehnungskoeffizienten des Metalls der Kontaktelemente und der Halbleiterbauelemente können sich im Betrieb der Baugruppe Scherkräfte entlang der Baugruppenebene einstellen, die insbesondere auf die Kontaktbindungen wirken und diese mit der Zeit lösen. Als Abhilfe ist es Stand der Technik, die Kontaktelemente in Form von sich von der Baugruppenebene abhebenden Schlaufen anzuordnen, so dass die Wärmeausdehnung der Metallkontakte vorrangig zu Scherkraftkomponenten senkrecht zur Baugruppenebene führt, was schadlos für die Bonds bleibt. Solche Schlaufen sind bei Draht- und bei Ribbon-Bonds geläufig.Due to the considerable differences in the coefficients of thermal expansion of the metal of the contact elements and of the semiconductor components, during operation of the module Set shear forces along the assembly plane, which in particular act on the contact bonds and solve them over time. As a remedy, it is state of the art to arrange the contact elements in the form of lifting off from the module level loops, so that the thermal expansion of the metal contacts leads primarily to shear force components perpendicular to the module level, which remains harmless for the bonds. Such loops are common in wire and ribbon bonds.
Zur Erzielung ausreichender Stoßfestigkeit der fertigen Leistungsbaugruppen ist es gängig, die Baugruppe mit einer Isoliermasse (z.B. Silikonkautschuk) bis oberhalb der Kontaktelemente zu vergießen. Bekannt ist dabei auch die Verwendung einer Vergussmasse mit hoher Dielektrizitätskonstante zur verbesserten inneren elektrischen Isolation.To achieve sufficient impact resistance of the finished power assemblies, it is common to shroud the assembly with an insulating material (e.g., silicone rubber) above the contact elements. Also known is the use of a potting compound with a high dielectric constant for improved internal electrical insulation.
Aus der DE 196 17 055 Cl ist eine Leistungsbaugruppe in Mehrschichtbauweise bekannt, bei deren Herstellung zeitgleich die elektrische Kontaktierung zwischen Substrat und Halbleiterbauelementen als auch zwischen Bauelementen und Verbindungselementen schaltungsgerecht in einem einzigen Arbeitsschritt, etwa durch isostatische Druckbeaufschlagung unter Erwärmung (Sinterschritt), erfolgen kann. Die Vergussmasse wird hierbei ersetzt durch vorgefertigte, insbesondere mit lokalen Aussparungen versehene Isoliermaterialfolien, so genannte PrePregs (PRE imPREGnated sheet material). Diese sind flexible Isolatorfolien (z.B. ein Polymer) mit beidseitigem Harzauftrag, wobei sich das Harz durch heißes Verpressen in seine endgültig feste Form bringen lässt. Auf die Halbleiterbauelemente und das PrePreg wird eine flexible Leiterplatte (z.B. Polyimid mit eingearbeiteten Kupferleiterbahnen) gelegt für eine schaltungsgerechte Kontaktierung der Bauelement-Oberseiten im Bereich der Aussparungen der PrePregs.From DE 196 17 055 Cl a power assembly in multi-layer construction is known, in the production of the same time the electrical contact between the substrate and semiconductor devices and between components and connecting elements circuit in a single step, such as by isostatic pressurization with heating (sintering step) can take place. The potting compound is hereby replaced by prefabricated, in particular provided with local recesses Isoliermaterialfolien, so-called PrePregs (PRE inPREGnated sheet material). These are flexible insulator sheets (e.g., a polymer) with double-sided resin coating, whereby the resin can be brought into its final solid form by hot pressing. On the semiconductor devices and the PrePreg, a flexible printed circuit board (e.g., polyimide with incorporated copper traces) is laid for circuit-wise contacting the device tops in the region of the recesses of the PrePregs.
