CN107522387A - Melting furnaces for TFT glass - Google Patents
Melting furnaces for TFT glass Download PDFInfo
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- CN107522387A CN107522387A CN201710827826.9A CN201710827826A CN107522387A CN 107522387 A CN107522387 A CN 107522387A CN 201710827826 A CN201710827826 A CN 201710827826A CN 107522387 A CN107522387 A CN 107522387A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/027—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by passing an electric current between electrodes immersed in the glass bath, i.e. by direct resistance heating
- C03B5/03—Tank furnaces
- C03B5/031—Cold top tank furnaces
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
- C03B5/182—Stirring devices; Homogenisation by moving the molten glass along fixed elements, e.g. deflectors, weirs, baffle plates
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/18—Stirring devices; Homogenisation
- C03B5/193—Stirring devices; Homogenisation using gas, e.g. bubblers
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Abstract
本发明提供一种用于TFT玻璃的熔窑,包括:依次设置的冷顶全电熔窑和澄清池;冷顶全电熔窑的底部设置有流液洞,流液洞的出口端与上升道连通,上升道与澄清池的进料口连通;冷顶全电熔窑的上部设有供TFT玻璃配合料加入的进料口,冷顶全电熔窑的内部设有多个窑部电极;澄清池的内部设有多个池内电极和多个火焰加热喷枪,澄清池上设有供烟气排出的排烟口;澄清池的池体底砖上依次设置有鼓泡装置和窑坎,鼓泡装置设置于所有的池内电极的后方。本发明的熔窑,将熔化和高温澄清、均化的过程分开,既可有效降低TFT玻璃配合料熔化时硼的高挥发及其所产生的缺陷,又可起到TFT玻璃的玻璃液高效澄清及均化作用,从而避免产品中条纹等缺陷的出现,显著提高产品质量。
The invention provides a melting furnace for TFT glass, comprising: a cold-top all-electric melting furnace and a clarification tank arranged sequentially; The ascending channel is connected with the feeding port of the clarification tank; the upper part of the cold-top all-electric melting furnace is provided with a feeding port for adding TFT glass batch materials, and the inside of the cold-top all-electric melting furnace is equipped with multiple kiln electrodes The inside of the clarification tank is equipped with multiple pool electrodes and multiple flame heating spray guns, and the clarifier tank is provided with a smoke exhaust port for the exhaust of the smoke; Bubble devices are located behind all electrodes in the cell. The melting furnace of the present invention separates the process of melting from high-temperature clarification and homogenization, which can not only effectively reduce the high volatilization of boron and the defects caused by the melting of TFT glass batch materials, but also effectively clarify the glass liquid of TFT glass And homogenization, so as to avoid the occurrence of defects such as streaks in the product, and significantly improve the product quality.
Description
技术领域technical field
本发明涉及玻璃生产技术领域,特别是涉及一种用于TFT玻璃的熔窑。The invention relates to the technical field of glass production, in particular to a melting furnace for TFT glass.
背景技术Background technique
TFT玻璃属“高硼高铝无碱”玻璃,TFT玻璃的成分中氧化硼含量8~12%的硼铝硅酸盐玻璃,其熔制温度和成型温度均很高,熔制时硼挥发以及容易产生分相、分层等问题。硼铝硅酸盐玻璃的熔制温度要比普通浮法玻璃熔制温度高170℃以上,通常采用全氧助燃与电熔化相结合的火电混合加热熔化方式,但硼的挥发率高达7~10%,导致密度较轻的二氧化硅聚集在玻璃液表层,这种富硅质不仅熔点高更难熔,而且粘度大,其中还聚集了大量的微气泡难以排出。这些具有二氧化硅层的玻璃在熔化时必须严格加以控制,否则在熔窑中即使经过多次的高温循环对流也难完全彻底消失,最终在玻璃板中形成条纹和微气泡等缺陷,这对质量要求达到光学玻璃等级的TFT玻璃是完全不可接受的。在生产TFT玻璃常常还会出现由于条纹和微气泡等缺陷而严重影响玻璃的良品率的。TFT glass belongs to "high boron, high alumina and alkali-free" glass. The composition of TFT glass is boroaluminosilicate glass with boron oxide content of 8-12%. It is easy to produce problems such as phase separation and delamination. The melting temperature of boroaluminosilicate glass is more than 170°C higher than that of ordinary float glass. Usually, the fusion heating and melting method of thermal power combined with oxygen combustion and electric melting is used, but the volatilization rate of boron is as high as 7-10 %, leading to the accumulation of silicon dioxide with a lighter density on the surface of the glass liquid. This silicon-rich material not only has a high melting point and is difficult to melt, but also has a high viscosity, and a large number of microbubbles are gathered in it, which is difficult to discharge. The glass with a silica layer must be strictly controlled during melting, otherwise it will be difficult to completely disappear even after repeated high-temperature circulation convection in the furnace, and eventually defects such as streaks and microbubbles will be formed in the glass plate, which is of great importance to the glass. TFT glass whose quality is required to reach the grade of optical glass is completely unacceptable. In the production of TFT glass, there are often defects such as streaks and micro-bubbles that seriously affect the yield of the glass.
中国实用新型专利《垂直冷顶熔制硼硅浮法玻璃双拼式全电熔窑》,授权公告号CN2878376,该专利中,玻璃熔窑的内部包括熔化区和澄清区,玻璃熔窑长边一侧的熔窑壁上部开有进料口;熔化区位于澄清区的上方;澄清区池壁一侧的下部设有流液洞,玻璃熔窑的流液洞分别连接上升道的一端进料口,上升道的另一端连接供料道。Chinese utility model patent "Full Borosilicate Float Glass Melting Furnace with Vertical Cold Roof", authorized announcement number CN2878376, in this patent, the interior of the glass melting furnace includes the melting zone and the clarification zone, and the long side of the glass melting furnace There is a feed port on the upper part of the furnace wall on one side; the melting zone is located above the clarification zone; the lower part of the side wall of the clarification zone is provided with a flow hole, and the flow holes of the glass melting furnace are respectively connected to one end of the ascending channel for feeding The other end of the ascending channel is connected to the feeding channel.
由于电熔窑为垂直熔化方式,挥发的氧化硼能在冷顶式电熔窑的顶部冷凝下来,这样就大大地减少了熔窑中硼的挥发,其挥发率一般仅为1~2%。但是全电熔窑也有其自身的缺陷:(1)电熔窑的垂直熔化方式不利于玻璃液中的微气泡的排除;(2)生产高硼硅全电熔窑最大规模一般不超过30吨/天,否则窑内温度均匀性受到影响,也会产生条纹等缺陷;(3)当窑内电极布置或温度制度稍有不当时,产品的均匀性就受到较大影响,产品合格率低。Since the electric melting furnace adopts a vertical melting method, the volatilized boron oxide can be condensed on the top of the cold top electric melting furnace, which greatly reduces the volatilization of boron in the melting furnace, and its volatilization rate is generally only 1-2%. However, the all-electric melting furnace also has its own defects: (1) the vertical melting method of the electric melting furnace is not conducive to the elimination of microbubbles in the molten glass; (2) the maximum scale of the full-electric melting furnace for the production of high borosilicate generally does not exceed 30 tons / day, otherwise the temperature uniformity in the kiln will be affected, and defects such as stripes will also occur; (3) When the electrode layout or temperature system in the kiln is slightly improper, the uniformity of the product will be greatly affected, and the product qualification rate will be low.
发明内容Contents of the invention
鉴于以上所述现有技术的缺点,本发明的目的在于提供一种用于TFT玻璃的熔窑,用于解决现有技术中存在的上述问题。In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a melting furnace for TFT glass to solve the above-mentioned problems in the prior art.
为实现上述目的及其他相关目的,本发明提供一种用于TFT玻璃的熔窑,包括:依次设置的冷顶全电熔窑和澄清池;所述冷顶全电熔窑的底部设置有流液洞,所述流液洞的出口端与一竖直设置的上升道的下端连通,所述上升道的上端与所述澄清池的进料口连通;所述冷顶全电熔窑的上部设有供TFT玻璃配合料加入的进料口,所述冷顶全电熔窑的内部设有多个窑部电极;所述澄清池的内部设有多个池内电极和多个火焰加热喷枪,所述澄清池上设有供烟气排出的排烟口,所有的所述火焰加热喷枪设置于所述澄清池的上部;沿着所述TFT玻璃的玻璃液配合料在所述澄清池中的流动方向,所述澄清池的池体底砖上依次设置有鼓泡装置和窑坎,所述鼓泡装置设置于所有的所述池内电极的后方。In order to achieve the above purpose and other related purposes, the present invention provides a melting furnace for TFT glass, comprising: a cold top full electric melting furnace and a clarification tank arranged in sequence; the bottom of the cold top full electric melting furnace is provided with a flow A liquid hole, the outlet end of the liquid flow hole communicates with the lower end of a vertically arranged ascending channel, and the upper end of the ascending channel communicates with the feed port of the clarification tank; the upper part of the cold-top all-electric melting furnace There is a feed port for adding TFT glass batch materials, and the inside of the cold-top all-electric melting furnace is equipped with a plurality of kiln electrodes; the inside of the clarification tank is equipped with a plurality of electrodes in the pool and a plurality of flame heating spray guns, The clarifier is provided with a smoke outlet for exhausting smoke, and all the flame heating spray guns are arranged on the upper part of the clarifier; along the flow of the molten glass batch of the TFT glass in the clarifier Direction, the bottom brick of the clarification tank is provided with a bubbling device and a kiln ridge in sequence, and the bubbling device is arranged behind all the electrodes in the tank.
优选地,所述冷顶全电熔窑的窑体底砖和窑体侧壁为平面结构,或者所述冷顶全电熔窑的窑体底砖和窑体侧壁为台阶式结构。Preferably, the bottom brick of the kiln body and the side wall of the kiln body of the cold-top all-electric melting furnace are planar structures, or the bottom bricks of the kiln body and the side walls of the kiln body of the cold-roof all-electric melting furnace are of a stepped structure.
优选地,所有的所述窑部电极插设于所述冷顶全电熔窑的窑体底砖上,或者所有的所述窑部电极插设于所述冷顶全电熔窑的窑体侧壁上。Preferably, all of the kiln electrodes are inserted on the bottom brick of the kiln body of the cold-top all-electric melting furnace, or all of the kiln electrodes are inserted into the kiln body of the cold-top all-electric melting furnace on the side wall.
