CN106409745A - Peeling method and peeling apparatus - Google Patents
Peeling method and peeling apparatus Download PDFInfo
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- CN106409745A CN106409745A CN201610607279.9A CN201610607279A CN106409745A CN 106409745 A CN106409745 A CN 106409745A CN 201610607279 A CN201610607279 A CN 201610607279A CN 106409745 A CN106409745 A CN 106409745A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
- H10P95/11—Separation of active layers from substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7412—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
提供剥离方法和剥离装置,能够不使用复杂的结构和运行成本负担大的剥离用的带而将粘贴在半导体晶片(板状部件)上的保护带(片材)剥离。根据本申请,提供剥离方法和能够执行该剥离方法的剥离装置,该剥离方法至少包含:第1剥离工序,使前端针状部件的前端部抵靠保持工作台所保持的板状部件的片材的外周的至少一部分,而使该一部分从该板状部件剥离;剥离起点部生成工序,对该一部分已剥离的该片材与该板状部件之间吹入空气,生成由包含该一部分在内的被扩大的剥离区域形成的剥离起点部;以及最终剥离工序,以该剥离起点部为起点,使该片材的未剥离的残余部分从该板状部件分离而进行剥离。
Provided are a peeling method and a peeling device capable of peeling a protective tape (sheet) affixed to a semiconductor wafer (plate member) without using a peeling tape with a complicated structure and a large burden on running costs. According to the present application, a peeling method and a peeling device capable of performing the peeling method are provided. The peeling method includes at least: a first peeling step of making the front end of the front needle-shaped member abut against the sheet of the plate-shaped member held by the holding table. At least a part of the outer periphery, so that this part is peeled from the plate-shaped member; the peeling starting point generation process blows air between the part of the peeled sheet and the plate-shaped member, and generates a part that includes the part. a peeling starting point formed by the enlarged peeling region; and a final peeling step of separating and peeling the unpeeled remaining portion of the sheet from the plate-shaped member starting from the peeling starting point.
Description
技术领域technical field
本发明涉及将粘贴在半导体晶片等板状部件上的片材剥离的剥离方法和剥离装置。The present invention relates to a peeling method and a peeling device for peeling a sheet adhered to a plate-like member such as a semiconductor wafer.
背景技术Background technique
在半导体器件的制造工艺中,在大致圆板形状的半导体晶片的正面上通过配置成格子状的分割预定线划分出多个区域,在该划分出的区域内形成IC、LSI等器件。并且,在通过磨削装置对该半导体晶片的背面进行磨削并形成为规定的厚度之后,通过划片装置、激光加工装置等沿着分割预定线切断该半导体晶片从而对形成有器件的区域进行分割而制造出各个半导体器件。In the manufacturing process of semiconductor devices, a plurality of regions are divided by dividing lines arranged in a grid pattern on the front surface of a substantially disk-shaped semiconductor wafer, and devices such as ICs and LSIs are formed in the divided regions. And, after the back surface of the semiconductor wafer is ground to a predetermined thickness by a grinding device, the semiconductor wafer is cut along a planned dividing line by a dicing device, a laser processing device, etc. Individual semiconductor devices are manufactured by dividing.
为了使上述的IC、LSI等半导体芯片小型化,优选在上述磨削工序中尽可能地使半导体晶片(板状部件)的背面变薄,在磨削时为了保护半导体晶片的形成有器件的正面而粘贴由粘接膜等构成的保护带(片材)。In order to miniaturize semiconductor chips such as ICs and LSIs, it is preferable to make the back surface of the semiconductor wafer (plate-shaped member) as thin as possible in the above-mentioned grinding process, and to protect the front surface of the semiconductor wafer on which devices are formed during grinding. On the other hand, a protective tape (sheet) made of an adhesive film or the like is pasted.
在磨削工序结束之后,需要使所述保护带从半导体晶片剥离,作为该保护带的剥离方法,公知有将剥离用的粘合带热压接于保护带的端部,牵拉该粘合带而使该保护带从半导体晶片剥离,其中,该保护带粘贴在半导体晶片的正面上(例如,参照专利文献1、2)。After the grinding process is completed, the protective tape needs to be peeled off from the semiconductor wafer. As a method for peeling the protective tape, it is known to bond an adhesive tape for peeling to the end of the protective tape by thermocompression, and pull the adhesive tape. The protective tape is peeled off from the semiconductor wafer, wherein the protective tape is stuck on the front surface of the semiconductor wafer (for example, refer to Patent Documents 1 and 2).
专利文献1:日本特开平11-016862号Patent Document 1: Japanese Patent Application Laid-Open No. 11-016862
专利文献2:日本特开2003-338477号Patent Document 2: Japanese Patent Laid-Open No. 2003-338477
在上述的基于以往的技术的保护带的剥离装置中,存在如下的问题:由于保护带因磨削工序时产生的按压力而粘贴在半导体晶片的正面上,所以成为当从半导体晶片的正面剥离保护带时将发挥较强的粘接力的剥离用带粘贴到保护带上并对该剥离用带进行牵拉从而剥离保护带的结构,为了实现该结构,至少需要剥离用带的传送机构、剥离用带的切断机构、剥离用带的压接机构,构造变得复杂。进而,还产生了如下问题:如上述所述,对剥离用带要求较强的粘接力,并且要求其能够耐受牢固地粘贴的保护带的剥离工序的强度,作为消耗品而使用的该剥离装置的剥离用带的运行成本变高。In the peeling device of the protective tape based on the above-mentioned prior art, there is the following problem: since the protective tape is stuck on the front surface of the semiconductor wafer due to the pressing force generated during the grinding process, it becomes difficult to peel the protective tape from the front surface of the semiconductor wafer. In the case of a protective tape, a peeling tape exhibiting a strong adhesive force is attached to the protective tape, and the peeling tape is pulled to peel off the protective tape. In order to realize this structure, at least a conveying mechanism for the peeling tape, The structure of the cutting mechanism of the peeling tape and the crimping mechanism of the peeling tape becomes complicated. Furthermore, the following problems have also arisen: as described above, a strong adhesive force is required for the peeling tape, and it is required to be able to withstand the strength of the peeling process of the protective tape firmly attached, and the tape used as a consumable The running cost of the peeling tape of the peeling device becomes high.
