CN115728250B - Semiconductor carrier dynamics test instrument and test method - Google Patents

Semiconductor carrier dynamics test instrument and test method Download PDF

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CN115728250B
CN115728250B CN202211494034.1A CN202211494034A CN115728250B CN 115728250 B CN115728250 B CN 115728250B CN 202211494034 A CN202211494034 A CN 202211494034A CN 115728250 B CN115728250 B CN 115728250B
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林乾乾
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Wuhan University WHU
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Abstract

The invention discloses a semiconductor carrier dynamics test instrument and a test method, wherein the semiconductor carrier dynamics test method comprises the following steps: placing a semiconductor sample in a microwave resonant cavity; providing continuous excitation light to excite the semiconductor sample to generate carriers, and providing steady-state bias background light to fill defect states of the semiconductor; a microwave analyzer is adopted as a microwave source and a detector to detect the microwave signal of the semiconductor, so as to obtain a time-resolved microwave photoconductive curve; carrying out frequency sweep of the whole frequency band on the microwave signal to obtain a time resolution microwave spectrum; and acquiring semiconductor carrier dynamics information according to the time-resolved microwave spectrum. The test method can effectively distinguish different carrier dynamics processes caused by carrier radiation recombination and defect capture.

Description

一种半导体载流子动力学测试仪器及测试方法A semiconductor carrier dynamics test instrument and test method

技术领域Technical Field

本发明涉及半导体材料检测技术领域,尤其涉及半导体载流子动力学测试仪器及测试方法。The present invention relates to the technical field of semiconductor material detection, and in particular to a semiconductor carrier dynamics testing instrument and a testing method.

背景技术Background Art

近几年,随着信息技术和微电子领域的飞速发展,人们对半导体材料和半导体器件的需求也逐年增长。实际应用中,工程技术人员经常需要对半导体晶圆的质量进行检测,以往抽样送检的方式,往往效率低下且成本较高。而常规的电学性能测试和光学性能测试又是比较独立的,比如利用反射、吸收和荧光光谱等来表征半导体材料的吸收因子、折射率和禁带宽度等。利用四探针法和霍尔效应测试半导体材料的导电率、载流子迁移率和载流子浓度等。利用LCR表测试不同频率下材料的介电性能。但这些常规的测试只能测试获得比较基础的信息,而且测试繁杂、需要各类仪器配合使用。此外,对于半导体材料的光电性能测试,尤其是载流子动力学方面的测试(包括载流子寿命和迁移率等重要参数)。In recent years, with the rapid development of information technology and microelectronics, people's demand for semiconductor materials and semiconductor devices has also increased year by year. In practical applications, engineering and technical personnel often need to test the quality of semiconductor wafers. The previous sampling inspection method is often inefficient and costly. Conventional electrical performance tests and optical performance tests are relatively independent. For example, reflection, absorption and fluorescence spectra are used to characterize the absorption factor, refractive index and band gap of semiconductor materials. The conductivity, carrier mobility and carrier concentration of semiconductor materials are tested using the four-probe method and the Hall effect. The dielectric properties of materials at different frequencies are tested using an LCR meter. However, these conventional tests can only obtain relatively basic information, and the tests are complicated and require the use of various instruments. In addition, for the photoelectric performance test of semiconductor materials, especially the test of carrier dynamics (including important parameters such as carrier lifetime and mobility).

通过时间分辨光致发光(TRPL)来研究电荷载流子动力学。一旦半导体被脉冲激光所激发,它就会自发地产生电荷载流子,这些载流子可以以辐射或非辐射的方式相互重组。然而,TRPL衰变只能反映辐射过程。如果需要全面了解整个载流子的电荷复合,还必须确定非辐射复合损耗。对于大多数有效的铅基钙钛矿,复合损耗确实可以由辐射部分主导。因此,由TRPL确定的寿命或多或少地代表了它们的光电性能,并且可能与器件性能密切相关。然而,最近开发的2D/3D钙钛矿、锡基钙钛矿和添加剂增强钙钛矿显示出由时间分辨微波传导率(TRMC)测试确定的超长载流子寿命。原则上,如果非辐射损耗可以忽略不计,则TRMC衰减应与TRPL衰减重叠。然而,如果样品中的浅陷阱引起额外的电荷捕获和去捕获过程,则光激发后的电荷载流子衰变可能会更复杂,需要额外的技术来表征这些非辐射复合损耗。Charge carrier dynamics are studied by time-resolved photoluminescence (TRPL). Once a semiconductor is excited by a pulsed laser, it spontaneously generates charge carriers that can recombine with each other in either a radiative or non-radiative manner. However, TRPL decays can only reflect radiative processes. If a comprehensive understanding of the charge recombination of the entire charge carriers is required, non-radiative recombination losses must also be determined. For most efficient lead-based perovskites, the recombination losses can indeed be dominated by the radiative part. Therefore, the lifetime determined by TRPL is more or less representative of their optoelectronic properties and can be closely related to the device performance. However, recently developed 2D/3D perovskites, tin-based perovskites, and additive-enhanced perovskites show ultra-long carrier lifetimes determined by time-resolved microwave conductivity (TRMC) tests. In principle, if non-radiative losses are negligible, the TRMC decay should overlap with the TRPL decay. However, if shallow traps in the sample induce additional charge trapping and de-trapping processes, the charge carrier decay after photoexcitation can be more complicated, and additional techniques are needed to characterize these non-radiative recombination losses.

