JP2009010307A - Bonding apparatus - Google Patents

Bonding apparatus Download PDF

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JP2009010307A
JP2009010307A JP2007172800A JP2007172800A JP2009010307A JP 2009010307 A JP2009010307 A JP 2009010307A JP 2007172800 A JP2007172800 A JP 2007172800A JP 2007172800 A JP2007172800 A JP 2007172800A JP 2009010307 A JP2009010307 A JP 2009010307A
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substrate
target
recognition
imaging means
image
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JP5181383B2 (en
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Tetsuo Kitaguchi
哲雄 北口
Ryuichi Ueda
竜一 植田
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Shibuya Corp
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Shibuya Kogyo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a bonding apparatus for correcting displacement in X-axis, Y-axis and θ-axis directions of a component imaging means and a substrate imaging means for accurate alignment of an electronic component. <P>SOLUTION: The bonding apparatus includes the component imaging means, the substrate imaging means and a target 8 with an alignment mark. The target 8 and the both imaging means are relatively movable. A relative positional relation between the both imaging means is calculated from an image picked-up with the both imaging means coaxially positioned with the target 8 interposed therebetween to align a substrate with the electronic component based on the calculated relative positional relation. The alignment mark on the target 8 has two intersecting points apart from each other by a predetermined distance. The positions of two intersecting points are recognized from each picked-up image to calculate the relative positional relation between both imaging means from their displacement in the X-axis, Y-axis and rotating directions. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、半導体チップなどの電子部品を基板にボンディングするボンディング装置の改良に関するもので、特に、電子部品と基板の位置合わせを主眼に開発されたものである。   The present invention relates to an improvement of a bonding apparatus for bonding an electronic component such as a semiconductor chip to a substrate, and has been developed mainly for alignment of the electronic component and the substrate.

フリップチップボンダでは、雰囲気温度の変動により、装置各部に膨張収縮などの経時変化が発生するものである。この変化により、電子部品と基板の位置合わせ装置における部品認識用撮像手段と基板認識用撮像手段との相対位置関係にもずれが生じる。このような撮像手段の位置関係がずれると、ボンディング位置にもずれが生じることになる。   In the flip chip bonder, a change over time such as expansion and contraction occurs in each part of the apparatus due to a change in ambient temperature. Due to this change, a shift also occurs in the relative positional relationship between the component recognition imaging means and the board recognition imaging means in the electronic component / substrate alignment apparatus. When such positional relationship of the image pickup means is deviated, the bonding position is also deviated.

この問題を解決するため、特許文献1に示されるように、部品認識用撮像手段及び基板認識用撮像手段のX軸方向及びY軸方向のずれ量を検出し、それを補正し、正確な位置合わせを行おうとするボンディング装置が、既に本特許出願人により開示されている。しかし、ボンディングの精度向上のためには、従来技術のようにX軸方向とY軸方向のみのずれ量の補正だけでは足りず、θ軸方向(回転方向)のずれ量も無視できない現状となってきている。   In order to solve this problem, as disclosed in Japanese Patent Application Laid-Open No. 2004-228688, the amount of deviation in the X-axis direction and the Y-axis direction of the component recognition imaging unit and the board recognition imaging unit is detected and corrected to obtain an accurate position. A bonding apparatus for matching is already disclosed by the present applicant. However, in order to improve bonding accuracy, it is not sufficient to correct the shift amount only in the X-axis direction and the Y-axis direction as in the prior art, and the shift amount in the θ-axis direction (rotation direction) cannot be ignored. It is coming.

特許第2780000号特許公報Japanese Patent No. 2780000

本発明は、部品認識用撮像手段及び基板認識用撮像手段のX軸方向及びY軸方向のずれ量補正に加えて、θ軸方向(回転方向)のずれ量に関しても補正をし、より正確な電子部品と基板の位置合わせを行うことを可能とするボンディング装置を提供することを目的とする。   The present invention corrects the deviation amount in the θ-axis direction (rotation direction) in addition to the deviation amount correction in the X-axis direction and the Y-axis direction of the image recognition means for component recognition and the imaging means for board recognition. An object of the present invention is to provide a bonding apparatus capable of aligning an electronic component and a substrate.

