CN119738865A - Control method for measuring beam transverse profile and emittance and beam diagnostic system - Google Patents
Control method for measuring beam transverse profile and emittance and beam diagnostic system Download PDFInfo
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Abstract
本发明涉及重离子加速器束流诊断技术领域，特别是涉及一种测量束流横向剖面和发射度的控制方法及束流诊断系统。控制方法包括：S1、设定测量方向、测量过程中测量探针的扫描范围和速度；S2、向可编程逻辑控制器和数据采集电子学发送开始测量指令；S3、获取可编程逻辑控制器回传的测量探针位置数据；接收到数据采集电子学采集结束信号，将束流流强数据存储到相应的流强数据结构中；S4、根据探针位置数据和束流流强数据，求取束流横向剖面、束流横向发射度的测量结果。本发明中，利用探针位置数据和束流流强数据能够对束流横向剖面和束流横向发射度快速进行准确测量，从而改善了束流匹配运输、提高了束流传输效率，加快了加速器束流调试的进程。
The present invention relates to the field of heavy ion accelerator beam diagnosis technology, and in particular to a control method for measuring beam transverse profile and emittance and a beam diagnosis system. The control method comprises: S1, setting the measurement direction, the scanning range and speed of the measuring probe during the measurement process; S2, sending a start measurement instruction to a programmable logic controller and data acquisition electronics; S3, obtaining the measurement probe position data returned by the programmable logic controller; receiving the acquisition end signal of the data acquisition electronics, storing the beam current intensity data in the corresponding current intensity data structure; S4, obtaining the measurement results of the beam transverse profile and the beam transverse emittance according to the probe position data and the beam current intensity data. In the present invention, the probe position data and the beam current intensity data can be used to quickly and accurately measure the beam transverse profile and the beam transverse emittance, thereby improving the beam matching transportation, improving the beam transmission efficiency, and accelerating the process of accelerator beam debugging.
Description
Technical Field
The invention relates to the technical field of beam diagnosis of heavy ion accelerators, in particular to a control method for measuring beam transverse section and emittance and a beam diagnosis system.
Background
The beam diagnostic system is one of the very important systems on heavy ion accelerators. Beam diagnostic systems, often referred to as the "eye" of the accelerator, can help physical personnel perform effective machine debugging of the accelerator. The beam diagnosis content comprises measurement and monitoring of various parameters such as beam energy, beam intensity, emittance and the like, and can ensure the parameter matching and stable operation of the beam in the front and rear sections of the accelerator. The beam transverse section and the beam transverse emittance are key parameters affecting the beam quality. The beam transverse emittance refers to the degree to which charged particles in the beam are spatially dispersed in the transverse phase. The increase in the lateral emittance of the beam and the resulting beam loss are critical factors affecting the operation of the accelerator.
However, a method capable of rapidly and accurately measuring the transverse beam profile and the transverse beam emittance is lacking at present, so that the process of debugging beam parameters by a physical person operating an accelerator is slower. In view of the foregoing, there is a need for a control method that can assist a physical person operating an accelerator to debug beam parameters and speed up the process of beam adjustment of the accelerator.
Disclosure of Invention
The present invention is directed to solving at least one of the technical problems existing in the related art. Therefore, the invention provides a control method for measuring the transverse profile and the emittance of beam and a beam diagnosis system, so as to realize the purposes of assisting the personnel operating the accelerator to debug the beam parameters and accelerating the beam debugging process of the accelerator.
In a first aspect, the present invention provides a control method for measuring a beam transverse profile and emittance, the control method comprising:
S1, setting a measuring direction, and setting a scanning range and a scanning speed of a measuring probe in a measuring process;
s2, sending a measurement starting instruction to the programmable logic controller and the data acquisition electronics;
s3, acquiring position data of a measurement probe returned by the programmable logic controller;
receiving a data acquisition electronics acquisition end signal, and storing beam intensity data into a corresponding beam intensity data structure;
S4, according to the position data of the measuring probe and the beam intensity data, measuring results of the beam transverse section and the beam transverse emittance are obtained.
According to the control method for measuring the transverse profile and the emittance of the beam, after sending a measurement starting instruction to the programmable logic controller and the data acquisition electronics, the control method further comprises the following steps:
S21, judging whether the interception type probe interferometrically measures the probe movement, and controlling to execute a measurement starting instruction when the judgment result is negative.