目前市场上主流的电荷载流子动力学测试技术是瞬态荧光光谱(TRPL),也有少量国外进口的时间分辨微波光电导(TRMC)和瞬态太赫兹光谱(OPTP)。但这些高端仪器一般价格昂贵,市场保有量较低,且操作维护繁琐,对实验人员的技术要求较高,需要对光路和电学测量系统都具备较好的理论和实验基础。此外,目前市面上商业化的瞬态光电分析表征系统功能还较为单一,比如瞬态荧光光谱只能测试表征辐射复合损失,而传统的时间分辨微波光电导技术对不同缺陷能级造成的复杂动力学又缺乏有效区分手段。其中时间分辨微波光电导技术虽然在半导体迁移率表征上已有较好的应用,但目前的技术主要利用超快纳秒激光器来激发半导体,然后利用单点微波源和微波探测器来探测半导体内载流子的浓度变化,从而把载流子浓度与微波透射/反射率关联起来。但是目前主流的TRMC技术还存在不少缺点,比如不能分别区分空穴和电子的载流子迁移率,测出的是一个综合的迁移率值。此外,目前的TRMC技术,虽然也有应用白光背景的,但是受限于单点微波探测,还未见有对整个频段进行扫频获得整个波段的时间分辨频谱,而这对半导体中载流子缺陷的研究尤为重要。综上所述,目前市场上还缺少小型化、操作简单、功能强大的载流子动力学分析仪器,特别是在载流子迁移率、寿命和缺陷捕获造成的复杂动力学方面能进行分析的有效手段。At present, the mainstream charge carrier dynamics test technology on the market is transient fluorescence spectroscopy (TRPL), and there are also a small number of time-resolved microwave photoconductivity (TRMC) and transient terahertz spectroscopy (OPTP) imported from abroad. However, these high-end instruments are generally expensive, with a low market share, and cumbersome operation and maintenance. They have high technical requirements for experimental personnel and require a good theoretical and experimental foundation for both the optical path and the electrical measurement system. In addition, the functions of the commercial transient photoelectric analysis and characterization systems on the market are still relatively simple. For example, transient fluorescence spectroscopy can only test and characterize radiation recombination losses, and traditional time-resolved microwave photoconductivity technology lacks effective means to distinguish the complex dynamics caused by different defect energy levels. Among them, although time-resolved microwave photoconductivity technology has been well applied in the characterization of semiconductor mobility, the current technology mainly uses ultrafast nanosecond lasers to excite semiconductors, and then uses single-point microwave sources and microwave detectors to detect changes in carrier concentration in semiconductors, thereby correlating carrier concentration with microwave transmittance/reflectivity. However, the current mainstream TRMC technology still has many shortcomings, such as the inability to distinguish the carrier mobility of holes and electrons separately, and the measured value is a comprehensive mobility value. In addition, although the current TRMC technology also uses white light background, it is limited by single-point microwave detection and has not yet been able to scan the entire frequency band to obtain the time-resolved spectrum of the entire band, which is particularly important for the study of carrier defects in semiconductors. In summary, there is still a lack of small, easy-to-operate, and powerful carrier dynamics analysis instruments on the market, especially effective means to analyze carrier mobility, lifetime, and complex dynamics caused by defect capture.

发明内容Summary of the invention

本申请的第一目的是提供一种半导体载流子动力学测试方法,该方法是一种通过光学泵浦-微波探测的技术,额外了增加稳态偏置光对半导体的缺陷态进行选择性填充,通过对微波信号的时间分辨频谱扫描,可以有效区分半导体内不同类型的载流子动力学过程。The first purpose of the present application is to provide a semiconductor carrier dynamics testing method, which is a technology that uses optical pumping-microwave detection, and additionally adds steady-state bias light to selectively fill the defect states of the semiconductor. By scanning the time-resolved spectrum of the microwave signal, different types of carrier dynamics processes in the semiconductor can be effectively distinguished.

本申请的第二目的是提供一种半导体载流子动力学测试仪器。The second object of the present application is to provide a semiconductor carrier dynamics testing instrument.

