KR100707407B1 - 폴리우레탄 발포체의 제조방법, 폴리우레탄 발포체 및연마 시트 - Google Patents
폴리우레탄 발포체의 제조방법, 폴리우레탄 발포체 및연마 시트 Download PDFInfo
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- KR100707407B1 KR100707407B1 KR1020027016600A KR20027016600A KR100707407B1 KR 100707407 B1 KR100707407 B1 KR 100707407B1 KR 1020027016600 A KR1020027016600 A KR 1020027016600A KR 20027016600 A KR20027016600 A KR 20027016600A KR 100707407 B1 KR100707407 B1 KR 100707407B1
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- South Korea
- Prior art keywords
- polyurethane foam
- component
- bubble
- fine
- microbubble
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/10—Prepolymer processes involving reaction of isocyanates or isothiocyanates with compounds having active hydrogen in a first reaction step
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/30—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by mixing gases into liquid compositions or plastisols, e.g. frothing with air
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/0061—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof characterized by the use of several polymeric components
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2375/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
- C08J2375/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Polyurethanes Or Polyureas (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Description
| 비교예 1 | 실시예 1 | 실시예 2 | 실시예 3 | 실시예 4 | 실시예 5 | 실시예 6 | 실시예 7 | ||
| 계면 활성제 | 첨가량(g) | 0 | 1 | 2 | 3 | 4 | 5 | 4 | 4 |
| 중량% (제1성분+제2성분에 대한 것) | 0 | 0.79 | 1.58 | 2.38 | 3.17 | 3.96 | 3.17 | 3.17 | |
| 발포체의 특성 | 밀도(g/㎤) | 0.8 | 0.8 | 0.8 | 0.8 | 0.8 | 0.8 | 0.7 | 0.7 |
| 경도(ASKER D) | 51 | 56 | 55 | 55 | 53 | 52 | 56 | 55 | |
| 셀 직경(㎛) | 50-100 | 30-40 | 30-40 | 30-40 | 30-40 | 30-40 | 30-40 | 30-40 | |
| 연마 특성 | 평탄성(Å) | 1250 | 750 | 850 | 900 | 1000 | 1000 | 700 | 750 |
| 면내 균일성(%) | 6.5 | 5.0 | 4.5 | 4.5 | 4.0 | 4.0 | 5.0 | 4.5 | |
| 평균 연마 속도(Å/분) | 2250 | 2600 | 2700 | 2700 | 2850 | 2900 | 2600 | 2600 | |
Claims (16)
- 이소시아네이트기 함유 화합물을 포함하는 제1 성분과, 활성 수소기 함유 화합물을 포함하는 제2 성분을 혼합하여 미세 기포 폴리우레탄 발포체를 제조하는 방법으로서,상기 제1 성분 또는 제2 성분 중 적어도 한 쪽에, 수산기를 갖지 않는 실리콘계 비이온성 계면활성제를 상기 제1 성분과 상기 제2 성분의 합계량에 대하여 0.1∼5 중량% 미만의 양으로 첨가한 다음, 상기 계면활성제가 첨가된 성분을 이소시아네이트기 또는 활성 수소기와 반응하지 않는 비반응성 기체와 교반함으로써, 상기 비반응성 기체가 미세 기포로서 분산된 기포 분산액을 제조한 후, 상기 기포 분산액에 나머지 성분을 혼합하고 경화시킴으로써, 상기 기포 분산액 중의 미세 기포에 의해 발포체 중의 미세 기포를 형성하는 단계를 포함하는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제1항에 있어서,상기 기포 분산액을 체망(sieve mesh)에 통과시키는 단계를 추가로 포함하는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제1항 또는 제2항에 있어서,상기 제1 성분이 이소시아네이트 프리폴리머(prepolymer)이고,상기 계면활성제를 상기 이소시아네이트 프리폴리머에 첨가하는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제3항에 있어서,상기 이소시아네이트 프리폴리머의 이소시아네이트기가, 지방족 이소시아네이트 화합물에서 유래한 이소시아네이트기를 포함하는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제1항 또는 제2항에 있어서,상기 미세 기포 폴리우레탄 발포체가 연마 시트에 사용되는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제1항 또는 제2항의 제조방법에 따라 얻어진 미세 기포 폴리우레탄 발포체.
- 제6항에 따른 미세 기포 폴리우레탄 발포체로 이루어진 연마 시트.
- 제7항에 있어서,상기 미세 기포 폴리우레탄 발포체의 표면에 홈(groove)이 형성된 것을 특징으로 하는 연마 시트.
