KR20070080536A - Chemical Vapor Deposition Equipment for Flat Panel Displays - Google Patents

Abstract

A chemical vapor deposition apparatus for planar displays is disclosed. Chemical vapor deposition apparatus for a flat panel display of the present invention, the susceptor is provided in the chamber in which the deposition process is carried out, the flat display is loaded (Uploading) to the upper surface; A susceptor support for supporting the susceptor; A lift module coupled to the susceptor support to lift the susceptor support; And it characterized in that it comprises a height adjusting unit for independently adjusting the height of the susceptor support for the lifting module. According to the present invention, by allowing the height of the susceptor support to be adjusted independently, it is possible to easily adjust the horizontality of the susceptor, the distance between the gas distribution plate and the susceptor to reduce the time required to adjust the initial process value than conventional The process may be performed in the wrong direction to prevent deposition defects on the flat panel display.

Description

Chemical Vapor Deposition Apparatus for Flat Displays {Chemical Vapor Deposition Apparatus for Flat Display}

1 is a schematic structural diagram of a chemical vapor deposition apparatus for a planar display according to a first embodiment of the present invention.

FIG. 2 is a diagram illustrating an arrangement of susceptor support in the deposition apparatus illustrated in FIG. 1.

3 is an enlarged view of the center rod region shown in FIG. 1.

4 is an enlarged perspective view of main parts of FIG. 1.

5 is a schematic structural diagram of a chemical vapor deposition apparatus for a planar display according to a second embodiment of the present invention.

6 and 7 are diagrams showing the lifting operation of the susceptor support, respectively.

FIG. 8 is a view showing a height adjusting area in a chemical vapor deposition apparatus for a flat display according to a third embodiment of the present invention.

9 is a view of the susceptor support is raised by the height adjustment unit shown in FIG.

FIG. 10 is a view illustrating a height adjusting unit region in a chemical vapor deposition apparatus for a flat display according to a fourth exemplary embodiment of the present invention.

11 is a view of the susceptor support is raised by the height adjustment unit shown in FIG.

* Explanation of symbols for the main parts of the drawings

10 chamber 16 electrode

17 gas distribution plate 26 insulator

30: susceptor 31: substrate loading portion

38: lift pin 40: susceptor support

41: head 42: shaft

50, 55, 60, 60a: height adjustment 62: holder

63: groove 64: leveler

65: head 66: shaft

68: rotating operation rod 69: bearing

70: rotating stop

The present invention relates to a chemical vapor deposition apparatus for a flat panel display, and more particularly, it is possible to easily adjust the height of the susceptor support to facilitate the horizontality of the susceptor, the gap between the gas distribution plate and the susceptor. The present invention relates to a chemical vapor deposition apparatus for planar displays, which can reduce the time required for initial process value adjustment and can prevent the deposition failure in the flat display due to the process being carried out in the wrong direction. .

Flat panel displays are widely used in personal handheld terminals, as well as in TVs and computers.

Such flat displays include liquid crystal displays (LCDs), plasma display panels (PDPs), and organic light emitting diodes (OLEDs).

Among them, liquid crystal display (LCD) injects a liquid crystal, which is an intermediate between solid and liquid, between two thin upper and lower glass substrates, and generates light and shade by changing the arrangement of liquid crystal molecules by the electrode voltage difference between the upper and lower glass substrates. It is a device using a kind of optical switch phenomenon to display an image.

LCDs are now widely used in electronic clocks, electronic calculators, TVs, notebook PCs, electronic products, automobiles, aircraft speed displays and driving systems.

Previously, LCD TVs have a size of about 20 to 30 inches, and monitors have a mainstream size of 17 inches or less. In recent years, however, the preference for large TVs of 40 inches or larger and large monitors of 20 inches or larger has increased.

Therefore, manufacturers of LCDs have come to produce wider glass substrates. Currently, research is being conducted to increase the size of glass substrates to the 7th generation having a width of 1950 X 2250 mm, the 1870 X 2200 mm, or the 8th generation of 2160 X 2460 mm or more.

LCD is a TFT process in which processes such as deposition, photo lithography, etching, chemical vapor deposition, etc. are repeatedly performed, a cell process for bonding upper and lower glass substrates, and an apparatus It is released as a product through the completed module process.

On the other hand, the chemical vapor deposition process, one of many processes, is plasma-formed by an external high frequency power source, and silicon-based compound ions having high energy are ejected from the gas distribution plate through the electrodes. It is a process to be deposited on a glass substrate. This process takes place in a chamber that performs a chemical vapor deposition process.

As will be described in detail later, a susceptor for loading a glass substrate to be deposited is provided in a lower region of the chamber in which the chemical vapor deposition process is performed, and an electrode and a gas distribution plate are disposed in the upper region.

