CN204288196U - A kind of laser etch process capacitance touch screen - Google Patents
A kind of laser etch process capacitance touch screen Download PDFInfo
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- CN204288196U CN204288196U CN201420837310.4U CN201420837310U CN204288196U CN 204288196 U CN204288196 U CN 204288196U CN 201420837310 U CN201420837310 U CN 201420837310U CN 204288196 U CN204288196 U CN 204288196U
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- 238000000034 method Methods 0.000 title claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 41
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052709 silver Inorganic materials 0.000 claims abstract description 20
- 239000004332 silver Substances 0.000 claims abstract description 20
- 238000005516 engineering process Methods 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 238000010329 laser etching Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 7
- 238000005530 etching Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 84
- 239000000976 ink Substances 0.000 description 73
- 239000011521 glass Substances 0.000 description 28
- 230000015572 biosynthetic process Effects 0.000 description 15
- 238000007650 screen-printing Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000005345 chemically strengthened glass Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
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Abstract
本实用新型公开了一种激光蚀刻工艺电容触摸屏,所述激光工艺电容触摸屏包括透明基板以及依次层叠于透明基板的油墨层、消影层、ITO电极、黑色盖底油墨和银浆;所述的银浆为规则图形,分布在邦定区或非视窗区,所述的黑色盖底油墨为规则图形。本实用新型通过对电容触摸屏的邦定PIN的材料选择及油墨印刷工艺的合理设计,解决了激光蚀刻工艺电容触摸屏ESD失效问题、解决了可视区边缘锯齿问题,并降低了ITO蚀刻纹,并减少了触摸屏生产工艺流程,有效的提升产品品质及降低产品生产成本。
The utility model discloses a capacitive touch screen with a laser etching process. The capacitive touch screen with a laser process comprises a transparent substrate and an ink layer, a shadow erasing layer, an ITO electrode, black bottom-covering ink and silver paste sequentially stacked on the transparent substrate; The silver paste is a regular pattern, which is distributed in the bonding area or the non-window area, and the black cover ink is a regular pattern. The utility model solves the ESD failure problem of the capacitive touch screen in the laser etching process, solves the jagged edge problem of the visible area, and reduces the ITO etching pattern through the material selection of the bonding PIN of the capacitive touch screen and the reasonable design of the ink printing process. The production process of the touch screen is reduced, the product quality is effectively improved and the production cost of the product is reduced.
Description
技术领域 technical field
本实用新型涉及电容触摸屏技术领域,尤其是涉及一种激光蚀刻工艺电容触摸屏。 The utility model relates to the technical field of capacitive touch screens, in particular to a capacitive touch screen with laser etching technology.
背景技术 Background technique
电容式触摸屏的基本原理是利用人体的电流感应进行工作的,电容式触摸屏是一块二层复合玻璃屏,玻璃屏的内表面夹层涂有ITO(氧化铟锡)导电膜(镀膜导电玻璃),最外层是一薄层矽土玻璃保护层,ITO涂层作为工作面,四个角上引出四个电极,当手指触摸在屏幕上时,由于人体电场,用户和触摸屏表面形成一个耦合电容,对于高频电流来说,电容是直接导体,于是手指从接触点吸走一个很小的电流,这个电流分别从触摸屏的四角上的电极中流出,并且流经这四个电极的电流与手指到四角的距离成正比,控制器通过对这四个电流比例的精确计算,得出触摸点的位置。 The basic principle of the capacitive touch screen is to use the current induction of the human body to work. The capacitive touch screen is a two-layer composite glass screen. The inner surface of the glass screen is coated with ITO (indium tin oxide) conductive film (coated conductive glass). The outer layer is a thin layer of silica glass protective layer, ITO coating as the working surface, and four electrodes are drawn from the four corners. When the finger touches the screen, due to the electric field of the human body, the user and the surface of the touch screen form a coupling capacitance. For high-frequency current, the capacitor is a direct conductor, so the finger sucks a small current from the contact point, and the current flows out from the electrodes on the four corners of the touch screen respectively, and the current flowing through the four electrodes is the same as that from the finger to the four corners. Proportional to the distance, the controller obtains the position of the touch point through accurate calculation of the four current ratios.
