JP3293843B2 - Hygroscopic material - Google Patents
Hygroscopic materialInfo
- Publication number
- JP3293843B2 JP3293843B2 JP14936591A JP14936591A JP3293843B2 JP 3293843 B2 JP3293843 B2 JP 3293843B2 JP 14936591 A JP14936591 A JP 14936591A JP 14936591 A JP14936591 A JP 14936591A JP 3293843 B2 JP3293843 B2 JP 3293843B2
- Authority
- JP
- Japan
- Prior art keywords
- moisture absorption
- silica gel
- surface area
- specific surface
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000463 material Substances 0.000 title claims description 28
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000000741 silica gel Substances 0.000 claims description 14
- 229910002027 silica gel Inorganic materials 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 230000002378 acidificating effect Effects 0.000 claims description 8
- 239000011358 absorbing material Substances 0.000 claims description 3
- 238000004438 BET method Methods 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 description 17
- 238000000576 coating method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000003575 carbonaceous material Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 239000012086 standard solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 108010025899 gelatin film Proteins 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical group CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Drying Of Gases (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、除湿装置等に適用され
る除湿材料に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dehumidifying material applied to a dehumidifying device or the like.
【０００２】[0002]
【従来の技術】水分子を、繰り返しての吸脱着を行う場
合、従来シリカゲルが主に用いられてきた。これは、Ｊ
ＩＳ−Ａ型に代表されるシリカゲルが、比較的低湿度領
域から吸湿性を示し、また加熱により水分子に脱離が容
易であるためである。上記低湿度領域からの吸湿性は、
化学工業別冊「吸着」ｐ１１７（１９７１年）に示され
るように、１００Å平方当り８個という多量の親水性基
を持つことに由来する。2. Description of the Related Art When water molecules are repeatedly adsorbed and desorbed, silica gel has been mainly used. This is J
This is because silica gel typified by IS-A type exhibits hygroscopicity from a relatively low humidity region, and is easily desorbed into water molecules by heating. Hygroscopicity from the low humidity area is
As shown in the Chemical Industry Supplement “Adsorption” p117 (1971), it is derived from having a large amount of 8 hydrophilic groups per 100 square meters.
【０００３】[0003]
【発明が解決しようとする課題】しかしながらシリカゲ
ルは、最大で８００ｍ2 ／ｇ〜１０００ｍ2 ／ｇ程度の
比表面積しか持たず、特に工業レベルにおいては強度上
の問題から比表面積１０００ｍ2 ／ｇ以上のシリカゲル
は製造困難であった。このため上記シリカゲルの最大吸
湿量は４０重量％以下の値しか示していなかった。However silica gel [Problems to be Solved by the Invention] is at most 800m 2 / g~1000m only have a specific surface area of about 2 / g, especially at industrial level on the intensity of the problem from the specific surface area 1000 m 2 / g or more Silica gel was difficult to manufacture. Therefore, the maximum moisture absorption of the above silica gel showed only a value of 40% by weight or less.
【０００４】これに対して、活性炭素繊維に代表される
多孔質炭素材料においては、１０００ｍ2 ／ｇ以上の比
表面積を持つものが知られており、その最大吸湿量も５
０重量％を越えるものが容易に得られている。しかしな
がら上記炭素材料は、親水性に寄与する表面酸性基量が
極めて少ないため、低湿度領域ではほとんど吸湿しない
という欠点を持っていた。On the other hand, among porous carbon materials represented by activated carbon fibers, those having a specific surface area of 1000 m 2 / g or more are known, and their maximum moisture absorption is 5
Those exceeding 0% by weight are easily obtained. However, the carbon material has a disadvantage that it hardly absorbs moisture in a low humidity region because the amount of surface acidic groups contributing to hydrophilicity is extremely small.
【０００５】かかる欠点を改善する方法として、特開昭
５９−３２９２１号公報に多孔質炭素材料の表面を酸化
して表面酸性基量を増大させる試みが示されているが、
実用上十分な親水性を与えるに至っておらず、しかも酸
化により強度が低下するという欠点を有していた。As a method for remedying such a defect, Japanese Patent Application Laid-Open No. Sho 59-32921 discloses an attempt to oxidize the surface of a porous carbon material to increase the amount of surface acidic groups.
It has not been able to impart sufficient hydrophilicity for practical use, and has the disadvantage that the strength is reduced by oxidation.