- 제3항에 있어서,상기 미세 기포 폴리우레탄 발포체가 연마 시트에 사용되는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제4항에 있어서,상기 미세 기포 폴리우레탄 발포체가 연마 시트에 사용되는 것을 특징으로 하는 미세 기포 폴리우레탄 발포체의 제조방법.
- 제3항의 제조방법에 따라 얻어진 미세 기포 폴리우레탄 발포체.
- 제4항의 제조방법에 따라 얻어진 미세 기포 폴리우레탄 발포체.
- 제9항의 제조방법에 따라 얻어진 미세 기포 폴리우레탄 발포체로 이루어진 연마 시트.
- 제10항의 제조방법에 따라 얻어진 미세 기포 폴리우레탄 발포체로 이루어진 연마 시트.
- 제13항에 있어서,상기 미세 기포 폴리우레탄 발포체의 표면에 홈이 형성된 것을 특징으로 하는 연마 시트.
- 제14항에 있어서,상기 미세 기포 폴리우레탄 발포체의 표면에 홈이 형성된 것을 특징으로 하는 연마 시트.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000176732 | 2000-06-13 | ||
| JPJP-P-2000-00176732 | 2000-06-13 | ||
| PCT/JP2001/004831 WO2001096434A1 (en) | 2000-06-13 | 2001-06-07 | Process for producing polyurethane foam, polyurethane foam, and abrasive sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20030007885A KR20030007885A (ko) | 2003-01-23 |
| KR100707407B1 true KR100707407B1 (ko) | 2007-04-13 |
Family
ID=18678424
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027016600A Expired - Lifetime KR100707407B1 (ko) | 2000-06-13 | 2001-06-07 | 폴리우레탄 발포체의 제조방법, 폴리우레탄 발포체 및연마 시트 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US6777455B2 (ko) |
| JP (1) | JP3490431B2 (ko) |
| KR (1) | KR100707407B1 (ko) |
| CN (1) | CN1263781C (ko) |
| AU (1) | AU2001262716A1 (ko) |
| TW (1) | TWI245050B (ko) |
| WO (1) | WO2001096434A1 (ko) |
Families Citing this family (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100707407B1 (ko) * | 2000-06-13 | 2007-04-13 | 도요 고무 고교 가부시키가이샤 | 폴리우레탄 발포체의 제조방법, 폴리우레탄 발포체 및연마 시트 |
| KR100784656B1 (ko) * | 2000-12-08 | 2007-12-12 | 가부시키가이샤 구라레 | 열가소성 폴리우레탄 발포체, 이의 제조방법 및 이로부터제조된 연마 패드 |
| JP3455187B2 (ja) * | 2001-02-01 | 2003-10-14 | 東洋ゴム工業株式会社 | 研磨パッド用ポリウレタン発泡体の製造装置 |
| JP3956364B2 (ja) * | 2001-04-09 | 2007-08-08 | 東洋ゴム工業株式会社 | ポリウレタン組成物および研磨パッド |
| JP2003062748A (ja) * | 2001-08-24 | 2003-03-05 | Inoac Corp | 研磨用パッド |
| KR100877385B1 (ko) * | 2001-11-13 | 2009-01-07 | 도요 고무 고교 가부시키가이샤 | 연마 패드 및 그 제조 방법 |
| US20040171339A1 (en) * | 2002-10-28 | 2004-09-02 | Cabot Microelectronics Corporation | Microporous polishing pads |
| US20040021243A1 (en) * | 2002-08-02 | 2004-02-05 | Wen-Chang Shih | Method for manufacturing auxiliary gas-adding polyurethae/polyurethane-urea polishing pad |
| JP4101584B2 (ja) * | 2002-08-09 | 2008-06-18 | 東洋ゴム工業株式会社 | 研磨シート用ポリウレタン発泡体及びその製造方法、研磨パッド用研磨シート、並びに研磨パッド |
| JP4313761B2 (ja) * | 2002-11-18 | 2009-08-12 | ドン ソン エイ アンド ティ カンパニー リミテッド | 微細気孔が含まれたポリウレタン発泡体の製造方法及びそれから製造された研磨パッド |
| TW592894B (en) * | 2002-11-19 | 2004-06-21 | Iv Technologies Co Ltd | Method of fabricating a polishing pad |
| TWI313693B (en) * | 2002-12-17 | 2009-08-21 | Dainippon Ink & Chemicals | Two-component curable polyol composition for foamed grindstone, two-component curable composition for foamed grindstone, foamed grindstone, and method for producing foamed grindstone |
| US20050171224A1 (en) * | 2004-02-03 | 2005-08-04 | Kulp Mary J. | Polyurethane polishing pad |
