EP1114206A1 - Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings - Google Patents
Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatingsInfo
- Publication number
- EP1114206A1 EP1114206A1 EP99936607A EP99936607A EP1114206A1 EP 1114206 A1 EP1114206 A1 EP 1114206A1 EP 99936607 A EP99936607 A EP 99936607A EP 99936607 A EP99936607 A EP 99936607A EP 1114206 A1 EP1114206 A1 EP 1114206A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- zinc
- bath
- bath according
- amount
- coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011701 zinc Substances 0.000 title claims abstract description 71
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims abstract description 59
- 229910052725 zinc Inorganic materials 0.000 title claims abstract description 57
- 238000000576 coating method Methods 0.000 title claims abstract description 33
- 229910001297 Zn alloy Inorganic materials 0.000 title claims abstract description 24
- 239000000654 additive Substances 0.000 claims abstract description 34
- 229920000642 polymer Polymers 0.000 claims abstract description 32
- 230000008021 deposition Effects 0.000 claims abstract description 21
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 19
- -1 hydroxide ions Chemical class 0.000 claims abstract description 13
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 12
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 47
- 239000000203 mixture Substances 0.000 claims description 25
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 20
- 230000000996 additive effect Effects 0.000 claims description 18
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 17
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 14
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 10
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 10
- 239000011787 zinc oxide Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 239000011572 manganese Substances 0.000 claims description 8
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 7
- 239000007795 chemical reaction product Substances 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 7
- 239000002738 chelating agent Substances 0.000 claims description 6
- 229910017052 cobalt Inorganic materials 0.000 claims description 6
- 239000010941 cobalt Substances 0.000 claims description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 5
- 150000003934 aromatic aldehydes Chemical class 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000008139 complexing agent Substances 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 4
- SATCULPHIDQDRE-UHFFFAOYSA-N piperonal Chemical compound O=CC1=CC=C2OCOC2=C1 SATCULPHIDQDRE-UHFFFAOYSA-N 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 claims description 4
- 150000003464 sulfur compounds Chemical class 0.000 claims description 4
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 claims description 4
- WJUFSDZVCOTFON-UHFFFAOYSA-N veratraldehyde Chemical compound COC1=CC=C(C=O)C=C1OC WJUFSDZVCOTFON-UHFFFAOYSA-N 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 239000004902 Softening Agent Substances 0.000 claims description 3
- 150000001299 aldehydes Chemical class 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 claims description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 150000001414 amino alcohols Chemical class 0.000 claims description 2
- 150000004982 aromatic amines Chemical class 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 2
- 150000003944 halohydrins Chemical class 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 102000004169 proteins and genes Human genes 0.000 claims description 2
- 108090000623 proteins and genes Proteins 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 150000005846 sugar alcohols Polymers 0.000 claims description 2
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims 1
- BCXBKOQDEOJNRH-UHFFFAOYSA-N NOP(O)=O Chemical class NOP(O)=O BCXBKOQDEOJNRH-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- DKZBBWMURDFHNE-UHFFFAOYSA-N trans-coniferylaldehyde Natural products COC1=CC(C=CC=O)=CC=C1O DKZBBWMURDFHNE-UHFFFAOYSA-N 0.000 claims 1
- 235000001968 nicotinic acid Nutrition 0.000 abstract description 8
- 239000011664 nicotinic acid Substances 0.000 abstract description 8
- 239000003792 electrolyte Substances 0.000 description 24
- 238000009826 distribution Methods 0.000 description 20
- 238000000151 deposition Methods 0.000 description 17
- 239000000243 solution Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 13
- 239000007787 solid Substances 0.000 description 11
- 229920001577 copolymer Polymers 0.000 description 7
- RAHZWNYVWXNFOC-UHFFFAOYSA-N sulfur dioxide Inorganic materials O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 7
- MACMNSLOLFMQKL-UHFFFAOYSA-N 1-sulfanyltriazole Chemical compound SN1C=CN=N1 MACMNSLOLFMQKL-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000008399 tap water Substances 0.000 description 6
- 235000020679 tap water Nutrition 0.000 description 6
- AVWFAACIXBQMBF-UHFFFAOYSA-N 1-benzylpyridin-1-ium-3-carboxylate Chemical compound [O-]C(=O)C1=CC=C[N+](CC=2C=CC=CC=2)=C1 AVWFAACIXBQMBF-UHFFFAOYSA-N 0.000 description 5
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000013543 active substance Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000010791 quenching Methods 0.000 description 5
- 230000000171 quenching effect Effects 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- FCQPNTOQFPJCMF-UHFFFAOYSA-N 1,3-bis[3-(dimethylamino)propyl]urea Chemical compound CN(C)CCCNC(=O)NCCCN(C)C FCQPNTOQFPJCMF-UHFFFAOYSA-N 0.000 description 4
- YHRUOJUYPBUZOS-UHFFFAOYSA-N 1,3-dichloropropane Chemical compound ClCCCCl YHRUOJUYPBUZOS-UHFFFAOYSA-N 0.000 description 4
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000176 sodium gluconate Substances 0.000 description 4
- 235000012207 sodium gluconate Nutrition 0.000 description 4
- 229940005574 sodium gluconate Drugs 0.000 description 4
- 238000005496 tempering Methods 0.000 description 4
- PHCDZUPEIPGYOG-UHFFFAOYSA-N [Fe].[Co].[Zn] Chemical compound [Fe].[Co].[Zn] PHCDZUPEIPGYOG-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- KFZAUHNPPZCSCR-UHFFFAOYSA-N iron zinc Chemical compound [Fe].[Zn] KFZAUHNPPZCSCR-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 3