第1の発明は、上記課題を解決するためボンディング装置に次の手段を採用する。
第1に、ボンディングヘッドに吸着保持された電子部品を下方から撮像する部品認識用撮像手段と、ボンディングステージ上に載置された基板を上方から撮像する基板認識用撮像手段と、部品認識用撮像手段と基板認識用撮像手段との間に配置されるアライメントマークを有するターゲットとを備える。
第2に、上記構成と共にターゲット及び上記両撮像手段が相対移動可能に設置される。
第3に、ターゲットを挟んで部品認識用撮像手段と基板認識用撮像手段とを同軸上に位置させた状態で両撮像手段により撮像した画像から両撮像手段の相対位置関係を算出し、相対位置関係に基づいて、基板認識用撮像手段により位置を認識した基板と部品認識用撮像手段により位置を認識した電子部品の位置合わせを行いボンディングをするボンディング装置とする。
第4に、ターゲットのアライメントマークは所定距離離れた2つの交点を有する。
第5に、各撮像手段により撮像された画像から前記2つの交点の位置を認識することにより、直交するX軸方向及びY軸方向のずれ量、X軸方向及びY軸方向で形成される平面内における回転方向のずれ量からなる両撮像手段の相対位置関係を算出するようする。
The first invention employs the following means in the bonding apparatus in order to solve the above problems.
First, a component recognition imaging unit that images the electronic component sucked and held by the bonding head from below, a substrate recognition imaging unit that images a substrate placed on the bonding stage from above, and a component recognition imaging And a target having an alignment mark disposed between the imaging means for substrate recognition.
Secondly, the target and the both imaging means are installed so as to be relatively movable together with the above-described configuration.
Third, the relative positional relationship between the two image pickup means is calculated from the images picked up by the two image pickup means while the component recognition image pickup means and the board recognition image pickup means are positioned coaxially with the target interposed therebetween. Based on the relationship, a bonding apparatus that performs bonding by aligning the substrate whose position is recognized by the substrate recognition imaging unit and the electronic component whose position is recognized by the component recognition imaging unit.
Fourth, the alignment mark of the target has two intersections that are separated by a predetermined distance.
Fifthly, by recognizing the positions of the two intersections from the images picked up by the respective image pickup means, the amount of deviation in the orthogonal X-axis direction and Y-axis direction, the plane formed in the X-axis direction and the Y-axis direction The relative positional relationship between the two image pickup means consisting of the amount of deviation in the rotation direction is calculated.

第2の発明は、第1の発明に、上記撮像位置は、2箇所設定されており、前記両撮像手段は、一の撮像位置で一方の交点を撮像した後、他の撮像位置に所定距離移動して他方の交点を撮像することによってずれ量を算出するものであることを付加したボンディング装置である。   In a second aspect based on the first aspect, the image pickup position is set at two locations, and the two image pickup means pick up one intersection at one image pickup position and then a predetermined distance to the other image pickup position. It is a bonding apparatus to which a shift amount is calculated by moving and imaging the other intersection.

本発明は、ターゲットにある所定距離離れた2つの交点を、部品認識用撮像手段及び基板認識用撮像手段による画像から、位置認識をするものであるので、直交するX軸方向及びY軸方向、X軸方向及びY軸方向で形成される平面内における回転方向における両撮像手段のずれ量を算出することが可能となった。この結果、基板への高精度の半導体チップの実装が可能となった。   The present invention recognizes the position of two intersections at a predetermined distance from the target from the images by the component recognition imaging means and the board recognition imaging means, so that the orthogonal X-axis direction and Y-axis direction, It has become possible to calculate the amount of deviation between the two image pickup means in the rotational direction in the plane formed by the X-axis direction and the Y-axis direction. As a result, a highly accurate semiconductor chip can be mounted on the substrate.

第2の発明の効果であるが、前記両撮像手段が、一方の交点を撮像した後、所定距離移動して他方の交点を撮像することによってずれ量を算出するものとすることにより、2つの交点の距離を長いものとすることができ、特に回転方向において高精度なずれ量の算出が可能となった。   According to the second aspect of the invention, the two image pickup means, after imaging one intersection, move a predetermined distance and calculate the amount of deviation by imaging the other intersection. The distance between the intersections can be made long, and the amount of deviation can be calculated with high accuracy especially in the rotation direction.

以下、図面に従って、実施例と共に本発明の実施の形態について説明する。図1は、本発明に利用するフリップチップボンディング装置の実施例を示すもので、該フリップチップボンディング装置においてボンディングヘッド1がボンディング位置上方にある状態を示す概略斜視説明図であり、図2は同平面説明図であり、図3は、同正面説明図である。   Hereinafter, embodiments of the present invention will be described together with examples according to the drawings. FIG. 1 shows an embodiment of a flip chip bonding apparatus used in the present invention, and is a schematic perspective view showing a state in which the bonding head 1 is above the bonding position in the flip chip bonding apparatus, and FIG. FIG. 3 is an explanatory plan view, and FIG. 3 is an explanatory front view thereof.

ボンディング装置には、電子部品としての半導体チップを吸着保持し、基板2(図2及び図3に示される)に、半導体チップをボンディングするボンディングヘッド1と、基板2の位置を上方より認識をする基板認識カメラ3(本願発明における基板認識用撮像手段となる)と、ボンディングヘッド1及び基板認識カメラ3をY軸方向(図2及び図3における左右方向)へと往復移動可能とするY軸駆動機構4と、基板2をボンディング位置で支持する基板ステージ5と、基板ステージ5をX軸方向(Y軸駆動機構4での移動方向と直交する方向)に移動可能とするX軸駆動機構6と、ボンディングヘッド1に吸着保持された半導体チップを下方より認識するチップ認識カメラ7(本願発明の部品認識用撮像手段となる)と、ターゲット8とが備えられている。   In the bonding apparatus, a semiconductor chip as an electronic component is sucked and held, and the bonding head 1 for bonding the semiconductor chip to the substrate 2 (shown in FIGS. 2 and 3) and the position of the substrate 2 are recognized from above. A substrate recognition camera 3 (which serves as an imaging means for substrate recognition in the present invention) and a Y-axis drive that enables the bonding head 1 and the substrate recognition camera 3 to reciprocate in the Y-axis direction (the left-right direction in FIGS. 2 and 3). A mechanism 4, a substrate stage 5 that supports the substrate 2 at the bonding position, and an X-axis drive mechanism 6 that enables the substrate stage 5 to move in the X-axis direction (direction orthogonal to the movement direction of the Y-axis drive mechanism 4). , A chip recognition camera 7 for recognizing the semiconductor chip attracted and held by the bonding head 1 from below (becomes an imaging means for component recognition of the present invention), a target 8, It is provided.

