JPH05171446A - 薄膜形成方法 - Google Patents
薄膜形成方法Info
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- JPH05171446A JPH05171446A JP34063791A JP34063791A JPH05171446A JP H05171446 A JPH05171446 A JP H05171446A JP 34063791 A JP34063791 A JP 34063791A JP 34063791 A JP34063791 A JP 34063791A JP H05171446 A JPH05171446 A JP H05171446A
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C39/00—Relieving load on bearings
- F16C39/06—Relieving load on bearings using magnetic means
- F16C39/063—Permanent magnets
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- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
(57)【要約】
【構成】 サセプタ1の上にトレイ2を載せ、前記トレ
イ2または/および前記サセプタ1を回転させながら、
化学気相成長法で前記トレイ2の上に載置されている基
板3に薄膜を形成する方法において、前記トレイ2と前
記サセプタ1が、少なくとも互いの対向面部分1b,2
aを互いに極性が同じ磁石材料で構成されることによ
り、前記トレイ2が前記サセプタ1から磁気浮上してい
る薄膜形成方法。 【効果】 複数枚の薄膜を同時に形成する場合に、基板
の自転・公転時における各回転軸は不要となり、また複
雑な機械的なメカニズムも不要になる。したがって、リ
アクタ構造は簡略となり、またメンテナンスは容易にな
る。
イ2または/および前記サセプタ1を回転させながら、
化学気相成長法で前記トレイ2の上に載置されている基
板3に薄膜を形成する方法において、前記トレイ2と前
記サセプタ1が、少なくとも互いの対向面部分1b,2
aを互いに極性が同じ磁石材料で構成されることによ
り、前記トレイ2が前記サセプタ1から磁気浮上してい
る薄膜形成方法。 【効果】 複数枚の薄膜を同時に形成する場合に、基板
の自転・公転時における各回転軸は不要となり、また複
雑な機械的なメカニズムも不要になる。したがって、リ
アクタ構造は簡略となり、またメンテナンスは容易にな
る。
Description
【0001】
【産業上の利用分野】本発明は化学気相成長法(CVD
法)による薄膜形成方法に関し、更に詳しくは、基板を
回転させるための複雑な機構を省略することができる薄
膜形成方法に関する。
法)による薄膜形成方法に関し、更に詳しくは、基板を
回転させるための複雑な機構を省略することができる薄
膜形成方法に関する。
【0002】
【従来の技術】CVD法においては、通常、リアクタの
中に配置されたサセプタの上に所望個数のトレイを載
せ、更にこの各トレイの上に所望の基板をそれぞれ載置
して、リアクタ内に所定の原料ガスを導入し、気相にお
ける原料ガスの化学反応を利用することにより、前記基
板の表面に所望の薄膜が形成される。
中に配置されたサセプタの上に所望個数のトレイを載
せ、更にこの各トレイの上に所望の基板をそれぞれ載置
して、リアクタ内に所定の原料ガスを導入し、気相にお
ける原料ガスの化学反応を利用することにより、前記基
板の表面に所望の薄膜が形成される。
【0003】このとき、基板上に均一な厚みの薄膜を形
成するために、この薄膜形成時には、各トレイを回転さ
せることによりその上の基板を自転させたり、または、
前記基板の自転とともにサセプタも回転させて各基板を
公転させるということが行われている。この場合、トレ
イの回転やサセプタの回転は、Oリングシールや磁気シ
ールが施されている回転軸と前記トレイや前記サセプタ
を結合し、別置のチェーンやベルトのような動力伝達機
構を介して前記回転軸を駆動して行われている。
成するために、この薄膜形成時には、各トレイを回転さ
せることによりその上の基板を自転させたり、または、
前記基板の自転とともにサセプタも回転させて各基板を
公転させるということが行われている。この場合、トレ
イの回転やサセプタの回転は、Oリングシールや磁気シ