According to the method for controlling the transverse profile and the emittance of the measuring beam, after the position data of the measuring probe returned by the programmable logic controller are obtained, the method further comprises the following steps:
And extracting the position information of the measurement probe according to all probe position data returned by the programmable logic controller, and storing the position information into a corresponding position data structure.
According to the control method for measuring the transverse profile and the emittance of the beam, the measuring direction comprises a horizontal direction and a vertical direction.
According to the control method for measuring the transverse profile and the emittance of the beam, the scanning range and the scanning speed of the measuring probe in the measuring process are set, and the method comprises the following steps:
setting the scanning range and speed of a profile measuring probe when measuring the transverse profile of the beam;
When measuring the transverse emittance of the beam, setting the scanning range and the step length of the first emittance measuring probe, and setting the scanning range and the speed of the second emittance measuring probe.
According to the control method for measuring the transverse profile and the emittance of the beam, provided by the invention, the scanning range of the measuring probe is correspondingly set according to the inner diameter of the vacuum pipeline and the limit of the motor of the measuring probe.
According to the control method for measuring the transverse profile and the emittance of the beam, the judging whether the interception probe interferometry probe moves comprises the following steps:
when measuring the beam transverse profile, if detecting the movement of the interception probe interference profile measuring probe, re-executing a measurement starting instruction;
And when the transverse emittance of the beam is measured, if the interception type probe is detected to interfere the movement of the first emittance measuring probe and the second emittance measuring probe, stopping executing the measurement starting instruction.
According to the control method for measuring the transverse profile and the emittance of the beam, provided by the invention, the measuring process can be interrupted at any time and the measuring starting state can be recovered in the process of measuring the transverse emittance of the beam.
According to the control method for measuring the beam transverse section and the emittance provided by the invention, the method for obtaining the measurement results of the beam transverse section and the beam transverse emittance comprises the following steps:
And calculating an angle value according to the position data of the first emittance measuring probe and the second emittance measuring probe and the distance between the first emittance measuring probe and the second emittance measuring probe, and calculating the transverse emittance of the beam current according to the angle value, the position data of the first emittance measuring probe and the beam current intensity data.
In a second aspect, the present invention further provides a beam diagnosis system, which adopts the control method for measuring the beam transverse profile and the emittance according to any one of the above aspects;
The beam diagnostic system includes:
The motion control module is used for remotely controlling the programmable logic controller;
the data acquisition module is used for carrying out information interaction with the data acquisition electronics;
and the data processing module is used for receiving and analyzing the data packet of the measuring probe position transmitted by the programmable logic controller.
The above technical solutions in the present invention have at least one of the following technical effects:
The beam transverse section and the beam transverse emittance can be rapidly and accurately measured by acquiring the probe position data and the beam intensity data, so that beam matching transportation is improved, beam transmission efficiency is improved, and the process of beam debugging of the accelerator is accelerated.
In addition to the technical problems, features of the constituent technical solutions and advantages brought by the technical features of the technical solutions described above, other technical features of the present invention and advantages brought by the technical features of the technical solutions will be further described with reference to the accompanying drawings or will be understood through practice of the present invention.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the related art, the drawings that are required to be used in the embodiments or the related technical descriptions will be briefly described, and it is apparent that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to the drawings without inventive effort for those skilled in the art.
Fig. 1 is a flow chart of a control method for measuring a beam transverse section and emittance according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of a control method for measuring a transverse cross section of a beam according to an embodiment of the present invention.
Fig. 3 is a schematic diagram of a control method for measuring beam transverse emittance according to an embodiment of the present invention.
Fig. 4 is a flowchart of offline data analysis of measurement results of beam transverse emittance according to an embodiment of the present invention.
Fig. 5 is a flowchart of a computer receiving PLC backhaul data according to an embodiment of the present invention.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly described below with reference to the accompanying drawings in which it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
In the description of the embodiments of the present invention, it should be noted that the terms "center", "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are merely for convenience in describing the embodiments of the present invention and simplifying the description, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the embodiments of the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In describing embodiments of the present invention, it should be noted that, unless explicitly stated or limited otherwise, the terms "connected," "connected," and "coupled" should be construed broadly, and may be, for example, fixedly connected, detachably connected, integrally connected, mechanically connected, electrically connected, directly connected, or indirectly connected via an intermediate medium. The specific meaning of the above terms in embodiments of the present invention will be understood in detail by those of ordinary skill in the art.
