CN205542905U - Ultraviolet organic light emitting device - Google Patents
Ultraviolet organic light emitting device Download PDFInfo
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Abstract
本实用新型公开了一种紫外有机发光器件。所述器件包括衬底层、阳极层、空穴注入层、空穴传输层、发光层、电子传输层、电子注入层和反射金属阴极层,电子注入层为厚度是1.5nm‑6nm的LiF;衬底层、阳极层、空穴注入层、空穴传输层、发光层、电子传输层、电子注入层、反射金属阴极层顺序叠接为一体。本实用新型利用厚绝缘层作为电子注入层,通过减少电子的注入,提高发光层中电子‑空穴的平衡性,因而在达到同等数量的电子‑空穴对数目时只需要更低的电流密度,增加了电子与空穴在发光层中复合的概率,产生高效率的近紫外光发射,提高了紫外OLED器件的发光效率和辐照度。
The utility model discloses an ultraviolet organic light-emitting device. The device comprises a substrate layer, an anode layer, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer and a reflective metal cathode layer, and the electron injection layer is LiF with a thickness of 1.5nm-6nm; The bottom layer, the anode layer, the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, the electron injection layer, and the reflective metal cathode layer are sequentially stacked as one. The utility model uses a thick insulating layer as the electron injection layer, and improves the balance of electron-holes in the light-emitting layer by reducing the injection of electrons, so that only a lower current density is required when the same number of electron-hole pairs is reached. , increasing the probability of recombination of electrons and holes in the light-emitting layer, resulting in high-efficiency near-ultraviolet light emission, and improving the luminous efficiency and irradiance of ultraviolet OLED devices.
Description
技术领域technical field
本实用新型属于半导体器件技术领域,具体涉及一种紫外有机发光器件。The utility model belongs to the technical field of semiconductor devices, in particular to an ultraviolet organic light-emitting device.
背景技术Background technique
自从1987年C.W.Tang等人实用新型了具有双层结构的高亮度、低电压有机电致发光器件(OLED)以来,OLED便受到了人们的广泛青睐。OLED具有丰富的色彩表现能力、超高的功率效率、100nm左右的超薄结构以及机械可柔性等优异特征而在新型平板显示和固态照明等领域中大放异彩。经过二十多年的发展,其技术已经进入实用化阶段。紫外OLED的发光波长一般在320nm-400nm范围,通常也称为近紫外发光。紫外有机发光器件的响应速度快、机械柔性好、超薄便携、易于构建大面积发光器件等优点,具有传统SiC、ZnO等无机紫外发光器件无可比拟的优越性能。因此,紫外OLED在高密度信息存储、涂料固化、生物传感、以及作为激发光源等领域中具有潜在的应用前景。Since C.W.Tang et al. invented a high-brightness, low-voltage organic electroluminescent device (OLED) with a double-layer structure in 1987, OLED has been widely favored by people. OLED has excellent characteristics such as rich color performance, ultra-high power efficiency, ultra-thin structure of about 100nm, and mechanical flexibility, so it shines in the fields of new flat panel display and solid-state lighting. After more than 20 years of development, its technology has entered the practical stage. The emission wavelength of ultraviolet OLED is generally in the range of 320nm-400nm, which is also called near-ultraviolet emission. Ultraviolet organic light-emitting devices have the advantages of fast response speed, good mechanical flexibility, ultra-thin and portable, easy to build large-area light-emitting devices, etc., and have incomparable superior performance of traditional SiC, ZnO and other inorganic ultraviolet light-emitting devices. Therefore, UV OLEDs have potential applications in high-density information storage, coating curing, biosensing, and as excitation light sources.