Ober- und Unterseiten der Halbleiterbauelemente werden bereits während der Bestückung mit Sinterpaste versehen. Durch Zufügen z.B. eines Tropfens Alkohol werden die Bauelemente bis zur Drucksinterung auf dem Substrat durch Adhäsion in Position gehalten. Die gesamte „Sandwich-Anordnung" aus Substrat, vorbefestigten Bauelementen, Prepreg und flexibler Leiterplatte kann dann mit einer einzigen Druckbeaufschlagung zu einer fertig laminierten Baugruppe gepresst werden. - A -Topsides and bottoms of the semiconductor devices are already provided with sintering paste during assembly. By adding, for example, a drop of alcohol, the components are held in place by adhesion to the pressure sintering on the substrate. The entire "sandwich" of substrate, pre-mounted components, prepreg and flexible circuit board can then be pressed into a finished laminated assembly with a single pressurization. - A -
Der heute gängige Druckbereich für den Drucksinterschritt liegt bei 10 MPa bis 60 MPa. Bei der Fertigung nach der Lehre der DE 196 17 055 Cl besteht deshalb das Risiko einer mechanischen Zerstörung insbesondere der Randbereiche der Halbleiterbauelemente. Die DE 10 2005 047 567 B3 lehrt deshalb, das PrePreg durch einen Isolationsformkörper zu ersetzen, der zunächst die Höhe der Halbleiterbauelemente überragt und Aussparungen für die Bauelemente aufweist, die länger und breiter als die Bauelementabmessungen sind. Durch den Pressvorgang wird die Höhe des Isolationsformkörpers verringert, wobei er sich zugleich seitlich ausdehnt und die Bauelemente dann von allen Seiten bündig umschließt. Auf diese Weise wird eine gleichmäßigere Druckverteilung während des Drucksinterns erreicht.The currently used pressure range for the pressure sintering step is 10 MPa to 60 MPa. In the production according to the teaching of DE 196 17 055 Cl there is therefore the risk of mechanical destruction, in particular of the edge regions of the semiconductor components. DE 10 2005 047 567 B3 therefore teaches to replace the PrePreg with an insulating molded body which initially projects beyond the height of the semiconductor components and has recesses for the components which are longer and wider than the component dimensions. By pressing the height of the insulating molding is reduced, at the same time it expands laterally and the components then surrounds flush from all sides. In this way, a more even pressure distribution during the pressure sintering is achieved.
Die Isolationsformkörper der DE 10 2005 047 567 B3 haben neben der elektrischen Isolierung und der Druckverteilung auch den Vorzug einer relativ bündigen Nivellierung der Oberseiten von Bauelementen und Formkörper beim Pressvorgang. Die aufzubringende flexible Leiterplatte ist hierdurch unter dem hohen Druck nur geringen Niveauunterschieden ausgesetzt. Insbesondere wird sie so nicht über die Kanten der Bauelemente hinweg durch Andrücken geknickt, was die Leiterbahnen in der Leiterplatte beschädigen kann.The insulating moldings of DE 10 2005 047 567 B3 have, in addition to the electrical insulation and the pressure distribution, the advantage of a relatively flush leveling of the upper sides of components and moldings during the pressing process. The applied flexible printed circuit board is thereby exposed under the high pressure only minor differences in level. In particular, it is not bent over the edges of the components away by pressing, which can damage the conductor tracks in the circuit board.
Gleichwohl besteht die laminierte Baugruppe auch nach der Lehre der DE 10 2005 047 567 B3 immer noch aus den vier oben genannten strukturierten Bauebenen, die vor dem Drucksintern sämtlich passgenau zusammengesetzt werden müssen.Nevertheless, according to the teaching of DE 10 2005 047 567 B3, the laminated assembly still consists of the four structured construction levels mentioned above, which must all be accurately fitted together prior to pressure sintering.
Es ist deshalb die Aufgabe der Erfindung, eine laminierte Leistungsbaugruppe vorzuschlagen, die aus nur noch drei strukturierten Bauebenen besteht und insbesondere auf einen vorgestanzten Isolationsformkörper verzichtet.It is therefore an object of the invention to propose a laminated power assembly, which consists of only three structured building levels and in particular dispenses with a pre-punched insulation molding.
Die Aufgabe wird gelöst durch eine Leistungsbaugruppe mit den Merkmalen des Anspruchs 1. Die Unteransprüche geben vorteilhafte Ausgestaltungen an.The object is achieved by a power module having the features of claim 1. The subclaims indicate advantageous embodiments.