传统的单片式电容触摸屏的制作,是在钢化玻璃镀上ITO膜层,经过黄光工艺完成,其工艺包括:1.真空镀膜、2.光阻涂布、3.曝光、4.显影、5.蚀刻、6.烘烤、7.脱膜等。由于触摸屏结构中包括多层导电线路(含引出线路)及不同层之间的绝缘层或保护层,上述工艺需要重复多次(一般4 ~6层)。 The production of the traditional single-chip capacitive touch screen is to coat the tempered glass with an ITO film layer and complete it through the yellow light process. The process includes: 1. Vacuum coating, 2. Photoresist coating, 3. Exposure, 4. Development, 5. Etching, 6. Baking, 7. Stripping, etc. Since the touch screen structure includes multi-layer conductive lines (including lead-out lines) and insulating layers or protective layers between different layers, the above process needs to be repeated many times (generally 4 to 6 layers).
因此传统的黄光工艺OGS(触摸屏)生产工艺复杂、流程多、设备投入高、占用车间面积大、能耗高,且在黄光显影过程中需要使用到大量的强酸强碱不利于环保。因此,寻找工艺简单、投入成本低和环保的生产方法迫在眉睫。采用激光工艺生产OGS可相对减少10-20道工序。激光蚀刻的原理通过精确的定位、能量均衡控制,利用激光高温并且依照设计图纸将镀在玻璃基板表面的ITO膜层部分气化,从而形成ITO线路及电极。但激光工艺OGS成品由于阻抗高对ESD测试抵抗能力较弱,且在激光蚀刻过程中,在可视区边缘油墨被击穿而形成锯齿状。 Therefore, the traditional yellow light process OGS (touch screen) production process is complex, with many processes, high equipment investment, large workshop area, high energy consumption, and the need to use a large amount of strong acid and alkali in the yellow light developing process, which is not conducive to environmental protection. Therefore, it is extremely urgent to find a production method with simple process, low input cost and environmental protection. The production of OGS by laser technology can relatively reduce 10-20 processes. The principle of laser etching is through precise positioning and energy balance control, using laser high temperature to partially vaporize the ITO film layer plated on the surface of the glass substrate according to the design drawings, thereby forming ITO lines and electrodes. However, due to the high impedance of the laser process OGS finished product, the resistance to ESD testing is weak, and during the laser etching process, the ink at the edge of the visible area is broken down to form a jagged shape.
实用新型内容 Utility model content
本实用新型所要解决的技术问题在于提供一种激光工艺电容屏生产方法,采用银浆低电阻材料作为邦定电极以及通过层叠优化采用盖底油墨反盖工艺,解决激光工艺OGS成品对ESD测试抵抗能力较弱及在可视区边缘油墨锯齿现象。 The technical problem to be solved by the utility model is to provide a laser process capacitive screen production method, using silver paste low-resistance material as the bonding electrode and adopting the cover bottom ink reverse cover process through lamination optimization, so as to solve the resistance of the laser process OGS finished product to the ESD test Weak ability and ink jaggedness at the edge of the viewing area.
为实现上述目的,本实用新型采用如下技术方案: In order to achieve the above object, the utility model adopts the following technical solutions:
一种激光工艺电容触摸屏,包括透明基板以及依次层叠于透明基板的油墨层、消影层、ITO电极、黑色盖底油墨和银浆;所述的银浆为规则图形,分布在邦定区或非视窗区,所述的黑色盖底油墨为规则图形。 A laser process capacitive touch screen, comprising a transparent substrate and an ink layer, an erasing layer, an ITO electrode, black cover ink and silver paste sequentially stacked on the transparent substrate; the silver paste is a regular pattern, distributed in the bonding area or In the non-window area, the black cover ink is a regular pattern.
所述银浆为低阻抗导电材料,全部丝印在邦定区的邦定PIN上,取代ITO与FPC金手指直接导通,厚度为5-30μm。 The silver paste is a low-impedance conductive material, all silk-screened on the bonding PIN in the bonding area, replacing ITO and directly conducting with the FPC gold finger, with a thickness of 5-30 μm.
所述油墨层由二层耐激光油墨组成,第一层主色油墨内圈尺寸以可视区外扩0~0.5mm,第二层以第一层油墨为基础外扩0~0.2mm,每层厚度为4-12μm。 The ink layer is composed of two layers of laser-resistant inks. The inner ring size of the main color ink of the first layer is expanded by 0-0.5mm from the visible area, and the second layer is expanded by 0-0.2mm based on the ink of the first layer. The layer thickness is 4-12 μm.