In embodiments of the invention, unless expressly specified and limited otherwise, a first feature "up" or "down" on a second feature may be that the first and second features are in direct contact, or that the first and second features are in indirect contact via an intervening medium. Moreover, a first feature "above," "over" and "on" a second feature may be a first feature directly above or obliquely above the second feature, or simply indicate that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the embodiments of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
In the present invention, PLC is an abbreviation for programmable logic controller (Programmable Logic Controller). It is a digital operation electronic system.
The data acquisition electronics refers to the hardware device that acquires beam signals during the process of measuring the beam transverse profile and the transverse emittance. Data acquisition electronics are typically used to capture analog or digital signals and convert such information into a form of data that can be processed by a computer.
In order to assist a physical person operating the accelerator to debug beam parameters, the beam debugging process of the accelerator is accelerated. In an embodiment of the invention, a control method for measuring the transverse profile and emittance of a beam is introduced.
As shown in FIG. 1, the control method mainly comprises the steps of S1, setting a measuring direction, and setting the scanning range and the speed of a measuring probe in the measuring process. S2, sending a measurement starting instruction to the programmable logic controller and the data acquisition electronics. And S3, acquiring position data of the measuring probe returned by the programmable logic controller, receiving a data acquisition end signal of the data acquisition electronics, and storing the beam intensity data into a corresponding stream intensity data structure. S4, according to the probe position data and the beam intensity data, measuring results of the beam transverse section and the beam transverse emittance are obtained.
Further, after the measurement starting instruction is sent to the programmable logic controller and the data acquisition electronics, S21 is further included, whether the interception type probe interferes with the measurement probe movement is judged, and when the judgment result is negative, the measurement starting instruction is controlled to be executed.
Further, after the position data of the measurement probe returned by the programmable logic controller is obtained, the method further comprises the steps of extracting the position information of the measurement probe according to all the position data of the probe returned by the programmable logic controller, and storing the position information into a corresponding position data structure.
Wherein the measurement direction includes both horizontal and vertical directions.
In the embodiment, the beam transverse section and the beam transverse emittance can be rapidly and accurately measured by acquiring the position data of the measuring probe and the beam intensity data, so that beam matching transportation is improved, beam transmission efficiency is improved, and the process of beam debugging of the accelerator is accelerated.
According to the control method for measuring the transverse profile and the emittance of the beam, the setting of the scanning range and the scanning speed of the measuring probe in the measuring process comprises the step of setting the scanning range and the scanning speed of the profile measuring probe when the transverse profile of the beam is measured. When measuring the transverse emittance of the beam, setting the scanning range and the step length of the first emittance measuring probe, and setting the scanning range and the speed of the second emittance measuring probe.
Further, the scanning range of the measuring probe is correspondingly set according to the inner diameter of the vacuum pipeline and the motor limit of the measuring probe.
Further, judging whether the interception type probe interferometry probe moves comprises the step of re-executing a measurement starting instruction if the interception type probe interferometry probe is detected to move when the beam transverse section is measured, and the step of terminating executing the measurement starting instruction if the interception type probe interferometry probe is detected to interfere with the movement of the first emittance measurement probe and the second emittance measurement probe when the beam transverse emittance is measured.
In addition, in the process of measuring the transverse emittance of the beam, the measuring process can be interrupted at any time and the state of starting the measurement can be restored.
Further, the measuring results of the beam transverse section and the beam transverse emittance comprise the steps of calculating an angle value according to the position data of the first emittance measuring probe and the second emittance measuring probe and the distance between the first emittance measuring probe and the second emittance measuring probe, and then calculating the beam transverse emittance according to the angle value, the position data of the first emittance measuring probe and the beam intensity data.
Specifically, there are some subtle differences in the control methods that measure the beam transverse profile and the beam transverse emittance. Accordingly, the following describes in detail the control method for measuring the beam transverse profile and the beam transverse emittance, respectively.
As shown in fig. 2, the measurement direction of the beam transverse profile is input to the computer. The measuring direction of the beam transverse section is divided into horizontal measurement and vertical measurement.
