CN103282317B - The cut-off method of brittle substrate - Google Patents

The cut-off method of brittle substrate Download PDF

Info

Publication number
CN103282317B
CN103282317B CN201180005624.7A CN201180005624A CN103282317B CN 103282317 B CN103282317 B CN 103282317B CN 201180005624 A CN201180005624 A CN 201180005624A CN 103282317 B CN103282317 B CN 103282317B
Authority
CN
China
Prior art keywords
laser beam
line
brittle material
material substrate
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201180005624.7A
Other languages
Chinese (zh)
Other versions
CN103282317A (en
Inventor
清水政二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsuboshi Diamond Industrial Co Ltd
Original Assignee
Mitsuboshi Diamond Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Industrial Co Ltd filed Critical Mitsuboshi Diamond Industrial Co Ltd
Publication of CN103282317A publication Critical patent/CN103282317A/en
Application granted granted Critical
Publication of CN103282317B publication Critical patent/CN103282317B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D1/00Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
    • B28D1/22Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
    • B28D1/221Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by thermic methods
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/146Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing a liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/362Laser etching
    • B23K26/364Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic materials other than metals or composite materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Mining & Mineral Resources (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Laser Beam Processing (AREA)

Abstract

Irradiation by laser beam LB forms the 1st score line 52a be made up of vertical slight crack 53a, the 2nd score line 52b be made up of vertical slight crack 53b with blowing of the cooling media from cooling jet 37.Afterwards to the 2nd score line 52b once again irradiating laser light beam LB vertical slight crack 53b is stretched, with the 2nd score line 52b, brittle substrate 50 is cut off.Secondly, the intersection area of cutting off line 54 and the 1st score line 52a is covered with sheet glass 61 or water droplet 62.Afterwards, except intersection area to the 1st score line 52a once again irradiating laser light beam LB vertical slight crack 53a is stretched, with the 1st score line 52a, brittle substrate 50 is cut off.Whereby, the generation of breaking of intersection point part is suppressed in the occasion using laser to be cut off by brittle substrate in two directions crossed one another.

Description

脆性材料基板的割断方法Cutting method of brittle material substrate

技术领域 technical field

本发明是关于对脆性材料基板照射激光光束,沿着互相交叉的两方向将脆性材料基板割断的方法。The present invention relates to a method of irradiating a laser beam on a brittle material substrate and cutting the brittle material substrate along two directions intersecting each other.

背景技术 Background technique

以往,做为玻璃基板或陶瓷基板等脆性材料基板的割断方法,是广泛使用使刀轮等压接转动而形成刻划线之后,沿着刻划线从垂直方向施加外力将基板割断的方法。Conventionally, as a cutting method for brittle material substrates such as glass substrates and ceramic substrates, a method of cutting the substrate by applying an external force from a vertical direction along the scribed lines after forming scribed lines by pressing and rotating a knife wheel etc. has been widely used.

通常,在使用刀轮进行脆性材料基板的刻划的场合,以刀轮对脆性材料基板赋予的机械式应力使基板的缺陷容易产生,在进行折断时起因于上述缺陷的破裂等会发生。Generally, when a cutter wheel is used for scribing a brittle material substrate, the mechanical stress applied to the brittle material substrate by the cutter wheel tends to generate defects on the substrate, and cracks due to the above defects occur when breaking.

针对上述问题,近年来使用激光将脆性材料基板割断的方法已实用化。此方法是将激光光束对基板照射而将基板加热至熔融温度未满后,借由以冷却媒体将基板冷却而使前述基板产生热应力,以此热应力从基板的表面在大致垂直方向使裂痕形成者。以此使用激光光束的脆性材料基板的割断方法是利用热应力,故不会使工具直接接触基板,割断面成为破裂等较少的平滑之面,维持基板的强度。In response to the above-mentioned problems, a method of cutting a brittle material substrate using a laser has been put into practical use in recent years. This method is to irradiate the substrate with a laser beam and heat the substrate to less than the melting temperature, and then cool the substrate with a cooling medium to cause thermal stress on the substrate, so that the thermal stress causes cracks in a substantially vertical direction from the surface of the substrate. former. The cutting method of the brittle material substrate using the laser beam utilizes thermal stress, so the tool does not directly contact the substrate, the cut surface becomes a smooth surface with few cracks, and the strength of the substrate is maintained.

此外,例如在专利文献1亦提案使用激光在互相交叉的两方向将脆性材料基板割断的方法。此提案方法是对脆性材料基板照射激光光束而形成半切状态的第1裂痕后,同样借由激光光束的照射来形成对第1裂痕交叉的半切状态的第2裂痕,其次对第1裂痕与第2裂痕再度照射激光光束而全切者。In addition, for example, Patent Document 1 proposes a method of cutting a brittle material substrate in two directions intersecting each other using laser light. This proposed method is to irradiate a laser beam on a brittle material substrate to form a first crack in a half-cut state, and then similarly irradiate a laser beam to form a second crack in a half-cut state that intersects with the first crack. 2. The cracks are completely cut by irradiating the laser beam again.

