JP2007221044A - Light emitting device - Google Patents

Light emitting device Download PDF

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JP2007221044A
JP2007221044A JP2006042345A JP2006042345A JP2007221044A JP 2007221044 A JP2007221044 A JP 2007221044A JP 2006042345 A JP2006042345 A JP 2006042345A JP 2006042345 A JP2006042345 A JP 2006042345A JP 2007221044 A JP2007221044 A JP 2007221044A
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light
wavelength conversion
light emitting
emitting device
conversion layer
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JP4838005B2 (en
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Masato Fukutome
正人 福留
Itsuro Sakaguchi
逸郎 坂口
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Kyocera Corp
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Abstract

【課題】 励起光を効率よく発光装置前方に射出し、優れた発光効率を実現する発光装置を提供することである。
【解決手段】 基板1と、この基板1上に載置された励起光を発する発光素子2と、この発光素子2の周囲に発光素子2を取り囲むように設けられ前記励起光を所望の方向に反射する内壁面を備えた側面反射部材3と、前記発光素子2を覆うように発光素子2上に設けられた透光部材5bと、前記側面反射部材3の内壁面に形成された第一の波長変換層4とを具備してなる発光装置であって、透光部材5bに第二の波長変換物質5aを分散させて第二の波長変換層5が形成されている。
【選択図】図1
PROBLEM TO BE SOLVED: To provide a light emitting device that efficiently emits excitation light in front of the light emitting device and realizes excellent light emission efficiency.
SOLUTION: A substrate 1, a light emitting element 2 that emits excitation light mounted on the substrate 1, and a light emitting element 2 provided around the light emitting element 2 so as to surround the light emitting element 2 are arranged in a desired direction. A side reflecting member 3 having a reflecting inner wall surface, a translucent member 5b provided on the light emitting element 2 so as to cover the light emitting element 2, and a first formed on the inner wall surface of the side reflecting member 3. The light-emitting device includes the wavelength conversion layer 4, and the second wavelength conversion layer 5 is formed by dispersing the second wavelength conversion material 5 a in the translucent member 5 b.
[Selection] Figure 1

Description

本発明は、発光素子から発せられる光を波長変換して外部に取り出す発光装置に関し、特に、電子ディスプレイ用のバックライト電源、蛍光ランプ等に好適に用いられる発光装置に関するものである。   The present invention relates to a light emitting device that converts the wavelength of light emitted from a light emitting element and extracts the light to the outside.

従来、白色光を発する発光装置としては、青色を発光する発光素子(LEDチップ)の表面に青色光を黄色光に変換することができる蛍光体を含む波長変換層を設けた構造の発光装置が提案されている。例えば、特許文献1には、nGaN系材料を使った青色LEDチップ上に(Y,Gd)3(Al,Ga)512の組成式で表されるYAG系蛍光体を含む波長変換層を形成した発光装置では、LEDチップから青色光が放出され、波長変換層で青色光の一部が黄色光に変化するため、青色と黄色の光が混色して白色を呈する発光装置が提案されている(特許文献1参照)。 Conventionally, as a light emitting device that emits white light, a light emitting device having a structure in which a wavelength conversion layer including a phosphor that can convert blue light into yellow light is provided on the surface of a light emitting element (LED chip) that emits blue light. Proposed. For example, Patent Document 1 discloses a wavelength conversion layer containing a YAG phosphor expressed by a composition formula of (Y, Gd) 3 (Al, Ga) 5 O 12 on a blue LED chip using an nGaN-based material. In the formed light emitting device, blue light is emitted from the LED chip, and a part of the blue light is changed to yellow light in the wavelength conversion layer. Therefore, a light emitting device in which blue and yellow light are mixed to present white is proposed. (See Patent Document 1).

このような構成の発光装置の一例を図4に示した。この図によれば、発光装置は、電極101が形成された基板102と、基板102上に中心波長が470nmの光を発する半導体材料を具備する発光素子103と、基板102上に発光素子103を覆うように設けられた波長変換層104とを具備し、波長変換層104が蛍光体からなる波長変換物質105を含有してなるものである。なお、所望により、発光素子103と波長変換層104の側面に、光を反射する側面反射部材106を設け、側面に逃げる光を前方に焦光し、出力光の強度を高めることも知られている。   An example of such a light emitting device is shown in FIG. According to this figure, the light-emitting device includes a substrate 102 on which an electrode 101 is formed, a light-emitting element 103 including a semiconductor material that emits light having a central wavelength of 470 nm on the substrate 102, and a light-emitting element 103 on the substrate 102. And a wavelength conversion layer 104 provided so as to cover the wavelength conversion layer 104. The wavelength conversion layer 104 contains a wavelength conversion material 105 made of a phosphor. In addition, it is also known that a side reflection member 106 that reflects light is provided on the side surfaces of the light emitting element 103 and the wavelength conversion layer 104, if desired, and the light escaping to the side surface is focused forward to increase the intensity of the output light. Yes.

この発光装置では、発光素子103から発する光が波長変換層104に照射されると、波長変換物質105は励起されて可視光を発し、この可視光が出力として利用される。
その際、400nm付近の紫色光を発するLEDチップと赤色、緑色、青色の各波長に変換する蛍光体を含有した波長変換層の組み合わせにより、白色を発光するという試みがなされている(特許文献2参照)。例えば、特許文献2に記載のように、紫色LEDチップを覆うように、高分子樹脂中に3種類の蛍光物質を混ぜ込んだ波長変換層を設けることにより、紫色光が波長変換層を透過する際に、赤色、緑色、青色の各波長に変換し、幅広い範囲で発光波長をカバーすることが可能となり、演色性を大幅に向上することができるようになる。
In this light emitting device, when the wavelength conversion layer 104 is irradiated with light emitted from the light emitting element 103, the wavelength conversion material 105 is excited to emit visible light, and this visible light is used as an output.
At that time, an attempt has been made to emit white light by a combination of an LED chip that emits purple light around 400 nm and a wavelength conversion layer containing a phosphor that converts red, green, and blue wavelengths (Patent Document 2). reference). For example, as described in Patent Document 2, by providing a wavelength conversion layer in which three kinds of fluorescent materials are mixed in a polymer resin so as to cover a purple LED chip, purple light is transmitted through the wavelength conversion layer. At this time, it is possible to cover the emission wavelength in a wide range by converting into red, green, and blue wavelengths, and the color rendering properties can be greatly improved.

特開平11−261114号公報JP 11-261114 A 特開2002−314142号公報JP 2002-314142 A

上記従来の発光装置においては、発光素子から発せられた励起光が波長変換層中の蛍光体からなる波長変換物質に吸収された後、別の波長を有する蛍光に変化され、あらゆる方向に放出される。この蛍光のうち一部のものは波長変換層から上側に放出されて発光装置の出力光となるものの、波長変換物質で光散乱が発生するため、他の一部は波長変換層から下方に放出される。その結果、光が発光素子側へ放射されて吸収されてしまう。また、波長変換物質にて散乱した光が発光素子から波長変換層の外に射出されるまでの光路長が長くなり、光路を進行する際の光の吸収も多かった。その結果、発光装置の発光効率が向上しないという問題があった。
従って、本発明は、励起光を効率よく発光装置前方に射出し、優れた発光効率を実現する発光装置を提供することを課題としている。
In the above conventional light emitting device, after the excitation light emitted from the light emitting element is absorbed by the wavelength conversion material made of the phosphor in the wavelength conversion layer, it is changed to fluorescence having another wavelength and emitted in all directions. The Some of this fluorescence is emitted upward from the wavelength conversion layer and becomes the output light of the light emitting device, but light scattering occurs in the wavelength conversion material, and the other part is emitted downward from the wavelength conversion layer. Is done. As a result, light is emitted to the light emitting element side and absorbed. In addition, the light path length until the light scattered by the wavelength conversion material is emitted from the light emitting element to the outside of the wavelength conversion layer is increased, and the light is absorbed much when traveling through the light path. As a result, there has been a problem that the light emission efficiency of the light emitting device is not improved.
Therefore, an object of the present invention is to provide a light emitting device that efficiently emits excitation light in front of the light emitting device and realizes excellent light emission efficiency.