As described above, since the glass substrate under the 7th generation or the 8th generation is a large glass substrate having a heavy weight and a relatively large size, when the large glass substrate is placed on the susceptor, sagging on the susceptor and the glass substrate is likely to occur.

Therefore, usually, several susceptor supports are supported on the lower surface of the susceptor to prevent the susceptor and the large glass substrate from sagging due to the weight of the large glass substrate.

With this configuration, when the glass substrate is loaded on the upper surface of the susceptor, the susceptor is heated to a temperature of about 400 ° C. Thereafter, the susceptor is raised together with the susceptor support through the lifting arm so that the glass substrate is disposed adjacent to the gas distribution plate located below the electrode.

Then, power is applied through an electrode insulated from the chamber by Teflon, which is an insulator. Subsequently, silicon-based compound ions are ejected through the gas distribution plate in which a large number of orifices are formed, and the deposition process of the glass substrate is performed.

On the other hand, whether or not the susceptor is horizontal, the gap between the gas distribution plate and the susceptor has a great influence on the uniformity of the process. Therefore, when assembling the chamber, the operation of precisely adjusting the gap between the susceptor and the gas distribution plate and the susceptor is preceded.

However, even if the chamber is assembled precisely, if the process is repeatedly performed through the chamber, the level of the susceptor and the gap between the gas distribution plate and the susceptor may be out of a desired level.

In particular, because the deflection occurs due to the weight of the glass substrate in the peripheral region of the substrate loading part, which is the upper surface of the susceptor holding the glass substrate, the gap between the susceptor, the gas distribution plate and the susceptor is not well matched in this region. Often happens.

By the way, in the conventional chemical vapor deposition apparatus for planar displays, since there is no means for independently adjusting the height of the susceptor support holding the substrate loading portion of the susceptor with respect to the lifting arm, the susceptor is horizontal. Whether or not, there is a problem that it is not easy to match the gap between the gas distribution plate and the susceptor.

In order to adjust the level of the susceptor, the gap between the gas distribution plate and the susceptor, it is necessary to stop the process, open the chamber, and then reassemble the susceptor and the susceptor support from the beginning. There is a problem that takes time.

If the process is performed in a state where the horizontality of the susceptor, the gap between the gas distribution plate and the susceptor is not properly matched, there is a problem in that deposition failure occurs in the flat panel display.

It is an object of the present invention to adjust the height of the susceptor support independently, so that the horizontality of the susceptor, the distance between the gas distribution plate and the susceptor can be easily adjusted, so that the time required for initial process value adjustment can be adjusted. It is possible to reduce, and to provide a chemical vapor deposition apparatus for a flat display that can prevent the deposition process in the wrong direction due to the process proceeds in the wrong direction in advance.

Another object of the present invention is to provide a chemical vapor deposition apparatus for a flat panel display, which can easily adjust the height of the susceptor support while preventing the bellows tube shielding the gap between the chamber and the susceptor support from being damaged.

According to the present invention, the susceptor is provided in the interior of the chamber in which the deposition process proceeds, the flat display is loaded (Uploading) the upper surface; A susceptor support for supporting the susceptor; A lift module coupled to the susceptor support to lift the susceptor support; And it is achieved by the chemical vapor deposition apparatus for a flat panel display, characterized in that it comprises a height adjusting unit for independently adjusting the height of the susceptor support for the lifting module.

Here, the elevating module, the elevating body unit; And one end may be coupled to the elevating body portion and the other end may include a plurality of lifting arms coupled to the height adjustment portion, the susceptor support may be coupled to the plurality of height adjustment portion, respectively.

The susceptor may include a substrate loading part disposed in the chamber in a lateral direction to support the flat panel display; And an upper end is fixed to the center of the substrate loading part and a lower end is disposed outside the chamber through the lower wall of the chamber, and may include a center rod penetrating the inside of the elevating body part.

A ceramic pillar for supporting the substrate loading part may be further coupled to the outside of the center rod together with the susceptor support.

The height adjustment unit, the boss coupled to the end of the lifting arm, the internal thread is formed; And a height adjusting screw having a male screw threaded to the female screw thread of the boss and screwing the screw to the boss, and a coupling part provided at an upper end of the screw shaft and coupled to the susceptor support. .

The height adjustment unit, the holder coupled to the lower end of the susceptor support; And one region is rotatably supported by the holder and the other region is screwed to the lifting arm to include a leveler for elevating the susceptor support through the holder during rotation in the forward and reverse directions.

The leveler may include a head accommodated in a groove formed in the holder at a predetermined rotation interval; And it may include a shaft portion connected to the head and the screw thread of the outer surface is screwed to the lifting arm.

Rotating operation rod for rotating the leveler in the forward and reverse direction may be further formed at the end of the shaft portion.

A bearing for doubling the rotation of the leveler may be interposed in the contact area where the holder and the leveler contact each other.