并且,在上述的以往的技术中,存在如下的问题:在将剥离用带压接于保护带的端部而进行了剥离之后,在将剥离后的保护带废弃至剥离装置的废弃容器中时,剥离用带的粘接面会附着在废弃容器的侧壁等上,无论废弃容器的容量是否还有剩余,剥离后的保护带会堵塞废弃容器的开口部,不能充分地利用废弃容器的容量。In addition, in the above-mentioned conventional technology, there is a problem in that after the peeling tape is bonded to the end of the protective tape by pressure and peeled, the peeled protective tape is discarded in the waste container of the peeling device. , The adhesive surface of the peeling tape will adhere to the side wall of the waste container, regardless of whether there is any remaining capacity in the waste container, the peeled protective tape will block the opening of the waste container, and the capacity of the waste container cannot be fully utilized.
发明内容Contents of the invention
本发明的目的在于提供一种剥离方法和剥离装置,不使用复杂的结构或运行成本负担大的剥离用的带便能够将粘贴在半导体晶片(板状部件)上的保护带(片材)剥离。The object of the present invention is to provide a peeling method and peeling device capable of peeling a protective tape (sheet) attached to a semiconductor wafer (plate-like member) without using a tape for peeling with a complicated structure or a large burden of running costs. .
为了解决上述技术课题,根据本发明,提供一种剥离方法,将粘贴在板状部件上的片材从板状部件剥离,其中,该剥离方法至少包含如下的工序:第1剥离工序,使前端针状部件的前端部抵靠保持工作台所保持的该板状部件的该片材的外周的至少一部分,而使该一部分从该板状部件剥离;剥离起点部生成工序,对该一部分已剥离的该片材与该板状部件之间吹入空气,生成由包含该一部分在内的被扩大的剥离区域形成的剥离起点部;以及最终剥离工序,以该剥离起点部为起点,使该片材的未剥离的残余部分从该板状部件分离而进行剥离。In order to solve the above-mentioned technical problems, according to the present invention, a peeling method is provided for peeling a sheet attached to a plate-shaped member from the plate-shaped member, wherein the peeling method includes at least the following steps: a first peeling step, making the front end The front end portion of the needle-shaped member abuts against at least a part of the outer periphery of the sheet of the plate-shaped member held by the holding table, so that the part is peeled off from the plate-shaped member; Air is blown between the sheet and the plate member to generate a peeling starting point formed by an enlarged peeling region including the part; and the final peeling process is to make the sheet from the peeling starting point The unpeeled remaining portion is separated from the plate-like member for peeling.
在上述剥离方法中,该剥离方法具有剥离起点部夹持工序,在该剥离起点部生成工序之后,对所生成的该剥离起点部进行夹持,经过该剥离起点夹持工序而执行该最终剥离工序。并且,在该剥离起点部生成工序中,也可以具有第2剥离工序,对该片材与该板状部件之间吹入空气,在生成剥离起点部之后,进一步抵靠前端针状部件的前端部而使剥离区域扩大。In the above-mentioned peeling method, the peeling method has a peeling starting point clamping step, after the peeling starting point generating step, the generated peeling starting point is clamped, and the final peeling is performed through the peeling starting point clamping step process. In addition, in the peeling starting point generating step, there may be a second peeling step, in which air is blown between the sheet and the plate-shaped member, and after the peeling starting point is generated, it is further abutted against the tip of the tip needle-shaped member. The exfoliation area is enlarged.
进而,根据本发明,提供一种剥离装置,其将粘贴在板状部件上的片材从板状部件剥离,其中,该剥离装置具有:保持工作台,其具有对粘贴了该片材的板状部件进行保持的保持面;剥离起点部生成单元,其使针状部件的前端部抵靠该保持工作台所保持的该板状部件的该片材的外周的至少一部分而使该一部分从该板状部件剥离,对该一部分已剥离的该片材与该板状部件之间吹入空气,生成由包含该一部分在内的被扩大的剥离区域形成的剥离起点部;夹持单元,其对该已剥离的剥离起点部进行夹持;分离单元,其使夹持了该剥离起点部的该夹持单元相对于该保持工作台向上方分离;弯折辊,其在向上方分离了的该夹持单元的下方对从该板状部件剥离了的该片材的粘接面侧进行作用,将该片材一边从该板状部件剥离一边在剥离方向上弯折;以及移动单元,其使该弯折辊与该保持工作台中的至少一方在与该板状部件并行的剥离方向上相对地移动,以便该片材从该板状部件剥离,通过该移动单元的移动使该片材全部从该板状部件剥离。Furthermore, according to the present invention, there is provided a peeling device for peeling a sheet adhered to a plate-shaped member from a plate-shaped member, wherein the peeling device has: The holding surface on which the plate-shaped member is held; the peeling starting point generation unit, which makes the front end of the needle-shaped member abut against at least a part of the outer periphery of the sheet of the plate-shaped member held by the holding table so that the part is removed from the plate. The part is peeled off, and air is blown between the part of the sheet that has been peeled off and the plate-shaped part to generate a peeling starting point formed by an enlarged peeling area including the part; The peeling starting point that has been peeled off is clamped; the separation unit separates the clamping unit that clamped the peeling starting point upward relative to the holding table; The lower side of the holding unit acts on the adhesive surface side of the sheet peeled off from the plate-shaped member, and bends the sheet in the peeling direction while peeling off the plate-shaped member; and the moving unit makes the sheet The bending roller and at least one of the holding tables move relatively in a peeling direction parallel to the plate-shaped member, so that the sheet is peeled from the plate-shaped member, and the sheet is completely removed from the plate-shaped member by the movement of the moving unit. Plate parts are peeled off.
在上述剥离装置中,具有:片材保持单元,其对从该板状部件剥离了的该片材进行吸引保持;以及废弃容器,其对剥离后的所述片材进行收纳,优选构成为:该片材保持单元在对该片材进行吸引保持之后,移动至该废弃容器的正上方,在该废弃容器的正上方解除对所吸引保持的该片材的吸引,将该片材收纳在该废弃容器内。In the above peeling device, there are: a sheet holding unit that sucks and holds the sheet peeled from the plate member; and a waste container that stores the peeled sheet, and is preferably configured as follows: After the sheet holding unit sucks and holds the sheet, it moves to directly above the waste container, releases the suction of the suction-held sheet directly above the waste container, and stores the sheet in the waste container. In waste container.