ールが施されている回転軸と前記トレイや前記サセプタ
を結合し、別置のチェーンやベルトのような動力伝達機
構を介して前記回転軸を駆動して行われている。
【0004】
【発明が解決しようとする課題】ところで、複数枚の均
一な薄膜を同時に形成するときには、サセプタの上に複
数枚の基板を配置し、各基板を自転させながらサセプタ
を回転(基板を公転)させることが要求される。そのた
めには、各トレイに結合しているそれぞれの回転軸を回
転させて各トレイを自転させつつ、サセプタに結合して
いる回転軸を回転させて各トレイ、すなわちその上の基
板を公転させる機構が必要になる。しかしながら、この
ような機構は極めて複雑である。しかも、この機構は薄
膜形成の過程で、常時、真空で高温の雰囲気に曝される
ことになるので、それに対する耐性が必要となり、か
つ、原料ガスの気相反応に対しても不活性であることが
必要とされ、更には、駆動時には塵埃などを発生しない
ということが要求されることになる。
一な薄膜を同時に形成するときには、サセプタの上に複
数枚の基板を配置し、各基板を自転させながらサセプタ
を回転(基板を公転)させることが要求される。そのた
めには、各トレイに結合しているそれぞれの回転軸を回
転させて各トレイを自転させつつ、サセプタに結合して
いる回転軸を回転させて各トレイ、すなわちその上の基
板を公転させる機構が必要になる。しかしながら、この
ような機構は極めて複雑である。しかも、この機構は薄
膜形成の過程で、常時、真空で高温の雰囲気に曝される
ことになるので、それに対する耐性が必要となり、か
つ、原料ガスの気相反応に対しても不活性であることが
必要とされ、更には、駆動時には塵埃などを発生しない
ということが要求されることになる。
【0005】このようなことから、自転・公転方式を採
用して薄膜を形成する方法は、それに必要な上記機構を
備えたリアクタの製造が非常に困難となっている。本発
明は上記した問題を解決し、機械的なメカニズムを用い
ることなく、トレイすなわち基板を回転させる、薄膜形
成方法の提供を目的とする。
用して薄膜を形成する方法は、それに必要な上記機構を
備えたリアクタの製造が非常に困難となっている。本発
明は上記した問題を解決し、機械的なメカニズムを用い
ることなく、トレイすなわち基板を回転させる、薄膜形
成方法の提供を目的とする。
【0006】
【課題を解決するための手段】上記した目的を達成する
ために、本発明においては、サセプタの上にトレイを載
せ、前記トレイまたは/および前記サセプタを回転させ
ながら、CVD法で前記トレイの上に載置されている基
板に薄膜を形成する方法において、前記トレイと前記サ
セプタが、少なくとも互いの対向面部分が互いに極性を
同じくする磁石材料で構成されることにより、前記トレ
イが前記サセプタから磁気浮上していることを特徴とす
る薄膜形成方法が提供される。
ために、本発明においては、サセプタの上にトレイを載
せ、前記トレイまたは/および前記サセプタを回転させ
ながら、CVD法で前記トレイの上に載置されている基
板に薄膜を形成する方法において、前記トレイと前記サ
セプタが、少なくとも互いの対向面部分が互いに極性を
同じくする磁石材料で構成されることにより、前記トレ
イが前記サセプタから磁気浮上していることを特徴とす
る薄膜形成方法が提供される。
【0007】
【作用】本発明においては、トレイとサセプタの対向面
部分は互いに同じ極性の材料になっているので、トレイ
とサセプタの間には斥力が作用する。したがって、トレ
イは、何らの支持物を要することなく、サセプタからそ
の上の空間に浮上することができる。
部分は互いに同じ極性の材料になっているので、トレイ
とサセプタの間には斥力が作用する。したがって、トレ
イは、何らの支持物を要することなく、サセプタからそ
の上の空間に浮上することができる。
【0008】この状態で、トレイの側面から例えばガス
流などを吹き当てれば、トレイは回転する。また、トレ
イとサセプタとの極性を周期的に変化させることによ
り、トレイに回転力を発生させることができる。すなわ
ち、トレイ(基板)は、機械的な回転軸による駆動を必
要とせずに、回転することができるようになる。
流などを吹き当てれば、トレイは回転する。また、トレ
イとサセプタとの極性を周期的に変化させることによ
り、トレイに回転力を発生させることができる。すなわ
ち、トレイ(基板)は、機械的な回転軸による駆動を必
要とせずに、回転することができるようになる。
【0009】
【実施例】以下に、添付図面に基づいて本発明を説明す
る。図1はトレイとサセプタの相互関係の1例を示す部