The scan range and speed of the profiling probe are input to the computer. After confirming that the error is avoided, inputting a measurement starting instruction to a computer, and sending a measurement command about the transverse profile of the beam to the PLC and the data acquisition electronics by the computer to wait for the end of the data acquisition of the PLC and the data acquisition electronics.
If the computer detects other intercept probe interferometry probe movements, then execution of the start measurement instruction is not allowed.
The computer receives probe position data returned by the PLC, extracts the position information of the measuring probe, and stores the position information into a corresponding position data structure.
And the computer receives the data acquisition electronic acquisition end signal and stores the beam intensity data into a corresponding beam intensity data structure.
And finally, the computer obtains the measurement result of the transverse beam profile according to the probe position data and the beam intensity data. In particular, the measurement result of the beam transverse section can be intuitively displayed on the graphical man-machine interaction interface. At the same time, the beam transverse profile measurements can be saved for offline analysis by physical personnel operating the accelerator.
As shown in fig. 3, the control method for measuring the transverse emittance of the beam is described in detail as follows:
and inputting the measuring direction of the beam transverse emittance into a computer. The measuring direction of the beam transverse emittance is divided into horizontal measurement and vertical measurement.
The scan range and the step size of the first emittance measurement probe are input to a computer. The scan range and speed of the second emittance measurement probe are input to the computer. The scanning range of the first emittance measuring probe is set according to the inner diameter of the vacuum pipeline where the first emittance measuring probe is located and the limit of the motor of the first emittance measuring probe. The step size of the first emittance measurement probe determines the number of times the first emittance measurement probe moves within the scanning range. The scanning range of the second emittance measuring probe is set according to the inner diameter of the vacuum pipeline where the second emittance measuring probe is positioned and the limit of a motor of the second emittance measuring probe. The speed of the second emittance measurement probe determines the speed at which the second emittance measurement probe moves within the scan range.
And inputting a measurement starting instruction to a computer, and sending a measurement command about the transverse emittance of the beam to the PLC and the data acquisition electronics by the computer, wherein the PLC and the data acquisition electronics wait for data acquisition to be finished.
In particular, if the computer detects that the other intercept probe interferes with the first and second emittance measurement probe movements, the start measurement instruction is not allowed to be executed. And when the transverse emittance of the beam is measured, the measurement process can be interrupted at any time and the state of starting the measurement can be restored.
The computer receives probe position data returned by the PLC, extracts the position information of the first emittance measuring probe and the second emittance measuring probe, and stores the position information into a corresponding position data structure.
And the computer receives the data acquisition electronic acquisition end signal and stores the beam intensity data into a corresponding beam intensity data structure.
Finally, the computer calculates an angle value according to the position data of the first emittance measuring probe and the second emittance measuring probe and the distance between the two probes. And the computer obtains the measurement result of the transverse beam emittance by the angle value, the position data of the first emittance measurement probe and the beam intensity data.
Meanwhile, the measurement result of the beam transverse emittance can be intuitively displayed on the graphical man-machine interface. And the measurement result of the beam transverse emittance can be stored locally, so that the physical personnel operating the accelerator can conveniently perform offline analysis. And restoring the emittance elliptical phase space by utilizing twiss parameters, and carrying out secondary verification on the measurement result of the beam transverse emittance, thereby further ensuring the accuracy and reliability of the measurement result of the beam transverse emittance.
As shown in FIG. 4, the method for automatically performing off-line analysis on the stored measurement result of the beam transverse emittance by the computer is as follows, namely, receiving the user input of a data file storage path of the measurement result of the beam transverse emittance. The content of the data file of the measurement result of the beam transverse emittance is divided into 3 columns, the first column of data is the position data of the measurement probe of the first emittance, the second column of data is the position data of the measurement probe of the second emittance, and the third column of data is the beam intensity data at the position corresponding to the probe.
Uploading the measurement result of the transverse emittance of the beam to a computer, and storing the data in a corresponding calculation data structure. And receiving measurement background data input by a user, wherein the default measurement background data value is 0. The computer uses twiss parameter calculation results and combines the emittance ellipse calculation formula:
Wherein β, α and γ are Twiss parameters, also known as Courant-Snyder parameters, used to describe beam characteristics in the particle accelerator, and a represents the elliptical area.
Drawing an emittance ellipse, and carrying out secondary authentication on the measurement result of the beam transverse emittance.