本发明的剥离方法由上述那样构成,是将粘贴在板状部件上的片材从板状部件剥离的剥离方法,由于该剥离方法至少包含:第1剥离工序,使前端针状部件的前端部抵靠保持工作台所保持的该板状部件的该片材的外周的至少一部分,而使该一部分从该板状部件剥离;剥离起点部生成工序,对该一部分已剥离的该片材与该板状部件之间吹入空气,生成由包含该一部分在内的被扩大的剥离区域形成的剥离起点部;以及最终剥离工序,以该剥离起点部为起点,使该片材的未剥离的残余部分从该板状部件分离而进行剥离,所以不需要剥离用的带的传送、切断、压接机构,不需要高价的剥离用带等消耗品,能够抑制执行剥离工序时的运行成本。The peeling method of the present invention is constituted as above, and is a peeling method for peeling a sheet attached to a plate-shaped member from a plate-shaped member. Since the peeling method includes at least: a first peeling step, the front end of the needle-shaped member at the front end is abutting against at least a part of the outer periphery of the sheet of the plate-shaped member held by the holding table, and peeling the part from the plate-shaped member; Air is blown between the shaped parts to generate a peeling starting point formed by an enlarged peeling region including the part; Since the strip is separated and peeled from the plate-shaped member, there is no need for a mechanism for conveying, cutting, and crimping the strip for stripping, and expensive consumables such as a strip for stripping are unnecessary, and the running cost at the time of performing the stripping process can be suppressed.
进而,本发明的剥离装置是将粘贴在板状部件上的片材从板状部件剥离的剥离装置,由于该剥离装置具有:保持工作台,其具有对粘贴了该片材的板状部件进行保持的保持面;剥离起点部生成单元,其使针状部件的前端部抵靠该保持工作台所保持的该板状部件的该片材的外周的至少一部分而使该一部分从该板状部件剥离,对该一部分已剥离的该片材与该板状部件之间吹入空气,生成由包含该一部分在内的被扩大的剥离区域形成的剥离起点部;夹持单元,其对该已剥离的剥离起点部进行夹持;分离单元,其使夹持了该剥离起点部的该夹持单元相对于该保持工作台向上方分离;弯折辊,其在向上方分离了的该夹持单元的下方对从该板状部件剥离了的该片材的粘接面侧进行作用,将该片材一边从该板状部件剥离一边在剥离方向上弯折;以及移动单元,其使该弯折辊与该保持工作台中的至少一方在与该板状部件并行的剥离方向上相对地移动,以便该片材从该板状部件剥离,通过该移动单元的移动使该片材全部从该板状部件剥离,所以与上述同样,不需要剥离用的带的传送、切断、压接机构,不需要高价的剥离用带等消耗品,能够抑制执行剥离工序时的运行成本。Furthermore, the peeling device of the present invention is a peeling device that peels the sheet attached to the plate-shaped member from the plate-shaped member. Since the peeling device has: The holding surface for holding; a peeling starting point generating unit that abuts the front end of the needle member against at least a part of the outer periphery of the sheet of the plate member held by the holding table to peel the part from the plate member Air is blown between the part of the peeled sheet and the plate member to generate a peeling starting point formed by an enlarged peeling region including the part; The peeling starting point is clamped; the separation unit is used to separate the clamping unit clamping the peeling starting point from the holding table upward; the bending roller is used to separate the clamping unit from the upward separation The lower side acts on the adhesive surface side of the sheet peeled from the plate-shaped member, bending the sheet in the peeling direction while peeling off the plate-shaped member; and a moving unit that makes the bending roller At least one of the holding tables is relatively moved in a peeling direction parallel to the plate-shaped member, so that the sheet is peeled off from the plate-shaped member, and the sheet is completely removed from the plate-shaped member by the movement of the moving unit. Therefore, similar to the above, there is no need for conveying, cutting, and crimping mechanisms for the stripping tape, and expensive consumables such as the stripping tape are not required, and the running cost when performing the stripping process can be suppressed.
并且,优选上述剥离装置具有:片材保持单元,其对从该板状部件剥离了的该片材进行吸引保持;以及废弃容器,其对剥离后的该片材进行收纳,该片材保持单元具有废弃单元,在对该片材进行了吸引保持之后,移动至该废弃容器的正上方,在该废弃容器的正上方解除对所吸引保持的该片材的吸引,将该片材收纳在该废弃容器内。在本发明所利用的剥离装置中,由于没有使用剥离用带等具有粘接性的消耗品,所以不存在当将该片材收纳于废弃容器中时附着在废弃容器的入口部或内侧侧面的担心,能够容易地通过片材保持单元以从废弃容器的底部重叠的方式将该片材废弃,能够充分地利用废弃容器的容量。In addition, it is preferable that the peeling device includes: a sheet holding unit that sucks and holds the sheet peeled from the plate member; and a waste container that stores the peeled sheet, and the sheet holding unit There is a waste unit, after the sheet is sucked and held, it is moved to the top of the waste container, the suction of the suctioned and held sheet is released right above the waste container, and the sheet is stored in the waste container. In waste container. In the peeling device used in the present invention, since no adhesive consumables such as peeling tapes are used, there is no such thing as sticking to the entrance or the inner side of the waste container when the sheet is stored in the waste container. Unfortunately, the sheets can be easily discarded by stacking them from the bottom of the waste container by the sheet holding unit, and the capacity of the waste container can be fully utilized.
附图说明Description of drawings
图1是根据本发明而构成的剥离装置的立体图。Figure 1 is a perspective view of a peeling device constructed in accordance with the present invention.
图2的(a)、(b)、(c)是示出图1所示的剥离装置的片材保持单元的立体图。(a), (b), and (c) of FIG. 2 are perspective views showing the sheet holding unit of the peeling device shown in FIG. 1 .
图3是示出构成图1所示的剥离装置的弯折辊的支承框架的立体图。Fig. 3 is a perspective view showing a support frame of bending rollers constituting the peeling device shown in Fig. 1 .
图4是图1所示的剥离装置的剥离起点部生成单元的立体图。Fig. 4 is a perspective view of a peeling origin generating unit of the peeling device shown in Fig. 1 .
图5是图1所示的剥离装置的主要部分侧视图。Fig. 5 is a side view of main parts of the peeling device shown in Fig. 1 .
图6是示出在图5所示的状态下,将粘贴有保护带的半导体晶片载置到保持工作台上的状态的主要部分侧视图。6 is a side view of main parts showing a state in which the semiconductor wafer to which the protective tape is pasted is placed on the holding table in the state shown in FIG. 5 .
图7是示出从图6的状态起使保持工作台移动而使半导体晶片移动的状态的主要部分侧视图。7 is a side view of main parts showing a state in which the holding table is moved to move the semiconductor wafer from the state in FIG. 6 .
