JPS62207860A - Vacuum deposition apparatus - Google Patents

Abstract

PURPOSE:To form a uniform film on the surface of a large-sized substrate by deflecting electron beams by a means of generating a modulation signal so as to uniformly heat a material to be evaporated in a large-sized crucible. CONSTITUTION:Electron beams 2 are irradiated on a material 13 to be evaporated in a crucible in a converged state. A polarization signal is fed from a means 6 of generating a modulation signal to the Y-axis polarization electrodes 4Y1, 4Y2 or the X-axis polarization electrodes 4X1, 4X2 of a means of deflecting the electron beams 2 so that the electron beams 2 are irradiated on the central part of the material 13 as well as the edge parts. The material 13 is uniformly heated by the irradiation and a uniform film is formed on the surface of a large-sized substrate, or the like.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vacuum evaporation device, and more specifically, it deflects an electron beam from an electron gun to uniformly heat the evaporated material in a large crucible. The present invention relates to an apparatus for forming a film with a uniform thickness on the surface of a substrate or the like.

[Prior art] In a conventional vapor deposition apparatus, a large (high output) vacuum vapor deposition electron gun (hereinafter referred to as an electron gun) is used to e.g.
In order to melt and evaporate the evaporation material placed in a relatively large crucible of about 1,000 cm2, a plurality of electron guns such as 10a, 10b, 10c, 10 as shown in FIG.
The evaporation material 13 in the crucible 12 is irradiated with the electron beam 11 emitted from the electron beam 10a, or the evaporation material 13 in the crucible 12 is scanned with the electron beam 11 emitted from a single electron gun 10a as shown in FIG. The evaporation material 13 was irradiated.

[Problems to be Solved by the Invention] By the way, in the former device equipped with a plurality of electron guns shown in FIG. 5, as the number of electron guns increases, the mechanism, control circuit, etc. become complicated, and the device becomes It becomes expensive and has poor operability since multiple electron guns are operated. On the other hand, in the latter device configured with a single electron gun shown in FIG. 6, the electron beam 11 is scanned with a sine wave deflection signal or a triangular wave deflection signal. When the evaporation material 13 is scanned as shown in (a), the residence time of the electron beam 11 in the etched portion of the evaporation material 13 becomes longer, so that the temperature curve shown in FIG. 7(b) There was a drawback that the etched portions at both ends and the central portion O were not heated uniformly. Also, when the evaporation material 13 is scanned with a triangular wave deflection signal as shown in FIG. 8(a), the evaporation material 1
Since the residence time of the electron beam 11 in the etched portion 3 becomes longer, the etched portions at both ends and the central portion O are not uniformly heated as shown by the temperature curve in FIG. 8(b). Therefore,
Such conventional vapor deposition apparatuses have a drawback when forming a film with a uniform thickness on the surface of a large substrate or the like.

In view of the above points, the present invention provides a vacuum evaporation apparatus that uniformly heats an evaporation material placed in a relatively large crucible with an electron beam and forms a film with a uniform thickness on the surface of a large substrate, etc. The purpose is to

[Means for solving the problem] The configuration of the present invention for solving the problem is to irradiate the evaporation material in the crucible with an electron beam from an electron gun in a focused state, and to In an apparatus configured to scan the evaporated material by deflecting it by a deflection means consisting of X and Y deflection electrodes, the X axis, YI of the deflection means
h! A modulation signal generation means for supplying a modulation signal as a deflection signal is provided to either one of the deflection means, and the electron beam is scanned by the modulated deflection No. 13 from the modulation signal generation means, and the evaporated material in the crucible is It is characterized by being configured so that the electron beam is irradiated onto the top.

[Example] Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

FIG. 1 is a block diagram of an embodiment of the present invention. In FIG. 1, 1 is an electron gun that emits an electron beam 2, 3 is a focusing lens, and 4 is a beam deflection electrode.
X-axis deflection electrode 4X+ that deflects the electron beam 2 in the X-axis direction
, 4X2 (shown by a dotted line in FIG. 1, 4X+ is not shown) and a Y-axis deflector 14Y1.4Yz. Reference numeral 5 denotes a deflection power supply that supplies X-axis and Y-axis deflection signals to the deflection electrode 4; 6, the deflection signal from the deflection power supply 5 modulates, for example, the amplitude of the Y-axis deflection signal supplied to the Y-axis deflection electrodes 4Y1, 4Y2, for example. It is a modulation signal generator, and in the device configured in this way, X@deflection electrode 4X+, 4X
2 is supplied with a sawtooth wave deflection signal Vx shown in FIG. 2(a) from the deflection power supply 5 via an amplifier 7, and a sawtooth wave deflection signal Vx shown in FIG. ) is supplied with an amplitude-modulated deflection signal Vy. 13 is the evaporation material mentioned above, and in FIG.
2 is omitted.

In the device configured in this way, the Y-axis deflection electrode 4Ys,
4Y2 is the amplitude-modulated deflection signal V shown in FIG. 2 (b).
When y is supplied, the evaporation material 13 is scanned by the electron beam 2 as shown in FIG. 3(a). When the evaporation material 13 is scanned in this way, the residence time of the electron beam 2 becomes longer not only in the etched portion of the evaporation material 13 but also in the central portion O, and therefore heat propagates in the direction of the arrow a. As shown by the temperature curve in FIG. 3(b), the etched portions at both ends and the central portion 0 are uniformly heated to approximately the same temperature.

Also, when the electron beam 2 irradiated onto the evaporated sample 13 is amplitude-modulated and scanned by the Y-axis deflection electrodes 4YL and 4Y2 as shown in FIG. In addition, the central portion O is uniformly heated to substantially the same temperature as shown by the temperature curve in FIG. 4(b). Therefore, by irradiating the surface of the evaporated material in the crucible with an electron beam while scanning as described above, it is considered that not only the temperature distribution in the X-axis direction but also the temperature distribution in the Y-axis direction is made uniform, for example. This effect is noticeable in large crucibles, especially crucibles with rectangular openings, and by using such a vapor deposition apparatus, it is possible to form a film with a uniform thickness on the surface of a large substrate or the like.

Note that the present invention is not limited to the above embodiments, and can be implemented in other embodiments. In the above example,
Although the case where the electron beam is electrostatically deflected has been described, the X and Y axis deflection electrodes may be replaced with scanning coils and an excitation current may be supplied to electromagnetically deflect the electron beam.

Furthermore, in the above embodiment, the deflection signal supplied to one of the deflection electrodes (Y axis in the above embodiment) is amplitude modulated, but the same result can be obtained even if a modulated signal by amplitude modulation and frequency modulation is supplied as the deflection signal. It has the effect of

Furthermore, the modulation signal is not limited to a sine wave as in the above embodiments, but the same effect can be obtained by using a triangular wave or a sawtooth wave.

[Effects of the Invention] As detailed above, according to the present invention, when heating an evaporation material placed in a relatively large crucible by scanning it with an electron beam, it is possible to control the temperature distribution not only in one direction but also in the same direction. Since the temperature distribution in the orthogonal directions is also considered to be uniform, the evaporation material in the crucible is heated uniformly, thus providing a vacuum evaporation device that can form a film with a uniform thickness on the surface of large substrates, etc. be done.

[Brief explanation of drawings]

Figure 1 is a configuration diagram of an embodiment of the present invention, Figures 2 (A), (
B) is an example of a deflection signal supplied to the deflection electrode, FIGS. 3A and 3B are diagrams for explaining one embodiment of the device, and FIGS. 4A and 4B are other embodiments. Figure 5 to explain
Figures 8 through 8 are diagrams for explaining the conventional device. 1: Electron gun, 2: Electron beam, 3: Focusing lens, 4: Deflection electrode, 5: Deflection power supply, 6: Modulation signal generator, 7, 8:
Amplifier, 12 Nil acupoint, 13: Evaporation material.

Claims (3)

[Claims] (1) The electron beam from the electron gun is irradiated onto the evaporation material in the crucible in a focused state, and the electron beam is
In an apparatus configured to scan the evaporated material by deflecting it by a deflection means consisting of a Y deflection electrode, modulation in which a modulation signal is supplied as a deflection signal to either the X-axis or Y-axis deflection means of the deflection means. A vacuum evaporation apparatus comprising a signal generating means configured to scan the electron beam using a modulated deflection signal from the modulated signal generating means and irradiate the evaporation material in the crucible with the electron beam. (2) The deflection signal supplied to the X-axis deflection electrode of the deflection means is a sawtooth wave deflection signal, and the deflection signal supplied to the Y-axis deflection electrode is an amplitude modulation signal. The vacuum evaporation apparatus according to item 1. (3) A patent in which the deflection signal supplied to the X-axis deflection electrode of the deflection means is a sawtooth wave deflection signal, and the deflection signal supplied to the Y-axis and deflection electrodes is a frequency and amplitude modulation signal. A vacuum evaporation apparatus according to claim 1.