上記課題を解決するための本発明の発光装置は、以下の構成からなる。
(1)基板と、該基板上に載置された励起光を発する発光素子と、該発光素子の周囲に発光素子を取り囲むように設けられ前記励起光を所望の方向に反射する内壁面を備えた側面反射部材と、前記側面反射部材の内壁面に形成された第一の波長変換層と、前記発光素子から発する光が前記発光装置から射出するまでの経路に形成された第二の波長変換層とを具備していることを特徴とする発光装置。
(2)前記第一の波長変換層は、平均粒径が0.1〜50μmである第一の波長変換物質を透光部材に含有させて形成されていることを特徴とする(1)に記載の発光装置。
(3)前記第二の波長変換層は、平均粒径が10nm以下の化合物半導体である第二の波長変換物質を透光部材に含有させて形成されていることを特徴とする(1)または(2)に記載の発光装置。
(4)前記第一の波長変換層の厚みが、0.05〜0.5mmであることを特徴とする(1)ないし(3)のいずれかに記載の発光装置。
(5)前記第二の波長変換層の厚みが、0.1〜10mmであることを特徴とする(1)ないし(4)のいずれかに記載の発光装置。
(6)前記化合物半導体物質のバンドギャップエネルギーが、1.5〜2.5eVの範囲にあることを特徴とする(3)に記載の発光装置。
(7)前記化合物半導体組成が、周期律表第I−b族、第II族(ただし、Be、Cd、Hg、Raを除く)、第III 族(ただし、Tl、Ac系列元素を除く)、第IV族(ただし、Pb、Hfを除く)、第V族(ただし、AsとPa系列を除く)、第VI族(ただし、Se、Uを除く)に属する少なくとも2種類以上の元素からなる半導体組成物であることを特徴とする(3)または(6)に記載の発光装置。
(8)前記第一の波長変換物質が、酸化物蛍光物質であることを特徴とする(2)に記載の発光装置。
(9)前記第一の波長変換層により変換された第一の出力光と、第二の波長変換層により変換された第二の出力光とが混合され、そのスペクトルが400〜900nmの白色光を発することを特徴とする(1)ないし(8)のいずれかに記載の発光装置。
(10)前記第一の波長変換層からの出力光のピーク波長が、400〜700nmであることを特徴とする(1)ないし(9)のいずれかに記載の発光装置。
(11)前記第二の波長変換物層からの出力光のピーク波長が、500〜900nmであることを特徴とする(1)ないし(10)のいずれかに記載の発光装置。
(12)前記発光素子が発する励起光の中心波長が、450nm以下であることを特徴とする(1)ないし(13)のいずれかに記載の発光装置。
(13)前記第二の波長変換層の一部を覆い前記発光素子の励起光出射面に対向する光反射面を有する対向反射部材を具備していることを特徴とする(1)ないし(12)のいずれかに記載の発光装置。
(14)前記側面反射部材よりも内方に発光素子を取り囲むように内周反射部材を設けたことを特徴とする請求項1ないし13のいずれかに記載の発光装置。
(15)前記内周反射部材の表面に第三の波長変換層を設けたことを特徴とする(14)に記載の発光装置。
(16)前記対向反射部材は、その外周部が発光素子の端部とその端部の反対側の内周反射部材の内周面の上端を通る直線よりも側面反射部材側に位置していることを特徴とする(13)ないし(15)のいずれかに記載の発光装置。
In order to solve the above problems, a light emitting device of the present invention has the following configuration.
(1) A substrate, a light emitting element that emits excitation light mounted on the substrate, and an inner wall surface that surrounds the light emitting element and surrounds the light emitting element and reflects the excitation light in a desired direction. Side reflection member, a first wavelength conversion layer formed on the inner wall surface of the side reflection member, and a second wavelength conversion formed in a path until light emitted from the light emitting element is emitted from the light emitting device. And a light-emitting device.
(2) The first wavelength conversion layer is formed by including a first wavelength conversion material having an average particle diameter of 0.1 to 50 μm in a translucent member. The light-emitting device of description.
(3) The second wavelength conversion layer is formed by containing a second wavelength conversion material, which is a compound semiconductor having an average particle size of 10 nm or less, in a light-transmitting member (1) or The light emitting device according to (2).
(4) The light emitting device according to any one of (1) to (3), wherein the first wavelength conversion layer has a thickness of 0.05 to 0.5 mm.
(5) The light emitting device according to any one of (1) to (4), wherein the thickness of the second wavelength conversion layer is 0.1 to 10 mm.
(6) The light-emitting device according to (3), wherein a band gap energy of the compound semiconductor material is in a range of 1.5 to 2.5 eV.
(7) The compound semiconductor composition has a periodic table group Ib, group II (excluding Be, Cd, Hg, Ra), group III (excluding Tl, Ac series elements), A semiconductor composed of at least two elements belonging to Group IV (excluding Pb and Hf), Group V (excluding As and Pa series), and Group VI (excluding Se and U) The light-emitting device according to (3) or (6), which is a composition.
(8) The light emitting device according to (2), wherein the first wavelength converting substance is an oxide fluorescent substance.
(9) The first output light converted by the first wavelength conversion layer and the second output light converted by the second wavelength conversion layer are mixed, and the spectrum has white light of 400 to 900 nm. The light-emitting device according to any one of (1) to (8), wherein
(10) The light emitting device according to any one of (1) to (9), wherein a peak wavelength of output light from the first wavelength conversion layer is 400 to 700 nm.
(11) The light emitting device according to any one of (1) to (10), wherein a peak wavelength of output light from the second wavelength conversion layer is 500 to 900 nm.
(12) The light-emitting device according to any one of (1) to (13), wherein a center wavelength of excitation light emitted from the light-emitting element is 450 nm or less.
(13) (1) to (12) characterized in that an opposing reflecting member is provided which covers a part of the second wavelength conversion layer and has a light reflecting surface facing the excitation light emitting surface of the light emitting element. ).
(14) The light-emitting device according to any one of (1) to (13), wherein an inner peripheral reflection member is provided so as to surround the light-emitting element inward of the side surface reflection member.
(15) The light-emitting device according to (14), wherein a third wavelength conversion layer is provided on the surface of the inner peripheral reflection member.
(16) The opposing reflecting member is positioned on the side reflecting member side with respect to the straight line passing through the upper end of the inner peripheral surface of the inner peripheral reflecting member on the opposite side of the end portion of the light emitting element. The light emitting device according to any one of (13) to (15).

上記(1)の発光装置によれば、波長変換物質の一部を第一の波長変換層として側面反射部材上に形成することにより、該第一の波長変換層内で波長変換物質に吸収され別の波長を有する蛍光に変化された光は、たとえ波長変換物質による光散乱が起こったとしても近傍に存在する側面反射部材により所望の方向(例えば発光素子の前方)に反射され、光の損失が抑制される。その結果、前記発光素子から発する光が前記発光装置から射出するまでの経路中(例えば透光部材中)に形成された第二の波長変換層では、該層中に分散する波長変換物質の量を減らすことができ、かつ光路長を短くし、光の吸収を抑制することができるので、光路中での光の吸収が少なくなり、発光効率が向上するという効果がある。 According to the light emitting device of (1) above, by forming a part of the wavelength conversion material on the side reflecting member as the first wavelength conversion layer, the wavelength conversion material is absorbed in the first wavelength conversion layer. Even if light scattering by the wavelength conversion material occurs, the light changed to fluorescence having another wavelength is reflected in a desired direction (for example, in front of the light emitting element) by a side reflection member present in the vicinity, and light loss is caused. Is suppressed. As a result, in the second wavelength conversion layer formed in the path (for example, in the translucent member) until the light emitted from the light emitting element exits from the light emitting device, the amount of the wavelength converting substance dispersed in the layer Can be reduced, and the optical path length can be shortened and the absorption of light can be suppressed, so that the absorption of light in the optical path is reduced and the light emission efficiency is improved.

上記(2)の発光装置によれば、側面反射部材上での拡散、反射する量が増大するため、第二の波長変換層へ吸収される励起光の量が増大し、高発光特性を実現することができる。
上記(3)の発光装置によれば、第二の波長変換層に含有される第二の波長変換物質の平均粒径が10nm以下であることにより、該波長変換物質は高い発光効率を示すだけなく、粒径に応じて様々な発光スペクトルを発現できる。よって、高効率かつ波長制御可能な発光装置を実現できる。
すなわち、第二の波長変換層が、平均粒径10nm以下の第二の波長変換物質を含有していることにより、励起光波長の4分の1よりもはるかに小さいため、光散乱が起き難い。
これにより、紫外域の励起光に対して優れた発光効率を示し、高輝度発光装置を実現できる。
According to the light emitting device of (2) above, since the amount of diffusion and reflection on the side reflecting member increases, the amount of excitation light absorbed by the second wavelength conversion layer increases, realizing high light emission characteristics. can do.
According to the light emitting device of (3) above, since the average particle diameter of the second wavelength conversion material contained in the second wavelength conversion layer is 10 nm or less, the wavelength conversion material only exhibits high luminous efficiency. In addition, various emission spectra can be developed depending on the particle size. Therefore, it is possible to realize a light-emitting device with high efficiency and wavelength control.
That is, since the second wavelength conversion layer contains the second wavelength conversion material having an average particle diameter of 10 nm or less, it is much smaller than a quarter of the excitation light wavelength, and thus light scattering hardly occurs. .
Thereby, the luminous efficiency which was excellent with respect to the excitation light of an ultraviolet region is shown, and a high-intensity light-emitting device is realizable.

上記(4)の発光装置によれば、第前記第一の波長変換層の厚みが0.05〜0.5mmであることにより、第一の波長変換層の波長変換効率が高く、且つ光が充分に透過するため、より優れた発光特性を示すことができる。また、変換された光が、第二の波長変換層に含有される他の蛍光体等により吸収されることを抑制することができる。よって、高効率な発光装置を実現できる。
上記(5)に記載のように、第二の波長変換層の厚みを0.1〜10mmと厚くする場合は、波長変換物質の体積分率(すなわち透明部材に対する波長変換物質の割合)が低くなるので、変換効率がより高くなる。
上記(6)の発光装置によれば、前記化合物半導体物質のバンドギャップエネルギーが1.5〜2.5eVの範囲にあるので、可視光領域の蛍光が得られる。すなわち、粒径を10nm以下のナノスケールまで微粒化すると、量子サイズ効果によってバンドギャップが増大する。このときバンドギャップエネルギーが1.5eV〜2.5eVのとき、波長400〜900nmの範囲の可視光領域の蛍光が得られ、演色性の高い高輝度発光の発光装置が得られる。
According to the light emitting device of (4) above, since the thickness of the first wavelength conversion layer is 0.05 to 0.5 mm, the wavelength conversion efficiency of the first wavelength conversion layer is high, and light is transmitted. Since it is sufficiently transmitted, more excellent light emission characteristics can be exhibited. Moreover, it can suppress that the converted light is absorbed by the other fluorescent substance etc. which are contained in the 2nd wavelength conversion layer. Therefore, a highly efficient light emitting device can be realized.
As described in (5) above, when the thickness of the second wavelength conversion layer is increased to 0.1 to 10 mm, the volume fraction of the wavelength conversion substance (that is, the ratio of the wavelength conversion substance to the transparent member) is low. Therefore, the conversion efficiency becomes higher.
According to the light emitting device of (6) above, since the band gap energy of the compound semiconductor material is in the range of 1.5 to 2.5 eV, fluorescence in the visible light region can be obtained. That is, when the particle size is atomized to a nanoscale of 10 nm or less, the band gap increases due to the quantum size effect. At this time, when the band gap energy is 1.5 eV to 2.5 eV, fluorescence in the visible light region in the wavelength range of 400 to 900 nm is obtained, and a light emitting device that emits light with high color rendering and high luminance is obtained.

上記(7)の発光装置によれば、前記化合物半導体が、CdSeやCdSなどの有害性な半導体超微粒子を含有していないので、安全性の高く、従ってさまざまな電子デバイスへの応用展開が可能となる。
上記(8)の発光装置によれば、第一の波長変換物質が酸化物蛍光物質であるので、耐光性に優れ、かつ高輝度発光する物質であることから、耐光性に優れかつ高輝度発光の発光装置が得られる。
上記(9)の発光装置によれば、出力光の波長は可視光の波長400〜900nmと合致するので、高効率で演色性の良好な白色光の発光装置が実現される。
上記(10)の発光装置によれば、第一の波長変換物質からの出力光のピーク波長が400〜700nmであるので、自らの発光波長よりも短い発光を示す蛍光体により発せられた光を吸収し、発光効率が低下するという半導体超微粒子の欠点を補うことができる。
上記(11)の発光装置によれば、第二の波長変換物質からの出力光のピーク波長が500〜900nmであるので、第二の波長変換層からの出力光が赤外領域を含むため発光効率が低下することがなく、出力光全てが可視光領域の波長400〜900nmの範囲に入る。よって、高効率で演色性のよい発光装置が得られる。
上記(12)の発光装置によれば、発光素子からの励起光の中心波長が450nm以下であるとき、第一および第二の波長変換層内の波長変換物質の量子効率を向上させることができ、発光効率を高めることができる。
According to the light-emitting device of (7), the compound semiconductor does not contain harmful semiconductor ultrafine particles such as CdSe and CdS, so it is highly safe and can be applied to various electronic devices. It becomes.
According to the light emitting device of the above (8), since the first wavelength conversion material is an oxide fluorescent material, it is a material that has excellent light resistance and emits high luminance, and thus has excellent light resistance and high luminance emission. The light emitting device is obtained.
According to the light emitting device of (9) above, the wavelength of the output light matches the wavelength of visible light of 400 to 900 nm, so that a white light emitting device with high efficiency and good color rendering is realized.
According to the light emitting device of the above (10), since the peak wavelength of the output light from the first wavelength converting substance is 400 to 700 nm, the light emitted by the phosphor that emits light shorter than its own light emitting wavelength is emitted. It is possible to compensate for the disadvantage of the semiconductor ultrafine particles that the light is absorbed and the luminous efficiency is lowered.
According to the light emitting device of (11) above, since the peak wavelength of the output light from the second wavelength conversion substance is 500 to 900 nm, the output light from the second wavelength conversion layer includes the infrared region, and thus emits light. The efficiency does not decrease, and all output light falls within the visible light wavelength range of 400 to 900 nm. Therefore, a light emitting device with high efficiency and good color rendering can be obtained.
According to the light emitting device of (12) above, when the central wavelength of the excitation light from the light emitting element is 450 nm or less, the quantum efficiency of the wavelength conversion material in the first and second wavelength conversion layers can be improved. , Luminous efficiency can be increased.