本申请提供的技术方案具体如下:The technical solutions provided by this application are as follows:

一种半导体载流子动力学测试方法,包括:A semiconductor carrier dynamics testing method, comprising:

将半导体样品置于微波谐振腔内;Placing a semiconductor sample in a microwave resonant cavity;

提供连续激发光激发半导体样品产生载流子,同时提供稳态偏置背景光以填充半导体的缺陷态;Providing continuous excitation light to excite semiconductor samples to generate carriers, while providing steady-state bias background light to fill defect states in the semiconductor;

采用微波分析仪作为微波源和检测器,探测半导体的微波信号,获得时间分辨微波光电导曲线;A microwave analyzer is used as a microwave source and detector to detect the microwave signal of the semiconductor and obtain the time-resolved microwave photoconductivity curve;

对微波信号进行整个频段的扫频,获得时间分辨微波频谱;Sweep the microwave signal across the entire frequency band to obtain a time-resolved microwave spectrum;

根据时间分辨微波频谱获取半导体载流子动力学信息。Obtain semiconductor carrier dynamics information from time-resolved microwave spectroscopy.

在上述技术方案的基础上,改变不同偏置背景光光强和辐照波长,获得一组时间分辨微波光电导曲线,对该组时间分辨微波光电导曲线的时间分辨微波频谱进行拟合,获得载流子动力学信息。On the basis of the above technical solution, by changing different bias background light intensities and irradiation wavelengths, a set of time-resolved microwave photoconductivity curves are obtained, and the time-resolved microwave spectra of the set of time-resolved microwave photoconductivity curves are fitted to obtain carrier dynamics information.

在上述技术方案的基础上,改变不同偏置背景光光强和辐照波长,获取不同缺陷填充态下的时间分辨微波光电导曲线,根据幅值和频率的变化,计算腔体Q值或微波反射率的变化,分析半导体样品在稳态和激发态下的微波复电导特性。On the basis of the above technical scheme, the intensity and irradiation wavelength of different bias background light are changed to obtain the time-resolved microwave photoconductivity curves under different defect filling states. According to the changes in amplitude and frequency, the change in cavity Q value or microwave reflectivity is calculated, and the microwave complex conductivity characteristics of semiconductor samples in steady state and excited state are analyzed.

在上述技术方案的基础上,时间分辨微波频谱的相位对应半导体介电常数的虚部,用来分析深能级缺陷捕获的动力学;所述时间分辨微波频谱的幅值信息对应半导体介电常数的实部,用来分析载流子的光产生率和浅能级缺陷捕获造成的动力学。Based on the above technical solution, the phase of the time-resolved microwave spectrum corresponds to the imaginary part of the semiconductor dielectric constant, which is used to analyze the dynamics of deep energy level defect capture; the amplitude information of the time-resolved microwave spectrum corresponds to the real part of the semiconductor dielectric constant, which is used to analyze the carrier light generation rate and the dynamics caused by shallow energy level defect capture.

在上述技术方案的基础上,根据时间分辨微波频谱分析半导体载流子动力学包括:拟合不同的时间分辨微波频谱,分析半导体缺陷的能级和密度。On the basis of the above technical solution, analyzing semiconductor carrier dynamics according to time-resolved microwave spectra includes: fitting different time-resolved microwave spectra and analyzing the energy level and density of semiconductor defects.

在上述技术方案的基础上,该方法还包括:检测不同时间延迟下微波信号的衰减,记录半导体样品中载流子的动态过程。On the basis of the above technical solution, the method also includes: detecting the attenuation of the microwave signal under different time delays and recording the dynamic process of carriers in the semiconductor sample.

在上述技术方案的基础上,该方法还包括:On the basis of the above technical solution, the method further comprises:

比较不同的时间分辨微波频谱,解析出微波信号中相位和幅值信息的变化,区分半导体内不同类型的载流子动力学过程。Compare different time-resolved microwave spectra, analyze the changes in phase and amplitude information in microwave signals, and distinguish different types of carrier dynamics processes in semiconductors.

本申请提供的半导体载流子动力学测试仪器,包括:The semiconductor carrier dynamics testing instrument provided in this application includes:

激发光光源,其用于向半导体样品提供脉冲激发光,以激发半导体样品产生光生载流子;An excitation light source, which is used to provide pulsed excitation light to the semiconductor sample to excite the semiconductor sample to generate photogenerated carriers;

背景光光源,其用于向半导体样品提供不同光强的偏置背景光,以填充半导体样品的不同缺陷态;A background light source, which is used to provide biased background light of different light intensities to the semiconductor sample to fill different defect states of the semiconductor sample;

微波分析仪,其用作微波源和检测器,其用于获取时间分辨微波频谱。A microwave analyzer, which acts as a microwave source and detector, is used to acquire a time-resolved microwave spectrum.

在上述技术方案的基础上,所述半导体载流子动力学测试仪器还包括:On the basis of the above technical solution, the semiconductor carrier dynamics test instrument further includes:

光谱仪,其用于记录稳态光致发光光谱;a spectrometer for recording steady-state photoluminescence spectra;

时间相关单光子计数器,其用于获取时间分辨光致发光光谱。A time-correlated single photon counter is used to acquire time-resolved photoluminescence spectra.