所述油墨层由四层耐激光油墨组成,前三层为白色油墨,第四层为黑色油墨,第一层油墨内圈尺寸以可视区外扩0~0.5mm,其余三层油墨其图案均为上一层油墨外扩0~0.15mm距离,每层厚度为4-12μm。 The ink layer is composed of four layers of laser-resistant ink, the first three layers are white ink, the fourth layer is black ink, the size of the inner circle of the first layer of ink is 0~0.5mm outside the visible area, and the patterns of the remaining three layers of ink are The ink on the previous layer is expanded by 0~0.15mm, and the thickness of each layer is 4-12μm.
述盖底油墨的内圈尺寸为触摸屏可视区尺寸,厚度为4-20μm。 The size of the inner circle of the cover bottom ink is the size of the visible area of the touch screen, and the thickness is 4-20 μm.
一种激光工艺电容触摸屏的制造方法,包括步骤: A method for manufacturing a laser process capacitive touch screen, comprising the steps of:
油墨层的形成:玻璃基板经过丝印工艺形成厚度为15-30μm均匀的主色油墨层; Formation of ink layer: the glass substrate is screen-printed to form a uniform main color ink layer with a thickness of 15-30μm;
消影层的形成:将消影材料TiO2、SiO2以真空镀膜,沉积在玻璃基板上 Formation of the disappearing layer: The disappearing materials TiO 2 and SiO 2 are vacuum coated and deposited on the glass substrate
ITO电极的形成:经过ITO镀膜,使在玻璃基板上形成一层透明及厚度均匀的ITO膜层,其厚度为50埃米~2000埃米; Formation of ITO electrode: After ITO coating, a layer of transparent and uniform thickness ITO film is formed on the glass substrate, and its thickness is 50 angstroms to 2000 angstroms;
经过ITO镀膜的玻璃基板,采用激光蚀刻机将ITO蚀刻出符合要求的、规则的ITO图案或电极; After ITO-coated glass substrate, laser etching machine is used to etch the ITO to meet the requirements and regular ITO patterns or electrodes;
黑色盖底油墨形成: Black cover ink formation:
所述白色方案中形成电极的玻璃基板,经过丝印工艺,先丝印一层白色油墨,形成反盖工艺,其内框尺寸为可视区尺寸,厚度为4~12μm;在丝印一层黑色盖底油墨,其内框尺寸为以可视区尺寸外扩0-0.8mm; In the white scheme, the glass substrate forming the electrodes is screen-printed with a layer of white ink first to form a reverse cover process. The size of the inner frame is the size of the visible area and the thickness is 4-12 μm; Ink, the size of the inner frame is 0-0.8mm outside the size of the visible area;
银浆形成: Silver paste formation:
丝印过盖底油墨的玻璃基板,经过丝印工艺,使之在玻璃基板邦定PIN区ITO电极上形成一层厚度均匀的银浆,其厚度为5~30μm。 The glass substrate with over-covering ink is screen-printed to form a layer of silver paste with a uniform thickness on the ITO electrode in the bonding PIN area of the glass substrate, with a thickness of 5-30 μm.
所述油墨层共四层油墨,丝印顺序为三层白色油墨及一层黑色油墨;第一层白色油墨内圈尺寸以可视区外扩0~0.3mm,其余三层油墨其图案均为上一层油墨外扩0~0.15mm距离,每层厚度为4-10μm使之在边缘形成一个坡度及高度都不大的台阶。 The ink layer has four layers of ink in total, and the order of silk screen printing is three layers of white ink and one layer of black ink; the inner circle size of the first layer of white ink is 0~0.3mm outside the visible area, and the patterns of the remaining three layers of ink are all above A layer of ink spreads 0~0.15mm, and the thickness of each layer is 4-10μm to form a step with a small slope and height at the edge.