Den Ausgangspunkt der Erfindung bildet ein strukturiertes Substrat mit darauf vorbefestigten, schaltungsgerecht positionierten Halbleiterbauelementen nach dem Stand der Technik. Vorzugsweise wird zwischen Bauelementen und Substrat bereits bei der automatischen Bestü- ckung eine Sintermetallpaste angeordnet, die erst im abschließenden, zugleich laminierenden Pressvorgang durch Drucksintern verfestigt wird.The starting point of the invention is a structured substrate with prefabricated, circuitally positioned semiconductor devices according to the prior art. Preferably, between components and substrate already in the automatic Bestü- a sintered metal paste arranged, which is solidified by pressure sintering only in the final, at the same laminating pressing process.
Es ist nun erfindungsgemäß vorgesehen, auf den Isolationsformkörper vollständig zu verzichten, und die flexible Leiterplatte durch eine strukturierte Polymerfolie zu ersetzen. Bevorzugt soll die Folie aus PTFE oder einem Silikonpolymer bestehen, da diese Materialien gute elektrische Isolatoren und zugleich unter Druck fließfähig sind. Letzteres ist insbesondere für Po- lyimid, aus dem übliche flexible Leiterplatten bestehen, nicht der Fall.It is now provided according to the invention to completely dispense with the insulating molding, and to replace the flexible printed circuit board by a structured polymer film. Preferably, the film should consist of PTFE or a silicone polymer, since these materials are good electrical insulators and at the same time flowable under pressure. The latter is not the case, in particular for polyimide, from which conventional flexible circuit boards are made.
Die erfindungsgemäße, unter Druck fließfähige Folie weist eine Strukturierung auf, mit deren Hilfe metallische Kontaktelemente in schaltungsgerechter Anordnung darin fixiert werden können. Bei den Kontaktelementen handelt es sich erfindungsgemäß um relativ dicke (300 μm - 500 μm) Metallbänder, bevorzugt aus Kupfer, mit Längen im Zentimeterbereich. Die Foliendicke wird vorzugsweise ebenfalls zu 300 μm - 500 μm gewählt, doch auch dickere Folien können verwendet werden.The inventive, flowable under pressure film has a structuring, with the aid of which metallic contact elements can be fixed in a circuit-oriented arrangement therein. According to the invention, the contact elements are relatively thick (300 μm-500 μm) metal strips, preferably of copper, with lengths in the centimeter range. The film thickness is also preferably selected to be 300 μm - 500 μm, but thicker films may also be used.
hi einer bevorzugten Ausgestaltung der Folie weist sie Schlitzungen auf, durch die die Metallbänder geführt werden. Teilbereiche der Kontaktbänder verlaufen dann je auf einer der beiden Folienseiten. Insbesondere können Bänder elektrisch isoliert voneinander über kreuz geführt werden, wenn sie im Bereich der Kreuzung auf verschiedenen Folienseiten angeordnet sind. Die konkrete Anordnung der Schlitzungen und Kontaktbänder ergibt sich im Einzelfall aus der beabsichtigten Verschaltung der Oberseiten der Halbleiterbauelemente. Nachfolgend soll als Innenseite der Folie jene Seite bezeichnet werden, die den Halbleiterbauelementen beim Zusammenfügen zugewandt ist.In a preferred embodiment of the film, it has slits through which the metal strips are guided. Portions of the contact bands then each run on one of the two sides of the film. In particular, tapes can be electrically isolated from each other cross over, if they are arranged in the region of the intersection on different sides of the film. The specific arrangement of the slits and contact strips results in the individual case from the intended interconnection of the upper sides of the semiconductor components. In the following, the side of the film which is facing the semiconductor components during assembly should be referred to as the inside of the film.
Die Außenseite der erfindungsgemäß geschlitzten und mit Metallbändern bestückten Polymerfolie weist zunächst noch blank liegende Metallkontaktflächen auf. Diese könnten grundsätzlich genutzt werden, um eine weitergehende Verschaltung dieser Flächen untereinander oder mit Außenkontakten herbeizuführen. Allerdings kann jede derart gewünschte Verschaltung auch über die Folieninnenseite erzielt werden, so dass auf die Außenseite vorzugsweise eine weitere, unstrukturierte Polymerfolie - bevorzugt desselben Materials - aufgeklebt wird, um die besagten Metallkontaktflächen komplett zu isolieren.The outside of the invention slotted and equipped with metal strips polymer film initially has blank metal contact surfaces. These could in principle be used to bring about a further interconnection of these areas with each other or with external contacts. However, any such desired interconnection can also be achieved via the film inside, so that preferably on the outside Another, unstructured polymer film - preferably the same material - is adhered to completely isolate said metal contact surfaces.