紫外光波长比可见光短,能量大,导致了作为紫外发光的有机材料需要具备非常宽的带隙,因此紫外有机发光材料的最高占据分子轨道(HOMO)能级比可见光的要高很多。例如,常用的紫外有机发光材料CBP的HOMO能级为6.1eV,OXD-7的HOMO能级为6.5eV,TAZ的HOMO能级为6.6eV。这些有机材料的HOMO能级与常用的透明导电阳极(如ITO)的功函数相差很大(ITO的功函数一般为4.7eV)。因此空穴从ITO阳极到紫外发光层的势垒高达1.5-2eV,高的空穴注入势垒导致了空穴很难注入到发光层中,导致了紫外OLED发光层中空穴的数量往往比电子的数量少很多,这使得发光层中电子-空穴的平衡性差,器件的发光效率和辐照度难以提高。The wavelength of ultraviolet light is shorter than that of visible light, and its energy is greater, which leads to the need for a very wide band gap as an organic material emitting ultraviolet light. Therefore, the energy level of the highest occupied molecular orbital (HOMO) of ultraviolet organic light emitting materials is much higher than that of visible light. For example, the HOMO energy level of CBP, a commonly used ultraviolet organic light-emitting material, is 6.1 eV, the HOMO energy level of OXD-7 is 6.5 eV, and the HOMO energy level of TAZ is 6.6 eV. The HOMO energy level of these organic materials is quite different from the work function of commonly used transparent conductive anodes (such as ITO) (the work function of ITO is generally 4.7eV). Therefore, the potential barrier of holes from the ITO anode to the ultraviolet light-emitting layer is as high as 1.5-2eV. The high hole injection barrier makes it difficult for holes to be injected into the light-emitting layer, resulting in the number of holes in the ultraviolet OLED light-emitting layer often being higher than that of electrons. The number of is very small, which makes the electron-hole balance in the light-emitting layer poor, and the luminous efficiency and irradiance of the device are difficult to improve.
通常克服这种高空穴注入势垒的方法是引入空穴注入层增加空穴注入,并辅以掺杂提高空穴迁移率,但是这种改善空穴注入与传输能力的方法对于紫外OLED来说仍然很有限,效果不是十分理想。Usually, the method to overcome this high hole injection barrier is to introduce a hole injection layer to increase hole injection, and supplemented with doping to improve hole mobility, but this method of improving hole injection and transport capabilities is very important for UV OLEDs. Still very limited, the effect is not very ideal.
实用新型内容Utility model content
本实用新型提供一种紫外有机发光器件,这种器件通过引入厚绝缘层作为电子注入层,有效地提高了紫外OLED器件的发光效率和辐照度。常规紫外OLED器件中的电子注入层厚度通常取0.5nm-1nm,认为已是最佳尺寸。本实用新型突破技术偏见,利用厚绝缘层作为电子注入层,达到同等数量的电子-空穴对数目时只需要更低的电流密度,增加了电子与空穴在发光层中复合的概率,产生高效率的近紫外光发射。与常规紫外OLED器件相比,本实用新型的外量子效率和辐照度均大幅度提高。本实用新型克服了常规紫外OLED器件中单一依靠提高空穴注入与传输能力来改善载流子平衡性不足的局限性,而且工艺简单,重复性好,因而在高功率紫外OLED器件的构筑方面具有十分重要的实际价值。The utility model provides an ultraviolet organic light-emitting device, which effectively improves the luminous efficiency and irradiance of the ultraviolet OLED device by introducing a thick insulating layer as an electron injection layer. The thickness of the electron injection layer in conventional ultraviolet OLED devices is usually 0.5nm-1nm, which is considered to be the optimal size. The utility model breaks through the technical prejudice, uses a thick insulating layer as the electron injection layer, and only needs a lower current density to achieve the same number of electron-hole pairs, which increases the probability of recombination of electrons and holes in the light-emitting layer, resulting in Efficient near-UV light emission. Compared with conventional ultraviolet OLED devices, the external quantum efficiency and irradiance of the utility model are greatly improved. The utility model overcomes the limitation of insufficient carrier balance in the conventional ultraviolet OLED device only relying on improving the hole injection and transport ability, and has simple process and good repeatability, so it has advantages in the construction of high-power ultraviolet OLED device very important practical value.
本实用新型的技术方案:Technical scheme of the utility model:
1.一种紫外有机发光器件,包括衬底层、阳极层、空穴注入层、空穴传输层、发光层、电子传输层、电子注入层、反射金属阴极层,电子注入层为厚度是1.5nm-6nm的LiF;衬底层、阳极层、空穴注入层、空穴传输层、发光层、电子传输层、电子注入层、反射金属阴极层顺序叠接为一体。1. An ultraviolet organic light-emitting device, comprising a substrate layer, an anode layer, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, an electron injection layer, a reflective metal cathode layer, and the electron injection layer is 1.5nm in thickness -6nm LiF; substrate layer, anode layer, hole injection layer, hole transport layer, light-emitting layer, electron transport layer, electron injection layer, and reflective metal cathode layer are sequentially stacked as one.
附图说明Description of drawings
图1为本实用新型的结构及外电路示意图。Fig. 1 is the structure of the utility model and the schematic diagram of external circuit.