先前技术文献prior art literature

专利文献patent documents

专利文献1:日本特开2001-130921号公报Patent Document 1: Japanese Patent Laid-Open No. 2001-130921

发明内容 Contents of the invention

[发明欲解决的课题][Problem to be solved by the invention]

然而,如上述提案方法在对第1裂痕与第2裂痕再度照射激光光束而将脆性材料基板全切时,可能在第1裂痕与第2裂痕的交点部分有破裂产生。若在成为割断后的角部的脆性材料基板的交点部分有破裂产生,割断后的脆性材料基板的尺寸精度会降低且发生的玻璃屑对基板表面附着等而成为问题的原因。However, in the method proposed above, when the brittle material substrate is fully cut by irradiating the laser beam again to the first crack and the second crack, cracks may occur at the intersection of the first crack and the second crack. If cracks occur at the intersections of the cut brittle material substrates at the corners, the dimensional accuracy of the cut brittle material substrates will decrease, and the generated glass shavings will adhere to the substrate surface, causing problems.

本发明是鉴于此种以往的问题而为者,其目的在于提供在使用激光在互相交叉的两方向将脆性材料基板割断的场合抑制交点部分的破裂的发生的方法。The present invention is made in view of such conventional problems, and an object of the present invention is to provide a method for suppressing the occurrence of cracks at intersections when a brittle material substrate is cut in two directions intersecting each other using laser light.

[解决课题的手段][means to solve the problem]

根据本发明,提供一种脆性材料基板的割断方法,包含:将互相交叉的由垂直裂痕构成的第1刻划线与第2刻划线在脆性材料基板形成的步骤、沿着第1刻划线与第2刻划线使激光光束相对移动同时照射而使前述垂直裂痕伸展并以第1刻划线与第2刻划线将前述基板割断的步骤,其特征在于:According to the present invention, there is provided a method for cutting a brittle material substrate, comprising: forming a first scribe line and a second scribe line formed by vertical cracks intersecting each other on a brittle material substrate; The step of moving the laser beam relative to the line and the second scribe line while irradiating it to extend the vertical crack and cut the substrate with the first scribe line and the second scribe line, is characterized in that:

在沿着第1刻划线及/或第2刻划线将激光光束照射之际使往第1刻划线与第2刻划线的交点区域的激光光束照射量比交点区域以外的激光光束照射量减少。When the laser beam is irradiated along the first ruled line and/or the second ruled line, the laser beam irradiation amount to the intersection area of the first ruled line and the second ruled line is lower than that of the laser beam other than the intersection area. Reduced exposure.

在此,使往第1刻划线与第2刻划线的交点区域的激光光束照射量为交点区域以外的激光光束照射量的50%以下较理想。Here, it is preferable that the laser beam irradiation amount to the intersection area of the first ruled line and the second ruled line is 50% or less of the laser beam irradiation amount other than the intersection area.

此外,借由控制激光光束输出,使往第1刻划线与第2刻划线的交点区域的激光光束照射量减少亦可。此外,将第1刻划线与第2刻划线的交点区域以将激光光束吸收或反射的被覆构件覆盖,使往前述交点区域的激光光束照射量减少亦可。此外,将第1刻划线与第2刻划线的交点区域以将激光光束吸收或反射的液体覆盖,使往前述交点区域的激光光束照射量减少亦可。In addition, by controlling the output of the laser beam, the irradiation amount of the laser beam to the intersection area of the first scribed line and the second scribed line may be reduced. In addition, the intersection region of the first scribed line and the second scribed line may be covered with a covering member that absorbs or reflects the laser beam to reduce the irradiation amount of the laser beam to the intersection region. In addition, the intersection area of the first scribe line and the second scribe line may be covered with a liquid that absorbs or reflects the laser beam to reduce the irradiation amount of the laser beam to the intersection area.

此外,前述交点区域是在从第1刻划线与第2刻划线的交点往激光光束的相对移动方向上流侧与下流侧分别具有5mm以下的宽度的区域较理想。In addition, the intersection region is preferably a region having a width of 5 mm or less on the upstream and downstream sides of the relative movement direction of the laser beam from the intersection of the first ruled line and the second ruled line.

此外,第1刻划线与第2刻划线是对前述基板使激光光束相对移动同时照射,将前述基板加热为熔融温度未满后,之后对前述基板吹送冷却媒体以冷却,以借由在前述基板产生的热应力形成较理想。In addition, the first scribed line and the second scribed line are irradiated while moving the laser beam relatively to the aforementioned substrate, and after heating the aforementioned substrate until the melting temperature is lower than the melting temperature, thereafter blowing a cooling medium to the aforementioned substrate for cooling, so that by The formation of thermal stress generated by the aforementioned substrate is ideal.

[发明的效果][Effect of the invention]

根据本发明的脆性材料基板的割断方法,可于在互相交叉的两方向将脆性材料基板割断时抑制交点部分的破裂的发生。借此,割断后的脆性材料基板的尺寸精度向上,且格外抑制起因于玻璃屑的问题。According to the method for cutting a brittle material substrate of the present invention, when the brittle material substrate is cut in two directions intersecting each other, it is possible to suppress the occurrence of cracks at intersections. Accordingly, the dimensional accuracy of the brittle material substrate after cutting is improved, and problems caused by glass shavings are significantly suppressed.

