JP5194076B2 - Laser cleaving device - Google Patents

Laser cleaving device Download PDF

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Publication number
JP5194076B2
JP5194076B2 JP2010190704A JP2010190704A JP5194076B2 JP 5194076 B2 JP5194076 B2 JP 5194076B2 JP 2010190704 A JP2010190704 A JP 2010190704A JP 2010190704 A JP2010190704 A JP 2010190704A JP 5194076 B2 JP5194076 B2 JP 5194076B2
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Prior art keywords
substrate
fixing
shaped member
rod
laser
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JP2012045830A (en
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陽一 今泉
健司 音田
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Mitsuboshi Diamond Industrial Co Ltd
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Mitsuboshi Diamond Industrial Co Ltd
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Priority to JP2010190704A priority Critical patent/JP5194076B2/en
Priority to TW100129921A priority patent/TWI507265B/en
Priority to KR1020110084765A priority patent/KR101369211B1/en
Priority to CN201110245629.9A priority patent/CN102380713B/en
Publication of JP2012045830A publication Critical patent/JP2012045830A/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • B23K1/0008Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0012Brazing of heat exchangers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/034Observing the temperature of the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/044Seam tracking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/10Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass
    • B23K37/04Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work
    • B23K37/0408Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work for planar work
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic materials other than metals or composite materials
    • B23K2103/54Glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04Arrangements of vacuum systems or suction cups

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Description

本発明は、レーザ割断装置に関するものである。   The present invention relates to a laser cleaving apparatus.

従来、ガラス基板などの脆性材料基板の割断方法としては、カッターホイール等を圧接転動させて、垂直クラックからなるスクライブラインを形成した後、スクライブラインに沿って基板に対して垂直方向から外力を加え基板を割断する方法が広く行われている。   Conventionally, as a method for cleaving a brittle material substrate such as a glass substrate, a cutter wheel or the like is pressed and rolled to form a scribe line composed of vertical cracks, and then an external force is applied from the direction perpendicular to the substrate along the scribe line. In addition, methods for cleaving the substrate are widely used.

通常、カッターホイールを用いて脆性材料基板のスクライブを行った場合、カッターホイールによって脆性材料基板に付与される機械的な応力によって基板の欠陥が生じやすく、外力を加えて基板を割断する際に上記欠陥に起因する割れ等が発生することがあった。   Usually, when scribing a brittle material substrate using a cutter wheel, the mechanical stress imparted to the brittle material substrate by the cutter wheel is likely to cause defects in the substrate, and when the substrate is cleaved by applying external force, Cracks or the like due to defects may occur.

そこで、近年、レーザを用いて脆性材料基板を割断する方法が実用化されている。この方法は、レーザビームを基板に照射して基板を溶融温度未満に加熱した後、冷却媒体により基板を冷却することによって基板に熱応力を生じさせ、この熱応力によって基板の表面から略垂直方向にクラック(以下、「垂直クラック」と記すことがある)を形成させるというものである。このレーザビームを用いた脆性材料基板の割断方法では、熱応力を利用するため、工具を基板に直接接触させることがなく、割断面は欠け等の少ない平滑な面となり、基板の強度が維持される。   Therefore, in recent years, a method of cleaving a brittle material substrate using a laser has been put into practical use. In this method, the substrate is irradiated with a laser beam to heat the substrate to a temperature lower than the melting temperature, and then the substrate is cooled by a cooling medium, thereby generating thermal stress on the substrate. Are formed with cracks (hereinafter sometimes referred to as “vertical cracks”). In this method of cleaving a brittle material substrate using a laser beam, since the thermal stress is used, the tool is not brought into direct contact with the substrate, the fractured surface becomes a smooth surface with few chips and the strength of the substrate is maintained. The

上記いわゆるレーザ割断方法において垂直クラックを深くするには、レーザビームの照射出力を大きくしたり、走査速度を遅くする必要があるが、レーザビームの照射出力を大きくすると、基板表面に加熱による損傷が生じることがある。また、レーザビームの走査速度を遅くすると加工効率が低下する。   In order to deepen the vertical crack in the so-called laser cleaving method, it is necessary to increase the laser beam irradiation output or slow down the scanning speed. However, if the laser beam irradiation output is increased, the substrate surface may be damaged by heating. May occur. Further, if the scanning speed of the laser beam is decreased, the processing efficiency is lowered.

そこで、基板を湾曲させ、その状態でレーザビームを照射して垂直クラックを深くする技術が提案されている。例えば特許文献1では、ステージ上に基板を吸着固定することによって基板を湾曲させている。また特許文献2では、支持部材の高さを変えて自重で基板を湾曲させている。   Therefore, a technique for deepening vertical cracks by bending the substrate and irradiating a laser beam in that state has been proposed. For example, in Patent Document 1, the substrate is curved by adsorbing and fixing the substrate on a stage. Further, in Patent Document 2, the substrate is bent by its own weight by changing the height of the support member.