- KJDRSWPQXHESDQ-UHFFFAOYSA-N 1,4-dichlorobutane Chemical compound ClCCCCCl KJDRSWPQXHESDQ-UHFFFAOYSA-N 0.000 description 2
- LBKDGROORAKTLC-UHFFFAOYSA-N 1,5-dichloropentane Chemical compound ClCCCCCCl LBKDGROORAKTLC-UHFFFAOYSA-N 0.000 description 2
- OVISMSJCKCDOPU-UHFFFAOYSA-N 1,6-dichlorohexane Chemical compound ClCCCCCCCl OVISMSJCKCDOPU-UHFFFAOYSA-N 0.000 description 2
- DVDWDFLGEGWZFP-UHFFFAOYSA-N 1-[[4-[(3-carboxylatopyridin-1-ium-1-yl)methyl]phenyl]methyl]pyridin-1-ium-3-carboxylate Chemical compound [O-]C(=O)C1=CC=C[N+](CC=2C=CC(C[N+]=3C=C(C=CC=3)C([O-])=O)=CC=2)=C1 DVDWDFLGEGWZFP-UHFFFAOYSA-N 0.000 description 2
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 235000013877 carbamide Nutrition 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229960003512 nicotinic acid Drugs 0.000 description 2
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 2
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 2
- 235000012141 vanillin Nutrition 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- FPPBCGUXPMKUIM-UHFFFAOYSA-N 1,3-bis[3-(diethylamino)propyl]urea Chemical compound CCN(CC)CCCNC(=O)NCCCN(CC)CC FPPBCGUXPMKUIM-UHFFFAOYSA-N 0.000 description 1
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 1
- ZUSZPUNTECJHJZ-UHFFFAOYSA-N 2,3-dibromo-1,4-dimethylbenzene Chemical group CC1=CC=C(C)C(Br)=C1Br ZUSZPUNTECJHJZ-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- QJSFUOBKBXVTMN-UHFFFAOYSA-N C=C.P(O)(O)=O Chemical compound C=C.P(O)(O)=O QJSFUOBKBXVTMN-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021380 Manganese Chloride Inorganic materials 0.000 description 1
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- DUIOPKIIICUYRZ-NJFSPNSNSA-N aminourea Chemical group NN[14C](N)=O DUIOPKIIICUYRZ-NJFSPNSNSA-N 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000004532 chromating Methods 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910000358 iron sulfate Inorganic materials 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 235000002867 manganese chloride Nutrition 0.000 description 1
- 239000011565 manganese chloride Substances 0.000 description 1
- 229940099607 manganese chloride Drugs 0.000 description 1
- WJZHMLNIAZSFDO-UHFFFAOYSA-N manganese zinc Chemical compound [Mn].[Zn] WJZHMLNIAZSFDO-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 150000006636 nicotinic acid Chemical class 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- NRNFFDZCBYOZJY-UHFFFAOYSA-N p-quinodimethane Chemical group C=C1C=CC(=C)C=C1 NRNFFDZCBYOZJY-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000019351 sodium silicates Nutrition 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
Definitions
- Cyanide-free zinc electrolyte baths can be divided into two bath types, namely weakly acidic zinc electrolytes (containing zinc chloride or zinc sulfate) and alkaline zincate electrolytes.
- a uniformly shiny zinc layer is deposited from weakly acidic zinc baths, so that this process could quickly assert a strong market share.
- this method has the disadvantage that its current efficiency is always 100% over a wide current density range.
- the ratio of zinc layer thickness in the high current density range to zinc layer thickness in the low current density range is called the layer thickness distribution and should ideally be 1.
- Zinc and zinc alloy baths have to meet ever higher demands. Accordingly, a zinc layer on the object to be coated should have the same layer thickness everywhere and have a high gloss.
- a good layer thickness distribution can be achieved by lowering the current efficiency in the high current density range, while maintaining the current efficiency in the low current density range.
- Alkaline zinc plating baths are generally based on an aqueous solution of zinc ions in sodium or potassium hydroxide. The use of these baths makes it possible to deposit zinc layers with a high gloss (DE 25 25 264, US 3 884 774), but these zinc layers do not have a uniform layer thickness distribution.
- No. 5,435,898 describes a similar compound with the trade name Mirapol WT as an additive for zinc and zinc alloy electroplating baths, which is also said to greatly improve the layer thickness distribution.
- DE 195 09 713 describes a diallylammonium sulfur dioxide copolymer as an additive for zinc and zinc alloy plating baths, which is intended to give the zinc layer a uniform layer thickness.
- US Pat. No. 4,030,987 likewise describes a diallylammonium-sulfur dioxide copolymer as an additive for zinc and zinc alloy electroplating baths, which is intended to give the zinc layer a uniform layer thickness.
- the invention is therefore based on the object of overcoming the shortcomings of the prior art and, in particular, of providing an aqueous cyanide-free alkaline bath for the electrodeposition of zinc and zinc alloy coatings, with which coatings of zinc or zinc alloys can be obtained, in which even after prolonged use Storage there is no tendency to form flaking.
- the advantages of these baths with regard to a uniform layer thickness, a high gloss and the uniformity of the alloy components in the coating are to be maintained over a wide range of current densities. It has now been found that the addition of a special type of quaternary ammonium polymer to aqueous alkaline cyanide-free zinc baths improves the layer thickness distribution of the coatings obtained and reduces the blistering of the coatings.
- the invention therefore relates to an aqueous alkaline, cyano-free bath for the galvanic deposition of zinc or zinc alloy coatings on substrate surfaces, which is characterized in that it
- n is 2 or 3
- n is at least 2
- R x , R 2 , R 3 and R which may be the same or different, each represent methyl, ethyl, hydroxyethyl
- p is in the range of 3 to 12 and X "stands for Cl “ , Br “ and / or I "
- the soluble polymer of the general formula A contained in the bath according to the invention can be obtained by reacting N, N'-bis [3- (Dialkylamino) alkyl] ureas with 1, ⁇ -Dihaiogenalkanen he will keep.