ボンディングヘッド1は、上下方向への移動をつかさどるヘッドZ軸駆動機構9及び回転方向への移動(回転)をつかさどるヘッドθ軸駆動機構10を備えて、Y軸駆動機構4の可動板11に装着されている。従って、ボンディングヘッド1は、Y軸方向、Z軸方向、θ軸方向への移動が可能である。尚、実施例でのボンディングヘッド1は、X軸方向への駆動機構は有していない。従って、半導体チップを基板2にボンディングするに際して、位置合わせにおけるX軸方向への相対移動は、X軸駆動機構6によって行われる。
尚、図示しないが、図2の基板搬送ガイド30の右方手前側には、半導体チップをボンディングヘッド1に供給するチップ供給部が配置されており、このチップ供給部はウエハをダイシングして形成された複数の半導体チップを支持するチップ支持部とチップ支持部から1つの半導体チップをピックアップするとともに上下反転してボンディングヘッド1に受け渡すピックアップヘッドなどを備えている。
The bonding head 1 includes a head Z-axis drive mechanism 9 that controls movement in the vertical direction and a head θ-axis drive mechanism 10 that controls movement (rotation) in the rotation direction, and is mounted on the movable plate 11 of the Y-axis drive mechanism 4. Has been. Therefore, the bonding head 1 can move in the Y-axis direction, the Z-axis direction, and the θ-axis direction. The bonding head 1 in the embodiment does not have a drive mechanism in the X-axis direction. Therefore, when the semiconductor chip is bonded to the substrate 2, the relative movement in the X-axis direction during alignment is performed by the X-axis drive mechanism 6.
Although not shown, a chip supply unit for supplying semiconductor chips to the bonding head 1 is disposed on the right front side of the substrate transport guide 30 in FIG. 2, and this chip supply unit is formed by dicing the wafer. There are provided a chip support part for supporting a plurality of semiconductor chips, a pickup head for picking up one semiconductor chip from the chip support part and transferring it to the bonding head 1 by turning it upside down.

基板認識カメラ3は、基板2を認識可能であると共に、図5に示されるようにターゲット8の2つの交点18,19が上方より同時に認識可能なカメラ視野20を有するカメラである。該基板認識カメラ3は、Z軸駆動機構16を備えて、Y軸駆動機構4の可動板12に装着されている。従って、基板認識カメラ3は、Z軸方向とY軸方向への移動のみが可能であって、基板認識時のX軸方向への移動は、X軸駆動機構6によって行われ、ターゲット8及びチップ認識カメラ7との基準位置へのX軸方向相対移動は、ターゲット8及びチップ認識カメラ7のX軸方向への駆動機構によって行われる。尚、基板認識カメラ3とボンディングヘッド1は、X軸方向では同位置に設置されている。   The substrate recognition camera 3 is a camera that can recognize the substrate 2 and has a camera field of view 20 in which two intersections 18 and 19 of the target 8 can be recognized simultaneously from above as shown in FIG. The substrate recognition camera 3 includes a Z-axis drive mechanism 16 and is attached to the movable plate 12 of the Y-axis drive mechanism 4. Therefore, the substrate recognition camera 3 can only move in the Z-axis direction and the Y-axis direction, and the movement in the X-axis direction at the time of substrate recognition is performed by the X-axis drive mechanism 6, and the target 8 and the chip The relative movement of the recognition camera 7 to the reference position in the X-axis direction is performed by a drive mechanism in the X-axis direction of the target 8 and the chip recognition camera 7. The substrate recognition camera 3 and the bonding head 1 are installed at the same position in the X-axis direction.

Y軸駆動機構4には、Y軸方向に直線的に配置された固定ガイド13と固定ガイド13に沿ってY軸方向に走行する可動板11、12とからなるリニアモータが利用されている。基板ステージ6はボンディング位置と基板供給位置の間をX軸駆動機構6により往復移動可能であり、基板ステージ6の移動路に沿って基板搬送ガイド30が昇降可能に設けられている。基板2は図示しない搬送爪により基板搬送ガイド30上を基板供給位置まで搬送されると基板搬送ガイド30が下降して、基板ステージ6に載置され、X軸駆動機構6によりボンディング位置に移動されるようになっている。ボンディング完了後には、基板搬送ガイド30が上昇することにより基板2は基板ステージ6から基板搬送ガイド30に移載され、図示しない搬送爪によりボンディング位置から搬出されるようになっている。   For the Y-axis drive mechanism 4, a linear motor including a fixed guide 13 linearly arranged in the Y-axis direction and movable plates 11 and 12 that run in the Y-axis direction along the fixed guide 13 is used. The substrate stage 6 can be reciprocated between the bonding position and the substrate supply position by the X-axis drive mechanism 6, and the substrate transport guide 30 is provided to be able to move up and down along the movement path of the substrate stage 6. When the substrate 2 is conveyed on the substrate conveyance guide 30 to the substrate supply position by a conveyance claw (not shown), the substrate conveyance guide 30 is lowered and placed on the substrate stage 6 and is moved to the bonding position by the X-axis drive mechanism 6. It has become so. After the completion of bonding, the substrate transport guide 30 is raised, so that the substrate 2 is transferred from the substrate stage 6 to the substrate transport guide 30 and unloaded from the bonding position by a transport claw (not shown).