特開平7-323384号公報JP-A-7-323384 特開2007-191363号公報JP 2007-191363 A

しかしながら、特許文献1の提案技術では、所定高さの突条又は所定の曲面が成形されたステージ上に基板を保持するので、基板を所望の形状に湾曲させるには基板の曲面状態に対応したステージをそれぞれ用いる必要があった。加えて、基板が厚い場合には基板が充分には湾曲せずステージに固定できないおそれがある。また、特許文献2の提案技術でも、基板が厚い場合には自重では基板が充分に湾曲しないおそれがある。   However, in the proposed technique of Patent Document 1, since the substrate is held on a stage on which a protrusion having a predetermined height or a predetermined curved surface is formed, it corresponds to the curved surface state of the substrate in order to curve the substrate into a desired shape. Each stage had to be used. In addition, when the substrate is thick, the substrate may not be sufficiently curved and cannot be fixed to the stage. Further, even in the proposed technique of Patent Document 2, when the substrate is thick, the substrate may not be sufficiently bent by its own weight.

本発明の目的は、固定台を交換することなくまた基板が厚い場合であっても、所望の形状に基板を湾曲でき且つ固定できるレーザ割断装置を提供することにある。   An object of the present invention is to provide a laser cleaving apparatus that can bend and fix a substrate to a desired shape without changing the fixing base and even when the substrate is thick.

本発明によれば、脆性材料基板を固定する固定手段と、レーザ照射手段と、冷却手段とを備え、前記基板に対して前記レーザ照射手段及び前記冷却手段を相対移動させて、レーザビームを脆性材料基板に照射して溶融温度未満に加熱した後、前記基板に対して冷却媒体を吹き付けて冷却し、前記基板に生じた熱応力によって、垂直クラックを形成して前記基板を割断する装置であって、前記固定手段が、前記基板を固定する固定台と、この固定台に固定された前記基板をレーザービームの照射面側が凸となるように湾曲させる棒状部材と、この棒状部材を中心として前記基板の両側を前記固定台に押さえ止める押圧部材とを有し、前記固定台に前記基板を載置し、前記押圧部材で前記基板を押さえ止めた後、前記棒状部材で前記基板を湾曲させ、レーザビームの照射及び冷却媒体の吹き付けを行って前記基板に垂直クラックを形成し割断することを特徴とするレーザ割断装置が提供される。   According to the present invention, a fixing means for fixing a brittle material substrate, a laser irradiation means, and a cooling means are provided, and the laser irradiation means and the cooling means are moved relative to the substrate to make the laser beam brittle. An apparatus that irradiates a material substrate and heats it to a temperature lower than the melting temperature, blows a cooling medium onto the substrate, cools the substrate, forms vertical cracks by the thermal stress generated on the substrate, and cleaves the substrate. The fixing means includes a fixing base for fixing the substrate, a rod-shaped member for bending the substrate fixed to the fixing table so that the laser beam irradiation surface side is convex, and the rod-shaped member as a center. A pressing member that holds both sides of the substrate against the fixed base, the substrate is placed on the fixed base, and the substrate is pressed and held by the pressing member, and then the substrate is bent by the rod-shaped member. Laser cleaving apparatus characterized by cleaving to form the irradiation and vertical crack in the substrate by performing the spraying of the cooling medium of the laser beam.

ここで、前記棒状部材を、前記固定台に対して突出位置と没入位置とに移動自在とし、前記棒状部材を前記固定台から突出した位置に移動させることによって前記基板を湾曲させるのが好ましい。   Here, it is preferable that the rod-shaped member is movable between a protruding position and an immersion position with respect to the fixed base, and the substrate is curved by moving the bar-shaped member to a position protruding from the fixed base.

また、前記棒状部材の前記固定台からの突出量を少なくとも2段階に切り替え可能とし、前記棒状部材を第1突出位置として前記基板を湾曲させ、レーザビームの照射及び冷却媒体の吹き付けによって垂直クラックを前記基板に形成した後、前記棒状部材を、第1突出位置よりもさらに突出した第2突出位置として前記基板を一層湾曲させて前記基板を割断するようにしてもよい。   Further, the amount of protrusion of the rod-shaped member from the fixed base can be switched in at least two stages, the substrate is curved with the rod-shaped member as a first protruding position, and vertical cracks are generated by laser beam irradiation and cooling medium spraying. After forming on the substrate, the substrate may be cleaved by further bending the substrate as a second protruding position that protrudes further than the first protruding position.

そしてまた、前記固定台に前記基板を固定するための吸引固定手段を設けるのが好ましい。   In addition, it is preferable to provide suction fixing means for fixing the substrate to the fixing table.

本発明に係るレーザ割断装置では、前記押圧部材で前記基板を押さえ止めた後、前記棒状部材で前記基板を湾曲させるので、固定台を交換することなくまた基板が厚い場合であっても、棒状部材の突出量を調整することによって所望の形状に基板を湾曲させることができる。そして湾曲した状態の基板にレーザビームを照射することにより、深い垂直クラックを基板に形成することができる。   In the laser cleaving apparatus according to the present invention, since the substrate is bent by the rod-shaped member after the substrate is held down by the pressing member, the rod-shaped member can be obtained without replacing the fixing base and even when the substrate is thick. The substrate can be bent into a desired shape by adjusting the protruding amount of the member. A deep vertical crack can be formed in the substrate by irradiating the curved substrate with a laser beam.

本発明に係るレーザ割断装置の一実施形態を示す概説図である。It is an outline figure showing one embodiment of a laser cleaving device concerning the present invention. 図1のレーザ割断装置を用いて基板の割断する場合の工程図である。It is process drawing in the case of cleaving a board | substrate using the laser cleaving apparatus of FIG. 図1のレーザ割断装置を用いて基板の割断する場合の工程図である。It is process drawing in the case of cleaving a board | substrate using the laser cleaving apparatus of FIG. レーザスクライブの操作状態を説明する斜視図である。It is a perspective view explaining the operation state of a laser scribe. 棒状部材が第1突出位置から第2突出位置に移動する際の移動状態を説明する図である。It is a figure explaining the movement state at the time of a rod-shaped member moving from a 1st protrusion position to a 2nd protrusion position. 本発明に係る他のレーザ割断装置を用いて基板の割断する場合の工程図である。It is process drawing in the case of cleaving a board | substrate using the other laser cleaving apparatus which concerns on this invention.

以下、本発明に係るレーザ割断装置についてより詳細に説明するが、本発明はこれらの実施形態に何ら限定されるものではない。   Hereinafter, although the laser cleaving apparatus according to the present invention will be described in more detail, the present invention is not limited to these embodiments.

図1に、本発明に係るレーザ割断装置の一例を示す概説図を示す。この図のレーザ割断装置では、固定台11上に脆性材料基板(以下、単に「基板」と記すことがある)50が載置・固定される。   FIG. 1 is a schematic diagram showing an example of a laser cleaving apparatus according to the present invention. In the laser cleaving apparatus of this figure, a brittle material substrate (hereinafter simply referred to as “substrate”) 50 is placed and fixed on a fixing base 11.

固定台11は左右2つの固定部11a,11bを有し、固定部11aは左右方向に移動自在に設けられている。また、固定部11a,11bの表面には複数の吸気孔(吸着固定手段)14が形成されており、これら複数の吸気孔14は真空ポンプ(吸着固定手段)Pに繋がっている。真空ポンプPを駆動させて空気を引くことにより、固定台11上に基板50が吸着固定される。固定台11の中央部、すなわち固定部11aと固定部11bとの間には、紙面に対して垂直方向(前後方向)に長い棒状部材12が、固定台11から突出した位置と固定台11に没入した位置とに移動自在に設けられている。棒状部材12が固定台11から突出した位置になると、レーザビームLB照射面側が凸となるように基板50が湾曲される。これについては後段で詳述する。   The fixed base 11 has two left and right fixing portions 11a and 11b, and the fixing portion 11a is provided so as to be movable in the left-right direction. Further, a plurality of intake holes (adsorption fixing means) 14 are formed on the surfaces of the fixing portions 11a and 11b, and the plurality of intake holes 14 are connected to a vacuum pump (adsorption fixing means) P. By driving the vacuum pump P and drawing air, the substrate 50 is adsorbed and fixed on the fixing table 11. A rod-like member 12 that is long in the vertical direction (front-rear direction) with respect to the paper surface is located between the center portion of the fixed base 11, that is, between the fixed portion 11 a and the fixed portion 11 b. It is provided so that it can be moved to the immersive position. When the rod-shaped member 12 is in a position protruding from the fixed base 11, the substrate 50 is curved so that the laser beam LB irradiation surface side is convex. This will be described in detail later.

固定台11の上方には、固定台11と離隔対向するように、支持台31が設けられている。支持台31には、基板50の表面にトリガークラックを形成するためのカッタホイール(不図示)と、基板50にレーザビームLBを照射するための開口と、基板50の表面を冷却するための冷却ノズル37(図4に図示)とが前後方向に並んで設けられている。   A support base 31 is provided above the fixed base 11 so as to face the fixed base 11 at a distance. The support base 31 includes a cutter wheel (not shown) for forming a trigger crack on the surface of the substrate 50, an opening for irradiating the substrate 50 with the laser beam LB, and cooling for cooling the surface of the substrate 50. Nozzles 37 (shown in FIG. 4) are provided side by side in the front-rear direction.

カッタホイール(不図示)は、基板50に圧接する位置と非接触な位置とに昇降可能に保持されており、スクライブラインの開始起点となるトリガークラックを形成するときのみ、基板50に圧接する位置に下降する。トリガークラックの形成位置は、トリガークラックから予測不可能な方向にクラックが生じる先走り現象を抑制するために、基板50の表面側端よりも内側に形成するのが好ましい。   The cutter wheel (not shown) is held so as to be able to move up and down between a position where it is pressed against the substrate 50 and a position where it is not contacted, and a position where the cutter wheel is pressed against the substrate 50 only when a trigger crack is formed as a starting point of the scribe line. To descend. The trigger crack is preferably formed on the inner side of the surface side end of the substrate 50 in order to suppress a pre-cursor phenomenon in which a crack occurs in an unpredictable direction from the trigger crack.

レーザ出力装置34から出射されたレーザビームLBは、反射ミラー44で下方に反射され、不図示の光学系を介して支持台31に形成された開口から、固定台11上に固定された基板50に照射される。   The laser beam LB emitted from the laser output device 34 is reflected downward by the reflection mirror 44 and is fixed on the fixed base 11 through an opening formed in the support base 31 via an optical system (not shown). Is irradiated.

また、支持台31の、レーザビームLBが出射する開口近傍に設けられた冷却ノズル37(図4に図示)からは、基板50に向かって冷却媒体としての水が空気と共に噴出される。冷却媒体が噴出される基板50上の位置は、スクライブ予定ライン51上で且つレーザビームLBの照射領域の後側である(図4を参照)。   Further, water as a cooling medium is ejected together with air from the cooling nozzle 37 (shown in FIG. 4) provided near the opening of the support 31 where the laser beam LB is emitted. The position on the substrate 50 where the cooling medium is ejected is on the scribe line 51 and behind the irradiation region of the laser beam LB (see FIG. 4).

支持台31の左右方向両側に、前後方向に細長い直方体状の押圧部材13a,13bが設けられている。これらの押圧部材13a,13bは、不図示の駆動手段によって左右方向及び上下方向に移動自在であり、後述するように、固定台11に基板50が固定されると、棒状部材12を中心として基板50の左右両側を押さえる。   On both sides of the support base 31 in the left-right direction, rectangular parallelepiped-shaped pressing members 13a, 13b that are elongated in the front-rear direction are provided. These pressing members 13a and 13b can be moved in the left and right direction and the up and down direction by a driving means (not shown). As will be described later, when the substrate 50 is fixed to the fixing base 11, the substrate is centered on the rod-shaped member 12. Hold the left and right sides of 50.

固定台11の上方には、基板50に予め刻印されたアライメントマークを認識する一対のCCDカメラ38,39が設けられている。これらのCCDカメラ38,39により、基板50のスクライブ予定ライン51(図4に図示)と棒状部材12とが平面視において重なるように位置修正される。具体的には、CCDカメラ38,39によりセット時の基板50の位置ずれが検出され、例えば基板50が角度θずれていた場合は固定台11が−θだけ回転され、基板50がYずれていたときは固定台11が−Yだけ移動される。   Above the fixed base 11, a pair of CCD cameras 38 and 39 for recognizing alignment marks preliminarily stamped on the substrate 50 are provided. By these CCD cameras 38 and 39, the position is corrected so that the scribe line 51 (shown in FIG. 4) of the substrate 50 and the rod-like member 12 overlap each other in plan view. Specifically, the position shift of the substrate 50 at the time of setting is detected by the CCD cameras 38 and 39. For example, when the substrate 50 is shifted by the angle θ, the fixed base 11 is rotated by −θ and the substrate 50 is shifted by Y. When this occurs, the fixed base 11 is moved by -Y.

図2及び図3に、このような構成の割断装置を用いて基板50を割断する場合の工程図を示す。なお、固定台11に基板50を吸着固定させる吸着手段及びレーザビーム照射手段、冷却手段については、図を簡潔にするためこれらの図からは省略している。   2 and 3 show process diagrams in the case of cleaving the substrate 50 using the cleaving apparatus having such a configuration. Note that the suction means, the laser beam irradiation means, and the cooling means for sucking and fixing the substrate 50 to the fixing base 11 are omitted from these drawings for the sake of brevity.

まず、基板50を固定台11上に載置し、真空ポンプP(図1に図示)を駆動させて吸気孔14(図1に図示)により固定台11に基板50を吸着固定する。そして、CCDカメラ38,39によって、基板50に設けられたアライメントマークを撮像し、前述のように、撮像データに基づいて基板50のスクライブ予定ライン51(図4に図示)と棒状部材12とが平面視において重なるように固定台11を移動させて基板50を所定の位置に位置決めする(図2(a))。   First, the substrate 50 is placed on the fixed base 11, the vacuum pump P (shown in FIG. 1) is driven, and the substrate 50 is sucked and fixed to the fixed base 11 by the intake holes 14 (shown in FIG. 1). Then, the CCD camera 38, 39 images the alignment mark provided on the substrate 50. As described above, the scribe planned line 51 (shown in FIG. 4) of the substrate 50 and the rod-like member 12 are formed based on the imaging data. The fixed base 11 is moved so as to overlap in plan view to position the substrate 50 at a predetermined position (FIG. 2A).

次に、押圧部材13a,13bを中央部へ移動させた後、下降させて基板50を固定台11に押圧固定する(同図(b))。押圧部材13a,13bによる基板50の押圧固定の程度は、センサにより検知し所定の押圧力となるよう制御するのが好ましい。また、押圧部材13a,13bによる基板50の固定位置は、基板50の材質や厚みなどから適宜決定すればよいが、棒状部材12の突出によって基板50が湾曲した際に基板50の曲率半径が4000mm以下となるようにするのが好ましい。このためには、棒状部材12の突出量が5mm以下の範囲の場合、棒状部材12から押圧部材13a,13bまでの距離Lは100mm以上300mm以下とするのが好ましい。また、押圧部材13a,13bは、基板50の前後方向の全体を押圧するのが好ましいが、前後方向に所定間隔で基板50を押圧するようにしても構わない。   Next, after the pressing members 13a and 13b are moved to the central portion, the pressing members 13a and 13b are lowered to press and fix the substrate 50 to the fixing base 11 ((b) in the figure). The degree of pressing and fixing of the substrate 50 by the pressing members 13a and 13b is preferably detected by a sensor and controlled to be a predetermined pressing force. Further, the fixing position of the substrate 50 by the pressing members 13a and 13b may be determined as appropriate from the material and thickness of the substrate 50, but when the substrate 50 is bent by the protrusion of the rod-shaped member 12, the radius of curvature of the substrate 50 is 4000 mm. The following is preferable. For this purpose, when the protruding amount of the rod-shaped member 12 is in the range of 5 mm or less, the distance L from the rod-shaped member 12 to the pressing members 13a and 13b is preferably 100 mm or more and 300 mm or less. The pressing members 13a and 13b preferably press the entire front and rear direction of the substrate 50, but may press the substrate 50 at a predetermined interval in the front and rear direction.

そして、棒状部材12を固定台11から突出した第1突出位置とする。これにより基板50が湾曲する(同図(c))。棒状部材12の突出量としては、前述のように、基板50を湾曲させた時の基板50の曲率半径が4000mm以下となるようにするのが好ましく、通常、0.1mm〜5mmの範囲である。   Then, the rod-like member 12 is set as a first protruding position protruding from the fixed base 11. As a result, the substrate 50 is bent ((c) in the figure). As described above, the protrusion amount of the rod-shaped member 12 is preferably such that the radius of curvature of the substrate 50 when the substrate 50 is curved is 4000 mm or less, and is usually in the range of 0.1 mm to 5 mm. .

次いで、前述のように、ホイールカッタによって基板50にトリガークラックを形成する。そして、レーザ出力装置34からレーザビームLBを出射する(同図(d))。レーザビームLBは反射ミラー44よって、図4に示すように、基板50表面に対して略垂直に照射する。また同時に、レーザビーム照射領域の後端近傍に冷却媒体としての水を冷却ノズル37から噴出させる。基板50にレーザビームLBを照射することによって、基板50は厚み方向に溶融温度未満で加熱され、基板50は熱膨張しようとするが、局所加熱のため膨張できず照射点を中心に圧縮応力が発生する。そして加熱直後に、基板50の表面が水により冷却されることによって、基板50が今度は収縮して引張応力が発生する。この引張応力の作用によって、トリガークラックを開始点としてスクライブ予定ライン51に沿って垂直クラック53が基板50に形成される。加えて、本発明の装置では、基板50のレーザビーム照射面側に基板50の湾曲による引張応力が付加されるので、垂直クラック53が通常よりも深く形成され、場合によっては垂直クラック53が基板50の反対面側まで至る。   Next, as described above, a trigger crack is formed in the substrate 50 by the wheel cutter. Then, a laser beam LB is emitted from the laser output device 34 ((d) in the figure). The laser beam LB is irradiated by the reflecting mirror 44 substantially perpendicularly to the surface of the substrate 50 as shown in FIG. At the same time, water as a cooling medium is ejected from the cooling nozzle 37 in the vicinity of the rear end of the laser beam irradiation region. By irradiating the substrate 50 with the laser beam LB, the substrate 50 is heated in the thickness direction at a temperature lower than the melting temperature, and the substrate 50 tries to thermally expand. Occur. Immediately after the heating, the surface of the substrate 50 is cooled by water, so that the substrate 50 is contracted and a tensile stress is generated. By the action of the tensile stress, the vertical crack 53 is formed on the substrate 50 along the scheduled scribe line 51 starting from the trigger crack. In addition, in the apparatus of the present invention, tensile stress due to the curvature of the substrate 50 is applied to the laser beam irradiation surface side of the substrate 50, so that the vertical crack 53 is formed deeper than usual, and in some cases the vertical crack 53 is formed on the substrate. 50 up to the opposite side.

そして、レーザビームLB及び冷却ノズル37をスクライブ予定ライン51に従って前後方向に相対的に移動させることによって、垂直クラック53が前後方向に進展し基板50にスクライブライン52が形成される。   Then, by moving the laser beam LB and the cooling nozzle 37 relatively in the front-rear direction according to the scribe line 51, the vertical crack 53 develops in the front-rear direction, and the scribe line 52 is formed on the substrate 50.

ここで使用するレーザビームLBとしては特に限定はなく、基板の材質や厚み、形成したい垂直クラックの深さなどから適宜決定すればよい。脆性材料基板がガラス基板の場合、ガラス基板表面での吸収が大きい波長9〜11μmのレーザビームが好適に使用される。このようなレーザビームとしてはCOレーザが挙げられる。レーザビームの照射スポットの形状としては、レーザビームの相対移動方向に細長い楕円形状が好ましく、相対移動方向の照射長さは10〜60mmの範囲、照射幅は1〜5mmの範囲が好適である。 The laser beam LB used here is not particularly limited, and may be determined appropriately from the material and thickness of the substrate, the depth of the vertical crack to be formed, and the like. When the brittle material substrate is a glass substrate, a laser beam having a wavelength of 9 to 11 μm, which has a large absorption on the glass substrate surface, is preferably used. An example of such a laser beam is a CO 2 laser. The shape of the laser beam irradiation spot is preferably an elliptical shape elongated in the relative movement direction of the laser beam. The irradiation length in the relative movement direction is preferably in the range of 10 to 60 mm, and the irradiation width is preferably in the range of 1 to 5 mm.

冷却ノズル37から噴出させる冷却媒体としては水やアルコールなどが挙げられる。また、割断後の脆性材料基板を使用する上で悪影響を与えない範囲において、界面活性剤等の添加剤が添加されていても構わない。冷却媒体の吹き付け量としては通常は数ml/min程度が好適である。冷却媒体による基板の冷却は、レーザビームによって加熱された基板を急冷する観点からは、気体(通常は空気)と共に水を噴射させるいわゆるウォータジェット方式が望ましい。冷却媒体による冷却領域は、長径1〜5mm程度の円形状又は楕円形状であることが好ましい。また、冷却領域は、レーザビームによる加熱領域の相対移動方向後方であって、冷却領域と加熱領域との中心点間の距離が数mm〜数十mm程度となるように形成するのが好ましい。   Examples of the cooling medium ejected from the cooling nozzle 37 include water and alcohol. Further, an additive such as a surfactant may be added within a range that does not adversely affect the use of the brittle material substrate after cleaving. Usually, the amount of cooling medium sprayed is preferably about several ml / min. The cooling of the substrate by the cooling medium is preferably a so-called water jet method in which water is injected together with gas (usually air) from the viewpoint of rapidly cooling the substrate heated by the laser beam. The cooling region with the cooling medium is preferably circular or elliptical with a major axis of about 1 to 5 mm. The cooling region is preferably formed so that the distance between the center points of the cooling region and the heating region is about several millimeters to several tens of millimeters behind the relative movement direction of the heating region by the laser beam.

レーザビームLB及び冷却ノズル37の相対移動速度としては特に限定はなく、得たい垂直クラックの深さなどから適宜決定すればよい。一般に相対移動速度を遅くするほど、形成される垂直クラックは深くなる。通常、相対移動速度は数百mm/sec程度である。   The relative moving speed of the laser beam LB and the cooling nozzle 37 is not particularly limited, and may be appropriately determined from the depth of the vertical crack to be obtained. In general, the slower the relative movement speed, the deeper the vertical cracks that are formed. Usually, the relative movement speed is about several hundred mm / sec.

次に、棒状部材12をさらに突出させて第2突出位置とする(図3(e))。これにより、基板50に形成された垂直クラック53が、基板50の反対面側にまで至り基板50が割断される。なお、レーザビームLBの照射によって垂直クラック53を形成する前工程において、垂直クラック53が基板50の反対面側まで至った場合には、この図に示す工程は不要となる。棒状部材12の突出量は、垂直クラック53を基板50の反対面側に進展させるものであれば特に限定はなく、通常、第1突出位置から0.1mm〜1mm程度の突出量で足りる。なお、棒状部材12を第1突出位置から第2突出位置にする際、棒状部材12の前後方向両端を同時に突出させてもよいし、図5に示すように、棒状部材12の前後方向の一方側端を先に突出させて、遅れてもう一方端側を突出させるようにしてもよい。   Next, the rod-shaped member 12 is further protruded to the second protruding position (FIG. 3E). Thereby, the vertical crack 53 formed in the substrate 50 reaches the opposite surface side of the substrate 50 and the substrate 50 is cleaved. If the vertical crack 53 reaches the opposite side of the substrate 50 in the previous process of forming the vertical crack 53 by irradiation with the laser beam LB, the process shown in FIG. The protruding amount of the rod-shaped member 12 is not particularly limited as long as the vertical crack 53 propagates to the opposite surface side of the substrate 50. Usually, a protruding amount of about 0.1 mm to 1 mm is sufficient from the first protruding position. When the rod-shaped member 12 is moved from the first projecting position to the second projecting position, both ends in the front-rear direction of the rod-shaped member 12 may be projected simultaneously, as shown in FIG. The side end may be protruded first, and the other end side may be protruded with a delay.

基板50の割断がなされると、一方の押圧部材13aが上昇して基板50aの押さえが解除され、基板50aと共に固定部11aが棒状部材12から離れる方向に移動する(図3(f))。これにより2つに割断された基板50a,50bが分離され、割断面の欠け等の発生が防止される。次いで、棒状部材12が第2突出位置から没入位置に移動する(同図(g))。なお、図3(f)及び同図(g)で示す工程は、同時に行っても構わない。   When the substrate 50 is cleaved, the one pressing member 13a rises to release the holding of the substrate 50a, and the fixing portion 11a moves away from the rod-shaped member 12 together with the substrate 50a (FIG. 3 (f)). Thereby, the board | substrates 50a and 50b cut into two are isolate | separated, and generation | occurrence | production of the crack of a broken surface, etc. is prevented. Next, the rod-shaped member 12 moves from the second protruding position to the immersive position ((g) in the figure). In addition, you may perform the process shown in FIG.3 (f) and the same figure (g) simultaneously.

そして、固定部11aの吸着固定が解除され、基板50aが次の工程に移動される(同図(h))。次いで、押圧部材13bが上昇して基板50bの押さえが解除されるとともに、固定部11bの吸着固定が解除される。そして、基板50bが棒状部材12を超えて所定距離まで移動され、前記一連の割断処理が繰り返し行われる。   Then, the fixing of the fixing portion 11a is released, and the substrate 50a is moved to the next step ((h) in the figure). Next, the pressing member 13b is lifted to release the holding of the substrate 50b, and the fixing of the fixing portion 11b is released. And the board | substrate 50b is moved to the predetermined distance beyond the rod-shaped member 12, and the said series of cleaving processes are performed repeatedly.

本発明に係るレーザ割断装置の割断対象としての脆性材料基板50に特に限定はなく、ガラス、セラミック、シリコン、サファイア等の従来公知の脆性材料基板が挙げられる。これらの中でも、表面圧縮応力が大きく、クロススクライブが困難とされている化学強化ガラスや風冷強化ガラスなどの強化ガラス基板の割断に本発明のレーザ割断装置は好適に使用できる。また、本発明のレーザ割断装置で割断できる脆性材料基板50の厚みとしては、脆性材料基板50の材質等によって異なるが、脆性材料基板50がガラス基板の場合にはおおよそ2mm程度の厚さまでである。   There is no particular limitation on the brittle material substrate 50 as a cleaving target of the laser cleaving apparatus according to the present invention, and conventionally known brittle material substrates such as glass, ceramic, silicon, and sapphire can be mentioned. Among these, the laser cleaving apparatus of the present invention can be suitably used for cleaving tempered glass substrates such as chemically tempered glass and air-cooled tempered glass, which have large surface compressive stress and are difficult to cross-scribe. Further, the thickness of the brittle material substrate 50 that can be cleaved by the laser cleaving apparatus of the present invention varies depending on the material of the brittle material substrate 50, but is approximately 2 mm when the brittle material substrate 50 is a glass substrate. .

図6に、本発明に係るレーザ割断装置の他の実施形態を示す。この図に示すレーザ割断装置が、前記の実施形態の装置と異なる点は、棒状部材12が、基板50の、押圧部材13a,13bが押圧する面と同じ面を押圧して基板50を湾曲させる点、及び基板50の、固定台側からレーザビームLBを照射する点にある。以下、この装置を用いた基板50の割断手順について、前記実施形態の装置と異なる点を中心に概説する。   FIG. 6 shows another embodiment of the laser cleaving apparatus according to the present invention. The laser cleaving apparatus shown in this figure is different from the apparatus of the above-described embodiment in that the bar-shaped member 12 presses the same surface as the surface pressed by the pressing members 13a and 13b of the substrate 50 to bend the substrate 50. The point is that the laser beam LB is irradiated from the fixed base side of the substrate 50. Hereinafter, a procedure for cleaving the substrate 50 using this apparatus will be outlined with a focus on differences from the apparatus of the above embodiment.

まず、基板50を固定台11に吸着固定する(図6(a))。そして、押圧部材13a,13bを移動させて、棒状部材12を中心として基板50の両側を押圧部材13a,13bで押圧固定する(同図(b))。次に、棒状部材12を下降させて基板50を湾曲させる(同図(c))。固定台11の表面から下方への棒状部材12の突出量としては、前述と同様の範囲がここでも例示される。   First, the substrate 50 is sucked and fixed to the fixed base 11 (FIG. 6A). Then, the pressing members 13a and 13b are moved, and both sides of the substrate 50 are pressed and fixed by the pressing members 13a and 13b with the rod-shaped member 12 as the center ((b) in the figure). Next, the rod-shaped member 12 is lowered to curve the substrate 50 (FIG. 3C). As the amount of protrusion of the bar-like member 12 downward from the surface of the fixed base 11, the same range as described above is also exemplified here.

次いで、前述のように、ホイールカッタによって基板50にトリガークラックを形成する。そして、レーザ出力装置34からレーザビームLBを出射する(同図(d))。
また同時に、レーザビーム照射領域の後端近傍に冷却媒体としての水を冷却ノズル37(図4に図示)から噴出させて、スクライブ予定ライン51(図4に図示)に沿って垂直クラック53を基板50に形成させる。この実施形態の装置でも、基板50のレーザビーム照射面側に基板50の湾曲による引張応力が付加されているので、垂直クラック53が通常よりも深く形成される。以下、図3に示した処理工程と同じ処理がこの実施形態の装置でも行われる。
Next, as described above, a trigger crack is formed in the substrate 50 by the wheel cutter. Then, a laser beam LB is emitted from the laser output device 34 ((d) in the figure).
At the same time, water as a cooling medium is ejected from the cooling nozzle 37 (shown in FIG. 4) in the vicinity of the rear end of the laser beam irradiation region, and the vertical crack 53 is formed on the substrate along the scribe line 51 (shown in FIG. 4). 50. Also in the apparatus of this embodiment, since the tensile stress due to the curvature of the substrate 50 is applied to the laser beam irradiation surface side of the substrate 50, the vertical crack 53 is formed deeper than usual. Hereinafter, the same processing as the processing steps shown in FIG. 3 is also performed in the apparatus of this embodiment.