在上述技术方案的基础上,半导体载流子动力学测试仪器还包括:On the basis of the above technical solution, the semiconductor carrier dynamics test instrument also includes:

光纤耦合器,所述光纤耦合器用于所述脉冲激发光和所述偏置背景光耦合到一根光纤上;和A fiber coupler, used for coupling the pulsed excitation light and the biased background light to one optical fiber; and

混光器,所述混光器用于接受所述光纤传递的脉冲激发光和偏置背景光,并将二者混匀。The optical mixer is used to receive the pulse excitation light and the bias background light transmitted by the optical fiber and mix the two.

在上述技术方案的基础上,激发光光源的脉冲重复频率、激光功率密度、波长连续可调。进一步地,激发光光源的脉冲重复频率在1Hz~1kHz之间连续可调,激光功率密度在100nJ/cm2~100μJ/cm2之间连续可调;脉冲激发光的脉冲宽度在20fs到20ns之间,波长在190nm~2400nm之间。On the basis of the above technical solution, the pulse repetition frequency, laser power density and wavelength of the excitation light source are continuously adjustable. Further, the pulse repetition frequency of the excitation light source is continuously adjustable between 1Hz and 1kHz, and the laser power density is continuously adjustable between 100nJ/ cm2 and 100μJ/ cm2 ; the pulse width of the pulse excitation light is between 20fs and 20ns, and the wavelength is between 190nm and 2400nm.

在上述技术方案的基础上,偏置背景光的光强和波长可调。进一步地,偏置背景光的光强在0~100mW/cm2之间连续可调、波长在400nm~3500nm之间连续可调。On the basis of the above technical solution, the intensity and wavelength of the biased background light are adjustable. Further, the intensity of the biased background light is continuously adjustable between 0 and 100 mW/ cm2 , and the wavelength is continuously adjustable between 400 nm and 3500 nm.

在上述技术方案的基础上,微波源的频段连续可调。进一步地,微波源的频段在1GHz~18GHz之间连续可调,微波发射和接收的时间分辨率为5ns~10ns。Based on the above technical solution, the frequency band of the microwave source is continuously adjustable. Further, the frequency band of the microwave source is continuously adjustable between 1 GHz and 18 GHz, and the time resolution of microwave emission and reception is 5 ns to 10 ns.

本发明具有以下优点和有益效果:The present invention has the following advantages and beneficial effects:

(1)本发明采用非接触的光学测试技术,可以在半导体薄膜样品上直接测试样品的电学特性,包括载流子迁移率、寿命、介电常数和复导电率等。(1) The present invention adopts non-contact optical testing technology, which can directly test the electrical properties of semiconductor thin film samples, including carrier mobility, lifetime, dielectric constant and complex conductivity.

(2)本发明通过背景光偏置可以有效区分和填充缺陷态,并研究缺陷态对半导体载流子动力学的影响。(2) The present invention can effectively distinguish and fill defect states through background light bias, and study the influence of defect states on semiconductor carrier dynamics.

(3)本发明利用分析微波的频谱变化,可以有效研究半导体材料的复导电率和复介电常数,并区分不同缺陷能级对半导体载流子动力学的影响。(3) The present invention utilizes the analysis of microwave spectrum changes to effectively study the complex conductivity and complex dielectric constant of semiconductor materials and distinguish the effects of different defect energy levels on semiconductor carrier dynamics.

(4)本发明通过调控微波腔和光激发条件,可以研究不同类型半导体材料,包括硅、砷化镓、氮化镓、杂化钙钛矿、有机半导体和硫族化物半导体等。(4) The present invention can study different types of semiconductor materials, including silicon, gallium arsenide, gallium nitride, hybrid perovskite, organic semiconductors and chalcogenide semiconductors, by regulating the microwave cavity and light excitation conditions.

附图说明BRIEF DESCRIPTION OF THE DRAWINGS

以下利用附图对本发明作进一步说明,但附图中的实施例不构成对本发明的任何限制。The present invention will be further described below with reference to the accompanying drawings, but the embodiments in the accompanying drawings do not constitute any limitation to the present invention.

图1是各实施例中所用的半导体载流子动力学测试仪器示意图;FIG1 is a schematic diagram of a semiconductor carrier dynamics testing instrument used in various embodiments;

图2是实施例1中氮化镓薄膜的时间分辨微波光电导频谱;FIG2 is a time-resolved microwave photoconductivity spectrum of the gallium nitride film in Example 1;

图3为实施例1氮化镓薄膜样品的时间分辨微波光电导曲线;FIG3 is a time-resolved microwave photoconductivity curve of the gallium nitride thin film sample of Example 1;

图4为实施例2中不同钙钛矿薄膜的时间分辨微波光电导曲线;FIG4 is a time-resolved microwave photoconductivity curve of different perovskite films in Example 2;

图5为实施例2中不同钠离子掺杂浓度钙钛矿的时间分辨微波光电导曲线;FIG5 is a time-resolved microwave photoconductivity curve of perovskite with different sodium ion doping concentrations in Example 2;

图6为实施例3中不同偏置背景光下的时间分辨微波光电导曲线;FIG6 is a time-resolved microwave photoconductivity curve under different bias background lights in Example 3;

图7为实施例3中没有偏置背景光(a)和有偏置背景光(b)的二维TRMC图谱;FIG7 is a two-dimensional TRMC spectrum without bias background light (a) and with bias background light (b) in Example 3;

图8为实施例4中不同无机半导体材料的时间分辨微波光电导曲线。FIG8 is a time-resolved microwave photoconductivity curve of different inorganic semiconductor materials in Example 4.

具体实施方式DETAILED DESCRIPTION

为使本发明更加容易理解,下面将进一步阐述本发明的具体实施例。In order to make the present invention easier to understand, specific embodiments of the present invention will be further described below.

如图1所示,本申请提供的半导体载流子动力学测试仪器,包括激发光光源、背景光光源、光谱仪、时间相关单光子计数器、微波谐振腔、微波分析仪。As shown in FIG1 , the semiconductor carrier dynamics testing instrument provided in the present application includes an excitation light source, a background light source, a spectrometer, a time-correlated single photon counter, a microwave resonant cavity, and a microwave analyzer.

其中,激发光光源可以是脉冲激光或超快脉冲型发光二极管,激发光脉冲宽度在20fs到20ns之间,激发光光强可以连续可调,其强度在100nJ/cm2~100μJ/cm2。激发光的波长也可调,在190nm~2400nm之间,激发光波长依据半导体材料带隙而定。激发光光源脉冲重复频率在1Hz~1kHz之间可调。本申请采用OPO波长可调谐激光器,其具有>5mJ的脉冲能量,脉冲宽度为7ns,脉冲重复频率为10Hz,并且可以容易地进行衰减调谐。The excitation light source can be a pulsed laser or an ultrafast pulsed light emitting diode, the excitation light pulse width is between 20fs and 20ns, the excitation light intensity can be continuously adjustable, and its intensity is between 100nJ/ cm2 and 100μJ/ cm2 . The wavelength of the excitation light can also be adjusted between 190nm and 2400nm, and the wavelength of the excitation light depends on the band gap of the semiconductor material. The pulse repetition frequency of the excitation light source is adjustable between 1Hz and 1kHz. The present application adopts an OPO wavelength tunable laser, which has a pulse energy of >5mJ, a pulse width of 7ns, a pulse repetition frequency of 10Hz, and can be easily attenuated and tuned.

背景光光源优选为白光光源,例如采用卤钨灯作为连续光激发源对样品进行背景辐照,这个白光偏置的光强也可以在0~100mW/cm2之间可调,波长范围为400nm~3500nm,白光偏置可以很好的填充半导体材料的内部缺陷,该白光和脉冲激发光源通过一个光纤耦合器耦合到一根光纤,另一端接到一个混光器后直接辐照到样品,这样混光后的光源更加均匀,可以减少实验误差。通过测试不同背景光偏置光强和辐照波长,可以获得一组TRMC动力学曲线,然后对其TRMC时间分辨频谱进行拟合,从而获得载流子动力学信息。The background light source is preferably a white light source, for example, a halogen tungsten lamp is used as a continuous light excitation source to perform background irradiation on the sample. The intensity of the white light bias can also be adjusted between 0 and 100 mW/ cm2 , and the wavelength range is 400nm to 3500nm. The white light bias can well fill the internal defects of the semiconductor material. The white light and pulse excitation light source are coupled to an optical fiber through a fiber coupler, and the other end is connected to a mixer and directly irradiated to the sample. In this way, the light source after mixing is more uniform, which can reduce experimental errors. By testing different background light bias intensities and irradiation wavelengths, a set of TRMC kinetic curves can be obtained, and then the TRMC time-resolved spectrum is fitted to obtain carrier dynamics information.

激发光辐照到半导体样品上后,产生光生载流子,这些过剩载流子的热运动又可以很好地吸收和反射微波源发出的微波,这里微波源的选用1GHz~18GHz的扫频微波源替代了传统的单频率点源,从而获得的是一个时间分辨的频谱变化,具有更多的样品信息,微波发射和接收的时间分辨率为5ns~10ns;具体地,本申请采用FieldFox手持式微波分析仪(Keysight,N9915A)用作微波源和检测器。After the excitation light is irradiated onto the semiconductor sample, photogenerated carriers are generated. The thermal motion of these excess carriers can well absorb and reflect the microwaves emitted by the microwave source. Here, the microwave source uses a 1GHz to 18GHz swept frequency microwave source to replace the traditional single-frequency point source, thereby obtaining a time-resolved spectrum change with more sample information. The time resolution of microwave emission and reception is 5ns to 10ns; specifically, the present application uses a FieldFox handheld microwave analyzer (Keysight, N9915A) as a microwave source and detector.