【０００６】[0006]
【発明が解決しようとする課題】除湿装置の小型高性能
化において、高湿度領域での最大吸湿率が大きく、しか
も低湿度領域から吸湿性を示すことが除湿材料に求めら
れている。しかしながら上記特性を同時に満たすような
吸湿材料は従来存在せず、このような素材の開発が課題
であった。In order to increase the size and performance of a dehumidifier, it is required for a dehumidifier material to have a large maximum moisture absorption rate in a high humidity area and exhibit hygroscopicity from a low humidity area. However, there has been no hygroscopic material that simultaneously satisfies the above characteristics, and development of such a material has been an issue.
【０００７】[0007]
【課題を解決するための手段】本発明は、高湿度領域で
の最大吸湿率が大きくしかも低湿度領域から吸湿性を示
す除湿材料に関するものである。SUMMARY OF THE INVENTION The present invention relates to a dehumidifying material having a high maximum moisture absorption in a high humidity region and exhibiting a hygroscopic property from a low humidity region.
【０００８】すなわち本発明は、ＢＥＴ法による比表面
積が１０００ｍ2／ｇ以上でかつ表面酸性基が５ｍｅｑ
／ｇ以上であることを特徴とする吸湿材料である。That is, according to the present invention, the specific surface area by the BET method is not less than 1000 m 2 / g and the surface acidic group is 5 meq.
/ G or more.
【０００９】本発明に起きる吸湿材料は、多孔質基体の
表面を親水性基を多量に持つ素材で被覆する事により得
られる。The moisture absorbing material according to the present invention can be obtained by coating the surface of a porous substrate with a material having a large amount of hydrophilic groups.
【００１０】上記多孔質基体は、高比表面積であると同
時に、表面被覆処理の関係から耐薬品性が必要である。
上記特性を満たす素材としては、多孔質炭素材料を使用
することが最も望ましい。多孔質炭素材料には、粉末状
活性炭、粒状活性炭、繊維状活性炭が存在するが、使用
条件に合わせて何れのものを使用してもかまわない。上
記多孔質炭素材料の比表面積は、１０００ｍ2 ／ｇ以上
２５００ｍ2 ／ｇ以下であることが望ましい。比表面積
が、１０００ｍ2 ／ｇ以下の場合は最大吸湿量が低下す
るため望ましくない。比表面積が、２５００ｍ2 ／ｇ以
上の場合には強度が低いために、表面被覆過程において
基体に破壊が起きやすく望ましくない。The above-mentioned porous substrate has a high specific surface area and, at the same time, requires chemical resistance due to surface coating treatment.
It is most desirable to use a porous carbon material as a material satisfying the above characteristics. The porous carbon material includes powdered activated carbon, granular activated carbon, and fibrous activated carbon, and any of them may be used according to the use conditions. The specific surface area of the porous carbon material is desirably from 1000 m 2 / g to 2500 m 2 / g. When the specific surface area is 1000 m 2 / g or less, the maximum moisture absorption decreases, which is not desirable. When the specific surface area is 2500 m 2 / g or more, since the strength is low, the substrate is easily broken in the surface coating process, which is not desirable.
【００１１】表面被覆に使用する材料には下記の特性が
必要とされる。表面酸性基つまりカルボキシル基（−Ｃ
ＯＯＨ）や水酸基（−ＯＨ）に代表される親水性基を、
大量に持つことである。そして分子の脱着工程における
加熱に耐えるため１２０℃以上の耐熱性が必要である。
上記目的には、膜状のシリカゲルが最も適した材料であ
る。高分子物質であるシリカゲルを、上記基体の細孔表
面まで被覆する手法として、以下に示す湿式法とＣＶＤ
法が適用可能である。The following properties are required for the material used for the surface coating. Surface acidic groups or carboxyl groups (-C
OOH) and a hydroxyl group (-OH)
It is to have in large quantities. Further, heat resistance of 120 ° C. or more is required to withstand heating in the molecule desorption step.
For this purpose, film-like silica gel is the most suitable material. As a method of coating silica gel which is a polymer substance to the surface of the pores of the above substrate, a wet method and a CVD method shown below are used.
The law is applicable.
【００１２】湿式法とは、けい酸ナトリウム（Ｓｉ（Ｏ
Ｎａ）4 ）、オルトケイ酸（Ｓｉ（ＯＨ）4 ）、ケイ酸
イステル（Ｓｉ（ＯＲ）4 ，Ｒ＝ＣＨ3 又はＣ2 Ｈ5 ）
等のシリカゲルのモノマー分子の水溶液に、上記基体を
浸漬し、モノマー分子を基体に適当量吸着させた後、酸
の水溶液（硫酸又は塩酸）に浸漬し、基体表面のモノマ
ー分子を重合させ膜状のシリカゲル化する方法である。The wet method is defined as sodium silicate (Si (O
Na) 4 ), orthosilicic acid (Si (OH) 4 ), istelic silicate (Si (OR) 4 , R = CH 3 or C 2 H 5 )
The above substrate is immersed in an aqueous solution of monomer molecules of silica gel, etc., and an appropriate amount of the monomer molecules is adsorbed on the substrate. Then, the substrate is immersed in an aqueous acid solution (sulfuric acid or hydrochloric acid) to polymerize the monomer molecules on the substrate surface and form a film. Is a method of converting silica gel into silica gel.
【００１３】ＣＶＤ法とはシラン（ＳｉＨ4 又はＳｉ2
Ｈ6 ）等の珪素化合物を酸素存在下で体気圧以下の減圧
下に置き、高周波等のエネルギーを加えプラズマ化した
後、基体表面に析出させる方法である。The CVD method refers to silane (SiH 4 or Si 2
This is a method in which a silicon compound such as H 6 ) is placed under reduced pressure of body pressure or less in the presence of oxygen, and is subjected to energy such as high frequency to be converted into plasma and then deposited on the substrate surface.
【００１４】膜状シリカゲル以外に望ましい材料とし
て、ＰＶＡ（ポリビニルアルコール）が適用可能であ
る。酢酸ビニルモノマーを基体表面に吸着させた後、重
合を行い高分子化したのち、アルカリ水溶液をもちいて
加水分解を行うことでＰＶＡ皮膜とすることが可能であ
る。As a desirable material other than the film-like silica gel, PVA (polyvinyl alcohol) is applicable. After the vinyl acetate monomer is adsorbed on the surface of the substrate, polymerization is carried out to obtain a polymer, and then hydrolysis is carried out using an alkaline aqueous solution to form a PVA film.
【００１５】上記被覆材料は、基体の吸湿特性を阻害し
ない量にとどめる必要があり、その被覆量は基体重量の
２０％以内であることが望ましく、さらに望ましくは１
０％以内である。It is necessary that the above-mentioned coating material does not impair the hygroscopic property of the substrate, and the coating amount is preferably within 20% of the weight of the substrate, more preferably 1%.
It is within 0%.
【００１６】[0016]
【実施例】以下実施例をあげて、本発明を説明する。EXAMPLES The present invention will be described below with reference to examples.
【００１７】吸湿材料の特性は、下記方法によって測定
した。The properties of the hygroscopic material were measured by the following method.
【００１８】１．全酸性基量 吸湿材料約０．３ｇを純水にて洗浄し、熱風乾燥に続き
１２時間の真空乾燥を施した後、秤量を行った。上記サ
ンプルを、２５０ｍｌの１／１０規定ＮａＯＨ標準溶液
に浸漬した状態で、２５℃で１０時間振とうした。上記
溶液をガラスろ過器でろ過した後、ろ液２５ｍｌを正確
に分取し、これを１／１０規定ＨＣｌ標準溶液にて滴定
した。指示薬は、フェノールフタレインを使用した。同
様の操作を吸湿材料を入れない状態で行い、これを空試
験の滴定量とした。吸湿材料の重量当たりの表面酸性基
量は、次式により求めた。1. The total acidic group amount hygroscopic material about 0.3g washed with pure water, was subjected to vacuum drying followed 12 hours in a hot air drying was performed weighed. The sample was shaken at 25 ° C. for 10 hours while immersed in 250 ml of a 1/10 normal NaOH standard solution. After the solution was filtered with a glass filter, 25 ml of the filtrate was accurately collected and titrated with a 1/10 N HCl standard solution. As the indicator, phenolphthalein was used. The same operation was performed without adding the hygroscopic material, and this was used as the titer for the blank test. The amount of surface acidic groups per weight of the hygroscopic material was determined by the following equation.
【００１９】表面酸性基量＝Ｄ＊ｆ／Ｗ〔ｍｅｑ／ｇ〕Surface acidic group content = D * f / W [meq / g]
【００２０】ここでＤは空試験の滴定量から、吸湿材料
を入れた時の滴定量を、差し引いた値〔ｍｌ）である。
ｆは、１／１０規定のＨＣｌ標準溶液のファクターであ
る。Ｗは、吸湿材料の重量〔ｇ〕である。Here, D is a value [ml] obtained by subtracting the titer when the hygroscopic material is added from the titer in the blank test.
f is a factor of a 1/10 normal HCl standard solution. W is the weight [g] of the hygroscopic material.
【００２１】２．比表面積 吸湿材料を約０．１ｇ採取し、１２０℃で１２時間真空
乾燥の後秤量した。上記サンプルの、液体窒素の沸点
（−１９５．８℃）における窒素ガスの吸着量を相対圧
が０．０〜０．２の範囲で徐々に高めながら数点測定し
た。結果をＢＥＴプロットし、重量当りの比表面積を求
めた。2. Specific surface area About 0.1 g of a hygroscopic material was sampled, vacuum-dried at 120 ° C. for 12 hours, and weighed. The sample was measured at several points while gradually increasing the amount of nitrogen gas adsorbed at the boiling point of liquid nitrogen (-195.8 ° C.) in the range of 0.0 to 0.2 in relative pressure. The results were BET plotted to determine the specific surface area per weight.
【００２２】３．平衡吸湿率 平衡吸湿率はＪＩＳ−Ｚ０７０１の規定に準じて規定し
た。低湿度下での吸湿特性の比較には相対湿度２０％で
の平衡吸湿率を用いた。最大吸湿率の比較には相対湿度
９０％での平衡吸湿率を用いた。3. Equilibrium moisture absorption The equilibrium moisture absorption was defined in accordance with JIS-Z0701. For comparison of the moisture absorption characteristics under low humidity, the equilibrium moisture absorption at a relative humidity of 20% was used. For comparison of the maximum moisture absorption, the equilibrium moisture absorption at a relative humidity of 90% was used.
【００２３】粉末状活性炭素（Ａ）をケイ酸ナトリウム
の１０重量％の水溶液に３時間浸漬させろ別した後に、
１５重量％の硫酸溶液に５時間浸漬した。水洗後、乾燥
し試料（Ｂ）とした。被覆材料の付着量は、（Ａ）と
（Ｂ）の重量差により求め、基体材料である（Ａ）に対
する重量％で示した。上記試料の特性値を表１に、吸湿
特性を図１に示した。After the powdered activated carbon (A) is immersed in a 10% by weight aqueous solution of sodium silicate for 3 hours and filtered,
It was immersed in a 15% by weight sulfuric acid solution for 5 hours. After washing with water, it was dried to obtain a sample (B). The adhesion amount of the coating material was determined from the weight difference between (A) and (B), and was shown as a percentage by weight based on the base material (A). The characteristic values of the above samples are shown in Table 1, and the moisture absorption characteristics are shown in FIG.
【００２４】比較例として、ケイ酸ナトリウムの１０重
量％水溶液を、直接１５重量％の硫酸溶液に投入し５時
間攪拌した。固形物を水洗し乾燥し、試料（Ｃ）とし
た。吸湿特性を図１に示した。As a comparative example, a 10% by weight aqueous solution of sodium silicate was directly charged into a 15% by weight sulfuric acid solution and stirred for 5 hours. The solid was washed with water and dried to obtain a sample (C). FIG. 1 shows the moisture absorption characteristics.
【００２５】粒状活性炭（Ｄ）を上記（Ａ）の場合と同
様にシリカゲル膜で被覆し、試料（Ｅ）とした。上記試
料の特性値を表２に、吸湿特性を図２に示した。The granular activated carbon (D) was coated with a silica gel film in the same manner as in the above (A) to obtain a sample (E). Table 2 shows the characteristic values of the samples, and FIG. 2 shows the moisture absorption characteristics.
【００２６】繊維状活性炭（Ｆ）を上記（Ａ）の場合と
同様にシリカゲル膜で被覆し、試料（Ｇ）とした。上記
試料の特性値を表３に、吸湿性を図３に示した。The fibrous activated carbon (F) was coated with a silica gel film in the same manner as in the above (A) to obtain a sample (G). Table 3 shows the characteristic values of the samples, and FIG. 3 shows the hygroscopicity.