附图说明 Description of drawings

图1是显示可实施本发明的割断方法的割断装置之一例的概说图。Fig. 1 is a schematic diagram showing an example of a cutting device capable of carrying out the cutting method of the present invention.

图2是说明激光刻划的操作状态的图。FIG. 2 is a diagram illustrating an operational state of laser scribing.

图3是显示本发明的割断方法之一例的步骤图。Fig. 3 is a step diagram showing an example of the cutting method of the present invention.

图4是显示往激光光束LB的交点区域的照射量调整例与在交点区域的激光照射量的图。FIG. 4 is a diagram showing an example of adjusting the irradiation amount to the intersection area of the laser beam LB and the laser irradiation amount in the intersection area.

图5是显示往激光光束LB的交点区域的照射量调整例与在交点区域的激光照射量的图。FIG. 5 is a diagram showing an example of adjustment of the irradiation amount to the intersection area of the laser beam LB and the laser irradiation amount in the intersection area.

图6是显示将往激光光束LB的交点区域的照射量调整以被覆构件来进行的场合之例的图。FIG. 6 is a diagram showing an example of the case where the adjustment of the irradiation amount to the intersection area of the laser beam LB is performed with a covering member.

图7是显示将往激光光束LB的交点区域的照射量调整以液体来进行的场合之例的图。FIG. 7 is a diagram showing an example in which the adjustment of the irradiation amount to the intersection area of the laser beam LB is performed with a liquid.

【主要元件符号说明】[Description of main component symbols]

具体实施方式 Detailed ways

以下虽针对本发明的脆性材料基板的割断方法更详细说明,但本发明并不限于此等实施型态。Although the cutting method of the brittle material substrate of the present invention will be described in detail below, the present invention is not limited to these implementation forms.

图1是显示可实施本发明的割断方法的割断装置之一例的概说图。在图1的割断装置中,在架台11上具备在对纸面垂直方向(Y方向)可移动的滑动平台12、在滑动平台12上在图的左右方向(X方向)可移动的台座19、设于台座19上的旋转机构25,载置、固定于设于此旋转机构25上的旋转平台26的脆性材料基板50是借由此等移动手段在水平面内自由移动。Fig. 1 is a schematic diagram showing an example of a cutting device capable of carrying out the cutting method of the present invention. In the cutting device of FIG. 1 , a slide platform 12 movable in a direction perpendicular to the paper (direction Y) is provided on a stand 11, a pedestal 19 movable in a left-right direction (direction X) of the drawing on the slide platform 12, The rotating mechanism 25 provided on the pedestal 19, and the brittle material substrate 50 placed and fixed on the rotating platform 26 provided on the rotating mechanism 25 can freely move in the horizontal plane by these moving means.

滑动平台12是可移动地安装于在架台11的上面隔既定距离平行配置的一对之导轨14、15。此外,在一对之导轨14、15之间是与一对之导轨14、15平行地设有借由以不图示的马达而可正、反转的滚珠螺杆13。此外,在滑动平台12的底面设滚珠螺帽16。此滚珠螺帽16螺合于滚珠螺杆13。借由滚珠螺杆13正转或反转,滚珠螺帽16在Y方向移动,借此安装滚珠螺帽16的滑动平台12在一对之导轨14、15上在Y方向移动。The sliding platform 12 is movably mounted on a pair of guide rails 14 and 15 arranged in parallel at a predetermined distance on the upper surface of the platform 11 . In addition, between the pair of guide rails 14 and 15, a ball screw 13 is provided parallel to the pair of guide rails 14 and 15 and can be rotated forward and backward by a motor not shown. In addition, a ball nut 16 is provided on the bottom surface of the slide table 12 . The ball nut 16 is screwed to the ball screw 13 . The ball nut 16 moves in the Y direction by the forward or reverse rotation of the ball screw 13 , so that the sliding platform 12 on which the ball nut 16 is mounted moves in the Y direction on the pair of guide rails 14 , 15 .

此外,台座19是可移动地支持于在滑动平台12上隔既定距离平行配置的一对之导引构件21。此外,在一对之导引构件21之间与一对之导引构件21平行地设有借由以马达23而可正、反转的滚珠螺杆22。此外,在台座19的底面设滚珠螺帽24。此滚珠螺帽24螺合于滚珠螺杆22。借由滚珠螺杆22正转或反转,滚珠螺帽24在X方向移动,借此台座19与滚珠螺帽24一起在一对之导引构件21上在X方向移动。In addition, the pedestal 19 is movably supported by a pair of guide members 21 arranged in parallel with a predetermined distance apart on the slide table 12 . In addition, between the pair of guide members 21 and parallel to the pair of guide members 21, a ball screw 22 that can be rotated forward and backward by a motor 23 is provided. In addition, a ball nut 24 is provided on the bottom surface of the pedestal 19 . The ball nut 24 is screwed to the ball screw 22 . When the ball screw 22 rotates forward or backward, the ball nut 24 moves in the X direction, whereby the base 19 moves in the X direction on the pair of guide members 21 together with the ball nut 24 .