A bellows pipe may be provided on the outside of the susceptor support to shield a gap between the chamber and the susceptor support, and the height adjustment part may be damaged when the susceptor support is rotated when the leveler is rotated. It may further include a rotation stop unit for preventing the rotation of the susceptor support to be prevented.

The rotation blocking unit, the key groove formed in any one of the lifting arm and the holder; And a key block provided at another one of the lifting arm and the holder and coupled to the key groove to prevent rotation of the holder when the leveler is rotated.

The key groove may be formed in the holder, and the key block may be provided in the lifting arm.

The susceptor support may be arranged in plural to be spaced apart from the lower portion of the substrate loading portion so as to prevent sagging of the substrate loading portion of the susceptor by the loaded flat display.

The height adjustment unit, the leveler is coupled to the lower end of the susceptor support and the thread formed on the outer surface; And it may include a thread formed in the lifting arm so that the leveler is screwed.

The flat panel display may be a large glass substrate for a liquid crystal display (LCD).

On the other hand, according to the present invention, the susceptor is provided in the interior of the chamber in which the deposition process is carried out, the flat display is loaded (Loading); A susceptor support for supporting the susceptor; A lift module coupled to the susceptor and the susceptor support to lift the susceptor and the susceptor support together; And it is also achieved by a chemical vapor deposition apparatus for a flat display, characterized in that it comprises a height adjusting unit for independently adjusting the height of the susceptor support for the elevating module.

The susceptor may include a substrate loading part disposed in the chamber in a lateral direction to support the flat panel display; And an upper end is fixed to the center of the substrate loading part and a lower end is disposed outside the chamber through the lower wall of the chamber, and may include a center rod coupled to the elevating module.

Hereinafter, with reference to the accompanying drawings will be described in detail for each embodiment of the present invention. In the description, the same reference numerals are given to the same components.

1 is a schematic structural diagram of a chemical vapor deposition apparatus for a planar display according to a first embodiment of the present invention, Figure 2 is a diagram showing the arrangement of the susceptor support in the deposition apparatus shown in Figure 1, Figure 3 1 is an enlarged view of the center rod region shown in FIG. 1, and FIG. 4 is an enlarged perspective view of main parts of FIG. 1.

Referring to these drawings but mainly referring to FIG. 1, a planar display chemical vapor deposition apparatus 1 according to a first embodiment of the present invention is provided in a chamber 10 and an upper region within the chamber 10. An electrode 16 emitting a predetermined silicon-based ion toward the planar display G of the substrate, and a susceptor 30 disposed under the electrode 16 to load the planar display G. ), A plurality of susceptor supports 40 for supporting the susceptor 30 at the lower part of the susceptor 30, an elevating module 36 for elevating the susceptor supports 40, and an elevating module 36. It is provided with a height adjusting portion 50 for independently adjusting the height of the susceptor supports 40.

In the chamber 10, the outer wall is shielded from the outside so that the deposition space S therein can be maintained in a vacuum atmosphere. The deposition space S of the chamber 10 is filled with inert gases He and Ar so as not to affect the silicon compound ions which are the deposition materials emitted from the electrode 16.

The outer wall of the chamber 10 is formed with an opening 10a which is a passage through which a flat display G flows in and out of the chamber 10 by a predetermined working robot. Although not shown, the opening 10a is selectively opened and closed by a door (not shown).

A gas diffusion plate 12 is provided on the bottom surface 11 of the chamber 10 to diffuse the gas existing in the deposition space S in the chamber 10 back into the deposition space S. In the center region of the bottom surface 11 in the chamber 10, a through hole 10b through which the center rod 32 of the susceptor 30 penetrates is formed. An additional through hole 10c through which the shaft portion 42 of the susceptor support 40 penetrates is further formed around the through hole 10b.

The electrode 16 is provided in the upper region in the chamber 10. A plurality of orifices are formed below the electrode 16 to provide a gas distribution plate 17 for distributing silicon compound ions which are deposition materials. The gas distribution plate 17 is disposed side by side with a substrate loading portion 31 of the susceptor 30 to be described later with a predetermined distance (about tens of millimeters (mm)).

The flat display G may be any of liquid crystal display (LCD), plasma display panel (PDP) and organic light emitting diodes (OLED) as described above.

However, in the present embodiment, a large glass substrate G for a liquid crystal display (LCD) will be regarded as a flat display (G). As described above, the large size refers to the size of the level applied to the 7th or 8th generation. Hereinafter, the flat display G will be described as a glass substrate G.

A remote plasma 18 is provided above the outside of the chamber 10 to supply a predetermined cleaning gas to remove impurities remaining in the chamber 10. The high frequency power supply unit 20 is provided around the remote plasma 18. The high frequency power supply unit 20 is connected to the electrode 16 by a connection line 22.