图1中:1.衬底层; 2.阳极层; 3.空穴注入层 ;4.空穴传输层; 5.发光层 ;6.电子传输层; 7.电子注入层; 8.反射金属阴极层; 9.电源。In Figure 1: 1. Substrate layer; 2. Anode layer; 3. Hole injection layer; 4. Hole transport layer; 5. Light emitting layer; 6. Electron transport layer; 7. Electron injection layer; 8. Reflective metal cathode layer; 9. Power supply.
图2为本实用新型不同电子注入层厚度实施例与常规紫外OLED器件在不同电流密度下的辐照度对比图。Fig. 2 is a comparison diagram of irradiance between embodiments of the present invention with different electron injection layer thicknesses and conventional ultraviolet OLED devices at different current densities.
图3为本实用新型不同电子注入层厚度实施例与常规紫外OLED器件在不同电流密度下的外量子效率(EQE)的对比图。Fig. 3 is a comparison diagram of the external quantum efficiency (EQE) of the embodiment of the utility model with different thicknesses of the electron injection layer and the conventional ultraviolet OLED device at different current densities.
图4为本实用新型不同电子注入层厚度实施例与常规紫外OLED器件的电流密度-电压关系的对比图。Fig. 4 is a comparison diagram of the current density-voltage relationship between embodiments of different electron injection layer thicknesses of the present invention and conventional ultraviolet OLED devices.
图2-图4中:器件一厚度为常规厚度;器件二厚度为1.5nm;器件三厚度为2.5nm;器件四厚度为4nm;器件五厚度为6nm。In Fig. 2-Fig. 4: the thickness of device 1 is conventional; the thickness of device 2 is 1.5nm; the thickness of device 3 is 2.5nm; the thickness of device 4 is 4nm; the thickness of device 5 is 6nm.
具体实施方式detailed description
下面结合附图和实施例对本实用新型内容作进一步的阐述。Below in conjunction with accompanying drawing and embodiment the content of the utility model is further elaborated.
衬底采用玻璃;阳极选用ITO氧化铟锡膜,方阻约为10Ω/□;空穴注入层选择厚度为2nm-5nm的MoO3;空穴传输层选用CBP材料;发光层选用TAZ材料;电子传输层选用BPhen材料;反射金属阴极层采用Al,厚度不小于100nm;电子注入层采用LiF,其厚度分别取1.5nm、2.5nm、4nm和6nm,构成四个实施例。外电路驱动电源可选择直流3V-20V,在器件上施加直流电压会从阳极一侧观测到近紫外出射发光线,并且通过相关仪器得到本实用新型紫外OLED器件的各种参数指标对比图,如图2-图4所示。The substrate is made of glass; the anode is made of ITO indium tin oxide film, and the square resistance is about 10Ω/□; the hole injection layer is made of MoO 3 with a thickness of 2nm-5nm; the hole transport layer is made of CBP material; the light-emitting layer is made of TAZ material; The transport layer is made of BPhen; the reflective metal cathode layer is made of Al, and its thickness is not less than 100nm; The driving power of the external circuit can be selected as DC 3V-20V. Applying a DC voltage on the device will observe the near-ultraviolet emitting luminous line from the anode side, and obtain a comparison chart of various parameters of the UV OLED device of the present invention through related instruments, such as Figure 2-Figure 4 shows.
其中:in:
CBP表示4,4'-bis(carbazol-9-yl)biphenyl,厚度为10nm-40nm。CBP means 4,4'-bis(carbazol-9-yl)biphenyl, the thickness is 10nm-40nm.
TAZ表示3-(4-biphenyl)-4-phenyl-5-tert-butylphenyl-1,2,4-triazole,厚度为10nm-40nm。TAZ means 3-(4-biphenyl)-4-phenyl-5-tert-butylphenyl-1,2,4-triazole with a thickness of 10nm-40nm.
BPhen表示4,7-diphenyl-1,10-phenanthroline,厚度为15nm-110nm。BPhen means 4,7-diphenyl-1,10-phenanthroline, the thickness is 15nm-110nm.
常规紫外OLED器件,电子注入层厚度为0.5nm-1nm,以此器件作为本实用新型的对比样件(器件一),得到如图2-图4所示的参数指标对比图。Conventional ultraviolet OLED device, electron injection layer thickness is 0.5nm-1nm, this device is used as a comparison sample (device 1) of the utility model, and the parameter index comparison diagram shown in Figure 2-Figure 4 is obtained.