一种激光工艺电容触摸屏的制造方法,包括步骤: A method for manufacturing a laser process capacitive touch screen, comprising the steps of:
油墨层的形成:玻璃基板经过丝印工艺形成厚度为5-20μm的均匀油墨层; Formation of the ink layer: the glass substrate forms a uniform ink layer with a thickness of 5-20 μm through the silk screen process;
消影层的形成:将消影材料TiO2、SiO2以真空镀膜,沉积在玻璃基板上; Formation of the disappearing layer: the disappearing materials TiO 2 and SiO 2 are deposited on the glass substrate by vacuum coating;
ITO电极的形成:经过ITO镀膜,使在玻璃基板上形成一层透明及厚度均匀的ITO膜层,其厚度为50埃米~2000埃米; Formation of ITO electrode: After ITO coating, a layer of transparent and uniform thickness ITO film is formed on the glass substrate, and its thickness is 50 angstroms to 2000 angstroms;
经过ITO镀膜的玻璃基板,采用激光蚀刻机将ITO蚀刻出符合要求的、规则的ITO图案或电极; After ITO-coated glass substrate, laser etching machine is used to etch the ITO to meet the requirements and regular ITO patterns or electrodes;
黑色盖底油墨形成:所述黑色方案中形成电极的玻璃基板,经过丝印工艺,使之在玻璃基板上形成厚度均匀的黑色盖底油墨层,其内框尺寸为可视区尺寸,形成反盖工艺,厚度为4~12μm; Formation of black cover ink: the glass substrate forming the electrode in the black scheme is processed by silk screen printing to form a black cover ink layer with uniform thickness on the glass substrate, and the size of the inner frame is the size of the visible area to form a reverse cover process, the thickness is 4~12μm;
银浆形成:丝印过盖底油墨的玻璃基板,经过丝印工艺,使之在玻璃基板邦定区邦定PIN区ITO电极上形成一层厚度均匀的银浆,其厚度为5~30μm。 Formation of silver paste: The glass substrate with silk screen printing over-covering ink, after the silk screen printing process, forms a layer of silver paste with a uniform thickness on the ITO electrode in the bonding PIN area of the glass substrate, with a thickness of 5-30 μm.
所述油墨层的形成为在透明基板上分两次丝印,第一层油墨内圈尺寸以可视区外扩0~0.3mm,第二层以第一层油墨为基础外扩0~0.15mm,每层厚度为4-10μm。 The ink layer is formed by screen printing twice on the transparent substrate. The inner circle of the first layer of ink is expanded by 0~0.3mm from the visible area, and the second layer is expanded by 0~0.15mm based on the first layer of ink. , the thickness of each layer is 4-10μm.
所述银浆仅丝印在邦定区ITO电极上; The silver paste is only screen-printed on the ITO electrode in the bonding area;
所述主色油墨的第一层油墨内圈尺寸以可视区外扩0~0.3mm,其余每层油墨其图案均为上一层油墨外扩0~0.15mm距离,每层厚度为4~12μm。 The size of the inner circle of the ink of the first layer of the main color ink is 0~0.3mm outside the visible area, and the pattern of each other layer of ink is 0~0.15mm outside the ink of the previous layer, and the thickness of each layer is 4~0. 12 μm.
所述激光蚀刻机为采用激辐射原理,将光子通过谐振腔进行雪崩式放大,形成发射方向、频率、偏振、光波相位单一的具有强大能量的光子束,从而对物体进行切割的机器。激光走线宽度15-40μm,ITO图形与主色油墨相对位置精度为±5μm. The laser etching machine adopts the principle of excitation radiation to amplify photons in an avalanche through a resonant cavity to form a powerful photon beam with a single emission direction, frequency, polarization, and light wave phase, so as to cut objects. The width of the laser line is 15-40μm, and the relative position accuracy of the ITO pattern and the main color ink is ±5μm.
所述的ITO电极为水平方向或垂直方向导通电极,具有规则图形结构;ITO电极为ITO导通电极一与ITO导通电极二组成,ITO导通电极一与ITO导通电极二在同一层面,相互独立,相互绝缘,交错设计。 The ITO electrode is a conduction electrode in a horizontal direction or a vertical direction, and has a regular graphic structure; the ITO electrode is composed of the ITO conduction electrode 1 and the ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level , independent of each other, insulated from each other, staggered design.
所述的ITO由In2O3和SnO2组成,其质量比为85~95:5~15。ITO镀膜的方式可以采用真空磁控溅镀,化学气相沉积法,热蒸镀,溶胶凝胶。 The ITO is composed of In 2 O 3 and SnO 2 with a mass ratio of 85-95:5-15. The way of ITO coating can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, sol-gel.