An insulator 26 is provided between the electrode 16 and the outer wall of the chamber 10 so that the electrode 16 directly contacts the outer wall of the chamber 10 and does not conduct electricity. The insulator 26 may be made of Teflon or the like. An exhaust buffer space portion 19 is formed between the electrode 16 and the gas distribution plate 17.

The susceptor 30 has a substrate loading part 31 for supporting a glass substrate G loaded in a transverse direction in the deposition space S in the chamber 10, and an upper end thereof is the center of the substrate loading part 31. The center rod 32 is fixed to the lower end and is disposed outside the chamber 10 through the through hole 10b.

The upper surface of the substrate loading portion 31 is made of almost a plate so that the glass substrate G can be loaded in a precise horizontal state. A heater (not shown) is mounted inside the substrate loading unit 31 to heat the substrate loading unit 31 to a predetermined deposition temperature of approximately 400 ° C.

The susceptor 30 moves up and down in the deposition space S in the chamber 10. That is, when the glass substrate G is loaded, the glass substrate G is disposed in the area of the bottom surface 11 in the chamber 10, and when the glass substrate G is loaded and the process is performed, the glass substrate G is the gas distribution plate 17. Injury so as to be adjacent to).

The space between the center rod 32 and the through hole 10b of the susceptor 30 should not be generated while the susceptor 30 moves up and down. Accordingly, the bellows pipe 34 is provided around the through hole 10b to surround the outside of the center rod 32. The bellows pipe 34 is expanded when the susceptor 30 descends and is compressed when the susceptor 30 rises to prevent the space between the center rod 32 and the through hole 10b.

Inside the bellows tube 34, as shown in FIGS. 1 and 3, a ceramic pillar 33 supporting the substrate loading portion 31 of the susceptor 30 is further provided. The ceramic pillar 33 serves to support the substrate loading part 31 of the susceptor 30 together with the susceptor support 40.

The ceramic pillar 33 is bent parallel to the substrate loading portion 31 at the upper end of the pillar body 33a and the pillar body 33a which are spaced apart from the outer surface of the center rod 32 by the substrate loading portion. An upper bent portion 33b in contact with the lower surface of the 31 and a lower bent portion 33c provided at a lower end of the column body 33a and being unevenly coupled to the elevating body portion 36a of the elevating module 36. . At this time, the pillar body 33a, the upper bent portion 33b and the lower bent portion 33c are preferably made of a ceramic material.

The substrate loading part 31 of the susceptor 30 is provided with a plurality of lift pins 38 which reliably support the lower surface of the glass substrate G loaded or taken out to guide the upper surface of the substrate loading part 31. . The lift pin 38 is provided to penetrate the substrate loading portion 31.

When the susceptor 30 is lowered, the lift pin 38 is pressed at the bottom 11 of the chamber 10 so that the top thereof protrudes to the top of the substrate loading part 31. Thus, the glass substrate G is spaced apart from the substrate loading part 31. On the contrary, when the susceptor 30 floats, the susceptor 30 moves downward to bring the glass substrate G into close contact with the upper surface of the substrate loading part 31.

The lift pin 38 is disposed between the glass substrate G and the substrate loading portion 31 so that the robot arm (not shown) can grip the glass substrate G loaded on the substrate loading portion 31 of the susceptor 30. It also serves to form a space.

On the other hand, as described above, the susceptor 30 under the 7th generation or the 8th generation may have a large weight and a relatively large size, which may cause sag, and in this case, the glass substrate G may also sag.

Thus, as shown, a plurality of susceptor support 40 is provided below the substrate loading portion 31 of the susceptor 30 to support the substrate loading portion 31 of the susceptor 30. Since the substrate loading part 31 is formed to be larger than the size of the large glass substrate G, sagging occurs seriously toward the radially outer side from the center center rod 32.

Therefore, the susceptor support 40 is provided in plurality in the outer region of the substrate loading part 31 of the susceptor 30 to prevent the substrate loading part 31 of the susceptor 30 from sagging.

As such, since the susceptor support 40 is a means for preventing the substrate loading part 31 of the susceptor 30 from sagging, it is preferable that at least two susceptor supports 40 are provided. However, considering that the substrate loading portion 31 has a substantially rectangular shape, as shown in FIG. 2, the susceptor support 40 is disposed along the circumferential direction with the center rod 32 of the susceptor 30 interposed therebetween. It is preferable to form four places at mutual equiangular intervals. Of course, the susceptor supports 40 do not necessarily have an equiangular spacing.

The susceptor support 40 includes a head portion 41 positioned on the bottom surface of the substrate loading portion 31, and a shaft portion extending from the head portion 41 and arranged parallel to the center rod 32 of the susceptor 30. Has 42.

The lower end of the shaft portion 42 is coupled to the height adjustment unit 50 coupled to the lifting arm 36a of the lifting module 36 as described below. Therefore, the susceptor support 40 can be elevated based on the lifting operation of the lifting module 36.