【００２７】[0027]
【作用】高比表面積を有する基体材料に、親水性材料を
被覆することにより、低湿度時（２０％）での吸湿性
は、被覆材料単独の時と同様の高い値を示し、しかも高
湿度時には基体材料の高比表面積が利用されることによ
り、極めて高い吸湿性を示している。これは、基体材料
の被覆材による表面改質であると考えられる。By coating a base material having a high specific surface area with a hydrophilic material, the hygroscopicity at low humidity (20%) shows the same high value as that of the coating material alone, and the high humidity Occasionally, the high specific surface area of the base material is utilized to exhibit extremely high hygroscopicity. This is considered to be surface modification by the coating material of the base material.
【００２８】[0028]
【発明の効果】以上説明したように、本発明による吸湿
材料は、広い相対湿度領域において優れた吸湿特性を持
っている。したがって本発明により、小型高性能は除湿
装置等が作成可能となり工業的に多大な実用性をもたら
すことができる。As described above, the moisture absorbing material according to the present invention has excellent moisture absorbing properties in a wide relative humidity range. Therefore, according to the present invention, a compact and high-performance dehumidifier or the like can be prepared, and industrially great practicality can be brought.
【図１】実施例（Ｂ）及び比較例（Ａ）、比較例（Ｃ）
の吸湿特性を示す図である。FIG. 1 shows an example (B), a comparative example (A), and a comparative example (C).
It is a figure which shows the moisture absorption characteristic of.
【図２】実施例（Ｅ）及び比較例（Ｄ）の吸湿特性を示
す図である。FIG. 2 is a diagram showing moisture absorption characteristics of Example (E) and Comparative Example (D).
【図３】実施例（Ｇ）及び比較例（Ｆ）の吸湿特性を示
す図である。FIG. 3 is a graph showing moisture absorption characteristics of Example (G) and Comparative Example (F).
【表１】 [Table 1]
【表２】 [Table 2]
【表３】 [Table 3]
フロントページの続き (58)調査した分野(Int.Cl.7，ＤＢ名) B01D 53/04 B01D 53/28 B01J 20/10 B01J 20/28 C01B 31/02 - 31/04 C01B 31/08 - 31/14 Continued on the front page (58) Fields surveyed (Int. Cl. 7 , DB name) B01D 53/04 B01D 53/28 B01J 20/10 B01J 20/28 C01B 31/02-31/04 C01B 31/08-31 /14
Claims (2)
／ｇ以上でかつ表面酸性基量が５ｍｅｑ／ｇ以上である
吸湿材料。1. A specific surface area of 1000 m 2 by a BET method.
/ G or more and the amount of surface acidic groups is 5 meq / g or more.
覆させたことを特徴とする請求項１の吸湿材料。Wherein the surface of the carbon-containing material substrate, moisture-absorbing material according to claim 1, characterized in that it is coated on silica gel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14936591A JP3293843B2 (en) | 1991-05-23 | 1991-05-23 | Hygroscopic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14936591A JP3293843B2 (en) | 1991-05-23 | 1991-05-23 | Hygroscopic material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04346814A JPH04346814A (en) | 1992-12-02 |
| JP3293843B2 true JP3293843B2 (en) | 2002-06-17 |
Family
ID=15473551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14936591A Expired - Fee Related JP3293843B2 (en) | 1991-05-23 | 1991-05-23 | Hygroscopic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3293843B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6624691B1 (en) | 1999-10-04 | 2003-09-23 | Nec Corporation | Demodulator for processing digital signal |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7178927B2 (en) | 2000-11-14 | 2007-02-20 | Semiconductor Energy Laboratory Co., Ltd. | Electroluminescent device having drying agent |
| JP6119849B2 (en) | 2013-05-22 | 2017-04-26 | 富士通株式会社 | Adsorbent for adsorption heat pump, method for producing the same, and adsorption heat pump |
| JP6682819B2 (en) * | 2015-11-18 | 2020-04-15 | 東洋紡株式会社 | Siloxane removal filter material |
-
1991
- 1991-05-23 JP JP14936591A patent/JP3293843B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6624691B1 (en) | 1999-10-04 | 2003-09-23 | Nec Corporation | Demodulator for processing digital signal |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04346814A (en) | 1992-12-02 |
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