- This reaction can be represented by the following reaction scheme, where the radicals R ! -R 4 , X and m and n are as defined above:
- the reaction of the starting products can be carried out, for example, in aqueous solution and at temperatures of 20 to 100 ° C.
- the polymers of formula A used according to the invention can be obtained in which the amino urea units are connected by hydrocarbon bridges.
- the degree of polymerization of these polymers is 2-80.
- the starting materials of the general formulas D and E are known per se.
- the diaminoureas of the formula D are described, for example, in JP 04-198160.
- the other starting products for the preparation of the polymers used according to the invention are l, ⁇ -dihaloalkanes of the general formula E. Individual examples of these l, ⁇ -dihaloalkanes are 1,3-dichloropropane, 1,4-dichlorobutane, 1,5-di- chloropentane, 1, 6-dichlorohexane.
- the polymer of formula A is contained in the bath according to the invention in an amount of 0.1 to 50 g / 1, preferably 0.25 to 10 g / 1.
- the degree of polymerization of polymer A plays no role in avoiding the formation of bubbles and improving the layer thickness distribution; only the required solubility of the polymer in the galvanic bath places an upper limit on the degree of polymerization.
- the bath contains as a further additive a quaternary derivative of a pyridine-3-carboxylic acid of the formula B and / or a quaternary derivative of a pyridine-3-carboxylic acid of the formula C.
- R 6 is a saturated or unsaturated, aliphatic, aromatic or araliphatic hydrocarbon radical having 1 to 12 carbon atoms.
- the amount of this additional additive in the bath according to the invention is 0.005 to 0.5 g / l, preferably 0.01 to 0.2 g / l.
- the quaternary derivatives of a pyridine-3-carboxylic acid of Formula 3 or C are used as further additives in the inventive bath are compounds known per se and at ⁇ play, in BS James, M Phil Thesis, Aston University. 1979 or DE 40 38 721. These derivatives are generally prepared by reacting nicotinic acid with aliphatic, aromatic or araliphatic hydrogen halides.
- the baths according to the invention can also contain further polymers, such as, for example, the polymers mentioned in the abovementioned publications.
- the cyanide-free zinc baths according to the invention correspond to the customary aqueous alkaline cyanide-free baths, such as those used for the deposition of zinc or Zinc alloy coatings can be used on various substrates. Standard baths of this type are described, for example, in DE 25 25 264 and US 3,884,774.
- the baths according to the invention contain the usual sources of zinc ions, such as zinc metal, zinc salts and zinc oxide, but preference is given to zinc oxide which is present as zincate in alkaline solution.
- the concentration of the zinc in the baths according to the invention is in the range of 0.2 to 20 g / 1, preferably 5 to 20 g / 1, which is customary for such baths.
- the baths contain a source of additional metal ions.
- additional metal ions cobalt, nickel, manganese and / or iron ions are preferred.
- Salts of the corresponding metals, preferably of the metals described above, optionally also in a mixture, are preferably used as sources for these additional metal ions.
- Suitable salts are nickel sulfate, iron sulfate, cobalt sulfate and manganese chloride.
- the concentration of the metal ions in the baths according to the invention can vary within a wide range and is preferably 0.01 to 100 g / l. Since a different alloy content is required for different alloy types, for example to improve corrosion protection, this concentration differs from metal ion to metal ion.
- the baths preferably contain zinc in an amount of 0.2 to 20 g / 1, cobalt in an amount of 10 to 120 mg / 1, nickel in an amount of 0.3 to 3 g / 1, manganese in an amount of 10 up to 100 g / 1 and iron in an amount of 10 to 120 mg / 1. These concentrations relate to the amount of metal ions contained in the bath. Corresponding conversions provide the amounts of the salts of these metals to be used in each case.
- baths according to the invention contain the above-mentioned additional metal ions, then it is expedient to add complexing agents which are matched to these additional metal ions in order to control the deposition potentials and to enable a joint reduction with the zinc ions present.
- Chelating agents are preferred as such complexing agents.
- suitable chelating agents are hydroxycarboxylates, such as sodium gluconate, amino alcohols, such as triethanolamine, polyamines, such as polyethylene diamine, aminocarboxyates, such as ⁇ DTA, amine phosphonates, such as amino-tris (ethylene phosphonic acid), and polyhydric alcohols, such as sorbitol or sucrose.
- the chelating agent can be contained individually or as a mixture in the 3-baths according to the invention, the amount of which is preferably in the range from 2 to 200 g / l.
- the baths according to the invention like the corresponding baths of the prior art - contain a hydroxide ion source, preferably an alkali metal hydroxide.
- a hydroxide ion source preferably an alkali metal hydroxide.
- Sodium hydroxide is usually used in a concentration of 80 to 250 g / l; however, other alkali and alkaline earth metal hydroxides and mixtures thereof are also suitable for use in the bath according to the invention. So show by using e.g. Potassium hydroxide increases the gloss of the zinc layer.
- the baths according to the invention can contain known levelers, such as 3-mercapto-1,2,4,4-triazole and / or thiourea, thiourea being preferred.
- concentration of the leveler is the usual concentration of zinc baths and is, for example, 0.01 to 0.50 g / 1.
- Other additives for the baths according to the invention are aromatic aldehydes or their bisulfite adducts.
- Preferred aromatic aldehydes are selected from the group 4-hydroxybenzaldehyde, 4-hydroxy-3-methoxybenzaldehyde (vanillin), 3, 4-dimethoxybenzaldehyde, 3, 4-methylenedioxybenzaldehyde, 2-hydroxybenzaldehyde and 4-hydroxybenzaldehyde or mixtures thereof.
- These additives the concentration of which is in the range from 0.005 to 1.0 g / 1, preferably from 0.01 to 0.50 g / 1, act in a manner known per se as brighteners.