在台座19设旋转机构25。此外,在此旋转机构25上设旋转平台26。为割断对象的脆性材料基板50在旋转平台26上以真空吸着固定。旋转机构25使旋转平台26绕垂直方向的中心轴旋转。A rotation mechanism 25 is provided on the pedestal 19 . In addition, a rotating platform 26 is provided on this rotating mechanism 25 . The brittle material substrate 50 to be cut is fixed on the rotary table 26 by vacuum suction. The rotation mechanism 25 rotates the rotation platform 26 around the central axis in the vertical direction.

在旋转平台26的上方支持台31以从安装台32垂下的保持构件33支持以使与旋转平台26分离对向。在支持台31设为了在脆性材料基板50的表面形成触发裂痕的刀轮35、为了对脆性材料基板50照射激光光束的开口(不图示)、为了将脆性材料基板50的表面冷却的冷却喷嘴37。The support table 31 is supported above the rotary table 26 by a holding member 33 suspended from the mounting table 32 so as to be separated from the rotary table 26 and face. The support table 31 is provided with a cutter wheel 35 for forming a trigger crack on the surface of the brittle material substrate 50, an opening (not shown) for irradiating the brittle material substrate 50 with a laser beam, and a cooling nozzle for cooling the surface of the brittle material substrate 50. 37.

刀轮35以刀轮保持具36保持为可在对脆性材料基板50压接的位置与非接触的位置升降,仅在形成成为刻划线的开始起点的触发裂痕时往对脆性材料基板50压接的位置下降。触发裂痕的形成位置为了抑制从触发裂痕往无法预测的方向有裂痕产生的先行现象而在比脆性材料基板50的表面侧端内侧形成较理想。The cutter wheel 35 is held by the cutter wheel holder 36 so as to be able to move up and down between the position where it is pressed against the brittle material substrate 50 and the position where it is not in contact, and presses against the brittle material substrate 50 only when a trigger crack that becomes the starting point of the scribe line is formed. Then the location drops. The formation position of the trigger crack is preferably formed on the inner side of the surface side of the brittle material substrate 50 in order to suppress the preceding phenomenon that the trigger crack is generated in an unpredictable direction.

在安装台32上设激光输出装置34。从激光输出装置34射出的激光光束LB是以反射镜44往下方反射,通过保持于保持构件33内的光学系从形成于支持台31的开口往固定于旋转平台26上的脆性材料基板50照射。A laser output device 34 is provided on the mount 32 . The laser beam LB emitted from the laser output device 34 is reflected downward by the mirror 44, passes through the optical system held in the holding member 33, and irradiates the brittle material substrate 50 fixed on the rotary platform 26 from the opening formed in the support table 31. .

此外,从支持台31的设于激光光束LB射出的开口附近的冷却喷嘴37往脆性材料基板50有做为冷却媒体的水与空气一起喷出。冷却媒体喷出的脆性材料基板50上的位置在割断预定线51上且激光光束LB的照射区域的后侧(参照图2)。In addition, water as a cooling medium is ejected together with air from the cooling nozzle 37 of the support table 31 near the opening where the laser beam LB is emitted to the brittle material substrate 50 . The position on the brittle material substrate 50 from which the cooling medium is ejected is on the planned cutting line 51 and behind the irradiation area of the laser beam LB (see FIG. 2 ).

在安装台32设辨识预先刻印于脆性材料基板50的对准标记的一对之CCD摄影机38、39。以此等一对的CCD摄影机38、39检出脆性材料基板50的设定时的位置偏移,例如在脆性材料基板50偏移角度θ的场合旋转平台26旋转-θ之量,脆性材料基板50偏移Y的场合滑动平台12移动-Y之量。A pair of CCD cameras 38 , 39 for recognizing alignment marks previously engraved on the brittle material substrate 50 are provided on the mounting table 32 . Use such a pair of CCD cameras 38, 39 to detect the position deviation during the setting of the brittle material substrate 50. 50 In the case of offset Y, the slide table 12 moves by the amount of -Y.

于在此种构成的割断装置中将脆性材料基板50割断的场合先将脆性材料基板50往旋转平台26上载置并以吸引手段固定。之后,以一对之CCD摄影机38、39拍摄设于脆性材料基板50的对准标记,如前述基于拍摄资料将脆性材料基板50定位于既定的位置。When cutting the brittle material substrate 50 in the cutting device having such a structure, first place the brittle material substrate 50 on the rotary table 26 and fix it by suction means. Afterwards, a pair of CCD cameras 38 and 39 are used to photograph the alignment marks provided on the brittle material substrate 50 , and the brittle material substrate 50 is positioned at a predetermined position based on the photographed data as described above.