| TWI293266B (en) * | 2004-05-05 | 2008-02-11 | Iv Technologies Co Ltd | A single-layer polishing pad and a method of producing the same |
| US7988534B1 (en) * | 2004-05-19 | 2011-08-02 | Sutton Stephen P | Optical polishing pitch formulations |
| TWI254354B (en) * | 2004-06-29 | 2006-05-01 | Iv Technologies Co Ltd | An inlaid polishing pad and a method of producing the same |
| US7275928B2 (en) | 2004-11-23 | 2007-10-02 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Apparatus for forming a striation reduced chemical mechanical polishing pad |
| JP5037014B2 (ja) * | 2005-03-08 | 2012-09-26 | 東洋ゴム工業株式会社 | 研磨パッドの製造方法、及び研磨パッド |
| SG160368A1 (en) * | 2005-03-08 | 2010-04-29 | Toyo Tire & Rubber Co | Polishing pad and process for producing the same |
| JP2006299076A (ja) * | 2005-04-20 | 2006-11-02 | Toray Ind Inc | ポリウレタンフォーム |
| WO2006123559A1 (ja) | 2005-05-17 | 2006-11-23 | Toyo Tire & Rubber Co., Ltd. | 研磨パッド |
| CN101223016B (zh) * | 2005-07-15 | 2012-02-29 | 东洋橡胶工业株式会社 | 层叠片及其制造方法 |
| JP4681970B2 (ja) * | 2005-07-27 | 2011-05-11 | ニッタ・ハース株式会社 | 研磨パッドおよび研磨機 |
| JP4884726B2 (ja) * | 2005-08-30 | 2012-02-29 | 東洋ゴム工業株式会社 | 積層研磨パッドの製造方法 |
| JP4884725B2 (ja) | 2005-08-30 | 2012-02-29 | 東洋ゴム工業株式会社 | 研磨パッド |
| JP5031236B2 (ja) | 2006-01-10 | 2012-09-19 | 東洋ゴム工業株式会社 | 研磨パッド |
| DE102006016638A1 (de) * | 2006-04-08 | 2007-10-11 | Bayer Materialscience Ag | Mikroporöse Beschichtung auf Basis von Polyurethan-Polyharnstoff |
| US20090093202A1 (en) | 2006-04-19 | 2009-04-09 | Toyo Tire & Rubber Co., Ltd. | Method for manufacturing polishing pad |
| KR100804275B1 (ko) * | 2006-07-24 | 2008-02-18 | 에스케이씨 주식회사 | 고분자 쉘로 둘러싸인 액상 유기물 코어를 포함하는 cmp연마패드 및 그 제조방법 |
| CN102152233B (zh) | 2006-08-28 | 2013-10-30 | 东洋橡胶工业株式会社 | 抛光垫 |
| JP5008927B2 (ja) | 2006-08-31 | 2012-08-22 | 東洋ゴム工業株式会社 | 研磨パッド |
| US20100009611A1 (en) * | 2006-09-08 | 2010-01-14 | Toyo Tire & Rubber Co., Ltd. | Method for manufacturing a polishing pad |
| US8167690B2 (en) | 2006-09-08 | 2012-05-01 | Toyo Tire & Rubber Co., Ltd. | Polishing pad |
| WO2008071622A1 (de) * | 2006-12-11 | 2008-06-19 | Basf Se | Hochelastische polyurethanweichschaumstoffe |
| JP4261586B2 (ja) * | 2007-01-15 | 2009-04-30 | 東洋ゴム工業株式会社 | 研磨パッドの製造方法 |
| US8257153B2 (en) * | 2007-01-15 | 2012-09-04 | Toyo Tire & Rubber Co., Ltd. | Polishing pad and a method for manufacturing the same |
| JP4237800B2 (ja) * | 2007-01-15 | 2009-03-11 | 東洋ゴム工業株式会社 | 研磨パッド |
| JP5078000B2 (ja) | 2007-03-28 | 2012-11-21 | 東洋ゴム工業株式会社 | 研磨パッド |
| KR100828949B1 (ko) * | 2007-04-18 | 2008-05-13 | 아이케이 주식회사 | 난연성 보드 및 그 제조방법 |
| US20090062414A1 (en) * | 2007-08-28 | 2009-03-05 | David Picheng Huang | System and method for producing damping polyurethane CMP pads |
| EP2045279A1 (de) * | 2007-10-05 | 2009-04-08 | Bayer MaterialScience AG | Polyurethan-Schäume für die Wundbehandlung |