チップ認識カメラ7はボンディングヘッド1が吸着保持した半導体チップを下方から認識可能であると共に、図5に示されるようにターゲット8の2つの交点18,19を下方より同時に認識可能なカメラ視野20を有するカメラである。チップ認識カメラ7は、X軸方向及びY軸方向に移動できるようXY駆動テーブル21に固着されている。   The chip recognition camera 7 can recognize the semiconductor chip attracted and held by the bonding head 1 from below and has a camera field of view 20 that can simultaneously recognize the two intersections 18 and 19 of the target 8 from below as shown in FIG. It has a camera. The chip recognition camera 7 is fixed to the XY drive table 21 so as to be movable in the X-axis direction and the Y-axis direction.

ターゲット8は、円板状のもので、表裏から認識可能なアライメントマーク15が描かれている。図5に示すアライメントマーク15の第1実施例は、直交する縦横各3本の直線からなり、基準位置設定用の中心交点17と、中心交点17より離れた位置にある第1交点18及び第2交点19を設定している。ここで3本のX軸方向の直線アライメントマーク15A,15B,15Cは等間隔で平行であり、3本のY軸方向の直線アライメントマーク15D,15E,15Fも同様に等間隔で平行であるため、第1交点18と第2交点19を結んだ線分の中点が中心交点17となっている。   The target 8 has a disk shape, and an alignment mark 15 that can be recognized from the front and back is drawn. The first embodiment of the alignment mark 15 shown in FIG. 5 is composed of three orthogonal vertical and horizontal straight lines, a central intersection 17 for setting a reference position, a first intersection 18 and a first intersection 18 which are located away from the central intersection 17. Two intersection points 19 are set. Here, the three linear alignment marks 15A, 15B, 15C in the X-axis direction are parallel at equal intervals, and the three linear alignment marks 15D, 15E, 15F in the Y-axis direction are also parallel at equal intervals. The middle point of the line segment connecting the first intersection 18 and the second intersection 19 is the central intersection 17.

尚、ターゲット8は、X軸方向の所定位置への進退移動を可能とするX軸シリンダ14を有しており、キャリブレーション時に基板認識カメラ3の同軸下方に移動することができるようにされている。これにより、ターゲット8を挟んで基板認識カメラ3とチップ認識カメラ7が同軸上に位置できる。   The target 8 has an X-axis cylinder 14 that can be moved back and forth to a predetermined position in the X-axis direction, and can be moved below the substrate recognition camera 3 on the same axis during calibration. Yes. Thereby, the board | substrate recognition camera 3 and the chip | tip recognition camera 7 can be located on the same axis on both sides of the target 8.

次に実施例による補正動作について説明する。
図1乃至図3では、ターゲット8のX軸シリンダ14のロッドは縮んだ状態で、ターゲット8は退避位置にある。更に、基板認識カメラ3とチップ認識カメラ7とは、図2に示されるようにX軸位置で同一、Y軸位置で相違する位置に離れている。この状態から、第1段階として基準位置の設定が行われる。
Next, the correction operation according to the embodiment will be described.
1 to 3, the rod of the X-axis cylinder 14 of the target 8 is in a contracted state, and the target 8 is in the retracted position. Further, as shown in FIG. 2, the substrate recognition camera 3 and the chip recognition camera 7 are separated at the same position at the X-axis position and different positions at the Y-axis position. From this state, the reference position is set as the first stage.

上記状態よりX軸シリンダ14が動作し、ロッドが伸び、ターゲット8が所定位置に進入し、停止する。該停止位置は、基板認識カメラ3のX軸位置と同一位置である。その後、Y軸駆動機構4が動作し、基板認識カメラ3がターゲット8上方に移動し、基板認識カメラ3の中心とターゲット8の中心交点17が一致する位置で基板認識カメラ3の移動は停止する。次に、チップ認識カメラ7のXY駆動テーブル21が動作し、ターゲット8の下方に移動し、チップ認識カメラ7の中心がターゲット8の中心交点17と一致する位置で停止する。この状態で、図4に示されるように基板認識カメラ3の中心、チップ認識カメラ7の中心及びターゲット8の中心交点17は同軸上に位置している。   From the above state, the X-axis cylinder 14 operates, the rod extends, and the target 8 enters a predetermined position and stops. The stop position is the same position as the X-axis position of the substrate recognition camera 3. Thereafter, the Y-axis drive mechanism 4 operates, the substrate recognition camera 3 moves above the target 8, and the movement of the substrate recognition camera 3 stops at a position where the center of the substrate recognition camera 3 and the center intersection 17 of the target 8 coincide. . Next, the XY drive table 21 of the chip recognition camera 7 operates, moves below the target 8, and stops at a position where the center of the chip recognition camera 7 coincides with the center intersection 17 of the target 8. In this state, as shown in FIG. 4, the center of the substrate recognition camera 3, the center of the chip recognition camera 7, and the center intersection 17 of the target 8 are located on the same axis.