分断面図である。図において、サセプタ1には凹部1a
が形成されていて、この凹部1aに所定厚みのトレイ2
が配置され、トレイ2の上には基板3が載置されてい
る。
る。図1はトレイとサセプタの相互関係の1例を示す部
分断面図である。図において、サセプタ1には凹部1a
が形成されていて、この凹部1aに所定厚みのトレイ2
が配置され、トレイ2の上には基板3が載置されてい
る。
【0010】サセプタ1とトレイ2はいずれも磁石で構
成されていて、凹部1aの底面1bは例えばS極であ
り、凹部1aの上縁部はN極になっている。また、トレ
イ2の下面2aはS極で、上面2bはN極になってい
る。したがって、トレイの下面2aとサセプタ凹部1a
の底面1bの間には垂直方向に反発力が作用して、トレ
イ2は凹部1aの中に浮上する。このとき、トレイ2の
周囲には、サセプタ凹部1aの上縁部から水平方向に均
等な反発力が作用するので、その力のバランスの結果、
トレイ2はサセプタ凹部1aの略中心に位置することに
なる。
成されていて、凹部1aの底面1bは例えばS極であ
り、凹部1aの上縁部はN極になっている。また、トレ
イ2の下面2aはS極で、上面2bはN極になってい
る。したがって、トレイの下面2aとサセプタ凹部1a
の底面1bの間には垂直方向に反発力が作用して、トレ
イ2は凹部1aの中に浮上する。このとき、トレイ2の
周囲には、サセプタ凹部1aの上縁部から水平方向に均
等な反発力が作用するので、その力のバランスの結果、
トレイ2はサセプタ凹部1aの略中心に位置することに
なる。
【0011】すなわち、トレイ2はサセプタの凹部1a
の略中心位置で浮上する。したがって、サセプタ1と結
合する回転軸を回転させ、かつ、前記浮上しているトレ
イ2にその周方向(接線方向)に何らかの外力を加えれ
ば、トレイ2、すなわち基板3は凹部1aの中で自転し
ながら前記サセプタの回転軸の周りを公転することにな
る。
の略中心位置で浮上する。したがって、サセプタ1と結
合する回転軸を回転させ、かつ、前記浮上しているトレ
イ2にその周方向(接線方向)に何らかの外力を加えれ
ば、トレイ2、すなわち基板3は凹部1aの中で自転し
ながら前記サセプタの回転軸の周りを公転することにな
る。
【0012】なお、トレイ2の浮上量は、トレイの下面
2aにおける磁極とサセプタ凹部の底面1bにおける磁
極の大きさによって適宜に決めることができる。図2は
トレイとサセプタの相互関係の他の例を示す断面図であ
る。図においては、サセプタ凹部の底面1bの中心に小
軸1cが突設され、またトレイ2の下面2aの中心に小
さい孔2cが凹設され、前記小軸1cに前記トレイの中
心孔2cを外嵌して、トレイ2が小軸1cで支持されて
いる。そして、小軸1cにパス4を接続して、このパス
4から例えばパージ用ガスを噴出させることにより、浮
上しているトレイ2をこのパージ用ガスで回転させるこ
とができるようになっている。
2aにおける磁極とサセプタ凹部の底面1bにおける磁
極の大きさによって適宜に決めることができる。図2は
トレイとサセプタの相互関係の他の例を示す断面図であ
る。図においては、サセプタ凹部の底面1bの中心に小
軸1cが突設され、またトレイ2の下面2aの中心に小
さい孔2cが凹設され、前記小軸1cに前記トレイの中
心孔2cを外嵌して、トレイ2が小軸1cで支持されて
いる。そして、小軸1cにパス4を接続して、このパス
4から例えばパージ用ガスを噴出させることにより、浮
上しているトレイ2をこのパージ用ガスで回転させるこ
とができるようになっている。
【0013】なお、この実施例の場合には、トレイ2の
上部周縁をN極の段差構造2dとし、また、サセプタ凹
部1aの上部周縁を同じくN極の張出し構造1dとする
ことにより、トレイ2を図1の場合に比べて一層安定に
浮上させることができるようになっている。図3は更に
別の実施例を示す断面図である。
上部周縁をN極の段差構造2dとし、また、サセプタ凹
部1aの上部周縁を同じくN極の張出し構造1dとする
ことにより、トレイ2を図1の場合に比べて一層安定に
浮上させることができるようになっている。図3は更に
別の実施例を示す断面図である。
【0014】図においては、サセプタ凹部の底面1bの
中心に先端が尖っている小突起1eを形成し、ここでト
レイ2を支持している。そして、トレイ2の周側が溝構
造2eになっていて、ここにサセプタ凹部の張出し構造
1dが、間隙を形成して嵌め込まれている。このとき、
張出し構造1dや溝構造2eはいずれもN極になってい
て、互いに反発力が作用するようになっている。