| US8052507B2 (en) * | 2007-11-20 | 2011-11-08 | Praxair Technology, Inc. | Damping polyurethane CMP pads with microfillers |
| JP4593643B2 (ja) * | 2008-03-12 | 2010-12-08 | 東洋ゴム工業株式会社 | 研磨パッド |
| US20100035529A1 (en) * | 2008-08-05 | 2010-02-11 | Mary Jo Kulp | Chemical mechanical polishing pad |
| CN101412798B (zh) * | 2008-11-21 | 2011-08-10 | 优洁(亚洲)有限公司 | 软质聚氨酯低回弹泡沫及其制备方法 |
| US8303375B2 (en) | 2009-01-12 | 2012-11-06 | Novaplanar Technology, Inc. | Polishing pads for chemical mechanical planarization and/or other polishing methods |
| WO2010138724A1 (en) * | 2009-05-27 | 2010-12-02 | Rogers Corporation | Polishing pad, polyurethane layer therefor, and method of polishing a silicon wafer |
| US8545292B2 (en) * | 2009-06-29 | 2013-10-01 | Dic Corporation | Two-component urethane resin composition for polishing pad, polyurethane polishing pad, and method for producing polyurethane polishing pad |
| JP5426469B2 (ja) * | 2010-05-10 | 2014-02-26 | 東洋ゴム工業株式会社 | 研磨パッドおよびガラス基板の製造方法 |
| RU2577572C2 (ru) * | 2011-02-24 | 2016-03-20 | Зм Инновейтив Пропертиз Компани | Абразивное изделие с покрытием на вспененной подложке и способ его изготовления |
| KR20130095430A (ko) * | 2012-02-20 | 2013-08-28 | 케이피엑스케미칼 주식회사 | 연마패드 및 그 제조방법 |
| KR101417274B1 (ko) * | 2012-05-23 | 2014-07-09 | 삼성전자주식회사 | 연마패드 및 그 제조방법 |
| SG11201502361QA (en) * | 2012-09-28 | 2015-04-29 | Univ Nanyang Tech | Methods of producing foams and nanocomposites of phthalonitrile based resins, and foams and nanocomposites produced thereof |
| US9643377B2 (en) | 2013-05-02 | 2017-05-09 | Tower Ipco Company Limited | Floor plank with foam core |
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| US10252396B2 (en) * | 2014-04-03 | 2019-04-09 | 3M Innovative Properties Company | Polishing pads and systems and methods of making and using the same |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4927861A (en) | 1987-03-11 | 1990-05-22 | Brastemp S/A | Rigid polyurethane preparation process |
| JPH0812794A (ja) * | 1994-06-30 | 1996-01-16 | Sumitomo Bayer Urethane Kk | ポリウレタン発泡体の製造法 |
| JPH11302355A (ja) * | 1998-04-23 | 1999-11-02 | Dainippon Ink & Chem Inc | 発泡ポリウレタンエラストマー組成物及び防振材 |
| JP2000178374A (ja) * | 1998-12-15 | 2000-06-27 | Toyo Tire & Rubber Co Ltd | ポリウレタン発泡体の製造方法及び研磨シート |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2878282B2 (ja) | 1988-03-01 | 1999-04-05 | 藤倉ゴム工業株式会社 | 研磨材用ポリウレタン組成物およびポリウレタン発泡体の製造方法 |
| MX170184B (es) | 1988-07-15 | 1993-08-10 | Takeda Chemical Industries Ltd | Composicion de poliol para producir espumas rigidas de poliuretano. |
| IT218189Z2 (it) * | 1988-11-23 | 1992-04-08 | Zanussi A Spa Industrie | Macchina lavastoviglie con filtro di ridircolo autopulente. |
| GB9216631D0 (en) * | 1992-08-05 | 1992-09-16 | Ici Plc | Reaction system for preparing microcellular elastomers |
| JPH06220151A (ja) | 1993-01-22 | 1994-08-09 | Sanyo Chem Ind Ltd | 研磨材用ポリウレタン樹脂 |
| JP3042593B2 (ja) * | 1995-10-25 | 2000-05-15 | 日本電気株式会社 | 研磨パッド |