本申请采用的半导体样品为薄膜样品,将其置于微波谐振腔内,时间分辨微波光电导测试分透射和反射两种模式,透射模式时,薄膜样品厚度在10nm~10μm之间,反射模式对膜厚没有要求,可以在毫米级的晶圆或单晶颗粒表面进行测试;The semiconductor sample used in this application is a thin film sample, which is placed in a microwave resonant cavity. The time-resolved microwave photoconductivity test is divided into two modes: transmission and reflection. In the transmission mode, the thickness of the thin film sample is between 10nm and 10μm. The reflection mode has no requirements for the film thickness and can be tested on the surface of millimeter-level wafers or single crystal particles.

通过测试微波腔内的谐振峰的幅值和频率的变化,可以有效分析出腔体Q值和微波反射率等特性参数的变化,从而进一步分析半导体材料在稳态和激发态下的微波复电导特性,此外,可以通过检测不同时间延迟下的微波信号的衰减,也记录了半导体样品中载流子的动态过程。By testing the changes in the amplitude and frequency of the resonant peak in the microwave cavity, the changes in characteristic parameters such as the cavity Q value and microwave reflectivity can be effectively analyzed, thereby further analyzing the microwave complex conductivity characteristics of semiconductor materials in the steady state and excited state. In addition, by detecting the attenuation of microwave signals under different time delays, the dynamic process of carriers in semiconductor samples can also be recorded.

采用以上技术方案,本发明可有效测试和分析半导体材料的载流子动力学,并能具体研究不同缺陷态对其动力学的影响。By adopting the above technical scheme, the present invention can effectively test and analyze the carrier dynamics of semiconductor materials, and can specifically study the influence of different defect states on their dynamics.

在450nm连续激光的激发下,使用Morpho-Nova光谱仪记录了稳态光致发光(PL)光谱。使用时间相关单光子计数技术TimeHarp 260PICO single,PicoQuant GmbH)获得时间分辨光致发光光谱(TRPL)。使用皮秒二极管激光器(405nm,PiL040X)作为激发光光源,电荷载流子迁移率通过时间分辨微波电导率(TRMC)测量来表征,这是一种无电极技术并且可以有效地探测半导体的载流子动力学。在测量过程中微波功率的变化(ΔP/P)在样品激发时由腔反射530nm监测激光并将其与样品电导的光诱导变化相关联:Steady-state photoluminescence (PL) spectra were recorded using a Morpho-Nova spectrometer under excitation with a 450 nm continuous laser. Time-resolved photoluminescence spectra (TRPL) were obtained using the time-correlated single photon counting technique TimeHarp 260PICO single, PicoQuant GmbH). Using a picosecond diode laser (405 nm, PiL040X) as the excitation light source, the charge carrier mobility was characterized by time-resolved microwave conductivity (TRMC) measurements, which is an electrode-free technique and can effectively probe the carrier dynamics of semiconductors. The change in microwave power (ΔP/P) during the measurement was monitored by the cavity reflecting the 530 nm laser upon sample excitation and correlated to the photoinduced change in the sample conductivity:

其中,ΔG是电导率的变化,ΔP(t)/P是检测到的微波功率的变化,K是腔体的灵敏度因子,这取决于腔体的尺寸、腔体内壁的质量以及腔体中的半导体样品的介电特性。where ΔG is the change in conductivity, ΔP(t)/P is the change in detected microwave power, and K is the sensitivity factor of the cavity, which depends on the size of the cavity, the quality of the cavity walls, and the dielectric properties of the semiconductor sample in the cavity.

光电导的变化ΔG与电荷载流子产生的量子产率以及空穴μh和电子迁移率μe之和有关,∑μ=μehThe change in photoconductivity ΔG is related to the quantum yield of charge carrier generation and the sum of the hole μ h and electron mobility μ e , ∑μ = μ e + μ h ,

其中,β是波导的宽和窄内部尺寸之间的比率,FA是在确定转换光子的比例的光学测量中定义的,FA=1-(FR+FT),FR和FT分别为钙钛矿膜的反射和透射的光的比例,I0为激发光强,e为单位电荷。where β is the ratio between the wide and narrow inner dimensions of the waveguide, FA is defined in optical measurements to determine the fraction of converted photons, FA = 1-( FR + FT ), where FR and FT are the fraction of light reflected and transmitted by the perovskite film, respectively, I0 is the excitation light intensity, and e is the unit charge.