上記(13)の発光装置によれば、対向反射部材を具備しているので、透光部材を通過した透過光の一部を対向反射部材にて反射させて、もう一度第一および第2の変換層内に取り込み、各層内の波長変換物質でそれぞれ変換させて、外部に出射すれば、第一および第2の変換層内の波長変換物質の濃度を増大させることなく、変換効率を向上させることができる。
上記(14)の発光装置によれば、前記側面反射部材の内方に内周反射部材を具備しているので、発光素子から発光された光を高い強度で外部に出射できる。すなわち、発光素子から発光した光は内周反射部材により上方に反射され、さらに対向反射部材により下方に反射され、側面反射部材により外部に出射する光の経路が形成される。従来では、種々の方向に進んで外部に出なかった光でも、本構成により良好に外部へ出射させることが可能となり、高効率な発光装置が実現できる。
According to the light emitting device of the above (13), since the opposed reflecting member is provided, a part of the transmitted light that has passed through the translucent member is reflected by the opposed reflecting member, and the first and second conversions are performed again. Improve the conversion efficiency without increasing the concentration of the wavelength conversion substance in the first and second conversion layers if it is taken into the layer, converted by the wavelength conversion substance in each layer, and emitted to the outside. Can do.
According to the light emitting device of the above (14), since the inner peripheral reflecting member is provided inside the side reflecting member, the light emitted from the light emitting element can be emitted to the outside with high intensity. That is, the light emitted from the light emitting element is reflected upward by the inner peripheral reflecting member, further reflected downward by the counter reflecting member, and a light path that is emitted to the outside is formed by the side reflecting member. Conventionally, light that has traveled in various directions and did not exit to the outside can be satisfactorily emitted to the outside by this configuration, and a highly efficient light-emitting device can be realized.

上記(15)の発光装置によれば、波長変換物質の一部で内周反射部材上に第三の波長変換層を形成することにより、該第三の波長変換層内で波長変換物質に吸収され別の波長を有する蛍光に変化された光は、たとえ波長変換物質による光散乱が起こったとしても近傍に存在する内周反射部材により所望の方向、例えば発光素子の前方に反射され、光の損失が抑制される。
上記(16)の発光装置によれば、前記対向反射部材は、その外周部が発光素子の端部とその端部の反対側の内周反射部材の内周面の上端を通る直線よりも側面反射部材側に位置しているので、第二の波長変換層を通過した透過光の一部を対向反射部材にて反射させる割合が増大するため、第二の波長変換層を通過した励起光をもう一度第一および第2の変換層内に取り込み、各層内の波長変換物質でそれぞれ変換させて、外部に出射するため、第一および第2の変換層内の波長変換物質の濃度を増大させることなく、変換効率を向上させることができる。よって、きわめて有効に放射光強度および輝度を高めることができ、発光効率の高い発光装置が実現できる。
According to the light emitting device of (15) above, by forming a third wavelength conversion layer on the inner reflection member with a part of the wavelength conversion material, the wavelength conversion material absorbs the third wavelength conversion layer. Even if light scattering by the wavelength conversion material occurs, the light converted into fluorescence having another wavelength is reflected in a desired direction, for example, in front of the light emitting element, by the nearby inner reflection member. Loss is suppressed.
According to the light emitting device of the above (16), the opposing reflecting member has a side surface that is more than a straight line whose outer peripheral portion passes through the end portion of the light emitting element and the upper end of the inner peripheral surface of the inner peripheral reflecting member opposite to the end portion. Since the ratio of reflecting part of the transmitted light that has passed through the second wavelength conversion layer by the opposing reflection member increases because it is located on the reflective member side, the excitation light that has passed through the second wavelength conversion layer Increasing the concentration of the wavelength conversion substance in the first and second conversion layers to be taken into the first and second conversion layers once again, converted by the wavelength conversion substance in each layer, and emitted to the outside. Therefore, the conversion efficiency can be improved. Therefore, the emitted light intensity and brightness can be increased very effectively, and a light emitting device with high luminous efficiency can be realized.

(第1実施形態)
本発明を、図面を用いて説明する。図1は本発明の発光装置の一実施形態を示す概略断面図である。
図1に示すように、本発明の発光装置は、基板1と、該基板1上に中心波長が450nm以下の光を発する半導体材料を具備する発光素子2と、該発光素子2の周りに発光素子2から発する励起光を効率良く前方に出射するように設けられた側面反射部材3と、該側面反射部材3上に形成された第一の波長変換層4と、基板1上に発光素子2を覆うように形成された第二の波長変換層5とから構成されている。発光素子2は電極6と接続されている。
(First embodiment)
The present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing an embodiment of a light emitting device of the present invention.
As shown in FIG. 1, the light emitting device of the present invention includes a substrate 1, a light emitting element 2 including a semiconductor material that emits light having a central wavelength of 450 nm or less on the substrate 1, and light emission around the light emitting element 2. The side reflection member 3 provided so as to efficiently emit the excitation light emitted from the element 2, the first wavelength conversion layer 4 formed on the side reflection member 3, and the light emitting element 2 on the substrate 1. The second wavelength conversion layer 5 is formed so as to cover. The light emitting element 2 is connected to the electrode 6.

発光素子2から発せられる励起光Lの一部は、第二の波長変換層5内を通過する途中で、第二の波長変換物質5aに吸収され、第二の出力光L2を発する。残りの励起光Lは、第二の波長変換層5aを吸収されずに通過し、第一の波長変換層4に注入される。注入された励起光Lは第一の波長変換層4内の蛍光物質からなる第二の波長変換物質5aに吸収され第一の出力光L1を発する。第一の出力光L1と第二の出力光L2が合成されて、白色光Lwが得られる。   A part of the excitation light L emitted from the light emitting element 2 is absorbed by the second wavelength conversion material 5a while passing through the second wavelength conversion layer 5, and emits the second output light L2. The remaining excitation light L passes through the second wavelength conversion layer 5 a without being absorbed and is injected into the first wavelength conversion layer 4. The injected excitation light L is absorbed by the second wavelength conversion material 5a made of a fluorescent material in the first wavelength conversion layer 4 and emits the first output light L1. The first output light L1 and the second output light L2 are combined to obtain white light Lw.

第一の出力光L1は、波長変換物質5aによる光散乱が起こったとしても近傍に存在する側面反射部材3により所望の方向(例えば発光素子の前方)に反射され、光の損失が抑制される。その結果、前記発光素子2から発する光が前記発光装置から射出するまでの経路中(例えば透光部材中)に形成された第二の波長変換層5では、該層5中に分散する波長変換物質5aの量を減らすことができ、かつ光路長を短くし、光の吸収を抑制することができるので、光路中での光の吸収が少なくなり、発光効率が向上する。   Even if light scattering by the wavelength conversion material 5a occurs, the first output light L1 is reflected in a desired direction (for example, in front of the light emitting element) by the side reflecting member 3 present in the vicinity, and light loss is suppressed. . As a result, in the second wavelength conversion layer 5 formed in the path (for example, in the translucent member) until the light emitted from the light emitting element 2 is emitted from the light emitting device, the wavelength conversion dispersed in the layer 5 is performed. Since the amount of the substance 5a can be reduced, the optical path length can be shortened and light absorption can be suppressed, light absorption in the optical path is reduced, and luminous efficiency is improved.

第一の波長変換層4は、粒径0.1〜50μmの蛍光物質からなる第一の波長変換物質4aが第一の透光部材4bに分散して形成されている。
第二の波長変換層5は、半導体超微粒子からなる第二の波長変換物質5aが第二の透光部材5bに分散して形成されている。
The first wavelength conversion layer 4 is formed by dispersing a first wavelength conversion material 4a made of a fluorescent material having a particle size of 0.1 to 50 μm in the first light transmissive member 4b.
The second wavelength conversion layer 5 is formed by dispersing the second wavelength conversion material 5a made of semiconductor ultrafine particles in the second light transmissive member 5b.

従来の発光装置のように、発光波長の異なる3種類の蛍光体が同一の波長変換層に含有されている場合には、いったん蛍光体から発せられた光を別の蛍光体が吸収してしまい、発光装置全体としての発光効率が充分に高くならなかった。   When three types of phosphors having different emission wavelengths are contained in the same wavelength conversion layer as in a conventional light emitting device, light emitted from the phosphor once is absorbed by another phosphor. The light emission efficiency as a whole of the light emitting device was not sufficiently high.

これに対して、本発明の場合、第一の波長変換層4および第二の波長変換層5内における、短波長の変換光を蛍光体からなる第一の波長変換物質4aが吸収する現象を抑制することができ、第一の波長変換層4内の第一の波長変換物質4aの濃度を上げて含有量を増やさなくても、高い変換効率を得ることができる。その結果、低消費電力で高光出力を得ることが期待できる。   On the other hand, in the case of the present invention, the phenomenon that the first wavelength conversion material 4a made of a phosphor absorbs the short wavelength conversion light in the first wavelength conversion layer 4 and the second wavelength conversion layer 5 is described. Even if the concentration of the first wavelength conversion substance 4a in the first wavelength conversion layer 4 is increased and the content is not increased, high conversion efficiency can be obtained. As a result, high light output can be expected with low power consumption.

基板1は、熱伝導性に優れ、全反射率の大きな基板が用いられる。アルミナ、窒素アルミニウム等のセラミック材料の他に、金属酸化物微粒子を分散させた高分子樹脂が好適に用いられる。   As the substrate 1, a substrate having excellent thermal conductivity and a large total reflectivity is used. In addition to ceramic materials such as alumina and nitrogen aluminum, a polymer resin in which metal oxide fine particles are dispersed is preferably used.