- a particularly preferred example of such a brightener is vanillin.
- the bath according to the invention can also act as a brightener, such as substances selected from the group consisting of sulfur compounds, aldehydes, ketones, amines, polyvinyl alcohol, polyvinyl pyrrolidone, proteins or reaction products of halohydrins with aliphatic or aromatic amines, polyamines or heterocyclic nitrogen compounds and mixtures thereof.
- a brightener such as substances selected from the group consisting of sulfur compounds, aldehydes, ketones, amines, polyvinyl alcohol, polyvinyl pyrrolidone, proteins or reaction products of halohydrins with aliphatic or aromatic amines, polyamines or heterocyclic nitrogen compounds and mixtures thereof.
- the baths according to the invention can also contain water-softening agents, since such additives reduce the sensitivity of the bath according to the invention to foreign metal ions, in particular calcium and magnesium from tap water.
- water softening agents are EDTA, sodium silicates and tartaric acid.
- conventional conductive substrates made of metal can be provided with a coating of zinc or a zinc alloy.
- Another object of the invention is therefore a method for the galvanic deposition of zinc coatings or zinc alloy coatings on conventional substrates, which is characterized in that a bath with the above composition is used as the bath.
- the coatings are preferably deposited at a current density in the range from 0.01 to 10 A / dm and at a temperature in the range from 15 to 45 ° C.
- the method according to the invention can be carried out, for example, as a drum electroplating process and for deposition on larger workpieces as a rack electroplating process.
- Anodes are used that can be soluble, such as zinc anodes, which also serve as a source of zinc ions, so that the zinc deposited on the cathode is recovered by dissolving zinc at the anode.
- insoluble anodes such as, for example, iron anodes, can also be used, the zinc ions extracted from the electrolyte having to be added again in another way, for example using a zinc dissolving container.
- the process according to the invention can also be operated with air blowing in, with movement of goods or without movement, without this resulting in any disadvantages for the coatings obtained.
- Trilon D trisodium salt of hydroxyethylethylenediaminetriacetic acid; from BASF, 40% solution
- a coated Zn anode serves as the anode. It works with strong air injection (1 1 / min), which flows out of an L-shaped plastic tube with 6 small holes (3 on each side) below the inserted cathode.
- the cathode sheet (18.5 cm x 5 cm) is bent at the lower end and coated at 2.8 A for 35 min.
- the bath should have a temperature of 20 ° C, as bubbles occur especially at low temperatures.
- the sheet is rinsed off, lightened for 10 s in 0.3% by volume of HNO 3 , rinsed again and dried under compressed air. Then the sheet is carefully bent straight until it takes on an elongated shape and stored at room temperature. It must be checked daily for blisters.
- the cathode sheet is coated at 1A for 15 minutes.
- the bath should have a temperature of 28 ° C.
- the sheet is rinsed off, lightened for 10 s in 0.3% by volume of HNO 3 , rinsed again and dried under compressed air.
- the layer thickness is measured at two points 3 cm from the bottom
- the layer thickness distribution corresponds to the ratio of the measured values for the layer thickness at high (hcd) and low current density (icd).
- a bath with the following composition is used:
- the layer thickness measurement is carried out at two points 3 cm from the lower edge and 2.5 cm from the right and left side edge at high (2.8 A / dm 2 ) and low current density (0.5 A / dm).
- XRF is used to measure at four points at the respective position in order to keep the measurement error as low as possible.
- the layer thickness distribution corresponds to the ratio of the measured values for the layer thickness at high (hcd) and low current density (Icd).
- Trilon D trisodium salt of hydroxyethylethylenediaminetriacetic acid; from BASF, 40% solution
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc layer.
- the electrolyte had the following composition: 10 g / 1 ZnO 120 g / 1 KOH
- a steel sheet (5 cm x 5 cm) was deposited at 2 A / dm and 30 ° C for 30 minutes.
- the steel sheet was rinsed and chromated in a commercially available blue chromating (Corrotriblue, Atotech).
- the chromated sheet had a standard commercially available.
- the zinc layer showed no tendency to form bubbles, even tempering in a circulating air cabinet at 220 ° C for 30 minutes and subsequent quenching in tap water at room temperature did not lead to flaking.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc layer.
- the electrolyte had the following composition:
- the Hull cell sheet was rinsed and chromatized in a commercially available yellow chromation (Tridur Yellow Liquid, Atot ⁇ ch).
- the chromated sheet had a slight iridescence and standard commercially available.
- the layer thickness distribution was measured according to the test described above, it was 1.30.
- the zinc layer showed no signs of blistering, even after 30 minutes in the circulating air cabinet at 220 ° C. and subsequent quenching in tap water from room temperature.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc layer.
- the electrolyte had the following composition:
- Steel screws were galvanized in a drum with a current density of 0.1 - 1 A / dm and room temperature.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc-nickel layer.
- the electrolyte had the following composition:
- a steel sheet (5 cm x 5 cm) was deposited at 3 A / dm 2 and 30 ° C for 30 minutes.
- a uniform, shiny zinc-nickel layer was deposited.
- the zinc-nickel layer showed no signs of blistering, even after 30 minutes of tempering in a circulating air cabinet at 220 ° C. and subsequent quenching in tap water at room temperature.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc-iron layer.
- the electrolyte had the following composition:
- a steel sheet (5 cm x 5 cm) was deposited at 2 A / dm "and room temperature for 30 minutes. A uniform, shiny zinc-iron-cobalt layer was deposited.
- the zinc-iron-cobalt layer showed no sign of blistering, even after 30 minutes of tempering in a circulating air cabinet at 220 ° C. and subsequent quenching in tap water at room temperature.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc-manganese layer.