其次,如前述以刀轮35对脆性材料基板50形成触发裂痕。之后,从激光输出装置34射出激光光束LB。激光光束LB借由反射镜44而如图2所示,对脆性材料基板50的表面大致垂直地照射。此外,对激光光束照射区域的后端附近使做为冷却媒体的水从冷却喷嘴37喷出。借由对脆性材料基板50照射激光光束LB,脆性材料基板50在厚度方向以熔融温度未满加热,脆性材料基板50欲热膨胀,但因局部加热故无法膨胀而已照射点为中心有压缩应力发生。此外,在加热后立刻借由脆性材料基板50的表面以水冷却而脆性材料基板50这次是收缩而有拉伸应力发生。借由此拉伸应力的作用,以触发裂痕为开始点沿着割断预定线51于脆性材料基板50形成垂直裂痕53。Secondly, trigger cracks are formed on the brittle material substrate 50 by the cutter wheel 35 as mentioned above. Thereafter, the laser beam LB is emitted from the laser output device 34 . The laser beam LB is irradiated substantially perpendicularly to the surface of the brittle material substrate 50 as shown in FIG. 2 via the mirror 44 . In addition, water as a cooling medium is sprayed from the cooling nozzle 37 to the vicinity of the rear end of the laser beam irradiation area. By irradiating the brittle material substrate 50 with the laser beam LB, the brittle material substrate 50 is heated in the thickness direction below the melting temperature, and the brittle material substrate 50 tends to thermally expand, but cannot expand due to local heating, and compressive stress occurs centered on the irradiated point. In addition, immediately after the heating, the surface of the brittle material substrate 50 is cooled with water, and the brittle material substrate 50 shrinks this time to generate tensile stress. Due to the action of the tensile stress, a vertical crack 53 is formed on the brittle material substrate 50 along the planned breaking line 51 starting from the triggering crack.

之后借由使激光光束LB与冷却喷嘴37沿着割断预定线51相对移动,垂直裂痕53伸展而在脆性材料基板50有刻划线52形成。在此实施形态的场合在激光光束LB与冷却喷嘴37固定于既定位置的状态下借由滑动平台12、台座19、旋转平台26的旋转机构25而脆性材料基板50移动。当然,在将脆性材料基板50固定的状态下使激光光束LB与冷却喷嘴37移动亦无妨。或使脆性材料基板50与激光光束LB与冷却喷嘴37的双方移动亦无妨。Afterwards, by relatively moving the laser beam LB and the cooling nozzle 37 along the planned cutting line 51 , the vertical crack 53 is extended and the scribed line 52 is formed on the brittle material substrate 50 . In this embodiment, the brittle material substrate 50 is moved by the slide stage 12, the pedestal 19, and the rotation mechanism 25 of the rotary stage 26 while the laser beam LB and the cooling nozzle 37 are fixed at predetermined positions. Of course, it does not matter if the laser beam LB and the cooling nozzle 37 are moved while the brittle material substrate 50 is fixed. Alternatively, both the brittle material substrate 50 and the laser beam LB and the cooling nozzle 37 may be moved.

其次,针对本发明的割断方法说明。图3显示本发明的割断方法之一例的步骤图。如同图(a)所示,借由使激光光束LB与冷却喷嘴37沿着割断预定线51相对移动,使以不图示的触发裂痕为开始点的垂直裂痕53a在相对移动方向伸展而在脆性材料基板50有第1刻划线52a形成。Next, the cutting method of the present invention will be described. Fig. 3 is a step diagram showing an example of the cutting method of the present invention. As shown in figure (a), by moving the laser beam LB and the cooling nozzle 37 relatively along the planned cutting line 51, the vertical crack 53a starting from the trigger crack not shown in the figure is extended in the direction of relative movement, and the brittle The material substrate 50 is formed with first scribe lines 52a.

做为在此使用的激光光束LB没有特别限定,由基板的材质或厚度、想要形成的垂直裂痕的深度等适当决定即可。脆性材料基板为玻璃基板的场合,在玻璃基板表面的吸收较大的波长9~11μm的激光光束合适地使用。The laser beam LB used here is not particularly limited, and may be appropriately determined according to the material and thickness of the substrate, the depth of the vertical crack to be formed, and the like. When the brittle material substrate is a glass substrate, a laser beam with a wavelength of 9 to 11 μm that absorbs relatively large on the surface of the glass substrate is suitably used.

做为此种激光光束可举出二氧化碳激光。做为激光光束的往基板的照射形状在激光光束的相对移动方向细长的椭圆形状较理想,相对移动方向的照射长度L是10~60mm的范围,照射宽度W是1~5mm的范围较合适。Examples of such laser beams include carbon dioxide lasers. The shape of the irradiation of the laser beam on the substrate is ideal as an elliptical shape that is elongated in the relative movement direction of the laser beam. The irradiation length L in the relative movement direction is in the range of 10 to 60 mm, and the irradiation width W is in the range of 1 to 5 mm. .