発光素子2は、中心波長が450nm以下、特に380〜420nmの光を発することが好ましい。この範囲の波長域の励起光を用いることにより、蛍光体の励起を効率的に行なうことができ、出力光の強度を高め、より発光強度の高い発光装置を得ることが可能となる。
発光素子2は、上記中心波長を発するものであれば特に制限されるものではないが、発光素子基板表面に、半導体材料からなる発光層を備える構造(不図示)を有していることが、高い外部量子効率を有する点で好ましい。このような半導体材料として、ZnSeや窒化物半導体(GaN等)等種々の半導体を挙げることができるが、発光波長が上記波長範囲であれば、特に半導体材料の種類は限定されない。これらの半導体材料を有機金属気相成長法(MOCVD法)や分子線エピタシャル成長法等の結晶成長法により、発光素子基板上に半導体材料からなる発光層を有する積層構造を形成すれば良い。
The light emitting element 2 preferably emits light having a center wavelength of 450 nm or less, particularly 380 to 420 nm. By using excitation light in the wavelength range of this range, the phosphor can be excited efficiently, the intensity of output light can be increased, and a light emitting device with higher emission intensity can be obtained.
The light emitting element 2 is not particularly limited as long as it emits the central wavelength, but the light emitting element substrate surface has a structure (not shown) including a light emitting layer made of a semiconductor material. This is preferable in that it has a high external quantum efficiency. Examples of such semiconductor materials include various semiconductors such as ZnSe and nitride semiconductors (GaN, etc.), but the type of the semiconductor material is not particularly limited as long as the emission wavelength is in the above wavelength range. A stacked structure including a light-emitting layer made of a semiconductor material may be formed over a light-emitting element substrate using a crystal growth method such as a metal organic chemical vapor deposition method (MOCVD method) or a molecular beam epitaxial growth method.

基板2は、発光層との組み合わせを考慮して材料選定ができ、例えば窒化物半導体からなる発光層を表面に形成する場合、サファイア、スピネル、SiC、Si、ZnO、ZrB2、GaNおよび石英等の材料が好適に用いられる。結晶性の良い窒化物半導体を量産性よく形成させるためにはサファイア基板を用いることが好ましい。 The substrate 2 can be selected in consideration of the combination with the light emitting layer. For example, when a light emitting layer made of a nitride semiconductor is formed on the surface, sapphire, spinel, SiC, Si, ZnO, ZrB 2 , GaN, quartz, etc. These materials are preferably used. In order to form a nitride semiconductor with good crystallinity with high productivity, it is preferable to use a sapphire substrate.

側面反射部材3は、Al,Ag,Au,白金(Pt),チタン(Ti),クロム(Cr),Cu等の高反射率の金属に対して切削加工や金型成形等を行うことにより形成される。または、側面反射部材3が、セラミックスや樹脂等の絶縁体からなる場合、絶縁体の表面上にメッキや蒸着等によりAl,Ag,Au,Pt,Ti,Cr,Cu等の高反射率の金属薄膜が形成されてもよい。側面反射部材3がAgやCu等の酸化により変色し易い金属からなる場合、その表面に、例えば厚さ1〜10μm程度のNiメッキ層と厚さ0.1〜3μm程度のAuメッキ層とが電解メッキ法や無電解メッキ法により順次被着されているのが良い。これにより、側面反射部材3の耐腐食性が向上するとともに、反射率の劣化が抑制される。
側面反射部材3は、図1に示すような、いわゆるすり鉢型であるのが好ましいが、必要に応じて、励起光を所望の方向に反射できるように任意な形状に形成することができる。
The side reflecting member 3 is formed by performing cutting or molding on a highly reflective metal such as Al, Ag, Au, platinum (Pt), titanium (Ti), chromium (Cr), or Cu. Is done. Alternatively, when the side reflecting member 3 is made of an insulator such as ceramics or resin, a highly reflective metal such as Al, Ag, Au, Pt, Ti, Cr, or Cu is formed on the surface of the insulator by plating or vapor deposition. A thin film may be formed. When the side reflecting member 3 is made of a metal that is easily discolored by oxidation such as Ag or Cu, for example, a Ni plating layer having a thickness of about 1 to 10 μm and an Au plating layer having a thickness of about 0.1 to 3 μm are formed on the surface. It is preferable that the electrodes are sequentially deposited by electrolytic plating or electroless plating. Thereby, the corrosion resistance of the side reflecting member 3 is improved and the deterioration of the reflectance is suppressed.
The side reflecting member 3 is preferably a so-called mortar type as shown in FIG. 1, but can be formed into an arbitrary shape so that the excitation light can be reflected in a desired direction, if necessary.

第一の波長変換層4に含まれる蛍光物質からなる波長変換物質4a、および第二の波長変換層5に含まれる半導体超微粒子からなる波長変換物質5aは、発光素子2から発せられる光で直接励起され、これらの光の波長が合成され、幅広い範囲で発光波長をカバーし、演色性が大幅に向上することができる。このようにして各波長変換層から得られる出力光の合成された白色光Lwのピーク波長は、400〜900nm、特に450〜850nm、更には500〜800nmであることが好ましい。   The wavelength conversion material 4 a made of a fluorescent material contained in the first wavelength conversion layer 4 and the wavelength conversion material 5 a made of semiconductor ultrafine particles contained in the second wavelength conversion layer 5 are directly emitted by light emitted from the light emitting element 2. When excited, the wavelengths of these lights are synthesized, covering the emission wavelength in a wide range, and the color rendering can be greatly improved. Thus, the peak wavelength of the synthesized white light Lw of the output light obtained from each wavelength conversion layer is preferably 400 to 900 nm, particularly 450 to 850 nm, and more preferably 500 to 800 nm.

出力光L1、L2は、それぞれ500〜900nmおよび400〜700nmであることが好ましい。これにより、幅広い範囲で発光波長をカバーし、演色性をより向上することができる。   The output lights L1 and L2 are preferably 500 to 900 nm and 400 to 700 nm, respectively. As a result, the emission wavelength can be covered in a wide range, and the color rendering can be further improved.

第二の波長変換層5内の半導体超微粒子からなる波長変換物質5aは、蛍光スペクトルの異なる複数の粒子からなってもよい。この場合、2種以上の半導体超微粒子は、半導体組成が異なるものであってもよく、あるいは同一組成で粒径が異なるものであってもよい。   The wavelength conversion material 5a made of semiconductor ultrafine particles in the second wavelength conversion layer 5 may be made of a plurality of particles having different fluorescence spectra. In this case, the two or more types of semiconductor ultrafine particles may have different semiconductor compositions, or may have the same composition and different particle sizes.

また、第一の波長変換層4内における第一の波長変換物質4aは、蛍光スペクトルの異なる複数の物質からなっても良い。
第一の波長変換層4および第二の波長変換層5の製造方法は、先に示したそれぞれの蛍光物質からなる第一の波長変換物質4a、半導体超微粒子からなる第二の波長変換物質5aを高分子樹脂膜からなる第一の透光部材4b、第二の透光部材5bにそれぞれ分散して形成することが好ましい。
The first wavelength conversion material 4a in the first wavelength conversion layer 4 may be composed of a plurality of materials having different fluorescence spectra.
The manufacturing method of the 1st wavelength conversion layer 4 and the 2nd wavelength conversion layer 5 is the 1st wavelength conversion material 4a which consists of each fluorescent substance shown previously, and the 2nd wavelength conversion material 5a which consists of semiconductor ultrafine particles. Are preferably dispersed and formed in the first translucent member 4b and the second translucent member 5b made of a polymer resin film, respectively.

透光部材としては、蛍光体を均一に分散、担持することが容易で、蛍光体の光劣化を抑制することができる高分子樹脂膜が使用される。このような高分子樹脂膜の材料は特に限定されるものではなく、例えば、エポキシ樹脂、シリコーン樹脂、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリスチレン、ポリカーボネート、ポリエーテルスルホン、酢酸セルロース、ポリアリレート、さらにこれら材料の誘導体などが用いられる。特に、350nm以上の波長域において95%以上の光透過性を有している透光部材を用いるのが好ましい。このような透光性、透明性に加え、耐熱性の観点から、エポキシ樹脂、シリコーン樹脂がより好適に用いられる。シリコーン樹脂の場合、直鎖状であっても架橋構造であっても特に限定されない。また、珪素上の置換基は、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、n−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基、オクチル基、デシル基、ドデシル基、ヘキサデシル基、オクタデシル基等の炭素数1〜20程度のアルキル基、フェニル基、ベンジル基、ナフチル基、ナフチルメチル基等の芳香族炭化水素基を含有する炭化水素基等が例示され、中でもメチル基、エチル基等の炭素数の少ない直鎖状アルキル基が好ましい。   As the translucent member, a polymer resin film that can easily disperse and carry the phosphor uniformly and can suppress light deterioration of the phosphor is used. The material of such a polymer resin film is not particularly limited. For example, epoxy resin, silicone resin, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polystyrene, polycarbonate, polyethersulfone, cellulose acetate, polyarylate Furthermore, derivatives of these materials are used. In particular, it is preferable to use a translucent member having a light transmittance of 95% or more in a wavelength region of 350 nm or more. In addition to such translucency and transparency, epoxy resins and silicone resins are more preferably used from the viewpoint of heat resistance. In the case of a silicone resin, it is not particularly limited whether it is linear or has a crosslinked structure. Substituents on silicon are methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, n-pentyl group, cyclopentyl group, n-hexyl group, cyclohexyl group, octyl group, Hydrocarbon groups containing aromatic hydrocarbon groups such as alkyl groups having about 1 to 20 carbon atoms such as decyl group, dodecyl group, hexadecyl group, octadecyl group, phenyl group, benzyl group, naphthyl group, naphthylmethyl group, etc. Among them, a linear alkyl group having a small number of carbon atoms such as a methyl group and an ethyl group is preferable.

さらに、半導体超微粒子からなる第二の波長変換物質5bと、第二の透光性部材5aとなるマトリックス樹脂の未硬化物との混合物をシート状に成形する。成形方法は、ドクターブレード法やダイコーター法、押し出し法、スピンコート法、ディップ法などシート成形ができる成形法を用いることができ、生産性の点でドクターブレード法やダイコーター法が望ましい。   Further, a mixture of the second wavelength converting material 5b made of ultrafine semiconductor particles and an uncured matrix resin to be the second light-transmissive member 5a is formed into a sheet shape. As the forming method, a forming method capable of forming a sheet, such as a doctor blade method, a die coater method, an extrusion method, a spin coating method, or a dip method, can be used, and a doctor blade method or a die coater method is desirable in terms of productivity.