A bellows pipe 34a is formed in the outer region of the shaft portion 42 similarly to the susceptor 30 region described above. The bellows pipe 34a serves to shield the through hole 10c formed in the bottom 11 region of the chamber 10.

If, as shown in the figure, when the bellows pipe 34a having a corrugated structure is not adopted and is made of a general tubular body, the through hole 10c may be opened due to the pipe bursting while the susceptor support 40 is elevated. Then, not only the vacuum state in the chamber 10 can be released, but also the deposition process cannot proceed because the gas and the like filled in the chamber 10 are discharged to the outside.

Therefore, as shown, the bellows pipe 34a having a corrugated structure is mounted on the shaft portion 42 of the susceptor support 40 so that the bellows pipe 34a does not burst even when the susceptor support 40 is elevated. 10c) is preventing it from opening.

The bellows pipe 34a is compressed when the susceptor support 40 rises, and expands when the susceptor support 40 descends. Therefore, the bellows pipe 34a is preferably made of a material that is flexible and heat resistant. The same applies to the bellows pipe 34 in the region of the susceptor 30 described above.

Meanwhile, referring to FIGS. 3 and 4 including FIG. 1, an elevating module 36 for elevating the susceptor support 40 is further coupled to the lower region of the susceptor support 40.

The elevating module 36 includes four lifting arms 36b, one end of which is coupled to the elevating body portion 36a and one end of which is coupled to the elevating body portion 36a, and the other end of which is coupled to the height adjusting unit 50.

The elevating body portion 36a has a structure in which a plurality of plate bodies are coupled to be spaced apart from each other, and a through hole 36c through which the center rod 32 penetrates is further formed inside the elevating body portion 36a. . As a result, the center rod 32 of the susceptor 30 takes the form of being inserted through the through hole 36c without being coupled to the lifting body portion 36a.

The lifting body portion 36a moves up and down together with four lifting arms 36b by being connected to a cylinder or a motor (not shown) and operating. By the elevating module 36, four susceptor supports 40 may be elevated together.

However, in consideration of the degree of deflection of the substrate loading part 31 or the glass substrate G, the four susceptor supports 40 need to be independently raised and lowered, and this is at the end of the lifting arm 36b. The height adjustment unit 50 is provided.

The height adjusting part 50 is coupled to the end of the lifting arm 26b, and includes a boss part 51 having a female thread formed therein, and a height adjusting screw 52. The height adjustment screw 52 has a male screw thread that is screwed to the female screw thread of the boss portion 51 and is provided on the upper end of the screw shaft portion 52a and the screw shaft portion 52a, which are screwed to the boss portion 51. A coupling portion 52b coupled to the lower end of the support 40 and a head portion 52c positioned below the coupling portion 52b are provided.

The operation of the chemical vapor deposition apparatus 1 for a flat panel display having such a configuration and the effects thereof will be described as follows.

First, the glass substrate G to be deposited by the robot arm while the susceptor 30 and the susceptor support 40 are lowered to the lower region of the chamber 10 is loaded with the substrate of the susceptor 30. It is disposed on the upper portion 31.

At this time, since the upper end of the lift pin 38 is protruded a predetermined height to the upper surface of the substrate loading portion 31, the robot arm is taken out after placing the glass substrate (G) on the lift pins (38). When the robot arm is taken out, the inside of the chamber 10 is maintained in a vacuum atmosphere and filled with inert gases He and Ar necessary for deposition.

Next, for the progress of the deposition process, the lifting arm 36b is operated to float the susceptor support 40. Then, the lift pin 38 is lowered, through which the glass substrate G is loaded while being in close contact with the upper surface of the substrate loading part 31. When the susceptor 30 rises to the position as shown in FIG. 6, the operation of the lifting arm 36b is stopped and the glass substrate G is positioned directly below the electrode 16. At this time, the susceptor 30 is heated to about 400 ° C.

Then, power is applied through the electrode 16 insulated by the insulator 26. Subsequently, the silicon-based compound ions are ejected through the gas distribution plate 17 on which a large number of orifices are formed to reach the glass substrate G, thereby depositing on the glass substrate G.

As described above, if the process is repeatedly performed through the chamber 10, the substrate loading part 31 of the susceptor 30 is horizontal, the gas distribution plate 17 and the substrate loading part of the susceptor 30 ( 31) the interval H (see FIG. 6) may deviate from the desired level.

If the deflection occurs in any one area of the substrate loading part 31 of the susceptor 30, the height adjusting part 50 belonging to the position may be adjusted. That is, when the head portion 52c of the height adjustment portion 50 is rotated in the forward and reverse directions, the height adjustment screw 52 can be raised and lowered with respect to the boss portion 51. Therefore, the independent lifting height for the susceptor support 40 can be adjusted.