图8是示出使前端针状部件从图7的状态向下方移动而接近半导体晶片的状态的主要部分侧视图。8 is a side view of main parts showing a state in which the tip needle member is moved downward from the state shown in FIG. 7 to approach the semiconductor wafer.
图9是示出从图8的状态起使前端针状部件相对于半导体晶片抵靠的状态的主要部分侧视图。FIG. 9 is a side view of main parts showing a state in which the tip needle member is brought into contact with the semiconductor wafer from the state shown in FIG. 8 .
图10是示出从图9的状态起从空气喷嘴对保护带的剥离部分与半导体晶片之间喷射空气的状态的主要部分侧视图。10 is a side view of main parts showing a state in which air is sprayed from the air nozzle between the peeled portion of the protective tape and the semiconductor wafer from the state of FIG. 9 .
图11是示出从图10的状态起使夹持部件进行动作而对剥离后的保护带的外周端部进行了夹持的状态的主要部分侧视图。Fig. 11 is a side view of main parts showing a state in which the grip member is operated to grip the outer peripheral end of the peeled protective tape from the state shown in Fig. 10 .
图12是示出从图11的状态起使弯折辊移动而与保护带的粘接面接触的状态的主要部分侧视图。Fig. 12 is a side view of main parts showing a state in which the bending roller is moved to contact the adhesive surface of the protective tape from the state of Fig. 11 .
图13是示出从图12的状态起使弯折辊和保持工作台移动而使保护带弯折、使剥离推进的状态的图。Fig. 13 is a view showing a state in which the protective tape is bent and peeled off by moving the bending roller and the holding table from the state of Fig. 12 .
图14是示出从图13的状态起使弯折辊移动而使保护带从半导体晶片剥离的状态的图。FIG. 14 is a diagram showing a state in which the protective tape is peeled off from the semiconductor wafer by moving the bending rollers from the state in FIG. 13 .
图15是示出从图14的状态起将剥离后的保护带吸引保持在片材保持板的下表面的状态的图。FIG. 15 is a diagram illustrating a state in which the peeled protective tape is sucked and held on the lower surface of the sheet holding plate from the state in FIG. 14 .
图16是示出从图15的状态起在将保护带吸引保持于片材保持板的下表面的状态下使片材保持单元移动至废弃容器正上方的状态的主要部分侧视图。16 is a side view of main parts showing a state in which the sheet holding unit is moved to directly above the waste container while the protective tape is sucked and held on the lower surface of the sheet holding plate from the state in FIG. 15 .
图17是示出从图16的状态起使片材保持板下降至废弃容器内的状态的图。Fig. 17 is a diagram showing a state in which the sheet holding plate is lowered into the waste container from the state in Fig. 16 .
标号说明Label description
1:剥离装置;2:静止基台;3:保持工作台机构(保持工作台);4:片材保持单元;5:弯折辊移动单元;6:剥离起点部生成单元;7:废弃容器;10:半导体晶片(板状部件);11:保护带(片材);12:剥离起点部;31、31:导轨;32:移动基台;36:工作台主体;41:第1气缸;44:第2气缸;47:第3气缸;48:夹持部件;55:弯折辊;61:第4气缸;64:前端部件;65:前端针状部件;66:空气喷嘴。1: Peeling device; 2: Stationary abutment; 3: Holding table mechanism (holding table); 4: Sheet holding unit; 5: Bending roller moving unit; 6: Peeling starting point generating unit; 7: Waste container ;10: semiconductor wafer (plate-shaped part); 11: protective tape (sheet); 12: peeling starting point; 31, 31: guide rail; 32: mobile base; 36: table main body; 44: No. 2 cylinder; 47: No. 3 cylinder; 48: Clamping member; 55: Bending roller; 61: No. 4 cylinder; 64: Front part; 65: Front needle part; 66: Air nozzle.
具体实施方式detailed description
以下,参照附图对根据本发明而构成的剥离方法以及用于执行该剥离方法的剥离装置的优选的实施方式进行详细地说明。Hereinafter, preferred embodiments of a peeling method according to the present invention and a peeling device for performing the peeling method will be described in detail with reference to the drawings.
在图1中示出了根据本发明而构成的剥离装置1的一实施方式的立体图。图示的实施方式中的剥离装置1具有:静止基台2、保持工作台机构3、片材保持单元4、弯折辊移动单元5、剥离起点部生成单元6以及废弃容器7。FIG. 1 shows a perspective view of one embodiment of a peeling device 1 constructed according to the present invention. The peeling device 1 in the illustrated embodiment includes a stationary base 2 , a holding table mechanism 3 , a sheet holding unit 4 , a bending roller moving unit 5 , a peeling starting point generating unit 6 , and a waste container 7 .
如图所示,所述保持工作台机构3包含:两条导轨31、31,其在静止基台2上沿着箭头X所示的剥离加工进给方向(剥离方向)配设;移动基台32,其滑动自如地配设在该2条导轨31、31上;滚珠丝杠轴33,其沿着导轨31、31而与该移动基台32的下表面的螺母部卡合;轴承34,其在该滚珠丝杠轴33的一端侧将该滚珠丝杠轴33支承为旋转自如;以及脉冲电动机35,其用于在另一端侧使该滚珠丝杠轴33旋转并使该移动基台32在X方向上以自由往复移动的方式移动。As shown in the figure, the holding table mechanism 3 includes: two guide rails 31, 31, which are arranged on the stationary base 2 along the feeding direction (peeling direction) of the peeling process shown by arrow X; 32, which is slidably arranged on the two guide rails 31, 31; the ball screw shaft 33, which is engaged with the nut portion on the lower surface of the mobile base 32 along the guide rails 31, 31; bearing 34, This ball screw shaft 33 is rotatably supported on one end side of the ball screw shaft 33 ; Move in a free reciprocating manner in the X direction.
该移动基台32具有:圆筒状的工作台主体36,其配设在该移动基台32上;以及吸附卡盘37,其配设在该工作台主体36的上表面。吸附卡盘37由多孔陶瓷材料形成并与未图示的吸引单元连接,在该吸附卡盘37的表面上产生适当的负压。因此,通过使未图示的吸引单元进行动作而将载置在吸附卡盘37上的构成本发明的板状部件的半导体晶片10吸引保持在吸附卡盘37上。The moving base 32 has a cylindrical table body 36 disposed on the moving base 32 , and an adsorption chuck 37 disposed on the upper surface of the table body 36 . The suction chuck 37 is formed of a porous ceramic material, is connected to a suction unit (not shown), and an appropriate negative pressure is generated on the surface of the suction chuck 37 . Therefore, the semiconductor wafer 10 constituting the plate-shaped member of the present invention placed on the suction chuck 37 is sucked and held on the suction chuck 37 by operating a suction unit (not shown).