优选地,所有的所述池内电极插设于所述澄清池的池体底砖上,或者所有的所述池内电极插设于所述澄清池的池体侧壁上,或者所有的所述池内电极分为插设于所述澄清池的池体底砖上的底部电极和插设于所述澄清池的池体侧壁上的侧部电极。Preferably, all the electrodes in the pool are inserted on the bottom brick of the tank body of the clarification tank, or all the electrodes in the pool are inserted on the side wall of the tank body of the clarification tank, or all the electrodes in the tank are inserted The electrodes are divided into bottom electrodes inserted on the bottom brick of the clarifier tank and side electrodes inserted on the side wall of the clarifier tank.
优选地,所有的所述火焰加热喷枪设置于所述澄清池的上部;所有的所述火焰加热喷枪的喷嘴设置于所述澄清池的池体侧壁上,或者所有的所述火焰加热喷枪的喷嘴设置于所述澄清池的池体碹顶上。Preferably, all of the flame heating spray guns are arranged on the upper part of the clarification tank; the nozzles of all the flame heating spray guns are arranged on the side wall of the tank body of the clarification tank, or all of the flame heating spray guns The nozzle is arranged on the top of the tank body of the clarification tank.
优选地,沿着所述TFT玻璃的玻璃液的流动方向,在所述澄清池的后端的池体侧壁上设有出料口,所述出料口连接铂金料道。Preferably, along the flow direction of the molten glass of the TFT glass, an outlet is provided on the side wall of the tank body at the rear end of the clarification tank, and the outlet is connected to a platinum forehearth.
进一步地,所述澄清池上还设有异质玻璃液表面溢流装置,所述异质玻璃液表面溢流装置与所述澄清池的出料口的前端两侧的池体侧壁连接。Further, the clarification tank is also provided with a heterogeneous glass liquid surface overflow device, and the heterogeneous glass liquid surface overflow device is connected to the side walls of the tank body on both sides of the front end of the discharge port of the clarification tank.
更进一步地,所述澄清池的出料口的取料高度低于所述澄清池中TFT玻璃的玻璃液的液面的水平高度。Furthermore, the material extraction height of the outlet of the clarification tank is lower than the liquid level of the liquid glass of the TFT glass in the clarification tank.
进一步地,所述澄清池的池体底砖上设有第一底部卸料装置,所述第一底部卸料装置处于所述所有的所述池内电极的后方,且所述第一底部卸料装置处于鼓泡装置的前方,且处于所述澄清池的出料口的前方。Further, the bottom brick of the clarification tank is provided with a first bottom discharge device, the first bottom discharge device is behind all the electrodes in the tank, and the first bottom discharge device The device is in front of the bubbling device and in front of the outlet of the clarification tank.
优选地,所述澄清池的池体底砖上设有第二底部卸料装置,所述第二底部卸料装置处于所述窑坎的后方。Preferably, the bottom brick of the clarification tank is provided with a second bottom discharge device, and the second bottom discharge device is behind the kiln sill.
优选地,所述上升道的底部设有中间泄料装置。Preferably, an intermediate discharge device is provided at the bottom of the ascending channel.
如上所述,本发明所述的用于TFT玻璃的熔窑,具有以下有益效果:As mentioned above, the melting furnace for TFT glass according to the present invention has the following beneficial effects:
本发明的熔窑,将熔化和高温澄清、均化的过程分开,既可有效降低TFT玻璃配合料熔化时硼的高挥发及其所产生的缺陷,又可起到TFT玻璃的玻璃液高效澄清及均化作用,从而避免产品中条纹等缺陷的出现,显著提高产品质量;澄清池内的鼓泡装置和窑坎的设置,极大地提高了TFT玻璃的玻璃液中的微气泡的逸出速度,加速了TFT玻璃的玻璃液的澄清效率,同时鼓泡装置还加速了TFT玻璃的玻璃液的对流,窑坎的设置提高了TFT玻璃的玻璃液的温度,这样,TFT玻璃的玻璃液的均化效率也得到显著提高,而且本发明的冷顶全电熔窑的规模不受熔化出来的TFT玻璃的玻璃液质量影响,即可实现较大的规模。The melting furnace of the present invention separates the process of melting from high-temperature clarification and homogenization, which can effectively reduce the high volatilization of boron and the defects caused by the melting of TFT glass batch materials, and can effectively clarify the glass liquid of TFT glass And homogenization, so as to avoid the occurrence of defects such as streaks in the product, and significantly improve product quality; the bubbling device in the clarification tank and the setting of the kiln ridge greatly increase the escape speed of the microbubbles in the glass liquid of TFT glass, The clarification efficiency of the molten glass of TFT glass is accelerated, and the bubbling device also accelerates the convection of the molten glass of TFT glass. The setting of the kiln sill increases the temperature of the molten glass of TFT glass. Efficiency is also significantly improved, and the scale of the cold-top all-electric melting furnace of the present invention is not affected by the quality of molten glass of TFT glass that is melted, so a larger scale can be realized.
附图说明Description of drawings
图1显示为本实施例的用于TFT玻璃的熔窑的纵向剖面结构示意图。FIG. 1 is a schematic diagram of a vertical cross-sectional structure of a melting furnace for TFT glass in this embodiment.
