TW200615053A - Coating apparatus and method - Google Patents

Coating apparatus and method

Info

Publication number
TW200615053A
TW200615053A TW094126237A TW94126237A TW200615053A TW 200615053 A TW200615053 A TW 200615053A TW 094126237 A TW094126237 A TW 094126237A TW 94126237 A TW94126237 A TW 94126237A TW 200615053 A TW200615053 A TW 200615053A
Authority
TW
Taiwan
Prior art keywords
coating liquid
pooled
space
opening
shot
Prior art date
Application number
TW094126237A
Other languages
Chinese (zh)
Other versions
TWI353892B (en
Inventor
Tomoatsu Ishibashi
Atsuo Kajima
Kenji Yoshizawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200615053A publication Critical patent/TW200615053A/en
Application granted granted Critical
Publication of TWI353892B publication Critical patent/TWI353892B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044—Slits, e.g. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1026—Valves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Degasification And Air Bubble Elimination (AREA)

Abstract

To provide a coating device and coating method, which can hold a constant discharge amount of a coating liquid at each shot even if shots (applications) of plural times are carried out continuously. When the first shot finishes, opening and closing valves 14 and 21 are closed, an opening and closing valve 11 is opened, and a syringe pump 9 is returned to the original position to send the coating liquid again in a coating liquid-pooled space S via a degassing module 8. At this time, the inside of the coating liquid-pooled space S is under a positive pressure with an excessive pressure in order to prevent the entrainment of air from outside. Thereafter, the opening and closing valve 11 is closed to open an opening and closing valve 17 of a branch line 15 at the same time. Similarly, the excessive pressure inside the coating liquid-pooled space S is removed and decreases up to pressures close to the atmosphere pressure. Thus, by removing the excessive pressure inside the coating liquid-pooled space S just before each shot, the state before the discharge of each shot can be held always in a constant condition.
TW094126237A 2004-08-04 2005-08-02 Coating apparatus and method TWI353892B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004228105A JP4522187B2 (en) 2004-08-04 2004-08-04 Coating apparatus and coating method

Publications (2)

Publication Number Publication Date
TW200615053A true TW200615053A (en) 2006-05-16
TWI353892B TWI353892B (en) 2011-12-11

Family

ID=36022751

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094126237A TWI353892B (en) 2004-08-04 2005-08-02 Coating apparatus and method

Country Status (4)

Country Link
JP (1) JP4522187B2 (en)
KR (1) KR101099256B1 (en)
CN (1) CN1736923B (en)
TW (1) TWI353892B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1987890B1 (en) * 2006-02-21 2011-09-21 Musashi Engineering, Inc. Liquid material discharge device with debubbling mechanism
JP2008036542A (en) * 2006-08-07 2008-02-21 Tokyo Ohka Kogyo Co Ltd Chemical liquid supply method
JP5355881B2 (en) * 2007-12-05 2013-11-27 東京応化工業株式会社 Coating device
JP5272422B2 (en) * 2008-01-30 2013-08-28 大日本印刷株式会社 Coating liquid supply system
JP5419616B2 (en) * 2009-09-25 2014-02-19 武蔵エンジニアリング株式会社 Bubble mixing prevention mechanism, liquid material discharging apparatus including the mechanism, and liquid material discharging method
JP6942497B2 (en) * 2016-09-08 2021-09-29 東京エレクトロン株式会社 Processing liquid supply device
JP2018099654A (en) * 2016-12-21 2018-06-28 アネスト岩田株式会社 Liquid supply system using syringe pump and liquid supply method to syringe pump
CN107029913A (en) * 2017-04-06 2017-08-11 武汉华星光电技术有限公司 A kind of apparatus for coating and coating method
JP7309297B2 (en) * 2021-03-03 2023-07-18 株式会社Ｓｃｒｅｅｎホールディングス Liquid supply device, coating device, aging device, liquid supply method, and aging method
CN117843255A (en) * 2023-12-13 2024-04-09 北京航天控制仪器研究所 A device and method for coating the inner wall of a hollow core optical fiber chamber

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11333352A (en) * 1998-05-29 1999-12-07 Dainippon Printing Co Ltd Paste supply device and method of manufacturing plasma display panel using the same
JP4166465B2 (en) * 2001-12-14 2008-10-15 三菱化学株式会社 Coating apparatus, coating method, and coated substrate manufacturing method
JP2004141744A (en) * 2002-10-23 2004-05-20 Toppan Printing Co Ltd Coating liquid supply apparatus and method

Also Published As

Publication number Publication date
CN1736923B (en) 2010-11-03
TWI353892B (en) 2011-12-11
JP4522187B2 (en) 2010-08-11
KR101099256B1 (en) 2011-12-27
KR20060048854A (en) 2006-05-18
CN1736923A (en) 2006-02-22
JP2006043584A (en) 2006-02-16

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent