JPS56132337A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS56132337A
JPS56132337A JP3582480A JP3582480A JPS56132337A JP S56132337 A JPS56132337 A JP S56132337A JP 3582480 A JP3582480 A JP 3582480A JP 3582480 A JP3582480 A JP 3582480A JP S56132337 A JPS56132337 A JP S56132337A
Authority
JP
Japan
Prior art keywords
film
cyano
nitro
halogen
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3582480A
Other languages
Japanese (ja)
Inventor
Akizo Hideyama
Akira Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP3582480A priority Critical patent/JPS56132337A/en
Publication of JPS56132337A publication Critical patent/JPS56132337A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To enable patterns with high accuracy and superior etching resistance to be formed by a mass production system by using a positive type crosslinkable radiation sensitive resist contg. benzoic acids or dicarboxydiphenyl disulfides. CONSTITUTION:A substrate is coated with a positive type crosslinkable radiation sensitive resist film contg. One or more kinds of compounds represented by formula I (where each of R1-R3 is a substitutable group and one or more among them are nitro, halogen or cyano) or by formula II (where each of R4 and R5 is a substitutable group and one or more among them are nitro, halogen or cyano). By heat treating the film, the crosslinking reaction is remarkably accelerated at a low temp. such as <=about 200 deg.C, and an enhancement in the sensitivity of the resist and an improvement in the solvent and heat resistances can be attained. The resulting film is then patterned with high energy radiation and developed to form a superior pattern.
JP3582480A 1980-03-21 1980-03-21 Pattern forming method Pending JPS56132337A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3582480A JPS56132337A (en) 1980-03-21 1980-03-21 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3582480A JPS56132337A (en) 1980-03-21 1980-03-21 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS56132337A true JPS56132337A (en) 1981-10-16

Family

ID=12452696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3582480A Pending JPS56132337A (en) 1980-03-21 1980-03-21 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS56132337A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60263143A (en) * 1984-06-01 1985-12-26 ローム　アンド　ハース　コンパニー Thermally stable copolymer image and formation thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60263143A (en) * 1984-06-01 1985-12-26 ローム　アンド　ハース　コンパニー Thermally stable copolymer image and formation thereof

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