做为从冷却喷嘴37使喷出的冷却媒体可举出水或酒精等。此外,于在使用割断后的脆性材料基板上不会给予不良影响的范围添加界面活性剂等添加剂亦无妨。做为冷却媒体的吹送量通常为数ml/min程度较合适。冷却媒体导致的基板的冷却从将以激光光束加热的基板急冷的观点是使水与气体(通常为空气)一起喷射的所谓waterjet方式较理想。冷却媒体导致的冷却区域为长径1~5mm程度的圆形状或椭圆形状较理想。此外,形成为冷却区域是激光光束导致的加热区域的相对移动方向后方且冷却区域与加热区域的中心点间的距离成为数mm~数十mm程度较理想。Examples of the cooling medium sprayed from the cooling nozzle 37 include water, alcohol, and the like. In addition, there is no problem in adding additives such as a surfactant within a range that does not adversely affect the brittle material substrate after use. As a cooling medium, the blowing volume is usually several ml/min. The cooling of the substrate by the cooling medium is a so-called waterjet method in which water is sprayed together with gas (usually air) from the viewpoint of rapidly cooling the substrate heated by the laser beam. The cooling area by the cooling medium is preferably circular or elliptical with a major diameter of about 1 to 5 mm. In addition, it is desirable that the cooling region is located behind the relative movement direction of the heating region by the laser beam, and the distance between the cooling region and the center point of the heating region is about several mm to several tens of mm.

做为激光光束LB与冷却喷嘴37的相对移动速度没有特别限定,由想要获得的垂直裂痕的深度等适当决定即可。一般越使相对移动速度缓慢,形成的垂直裂痕就越加深。通常,相对速度是数百mm/sec程度。The relative movement speed of the laser beam LB and the cooling nozzle 37 is not particularly limited, and may be appropriately determined according to the depth of the vertical crack to be obtained. Generally, the slower the relative moving speed is, the deeper the vertical crack will be formed. Usually, the relative speed is on the order of hundreds of mm/sec.

做为构成第1刻划线52a的垂直裂痕53a的深度虽没有特别限定,但为了增大后步骤的为了将脆性材料基板割断的照射激光光束的条件,例如相对移动速度或激光输出等的裕度,使为相对于基板厚度25%以上的深度较理想。The depth of the vertical crack 53a constituting the first scribe line 52a is not particularly limited, but in order to increase the conditions of the irradiation laser beam for cutting the brittle material substrate in the subsequent step, such as the relative moving speed or the margin of the laser output, etc. It is ideal to have a depth of 25% or more relative to the thickness of the substrate.

其次如图3(b)所示,借由沿着对第1刻划线52a正交的割断预定线51b使激光光束LB与冷却喷嘴37相对移动来形成第2刻划线52b。做为第2刻划线52b的形成条件与第1刻划线52a的形成条件相同条件在此亦可举出。Next, as shown in FIG. 3( b ), the second scribe line 52 b is formed by moving the laser beam LB and the cooling nozzle 37 relative to each other along the line 51 b perpendicular to the first scribe line 52 a. Conditions for forming the second scribed line 52b are the same as those for forming the first scribed line 52a.

其次,如同图(c)所示,沿着第2刻划线52b再度照射激光光束LB。借此垂直裂痕53b在基板厚度方向伸展,以第2刻划线52b割断脆性材料基板50而形成割断线54。另外,垂直裂痕53b只要伸展至不施加外力便将脆性材料基板50割断的深度即可,不一定要到达脆性材料基板50的反面侧。Next, as shown in figure (c), the laser beam LB is irradiated again along the 2nd scribe line 52b. As a result, the vertical crack 53b extends in the thickness direction of the substrate, and the brittle material substrate 50 is cut off by the second scribe line 52b to form a breaking line 54 . In addition, the vertical crack 53 b only needs to extend to a depth at which the brittle material substrate 50 is cut without applying an external force, and does not necessarily have to reach the back side of the brittle material substrate 50 .

为了使垂直裂痕53b在基板厚度方向伸展的激光光束LB的照射条件虽只要由脆性材料基板50的厚度或垂直裂痕53b的深度等适当决定即可,但通常形成前述的第2刻划线52b时的照射条件在此亦例示。The irradiation conditions of the laser beam LB to extend the vertical crack 53b in the thickness direction of the substrate may be appropriately determined according to the thickness of the brittle material substrate 50 or the depth of the vertical crack 53b. The irradiation conditions are also exemplified here.

其次,如同图(d)所示,沿着第1刻划线52a再度照射激光光束LB。借此垂直裂痕53a在基板厚度方向伸展,以第1刻划线52a割断脆性材料基板50。伸展后的垂直裂痕53a的基板厚度方向的深度与垂直裂痕53b的场合同样地,只要伸展至不施加外力便将脆性材料基板50割断的深度即可,不一定要到达脆性材料基板50的反面侧。Next, as shown in figure (d), the laser beam LB is irradiated again along the 1st scribe line 52a. As a result, the vertical crack 53a extends in the thickness direction of the substrate, and the brittle material substrate 50 is cut off by the first scribe line 52a. The depth of the substrate thickness direction of the extended vertical crack 53a is the same as that of the vertical crack 53b, as long as it extends to a depth that can cut the brittle material substrate 50 without applying external force, and it does not have to reach the back side of the brittle material substrate 50. .