- the electrolyte had the following composition:
- a Hullzellbl ⁇ ch was deposited at 1 ampere and room temperature for 15 minutes.
- the Hull cell sheet was rinsed and lightened in 0.3 vol% HN0 3 for 10 s.
- the layer thickness distribution was measured according to the test described above; it was 1.41.
- the manganese incorporation was measured with XRF at the same positions at which the layer thickness was also measured. at 60 mg / 1 iron (as FeSC 4 • 7 H 2 0) 25 g / 1 sodium gluconate
- a Hull cell sheet was deposited at 1 amp and room temperature for 15 minutes.
- the Hull cell sheet was rinsed and chromated in a commercially available black chromation for zinc-iron layers (Tridur Schwarz Liquid ZnFe, Atot ⁇ ch).
- the chromated sheet had a very good black color.
- the layer thickness distribution was measured according to the test described above, it was 1.50.
- the zinc-iron layer showed no signs of blistering, not even after 30 minutes' tempering in a circulating air cabinet at 220 ° C. and subsequent quenching in tap water at room temperature.
- aqueous electrolyte was produced which is suitable for the galvanic deposition of a zinc-iron-cobalt layer.
- the electrolyte had the following composition:
- a bath with the following composition is used:
- the layer thickness is measured at two points 3 cm from the lower edge and 2.5 cm from the right and left side edge at high (2.8 A / dm " ) and low current density (0.5 A / dm). Measurements are also taken XRF at four positions at the respective position in order to keep the measurement error as low as possible
- the layer thickness distribution corresponds to the ratio of the measured values for the layer thickness at higher (hcd) and lower current density (icd).
- a bath with the following composition is used:
- A.l's anode is a coated Zn anode. It will be at strong air injection (1 1 / min) worked, which flows out of an L-shaped plastic tube with 6 ki ⁇ in ⁇ n holes (3 on each side) below the inserted cathode.
- the cathode sheet (18.5 cm x 5 cm) is bent at the lower end and coated at 2.8 A for 35 min.
- the bath should have a temperature of 20 ° C, since bubbles occur especially at low temperatures.
- the sheet is rinsed off, lightened for 10 s in 0.3% by volume of HNO 3 , rinsed again and dried under compressed air. Thereafter, the sheet is carefully straightened until it assumes an elongated shape and stored at room temperature. It must be examined daily for blisters.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Pyridine Compounds (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19840019A DE19840019C1 (en) | 1998-09-02 | 1998-09-02 | Aqueous alkaline cyanide-free bath for the electrodeposition of zinc or zinc alloy coatings and method |
| DE19840019 | 1998-09-02 | ||
| PCT/EP1999/005318 WO2000014305A1 (en) | 1998-09-02 | 1999-07-26 | Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1114206A1 true EP1114206A1 (en) | 2001-07-11 |
| EP1114206B1 EP1114206B1 (en) | 2003-02-26 |
Family
ID=7879582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99936607A Expired - Lifetime EP1114206B1 (en) | 1998-09-02 | 1999-07-26 | Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6652728B1 (en) |
| EP (1) | EP1114206B1 (en) |
| JP (1) | JP4263363B2 (en) |
| AT (1) | ATE233329T1 (en) |
| CA (1) | CA2342219C (en) |
| DE (2) | DE19840019C1 (en) |
| ES (1) | ES2193728T3 (en) |
| PT (1) | PT1114206E (en) |
| WO (1) | WO2000014305A1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LT5481B (en) | 2006-07-11 | 2008-03-26 | Chemijos Institutas | Sarminis cinko-kobalto lydinio dangu nusodinimo elektrolitas |
| EP2096193A1 (en) | 2008-02-21 | 2009-09-02 | Atotech Deutschland Gmbh | Process for the preparation of corrosion resistant zinc and zinc-nickel plated linear or complex shaped parts |
| CN102171386A (en) * | 2008-10-17 | 2011-08-31 | 麦克德米德股份有限公司 | Zinc alloy electroplating baths and processes |
| US9322107B2 (en) | 2009-09-08 | 2016-04-26 | Atotech Deutschland Gmbh | Polymers having terminal amino groups and use thereof as additives for zinc and zinc alloy electrodeposition baths |
Families Citing this family (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5005849B2 (en) * | 2000-01-31 | 2012-08-22 | ディップソール株式会社 | Alkaline zinc and zinc alloy plating bath |
| DE10026956A1 (en) * | 2000-05-30 | 2001-12-13 | Walter Hillebrand Galvanotechn | Zinc alloy bath |
| GB0017741D0 (en) * | 2000-07-20 | 2000-09-06 | Macdermid Canning Plc | Zinc and zinc alloy electroplating additives and electroplating methods |
| JP2003049282A (en) * | 2001-08-06 | 2003-02-21 | Hitachi Ltd | In-vehicle electrical components, electric machines and their manufacturing methods |
| US6790265B2 (en) * | 2002-10-07 | 2004-09-14 | Atotech Deutschland Gmbh | Aqueous alkaline zincate solutions and methods |
| US6830674B2 (en) * | 2002-11-05 | 2004-12-14 | Columbia Chemical Corporation | Brightener additive and bath for alkaline cyanide-free zinc electroplating |
| US8377283B2 (en) * | 2002-11-25 | 2013-02-19 | Coventya, Inc. | Zinc and zinc-alloy electroplating |
| US20050133376A1 (en) * | 2003-12-19 | 2005-06-23 | Opaskar Vincent C. | Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom |
| US7442286B2 (en) | 2004-02-26 | 2008-10-28 | Atotech Deutschland Gmbh | Articles with electroplated zinc-nickel ternary and higher alloys, electroplating baths, processes and systems for electroplating such alloys |