图2显示为本实施例的用于TFT玻璃的熔窑的俯视结构示意图。FIG. 2 is a schematic top view of the melting furnace for TFT glass in this embodiment.
附图标号说明Explanation of reference numbers
100 冷顶全电熔窑100 cold top full electric melting furnace
110 窑部进液口110 Kiln liquid inlet
120 窑部电极120 kiln electrode
200 澄清池200 clarifier
201 排烟口201 smoke vent
210 池内电极210 cell electrode
220 火焰加热喷枪220 Flame Heated Spray Gun
230 异质玻璃液表面溢流装置230 Heterogeneous glass liquid surface overflow device
241 第一底部卸料装置241 First bottom discharge device
242 第二底部卸料装置242 Second bottom discharge device
300 流液洞300 Fluid Hole
310 防堵电极310 anti-blocking electrode
400 上升道400 ascending road
410 侧插电极410 side insert electrode
420 中间泄料装置420 Intermediate discharge device
250 鼓泡装置250 bubbler
600 出料口600 Outlet
700 铂金料道700 Platinum Forehearth
800 窑坎800 kiln ridge
具体实施方式detailed description
以下由特定的具体实施例说明本发明的实施方式,熟悉此技术的人士可由本说明书所揭露的内容轻易地了解本发明的其他优点及功效。The implementation of the present invention will be illustrated by specific specific examples below, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.
请参阅附图。须知,本说明书所附图式所绘示的结构、比例、大小等,均仅用以配合说明书所揭示的内容,以供熟悉此技术的人士了解与阅读,并非用以限定本发明可实施的限定条件,故不具技术上的实质意义,任何结构的修饰、比例关系的改变或大小的调整,在不影响本发明所能产生的功效及所能达成的目的下,均应仍落在本发明所揭示的技术内容得能涵盖的范围内。同时,本说明书中所引用的如“上”、“下”、“左”、“右”、“中间”及“一”等的用语,亦仅为便于叙述的明了,而非用以限定本发明可实施的范围,其相对关系的改变或调整,在无实质变更技术内容下,当亦视为本发明可实施的范畴。Please refer to attached picture. It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for those who are familiar with this technology to understand and read, and are not used to limit the implementation of the present invention. Limiting conditions, so there is no technical substantive meaning, any modification of structure, change of proportional relationship or adjustment of size, without affecting the effect and purpose of the present invention, should still fall within the scope of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in this specification are only for the convenience of description and are not used to limit this specification. The practicable scope of the invention and the change or adjustment of its relative relationship shall also be regarded as the practicable scope of the present invention without any substantial change in the technical content.
如图1至图2所示,本实施例的用于TFT玻璃的熔窑,包括:依次设置的冷顶全电熔窑100和澄清池200;As shown in Figures 1 to 2, the melting furnace for TFT glass in this embodiment includes: a cold-top all-electric melting furnace 100 and a clarification tank 200 arranged in sequence;
所述冷顶全电熔窑100的底部设置有流液洞300,所述流液洞300的出口端与一竖直设置的上升道400的下端连通,所述上升道400的上端与所述澄清池200的进料口110连通;The bottom of the cold roof all-electric melting furnace 100 is provided with a liquid flow hole 300, the outlet end of the liquid flow hole 300 communicates with the lower end of a vertically arranged ascending channel 400, and the upper end of the ascending channel 400 is connected to the The feed port 110 of the clarifier 200 is communicated;
所述冷顶全电熔窑100的上部设有供TFT玻璃配合料加入的进料口110,所述冷顶全电熔窑100的内部设有多个窑部电极120;The upper part of the cold-top all-electric melting furnace 100 is provided with a feed port 110 for adding TFT glass batch materials, and the inside of the cold-top all-electric melting furnace 100 is provided with a plurality of kiln electrodes 120;
所述澄清池200的内部设有多个池内电极210和多个火焰加热喷枪220,所述澄清池200上设有供烟气排出的排烟口201,所有的所述火焰加热喷枪220设置于所述澄清池200的上部;The interior of the clarification tank 200 is provided with a plurality of electrodes 210 in the pool and a plurality of flame heating spray guns 220. The clarification tank 200 is provided with a smoke exhaust port 201 for exhausting smoke, and all the flame heating spray guns 220 are arranged on The upper part of the clarifier 200;
沿着所述TFT玻璃的玻璃液在所述澄清池200中的流动方向,所述澄清池200的池体底砖上依次设置有鼓泡装置500和窑坎800,所述鼓泡装置500设置于所有的所述池内电极210的后方。Along the flow direction of the molten glass of the TFT glass in the clarification tank 200, a bubbling device 500 and a kiln ridge 800 are sequentially arranged on the bottom brick of the tank body of the clarification tank 200, and the bubbling device 500 is set behind all electrodes 210 in the cell.