本实用新型与现有技术相比,具有如下优点和有益效果: Compared with the prior art, the utility model has the following advantages and beneficial effects:
通过对邦定电极材料及层叠结构的合理优化,解决现有产品对ESD测试抵抗能力较弱及在可视区边缘油墨锯齿现象,并减少了触摸屏生产工艺流程,有效的降低触摸屏生产成本。 Through reasonable optimization of bonding electrode materials and laminated structures, the weak resistance to ESD testing of existing products and ink jaggedness at the edge of the visible area are solved, and the production process of the touch screen is reduced, which effectively reduces the production cost of the touch screen.
附图说明 Description of drawings
图1 为本实用新型实施例所述黑色方案激光工艺触摸屏剖面堆叠结构示意图; Fig. 1 is a schematic diagram of the stacked structure of the black scheme laser technology touch screen section stacking structure described in the embodiment of the present invention;
图2为本实用新型实施例所述的玻璃基板结构示意图; Fig. 2 is a schematic structural diagram of the glass substrate described in the embodiment of the present invention;
图3为本实用新型实施例所述白色方案激光工艺触摸屏剖面堆叠结构示意图; Fig. 3 is a schematic diagram of a cross-sectional stacked structure of a white scheme laser technology touch screen according to an embodiment of the present invention;
具体实施方式 Detailed ways
下面结合具体实施例对本实用新型作进一步详细说明。 Below in conjunction with specific embodiment the utility model is described in further detail.
如图1及图2所示,所述的一种黑色OGS方案激光工艺电容触摸屏,包括厚度在0.5mm~2.0mm之间的化学强化玻璃基板1(也可以适用树脂材料基板),依次层叠于透明基板的主色油墨2、消影层3、ITO电极4、盖底油墨层5、银浆6;所述的ITO电极为水平方向或垂直方向导通电极,具有规则图形结构;ITO电极包括电容屏驱动(ITO电极一)和感应电极(ITO电极二),ITO电极一与ITO电极二在同一层面,相互独立,相互绝缘,交错设计。透明基板包括视窗区21和非视窗区22,黑色树脂层及彩色油墨层分布在显示屏非视窗区。 As shown in Figures 1 and 2, the black OGS scheme laser process capacitive touch screen includes a chemically strengthened glass substrate 1 with a thickness between 0.5mm and 2.0mm (resin material substrates can also be used), which are sequentially stacked on the The main color ink 2, the erasing layer 3, the ITO electrode 4, the cover bottom ink layer 5, and the silver paste 6 of the transparent substrate; the ITO electrode is a horizontal or vertical conduction electrode, and has a regular pattern structure; the ITO electrode includes Capacitive screen drive (ITO electrode 1) and sensing electrode (ITO electrode 2), ITO electrode 1 and ITO electrode 2 are on the same layer, independent of each other, insulated from each other, and interleaved design. The transparent substrate includes a window area 21 and a non-window area 22, and a black resin layer and a colored ink layer are distributed in the non-window area of the display screen.
其制备工艺如下: Its preparation process is as follows:
主色油墨的形成:玻璃基板经过丝印工艺形成厚度均匀的油墨层。黑色OGS方案主色油墨厚度为5-20μm; Formation of main color ink: the glass substrate is screen-printed to form an ink layer with uniform thickness. The main color ink thickness of the black OGS scheme is 5-20μm;
所述黑色OGS方案的主色油墨采用耐激光油墨,在透明基板上分两次丝印,第一层油墨内圈尺寸以可视区外扩0~0.3mm,第二层以第一层油墨为基础外扩0~0.15mm,每层厚度为4-12μm。 The main color ink of the black OGS scheme adopts laser-resistant ink, which is screen-printed twice on the transparent substrate. The size of the inner circle of the ink on the first layer is expanded by 0~0.3mm from the visible area, and the ink on the second layer is based on the first layer of ink. The base is expanded by 0~0.15mm, and the thickness of each layer is 4-12μm.
每层丝印完成后,只进行表层干燥,以提高丝印效率。全部完成后,进行完全烘烤干燥。 After each layer of silk screen printing is completed, only the surface layer is dried to improve the efficiency of silk screen printing. After everything is done, it is fully baked and dried.