| US7964083B2 (en) * | 2004-03-04 | 2011-06-21 | Taskem, Inc. | Polyamine brightening agent |
| CZ300264B6 (en) * | 2004-08-02 | 2009-04-01 | Atotech Cz, A.S. | Nitrogenous polymeric additive for electrolytic deposition of zinc and zinc alloys, process for its preparation and its use |
| DE102005013780A1 (en) | 2005-03-22 | 2006-09-28 | Basf Ag | Use of cationic polycondensation products as color-fixing and / or color-transfer-inhibiting additive to detergents and laundry aftertreatment agents |
| ATE429528T1 (en) * | 2005-04-26 | 2009-05-15 | Atotech Deutschland Gmbh | ALKALINE GALVANIC BATH WITH A FILTRATION MEMBRANE |
| CZ2005456A3 (en) * | 2005-07-14 | 2007-01-31 | Atotech Deutschland Gmbh | Nitrogenous polymeric ingredient for electrolytic deposition of zinc and zinc alloys, process for its preparation and use thereof |
| DE102005040964A1 (en) * | 2005-08-30 | 2007-03-01 | Dr. M. Kampschulte Gmbh & Co. Kg | Matt zinc coatings with a low level of surface roughness, for technical or decorative applications, made by using acid or alkaline electrolytes containing special delustering agents |
| DE102005049789A1 (en) * | 2005-10-18 | 2007-04-19 | Basf Ag | Aqueous, alkylic, cyanide-free bath for the galvanic deposition of zinc and zinc alloy coatings |
| DE102005060030A1 (en) | 2005-12-15 | 2007-06-21 | Coventya Gmbh | New polymer with at least a partially cross-linked polymer main chains obtained from amine or methylene repeat units useful as an additive for the galvanic separation of metals and/or metal alloys |
| EP1870495A1 (en) * | 2006-06-21 | 2007-12-26 | Atotech Deutschland Gmbh | Aqueous alkaline, cyanide-free, bath for the galvanic deposition of Zinc and Zinc alloy layers |
| US8691346B2 (en) * | 2008-05-09 | 2014-04-08 | Birchwood Laboratories, Inc. | Methods and compositions for coating aluminum substrates |
| CN101382483B (en) * | 2008-08-22 | 2010-12-29 | 宏正(福建)化学品有限公司 | Quantitative test method for concentration of additive in alkaline cyanide-free galvanizing plating solution |
| EP2175048A1 (en) | 2008-10-13 | 2010-04-14 | Atotech Deutschland Gmbh | Metal plating composition for deposition of tin-zinc alloys onto a substrate |
| JP4849186B2 (en) * | 2009-10-28 | 2012-01-11 | Jfeスチール株式会社 | Hot pressed member and method for manufacturing the same |
| JP5630692B2 (en) * | 2010-07-20 | 2014-11-26 | 日本表面化学株式会社 | Zinc-iron alloy plating solution |
| EP2489762B1 (en) * | 2010-09-09 | 2014-12-17 | Yuken Industry Co., Ltd. | Additive for zinc plating baths and non-cyanide alkaline zinc plating baths |
| JP5551094B2 (en) * | 2011-01-31 | 2014-07-16 | ディップソール株式会社 | Alkaline zinc and zinc alloy plating bath |
| EP2489763A1 (en) | 2011-02-15 | 2012-08-22 | Atotech Deutschland GmbH | Zinc-iron alloy layer material |
| CN105908226B (en) | 2011-06-07 | 2018-07-17 | 杰富意钢铁株式会社 | Hot pressing steel plate |
| JP5747359B2 (en) * | 2012-10-09 | 2015-07-15 | ユケン工業株式会社 | Zincate-type zinc-based plating bath, additive for zincate-type zinc-based plating bath, and method for producing zinc-based plated member |
| IN2015DN02108A (en) | 2012-10-31 | 2015-08-14 | Jfe Steel Corp | |
| EP2784189A1 (en) | 2013-03-28 | 2014-10-01 | Coventya SAS | Electroplating bath for zinc-iron alloys, method for depositing zinc-iron alloy on a device and such a device |
| EP2801640A1 (en) | 2013-05-08 | 2014-11-12 | ATOTECH Deutschland GmbH | Galvanic nickel or nickel alloy electroplating bath for depositing a semi-bright nickel or nickel alloy |
| CN103320821B (en) * | 2013-07-12 | 2016-08-10 | 贵阳华科电镀有限公司 | A kind of Alkaline Zinc Cobalt Alloy Plating liquid |
| CN105683250B (en) * | 2013-11-06 | 2019-04-12 | 罗门哈斯电子材料有限责任公司 | Nitrogen-containing polymers as levelers |
| CN103952733B (en) * | 2013-12-23 | 2017-06-20 | 韶关美妥维志化工有限公司 | For carrier brightener precursor and carrier brightener and electroplate liquid in alkaline zinc plating or Zinc alloy electroplating liquid |
| WO2016001317A1 (en) | 2014-07-04 | 2016-01-07 | Basf Se | Additive for alkaline zinc plating |
| US10718060B2 (en) | 2015-06-25 | 2020-07-21 | Basf Se | Additive for alkaline zinc plating |
| CN109642337B (en) * | 2016-05-24 | 2021-07-13 | 科文特亚股份有限公司 | Ternary zinc-nickel-iron alloys and alkaline electrolytes for electroplating such alloys |
| JP7002548B2 (en) * | 2016-12-22 | 2022-01-20 | カール・フロイデンベルク・カー・ゲー | Aqueous alkaline electrolyte for precipitating a zinc-containing film on the surface of metal pieces |
| CN107513733A (en) * | 2017-09-08 | 2017-12-26 | 湖北吉和昌化工科技有限公司 | A kind of zinc-plated complexant of new non-cyanide alkali |
| US11661666B2 (en) * | 2019-10-10 | 2023-05-30 | The Boeing Company | Electrodeposited zinc and iron coatings for corrosion resistance |
| KR102173164B1 (en) * | 2020-05-20 | 2020-11-02 | 주식회사 지에스켐텍 | Mixed brighteners for zincate plating solution and Zincate plating solution containing the same |
| CN111733433A (en) * | 2020-06-15 | 2020-10-02 | 武汉钢铁有限公司 | Alkaline electro-galvanized iron alloy plating solution additive for low-iron-content plating layer and application thereof |
| CN121204749A (en) * | 2025-11-28 | 2025-12-26 | 山东力净环保科技有限公司 | A method for preparing zinc electrodes in an alkaline system with multi-stage current-interface synergistic regulation |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3884774A (en) * | 1973-02-01 | 1975-05-20 | Lea Ronal Inc | Electrolytic deposition of zinc |