本发明中,冷顶全电熔窑100采用的是垂直熔化机理,冷顶全电熔窑100形成冷顶后,由于顶部温度较低,因此冷顶全电熔窑100散热大大降低,热效率显著提高,同时低温也抑制了挥发物的挥发;In the present invention, the cold-top all-electric melting furnace 100 adopts a vertical melting mechanism. After the cold-top all-electric melting furnace 100 forms a cold roof, the temperature of the top is lower, so the heat dissipation of the cold-top all-electric melting furnace 100 is greatly reduced, and the thermal efficiency is remarkable. Improvement, while the low temperature also suppresses the volatilization of volatiles;
现有的垂直冷顶熔制硼硅浮法玻璃双拼式全电熔窑中的成型液流是自上垂直流向下方,而玻璃液中的气泡排除过程是自下而上的浮升过程,即气泡的逸出过程与成型玻璃液流的流向相反,增加了玻璃液中气泡上浮的行程和阻力,不利于气泡的排出;而且现有的垂直冷顶熔制硼硅浮法玻璃双拼式全电熔窑的冷顶结构由于顶部玻璃液温度低、粘度大,也不利于气泡的逸出,因此现有的垂直冷顶熔制硼硅浮法玻璃双拼式全电熔窑熔化工艺实际上也限制了玻璃液中微气泡的澄清作用。In the existing vertical cold-roof melting borosilicate float glass duplex type all-electric melting furnace, the forming liquid flows vertically from the top to the bottom, and the bubble removal process in the molten glass is a bottom-up buoyancy process. That is, the escape process of the bubbles is opposite to the flow direction of the formed glass liquid flow, which increases the stroke and resistance of the bubbles in the glass liquid, which is not conducive to the discharge of the bubbles; The cold roof structure of the all-electric melting furnace is not conducive to the escape of air bubbles due to the low temperature and high viscosity of the glass liquid at the top. It also limits the clarification of the microbubbles in the glass liquid.
采用本发明的熔窑是将TFT玻璃的玻璃液的熔化过程与澄清、均化过程分开,TFT玻璃配合料的熔化过程主要在冷顶全电熔窑100中完成,不要求冷顶全电熔窑100中熔化出的TFT玻璃的玻璃液的澄清质量,因此该冷顶全电熔窑100的熔化温度可比现有的单个全电熔窑的熔化温度低,目的是不想将全电熔窑熔化的TFT玻璃的玻璃液中的气泡过早全部释放掉,而是使TFT玻璃的玻璃液中的气泡尽可能多的保留在TFT玻璃配合料中;The melting furnace of the present invention separates the melting process of the molten glass of TFT glass from the clarification and homogenization process, and the melting process of the TFT glass batch material is mainly completed in the cold-top all-electric melting furnace 100, which does not require cold-top full-electric melting The clarification quality of the molten glass of the TFT glass melted in the kiln 100, so the melting temperature of the cold-top all-electric melting furnace 100 can be lower than the melting temperature of the existing single all-electric melting furnace, the purpose is not to melt the all-electric melting furnace The bubbles in the molten glass of TFT glass are all released prematurely, but the bubbles in the molten glass of TFT glass are kept in the TFT glass batch as much as possible;
熔化好的TFT玻璃的玻璃液经流液洞300和上升道400进入澄清池200中再进行高温澄清和均化,澄清池200的温度要比冷顶全电熔窑100的TFT玻璃的玻璃液熔化温度高50-120℃,因此澄清池200的内部需设有多个池内电极210和多个火焰加热喷枪220,即在澄清池200中的加热采用火电混合加热的方式;The molten glass of the melted TFT glass enters the clarification tank 200 through the flow hole 300 and the ascending channel 400, and then undergoes high-temperature clarification and homogenization. The melting temperature is 50-120°C higher, so the inside of the clarification tank 200 needs to be equipped with multiple pool electrodes 210 and multiple flame heating spray guns 220, that is, the heating in the clarification tank 200 adopts thermal and electric hybrid heating;
鼓泡装置500设置于池内电极210的后方,通过鼓泡装置500的鼓泡喷嘴对澄清池200内部的TFT玻璃的玻璃液鼓入鼓泡介质,能够在TFT玻璃的玻璃液中形成气泡,随着TFT玻璃的玻璃液温度的不断提高,气泡也在不断地胀大上浮,在上浮的过程中由于表面张力的作用不断地将周围小气泡吸附在其表面,形成了TFT玻璃的玻璃液中析出气泡的“泡核”和动力,从而促进了TFT玻璃的玻璃液的高效澄清,由于在冷顶全电熔窑100中抑制了玻璃液中的气泡过早地释放,因此在澄清池200的TFT玻璃的玻璃液中的气泡经高温和鼓泡作用更容易释放,比现有的垂直冷顶熔制硼硅浮法玻璃双拼式全电熔窑所实现的澄清与均化效果更好,玻璃质量更优;The bubbling device 500 is arranged behind the electrode 210 in the pool, and the bubbling medium is blown into the molten glass of the TFT glass inside the clarification tank 200 through the bubbling nozzle of the bubbling device 500, so that bubbles can be formed in the molten glass of the TFT glass, and then As the temperature of the molten glass of TFT glass continues to increase, the bubbles also expand and float continuously. During the process of rising, the surrounding small bubbles are continuously adsorbed on the surface due to the effect of surface tension, forming the precipitation in the molten glass of TFT glass. The "bubble nucleus" and power of the bubbles, thereby promoting the efficient clarification of the molten glass of TFT glass. Since the premature release of the bubbles in the molten glass is suppressed in the cold-top all-electric melting furnace 100, the TFT in the clarification tank 200 The bubbles in the molten glass of the glass are released more easily through high temperature and bubbling, and the clarification and homogenization effect is better than that achieved by the existing vertical cold top melting borosilicate float glass double-split all-electric melting furnace. better quality;
在鼓泡装置500之后,澄清池200内还设有一道窑坎800,该窑坎800的设置不仅可强制使高温的TFT玻璃的玻璃液流经窑坎800的上方,则TFT玻璃的玻璃液能够获得表面更高温度的火焰加热,同时流经窑坎800上方的TFT玻璃的玻璃液表面流层变浅,促使TFT玻璃的玻璃液内微气泡快速释放。After the bubbling device 500, a kiln sill 800 is also provided in the clarification tank 200. The setting of this kiln sill 800 can not only force the molten glass of high-temperature TFT glass to flow through the top of the kiln sill 800, but also the molten glass of TFT glass Flame heating with a higher surface temperature can be obtained, and at the same time, the surface flow layer of the molten glass flowing through the TFT glass above the kiln sill 800 becomes shallower, which promotes the rapid release of microbubbles in the molten glass of the TFT glass.