As shown in fig. 5, the method for receiving PLC backhaul data by the computer includes:
And waiting for PLC connection, judging the connection state of the PLC, and if the PLC connection is performed, judging whether the length of the received data of the computer is greater than 0.
If the computer received data length is greater than 0, then judging whether the received data contains an end marker. If the received data contains the end marker, stopping receiving the data, and executing the data analysis command by the computer.
And the computer executes the data analysis command and calculates the total point acquired by the current experiment according to the type of the user instruction.
The computer executes the data analysis command, which comprises judging whether the command is a measurement command related to the transverse beam profile, if so, calculating the total point number corresponding to the transverse beam profile, and if not, judging whether the command is a measurement command related to the transverse beam emittance, and if so, calculating the total point number corresponding to the transverse beam emittance.
Specifically, if the measurement instruction about the transverse section of the beam is currently executed, the total point acquired in the current experiment is the point acquired by the second emittance measurement probe in one scan. If the emittance measurement instruction is currently executed, the total point number acquired in the current experiment is the product of the point number acquired once by the second emittance measurement probe and the step number of the first emittance measurement probe. And the computer acquires total points according to the current experiment, extracts the position data of the corresponding probe in the PLC return data, stores the position data into a corresponding data structure and finally generates probe position information data.
For example, currently executing measurement instructions regarding the beam transverse profile extracts probe position data and stores it in a profile data structure. Currently executed are measurement instructions regarding the beam transverse emittance, probe position data are extracted and stored in an emittance data structure.
The step of calculating the measurement result of the beam transverse emittance comprises the step of calculating an angle matrix X' according to the position matrix X of the first emittance measurement probe, the position matrix Y of the second emittance measurement probe and the distance L between the first emittance measurement probe and the second emittance measurement probe.
Wherein the angle matrix X' is calculated by the following formula:
X'=(Y-X)/L (1)
specifically, the emittance refers to the two-dimensional phase space occupation area of charged particles in the beam at the abscissa, and the ordinate is the angle, and represents the transverse size and the advancing angle information of the beam. Emittance is generally denoted epsilon, and root mean square emittance can be further calculated according to the following formula:
(2)
Wherein, Calculated from the square of X and the weighting method,Calculated by the square sum weighting method of X', so that the calculation result is as accurate as possible.
Specifically, the sum of squares weighting method is a method commonly used in mathematics, statistics, and machine learning. By this method, the matrix array can be converted into a single metric value while taking into account the weight of each value.
In addition, twiss parameters α, β, γ are important parameters for beam transverse emittance during beam injection and transport in the accelerator. At the start of the beam, the divergence and focus of the beam are represented, and at the end of the beam, the size and variation in the divergence are represented. The Twiss parameters were further calculated by the following formula:
(3); (4); (5)。
In another aspect, another embodiment of the present invention introduces a beam diagnostic system based on the same inventive concept. The beam diagnostic system adopts the control method for measuring the beam transverse profile and the emittance described in any one of the embodiments.
The beam diagnosis system mainly comprises a motion control module, a data acquisition module and a data processing module. The motion control module is used for remote control of the programmable logic controller. The data acquisition module is used for carrying out information interaction with the data acquisition electronics. The data processing module is used for receiving and analyzing the data packet of the measuring probe position transmitted by the programmable logic controller.
Specifically, the data processing module is used for calculating an angle value according to the position data of the first emittance measuring probe, the position data of the second emittance measuring probe and the distance between the first emittance measuring probe and the second emittance measuring probe. And forming a three-dimensional array by the position data, the angle value and the beam intensity data, and generating a final beam transverse emittance measurement result.
The motion control module is used for determining that the measured direction is the horizontal direction or the vertical direction.
The first horizontal emittance measuring probe and the second horizontal emittance measuring probe are adopted in the horizontal direction to measure the beam transverse emittance in the horizontal direction.
The vertical direction measurement adopts a first vertical emittance measurement probe and a second vertical emittance measurement probe to measure the beam transverse emittance in the vertical direction.
Further, determining the measuring range and step length of the first emittance measuring probe and the measuring range and speed of the second emittance measuring probe, which are used for determining the scanning mode of the current measuring transverse emittance.