在此,重点在于在沿着第1刻划线52a再度照射激光光束LB时使往第1刻划线52a与割断线54的交点区域的激光光束LB的照射量比其他部分的照射量减少。借由如上述使往第1刻划线52a与割断线54的交点区域的激光光束LB的照射量比其他部分的照射量减少,有效抑制割断后的成为角部的交点部分的破裂。交点区域中的较理想的激光光束照射量是交点区域以外的激光光束照射量的50%以下,较理想是10%以下,更理想是0%。Here, it is important to reduce the irradiation amount of the laser beam LB to the intersection area of the first ruled line 52a and the splitting line 54 compared to other parts when irradiating the laser beam LB again along the first ruled line 52a. By reducing the irradiation amount of the laser beam LB to the intersection area of the first scribe line 52a and the cutting line 54 as described above, compared with other areas, cracking at the intersection portion which becomes the corner portion after cutting is effectively suppressed. The laser beam irradiation amount in the intersection area is preferably 50% or less of the laser beam irradiation amount outside the intersection area, more preferably 10% or less, and more preferably 0%.

另外,在以上说明的实施形态虽是在沿着第1刻划线52a再度照射激光光束LB时使往第1刻划线52a与割断线54的交点区域的激光光束LB的照射量比其他部分的照射量减少,但在沿着第2刻划线52b再度照射激光光束LB时使往交点区域的激光光束LB的照射量比其他部分的照射量减少亦可。或者在沿着第1刻划线52a再度照射激光光束LB时与沿着第2刻划线52b再度照射激光光束LB时使往交点区域的激光光束LB的照射量比其他部分的照射量减少亦可。In addition, in the embodiment described above, when the laser beam LB is irradiated again along the first scribed line 52a, the irradiation amount of the laser beam LB to the intersection area of the first scribed line 52a and the dividing line 54 is lower than that of other parts. However, when the laser beam LB is irradiated again along the second scribed line 52b, the irradiation amount of the laser beam LB toward the intersection area may be reduced compared to other portions. Alternatively, when the laser beam LB is irradiated again along the first scribe line 52a and when the laser beam LB is irradiated again along the second scribe line 52b, the irradiation amount of the laser beam LB to the intersection area is reduced compared with the irradiation amount of other parts. Can.

往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量的调整是可以例如激光光束的输出的控制来进行。在将激光光束的照射点以圆柱透镜等光学系使为在激光光束的相对移动方向细长的椭圆形状的场合如图4(a)所示,以第1刻划线52a与第2刻划线52b的交点为中心,从激光光束LB的相对移动方向上流侧涵盖至下流侧的既定范围设不照射激光光束LB的区域。将此时的激光光束LB的照射量在图4(b)显示。如由图4(b)理解,激光光束LB的照射量是往第1刻划线52a与第2刻划线52b的交点从通常照射量逐渐减少,在交点成为0后,逐渐增加返回通常照射量。如上述,借由使往第1刻划线52a与第2刻划线52b的交点区域的激光光束的照射量减少,抑制交点部分中的破裂的发生。The adjustment of the irradiation amount of the laser beam LB to the intersection area of the first ruled line 52a and the second ruled line 52b can be performed, for example, by controlling the output of the laser beam. When the irradiation point of the laser beam is made into an elliptical shape elongated in the relative movement direction of the laser beam by an optical system such as a cylindrical lens, as shown in FIG. The intersection point of the lines 52 b is the center, and a predetermined range covering from the upstream side to the downstream side in the relative movement direction of the laser beam LB is defined as an area not irradiated with the laser beam LB. The irradiation amount of the laser beam LB at this time is shown in FIG. 4( b ). As can be understood from FIG. 4( b ), the irradiation amount of the laser beam LB gradually decreases from the normal irradiation amount toward the intersection point of the first scribed line 52a and the second scribed line 52b, and gradually increases back to normal irradiation after the intersection point becomes 0. quantity. As described above, by reducing the irradiation amount of the laser beam to the intersection area of the first scribe line 52a and the second scribe line 52b, the occurrence of cracks in the intersection area is suppressed.

做为使激光光束LB的照射量减少的区域,亦即第1刻划线52a与第2刻划线52b的交点区域,是在从第1刻划线52a与第2刻划线52b的交点往激光光束LB的相对移动方向上流侧与下流侧分别具有5mm以下的宽度的区域较理想。As the region where the irradiation amount of the laser beam LB is reduced, that is, the intersection region of the first ruled line 52a and the second ruled line 52b is formed from the intersection point of the first ruled line 52a and the second ruled line 52b. Preferably, the regions each have a width of 5 mm or less on the upstream side and the downstream side in the relative movement direction of the laser beam LB.