所述冷顶全电熔窑100的窑体底砖和窑体侧壁为平面结构,或者所述冷顶全电熔窑100的窑体底砖和窑体侧壁为台阶式结构。当冷顶全电熔窑100的窑体底砖和窑体侧壁为台阶式结构时,冷顶全电熔窑100的规模大,冷顶全电熔窑100的深度可达到1.8-3m;当冷顶全电熔窑100的窑体底砖和窑体侧壁为平面结构时,冷顶全电熔窑100的规模小,冷顶全电熔窑100为非台阶式结构,冷顶全电熔窑100的深度小于1.8m。The bottom bricks and side walls of the kiln body of the cold-top all-electric melting furnace 100 are planar structures, or the bottom bricks and side walls of the kiln body of the cold-top all-electric melting furnace 100 are stepped structures. When the bottom brick of the kiln body and the side wall of the kiln body of the cold-top all-electric melting furnace 100 are stepped structures, the scale of the cold-top all-electric melting furnace 100 is large, and the depth of the cold-top all-electric melting furnace 100 can reach 1.8-3m; When the bottom brick of the kiln body and the side wall of the kiln body of the cold top all-electric melting furnace 100 are planar structures, the scale of the cold-top all-electric melting furnace 100 is small, and the cold-top all-electric melting furnace 100 is a non-step structure, and the cold top all-electric melting furnace 100 is a non-step structure. The depth of the electric melting furnace 100 is less than 1.8m.
所有的所述窑部电极120插设于所述冷顶全电熔窑100的窑体底砖上,或者所有的所述窑部电极120插设于所述冷顶全电熔窑100的窑体侧壁上。窑部电极120对冷顶全电熔窑100中的TFT玻璃的玻璃液进行加热。本实施例中,所有的窑部电极120插设于熔窑的窑体底砖上。All the kiln electrodes 120 are inserted on the bottom brick of the kiln body of the cold top full electric melting furnace 100, or all the kiln electrodes 120 are inserted in the kiln of the cold top full electric melting furnace 100 on the side wall of the body. The kiln electrode 120 heats the molten glass of TFT glass in the cold-roof all-electric melting furnace 100 . In this embodiment, all the kiln electrodes 120 are inserted on the kiln body bottom bricks of the melting furnace.
本实施例中,冷顶全电熔窑100的结构根据生产规模确定,冷顶全电熔窑100的横截面为六边形、矩形或者圆形;冷顶全电熔窑100的深度能够为1.5~2.8m。In this embodiment, the structure of the cold top full electric melting furnace 100 is determined according to the production scale, and the cross section of the cold top full electric melting furnace 100 is hexagonal, rectangular or circular; the depth of the cold top full electric melting furnace 100 can be 1.5 ~ 2.8m.
所有的所述池内电极210插设于所述澄清池200的池体底砖上,或者所有的所述池内电极210插设于所述澄清池200的池体侧壁上,或者所有的所述池内电极210分为插设于所述澄清池200的池体底砖上的底部电极和插设于所述澄清池200的池体侧壁上的侧部电极。池内电极210对澄清池200中的TFT玻璃的玻璃液进行加热。本实施例中,所有的池内电极210插设于澄清池200的池体底砖上。All of the electrodes 210 in the pool are inserted on the bottom brick of the clarifier 200, or all the electrodes 210 in the pool are inserted on the side wall of the clarifier 200, or all of the The electrodes 210 in the tank are divided into bottom electrodes inserted on the bottom brick of the clarification tank 200 and side electrodes inserted on the side walls of the tank body of the clarification tank 200 . The electrode 210 in the tank heats the molten glass of the TFT glass in the clarification tank 200 . In this embodiment, all the electrodes 210 in the tank are inserted on the bottom brick of the tank body of the clarification tank 200 .