由图2可知,在相同电流密度下,本实用新型(器件二~器件五)的辐照度比常规厚度的电子注入层的器件(器件一)均有所提高。例如,当电流密度为100mA/cm2时,器件一的辐照度为1.87mW/cm2,器件二的辐照度为2.28mW/cm2;器件三的辐照度为3.74mW/cm2;器件四的辐照度为3.29mW/cm2;器件五的辐照度为1.93mW/cm2;器件二、器件三、器件四、器件五的辐照度比器件一分别提高了21.9%,100%,75.9%,3.2%。因此,本实用新型大幅度提高了辐照度,获得了意想不到的效果。It can be seen from Figure 2 that under the same current density, the irradiance of the utility model (device 2 to device 5) is higher than that of the device (device 1) with an electron injection layer of conventional thickness. For example, when the current density is 100mA/cm 2 , the irradiance of device 1 is 1.87mW/cm 2 , the irradiance of device 2 is 2.28mW/cm 2 ; the irradiance of device 3 is 3.74mW/cm 2 ; The irradiance of device 4 is 3.29mW/cm 2 ; the irradiance of device 5 is 1.93mW/cm 2 ; the irradiance of device 2, device 3, device 4 and device 5 is 21.9% higher than that of device 1 , 100%, 75.9%, 3.2%. Therefore, the utility model greatly improves the irradiance and obtains unexpected effects.
由图3可知,器件一的最大外量子效率(EQE)为1.07%@2.4mA/cm2,器件二的最大EQE为1.3%@2.1mA/cm2,器件三的最大EQE为2.1%@2.5mA/cm2,器件四的最大EQE为1.7%@2.3mA/cm2,器件五的最大EQE为1.15%@7.8mA/cm2,器件二、器件三、器件四、器件五的最大EQE比器件一分别提高了21.5%,96.3%,58.9%,7.5%。同时,在相同电流密度下,器件二~器件五的EQE均比器件一高。因此,当电子注入层LiF的厚度为1.5~6nm时,可以获得比常规厚度(0.5-1nm)电子注入层更高的外量子效率,获得了意想不到的效果。It can be seen from Figure 3 that the maximum external quantum efficiency (EQE) of device 1 is 1.07%@2.4mA/cm 2 , the maximum EQE of device 2 is 1.3%@2.1mA/cm 2 , and the maximum EQE of device 3 is 2.1%@2.5 mA/cm 2 , the maximum EQE of device 4 is 1.7%@2.3mA/cm 2 , the maximum EQE of device 5 is 1.15%@7.8mA/cm 2 , the maximum EQE ratio of device 2, device 3, device 4, and device 5 Device 1 increased by 21.5%, 96.3%, 58.9%, and 7.5%, respectively. At the same time, at the same current density, the EQEs of devices 2 to 5 are higher than those of device 1. Therefore, when the thickness of the electron injection layer LiF is 1.5-6nm, a higher external quantum efficiency can be obtained than that of the conventional thickness (0.5-1nm) electron injection layer, and an unexpected effect is obtained.
由图4可知,在相同电压下,器件二~器件五的电流密度比器件一要低一些,表明本实用新型的发光效率和辐照度也得到提高。It can be seen from Fig. 4 that under the same voltage, the current density of devices 2 to 5 is lower than that of device 1, indicating that the luminous efficiency and irradiance of the utility model are also improved.
综合以上实验数据可以看出,本实用新型由于突破了常规技术的惯性思维,抛弃依靠提高空穴注入与传输能力的方式,以及采用厚绝缘层作为电子注入层,因此各项技术指标都获得了意想不到的效果。Based on the above experimental data, it can be seen that because the utility model breaks through the inertial thinking of conventional technologies, abandons the method of relying on improving hole injection and transmission capabilities, and uses a thick insulating layer as the electron injection layer, all technical indicators have obtained unexpected effect.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105552243A (en) * | 2016-01-29 | 2016-05-04 | 桂林电子科技大学 | Ultraviolet organic light emitting device and fabrication method thereof |
| CN109449313A (en) * | 2018-10-24 | 2019-03-08 | 桂林电子科技大学 | It is a kind of that the method for hole injection layer and the Organic Light Emitting Diode of building in Organic Light Emitting Diode are prepared based on sol-gel method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105552243A (en) * | 2016-01-29 | 2016-05-04 | 桂林电子科技大学 | Ultraviolet organic light emitting device and fabrication method thereof |
| CN109449313A (en) * | 2018-10-24 | 2019-03-08 | 桂林电子科技大学 | It is a kind of that the method for hole injection layer and the Organic Light Emitting Diode of building in Organic Light Emitting Diode are prepared based on sol-gel method |
| CN109449313B (en) * | 2018-10-24 | 2021-06-08 | 桂林电子科技大学 | Method for preparing hole injection layer in organic light-emitting diode based on sol-gel method and constructed organic light-emitting diode |
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