Through such a height adjustment unit 50, a total of four susceptor support 40 can be freely adjusted in its height. Therefore, the horizontality of the susceptor 30, the distance between the gas distribution plate 17 and the susceptor 30 (H, Figure 6) can be easily adjusted to reduce the time required to adjust the initial process value than conventional The process may be performed in an incorrect direction, thereby preventing the deposition failure on the glass substrate G in advance.

5 is a schematic structural diagram of a chemical vapor deposition apparatus for a planar display according to a second exemplary embodiment of the present invention, and FIGS. 6 and 7 illustrate lifting and lowering operations of the susceptor support, respectively.

As shown in these figures, the present embodiment has a slightly different height adjustment unit 55, as described below, compared to the first embodiment described above, but in addition, the susceptor 30 has a substrate loading unit 31 and a center. The rod 32a is provided, but the elevating module 36 is coupled to the susceptor 30 and the susceptor support 40 so as to elevate the susceptor 30 and the susceptor support 40 together. Of course, even in this case, the susceptor support 40 can be adjusted independently of the height of the lifting module 36, specifically, the lifting arm 36b.

In the chemical vapor deposition apparatus for planar display according to the second embodiment of the present invention, the height adjusting unit 55 is coupled to the lower end of the susceptor support 40 and has a threader formed on the outer surface thereof, and a leveler 56. ) Includes a threaded portion (not shown) formed inside the elevating arm 36b to be screwed.

When the leveler 56 is rotated in the forward and reverse directions, the leveler 56 is elevated along the threaded portion of the lifting arm 36b, and thus the susceptor support 40 can also be elevated. That is, as shown in FIGS. 6 and 7, which are somewhat exaggerated, when the leveler 56 is rotated in the forward direction, the leveler 56 and the susceptor support 40 are raised together with respect to the lifting arm 36b. Rotating the leveler 56 in the reverse direction allows the leveler 56 and the susceptor support 40 to descend with respect to the lifting arm 36b. Of course, at this time, the bellows pipe 34a is compressed and expanded.

The height adjustment unit 55 may be the height adjustment method of the simplest form, even if the height adjustment unit 55 is provided as such a structure there is no difficulty in achieving the effect of the present invention.

FIG. 8 is a view illustrating a height adjusting unit region in a chemical vapor deposition apparatus for a flat display according to a third exemplary embodiment of the present invention, and FIG. 9 is a state in which a susceptor support is raised by the height adjusting unit shown in FIG. 8. Drawing.

As shown in these drawings, in the chemical vapor deposition apparatus for planar display according to the third embodiment of the present invention, the height adjusting unit 60 is coupled to the lifting arm 36b to independently lift and lift the susceptor support 40. Includes a holder 62 and a leveler 64.

The holder 62 serves to connect the leveler 64 to the susceptor support 40. Therefore, the upper end of the holder 62 is fixed to the lower end of the susceptor support 40. As the fixing method, any one such as bonding or bolting may be applied. At this time, the holder 62 may be integrally formed with the susceptor support 40. The groove portion 63 is formed inside the holder 62.

The leveler 64 has one area (upper area in FIGS. 8 and 9) rotatably supported by the holder 63 and another area (lower area in FIGS. 8 and 9) screwed to the lifting arm 36b. have.

In more detail, the leveler 64 has a head portion 65 accommodated in the groove portion 63 formed in the holder 62 at a predetermined rotation interval, and is connected to the head portion 65 and has an outer thread 66a. It consists of a shaft portion 66 screwed to the lifting arm (36).

At this time, the head portion 65 of the leveler 64 may have a larger cross-sectional area than the shaft portion 66 as shown in FIGS. 8 and 9, or as shown in FIGS. 10 and 11, and the cross-sectional area of the shaft portion 66. It may be of almost similar or substantially the same size.

At the end of the shaft portion 66, there is further formed a rotary operation rod 68 for rotating the leveler 64 in the forward and reverse directions.

Although not shown, when the rotary operation rod 68 is shaped like a butterfly nut, the rotary operation rod 68 may be rotated in the forward and reverse directions without a separate tool. However, as shown in the figure, it is enough to rotate the rotary operation rod 68 in the forward and reverse directions by using a separate tool.

Referring to the operation of the height adjustment unit 60 having such a configuration as follows.

First, in the state as shown in FIG. 8, as shown in FIG. 9 using a separate tool, the rotary operation rod 68 is rotated in the forward direction (A). Then, the leveler 34 screwed to the lifting arm 36b is raised.

While rising, the head 65 of the leveler 34 presses the holder 62 to raise the susceptor support 40 in the B direction. At this time, the bellows pipe 34a is crimped.

On the contrary, when the rotary operation rod 68 is rotated in the reverse direction, the leveler 34 screwed to the lifting arm 36b is lowered. Then, in conjunction with this, the susceptor support 40 moves downward as the leveler 34 descends by its own weight. At this time, the bellows pipe 34a is expanded.