本発明に係るレーザ割断装置は、押圧部材で基板を押さえ止めた後、棒状部材で基板を湾曲させるので、固定台を交換することなくまた基板が厚い場合であっても、所望の形状に基板を湾曲させることができる。そして湾曲した状態の基板にレーザビームを照射することにより、深い垂直クラックを基板に形成させることができ有用である。   In the laser cleaving apparatus according to the present invention, the substrate is bent by the rod-shaped member after the substrate is held down by the pressing member, so that the substrate can be formed into a desired shape without changing the fixing base and even when the substrate is thick. Can be curved. By irradiating a curved substrate with a laser beam, deep vertical cracks can be formed in the substrate, which is useful.

11 固定台
11a,11b 固定部
12 棒状部材
13a,13b 押圧部材
37 冷却ノズル
50 脆性材料基板
53 垂直クラック
P 真空ポンプ
LB レーザビーム
DESCRIPTION OF SYMBOLS 11 Fixing base 11a, 11b Fixing part 12 Bar-shaped member 13a, 13b Pressing member 37 Cooling nozzle 50 Brittle material substrate 53 Vertical crack P Vacuum pump LB Laser beam

Claims (4)

脆性材料基板を固定する固定手段と、レーザ照射手段と、冷却手段とを備え、前記基板に対して前記レーザ照射手段及び前記冷却手段を相対移動させて、レーザビームを脆性材料基板に照射して溶融温度未満に加熱した後、前記基板に対して冷却媒体を吹き付けて冷却し、前記基板に生じた熱応力によって、垂直クラックを形成して前記基板を割断する装置であって、
前記固定手段が、前記基板を固定する固定台と、この固定台に固定された前記基板をレーザービームの照射面側が凸となるように湾曲させる棒状部材と、この棒状部材を中心として前記基板の両側を前記固定台に押さえ止める押圧部材とを有し、
前記固定台に前記基板を載置し、前記押圧部材で前記基板を押さえ止めた後、前記棒状部材で前記基板を湾曲させ、レーザビームの照射及び冷却媒体の吹き付けを行って前記基板に垂直クラックを形成し割断することを特徴とするレーザ割断装置。
A fixing means for fixing the brittle material substrate, a laser irradiation means, and a cooling means are provided, and the laser irradiation means and the cooling means are moved relative to the substrate to irradiate the brittle material substrate with a laser beam. After heating below the melting temperature, the substrate is cooled by spraying a cooling medium on the substrate, and a thermal crack generated on the substrate forms a vertical crack to cleave the substrate,
The fixing means includes: a fixing base for fixing the substrate; a rod-shaped member for bending the substrate fixed to the fixing table so that a laser beam irradiation surface side is convex; and the substrate around the rod-shaped member. A pressing member that holds both sides against the fixed base;
After the substrate is placed on the fixed base and the substrate is held down by the pressing member, the substrate is bent by the rod-shaped member, and laser beam irradiation and cooling medium spraying are performed to cause a vertical crack on the substrate. Laser cleaving apparatus characterized by forming and cleaving.
前記棒状部材が、前記固定台に対して突出位置と没入位置とに移動自在で、前記固定台から突出した位置に移動することによって前記基板を湾曲させる請求項1記載のレーザ割断装置。   2. The laser cleaving apparatus according to claim 1, wherein the bar-shaped member is movable to a protruding position and an immersing position with respect to the fixed base, and is bent to move to a position protruding from the fixed base. 前記棒状部材の前記固定台からの突出量を少なくとも2段階に切り替え可能とし、前記棒状部材を第1突出位置として前記基板を湾曲させ、レーザビームの照射及び冷却媒体の吹き付けによって垂直クラックを前記基板に形成した後、前記棒状部材を、第1突出位置よりもさらに突出した第2突出位置として前記基板を一層湾曲させて前記基板を割断する請求項2記載のレーザ割断装置。   The amount of protrusion of the rod-shaped member from the fixed base can be switched to at least two stages, the substrate is curved with the rod-shaped member as a first protruding position, and vertical cracks are formed by irradiating a laser beam and blowing a cooling medium. 3. The laser cleaving apparatus according to claim 2, wherein the substrate is further bent by using the rod-shaped member as a second protruding position that protrudes further than the first protruding position. 前記固定台に前記基板を固定するための吸引固定手段が設けられている請求項1〜3のいずれかに記載のレーザ割断装置。   The laser cleaving apparatus according to any one of claims 1 to 3, wherein suction fixing means for fixing the substrate to the fixing base is provided.
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