所有的火焰加热喷枪220设置于澄清池200的上部;所有的所述火焰加热喷枪220的喷嘴设置于所述澄清池200的池体侧壁上,以加热TFT玻璃的玻璃液;或者所有的所述火焰加热喷枪220的喷嘴设置于所述澄清池200的池体碹顶上,以加热TFT玻璃的玻璃液。火焰加热喷枪220的加热方式采用全氧或富氧助燃加热。所有的喷嘴为交错或者对称布置。本实施中,所有的火焰加热喷枪220的喷嘴设置于澄清池200的上部空间的池体侧壁上。All the flame heating spray guns 220 are arranged on the top of the clarification tank 200; the nozzles of all the flame heating spray guns 220 are arranged on the side wall of the tank body of the clarification tank 200 to heat the molten glass of the TFT glass; The nozzle of the flame heating spray gun 220 is arranged on the top of the tank body of the clarification tank 200 to heat the molten glass of the TFT glass. The heating method of the flame heating spray gun 220 adopts all-oxygen or oxygen-enriched combustion-supporting heating. All nozzles are staggered or symmetrically arranged. In this implementation, the nozzles of all the flame heating spray guns 220 are arranged on the side wall of the tank body in the upper space of the clarification tank 200 .
鼓泡装置500所使用的鼓泡介质为高压氧气、压缩空气、氩气或氮气等气体。本实施例中,鼓泡介质为高压氧气。The bubbling medium used in the bubbling device 500 is gas such as high pressure oxygen, compressed air, argon or nitrogen. In this embodiment, the bubbling medium is high pressure oxygen.
沿着所述TFT玻璃的玻璃液的流动方向,在所述澄清池200的后端的池体侧壁上设有出料口600,所述出料口600连接铂金料道700。由于TFT玻璃的高质量要求,TFT玻璃的玻璃液经出料口600流出后还要进入到铂金料道700系统进行更精确、更高效的高温澄清、强制均化和冷却过程,由于有了本发明熔窑,最终制成的TFT玻璃基板来自熔化方面的缺陷会显著下降,良品率获得提升。本实施中,出料口600也是由铂金材料制作,实际上与所连接的铂金料道700的材料保持统一。本发明熔窑由于TFT玻璃的玻璃液的澄清效率很高,TFT玻璃的玻璃液流出出料口600后的铂金料道700系统可不必再设置高温澄清功能,只需设置均化和调温冷却功能,这样可大大节省后面的铂金料道700投资费用和延长铂金料道700的使用寿命。Along the flow direction of the molten glass of the TFT glass, a discharge port 600 is provided on the side wall of the rear end of the clarification tank 200 , and the discharge port 600 is connected to a platinum channel 700 . Due to the high quality requirements of TFT glass, the molten glass of TFT glass flows out through the discharge port 600 and enters the platinum forehearth 700 system for more accurate and efficient high-temperature clarification, forced homogenization and cooling processes. With the invention of the melting furnace, the defects of the final TFT glass substrate from melting will be significantly reduced, and the yield rate will be improved. In this implementation, the outlet 600 is also made of platinum material, which is actually consistent with the material of the connected platinum channel 700 . Due to the high clarification efficiency of the molten glass of TFT glass in the melting furnace of the present invention, the platinum forehearth 700 system after the molten glass of TFT glass flows out of the discharge port 600 does not need to be equipped with a high-temperature clarification function, and only needs to be equipped with homogenization and temperature adjustment cooling function, which can greatly save the investment cost of the subsequent platinum forehearth 700 and prolong the service life of the platinum forehearth 700.
本实施例中,出料口600设置于澄清池200的下部。澄清池200上还设有异质玻璃液表面溢流装置240,所述异质玻璃液表面溢流装置240与所述澄清池200的出料口600的前端两侧的池体侧壁连接。设置池内表面溢流装置目的是将TFT玻璃的玻璃液中表层残存的富硅不均质玻璃液排放掉。In this embodiment, the discharge port 600 is located at the lower part of the clarification tank 200 . The clarification tank 200 is also provided with a heterogeneous glass liquid surface overflow device 240 , and the heterogeneous glass liquid surface overflow device 240 is connected to the side walls of the tank body on both sides of the front end of the discharge port 600 of the clarification tank 200 . The purpose of setting the overflow device on the inner surface of the pool is to discharge the silicon-rich inhomogeneous molten glass remaining on the surface of the molten glass of the TFT glass.
所述澄清池200的出料口600的取料高度低于所述澄清池200中TFT玻璃的玻璃液的液面的水平高度。该结构能够使TFT玻璃液中表层残存的富硅质玻璃液排放掉后,质量较好的TFT玻璃的玻璃液排出。The feeding height of the outlet 600 of the clarification tank 200 is lower than the liquid level of the molten glass of TFT glass in the clarification tank 200 . This structure can make the glass liquid of TFT glass with better quality be discharged after the silicon-rich glass liquid remaining on the surface layer in the TFT glass liquid is discharged.
所述窑坎800的顶面的水平高度比所述TFT玻璃的玻璃液的液面的水平高度低75-200mm,该结构使气泡上浮的距离大为缩短。The horizontal height of the top surface of the kiln ridge 800 is 75-200mm lower than the liquid level of the molten glass of the TFT glass, and this structure greatly shortens the distance for the bubbles to float up.
为了获得满意的玻璃质量,所述澄清池200的池体底砖上设有第一底部卸料装置241,所述第一底部卸料装置241处于所述所有的所述池内电极210的后方,且所述第一底部卸料装置241处于鼓泡装置500的前方。本发明使用时,根据产品质量的要求,打开第一底部卸料装置241,以排放TFT玻璃的玻璃液底部的杂质。将第一底部卸料装置241设置于鼓泡装置500之前,使TFT玻璃的玻璃液在流过窑坎800之前能够排出杂质。In order to obtain satisfactory glass quality, a first bottom discharge device 241 is provided on the bottom brick of the clarification tank 200, and the first bottom discharge device 241 is located behind all the electrodes 210 in the tank, And the first bottom discharge device 241 is in front of the bubbling device 500 . When the present invention is used, according to the requirements of product quality, the first bottom unloading device 241 is opened to discharge the impurities at the bottom of the molten glass of TFT glass. The first bottom unloading device 241 is arranged before the bubbling device 500 so that the molten glass of the TFT glass can discharge impurities before flowing through the kiln sill 800 .