次に、半導体超微粒子からなる第二の波長変換物質5bを含有した波長変換層5をBステージ化し、その後硬化する。Bステージの状態で硬化することで、密着性がよくなり、硬化後のシート層間の剥離を防止できる。また、熱圧着と硬化の工程は、別々に行ってもよいが、短時間で作製できる点では、連続して行うほうがよい。
第二の波長変換層5に含まれる半導体超微粒子からなる波長変換物質5aは、周期律表第I−b族、第II族(ただし、Be、Cd、Hg、Raを除く)、第III 族(ただし、Tl、Ac系列元素を除く)、第IV族(ただし、Pb、Hfを除く)、第V族(ただし、AsとPa系列を除く)、第VI族(ただし、Se、Uを除く)に属する少なくとも2種類以上の元素からなる半導体超微粒子であれば良く、特に限定されない。これには、例えばBN、BP、BAs、AlN、AlP、AlSb、GaN、GaP、GaSb、InN、InP、InSb等のIII−V族化合物半導体、ZnO、ZnS等のII−VI族化合物半導体、CuInS2、CuGaS2、CuAlS2、Cu(In1-xAlx)S2、CuInS2、Cu(In1-xGax)S2(x及びyは、それぞれ0≦x≦1、0≦y≦1で示される値)などが好適に用いられる。
Next, the wavelength conversion layer 5 containing the second wavelength conversion material 5b made of ultrafine semiconductor particles is B-staged and then cured. By curing in the B-stage state, adhesion is improved and peeling between the sheet layers after curing can be prevented. Further, the thermocompression bonding and curing steps may be performed separately, but it is preferable to perform them continuously in that they can be produced in a short time.
The wavelength converting material 5a made of semiconductor ultrafine particles contained in the second wavelength converting layer 5 is composed of Group Ib, Group II (excluding Be, Cd, Hg, Ra), Group III of the periodic table. (Excluding Tl and Ac series elements), Group IV (excluding Pb and Hf), Group V (excluding As and Pa series), Group VI (excluding Se and U) The semiconductor ultrafine particles composed of at least two kinds of elements belonging to (1) are not particularly limited. For example, BN, BP, BAs, AlN, AlP, AlSb, GaN, GaP, GaSb, InN, InP, InSb and other III-V group compound semiconductors, ZnO, ZnS and other II-VI group compound semiconductors, CuInS 2 , CuGaS 2 , CuAlS 2 , Cu (In 1-x Al x ) S 2 , CuInS 2 , Cu (In 1-x Ga x ) S 2 (x and y are 0 ≦ x ≦ 1, 0 ≦ y, respectively) A value represented by ≦ 1) is preferably used.

本発明の半導体超微粒子からなる第二の波長変換物質5aの粒径は10nm以下、特に2nm〜10nmであることが好ましい。
さらに、本発明の半導体超微粒子からなる第二の波長変換物質5aは、これを構成する半導体組成物のバルク状態での化合物半導体のバンドギャップエネルギーが、温度300Kで1.5から2.5eVの範囲であることが好ましい。
The particle diameter of the second wavelength converting material 5a made of the ultrafine semiconductor particles of the present invention is preferably 10 nm or less, particularly preferably 2 nm to 10 nm.
Furthermore, the second wavelength converting material 5a comprising the semiconductor ultrafine particles of the present invention has a band gap energy of 1.5 to 2.5 eV at a temperature of 300 K in the compound semiconductor in the bulk state of the semiconductor composition constituting the second wavelength converting material 5a. A range is preferable.

また、本発明における半導体超微粒子からなる第二の波長変換物質5aは、内核(コア)と外殻(シェル)からなる、いわゆるコアシェル構造であってもよい。コアシェル型半導体ナノ粒子では、エキシトン吸発光帯を利用する用途に好適な場合がある。この場合、シェルの半導体粒子の組成として、禁制帯幅(バンドギャップ)がコアよりも大きなものを起用することによりエネルギー的な障壁を形成させることが一般に有効である。これは、外界の影響や結晶表面での結晶格子欠陥等の理由による望ましくない表面準位等の影響を抑制する機構によるものと推測される。   Further, the second wavelength converting material 5a made of semiconductor ultrafine particles in the present invention may have a so-called core-shell structure made of an inner core (core) and an outer shell (shell). The core-shell type semiconductor nanoparticles may be suitable for applications using an exciton absorption / emission band. In this case, it is generally effective to form an energy barrier by using a shell semiconductor particle having a forbidden band width (band gap) larger than that of the core. This is presumed to be due to a mechanism that suppresses the influence of an undesirable surface level or the like due to the influence of the outside world or crystal lattice defects on the crystal surface.

シェルに好適に用いられる半導体材料の組成としては、コア半導体結晶のバンドギャップにもよるが、バルク状態のバンドギャップが温度300Kにおいて2.5eV以上であるもの、例えばBN、BAs、GaNやGaP等のIII−V族化合物半導体、ZnO、ZnS等のII−VI族化合物半導体、MgSやMgSe等の周期表第2族元素と周期表第16族元素との化合物等が好適に用いられる。   The composition of the semiconductor material suitably used for the shell depends on the band gap of the core semiconductor crystal, but the band gap in the bulk state is 2.5 eV or more at a temperature of 300 K, such as BN, BAs, GaN, GaP, etc. III-V group compound semiconductors, II-VI group compound semiconductors such as ZnO and ZnS, and compounds of Group 2 elements of the periodic table and Group 16 elements of the periodic table such as MgS and MgSe are preferably used.

また、本発明における半導体超微粒子からなる第二の波長変換物質5aは、有機配位子からなる表面修飾分子で覆われていても良い。表面分修飾分子覆うことにより、半導体超微粒子からなる第二の波長変換物質5aの凝集を抑制し、半導体超微粒子の機能を最大限に発現することができる。表面修飾分子としては、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、n−ペンチル基、シクロペンチル基、n−ヘキシル基、シクロヘキシル基、オクチル基、デシル基、ドデシル基、ヘキサデシル基、オクタデシル基等の炭素数3〜20程度のアルキル基、フェニル基、ベンジル基、ナフチル基、ナフチルメチル基等の芳香族炭化水素基を有する炭化水素系化合物等が例示され、中でもn−ヘキシル基、オクチル基、デシル基、ドデシル基、ヘキサデシル基等の炭素数6〜16程度の直鎖状アルキル基を有する炭化水素系化合物が好ましい。また、メルカプト基、ジスルフィド基、チオフェン環等の硫黄原子含有官能基、アミノ基、ピリジン環、アミド結合、ニトリル基等の窒素原子含有官能基、カルボキシル基、スルホン酸基、ホスホン酸基、ホスフィン酸基等の酸性官能基、ホスフィン基やホスフィンオキシド基等のリン原子含有官能基、あるいは水酸基、カルボニル基、エステル結合、エーテル結合、ポリエチレングリコール鎖等の酸素原子含有官能基等を有する有機化合物が好ましい。
このような表面修飾分子の具体例としては、オレイルアミン、オクタデシルアミン、オレイン酸、メルカプト変性シリコーン、アミン変性シリコーン、カルボキシル変性シリコーンなどが例示される。
Further, the second wavelength converting material 5a made of semiconductor ultrafine particles in the present invention may be covered with a surface modifying molecule made of an organic ligand. By covering the surface modification molecules, aggregation of the second wavelength conversion material 5a made of semiconductor ultrafine particles can be suppressed, and the function of the semiconductor ultrafine particles can be expressed to the maximum. As the surface modifying molecule, n-propyl group, isopropyl group, n-butyl group, isobutyl group, n-pentyl group, cyclopentyl group, n-hexyl group, cyclohexyl group, octyl group, decyl group, dodecyl group, hexadecyl group, Examples include hydrocarbon compounds having an aromatic hydrocarbon group such as an alkyl group having about 3 to 20 carbon atoms such as an octadecyl group, a phenyl group, a benzyl group, a naphthyl group, and a naphthylmethyl group, among which an n-hexyl group, A hydrocarbon compound having a linear alkyl group having about 6 to 16 carbon atoms such as an octyl group, a decyl group, a dodecyl group, a hexadecyl group and the like is preferable. Also, sulfur atom-containing functional groups such as mercapto group, disulfide group, thiophene ring, nitrogen atom-containing functional groups such as amino group, pyridine ring, amide bond, nitrile group, carboxyl group, sulfonic acid group, phosphonic acid group, phosphinic acid An organic compound having an acidic functional group such as a group, a phosphorus atom-containing functional group such as a phosphine group or a phosphine oxide group, or an oxygen atom-containing functional group such as a hydroxyl group, a carbonyl group, an ester bond, an ether bond, or a polyethylene glycol chain is preferable. .
Specific examples of such surface modifying molecules include oleylamine, octadecylamine, oleic acid, mercapto-modified silicone, amine-modified silicone, carboxyl-modified silicone and the like.

また、本発明における半導体超微粒子からなる第二の波長変換物質5aは、一般的な製造方法によって製造される。例えば、火炎プロセス・プラズマプロセス・電気加熱プロセス・レーザープロセス等の気相化学反応法、物理冷却法、ゾルゲル法・アルコキシド法・共沈法・ホットソープ法・水熱合成法・噴霧熱分解法等の液相法、さらにメカノケミカルボンディング法、マイクロリアクター法、マイクロ波加熱法等が用いられる。
本発明における蛍光物質からなる第一の波長変換物質4aは、450nm以下の光により励起され、400〜700nmの範囲の光を発する材料であれば特に限定されない。蛍光物質からなる第一の波長変換物質4aには、一般的に用いられる蛍光体を採用できる。例えば、(Ba,Eu)MgAl1017、(Sr,Ca,Ba,Mg)10(PO46Cl17:Eu、Sr10(PO46Cl12:Eu、(Ba,Sr,Eu)(Mg,Mn)Al1017、10(Sr,Ca,Ba,Eu)・6PO4・Cl2、BaMg2Al1625:Eu、Y3Al512:Tb、Y3(Al,Ga)512:Tb、Y2SiO5:Tb、Zn2SiO4:Mn、ZnS:Cu+Zn2SiO4:Mn、Gd22S:Tb、(Zn,Cd)S:Ag、Y22S:Tb、ZnS:Cu,Al+In23、(Zn,Cd)S:Ag+In23、(Zn,Mn)2SiO4、BaAl1219:Mn、(Ba,Sr,Mg)O・aAl23:Mn、LaPO4:Ce,Tb、3(Ba,Mg,Eu,Mn)O・8Al23、La23・0.2SiO2・0.9P25:Ce,Tb、CeMgAl1119:Tb、Y22S:Eu、Y23:Eu、Zn3(PO42:Mn、(Zn,Cd)S:Ag+In23、(Y,Gd、Eu)BO3、(Y,Gd、Eu)23、YVO4:Eu、La22S:Eu,Sm、YAG:Ce等が用いられる。第一の波長変換物質4aは粒径が0.1〜50μm、特に1μm20μmであることが好ましい。
In addition, the second wavelength converting material 5a made of semiconductor ultrafine particles in the present invention is manufactured by a general manufacturing method. For example, gas phase chemical reaction methods such as flame process, plasma process, electric heating process, laser process, physical cooling method, sol-gel method, alkoxide method, coprecipitation method, hot soap method, hydrothermal synthesis method, spray pyrolysis method, etc. The liquid phase method, the mechanochemical bonding method, the microreactor method, the microwave heating method and the like are used.
The first wavelength conversion substance 4a made of a fluorescent substance in the present invention is not particularly limited as long as it is a material that is excited by light of 450 nm or less and emits light in the range of 400 to 700 nm. As the first wavelength conversion material 4a made of a fluorescent material, a generally used phosphor can be adopted. For example, (Ba, Eu) MgAl 10 O 17 , (Sr, Ca, Ba, Mg) 10 (PO 4 ) 6 Cl 17 : Eu, Sr 10 (PO 4 ) 6 Cl 12 : Eu, (Ba, Sr, Eu ) (Mg, Mn) Al 10 O 17, 10 (Sr, Ca, Ba, Eu) · 6PO 4 · Cl 2, BaMg 2 Al 16 O 25: Eu, Y 3 Al 5 O 12: Tb, Y3 (Al, Ga) 5 O 12 : Tb, Y 2 SiO 5 : Tb, Zn 2 SiO 4 : Mn, ZnS: Cu + Zn 2 SiO 4 : Mn, Gd 2 O 2 S: Tb, (Zn, Cd) S: Ag, Y 2 O 2 S: Tb, ZnS: Cu, Al + In 2 O 3 , (Zn, Cd) S: Ag + In 2 O 3 , (Zn, Mn) 2 SiO 4 , BaAl 12 O 19 : Mn, (Ba, Sr, Mg) O.aAl 2 O 3 : Mn, LaPO 4 : Ce, Tb, 3 (Ba, Mg, Eu, Mn) O. 8Al 2 O 3 , La 2 O 3 .0.2SiO 2 .0.9P 2 O 5 : Ce, Tb, CeMgAl 11 O 19 : Tb, Y 2 O 2 S: Eu, Y 2 O 3 : Eu, Zn 3 (PO 4 ) 2 : Mn, (Zn, Cd) S: Ag + In 2 O 3 , (Y, Gd, Eu) BO 3 , (Y, Gd, Eu) 2 O 3 , YVO 4 : Eu, La 2 O 2 S: Eu, Sm, YAG: Ce, etc. are used. The first wavelength converting material 4a preferably has a particle size of 0.1 to 50 μm, particularly 1 μm to 20 μm.