如图1、图2的(a)~(c)所示,片材保持单元4配设在静止基台2上,该片材保持单元4具有:第1气缸41,其竖立设置在该静止基台2上;以及保持基座43,其被从该第1气缸41延伸的轴42支承。在该保持基座43上配设有:第2气缸44,其竖立设置在上表面上;片材保持板46,其被从该第2气缸44贯通至保持基座43的下表面侧并第2气缸44的进退自如的轴45支承;第3气缸47,其配设在该保持基座43上,在端部具有夹持片48a并具有在水平方向上进退自如的轴;以及夹持片48b,其位于所述保持基座43的下表面侧,配置在与该夹持片48a相对的位置,与夹持片48a一起构成夹持单元48。As shown in Fig. 1 and (a) to (c) of Fig. 2, the sheet holding unit 4 is arranged on the stationary base 2, and the sheet holding unit 4 has: a first air cylinder 41, which is erected on the stationary base 2. and a holding base 43 supported by a shaft 42 extending from the first cylinder 41 . The holding base 43 is provided with: a second air cylinder 44 erected on the upper surface; and a sheet holding plate 46 penetrating from the second air cylinder 44 to the lower surface side of the holding base 43 and second. 2. The cylinder 44 is supported by the shaft 45 which can move forward and backward freely; the third cylinder 47 is arranged on the holding base 43 and has a holding piece 48a at the end and has a shaft which can move forward and backward freely in the horizontal direction; and the holding piece 48b is located on the lower surface side of the holding base 43, is arranged at a position facing the clamping piece 48a, and constitutes a clamping unit 48 together with the clamping piece 48a.
所述片材保持板46构成为内部中空,在下表面的整个面上设置有多个未图示的微孔,构成为能够借助将第2气缸44和片材保持板46连结的轴内部对片材保持板46内部进行吸引,能够借助所述微孔在片材保持板下表面上产生负压。The sheet holding plate 46 is configured to be hollow inside, and a plurality of microholes not shown are provided on the entire lower surface, and is configured so that the sheet can be aligned inside the shaft that connects the second air cylinder 44 and the sheet holding plate 46 . Suction is carried out inside the sheet holding plate 46, and a negative pressure can be generated on the lower surface of the sheet holding plate by means of the micropores.
所述保持基座43构成为能够与轴42一起上下移动,该轴42以能够进退的方式被所述第1气缸41驱动,进而,如图2的(b)中的箭头所示,保持基座43能够以该轴42为中心在水平方向上旋转。另外,通过使该保持基座43从位于导轨31、31上的图2的(a)的位置朝向图2的(b)所示的位置按照顺时针方向旋转,能够将所述片材保持板46移动至设置在静止基台2的附近的废弃容器7的正上方。The holding base 43 is configured to be able to move up and down together with the shaft 42, which is driven by the first air cylinder 41 so as to be capable of advancing and retreating. Furthermore, as shown by the arrow in FIG. The base 43 can rotate in the horizontal direction around the shaft 42 . In addition, by rotating the holding base 43 in the clockwise direction from the position shown in FIG. 2(a) on the guide rails 31, 31 toward the position shown in FIG. 46 moves to directly above the waste container 7 installed in the vicinity of the stationary base 2 .
如图3所示,所述弯折辊移动单元5由呈门型形状的支承框架51构成,该支承框架51具有:柱部52、52,其沿着支承基台2上的导轨31、31隔开间隔地并排设置;支承部53,其将该柱部52、52的上端连结;以及弯折辊55,其借助内设在该支承部53内的未图示的驱动机构沿着该支承部53的引导孔54移动。该弯折辊55能够绕长度方向的轴中心旋转,至少比粘贴在半导体晶片10上并构成了本发明的片材的保护带11的直径长,并且,在其正面上涂布有氟树脂以便剥离后的保护带的粘接面不会附着。As shown in FIG. 3 , the bending roller moving unit 5 is composed of a support frame 51 in a door-shaped shape, and the support frame 51 has: column parts 52, 52 that follow the guide rails 31, 31 on the support base 2 Arranged side by side at intervals; a support part 53, which connects the upper ends of the column parts 52, 52; The guide hole 54 of the part 53 moves. This bending roller 55 can rotate around the axial center of the longitudinal direction, is at least longer than the diameter of the protective tape 11 that is pasted on the semiconductor wafer 10 and constitutes the sheet of the present invention, and is coated with fluororesin on its front surface so that The adhesive surface of the peeled protective tape will not adhere.
如图4所示,所述剥离起点部生成单元6包含:第4气缸61;轴62,其从该第4气缸61延伸并能够以自由进退的方式对高度方向上的位置进行微调整;臂部件63;以及前端部件64,其设置在该臂部件63的前端部并具有前端针状部件65和空气喷嘴66。通过该结构,前端部件64构成为能够上下移动,并构成为能够通过调整其高度位置来将针状部件的前端部定位在该板状部件上的保护带的高度位置。并且,空气喷嘴66构成为经由第4气缸61、轴62对其供给空气,并能够根据需要喷出空气。As shown in FIG. 4 , the peeling starting point generating unit 6 includes: a fourth air cylinder 61; a shaft 62 extending from the fourth air cylinder 61 and capable of finely adjusting the position in the height direction in a freely advancing and retreating manner; member 63 ; and a front end member 64 provided at the front end portion of the arm member 63 and having a front needle member 65 and an air nozzle 66 . With this configuration, the tip member 64 is configured to be movable up and down, and is configured to be able to position the tip of the needle member at the height position of the protective band on the plate member by adjusting its height position. Furthermore, the air nozzle 66 is configured to supply air thereto via the fourth air cylinder 61 and the shaft 62 and to discharge air as necessary.
如图1所记载的那样,废弃容器7构成为配置在静止基台2的片材保持单元4的附近,形成为上方开放的圆筒状,并形成为比切成大致圆形状而使用的保护带11大一圈,能够将由本发明的剥离装置剥离的该保护带11层叠在容器内。As described in FIG. 1 , the waste container 7 is configured to be arranged near the sheet holding unit 4 of the stationary base 2, and is formed in a cylindrical shape with an open top, and is formed into a protective cover that is cut into a substantially circular shape and used. The tape 11 is larger, and the protective tape 11 peeled off by the peeling device of the present invention can be stacked in the container.