As such, by raising or lowering the height of the susceptor support 40 at the corresponding position through the height adjusting unit 60, the horizontal loading of the susceptor 30 to the substrate loading unit 31, the gas distribution plate 17 And the distance H between the substrate loading part 31 of the susceptor 30 can be precisely adjusted again. Therefore, the process proceeds in the wrong direction to prevent the deposition failure in the glass substrate (G) in advance can be prevented.

8 and 9, when the high load is applied to the susceptor support 40 by the weight of the glass substrate G, the weight of the susceptor 30, and the like, the head 65 of the leveler 64 is applied. ) Can be pressed completely into the groove portion 63 of the holder 62.

In this case, forcibly rotating the leveler 64 may rotate the susceptor support 40 while the holder 62 rotates together. In this case, the bellows pipe 34a may burst. Therefore, as shown in FIG. 9, when the leveler 64 is rotated, it is preferable to perform the state in which the rotation of the holder 62 is restricted.

However, if it is cumbersome to rotate the leveler 64 in the forward and reverse directions while restraining the rotation of the holder 62, the structures shown in FIGS. 10 and 11 below may be applied.

FIG. 10 is a view illustrating a height adjusting unit region in a chemical vapor deposition apparatus for a planar display according to a fourth exemplary embodiment of the present invention, and FIG. 11 is a state in which a susceptor support is raised by the height adjusting unit shown in FIG. 10. Drawing.

As shown in these figures, in the chemical vapor deposition apparatus for planar display according to the third embodiment of the present invention, the height adjusting unit 60a has a leveler in a contact area where the holder 62 and the leveler 64 are in contact with each other. The bearing 69 further doubles the rotation of 64.

As shown in the bearing 69, a ball bearing may be applied or a roller bearing may be applied. In addition, the bearings 69 may be arranged in two rows along the lengthwise direction of the leveler 64 to smoothly rotate the leveler 64.

As such, when the bearing 69 is applied, the rotation of the leveler 64 may be smoothly caused by the bearing 69 even if the susceptor support 40 is relatively loaded. Accordingly, as shown in FIG. 11, when the rotary operation rod 68 is rotated in the forward direction A, the leveler 34 screwed to the lifting arm 36 is raised, and the susceptor support 40 is connected to the B direction in conjunction with this. Can be raised. This is the same as the operation of FIG. 9 described above.

On the other hand, even when the bearing 69 is mounted, as described above, when the leveler 64 is forcibly rotated while the susceptor support 40 is relatively loaded, the holder 62 rotates together. The bellows pipe 34a may burst by rotating the acceptor support 40.

Therefore, the height adjuster 60a of the present embodiment prevents the susceptor support 40 from rotating when the susceptor support 40 rotates to prevent the bellows pipe 34a from bursting or breaking. The rotation stopping part 70 which blocks is further provided.

As a simple structure, the rotation stopping unit 70 is provided with a key groove 70a formed in the holder 62 as shown in FIGS. 10 and 11, and is provided on the lifting arm 36 and coupled to the key groove 70a to level the 64. , The key block 70b prevents rotation of the holder 62.

When the rotation stopping unit 70 is provided in this way, even if a relatively high load is applied to the susceptor support 40 due to the weight of the glass substrate G and the weight of the susceptor 30, the key block 70b is provided. Since it is coupled to the key groove 70a, the holder 62 does not rotate when the leveler 64 rotates. Therefore, the susceptor support 40 also can not rotate, the bellows pipe (34a) is not broken or broken.

As such, according to the present invention, by allowing the height of the susceptor support 40 to be independently adjusted with respect to the lifting arm 36, whether the susceptor 30 is horizontal or not, the gas distribution plate 17 and the susceptor 30. The distance between H) can be easily adjusted to reduce the time required for adjusting the initial process value compared to the conventional method, and the process is carried out in the wrong direction, resulting in poor deposition on the glass substrate (G). Can be prevented.

As well as preventing the bellows pipe 34a shielding the gap between the chamber 10 and the susceptor support 40 from being damaged, the height of the susceptor support 40 can be easily adjusted.

In the above-described fourth embodiment, the key groove 70a is formed in the holder 62 and the key block 70b is provided in the lifting arm 36. However, the key block 70b is provided in the holder 62 in the lifting arm 36. The key groove 70a may be formed in the 36.

Although the description is omitted in the above-described embodiment, when the height of the susceptor support 40 is elevated through the height adjusting units 50, 55, 60, and 60a, accurate distance adjustment is necessary. Therefore, in this case, it is preferable to adjust the height of the susceptor support 40 after accurately measuring the horizontality of the susceptor 30 using a separate distance measuring sensor or the like.