Auf die blank liegenden Metallkontaktflächen der Folieninnenseite oder wahlweise auf die mit diesen zu kontaktierenden Flächen auf der Oberseite der Halbleiterbauelemente wird Sin- termetallpaste aufgetragen, und die erfindungsgemäße, unter Druck fließfähige und mit Metallbändern bestückte Polymerfolie wird in einem einzelnen Drucksinterschritt mit dem in an sich bekannter Weise präparierten Substrat mit darauf angeordneten Bauelementen verpresst, um eine laminierte Leistungsbaugruppe zu erzeugen. Die dicke Polymerfolie wirkt dabei sowohl elektrisch isolierend als auch Druck verteilend. Auf eine Höhennivellierung der Baugruppe, wie sie mit den bekannten Isolationsformkörpern erreicht wird, wird indes verzichtet. Folglich werden die Metallbänder beim Drucksintern über die Kanten der Bauelemente gebogen und verlaufen dann dem Profil folgend. Ein scharfes Abknicken der Bänder im Bereich der Kanten wird vermieden durch die Kissenwirkung der Polymerfolie, die dort zwischen Metallband und Bauelement angeordnet ist. Die Dicke der Bänder stellt überdies sicher, dass die Kontaktbänder auch im Bereich starker Verformung nicht unterbrochen werden.Sint-metal paste is applied to the exposed metal contact surfaces of the film inside or alternatively to the surfaces to be contacted with these on the upper side of the semiconductor components, and the polymer film according to the invention, which is flowable under pressure and equipped with metal strips, becomes in a single pressure sintering step Pressed prepared substrate with components arranged thereon pressed to produce a laminated power assembly. The thick polymer film acts both electrically insulating and distributing pressure. On a height leveling of the assembly, as achieved with the known insulating moldings is, however, omitted. Consequently, the metal bands are bent over the edges of the components during pressure sintering and then run following the profile. A sharp bending of the bands in the region of the edges is avoided by the cushion effect of the polymer film, which is arranged there between the metal strip and the component. The thickness of the bands also ensures that the contact bands are not interrupted even in the area of severe deformation.
Wie eingangs im Stand der Technik hervorgehoben, können Krafteinwirkungen durch unterschiedliche thermische Ausdehnung von Metallbändern und Bauelementen die Haltbarkeit der Baugruppenkontakte beeinträchtigen. Da sich in der vorgeschlagenen laminierten Bauweise trotz Verwendung dicker Metallbänder natürlich keine abgehobenen Schlaufen zur Kraftminderung realisieren lassen, wird erfindungsgemäß eine nähere Ausgestaltung der Metallbänder empfohlen.As emphasized in the prior art, the effects of force due to different thermal expansion of metal strips and components can impair the durability of the module contacts. Of course, in the proposed laminated construction, despite the use of thick metal bands can not realize lifted loops for force reduction, a closer design of the metal bands is recommended according to the invention.
Die Metallbänder können etwa Längsschlitzungen aufweisen, entlang derer dünne Metallstreifen entfernt worden sind. Beispielsweise werden diese Streifen schon während der Herstellung in regelmäßigen Abständen herausgestanzt. Dies schwächt zum einen die innere mechanische Struktur der Metallbänder, so dass sie eine erhöhte Beweglichkeit z.B. gegenüber stauchenden Kräften aufweisen, und schafft zum anderen einen „innerhalb des Metallbandes selbst vorgesehenen Raum" zur Aufnahme einer temperaturbedingten Volumenvergrößerung. Besonders vorteilhaft ist, dass Metallbänder in der Form eines Geflechts von Metalldrähten ebenso die gewünschte Beweglichkeit und den internen Raum zur Aufnahme von Materialausdehnungen aurweisen, und dass diese z.B. als Entlötlitzen am Markt bereits erhältlich sind. Von daher wird als besonders bevorzugte Ausgestaltung der Erfindung vorgeschlagen, die erfindungsgemäße Polymerfolie von vornherein mit Metallflechtbändern als Kontaktelementen zu bestücken.The metal bands may have approximately longitudinal slots along which thin metal strips have been removed. For example, these strips are already punched out during production at regular intervals. This weakens on the one hand the internal mechanical structure of the metal bands, so that they have an increased mobility, for example against compressive forces, and on the other hand creates a "within the metal strip itself provided space" for receiving a temperature-induced increase in volume. It is particularly advantageous that metal strips in the form of a braid of metal wires also aurweisen the desired mobility and the internal space for receiving material expansions, and that these are already available, for example as Entlötlitzen on the market. Therefore, it is proposed as a particularly preferred embodiment of the invention to equip the polymer film of the invention from the outset with Metallflechtbändern as contact elements.
Die Erfindung wird näher beschrieben anhand der folgenden Figuren. Dabei zeigtThe invention will be described in more detail with reference to the following figures. It shows
Fig. 1 einen Querschnitt durch eine erfindungsgemäß hergestellte, laminierte Leistungsbaugruppe unmittelbar vor dem Zusammenfugen und Drucksintern.Figure 1 is a cross-section through a laminated power assembly made in accordance with the present invention just prior to assembly and pressure sintering.
Fig. 2 eine Aufsicht auf das Substrat, die erfindungsgemäße Polymerfolie mit eingefädelten Metallbändern und die Übereinanderanordnung beider wie in Fig. 1.2 shows a plan view of the substrate, the polymer film according to the invention with threaded metal strips and the superposition of the two as in FIG. 1.
In der nachfolgenden Beschreibung wird stets vorausgesetzt, dass die Außenseite der geschlitzten Polymerfolie mit einer zusätzlichen, unstrukturierten Polymerfolie belegt wird, um die Kontaktelemente nach außen zu isolieren. In den Figuren ist diese Folie nicht dargestellt und sie wird im Weiteren auch nicht diskutiert.In the following description, it is always assumed that the outside of the slotted polymer film is covered with an additional, unstructured polymer film in order to isolate the contact elements to the outside. In the figures, this film is not shown and it will not be discussed further below.
In Fig. 1 ist ein gängiges Substrat (10) bestehend aus einer Industriekeramik mit beidseitiger Metallbeschichtung dargestellt, wobei die Metallschicht der Oberseite eine Strukturierung in voneinander isolierte Leiterbahnen aufweist. Auf dem Substrat ist an geeigneten Stellen Drucksintermaterial (20), insbesondere Silbersinterpaste, angeordnet, die zur Ausbildung fester, flächiger Kontaktverbindungen mit den Halbleiterbauelementen (30) und den erfindungsgemäßen Metallbändern (40) dient. Das Metallband ist liier Kupferflechtband (oder Litze), welches vorzugsweise noch mit einem Edelmetall (z.B. Gold, Silber, Palladium) beschichtet (z.B. galvanisiert) wird. Die erfindungsgemäße Folie (50) besteht aus unter Druck fließfähigem Polymer (z.B. Polytetrafluorethylen, PTFE) und weist in diesem Beispiel Schlitze und Aussparungen auf. Das dargestellte linke Metallband (40) verläuft beispielsweise zunächst auf der Innenseite der Folie (50), tritt durch einen Schlitz auf die Außenseite und überdeckt dort einen Bereich mit einer Aussparung. Eine Kontaktierung soll in den Bereichen der Aussparung und des Innenfolienverlaufs erfolgen, wozu neben der Drucksinterpaste (20) eine weitere Anordnung von Drucksinterpaste (60) auf der Oberseite des Halbleiterbauelements (30) vorgesehen ist. Es sei gesondert darauf verwiesen, dass anstelle der Aussparung auch eine einfache Schlitzung der Folie (50) am linken Rand der Aussparung für das Erreichen derselben Verschaltung ausreicht, wenn das Metallband (40) durch diesen wieder auf die Folieninnenseite geführt wird. Das Metallband (40) wird dann durch die Durchführung durch wenigstens zwei Schlitze in der Folie (50) bereits zuverlässig in seiner Position fixiert.In Fig. 1, a common substrate (10) is shown consisting of an industrial ceramic with metal coating on both sides, wherein the metal layer of the top has a structuring in mutually insulated conductor tracks. On the substrate pressure sintered material (20), in particular silver sintering paste, is arranged at suitable locations, which serves for the formation of solid, flat contact connections with the semiconductor components (30) and the metal strips (40) according to the invention. The metal strip is liier Kupferflechtband (or strand), which preferably still with a precious metal (eg gold, silver, palladium) coated (eg galvanized) is. The film (50) according to the invention consists of a polymer which is flowable under pressure (for example polytetrafluoroethylene, PTFE) and, in this example, has slots and recesses. The illustrated left metal band (40) runs, for example, first on the inside of the film (50), passes through a slot on the outside and covered there an area with a recess. A contacting should take place in the regions of the recess and the inner foil course, for which purpose a further arrangement of pressure sintering paste (60) on the upper side of the semiconductor component (30) is provided in addition to the pressure sintering paste (20). It should be noted separately that instead of the recess and a simple slotting of the film (50) on the left edge of the recess for achieving the same interconnection is sufficient when the metal strip (40) is guided by this again on the film inside. The metal strip (40) is then reliably fixed in position by being passed through at least two slots in the film (50).