消影层的形成: Formation of the vanishing layer:
将消影材料TiO2、SiO2以真空磁控溅镀方式,沉积在玻璃基板上。 The disappearing materials TiO 2 and SiO 2 are deposited on the glass substrate by means of vacuum magnetron sputtering.
ITO电极的形成:透明基板经过ITO镀膜,使在玻璃基板上形成一层透明及厚度均匀的ITO膜层,其厚度为50埃米~2000埃米(面电阻为10~430欧姆); Formation of ITO electrodes: The transparent substrate is coated with ITO, so that a layer of transparent and uniform ITO film layer is formed on the glass substrate, and its thickness is 50 angstroms to 2000 angstroms (surface resistance is 10 to 430 ohms);
经过ITO镀膜的玻璃基板,采用激光蚀刻机依据图纸将ITO蚀刻出符合要求的、规则的ITO图案或电极; After the ITO-coated glass substrate, use a laser etching machine to etch the ITO to meet the requirements and regular ITO patterns or electrodes according to the drawings;
所述激光蚀刻机为采用受激辐射原理,将光子通过谐振腔进行雪崩式放大,形成发射方向、频率、偏振、光波相位单一的具有强大能量的光子束,从而对物体进行切割的机器。激光走线宽度15-40μm,ITO图形与主色油墨相对位置精度为±5μm。 The laser etching machine adopts the principle of stimulated radiation to amplify photons in avalanche through a resonant cavity to form a powerful photon beam with single emission direction, frequency, polarization and light wave phase, so as to cut objects. The width of the laser line is 15-40μm, and the relative position accuracy of the ITO pattern and the main color ink is ±5μm.
所述的ITO电极为水平方向或垂直方向导通电极,具有规则图形结构;ITO电极为ITO导通电极一与ITO导通电极二组成,ITO导通电极一与ITO导通电极二在同一层面,相互独立,相互绝缘,交错设计。 The ITO electrode is a conduction electrode in a horizontal direction or a vertical direction, and has a regular graphic structure; the ITO electrode is composed of the ITO conduction electrode 1 and the ITO conduction electrode 2, and the ITO conduction electrode 1 and the ITO conduction electrode 2 are on the same level , independent of each other, insulated from each other, staggered design.
所述的ITO由In2O3和SnO2组成,其质量比为85~95:5~15。ITO镀膜的方式可以采用真空磁控溅镀,化学气相沉积法,热蒸镀,溶胶凝胶。 The ITO is composed of In 2 O 3 and SnO 2 with a mass ratio of 85-95:5-15. The way of ITO coating can be vacuum magnetron sputtering, chemical vapor deposition, thermal evaporation, sol-gel.
盖底油墨形成: Covering Ink Formation:
形成电极的玻璃基板,经过丝印工艺,使之在玻璃基板上形成一层厚度均匀的盖底油墨层,其内框尺寸为可视区要求尺寸,丝印厚度为5~20μm; The glass substrate that forms the electrode is subjected to a silk screen printing process to form a layer of ink layer with a uniform thickness on the glass substrate.
经过盖底油墨烘烤,最终形成厚度为5~20μm及规则的黑色层图案。 After the bottom ink is baked, a regular black layer pattern with a thickness of 5-20 μm is finally formed.
银浆形成: Silver paste formation:
丝印过盖底油墨的玻璃基板,经过丝印工艺,使之在玻璃基板邦定PIN区ITO电极上形成一层厚度均匀的银浆,作为与FPC金手指接触的电极,其厚度为5~20μm; The glass substrate with over-covering ink is screen-printed to form a layer of silver paste with a uniform thickness on the ITO electrode in the bonding PIN area of the glass substrate. As the electrode in contact with the FPC gold finger, the thickness is 5~20μm;
经过银浆烘烤,最终形成厚度为5~20μm及规则银浆图案电极。 After the silver paste is baked, a regular silver paste pattern electrode with a thickness of 5-20 μm is finally formed.