第二の波長変換層5の厚みは、変換効率および紫外および可視光の透過率の観点から、0.5〜10μm、特に1.0〜5mmが好ましい。さらに、第一の波長変換層4の厚みは、0.05〜0.5mm、特に0.1〜0.3mmが好ましい。この範囲であれば、発光素子から発せられる励起光Lを高効率で出力光L1及びL2に変換することができ、さらに変換された出力光L1およびL2を外部に高効率で透過させることができる。   The thickness of the second wavelength conversion layer 5 is preferably 0.5 to 10 μm, particularly preferably 1.0 to 5 mm, from the viewpoint of conversion efficiency and ultraviolet and visible light transmittance. Furthermore, the thickness of the first wavelength conversion layer 4 is preferably 0.05 to 0.5 mm, particularly preferably 0.1 to 0.3 mm. Within this range, the excitation light L emitted from the light emitting element can be converted into the output lights L1 and L2 with high efficiency, and the converted output lights L1 and L2 can be transmitted to the outside with high efficiency. .

(第2実施形態)
本発明の他の実施形態を図2を用いて説明する。図2は本発明のさらに他の実施形態を示す概略断面図である。なお、図1と同じ構成部材には同一符号を付して説明を省略する。
この実施形態の発光装置は、図2に示すように、発光素子2の周りに発光素子2から発する励起光を効率良く前方に出射するように設けられた側面反射部材3と、側面反射部材3上に形成された第一の波長変換層4と、基板1上に発光素子2を覆うように形成された第二の波長変換層5と、この第二の波長変換層5の一部を覆う対向反射部材8と、側面反射部材3よりも内方に発光素子2を取り囲むように発光素子2の周囲に設けられた内周反射部材9とから構成されている。
(Second Embodiment)
Another embodiment of the present invention will be described with reference to FIG. FIG. 2 is a schematic sectional view showing still another embodiment of the present invention. In addition, the same code | symbol is attached | subjected to the same component as FIG. 1, and description is abbreviate | omitted.
As shown in FIG. 2, the light emitting device of this embodiment includes a side reflecting member 3 provided around the light emitting element 2 so that excitation light emitted from the light emitting element 2 is efficiently emitted forward, and the side reflecting member 3. The first wavelength conversion layer 4 formed above, the second wavelength conversion layer 5 formed on the substrate 1 so as to cover the light emitting element 2, and a part of the second wavelength conversion layer 5 are covered. The counter reflecting member 8 and an inner peripheral reflecting member 9 provided around the light emitting element 2 so as to surround the light emitting element 2 inwardly of the side surface reflecting member 3.

その結果、発光素子から発光した光は内周反射部材により上方に反射され、さらに対向反射部材により下方に反射され、側面反射部材により外部に出射する光の経路が形成される。従来では、種々の方向に進んで外部に出なかった光でも、本構成により良好に外部へ出射させることが可能となり、高効率な発光装置が実現できる。   As a result, light emitted from the light emitting element is reflected upward by the inner peripheral reflecting member, further reflected downward by the counter reflecting member, and a light path that is emitted to the outside is formed by the side reflecting member. Conventionally, light that has traveled in various directions and did not exit to the outside can be satisfactorily emitted to the outside by this configuration, and a highly efficient light-emitting device can be realized.

対向反射部材8は板状で構成され、前記発光素子2の励起光出射面に対向する光反射面8aを有する。
第一の波長変換層4には、粒径0.1〜50μmの酸化物蛍光物質または、粒径10nm以下の半導体超微粒子からなる第一の波長変換物質4aが第一の透光部材4bに分散している。
第二の波長変換層5には、半導体超微粒子からなる第二の波長変換物質5aが第二の透明部材5bに分散している。
The counter reflecting member 8 is formed in a plate shape and has a light reflecting surface 8 a that faces the excitation light emitting surface of the light emitting element 2.
In the first wavelength conversion layer 4, an oxide fluorescent material having a particle size of 0.1 to 50 μm or a first wavelength conversion material 4 a made of semiconductor ultrafine particles having a particle size of 10 nm or less is formed on the first light transmitting member 4 b. Is distributed.
In the second wavelength conversion layer 5, a second wavelength conversion material 5a made of semiconductor ultrafine particles is dispersed in the second transparent member 5b.

対向反射材8の材料は、近紫外光から可視光領域において反射率が高い金属、樹脂、セラミックス等である。金属ではアルミニウム等、樹脂ではポリエステルやポリオレフィン等、セラミックスではアルミナセラミックス等が材料としてあげられる。あるいは金属や樹脂、セラミックス等の基板の表面に、めっきや蒸着等の薄膜形成法により、AgやAuを被着させて対向反射板としてもよい。
対向反射材8は、例えばアルミニウム板から成る場合、アルミニウムを打ち抜き加工や切削加工により円板状等に形成し、その表面に硫酸バリウムや酸化チタン等の光散乱材を樹脂に含有して霧状に塗布することにより高反射率の光散乱面を有する対向反射板を形成することができる。
The material of the counter-reflecting material 8 is a metal, resin, ceramic, or the like that has a high reflectance in the near ultraviolet to visible light region. Examples of materials include aluminum for metals, polyester and polyolefin for resins, and alumina ceramics for ceramics. Alternatively, Ag or Au may be deposited on the surface of a substrate made of metal, resin, ceramic, or the like by a thin film forming method such as plating or vapor deposition to form a counter reflector.
When the counter-reflecting material 8 is made of, for example, an aluminum plate, aluminum is formed into a disk shape or the like by punching or cutting, and a light scattering material such as barium sulfate or titanium oxide is contained on the surface of the resin to form a mist. By applying to the counter reflector, a counter reflector having a light scattering surface with a high reflectance can be formed.

内周反射部材9は、前記側面反射部材3の内周側に、発光素子を取り囲むように形成されている。内周反射部材9は、側面反射部材3と同じ材料を使用して形成することができる。
また、前記対向反射部材8は、その外周部が発光素子2の端部とその端部の反対側の内周反射部材9の内周面上端を通る直線Aよりも側面反射部材3側に位置しているのが発光効率を高めるうえで好ましい。すなわち、第二の波長変換層5を通過した透過光の一部を対向反射部材8にて反射させるため、第二の波長変換層8を通過した励起光をもう一度第一および第二の変換層4,5内に取り込み、各層4,5内の波長変換物質4a,5aでそれぞれ変換させて、外部に出射するため(光の反射経路を矢印B1,B2,B3で例示する)、第一および第二の変換層4,5内の波長変換物質4a,5aの濃度(含有量)を増大させることなく、変換効率を向上させることができる。
The inner periphery reflecting member 9 is formed on the inner periphery side of the side surface reflecting member 3 so as to surround the light emitting element. The inner peripheral reflecting member 9 can be formed using the same material as the side reflecting member 3.
Further, the opposing reflection member 8 has an outer peripheral portion positioned closer to the side reflection member 3 than a straight line A passing through the end of the light emitting element 2 and the inner peripheral surface upper end of the inner peripheral reflection member 9 on the opposite side of the end. It is preferable to increase luminous efficiency. That is, in order to reflect a part of the transmitted light that has passed through the second wavelength conversion layer 5 by the opposing reflection member 8, the excitation light that has passed through the second wavelength conversion layer 8 is once again converted into the first and second conversion layers. 4 and 5 are converted into wavelength conversion materials 4a and 5a in the respective layers 4 and 5 and emitted to the outside (light reflection paths are exemplified by arrows B1, B2 and B3). Conversion efficiency can be improved without increasing the concentration (content) of the wavelength converting substances 4a and 5a in the second conversion layers 4 and 5.

また、図3に示すように、この実施形態の発光装置は、内周反射部材9の表面に第三の波長変換層7を具備しているのが好ましい。すなわち、この実施形態の発光装置は、基板1と、該基板1上に中心波長が450nm以下の光を発する半導体材料を具備する発光素子2と、該発光素子2の周りに発光素子2から発する励起光を効率良く前方に出射するように設けられた側面反射部材3と、該側面反射部材3上に形成された第一の波長変換層4と、基板1上に発光素子2を覆うように形成された第二の波長変換層5と、前記側面反射部材3よりも内方に発光素子を取り囲むように設けられた内周反射部材9と、内周反射部材9の表面に第三の波長変換層7とを具備しているのが好ましい。   As shown in FIG. 3, the light emitting device of this embodiment preferably includes a third wavelength conversion layer 7 on the surface of the inner peripheral reflection member 9. That is, the light-emitting device of this embodiment emits light from the light-emitting element 2 around the light-emitting element 2 and the light-emitting element 2 including a semiconductor material that emits light having a central wavelength of 450 nm or less on the substrate 1. A side reflection member 3 provided to efficiently emit excitation light forward, a first wavelength conversion layer 4 formed on the side reflection member 3, and a light emitting element 2 on the substrate 1 The formed second wavelength conversion layer 5, the inner peripheral reflection member 9 provided so as to surround the light emitting element inwardly of the side surface reflection member 3, and a third wavelength on the surface of the inner peripheral reflection member 9 The conversion layer 7 is preferably included.

第三の波長変換層7は、粒径0.1〜50μmの蛍光物質、または半導体超微粒子からなる第三の波長変換物質7aが透光部材7bに分散して形成されている。第三の波長変換物質7aは、第一の波長変換物質4aおよび第二の波長変換物質5aと同じでもよく、相違していてもよい。   The third wavelength conversion layer 7 is formed by dispersing a third wavelength conversion material 7 a made of a fluorescent material having a particle size of 0.1 to 50 μm or semiconductor ultrafine particles in the light transmitting member 7 b. The third wavelength converting substance 7a may be the same as or different from the first wavelength converting substance 4a and the second wavelength converting substance 5a.