基板認識カメラ3及びチップ認識カメラ7の中心とターゲット8の中心交点17が同軸上に位置したところで、基板認識カメラ3及びチップ認識カメラ7にてターゲット8の第1交点18及び第2交点19を撮像する。撮像後、画像処理により第1交点18及び第2交点19の座標を求め、2点の座標から、2点間の中心点座標(基準位置)と2点を結ぶ直線の傾き角を算出する。この算出された中心点座標が基準位置、傾き角が基準角であり、基板認識カメラ3、チップ認識カメラ7及びターゲット8の基準位置として記憶装置に記録され、基準位置での両撮像手段(基板認識カメラ3とチップ認識カメラ7)の相対位置関係も認識される。以上が第1段階としての基準位置の設定動作である。   When the center of the substrate recognition camera 3 and the chip recognition camera 7 and the center intersection 17 of the target 8 are located coaxially, the substrate recognition camera 3 and the chip recognition camera 7 set the first intersection 18 and the second intersection 19 of the target 8. Take an image. After imaging, the coordinates of the first intersection 18 and the second intersection 19 are obtained by image processing, and the inclination angle of the straight line connecting the two points with the center point coordinate (reference position) between the two points is calculated from the coordinates of the two points. The calculated center point coordinates are the reference position, and the tilt angle is the reference angle, which are recorded in the storage device as the reference positions of the substrate recognition camera 3, the chip recognition camera 7, and the target 8, and both imaging means (substrates) at the reference position The relative positional relationship between the recognition camera 3 and the chip recognition camera 7) is also recognized. The above is the reference position setting operation as the first stage.

続いて、第2段階として、所定回数又は所定時間、通常の方法で基板2に対して半導体チップをボンディングする。即ち、チップ認識カメラ7にてボンディングヘッド1に吸着された半導体チップの位置認識を行い、基板認識カメラ3にて、基板ステージ6に載置されている基板2の位置認識を行い、演算に基づいた位置の基板2上に半導体チップを接合するのである。   Subsequently, as a second stage, a semiconductor chip is bonded to the substrate 2 by a normal method for a predetermined number of times or a predetermined time. That is, the position of the semiconductor chip attracted to the bonding head 1 is recognized by the chip recognition camera 7, the position of the substrate 2 placed on the substrate stage 6 is recognized by the substrate recognition camera 3, and based on the calculation. The semiconductor chip is bonded onto the substrate 2 at the predetermined position.

第3段階として、所定回数又は所定時間のボンディング動作の後、相対位置関係の変化の検出が行われる。即ち、基準位置設定動作で記憶された基準位置又は基準位置近くに撮像位置が設定される。原則的には基準位置に撮像位置を設定することが好ましく、本実施例では基準位置に設定してある。該撮像位置に基板認識カメラ3とチップ認識カメラ7、及びターゲット8を移動させ、両認識カメラ3、7により第1交点18及び第2交点19の画像取込を行う。   As a third stage, a change in relative positional relationship is detected after a predetermined number of times or a predetermined time of bonding operation. That is, the imaging position is set near or at the reference position stored in the reference position setting operation. In principle, it is preferable to set the imaging position as the reference position. In this embodiment, the imaging position is set as the reference position. The substrate recognition camera 3, the chip recognition camera 7, and the target 8 are moved to the imaging position, and the first intersection 18 and the second intersection 19 are captured by both recognition cameras 3, 7.

画像処理により第1交点18及び第2交点19の座標を求め、2点の座標から、2点間の中心点座標と2点を結ぶ直線の傾き角を算出する。この時、2点間の中心位置が基準位置(基準位置設定動作にて検出した2点間の中心位置)より変化していれば、それは熱膨張等の理由による影響、即ちX軸方向及びY軸方向のずれである。更に、2点を結ぶ直線の傾き角が基準角より変化していれば、それはθ軸方向(回転方向)のずれが生じたことになる。   The coordinates of the first intersection 18 and the second intersection 19 are obtained by image processing, and the inclination angle of the straight line connecting the two points with the center point coordinate between the two points is calculated from the coordinates of the two points. At this time, if the center position between the two points is changed from the reference position (the center position between the two points detected by the reference position setting operation), it is influenced by the reasons such as thermal expansion, that is, the X-axis direction and the Y-axis. Axial misalignment. Furthermore, if the inclination angle of the straight line connecting the two points changes from the reference angle, it means that a deviation in the θ-axis direction (rotation direction) has occurred.