The data acquisition module is used for carrying out information interaction with the data acquisition electronics. Before beam signal acquisition, the data acquisition module transmits acquisition aggregate points to data acquisition electronics, and then transmits an acquisition start command. After the data acquisition electronics receive the acquisition command, the data acquisition electronics start to acquire and record the acquired points. And if the acquired points are equal to the total points, stopping acquisition and sending the beam signal information to the data acquisition module. And after receiving the current emittance measurement beam signal information, the data acquisition module stores the current emittance measurement beam signal information into a local data structure. If the measurement of the transverse emittance is stopped midway, the data acquisition module sends a clear command to the data acquisition electronics and restores the data acquisition state of the data acquisition electronics to be an initial state.
It should be noted that the above-mentioned embodiments are merely for illustrating the technical solution of the present invention, and not for limiting the same, and although the present invention has been described in detail with reference to the above-mentioned embodiments, it should be understood by those skilled in the art that the technical solution described in the above-mentioned embodiments may be modified or some technical features may be equivalently replaced, and these modifications or substitutions do not make the essence of the corresponding technical solution deviate from the spirit and scope of the technical solution of the embodiments of the present invention.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, alternatives, and improvements that fall within the spirit and scope of the invention.
Claims (10)
1. A control method for measuring beam transverse profile and emittance, comprising:
S1, setting a measuring direction, and setting a scanning range and a scanning speed of a measuring probe in a measuring process;
s2, sending a measurement starting instruction to the programmable logic controller and the data acquisition electronics;
s3, acquiring position data of a measurement probe returned by the programmable logic controller;
receiving a data acquisition electronics acquisition end signal, and storing beam intensity data into a corresponding beam intensity data structure;
S4, according to the position data of the measuring probe and the beam intensity data, measuring results of the beam transverse section and the beam transverse emittance are obtained.
2. The method of claim 1, wherein after sending a start measurement command to the programmable logic controller and the data acquisition electronics, further comprising:
S21, judging whether the interception type probe interferometrically measures the probe movement, and controlling to execute a measurement starting instruction when the judgment result is negative.
3. The method for controlling the transverse profile and the emittance of a measurement beam according to claim 1, wherein after the obtaining the position data of the measurement probe returned by the programmable logic controller, the method further comprises:
And extracting the position information of the measurement probe according to all probe position data returned by the programmable logic controller, and storing the position information into a corresponding position data structure.
4. A method of controlling the cross-section and emittance of a measuring beam as claimed in any one of claims 1 to 3, wherein the measuring directions include both horizontal and vertical directions.
5. The method according to claim 2, wherein the setting the scanning range and speed of the measuring probe in the measuring process comprises:
setting the scanning range and speed of a profile measuring probe when measuring the transverse profile of the beam;
When measuring the transverse emittance of the beam, setting the scanning range and the step length of the first emittance measuring probe, and setting the scanning range and the speed of the second emittance measuring probe.
6. The method according to claim 5, wherein the scanning range of the measuring probe is set correspondingly according to the inner diameter of the vacuum pipe and the limit of the motor of the measuring probe.
7. The method for controlling a transverse profile and emittance of a beam as claimed in claim 6, the method is characterized in that the judging whether the interception type probe interferometrically measures the probe motion comprises the following steps:
when measuring the beam transverse profile, if detecting the movement of the interception probe interference profile measuring probe, re-executing a measurement starting instruction;
And when the transverse emittance of the beam is measured, if the interception type probe is detected to interfere the movement of the first emittance measuring probe and the second emittance measuring probe, stopping executing the measurement starting instruction.
8. The method according to claim 7, wherein the measuring process is interrupted and the state of starting the measurement is restored at any time during the measuring process of the transverse emittance of the beam.
9. The method according to claim 5, wherein the determining the measurement results of the beam transverse profile and the beam transverse emittance comprises:
And calculating an angle value according to the position data of the first emittance measuring probe and the second emittance measuring probe and the distance between the first emittance measuring probe and the second emittance measuring probe, and calculating the transverse emittance of the beam current according to the angle value, the position data of the first emittance measuring probe and the beam current intensity data.
10. A beam diagnostic system, characterized in that a control method for measuring beam transverse profile and emittance according to any one of claims 1 to 9 is employed;
The beam diagnostic system includes:
The motion control module is used for remotely controlling the programmable logic controller;
the data acquisition module is used for carrying out information interaction with the data acquisition electronics;
and the data processing module is used for receiving and analyzing the data packet of the measuring probe position transmitted by the programmable logic controller.
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