KR101214361B9 - Plasma generation apparatus - Google Patents

Plasma generation apparatus

Info

Publication number
KR101214361B9
KR101214361B9 KR1020050075064A KR20050075064A KR101214361B9 KR 101214361 B9 KR101214361 B9 KR 101214361B9 KR 1020050075064 A KR1020050075064 A KR 1020050075064A KR 20050075064 A KR20050075064 A KR 20050075064A KR 101214361 B9 KR101214361 B9 KR 101214361B9
Authority
KR
South Korea
Prior art keywords
generation apparatus
plasma generation
plasma
generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1020050075064A
Other languages
Korean (ko)
Other versions
KR101214361B1 (en
KR20070020798A (en
Inventor
권기청
황철주
Original Assignee
주성엔지니어링(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주성엔지니어링(주) filed Critical 주성엔지니어링(주)
Priority to KR1020050075064A priority Critical patent/KR101214361B1/en
Publication of KR20070020798A publication Critical patent/KR20070020798A/en
Application granted granted Critical
Publication of KR101214361B1 publication Critical patent/KR101214361B1/en
Publication of KR101214361B9 publication Critical patent/KR101214361B9/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211Antennas, e.g. particular shapes of coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32091Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • H01J37/32183Matching circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32541Shape

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR1020050075064A 2005-08-17 2005-08-17 Plasma generation apparatus Expired - Lifetime KR101214361B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020050075064A KR101214361B1 (en) 2005-08-17 2005-08-17 Plasma generation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050075064A KR101214361B1 (en) 2005-08-17 2005-08-17 Plasma generation apparatus

Publications (3)

Publication Number Publication Date
KR20070020798A KR20070020798A (en) 2007-02-22
KR101214361B1 KR101214361B1 (en) 2012-12-21
KR101214361B9 true KR101214361B9 (en) 2025-01-10

Family

ID=43653074

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050075064A Expired - Lifetime KR101214361B1 (en) 2005-08-17 2005-08-17 Plasma generation apparatus

Country Status (1)

Country Link
KR (1) KR101214361B1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101003382B1 (en) * 2008-02-13 2010-12-22 주식회사 유진테크 Plasma treatment apparatus and method
KR101013357B1 (en) * 2008-07-23 2011-02-14 한국표준과학연구원 High Power Plasma Generator
JP6647180B2 (en) * 2016-09-09 2020-02-14 東京エレクトロン株式会社 Antenna device, plasma generating device using the same, and plasma processing device
KR102015381B1 (en) 2017-03-29 2019-08-29 세메스 주식회사 Plasma generating device and apparatus for treating substrate comprising the same
JP2024531964A (en) * 2021-08-20 2024-09-03 東京エレクトロン株式会社 Apparatus for plasma processing

Also Published As

Publication number Publication date
KR101214361B1 (en) 2012-12-21
KR20070020798A (en) 2007-02-22

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