| JPS51103039A (en) * | 1975-03-08 | 1976-09-11 | Japan Metarufuinitsushingu Kan | |
| DE2525264C2 (en) * | 1975-06-04 | 1984-02-16 | Schering AG, 1000 Berlin und 4709 Bergkamen | Alkaline, cyanide-free zinc bath and process for the electrodeposition of zinc coatings using this bath |
| EP0037634A1 (en) * | 1980-02-28 | 1981-10-14 | Albright & Wilson Limited | Zinc plating baths and additives therefor |
| US4889602B1 (en) * | 1986-04-14 | 1995-11-14 | Dipsol Chem | Electroplating bath and method for forming zinc-nickel alloy coating |
| US4717458A (en) * | 1986-10-20 | 1988-01-05 | Omi International Corporation | Zinc and zinc alloy electrolyte and process |
| JPH04198160A (en) | 1990-11-28 | 1992-07-17 | Aibaitsu Kk | New carbodiimide derivative and its production |
| DE4038721A1 (en) * | 1990-12-05 | 1992-06-11 | Bayer Ag | MEANS OF THE PROTECTION OF PLANTS AGAINST MICRO-ORGANISMS |
| US5405523A (en) * | 1993-12-15 | 1995-04-11 | Taskem Inc. | Zinc alloy plating with quaternary ammonium polymer |
| US5435898A (en) * | 1994-10-25 | 1995-07-25 | Enthone-Omi Inc. | Alkaline zinc and zinc alloy electroplating baths and processes |
| DE19509713C1 (en) * | 1995-03-10 | 1996-08-22 | Atotech Deutschland Gmbh | Aq. alkaline cyanide free bright zinc@ or alloy electroplating bath |
-
1998
- 1998-09-02 DE DE19840019A patent/DE19840019C1/en not_active Expired - Fee Related
-
1999
- 1999-07-26 JP JP2000569041A patent/JP4263363B2/en not_active Expired - Lifetime
- 1999-07-26 PT PT99936607T patent/PT1114206E/en unknown
- 1999-07-26 ES ES99936607T patent/ES2193728T3/en not_active Expired - Lifetime
- 1999-07-26 EP EP99936607A patent/EP1114206B1/en not_active Expired - Lifetime
- 1999-07-26 AT AT99936607T patent/ATE233329T1/en active
- 1999-07-26 WO PCT/EP1999/005318 patent/WO2000014305A1/en not_active Ceased
- 1999-07-26 CA CA002342219A patent/CA2342219C/en not_active Expired - Fee Related
- 1999-07-26 US US09/786,242 patent/US6652728B1/en not_active Expired - Lifetime
- 1999-07-26 DE DE59904390T patent/DE59904390D1/en not_active Expired - Lifetime
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0014305A1 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| LT5481B (en) | 2006-07-11 | 2008-03-26 | Chemijos Institutas | Sarminis cinko-kobalto lydinio dangu nusodinimo elektrolitas |
| EP2096193A1 (en) | 2008-02-21 | 2009-09-02 | Atotech Deutschland Gmbh | Process for the preparation of corrosion resistant zinc and zinc-nickel plated linear or complex shaped parts |
| CN102171386A (en) * | 2008-10-17 | 2011-08-31 | 麦克德米德股份有限公司 | Zinc alloy electroplating baths and processes |
| CN102171386B (en) * | 2008-10-17 | 2013-11-06 | 麦克德米德股份有限公司 | Zinc alloy electroplating baths and processes |
| US9322107B2 (en) | 2009-09-08 | 2016-04-26 | Atotech Deutschland Gmbh | Polymers having terminal amino groups and use thereof as additives for zinc and zinc alloy electrodeposition baths |
Also Published As
| Publication number | Publication date |
|---|---|
| DE19840019C1 (en) | 2000-03-16 |
| JP2002524662A (en) | 2002-08-06 |
| DE59904390D1 (en) | 2003-04-03 |
| WO2000014305A9 (en) | 2000-08-24 |
| CA2342219A1 (en) | 2000-03-16 |
| PT1114206E (en) | 2003-07-31 |
| ES2193728T3 (en) | 2003-11-01 |
| JP4263363B2 (en) | 2009-05-13 |
| ATE233329T1 (en) | 2003-03-15 |
| WO2000014305A1 (en) | 2000-03-16 |
| CA2342219C (en) | 2008-09-23 |
| EP1114206B1 (en) | 2003-02-26 |
| US6652728B1 (en) | 2003-11-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1114206B1 (en) | Cyanide-free aqueous alkaline bath used for the galvanic application of zinc or zinc-alloy coatings | |
| EP2292679B1 (en) | Polymers with amino end groups and their use as additives for galvanic zinc and zinc alloy baths | |
| WO2007147605A2 (en) | Tripyridinium compounds used as additives in aqueous alkaline baths, devoid of cyanide, for the deposition of electroplated zinc and zinc alloy coatings | |
| DE19538419C2 (en) | Use of a bath-soluble polymer in an aqueous alkaline bath for the galvanic deposition of zinc and zinc alloys | |
| DE2830572C2 (en) | Aqueous bath for the galvanic deposition of shiny metal coatings and process for the galvanic deposition of shiny nickel-iron coatings | |
| EP2283170B1 (en) | Pd and pd-ni electrolyte baths | |
| DE4105272C2 (en) | ||
| EP2130948B1 (en) | Pyrophosphate-containing bath for cyanide-free electroplating of copper- tin alloys | |
| DE60010591T2 (en) | ZINC AND ZINC ALLOY ELECTROPLATING ADDITIVES AND ELECTROPLATING METHOD | |
| DE2525264C2 (en) | Alkaline, cyanide-free zinc bath and process for the electrodeposition of zinc coatings using this bath | |
| EP2103717A1 (en) | Pyrophosphate-based bath for depositing tin alloy layers | |
| DE102005011708B3 (en) | A polyvinylammonium compound and process for the production thereof, and an acidic solution containing the compound and a process for electrolytically depositing a copper precipitate | |
| DE3231054A1 (en) | AQUEOUS ELECTROLYTE BATH FOR CATHODICALLY DEPOSITING ZINC-NICKEL ALLOYS AND ITS USE | |
| DE3317620A1 (en) | AQUEOUS BATH FOR GALVANIC DEPOSITION OF A ZINC ALLOY | |
| DE602004011520T2 (en) | AQUEOUS, SOFT SOLUTION AND METHOD FOR THE ELECTROLYTIC DECOMPOSITION OF COPPER COATS AND THE USE OF THE SOLUTION | |