このように内周反射部材9の表面に第三の波長変換層7を設けることにより、通常よりも励起光が波長変換層に照射させる面積が大きくなるため、蛍光体の分散濃度を増やさなくても、変換効率を向上させることができる。さらに、励起光の照射面積を大きくなったにもかかわらず、モジュールサイズを大きくしなくても良いので、小型かつ高効率の発光装置が可能となる。   By providing the third wavelength conversion layer 7 on the surface of the inner peripheral reflection member 9 in this way, the area on which the excitation light is irradiated to the wavelength conversion layer becomes larger than usual, so the dispersion concentration of the phosphor does not have to be increased. Also, the conversion efficiency can be improved. Further, although the irradiation area of the excitation light is increased, the module size does not have to be increased, so that a small and highly efficient light emitting device can be realized.

なお、対向反射材8および内周反射部材9のいずれか一方のみであっても、発光効率を高めるのに効果的である。   In addition, even if it is only any one of the opposing reflective material 8 and the internal peripheral reflection member 9, it is effective in improving luminous efficiency.

(半導体超微粒子)
使用した半導体超微粒子の平均粒子径は、透過型電子顕微鏡(TEM)により確認した。使用した透過型電子顕微鏡はJEOL製JEM2010Fであり、以下の手順で加速電圧200kVの観察を行った。すなわち、半導体超微粒子をサンプル瓶にとり、粒子濃度が0.002〜0.02モル/リットルの範囲となる量のイソプロピルアルコール(IPA)またはトルエンを加えて分散させた。これをTEM観察用マイクログリッドですくい取り、乾燥後、透過型電子顕微鏡にセットした。平均粒子径の測定は格子像より粒子を確認して行った。まず、粒子がメッシュに付着している部分を低倍率で探した。この時、蛍光体が多く付着している部分は粒子が電子線の方向に重なっているため平均粒子径の測定には適さない。また、マイクログリッドのCuメッシュの部分に付着している蛍光体も格子像が観察できないため平均粒子径の観察には適さない。従って、平均粒子径を測定する半導体超微粒子はマイクログリッドの樹脂の部分にある極力重なりの少ない部分を選んで行なった。次に、この部分を1,000,000倍程度に拡大して格子像の確認を行なう。
(Semiconductor ultrafine particles)
The average particle diameter of the used semiconductor ultrafine particles was confirmed by a transmission electron microscope (TEM). The transmission electron microscope used was JEOL JEM2010F, and an acceleration voltage of 200 kV was observed according to the following procedure. That is, the semiconductor ultrafine particles were placed in a sample bottle, and isopropyl alcohol (IPA) or toluene in an amount such that the particle concentration was in the range of 0.002 to 0.02 mol / liter was added and dispersed. This was scooped with a TEM observation microgrid, dried, and then set on a transmission electron microscope. The average particle diameter was measured by confirming the particles from the lattice image. First, the part where the particles adhered to the mesh was searched at a low magnification. At this time, the portion where a large amount of phosphor is attached is not suitable for measurement of the average particle diameter because the particles overlap in the direction of the electron beam. Further, the phosphor adhering to the Cu mesh portion of the microgrid is not suitable for observation of the average particle diameter because the lattice image cannot be observed. Therefore, the semiconductor ultrafine particles for measuring the average particle diameter were selected by selecting a portion having as little overlap as possible in the resin portion of the microgrid. Next, this portion is enlarged to about 1,000,000 times to confirm the lattice image.

このとき、蛍光体の周囲に合成時に使用した有機成分が多く残っている場合には格子像がぼやけてしまうため、平均粒子径を正しく測定することができない。このような場合には場所を変えて観察を行なうか、場合によっては合成時の有機成分の除去を繰り返し行なったサンプルを準備しなおして観察を行なった。
合成時の有機成分の除去は、沈殿させた蛍光体にクロロホルム、トルエンもしくはヘキサンを加えて超音波で分散させた後、ここにアルコール(例えばエタノール)を加えて、遠心分離機にかけることで行なうことができる。合成時の有機成分は上澄みのエタノールに溶解し、蛍光体は沈殿する。必要に応じてこの操作を繰り返した。このようにして合成時に使用した有機成分の付着の少ない半導体超微粒子を探し出した後、この部分を倍率4,000,000倍として格子像の写真撮影を行なった。このとき電子線を長く当て続けると半導体超微粒子は移動してしまうため、速やかに撮影を行なった。
At this time, when many organic components used at the time of synthesis remain around the phosphor, the lattice image is blurred, and thus the average particle diameter cannot be measured correctly. In such a case, observation was performed by changing the location, or in some cases, a sample was prepared by repeatedly removing organic components during synthesis, and observation was performed.
Removal of organic components at the time of synthesis is performed by adding chloroform, toluene or hexane to the precipitated phosphor and dispersing it with ultrasonic waves, and then adding alcohol (for example, ethanol) thereto and centrifuging it. be able to. The organic components at the time of synthesis are dissolved in the supernatant ethanol, and the phosphor is precipitated. This operation was repeated as necessary. Thus, after searching for semiconductor ultrafine particles with less organic component adhesion used during synthesis, a lattice image was photographed at a magnification of 4,000,000. At this time, if the electron beam was kept on for a long time, the semiconductor ultrafine particles moved, and thus the image was taken promptly.

蛍光体の平均粒子径は撮影した格子像200個の直径を元に以下の方法で処理することにより求めた。
測定した格子像の直径を、ヒストグラムを書いて統計的に計算することで、長さ平均直径を算出した。長さ平均直径の算出方法は、直径区に属する個数をカウントし、直径区の中心値と個数のそれぞれの積の和を、測定した格子像の個数の総数で割るという方法を用いた(平均粒子径の形状とその計算式、「セラミックの製造プロセス」p.11〜12、窯業協会編集委員会講座小委員会編)。このようにして計算した長さ平均直径を蛍光体の平均粒子径とみなした。
The average particle diameter of the phosphor was determined by processing according to the following method based on the diameter of 200 photographed lattice images.
The length average diameter was calculated by statistically calculating the diameter of the measured lattice image by writing a histogram. The length average diameter was calculated by counting the number belonging to the diameter section and dividing the sum of the product of the center value and the number of the diameter section by the total number of measured grid images (average Particle shape and calculation formula, “Ceramic manufacturing process” p.11-12, edited by ceramic industry association editorial committee lecture subcommittee). The length average diameter thus calculated was regarded as the average particle diameter of the phosphor.

(半導体超微粒子以外)
半導体超微粒子以外の波長変換物質の平均粒子径(0.1μm〜50μm)は、レーザー回折散乱法を用いて、測定した。すなわち、日機装(株)製のマイクロトラック(9320−X100)を用いて、測定を行った。分散媒には、2−プロパノールを用い、超音波ホモジナーザー(超音波出力:300〜400μA、照射時間6分)にて分散させた。
(Other than semiconductor ultrafine particles)
The average particle diameter (0.1 μm to 50 μm) of the wavelength converting substance other than the semiconductor ultrafine particles was measured using a laser diffraction scattering method. That is, the measurement was performed using a microtrack (9320-X100) manufactured by Nikkiso Co., Ltd. As a dispersion medium, 2-propanol was used and dispersed with an ultrasonic homogenizer (ultrasonic output: 300 to 400 μA, irradiation time 6 minutes).

以下、実施例をあげて本発明の発光装置を説明するが、本発明は以下の実施例に限定されるものではない。   Hereinafter, the light emitting device of the present invention will be described with reference to examples, but the present invention is not limited to the following examples.

図1の発光装置を作製した。まず、サファイアからなる発光素子基板上に窒化物半導体からなる発光素子を有機金属気相成長法にて形成した。
発光素子の構造としては発光素子基板上に、アンドープの窒化物半導体であるn型GaN層、Siドープのn型電極が形成されn型コンタクト層となるGaN層、アンドープの窒化物半導体であるn型GaN層、次に発光層を構成するバリア層となるGaN層、井戸層を構成するInGaN層、バリア層となるGaN層を1セットとしGaN層に挟まれたInGaN層を5層積層させた多重量子井戸構造とした。
この発光素子を、アルミナからなる基板上にフリップチップ実装法にて実装した。一方、発光素子2の周りに、アルミニウムからなる側面反射部材を設け、さらにこの側面反射部材の内周面に(Sr,Ca,Ba,Mg)10(PO46l2:Eu、BaMgAl1017:Eu,Mnを20質量%含有したシリコーン樹脂を塗布し、厚さ0.2mmの第一の波長変換層を作成した。
さらに、発光素子を覆うように半導体超微粒子CuGa0.5In0.52を(バンドギャップエネルギー:2.0eV)を0.5質量%分散したシリコーン樹脂をディスペンサーにて塗布し、厚さ5mmの第二の波長変換層を作成した。この第二の波長変換層の表面は直径10mmの円形である。なお、上記半導体超微粒子は、粒径2.5nmおよび3.5nmの粒子を同量混合した。
得られた発光装置の発光特性を評価した。その結果、演色性Ra85、発光効率60lm/Wと高い特性を示すことがわかった。演色性Ra及び発光効率は、蛍光測定システムMCPD−7000(大塚電子社製)により測定した。
The light emitting device of FIG. 1 was produced. First, a light emitting element made of a nitride semiconductor was formed on a light emitting element substrate made of sapphire by metal organic vapor phase epitaxy.
The structure of the light-emitting element is an n-type GaN layer that is an undoped nitride semiconductor on a light-emitting element substrate, a GaN layer that is an n-type contact layer formed with an Si-doped n-type electrode, and an n-type nitride semiconductor that is an undoped nitride semiconductor. 5 layers of InGaN layers sandwiched between GaN layers, each comprising a type GaN layer, a GaN layer that constitutes a light emitting layer, a InGaN layer that constitutes a well layer, and a GaN layer that constitutes a barrier layer A multiple quantum well structure was adopted.
This light emitting element was mounted on a substrate made of alumina by a flip chip mounting method. On the other hand, a side reflecting member made of aluminum is provided around the light emitting element 2, and (Sr, Ca, Ba, Mg) 10 (PO 4 ) 6 Cl 2 : Eu, BaMgAl 10 is provided on the inner peripheral surface of the side reflecting member. A silicone resin containing 20% by mass of O 17 : Eu, Mn was applied to form a first wavelength conversion layer having a thickness of 0.2 mm.
Further, a silicone resin in which 0.5% by mass of semiconductor ultrafine particles CuGa 0.5 In 0.5 S 2 (band gap energy: 2.0 eV) is dispersed is applied with a dispenser so as to cover the light emitting element, and a second 5 mm thick second resin is applied. A wavelength conversion layer was prepared. The surface of this second wavelength conversion layer is circular with a diameter of 10 mm. In addition, the said semiconductor ultrafine particle mixed the same amount of particles with a particle size of 2.5 nm and 3.5 nm.
The light emitting characteristics of the obtained light emitting device were evaluated. As a result, it was found that the color rendering property Ra85 and the luminous efficiency of 60 lm / W were high. The color rendering property Ra and the light emission efficiency were measured by a fluorescence measurement system MCPD-7000 (manufactured by Otsuka Electronics Co., Ltd.).