このずれ量はターゲット8と基板認識カメラ3との相対ずれ量と、ターゲット8とチップ認識カメラ7の相対ずれ量として検出される。そして、該ターゲット8と基板認識カメラ3との相対ずれ量と該ターゲット8とチップ認識カメラ7の相対ずれ量から基板認識カメラ3とチップ認識カメラ7の相対ずれ量を演算し、両撮像手段の相対位置関係として認識する。このずれ量を補正量としてボンディングの際の誤差を取り除くのである。   This deviation amount is detected as a relative deviation amount between the target 8 and the substrate recognition camera 3 and as a relative deviation amount between the target 8 and the chip recognition camera 7. Then, the relative displacement between the target 8 and the substrate recognition camera 3 and the relative displacement between the target 8 and the chip recognition camera 7 are calculated, and the relative displacement between the substrate recognition camera 3 and the chip recognition camera 7 is calculated. Recognized as a relative positional relationship. This deviation amount is used as a correction amount to remove an error during bonding.

以上は、第1実施例のアライメントマーク15を用いた例を説明してきた。即ち、基板認識カメラ3及びチップ認識カメラ7のカメラ視野20に、第1交点18及び第2交点19が入り、1回の撮像で両交点18,19の位置認識が可能となるアライメントマーク15を用いた。これに対し、図6に示すように同一カメラ視野20に入らないY軸方向に比較的長い距離をとって、第1交点28と第2交点29を設定した第2実施例のアライメントマーク25を有するターゲット8を用い、基板認識カメラ3及びチップ認識カメラ7をY軸方向に移動させて、ずれ量を算出することも可能である。   The above has described an example using the alignment mark 15 of the first embodiment. That is, the first intersection 18 and the second intersection 19 enter the camera field of view 20 of the substrate recognition camera 3 and the chip recognition camera 7, and the alignment marks 15 that can recognize the positions of both the intersections 18 and 19 by one imaging are provided. Using. On the other hand, as shown in FIG. 6, the alignment mark 25 of the second embodiment in which the first intersection 28 and the second intersection 29 are set at a relatively long distance in the Y-axis direction that does not enter the same camera field of view 20 is shown. It is also possible to calculate the shift amount by moving the substrate recognition camera 3 and the chip recognition camera 7 in the Y-axis direction using the target 8 that is provided.

この第2実施例のアライメントマーク25のターゲット8を用いる場合、次のように動作する。先ず、基板認識カメラ3及びチップ認識カメラ7の中心とターゲット8の中心交点27を同軸上に位置させる。そこから、基板認識カメラ3及びチップ認識カメラ7の中心とターゲット8の第1交点28が同軸上に位置したところへ移動し、基板認識カメラ3及びチップ認識カメラ7にてターゲット8の第1交点28を撮像する。撮像後、画像処理により第1交点28の座標を求める。   When the target 8 of the alignment mark 25 of the second embodiment is used, the operation is as follows. First, the centers of the substrate recognition camera 3 and chip recognition camera 7 and the center intersection 27 of the target 8 are positioned on the same axis. From there, the center of the substrate recognition camera 3 and the chip recognition camera 7 and the first intersection 28 of the target 8 are moved coaxially, and the first intersection of the target 8 is detected by the substrate recognition camera 3 and the chip recognition camera 7. 28 is imaged. After imaging, the coordinates of the first intersection point 28 are obtained by image processing.

続いて、両カメラ3,7はY軸方向に所定距離移動し、両カメラ3,7の中心とターゲット8の第2交点29を同軸上に位置させ、両カメラ3,7にて第2交点29を撮像し、撮像後第2交点29の座標を求める。この2点の座標から、2点間の中心点座標(基準位置)と2点を結ぶ直線の傾き角を算出する。この算出された中心点座標及び傾き角が基板認識カメラ3、チップ認識カメラ7及びターゲット8の基準位置、基準角として、記憶装置に記録され、基準位置での両撮像手段(基板認識カメラ3とチップ認識カメラ7)の相対位置関係も認識される。   Subsequently, both the cameras 3 and 7 are moved by a predetermined distance in the Y-axis direction, the center of both the cameras 3 and 7 and the second intersection 29 of the target 8 are positioned on the same axis, and the second intersection is detected by both the cameras 3 and 7. 29 is imaged, and the coordinates of the second intersection point 29 are obtained after imaging. From the coordinates of these two points, the inclination angle of the straight line connecting the two points with the center point coordinate (reference position) between the two points is calculated. The calculated center point coordinates and tilt angle are recorded in the storage device as reference positions and reference angles of the substrate recognition camera 3, the chip recognition camera 7 and the target 8, and both image pickup means (substrate recognition camera 3 and The relative positional relationship of the chip recognition camera 7) is also recognized.

続いて、アライメントマーク15の第1実施例の場合と同様、第2段階として、所定回数又は所定時間、通常の方法で基板2に対して半導体チップをボンディングする。即ち、チップ認識カメラ7にてボンディングヘッド1に吸着された半導体チップの位置認識を行い、基板認識カメラ3にて、基板ステージ6に載置されている基板2の位置認識を行い、演算に基づいた位置の基板2上に半導体チップを接合するのである。   Subsequently, as in the case of the first embodiment of the alignment mark 15, as a second step, a semiconductor chip is bonded to the substrate 2 by a normal method for a predetermined number of times or for a predetermined time. That is, the position of the semiconductor chip attracted to the bonding head 1 is recognized by the chip recognition camera 7, the position of the substrate 2 placed on the substrate stage 6 is recognized by the substrate recognition camera 3, and based on the calculation. The semiconductor chip is bonded onto the substrate 2 at the predetermined position.