| DE2352970A1 (en) | CORROSION-RESISTANT METAL COATINGS CONTAINING ELECTRICALLY DEPOSITED NICKEL AND MICROPOROUS CHROME | |
| EP3415665B1 (en) | Method for the galvanic deposition of zinc-nickel alloy layers from an alkaline zinc-nickel alloy bath with reduced degradation of additives | |
| DE2740592C2 (en) | Galvanic zinc bath | |
| DE2948261A1 (en) | ACID ZINC GALVANIZING BATH AND METHOD FOR ELECTROLYTICALLY DEPOSITING GLOSSY ZINCING COATS ON A SUBSTRATE | |
| DE3121016A1 (en) | Polymeric additive for zinc plating baths based on polyalkyleneimines, process for producing and using said additive, and aqueous alkaline, cyanide-free zinc bath containing said additive | |
| DE2445359A1 (en) | CYANIDE-FREE, SHINY ZINC COATS CREATING GALVANIZATION BATH | |
| DE102005049789A1 (en) | Aqueous, alkylic, cyanide-free bath for the galvanic deposition of zinc and zinc alloy coatings | |
| DE19509713C1 (en) | Aq. alkaline cyanide free bright zinc@ or alloy electroplating bath | |
| EP1373336A2 (en) | Use of polyolefins with alkaline, aromatic substituents as auxiliaries in the electrolytic deposition of metal layers | |
| DE2023304B2 (en) | CYANIDE-FREE GALVANIC BAEDER |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 20010212 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
| GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20030226 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20030226 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: NV Representative=s name: SERVOPATENT GMBH Ref country code: CH Ref legal event code: EP |
|
| GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20030226 |
|
| REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: GERMAN |
|
| REF | Corresponds to: |
Ref document number: 59904390 Country of ref document: DE Date of ref document: 20030403 Kind code of ref document: P |
|
| REG | Reference to a national code |
Ref country code: SE Ref legal event code: TRGR |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20030526 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030726 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20030726 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030731 Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20030731 |
|
| ET | Fr: translation filed | ||
| REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2193728 Country of ref document: ES Kind code of ref document: T3 |
|
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| BERE | Be: lapsed |
Owner name: *ATOTECH DEUTSCHLAND G.M.B.H. Effective date: 20030731 |
|
| 26N | No opposition filed |
Effective date: 20031127 |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PFA Owner name: ATOTECH DEUTSCHLAND GMBH Free format text: ATOTECH DEUTSCHLAND GMBH#ERASMUSSTRASSE 20#10553 BERLIN (DE) -TRANSFER TO- ATOTECH DEUTSCHLAND GMBH#ERASMUSSTRASSE 20#10553 BERLIN (DE) |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 20110725 Year of fee payment: 13 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20120719 Year of fee payment: 14 Ref country code: IE Payment date: 20120719 Year of fee payment: 14 Ref country code: SE Payment date: 20120725 Year of fee payment: 14 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20120719 Year of fee payment: 14 Ref country code: PT Payment date: 20120127 Year of fee payment: 14 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20130711 Year of fee payment: 15 |
|
| REG | Reference to a national code |
Ref country code: PT Ref legal event code: MM4A Free format text: LAPSE DUE TO NON-PAYMENT OF FEES Effective date: 20140127 |
|
| REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20140201 |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| REG | Reference to a national code |
Ref country code: SE Ref legal event code: EUG |
|
| GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20130726 |
|
| REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130731 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130726 Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140201 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130731 Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130727 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140127 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130726 |
|
| REG | Reference to a national code |
Ref country code: AT Ref legal event code: MM01 Ref document number: 233329 Country of ref document: AT Kind code of ref document: T Effective date: 20140726 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20140726 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 17 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 18 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 19 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 20 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20180723 Year of fee payment: 20 Ref country code: ES Payment date: 20180829 Year of fee payment: 20 Ref country code: IT Payment date: 20180724 Year of fee payment: 20 Ref country code: FR Payment date: 20180725 Year of fee payment: 20 |
|
| REG | Reference to a national code |
Ref country code: DE Ref legal event code: R071 Ref document number: 59904390 Country of ref document: DE |
|
| REG | Reference to a national code |
Ref country code: ES Ref legal event code: FD2A Effective date: 20201110 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION Effective date: 20190727 |