以下实施例采用上述半导体载流子动力学测试仪器对多种半导体样品进行测试,如无特殊说明,半导体样品为市购产品或采用常规的制备方法获得,数据和图谱获取、处理方法均采用本领域常见的技术手段。The following examples use the above-mentioned semiconductor carrier dynamics testing instrument to test various semiconductor samples. Unless otherwise specified, the semiconductor samples are commercially available products or obtained by conventional preparation methods, and the data and spectrum acquisition and processing methods all use common technical means in the field.

实施例1Example 1

我们上述半导体载流子动力学测试仪器研究了第三代宽禁带半导体氮化镓薄膜,TRMC的原理如图1所示,这里白光背景是可选项,主要用于研究浅能级缺陷的影响。这里使用的激发光波长是250nm的紫外脉冲激光,脉冲宽度为5ns,脉冲重复频率为10Hz。We used the semiconductor carrier dynamics test instrument mentioned above to study the third-generation wide-bandgap semiconductor gallium nitride film. The principle of TRMC is shown in Figure 1. The white light background is optional and is mainly used to study the influence of shallow energy level defects. The excitation light wavelength used here is a 250nm ultraviolet pulse laser with a pulse width of 5ns and a pulse repetition frequency of 10Hz.

图2是氮化镓薄膜在微波腔内的典型TRMC频谱,通过拟合该频谱可以很好的得到微波腔的Q值和反射率。Figure 2 is a typical TRMC spectrum of a GaN film in a microwave cavity. By fitting this spectrum, the Q value and reflectivity of the microwave cavity can be well obtained.

图3则展示了氮化镓薄膜在不同激光强度下激发的TRMC动力学曲线,可以看到随着激发强度的增加,载流子微波寿命有所下降,但都在较大值,可达毫秒级,外延生长的氮化镓薄膜也具有极高的迁移率(~5000cm2 V-1s-1)。Figure 3 shows the TRMC kinetic curves of GaN films excited at different laser intensities. It can be seen that with the increase of excitation intensity, the carrier microwave lifetime decreases, but it is still at a large value, up to milliseconds. The epitaxially grown GaN film also has an extremely high mobility (~5000cm 2 V -1 s -1 ).

实施例2Example 2

本实施例上述半导体载流子动力学测试仪器和测试方法测试了溶液法制备的不同钙钛矿薄膜,如图4所示。测试中所用激发光源为532nm纳秒激光,脉冲宽度为8ns,脉冲重复频率为5Hz。可以看到,三种钙钛矿具有不同的载流子动力学过程,比如最经典的甲胺铅碘(MAPbI3)半导体具有最短的寿命,只有几百纳秒,而近几年研究较多的三元钙钛矿(MAFACs)具有更长的载流子寿命,可以达到几微米,而利用二位钙钛矿PEAI处理的三元钙钛矿(2D/3D)具有最少的缺陷态和最长的载流子寿命,这些载流子动力学的信息也是和近几年钙钛矿太阳能电池的性能提升密不可分的。The semiconductor carrier dynamics test instrument and test method of this embodiment tested different perovskite films prepared by the solution method, as shown in Figure 4. The excitation light source used in the test is a 532nm nanosecond laser with a pulse width of 8ns and a pulse repetition frequency of 5Hz. It can be seen that the three perovskites have different carrier dynamics processes. For example, the most classic methylamine lead iodine ( MAPbI3 ) semiconductor has the shortest lifetime, which is only a few hundred nanoseconds, while the ternary perovskites (MAFACs) that have been studied more in recent years have a longer carrier lifetime, which can reach several microns, and the ternary perovskites (2D/3D) treated with the two-position perovskite PEAI have the least defect states and the longest carrier lifetime. These carrier dynamics information is also inseparable from the performance improvement of perovskite solar cells in recent years.

图5比较了典型二维钙钛矿(FACs)和不同浓度钠离子掺杂,对其载流子动力学的影响。可以看到,随着钠离子浓度的增加,载流子的寿命有着显著的提高。Figure 5 compares the effects of typical two-dimensional perovskites (FACs) and different concentrations of sodium ion doping on their carrier dynamics. It can be seen that with the increase of sodium ion concentration, the carrier lifetime is significantly improved.

实施例3Example 3

虽然实施例2观测到钙钛矿薄膜中超长的载流子寿命,但这种寿命的起因还不是很确定,本实施例继续在普通TRMC的技术上,引入了白光偏置,白光光强为0~1000μW/cm2之间,如图6所示,图7a和7b分别是无背景辐照和有背景辐照偏置的二维TRMC图谱。可以看到,随着白光偏置光强的增加,掺杂钙钛矿薄膜中载流子的寿命逐渐减少,这说明薄膜中载流子的缺陷可以很好地被白光所产生的载流子所填充,也就没有了浅能级缺陷对载流子捕获和释放的过程,也就没有了超长的寿命。Although Example 2 observed an ultra-long carrier lifetime in the perovskite film, the cause of this lifetime is still uncertain. This example continues to introduce white light bias based on the ordinary TRMC technology, and the white light intensity is between 0 and 1000 μW/cm 2 , as shown in Figure 6, and Figures 7a and 7b are two-dimensional TRMC spectra without background irradiation and with background irradiation bias, respectively. It can be seen that with the increase of the white light bias intensity, the carrier lifetime in the doped perovskite film gradually decreases, which shows that the carrier defects in the film can be well filled by the carriers generated by white light, and there is no process of shallow energy level defects to capture and release carriers, and there is no ultra-long lifetime.