Although the description is omitted in the above-described embodiment, the susceptor 30 and the susceptor support 40 may be elevated together by the lifting module 36.

As described above, the present invention is not limited to the described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the present invention, which will be apparent to those skilled in the art. Therefore, such modifications or variations will have to be belong to the claims of the present invention.

As described above, according to the present invention, by adjusting the height of the susceptor support independently, it is possible to easily adjust the horizontality of the susceptor, the gap between the gas distribution plate and the susceptor, which is required for initial process value adjustment. It is possible to reduce the time than in the prior art, and to prevent the deposition failure in the flat display due to the process in the wrong direction.

In addition, according to the present invention, it is possible to easily adjust the height of the susceptor support while preventing the bellows pipe shielding the gap between the chamber and the susceptor support to be broken.

Claims (17)

A susceptor provided inside the chamber in which the deposition process is performed and having a flat display loaded on the upper surface thereof; A susceptor support for supporting the susceptor; A lift module coupled to the susceptor support to lift the susceptor support; And And a height control unit for independently adjusting the height of the susceptor support with respect to the elevating module. The method of claim 1, The lifting module, Lifting body part; And One end is coupled to the lifting body portion and the other end includes a plurality of lifting arms coupled to the height adjustment portion, The susceptor support is a chemical vapor deposition apparatus for a flat panel display, characterized in that the lower end is respectively coupled to the plurality of height adjustment. The method of claim 2, The susceptor, A substrate loading part disposed in the chamber in a lateral direction to support the flat panel display; And The upper end is fixed to the center of the substrate loading portion and the lower end is disposed outside the chamber through the lower wall of the chamber, the chemical vapor phase for flat display, characterized in that it comprises a center rod penetrating the inside of the lifting body portion Vapor deposition apparatus. The method of claim 3, And a ceramic pillar supporting the substrate loading portion together with the susceptor support on an outer side of the center rod. The method of claim 2, The height adjustment unit, A boss portion coupled to an end of the lifting arm and having a female thread formed therein; And And a height adjusting screw having a male screw thread screwed to the female screw thread of the boss, and a screw shaft screwed to the boss, and a coupling part provided on the screw shaft and coupled to the susceptor support. Chemical vapor deposition apparatus for a flat panel display. The method of claim 2, The height adjustment unit, A holder coupled to the lower end of the susceptor support; And One region is rotatably supported by the holder and the other region is screwed to the lifting arm and includes a leveler for elevating the susceptor support through the holder during rotation in the forward and reverse directions. Chemical vapor deposition apparatus. The method of claim 6, The leveler is A head portion accommodated in a groove portion formed in the holder with a predetermined rotation interval; And And a shaft portion connected to the head and having a screw thread on an outer surface thereof screwed to the lifting arm. The method of claim 7, wherein And a rotation operation rod for rotating the leveler in the forward and reverse directions at an end portion of the shaft portion. The method according to claim 6 or 7, And a bearing for doubling the rotation of the leveler in a contact area where the holder and the leveler are in contact with each other. The method of claim 6, On the outside of the susceptor support is provided a bellows pipe for shielding the gap between the chamber and the susceptor support, The height adjusting unit further includes a rotation stop unit for preventing rotation of the susceptor support so that the susceptor support is rotated to prevent the bellows pipe from being damaged when the leveler is rotated. Vapor deposition apparatus. The method of claim 10, The rotation stopping part, A key groove formed on any one of the lifting arm and the holder; And And a key block provided on the other one of the lifting arm and the holder and coupled to the key groove to prevent rotation of the holder when the leveler is rotated. The method of claim 11, The key groove is formed in the holder, the key block is a chemical vapor deposition apparatus for a flat display, characterized in that provided on the lifting arm. The method of claim 3, And a plurality of susceptor supports arranged at a lower portion of the substrate loading portion to prevent sagging of the substrate loading portion of the susceptor by the loaded flat display. The method of claim 2, The height adjustment unit, A leveler coupled to a lower end of the susceptor support and having a thread formed on an outer surface thereof; And And a screw portion formed inside the lifting arm such that the leveler is screwed together. The method of claim 1, The planar display is a chemical vapor deposition apparatus for a flat panel display, characterized in that the large glass substrate for liquid crystal display (LCD). A susceptor provided inside the chamber in which the deposition process is performed and loaded with a flat panel display; A susceptor support for supporting the susceptor; A lift module coupled to the susceptor and the susceptor support to lift the susceptor and the susceptor support together; And And a height control unit for independently adjusting the height of the susceptor support with respect to the elevating module. The method of claim 16, The susceptor, A substrate loading part disposed in the chamber in a lateral direction to support the flat panel display; And The upper end is fixed to the center of the substrate loading portion and the lower end is disposed outside the chamber through the lower wall of the chamber, the chemical vapor deposition apparatus for a flat panel display comprising a center rod coupled to the elevating module .

Images