图示的实施方式中的剥离装置1由以上所述的那样构成,一边参照图5到17一边对其作用进行说明。另外,图5到图15是图1的剥离装置1的主要部分侧视图,为了容易理解地对动作进行说明,适当省略了静止基台2、支承框架51、第1气缸41、第4气缸61、电动机35等与动作说明无直接关系的结构。The peeling device 1 in the illustrated embodiment is configured as described above, and its operation will be described with reference to FIGS. 5 to 17 . In addition, FIGS. 5 to 15 are side views of main parts of the peeling device 1 of FIG. 1 , and the stationary base 2 , support frame 51 , first air cylinder 41 , and fourth air cylinder 61 are appropriately omitted in order to explain the operation easily. , motor 35 and the like are structures that are not directly related to the description of the action.
在该剥离装置1中,在开始进行将粘贴在半导体晶片10上的保护带11剥离的剥离工序时,首先,如图5所示,使移动基台32在保持工作台机构3的导轨31、31上在待机位置(图中右侧)待机,并且利用第2气缸44将片材保持板46提升至最上位的位置。并且,弯折辊55被定位在比空气喷嘴66靠移动基台32的待机位置侧。In this peeling device 1, when starting the peeling process of peeling the protective tape 11 stuck on the semiconductor wafer 10, first, as shown in FIG. 31 is on standby at the standby position (right side in the figure), and the sheet holding plate 46 is lifted to the uppermost position by the second air cylinder 44 . Furthermore, the bending roller 55 is positioned on the standby position side of the moving base 32 relative to the air nozzle 66 .
如图5、6所示,首先,将正面上粘贴有保护带11的半导体晶片10载置到移动基台32的工作台主体36的吸附卡盘37上。此时,通过吸附卡盘37背侧的空间与未图示的吸引单元连结而在吸附卡盘37上产生负压,半导体晶片10被吸引固定在吸附卡盘37上,其中,该吸附卡盘37由多孔陶瓷材料构成,在正背面间形成为能够通气。As shown in FIGS. 5 and 6 , first, the semiconductor wafer 10 with the protective tape 11 stuck on the front surface is placed on the adsorption chuck 37 of the stage main body 36 of the movable base 32 . At this time, the space on the back side of the suction chuck 37 is connected to a suction unit not shown to generate a negative pressure on the suction chuck 37, and the semiconductor wafer 10 is sucked and fixed on the suction chuck 37. 37 is made of a porous ceramic material, and is formed to be able to ventilate between the front and the back.
在将半导体晶片10固定在吸附卡盘37上之后,驱动脉冲电动机35并使滚珠丝杠轴33旋转,由此,使该移动基台32从图6的待机位置沿着导轨31移动至片材保持单元4和剥离起点部生成单元6的下方。此时,粘贴在半导体晶片10上的保护带11的外周端部的稍微外侧部分被定位在剥离起点部生成单元6的前端针状部件65的前端的正下方(参照图7)。After the semiconductor wafer 10 is fixed on the suction chuck 37, the pulse motor 35 is driven to rotate the ball screw shaft 33, thereby moving the moving base 32 from the standby position in FIG. Below the holding unit 4 and the peeling origin generating unit 6 . At this time, the slightly outer portion of the outer peripheral end of the protective tape 11 attached to the semiconductor wafer 10 is positioned directly below the tip of the tip needle member 65 of the peeling starting point generating unit 6 (see FIG. 7 ).
(第1剥离工序)(1st peeling process)
在将半导体晶片10的外周端部的稍微外侧部分定位在剥离起点部生成单元6的前端针状部件65的正下方之后,使第4气缸61动作而使前端针状部件65的前端部下降至接近半导体晶片10的保护带11的外周端部的位置(参照图8)。After the slightly outer portion of the outer peripheral end of the semiconductor wafer 10 is positioned directly below the tip needle-shaped member 65 of the peeling starting point generating unit 6, the fourth air cylinder 61 is operated to lower the tip of the tip needle-shaped member 65 to A position close to the outer peripheral end of the protective tape 11 of the semiconductor wafer 10 (see FIG. 8 ).
按照该保护带11的正面高度对该前端针状部件65的前端部的高度进行微调整,以便前端针状部件65的前端接近半导体晶片10的保护带11的外周部分,在该前端部已接近的状态下将该移动基台稍微向图中右方移动,由此,该前端针状部件65的前端抵靠于该保护带11的外周部分(参照图9)。另外,可以如图9所示从保护带11的周向外侧抵靠该前端部,也可以从该保护带11的外周部分的上方抵靠该前端部。The height of the front end portion of this front end needle-shaped member 65 is finely adjusted according to the front height of this protective tape 11, so that the front end of the front end needle-shaped member 65 is close to the outer peripheral portion of the protective tape 11 of the semiconductor wafer 10. The mobile base is moved slightly to the right in the drawing in the state of the left side, whereby the front end of the front end needle member 65 abuts against the outer peripheral portion of the protective tape 11 (see FIG. 9 ). In addition, as shown in FIG. 9 , the front end portion may be abutted from the outer side of the protective tape 11 in the circumferential direction, or may be abutted against the front end portion from above the outer peripheral portion of the protective tape 11 .
并且,在该前端部抵靠于该保护带11的外周部分之后,使该第4气缸61进行动作,使该前端针状部件65稍微上升并且使该移动基台进一步向右方移动,由此,该保护带11的外周部分的一部分被良好地剥离。And, after the front end portion abuts against the outer peripheral portion of the protective belt 11, the fourth air cylinder 61 is operated, the front end needle member 65 is slightly raised and the mobile base is further moved to the right, thereby , a part of the outer peripheral portion of the protective tape 11 was well peeled off.