Die Ausgestaltung der Folie (50) als eine solche, die ausschließlich Schlitze zur Durchführung der Metallbänder (40) aufweist, wird deshalb als bevorzugte Ausgestaltung der Erfindung vorgeschlagen.The design of the film (50) as one having only slots for passing the metal strips (40) is therefore proposed as a preferred embodiment of the invention.
Fig. 2 verdeutlicht dies unter Weglassung der Darstellung der Drucksinterpaste (20, 60). Das linke Bild zeigt das Substrat (10) mit den Halbleiterbauelementen (30) auf der strukturierten Metallschicht (grob schraffiert). In der Mitte ist die Polymerfolie (50) gezeigt, die mit insgesamt vier Schlitzen zur Durchführung von zwei rechteckigen Metallbändern (40) versehen ist. Dabei erstreckt sich jedes Metallband teilweise unter (41) und über (42) der Bildebene, d.h. der Polymerfolie. Legt man die Folie (50) über das Substrat (10), können die Metallbandabschnitte (41) mit den Bauelementen (30) und den Außenanschlüssen kontaktiert werden. Fig. 2 illustrates this by omitting the representation of the pressure sintering paste (20, 60). The left picture shows the substrate (10) with the semiconductor components (30) on the structured metal layer (coarsely hatched). In the middle, the polymer film (50) is shown, which is provided with a total of four slots for the passage of two rectangular metal bands (40). In this case, each metal band extends partially below (41) and above (42) the image plane, i. the polymer film. By placing the film (50) over the substrate (10), the metal strip portions (41) can be contacted with the components (30) and the external terminals.
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007057346A DE102007057346B3 (en) | 2007-11-28 | 2007-11-28 | Laminated power electronics module |
| DE102007057346.6 | 2007-11-28 |
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| WO2009068010A1 true WO2009068010A1 (en) | 2009-06-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/DE2008/001963 Ceased WO2009068010A1 (en) | 2007-11-28 | 2008-11-27 | Laminated power electronics subassembly |
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| DE (1) | DE102007057346B3 (en) |
| WO (1) | WO2009068010A1 (en) |
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| DE112010005383B4 (en) * | 2010-03-12 | 2014-10-16 | Hitachi, Ltd. | Semiconductor device |
| US20240030181A1 (en) * | 2022-07-22 | 2024-01-25 | Asmpt Singapore Pte. Ltd. | Apparatus for applying a sintering force via a compressible film |
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| DE102010039824B4 (en) * | 2010-08-26 | 2018-03-29 | Semikron Elektronik Gmbh & Co. Kg | Power module with a flexible connection device |
| DE102014206601A1 (en) * | 2014-04-04 | 2015-10-08 | Siemens Aktiengesellschaft | A method of mounting an electrical component using a hood and a hood suitable for use in this method |
| DE102014206606A1 (en) * | 2014-04-04 | 2015-10-08 | Siemens Aktiengesellschaft | Method for mounting an electrical component on a substrate |
| DE102014206608A1 (en) * | 2014-04-04 | 2015-10-08 | Siemens Aktiengesellschaft | A method of mounting an electrical component using a hood and a hood suitable for use in this method |
| DE102015116165A1 (en) | 2015-09-24 | 2017-03-30 | Semikron Elektronik Gmbh & Co. Kg | Method for producing a power electronic switching device and power electronic switching device |
| DE102016125521B4 (en) * | 2016-12-22 | 2020-10-15 | Infineon Technologies Ag | Common method for connecting an electronic chip to a connector body and for forming the connector body |
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| DE102007057346B3 (en) | 2009-06-10 |
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