第3段階として、所定回数又は所定時間のボンディング動作の後、相対位置関係の変化の検出が行われる。このとき第1交点28及び第2交点29を両カメラ3,7で撮像するのであるが、撮像位置は2箇所設けられており、第1交点28の撮像位置は、基準点設定時の第1交点28の座標位置と同一又はその近傍に設定される。又、第2交点29の撮像位置も、同様に基準位置設定時の第2交点29の座標位置と同一又はその近傍に設定されている。   As a third stage, a change in relative positional relationship is detected after a predetermined number of times or a predetermined time of bonding operation. At this time, the first intersection 28 and the second intersection 29 are imaged by both the cameras 3 and 7, but two imaging positions are provided, and the imaging position of the first intersection 28 is the first when the reference point is set. It is set to be the same as or near the coordinate position of the intersection 28. Similarly, the imaging position of the second intersection point 29 is set to be the same as or near the coordinate position of the second intersection point 29 when the reference position is set.

ここで基板認識カメラ3及びチップ認識カメラ7の中心とターゲット8の第1交点28を撮像位置に移動させ、同軸上に位置したところで、基板認識カメラ3及びチップ認識カメラ7にてターゲット8の第1交点28を撮像する。撮像後、画像処理により第1交点28の座標を求める。   Here, the center of the substrate recognition camera 3 and the chip recognition camera 7 and the first intersection 28 of the target 8 are moved to the imaging position, and when they are located on the same axis, the substrate recognition camera 3 and the chip recognition camera 7 use the first of the targets 8. One intersection 28 is imaged. After imaging, the coordinates of the first intersection point 28 are obtained by image processing.

続いて、両カメラ3,7はY軸方向に所定距離移動し、両カメラ3,7の中心とターゲット8の第2交点29を同軸上に位置させ、両カメラ3,7にて第2交点29を撮像し、撮像後第2交点29の座標を求める。2点の座標から、2点間の中心点座標と2点を結ぶ直線の傾き角を算出する。この時、2点間の中心位置が基準位置(基準位置設定動作にて検出した2点間の中心位置)より変化していれば、X軸方向及びY軸方向のずれが生じたことになり、更に、2点を結ぶ直線の傾き角が基準角より変化していれば、それはθ軸方向(回転方向)のずれが生じたことになる。   Subsequently, both the cameras 3 and 7 are moved by a predetermined distance in the Y-axis direction, the center of both the cameras 3 and 7 and the second intersection 29 of the target 8 are coaxially positioned, 29 is imaged, and the coordinates of the second intersection point 29 are obtained after imaging. From the coordinates of the two points, the center point coordinate between the two points and the inclination angle of the straight line connecting the two points are calculated. At this time, if the center position between the two points has changed from the reference position (the center position between the two points detected by the reference position setting operation), a deviation in the X-axis direction and the Y-axis direction has occurred. Furthermore, if the inclination angle of the straight line connecting the two points changes from the reference angle, it means that a deviation in the θ-axis direction (rotation direction) has occurred.

このずれ量はターゲット8と基板認識カメラ3との相対ずれ量と、ターゲット8とチップ認識カメラ7の相対ずれ量として検出される。そして、該ターゲット8と基板認識カメラ3との相対ずれ量と該ターゲット8とチップ認識カメラ7の相対ずれ量から基板認識カメラ3とチップ認識カメラ7の相対ずれ量を演算し、両撮像手段の相対位置関係として認識する。このずれ量を補正量としてボンディングの際の誤差を取り除くのである。   This deviation amount is detected as a relative deviation amount between the target 8 and the substrate recognition camera 3 and as a relative deviation amount between the target 8 and the chip recognition camera 7. Then, the relative displacement between the target 8 and the substrate recognition camera 3 and the relative displacement between the target 8 and the chip recognition camera 7 are calculated, and the relative displacement between the substrate recognition camera 3 and the chip recognition camera 7 is calculated. Recognized as a relative positional relationship. This deviation amount is used as a correction amount to remove an error during bonding.

尚、第2実施例のアラインメントマーク25を有するターゲット8を用いた場合でも、基板認識カメラ3及びチップ認識カメラ3のカメラ視野20を広げることにより1の撮像位置で対応できるが、カメラ視野20は、広げれば広げるほど周辺部の歪みが大きくなり正確な位置認識に問題が生じるので、小さなカメラ視野20の基板認識カメラ3及びチップ認識カメラ7を利用し、更に、2点間の距離を長くすることにより、より正確なずれ量の算出が可能となる。   Even when the target 8 having the alignment mark 25 of the second embodiment is used, it is possible to cope with one imaging position by widening the camera field 20 of the substrate recognition camera 3 and the chip recognition camera 3. The wider the spread, the greater the distortion of the peripheral portion, causing a problem in accurate position recognition. Therefore, the substrate recognition camera 3 and the chip recognition camera 7 having a small camera field of view 20 are used, and the distance between the two points is further increased. As a result, it is possible to calculate the shift amount more accurately.