(剥离起点部生成工序)(Peel origin part generation process)
在该保护带11的该一部分被剥离之后,如图10所示,使该前端部分64上升,并且从空气喷嘴66喷射高压空气,由此,该保护带11的外周部分从该前端针状部件65的前端部脱离,在该保护带11的外周部分中包含之前已剥离的该一部分的剥离区域扩大,生成适合于被后述的夹持单元48夹持的剥离起点部12。另外,对剥离起点部生成工序中的该保持基座43的高度进行调整,以便当该剥离起点部12被来自空气喷嘴66的高压空气剥离时,该剥离起点部12处在设置于该保持基座43上的夹持单元48的夹持片48a、48b之间。另外,也可以在通过所述空气喷嘴66喷射高压空气而使剥离区域扩大时,进一步使上述的第1剥离工序中使用的前端针状部件64抵靠。这样,良好地生成剥离起点部。After the part of the protective tape 11 is peeled off, as shown in FIG. 10, the front end portion 64 is raised, and high-pressure air is sprayed from the air nozzle 66, whereby the outer peripheral portion of the protective tape 11 is lifted from the front end needle-shaped member. 65 is detached, and the peeling area including the part that has been peeled off in the outer peripheral portion of the protective tape 11 is expanded, and the peeling starting point 12 suitable for being clamped by the clamping unit 48 described later is generated. In addition, the height of the holding base 43 in the peeling starting point generation process is adjusted so that when the peeling starting point 12 is peeled off by the high-pressure air from the air nozzle 66, the peeling starting point 12 is placed on the holding base. Between the clamping pieces 48a, 48b of the clamping unit 48 on the seat 43. In addition, when the high-pressure air is sprayed from the air nozzle 66 to expand the peeling area, the tip needle-like member 64 used in the first peeling step described above may be further brought into abutment. In this way, the peeling starting point is favorably produced.
(最终剥离工序)(final peeling process)
当所述保护带11的外周端部被来自空气喷嘴66的高压空气掀起时,暂时停止该移动基台32朝向待机位置方向的移动,通过第3气缸47的动作使夹持部件48a移动至夹持部件48b侧,通过夹持单元48对已剥离的保护带11的外周端部进行夹持(参照图11)。然后,使第1气缸41动作,由此,以能够使弯折辊55进入夹持单元48的下方的程度使片材保持单元4整体向上方移动。When the outer peripheral end of the protective belt 11 is lifted by the high-pressure air from the air nozzle 66, the movement of the moving base 32 toward the standby position is temporarily stopped, and the clamping member 48a is moved to the clamping position by the action of the third air cylinder 47. On the holding member 48b side, the outer peripheral end portion of the peeled protective tape 11 is held by the holding unit 48 (see FIG. 11 ). Then, the first air cylinder 41 is operated to move the entire sheet holding unit 4 upward to such an extent that the bending rollers 55 can enter below the nip unit 48 .
一边使所述片材保持单元4向上方移动并使移动基台32向待机方向移动,一边沿着所述门型的支承框架51的支承部53的引导孔54使弯折辊55移动至片材保持单元4侧(参照图12)。另外,对于弯折辊55而言,为了一边与保护带11的相对于半导体晶片10的粘接面侧抵接一边使剥离推进,在其表面上涂布有氟树脂以使其能够绕长度方向的轴中心旋转、且所接触的保护带11的粘接面不会附着其上。While moving the sheet holding unit 4 upward and moving the moving base 32 in the standby direction, the bending roller 55 is moved to the sheet along the guide hole 54 of the support portion 53 of the door-shaped support frame 51 . material holding unit 4 side (refer to Fig. 12). In addition, the bending roller 55 is coated with a fluororesin so that it can be wound in the longitudinal direction in order to advance the peeling while being in contact with the adhesive surface side of the protective tape 11 with respect to the semiconductor wafer 10 . The center of the shaft rotates, and the adhesive surface of the contacting protective tape 11 will not adhere to it.
虽然在本实施方式中,半导体晶片10上的保护带11朝向进行剥离的方向(图中左方)弯折180度(参照图13),但该弯折角度并不一定需要为180度。但是,半导体晶片10的背面被磨削而形成为极薄的板状,当该弯折角度较小时会存在当进行保护带11的剥离时引起半导体晶片10的破裂、破损等的担心,所以尽可能地优选180度或者与180度接近的角度来进行弯折。In the present embodiment, the protective tape 11 on the semiconductor wafer 10 is bent 180 degrees toward the peeling direction (left in the figure) (see FIG. 13 ), but the bending angle does not necessarily have to be 180 degrees. However, the back surface of the semiconductor wafer 10 is ground and formed into an extremely thin plate shape. If the bending angle is small, there is a possibility that the semiconductor wafer 10 may be cracked or damaged when the protective tape 11 is peeled off. It may be preferable to bend at an angle of 180 degrees or close to 180 degrees.
当弯折辊55移动至片材保持板46下表面的图中左方侧的另一端部时,保护带11从半导体晶片10完全剥离(参照图14)。这样,最终剥离工序完成。When the bending roller 55 moves to the other end on the left side in the figure on the lower surface of the sheet holding plate 46 , the protective tape 11 is completely peeled off from the semiconductor wafer 10 (see FIG. 14 ). In this way, the final peeling process is completed.
如图15所示,当剥离后的保护带11展开于片材保持板46的下表面时,通过未图示的吸引单元对形成为中空并在下表面上设置有微孔的片材保持板46的内部进行吸引,对剥离后的保护带11进行吸引保持。并且,移动基台32和弯折辊55移动至剥离工序开始时所定位的待机位置,并且通过第3气缸47的动作使夹持单元48a与另一个夹持单元48b分离而释放保护带11的外周端部。As shown in FIG. 15, when the peeled protective tape 11 is spread on the lower surface of the sheet holding plate 46, the sheet holding plate 46 formed hollow and provided with micropores on the lower surface is formed by a suction unit not shown. The inside of the strip is sucked, and the stripped protective tape 11 is sucked and held. And, the mobile base 32 and the bending roller 55 move to the standby position positioned when the peeling process starts, and the clamping unit 48a is separated from the other clamping unit 48b by the action of the third air cylinder 47 to release the tension of the protective tape 11. Peripheral end.
接下来,根据图2、16、17,对接着所述剥离工序、将剥离后的保护带11废弃至废弃容器7中的废弃工序进行说明。Next, a discarding step of discarding the peeled protective tape 11 in the discarding container 7 following the peeling step will be described with reference to FIGS. 2 , 16 , and 17 .
如前述的那样,从半导体晶片10剥离的保护带11在片材保持板46定位于静止基台2的导轨31、31的上方的状态下被吸引保持。As described above, the protective tape 11 peeled off from the semiconductor wafer 10 is sucked and held while the sheet holding plate 46 is positioned above the guide rails 31 , 31 of the stationary base 2 .