本实用新型的另一实施例为采用白色OGS方案。如图3所示,为本实用新型实施例所述白色方案激光工艺触摸屏剖面堆叠结构示意图,包括厚度在0.5mm~2.0mm之间的化学强化玻璃基板1(也可以适用树脂材料基板),依次层叠于透明基板的三层白色主色油墨2、黑色油墨3、消影层4、ITO电极5、白色反盖油墨层6、盖底油墨层7、银浆8。 Another embodiment of the present invention adopts the white OGS scheme. As shown in Figure 3, it is a schematic diagram of the cross-sectional stacked structure of the laser process touch screen in the white scheme described in the embodiment of the present invention, including a chemically strengthened glass substrate 1 (resin material substrate can also be used) with a thickness between 0.5 mm and 2.0 mm, followed by Three layers of white main color ink 2, black ink 3, shadow erasing layer 4, ITO electrode 5, white reverse cover ink layer 6, bottom cover ink layer 7, and silver paste 8 laminated on the transparent substrate.
白色OGS方案与前一实施例采用黑色OGS方案的区别是,白色OGS方案的油墨层共四层油墨,丝印顺序为三层白色主色油墨2及一层黑色油墨3。第一层白色油墨内圈尺寸以可视区外扩0~0.3mm,其余三层油墨其图案均为上一层油墨外扩0~0.15mm距离,每层厚度为4-10μm使之在边缘形成一个坡度及高度都不大的台阶。白色OGS方案主色油墨厚度为15-30μm。 The difference between the white OGS solution and the black OGS solution used in the previous embodiment is that the ink layer of the white OGS solution has four ink layers in total, and the silk screen printing sequence is three layers of white main color ink 2 and one layer of black ink 3 . The size of the inner ring of the first layer of white ink is 0~0.3mm outside the visible area, and the patterns of the other three layers of ink are 0~0.15mm away from the previous layer of ink, and the thickness of each layer is 4-10μm so that it is on the edge Form a step with little slope and height. The main color ink thickness of the white OGS scheme is 15-30μm.
以上内容是结合具体的优选实施方式对本实用新型所作的进一步详细说明,不能认定本实用新型的具体实施只局限于这些说明。对于本实用新型所属技术领域的普通技术人员来说,在不脱离本实用新型构思的前提下,还可以做出若干简单推演或替换,都应当视为属于本实用新型的保护范围。 The above content is a further detailed description of the utility model in combination with specific preferred embodiments, and it cannot be assumed that the specific implementation of the utility model is only limited to these descriptions. For a person of ordinary skill in the technical field to which the utility model belongs, without departing from the concept of the utility model, some simple deduction or substitutions can also be made, which should be regarded as belonging to the protection scope of the utility model.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105353930A (en) * | 2015-11-17 | 2016-02-24 | 信义光伏产业(安徽)控股有限公司 | OGS capacitive touch screen, preparation method thereof and touch display device |
| CN106155432A (en) * | 2014-12-25 | 2016-11-23 | 惠州市宝明精工有限公司 | A kind of laser etch process capacitance touch screen and manufacture method thereof |
| CN108227995A (en) * | 2018-01-16 | 2018-06-29 | 晟光科技股份有限公司 | A kind of white OGS touch screen photographic hole screen printing method for solving the problems, such as aberration |
| CN110688033A (en) * | 2019-09-12 | 2020-01-14 | 东莞市宏凯光电有限公司 | FOG touch screen and production process thereof |
| CN113748405A (en) * | 2019-04-15 | 2021-12-03 | 电子触控产品解决方案 | Laser ablation gradient zones for touch screens |
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2014
- 2014-12-25 CN CN201420837310.4U patent/CN204288196U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106155432A (en) * | 2014-12-25 | 2016-11-23 | 惠州市宝明精工有限公司 | A kind of laser etch process capacitance touch screen and manufacture method thereof |
| CN105353930A (en) * | 2015-11-17 | 2016-02-24 | 信义光伏产业(安徽)控股有限公司 | OGS capacitive touch screen, preparation method thereof and touch display device |
| CN108227995A (en) * | 2018-01-16 | 2018-06-29 | 晟光科技股份有限公司 | A kind of white OGS touch screen photographic hole screen printing method for solving the problems, such as aberration |
| CN113748405A (en) * | 2019-04-15 | 2021-12-03 | 电子触控产品解决方案 | Laser ablation gradient zones for touch screens |
| CN110688033A (en) * | 2019-09-12 | 2020-01-14 | 东莞市宏凯光电有限公司 | FOG touch screen and production process thereof |
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