フリップチップボンディング装置の概略を示す斜視説明図An explanatory perspective view showing an outline of a flip chip bonding apparatus. 同平面説明図Same plane explanatory drawing 同正面説明図Front explanatory drawing ターゲット観察時の正面説明図Front explanatory drawing during target observation アライメントマークの第1実施例の平面説明図Plane explanatory drawing of 1st Example of an alignment mark アライメントマークの第2実施例の平面説明図Plane explanatory drawing of 2nd Example of an alignment mark

符号の説明Explanation of symbols

1......ボンディングヘッド
2......基板
3......基板認識カメラ
4......Y軸駆動機構
5......基板ステージ
6......X軸駆動機構
7......チップ認識カメラ
8......ターゲット
9......ヘッドZ軸駆動機構
10.....ヘッドθ軸駆動機構
11,12...可動板
13.....固定ガイド
14.....X軸シリンダ
15,25.アライメントマーク
16.....基板認識カメラのZ軸駆動機構
17,27.中心交点
18,28.第1交点
19,29.第2交点
20.....カメラ視野
21.....XY駆動テーブル
30.....基板搬送ガイド
1. . . . . . Bonding head . . . . . Substrate 3. . . . . . Substrate recognition camera . . . . . 4. Y-axis drive mechanism . . . . . Substrate stage 6. . . . . . 6. X-axis drive mechanism . . . . . Chip recognition camera 8. . . . . . Target 9. . . . . . Head Z axis drive mechanism 10. . . . . Head θ-axis drive mechanism 11,12. . . Movable plate 13. . . . . Fixed guide 14. . . . . X-axis cylinder 15, 25. Alignment mark 16. . . . . Z-axis drive mechanism of substrate recognition camera 17, 27. Central intersection 18,28. First intersection 19,29. Second intersection 20. . . . . Camera view 21. . . . . XY drive table 30. . . . . Board transfer guide

Claims (2)

ボンディングヘッドに吸着保持された電子部品を下方から撮像する部品認識用撮像手段と、
ボンディングステージ上に載置された基板を上方から撮像する基板認識用撮像手段と、部品認識用撮像手段と基板認識用撮像手段との間に配置されるアライメントマークを有するターゲットとを備えると共にターゲット及び両撮像手段が相対移動可能に設置され、
ターゲットを挟んで部品認識用撮像手段と基板認識用撮像手段とを同軸上に位置させた状態で両撮像手段により撮像した画像から両撮像手段の相対位置関係を算出し、相対位置関係に基づいて、基板認識用撮像手段により位置を認識した基板と部品認識用撮像手段により位置を認識した電子部品の位置合わせを行いボンディングをするボンディング装置において、
ターゲットのアライメントマークは所定距離離れた2つの交点を有し、
各撮像手段により撮像された画像から前記2つの交点の位置を認識することにより、
直交するX軸方向及びY軸方向のずれ量、X軸方向及びY軸方向で形成される平面内における回転方向のずれ量からなる両撮像手段の相対位置関係を算出するようにしたことを特徴とするボンディング装置。
Image recognition means for recognizing components from below to image electronic components sucked and held by the bonding head;
A substrate recognition image pickup means for picking up an image of a substrate placed on the bonding stage from above, and a target having an alignment mark arranged between the component recognition image pickup means and the substrate recognition image pickup means; Both imaging means are installed so as to be relatively movable,
The relative positional relationship between the two imaging means is calculated from the images captured by the two imaging means in a state where the imaging means for component recognition and the imaging means for board recognition are positioned coaxially with the target interposed therebetween, and based on the relative positional relationship In a bonding apparatus for aligning and bonding a substrate whose position is recognized by the image recognition means for substrate recognition and an electronic component whose position is recognized by the image recognition means for component recognition,
The target alignment mark has two intersections separated by a predetermined distance,
By recognizing the position of the two intersections from the images imaged by each imaging means,
The relative positional relationship between the two image pickup means is calculated, which includes a deviation amount in the X-axis direction and the Y-axis direction orthogonal to each other and a deviation amount in the rotation direction in a plane formed by the X-axis direction and the Y-axis direction. Bonding equipment.
上記撮像位置は、2箇所設定さており、前記両撮像手段は、一の撮像位置で一方の交点を撮像した後、他の撮像位置に所定距離移動して他方の交点を撮像することによってずれ量を算出するものである請求項1記載のボンディング装置。   The imaging position is set at two locations, and both the imaging means capture an image of one intersection at one imaging position, and then move to a different distance to image another intersection to image the other intersection. The bonding apparatus according to claim 1, wherein:
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CN115529843A (en) * 2021-04-27 2022-12-27 株式会社新川 Semiconductor device manufacturing device and semiconductor device manufacturing method
CN119446997A (en) * 2024-08-15 2025-02-14 鑫益邦半导体(江苏)有限公司 Image recognition system for bonding position and bonding status

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