中心に先端が尖っている小突起1eを形成し、ここでト
レイ2を支持している。そして、トレイ2の周側が溝構
造2eになっていて、ここにサセプタ凹部の張出し構造
1dが、間隙を形成して嵌め込まれている。このとき、
張出し構造1dや溝構造2eはいずれもN極になってい
て、互いに反発力が作用するようになっている。
【0015】また、サセプタの凹部1aの側部にはパス
4が形成されていて、ここからパージ用ガスを噴出して
トレイ2の側部に吹き当てることにより、浮上している
トレイ2が凹部1aの中で回転できるようになってい
る。図4はサセプタ1の凹部底面1bにおける磁石材料
の配置例を示す概略図である。
4が形成されていて、ここからパージ用ガスを噴出して
トレイ2の側部に吹き当てることにより、浮上している
トレイ2が凹部1aの中で回転できるようになってい
る。図4はサセプタ1の凹部底面1bにおける磁石材料
の配置例を示す概略図である。
【0016】すなわち、サセプタ1の凹部底面1bの縁
部には、複数個の電磁石が、N極,S極が交互に位置す
るように配列されている。サセプタの凹部底面をこのよ
うに構成すると、各電磁石の極性を周期的に変化させた
場合、この上に位置するトレイを回転させることができ
る。
部には、複数個の電磁石が、N極,S極が交互に位置す
るように配列されている。サセプタの凹部底面をこのよ
うに構成すると、各電磁石の極性を周期的に変化させた
場合、この上に位置するトレイを回転させることができ
る。
【0017】
【発明の効果】以上の説明で明らかなように、本発明方
法によれば、サセプタの中でトレイ、すなわち基板を磁
気浮上させて回転させることができるので、自転・公転
方式で薄膜を形成する場合、従来のような複雑なトレイ
(基板)自転機構やサセプタ回転機構を組み合わせた複
雑な機構を必要としなくなり、リアクタ構造は著しく簡
素化される。
法によれば、サセプタの中でトレイ、すなわち基板を磁
気浮上させて回転させることができるので、自転・公転
方式で薄膜を形成する場合、従来のような複雑なトレイ
(基板)自転機構やサセプタ回転機構を組み合わせた複
雑な機構を必要としなくなり、リアクタ構造は著しく簡
素化される。
【図1】本発明におけるトレイとサセプタの相互関係の
1例を示す概略断面図である。
1例を示す概略断面図である。
【図2】トレイとサセプタの相互関係の他の例を示す概
略断面図である。
略断面図である。
【図3】トレイとサセプタの相互関係の更に別の例を示
す概略断面図である。
す概略断面図である。
【図4】サセプタ凹部の底面における磁石材料の配置例
を示す概略図である。
を示す概略図である。
1 サセプタ 1a サセプタ1の凹部 1b 凹部1aの底面 1c 小軸 1d 凹部1aの張出し構造 1e 小突起 2 トレイ 2a トレイ2の下面 2b トレイ2の上面 2c トレイ2の小孔 2d トレイ2の段差構造 2e トレイ2の側部の溝構造 3 基板 4 パージ用ガスのパス
Claims (1)
- 【請求項1】 サセプタの上にトレイを載せ、前記トレ
イまたは/および前記サセプタを回転させながら、化学
気相成長法で前記トレイの上に載置されている基板に薄
膜を形成する方法において、前記トレイと前記サセプタ
が、少なくとも互いの対向面部分が互いに極性を同じく
する磁石材料で構成されることにより、前記トレイが前
記サセプタから磁気浮上していることを特徴とする薄膜
形成方法。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34063791A JPH05171446A (ja) | 1991-12-24 | 1991-12-24 | 薄膜形成方法 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP34063791A JPH05171446A (ja) | 1991-12-24 | 1991-12-24 | 薄膜形成方法 |
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| JPH05171446A true JPH05171446A (ja) | 1993-07-09 |
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| JP34063791A Pending JPH05171446A (ja) | 1991-12-24 | 1991-12-24 | 薄膜形成方法 |
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