発光素子を覆う第二の波長変換層の表面中央部に対向反射板として直径7mmのアルミニウム板を載置した以外は、実施例1と同様にして発光装置を得た。
得られた発光装置の発光特性を実施例1と同様にして評価した。その結果、演色性Ra92、発光効率72lm/Wと非常に高い特性を示すことがわかった。
A light emitting device was obtained in the same manner as in Example 1 except that an aluminum plate having a diameter of 7 mm was placed as a counter reflecting plate at the center of the surface of the second wavelength conversion layer covering the light emitting element.
The light emitting characteristics of the obtained light emitting device were evaluated in the same manner as in Example 1. As a result, it was found that the color rendering property Ra92 and the luminous efficiency of 72 lm / W were very high.

実施例2において、前記側面反射部材よりも内方にアルミニウムからなる内周反射部材を、発光素子を取り囲むように設けた以外は、実施例2と同様にして発光装置を得た。このとき、内周反射部材は、図2に一点鎖線Aで示すように、その外周部が発光素子の端部とその端部の反対側の内周反射部材の内周面の上端を通る直線よりも側面反射部材側に位置している。
得られた発光装置の発光特性を実施例1と同様にして評価した。その結果、演色性Ra90、発光効率70lm/Wと非常に高い特性を示すことがわかった。
In Example 2, a light emitting device was obtained in the same manner as Example 2 except that an inner peripheral reflecting member made of aluminum was provided inward of the side reflecting member so as to surround the light emitting element. At this time, as shown by a one-dot chain line A in FIG. 2, the inner peripheral reflecting member is a straight line whose outer peripheral portion passes through the end of the light emitting element and the upper end of the inner peripheral surface of the inner peripheral reflecting member opposite to the end. It is located on the side reflecting member side.
The light emitting characteristics of the obtained light emitting device were evaluated in the same manner as in Example 1. As a result, it was found that the color rendering property Ra90 and the luminous efficiency of 70 lm / W were very high.

実施例3において、前記内周反射部材表面に蛍光物質を含有した第三の波長変換層を設けた以外は、実施例3と同様にして発光装置を得た。すなわち、内周反射部材の内周面に(Sr,Ca,Ba,Mg)10(PO46l2:Eu、BaMgAl1017:Eu,Mnを固形物換算で20質量%含有したシリコーン樹脂を塗布し、厚さ0.1mmの第三の波長変換層を作成した。
得られた発光装置の発光特性を実施例1と同様にして評価した。その結果、演色性Ra90、発光効率75lm/Wのランプ効率が得られた。内周反射面に波長変換層を設けることにより、装置サイズを大きくしなくても、発光効率を向上させることが出来た。
In Example 3, a light emitting device was obtained in the same manner as in Example 3 except that a third wavelength conversion layer containing a fluorescent material was provided on the inner peripheral reflecting member surface. That is, silicone containing 20% by mass of (Sr, Ca, Ba, Mg) 10 (PO 4 ) 6 Cl 2 : Eu, BaMgAl 10 O 17 : Eu, Mn on the inner peripheral surface of the inner peripheral reflecting member in terms of solid matter. Resin was applied to form a third wavelength conversion layer having a thickness of 0.1 mm.
The light emitting characteristics of the obtained light emitting device were evaluated in the same manner as in Example 1. As a result, a lamp efficiency of color rendering property Ra90 and luminous efficiency of 75 lm / W was obtained. By providing the wavelength conversion layer on the inner peripheral reflection surface, the luminous efficiency could be improved without increasing the device size.

本発明の光学装置の一実施形態を示す概略断面図である。It is a schematic sectional drawing which shows one Embodiment of the optical apparatus of this invention. 本発明の発光装置の他の実施形態を示す概略断面図である。It is a schematic sectional drawing which shows other embodiment of the light-emitting device of this invention. 本発明の発光装置のさらに他の実施形態を示す概略断面図である。It is a schematic sectional drawing which shows other embodiment of the light-emitting device of this invention. 従来の発光装置を示す概略断面図である。It is a schematic sectional drawing which shows the conventional light-emitting device.

符号の説明Explanation of symbols

1・・・基板
2・・・発光素子
3・・・側面反射部材
4・・・第一の波長変換層
5・・・第二の波長変換層
4a・・・第一の波長変換物質
4b・・・第一の透光部材
5a・・・第二の波長変換物質
5b・・・第二の透光部材
6・・・電極
8・・・対向反射部材
9・・・内周反射部材
DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Light emitting element 3 ... Side reflection member 4 ... First wavelength conversion layer 5 ... Second wavelength conversion layer 4a ... First wavelength conversion substance 4b .... First translucent member 5a ... second wavelength converting material 5b ... second translucent member 6 ... electrode 8 ... opposite reflecting member 9 ... inner peripheral reflecting member

Claims (16)

基板と、該基板上に載置された励起光を発する発光素子と、該発光素子の周囲に発光素子を取り囲むように設けられ前記励起光を所望の方向に反射する内壁面を備えた側面反射部材と、前記側面反射部材の内壁面に形成された第一の波長変換層と、前記発光素子から発する光が前記発光装置から射出するまでの経路に形成された第二の波長変換層とを具備していることを特徴とする発光装置。 Side-surface reflection provided with a substrate, a light-emitting element that emits excitation light mounted on the substrate, and an inner wall surface that surrounds the light-emitting element and surrounds the light-emitting element and reflects the excitation light in a desired direction A member, a first wavelength conversion layer formed on the inner wall surface of the side-surface reflection member, and a second wavelength conversion layer formed in a path until light emitted from the light emitting element is emitted from the light emitting device. A light emitting device comprising the light emitting device. 前記第一の波長変換層は、平均粒径が0.1〜50μmである第一の波長変換物質を透光部材に含有させて形成されていることを特徴とする請求項1に記載の発光装置。 2. The light emitting device according to claim 1, wherein the first wavelength conversion layer is formed by including a first wavelength conversion material having an average particle diameter of 0.1 to 50 μm in a translucent member. apparatus. 前記第二の波長変換層は、平均粒径が10nm以下の化合物半導体である第二の波長変換物質を透光部材に含有させて形成されていることを特徴とする請求項1または2に記載の発光装置。 The second wavelength conversion layer is formed by containing a second wavelength conversion material, which is a compound semiconductor having an average particle diameter of 10 nm or less, in a translucent member. Light-emitting device. 前記第一の波長変換層の厚みが、0.05〜0.5mmであることを特徴とする請求項1ないし3のいずれかに記載の発光装置。 The light emitting device according to any one of claims 1 to 3, wherein the first wavelength conversion layer has a thickness of 0.05 to 0.5 mm. 前記第二の波長変換層の厚みが0.1〜10mmであることを特徴とする請求項1ないし4のいずれかに記載の発光装置。 5. The light emitting device according to claim 1, wherein the second wavelength conversion layer has a thickness of 0.1 to 10 mm. 前記化合物半導体物質のバンドギャップエネルギーが、1.5〜2.5eVの範囲にあることを特徴とする請求項3に記載の発光装置。 The light emitting device according to claim 3, wherein a band gap energy of the compound semiconductor material is in a range of 1.5 to 2.5 eV. 前記化合物半導体が、周期律表第I−b族、第II族(ただし、Be、Cd、Hg、Raを除く)、第III 族(ただし、Tl、Ac系列元素を除く)、第IV族(ただし、Pb、Hfを除く)、第V族(ただし、AsとPa系列を除く)、第VI族(ただし、Se、Uを除く)に属する少なくとも2種類以上の元素からなる半導体組成物を有することを特徴とする請求項3または6に記載の発光装置。 The compound semiconductor is composed of Group Ib, Group II (excluding Be, Cd, Hg, Ra), Group III (excluding Tl, Ac series elements), Group IV (excluding Be, Cd, Hg, Ra). However, it has a semiconductor composition composed of at least two elements belonging to Group V (excluding As and Pa series), Group VI (excluding Se and U), excluding Pb and Hf) The light-emitting device according to claim 3 or 6. 前記第一の波長変換物質が、酸化物蛍光物質であることを特徴とする請求項2に記載の発光装置。 The light emitting device according to claim 2, wherein the first wavelength converting substance is an oxide fluorescent substance. 前記第一の波長変換層により変換された第一の出力光と、第二の波長変換層により変換された第二の出力光とが混合され、そのスペクトルが400〜900nmの白色光を発することを特徴とする請求項1ないし8のいずれかに記載の発光装置。 The first output light converted by the first wavelength conversion layer and the second output light converted by the second wavelength conversion layer are mixed to emit white light having a spectrum of 400 to 900 nm. The light-emitting device according to claim 1. 前記第一の波長変換層からの出力光のピーク波長が、400〜700nmであることを特徴とする請求項1ないし9のいずれかに記載の発光装置。 The light emitting device according to claim 1, wherein a peak wavelength of output light from the first wavelength conversion layer is 400 to 700 nm. 前記第二の波長変換物層からの出力光のピーク波長が、500〜900nmであることを特徴とする請求項1ないし10のいずれかに記載の発光装置。 11. The light emitting device according to claim 1, wherein a peak wavelength of output light from the second wavelength conversion layer is 500 to 900 nm. 前記発光素子が発する励起光の中心波長が450nm以下であることを特徴とする請求項1ないし11のいずれかに記載の発光装置。 The light emitting device according to any one of claims 1 to 11, wherein a central wavelength of excitation light emitted from the light emitting element is 450 nm or less. 前記第二の波長変換層の一部を覆い前記発光素子の励起光出射面に対向する光反射面を有する対向反射部材を具備していることを特徴とする請求項1ないし12のいずれかに記載の発光装置。 The counter reflection member which has a light reflection surface which covers a part of said 2nd wavelength conversion layer, and opposes the excitation light emission surface of the said light emitting element is comprised. The light-emitting device of description. 前記側面反射部材よりも内方に発光素子を取り囲むように内周反射部材を設けたことを特徴とする請求項1ないし13のいずれかに記載の発光装置。 The light-emitting device according to claim 1, wherein an inner peripheral reflection member is provided so as to surround the light-emitting element inward of the side surface reflection member. 前記内周反射部材の表面に第三の波長変換層を設けたことを特徴とする請求項14に記載の発光装置。 The light emitting device according to claim 14, wherein a third wavelength conversion layer is provided on a surface of the inner peripheral reflection member. 前記対向反射部材は、その外周部が発光素子の端部とその端部の反対側の内周反射部材の内周面の上端を通る直線よりも側面反射部材側に位置していることを特徴とする請求項13ないし15のいずれかに記載の発光装置。

The counter reflecting member has an outer peripheral portion positioned on the side reflecting member side with respect to a straight line passing through an end of the light emitting element and an upper end of the inner peripheral surface of the inner peripheral reflecting member on the opposite side of the end. The light-emitting device according to claim 13.

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