从该状态起,保持将保护带11吸引保持于片材保持板46的状态不变地,使第1气缸41的轴42绕俯视顺时针旋转,将该片材保持板46定位在废弃容器7的正上方,其中,该废弃容器7配设在静止基台2的附近(参照图2的(b)、图16)。另外,图16、17是从静止基台2的配设了废弃容器的一侧观察到的侧视图,为了方便说明,仅示出了片材保持单元4和废弃容器7,废弃容器7为剖视图。From this state, while maintaining the state in which the protective tape 11 is sucked and held on the sheet holding plate 46, the shaft 42 of the first air cylinder 41 is rotated clockwise around the top view, and the sheet holding plate 46 is positioned on the waste container 7. , where the waste container 7 is disposed near the stationary base 2 (see FIG. 2( b ), FIG. 16 ). In addition, FIGS. 16 and 17 are side views viewed from the side of the stationary base 2 where the waste container is disposed. For convenience of explanation, only the sheet holding unit 4 and the waste container 7 are shown, and the waste container 7 is a cross-sectional view. .
在将片材保持板46定位在废弃容器7的正上方之后,使第2气缸44动作而使片材保持板46下降到废弃容器7内(参照图17)。对于该下降时的下端位置,可以使用设置在废弃容器7内的未图示的水平传感器而根据废弃的保护带11的层叠水平使其适当变化,也可以按照对废弃的张数进行计数而计数出的张数使其变化。After positioning the sheet holding plate 46 directly above the waste container 7, the second air cylinder 44 is operated to lower the sheet holding plate 46 into the waste container 7 (see FIG. 17 ). The lower end position during this descent may be appropriately changed according to the stacking level of the discarded protective tape 11 using a level sensor (not shown) provided in the discard container 7, or may be counted by counting the number of discarded sheets. The number of sheets out makes it change.
在使片材保持板46下降至废弃容器内之后,在最下端停止来自片材保持板46的下表面的微孔的吸引,使保护带11落下。此时,能够通过使空气从片材保持板46的下表面的微孔喷出而更可靠地执行保护带11的脱离。并且,在通过废弃容器7的水平传感器检测出层叠在废弃容器中的剥离后的保护带11以规定的量贮存在废弃容器中的情况下,或者计数出的张数达到了规定的量的情况下,以促使对贮存在废弃容器7中的保护带11的废弃的方式执行以下措施:产生向该剥离装置的操作者通知的警报声、点亮警报灯等。After the sheet holding plate 46 is lowered into the waste container, the suction from the pores on the lower surface of the sheet holding plate 46 is stopped at the lowermost end, and the protective tape 11 is dropped. At this time, detachment of the protective tape 11 can be performed more reliably by blowing air out from the fine holes on the lower surface of the sheet holding plate 46 . In addition, when the level sensor of the waste container 7 detects that the peeled protective tape 11 stacked in the waste container is stored in a predetermined amount in the waste container, or when the counted number of sheets reaches a predetermined amount Next, measures such as generating an alarm sound to notify the operator of the peeling apparatus, lighting an alarm lamp, etc. are performed to prompt the discarding of the protective tape 11 stored in the discarding container 7 .
基于本发明的剥离装置由以上所述的那样构成,能够在需要进行保护带的剥离的各种领域内广泛地利用,且容易使用,由于不使用剥离用的带等消耗品,所以能够以不使该剥离装置复杂化的方式构成,并且,由于能够高效地将已剥离的保护带层叠废弃到废弃容器中,所以能够充分地利用废弃容器的容量。The stripping device based on the present invention is constituted as described above, can be widely used in various fields where stripping of the protective tape is required, and is easy to use. This peeling device is configured in a complex manner, and since the peeled protective tapes can be efficiently discarded in stacks in a waste container, the capacity of the waste container can be fully utilized.
另外,虽然在上述的本发明的实施方式中将板状部件设为半导体晶片,但并不限于此,例如,在采用蓝宝石基板来作为板状部件并将保护带粘贴在该蓝宝石基板上的情况下等时,只要是使用在正面上粘贴片状的部件的板状部件并使片状的部件剥离的情况,则能够适用本申请发明。In addition, although the plate-shaped member is used as a semiconductor wafer in the above-mentioned embodiment of the present invention, it is not limited thereto. In the case of inferiority, the invention of the present application can be applied as long as a plate-like member with a sheet-like member attached to the front surface is used and the sheet-like member is peeled off.
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015150397A JP6580408B2 (en) | 2015-07-30 | 2015-07-30 | Peeling method and peeling device |
| JP2015-150397 | 2015-07-30 |
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| CN106409745A true CN106409745A (en) | 2017-02-15 |
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| JP (1) | JP6580408B2 (en) |
| KR (1) | KR102391268B1 (en) |
| CN (1) | CN106409745B (en) |
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| CN108630582A (en) * | 2017-03-22 | 2018-10-09 | 株式会社迪思科 | Band stripping off device |
| CN110416114A (en) * | 2018-04-26 | 2019-11-05 | 株式会社迪思科 | Band stripping off device |
| CN111498579A (en) * | 2019-01-30 | 2020-08-07 | 日机装株式会社 | Stripping device |
| CN115458468A (en) * | 2022-11-11 | 2022-12-09 | 扬州韩思半导体科技有限公司 | Semiconductor wafer laser cutting device and method |
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| JP6960626B2 (en) * | 2017-06-20 | 2021-11-05 | トヨタ自動車九州株式会社 | Film pasting device and film pasting method |
| JP6975056B2 (en) * | 2018-01-29 | 2021-12-01 | 株式会社ディスコ | Transport mechanism |
| JP7813529B2 (en) * | 2021-07-05 | 2026-02-13 | リンテック株式会社 | Sheet peeling device and sheet peeling method |
| JP7810986B2 (en) * | 2021-08-06 | 2026-02-04 | 株式会社タカトリ | Sheet peeling device and sheet peeling method |
| KR102369893B1 (en) * | 2021-09-29 | 2022-03-03 | 오토이엠 주식회사 | Insulation sheet attachment device for top frame used in electric vehicle battery case |
| CN115339219B (en) * | 2022-08-16 | 2024-03-19 | 迈为技术(珠海)有限公司 | Stripping device and stripping method thereof |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201724337A (en) | 2017-07-01 |
| TWI720992B (en) | 2021-03-11 |
| CN106409745B (en) | 2021-10-29 |
| JP6580408B2 (en) | 2019-09-25 |
| KR20170015156A (en) | 2017-02-08 |
| JP2017034015A (en) | 2017-02-09 |
| KR102391268B1 (en) | 2022-04-26 |
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