实施例4Example 4

本实施例中利用上述半导体载流子动力学测试仪器和测试方法测试了几种传统的半导体薄膜,包括砷化镓、磷化铟和铟镓砷。激发波长为630nm,激光脉冲宽度为8ns,脉冲重复频率为10Hz。其载流子动力学如图8所示。可以看到砷化镓和磷化铟都具有极高的载流子迁移率和寿命(>1000cm2 V-1s-1),而铟镓砷具有较低的迁移率和载流子寿命。In this embodiment, several conventional semiconductor films, including gallium arsenide, indium phosphide and indium gallium arsenide, are tested using the semiconductor carrier dynamics test instrument and test method. The excitation wavelength is 630nm, the laser pulse width is 8ns, and the pulse repetition frequency is 10Hz. The carrier dynamics are shown in FIG8. It can be seen that both gallium arsenide and indium phosphide have extremely high carrier mobility and lifetime (>1000cm 2 V -1 s -1 ), while indium gallium arsenide has lower mobility and carrier lifetime.

以上所述是本发明的优选实施方式而已,当然不能以此来限定本发明之权利范围,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和变动,这些改进和变动也视为本发明的保护范围。The above is only a preferred embodiment of the present invention, which certainly cannot be used to limit the scope of rights of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and changes can be made without departing from the principle of the present invention, and these improvements and changes are also regarded as the protection scope of the present invention.

Claims (8)

1. A semiconductor carrier dynamics testing method, comprising:
Placing a semiconductor sample in a microwave resonant cavity;
providing continuous excitation light to excite a semiconductor sample to generate carriers, and simultaneously providing steady-state bias background light with different light intensities to fill defect states of the semiconductor;
A microwave analyzer is adopted as a microwave source and a detector to detect the microwave signal of the semiconductor, so as to obtain a time-resolved microwave photoconductive curve;
Carrying out frequency sweep of the whole frequency band on the microwave signal to obtain a time resolution microwave spectrum;
And acquiring semiconductor carrier dynamics information according to the time-resolved microwave spectrum.
2. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: changing the light intensity and the irradiation wavelength of different bias background light to obtain a group of time-resolved microwave photoconductive curves, and fitting the time-resolved microwave frequency spectrums of the group of time-resolved microwave photoconductive curves to obtain carrier dynamics information.
3. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: and changing the light intensity and the irradiation wavelength of different bias background light, obtaining time-resolved microwave photoconductive curves under different defect filling states, calculating the change of the Q value or the microwave reflectivity of the cavity according to the change of the amplitude and the frequency, and analyzing the microwave photoconductive characteristics of the semiconductor sample under steady state and excited state.
4. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: the phase of the time-resolved microwave spectrum corresponds to the imaginary part of the dielectric constant of the semiconductor and is used for analyzing the dynamics of capturing deep energy level defects; the amplitude information of the time-resolved microwave spectrum corresponds to the real part of the dielectric constant of the semiconductor and is used for analyzing the light generation rate of carriers and dynamics caused by capturing shallow level defects.
5. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: the analyzing semiconductor carrier dynamics according to time-resolved microwave spectrum includes: the energy level and density of semiconductor defects are analyzed by fitting different time-resolved microwave spectra.
6. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: the method further comprises the steps of: detecting the attenuation of microwave signals under different time delays, and recording the dynamic process of carriers in the semiconductor sample.
7. The semiconductor carrier dynamics testing method according to claim 1, characterized in that: the method further comprises the steps of:
And comparing different time-resolved microwave spectrums, resolving the change of phase and amplitude information in a microwave signal, and distinguishing different types of carrier dynamics processes in a semiconductor.
8. A semiconductor carrier dynamics test apparatus, characterized in that: comprising the following steps:
An excitation light source for providing pulsed excitation light to the semiconductor sample to excite the semiconductor sample to generate photogenerated carriers;
A backlight source for providing bias backlight of different intensities to the semiconductor sample to fill different defect states of the semiconductor sample;
A microwave analyzer, which serves as a microwave source and detector, for acquiring a time-resolved microwave spectrum;
a spectrometer for recording a steady state photoluminescence spectrum;
a time-dependent single photon counter for acquiring a time-resolved photoluminescence spectrum;
The optical fiber coupler is used for coupling the pulse excitation light and the bias background light to one optical fiber; and
The light mixer is used for receiving the pulse excitation light and the bias background light transmitted by the optical fiber and uniformly mixing the pulse excitation light and the bias background light.
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