| US6200901B1 (en) * | 1998-06-10 | 2001-03-13 | Micron Technology, Inc. | Polishing polymer surfaces on non-porous CMP pads |
| JP2000017252A (ja) | 1998-06-29 | 2000-01-18 | Dainippon Ink & Chem Inc | 研磨材組成物及びその研磨材 |
| US6022903A (en) * | 1998-07-09 | 2000-02-08 | Arco Chemical Technology L.P. | Permanent gas blown microcellular polyurethane elastomers |
| JP3292725B2 (ja) * | 1998-07-31 | 2002-06-17 | 花王株式会社 | ポリウレタンフォームの製造法 |
| JP2000176374A (ja) | 1998-12-18 | 2000-06-27 | Nippon Steel Corp | 金属板に外観品位の良好な水ガラス系皮膜を形成する方法 |
| JP3880028B2 (ja) | 1999-08-06 | 2007-02-14 | Jsr株式会社 | 研磨パッド用重合体組成物及びそれを用いた研磨パッド |
| JP2001176829A (ja) | 1999-12-20 | 2001-06-29 | Nitto Denko Corp | 半導体ウェーハの研磨方法及び半導体ウェーハ研磨用パッド |
| JP2001179608A (ja) | 1999-12-22 | 2001-07-03 | Toray Ind Inc | 研磨用パッドおよびそれを用いた研磨装置及び研磨方法 |
| TWI225494B (en) * | 2000-02-17 | 2004-12-21 | Mitsui Chemicals Inc | Microcellular polyurethane elastomer, and method of producing the same |
| JP2001277101A (ja) | 2000-03-28 | 2001-10-09 | Rodel Nitta Co | 研磨布 |
| KR100707407B1 (ko) * | 2000-06-13 | 2007-04-13 | 도요 고무 고교 가부시키가이샤 | 폴리우레탄 발포체의 제조방법, 폴리우레탄 발포체 및연마 시트 |
| JP2001358101A (ja) | 2000-06-13 | 2001-12-26 | Toray Ind Inc | 研磨パッド |
| KR100877385B1 (ko) * | 2001-11-13 | 2009-01-07 | 도요 고무 고교 가부시키가이샤 | 연마 패드 및 그 제조 방법 |
-
2001
- 2001-06-07 KR KR1020027016600A patent/KR100707407B1/ko not_active Expired - Lifetime
- 2001-06-07 CN CNB018110789A patent/CN1263781C/zh not_active Expired - Lifetime
- 2001-06-07 JP JP2002510566A patent/JP3490431B2/ja not_active Expired - Lifetime
- 2001-06-07 US US10/111,738 patent/US6777455B2/en not_active Expired - Lifetime
- 2001-06-07 AU AU2001262716A patent/AU2001262716A1/en not_active Abandoned
- 2001-06-07 WO PCT/JP2001/004831 patent/WO2001096434A1/ja not_active Ceased
- 2001-06-12 TW TW090114178A patent/TWI245050B/zh not_active IP Right Cessation
-
2004
- 2004-06-30 US US10/881,756 patent/US7098255B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4927861A (en) | 1987-03-11 | 1990-05-22 | Brastemp S/A | Rigid polyurethane preparation process |
| JPH0812794A (ja) * | 1994-06-30 | 1996-01-16 | Sumitomo Bayer Urethane Kk | ポリウレタン発泡体の製造法 |
| JPH11302355A (ja) * | 1998-04-23 | 1999-11-02 | Dainippon Ink & Chem Inc | 発泡ポリウレタンエラストマー組成物及び防振材 |
| JP2000178374A (ja) * | 1998-12-15 | 2000-06-27 | Toyo Tire & Rubber Co Ltd | ポリウレタン発泡体の製造方法及び研磨シート |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040242719A1 (en) | 2004-12-02 |
| CN1263781C (zh) | 2006-07-12 |
| US7098255B2 (en) | 2006-08-29 |
| WO2001096434A1 (en) | 2001-12-20 |
| KR20030007885A (ko) | 2003-01-23 |
| US6777455B2 (en) | 2004-08-17 |
| US20020183409A1 (en) | 2002-12-05 |
| JP3490431B2 (ja) | 2004-01-26 |
| JPWO2001096434A1 (ja) | 2004-01-08 |
| AU2001262716A1 (en) | 2001-12-24 |
| TWI245050B (en) | 2005-12-11 |
| CN1602321A (zh) | 2005-03-30 |
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