所述澄清池200的池体底砖上设有第二底部卸料装置242,所述第二底部卸料装置242处于所述窑坎800的后方,且处于澄清池200的出料口600的前方。本发明使用时,根据产品质量的要求,打开第二底部卸料装置242,以排放TFT玻璃的玻璃液底部的杂质。将第二底部卸料装置242设置于窑坎800之后、出料口600之前;使TFT玻璃的玻璃液在进出铂金料道700之前排出杂质。The bottom brick of the clarifier 200 is provided with a second bottom discharge device 242, the second bottom discharge device 242 is located behind the kiln ridge 800, and is located at the outlet 600 of the clarifier 200. ahead. When the present invention is used, according to the requirements of product quality, the second bottom unloading device 242 is opened to discharge the impurities at the bottom of the molten glass of TFT glass. The second bottom unloading device 242 is arranged behind the kiln ridge 800 and before the outlet 600 ; the molten glass of the TFT glass discharges impurities before entering and exiting the platinum forehearth 700 .
上升道400的底部设有中间泄料装置420,以排放TFT玻璃的玻璃液底部的杂质。An intermediate discharge device 420 is provided at the bottom of the ascending channel 400 to discharge impurities at the bottom of the molten glass of the TFT glass.
为了防止流液洞300在投产时或停止引板时出现冻料,在流液洞300的进口端和出口端上分别设置有防堵电极;防堵电极对TFT玻璃的玻璃液进行加热。为了减缓TFT玻璃的玻璃液在上升道400中的温降,在上升道400的上升侧壁上设置侧插电极,侧插电极对TFT玻璃的玻璃液进行加热。In order to prevent the liquid flow hole 300 from freezing when it is put into production or when the lead plate is stopped, anti-blocking electrodes are respectively arranged on the inlet and outlet ends of the flow hole 300; the anti-blocking electrodes heat the glass liquid of the TFT glass. In order to slow down the temperature drop of the TFT glass molten glass in the ascending channel 400 , side-inserted electrodes are arranged on the ascending side wall of the ascending channel 400 , and the side-inserted electrodes heat the TFT glass molten glass.
本发明的熔窑,将熔化和高温澄清、均化的过程分开,既可有效降低TFT玻璃配合料熔化时硼的高挥发及其所产生的缺陷,又可起到TFT玻璃的玻璃液高效澄清及均化作用,从而避免产品中条纹等缺陷的出现,显著提高产品质量;澄清池200内的鼓泡装置500和窑坎800的设置,极大地提高了TFT玻璃的玻璃液中的微气泡的逸出速度,加速了TFT玻璃的玻璃液的澄清效率,同时鼓泡装置500还加速了TFT玻璃的玻璃液的对流,窑坎800的设置提高了TFT玻璃的玻璃液的温度,这样,TFT玻璃的玻璃液的均化效率也得到显著提高,而且本发明的冷顶全电熔窑100的规模不受熔化出来的TFT玻璃的玻璃液质量影响,即可实现较大的规模。The melting furnace of the present invention separates the process of melting from high-temperature clarification and homogenization, which can effectively reduce the high volatilization of boron and the defects caused by the melting of TFT glass batch materials, and can effectively clarify the glass liquid of TFT glass and homogenization, thereby avoiding the occurrence of defects such as streaks in the product, and significantly improving product quality; the setting of the bubbling device 500 and the kiln ridge 800 in the clarification tank 200 greatly improves the microbubbles in the glass liquid of TFT glass. The escape speed accelerates the clarification efficiency of the molten glass of the TFT glass, while the bubbling device 500 also accelerates the convection of the molten glass of the TFT glass, and the setting of the kiln ridge 800 improves the temperature of the molten glass of the TFT glass. In this way, the TFT glass The homogenization efficiency of the molten glass is also significantly improved, and the scale of the cold-top all-electric melting furnace 100 of the present invention is not affected by the quality of the molten glass of the melted TFT glass, so a larger scale can be realized.
综上,本发明有效克服了现有技术中的种种缺点而具高度产业利用价值。To sum up, the present invention effectively overcomes various shortcomings in the prior art and has high industrial application value.
上述实施例仅例示性说明本发明的原理及其功效,而非用于限制本发明。任何熟悉此技术的人士皆可在不违背本发明的精神及范畴下,对上述实施例进行修饰或改变。因此,举凡所属技术领域中具有通常知识者在未脱离本发明所揭示的精神与技术思想下所完成的一切等效修饰或改变,仍应由本发明的权利要求所涵盖。The above-mentioned embodiments only illustrate the principles and effects of the present invention, but are not intended to limit the present invention. Anyone skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or changes made by those skilled in the art without departing from the spirit and technical ideas disclosed in the present invention should still be covered by the claims of the present invention.
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