此外,在使激光光束LB的照射点使用多边形镜或检流镜、圆筒型反射镜等扫瞄并使为在激光光束的相对移动方向细长的椭圆形状的场合,照射点内的激光强度成为均匀且亦可涵盖既定范围使激光照射量为0。在图5(a)显示将激光光束LB的照射状态经时地显示的图。激光光束LB到达第1刻划线52a与第2刻划线52b的交点区域后,扫瞄交点区域内使激光振荡为关闭,但出到交点区域外后便使激光振荡为开启。借此,如图5(b)所示,可使往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量为0。In addition, when scanning the irradiation point of the laser beam LB with a polygonal mirror, a galvanometric mirror, a cylindrical mirror, etc., and making it into an elliptical shape that is elongated in the relative movement direction of the laser beam, the laser intensity in the irradiation point It becomes uniform and covers a predetermined range so that the laser irradiation amount can be 0. FIG. 5( a ) shows a graph showing the irradiation state of the laser beam LB over time. After the laser beam LB reaches the intersection area of the first scribe line 52a and the second scribe line 52b, it scans the intersection area to turn off the laser oscillation, but turns the laser oscillation on when it goes out of the intersection area. Thereby, as shown in FIG.5(b), the irradiation amount of the laser beam LB to the intersection area of the 1st ruled line 52a and the 2nd ruled line 52b can be made zero.

在图6显示调整往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量的其他的手段。在于此图显示的手段是将第1刻划线52a与第2刻划线52b的交点区域以被覆构件61覆盖,使往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量减少。若利用此手段,没有如前述实施形态的将激光振荡开启、关闭的控制的必要,可以被覆构件61的载置的简单的作业将激光光束LB的照射量减少。FIG. 6 shows another means of adjusting the irradiation amount of the laser beam LB to the intersection region of the first ruled line 52a and the second ruled line 52b. The means shown in this figure is to cover the intersection area of the first scribed line 52a and the second scribed line 52b with the covering member 61, so that the laser beam directed to the intersection area of the first scribed line 52a and the second scribed line 52b The irradiation amount of the light beam LB decreases. Using this means eliminates the need to control the laser oscillation on and off as in the previous embodiment, and can reduce the irradiation amount of the laser beam LB with a simple operation of placing the covering member 61 .

做为在本发明使用的被覆构件61只要是将激光光束LB吸收或反射的构件便没有特别限定,例如,可举出玻璃基板或铝等金属板、干冰等。在使用玻璃基板的场合是以玻璃基板吸收激光光束LB,故可以其材质或厚度等调整往脆性材料基板50的激光光束LB的照射量。此外,在使用铝等金属板的场合是激光光束LB在金属板反射故往脆性材料基板50的照射量成为0。The covering member 61 used in the present invention is not particularly limited as long as it absorbs or reflects the laser beam LB, and examples thereof include a glass substrate, a metal plate such as aluminum, and dry ice. When a glass substrate is used, the laser beam LB is absorbed by the glass substrate, so the irradiation amount of the laser beam LB to the brittle material substrate 50 can be adjusted by its material or thickness. In addition, when a metal plate such as aluminum is used, the irradiation amount to the brittle material substrate 50 becomes zero because the laser beam LB is reflected by the metal plate.

在图7显示调整往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量的再其他的手段。在于此图显示的手段是将第1刻划线52a与第2刻划线52b的交点区域以液体62覆盖,使往第1刻划线52a与第2刻划线52b的交点区域的激光光束LB的照射量减少。若利用此手段,与上述实施形态同样地没有如前述实施形态的将激光振荡开启、关闭的控制的必要,可以液体62的滴下、涂布等简单的作业将激光光束LB的照射量减少。Still another means of adjusting the irradiation amount of the laser beam LB to the intersection area of the first ruled line 52 a and the second ruled line 52 b is shown in FIG. 7 . The means shown in this figure is to cover the intersection area of the first scribe line 52a and the second scribe line 52b with liquid 62, so that the laser beam to the intersection area of the first scribe line 52a and the second scribe line 52b The amount of exposure to LB is reduced. With this means, there is no need to control the laser oscillation on and off as in the above-mentioned embodiment, and the irradiation amount of the laser beam LB can be reduced by simple operations such as dropping and coating of the liquid 62 .

做为在本发明使用的液体62只要是将激光光束LB吸收或反射的构件便没有特别限定,例如,水或酒精等合适地使用。往脆性材料基板50的交点区域的液体62的附着是可以例如洗涤器等的滴下或涂布等来进行。做为液体62的附着量虽是只要由交点区域的大小、使用的激光的种类或输出等适当决定即可,在使用水的场合是通常0.01mL~0.05mL的范围较理想。The liquid 62 used in the present invention is not particularly limited as long as it absorbs or reflects the laser beam LB. For example, water, alcohol, or the like is suitably used. Adhesion of the liquid 62 to the intersection region of the brittle material substrate 50 can be performed, for example, by dripping or coating with a scrubber or the like. The adhesion amount of the liquid 62 may be appropriately determined according to the size of the intersection area, the type and output of the laser to be used, and when water is used, it is usually in the range of 0.01mL to 0.05mL.

以上,在说明的各实施形态虽是将第1刻划线52a与第2刻划线52b各形成1条而将基板割断,但在大面积的脆性材料基板50将第1刻划线52a与第2刻划线52b分别形成多条再割断为多个的小面积基板的场合本发明的割断方法亦当然可适用。此外,本发明的割断方法是除使两个刻划线正交的场合外,在以所望的角度使交点的场合亦当然可适用。In the embodiments described above, each of the first scribe line 52a and the second scribe line 52b is formed to divide the substrate, but in the large-area brittle material substrate 50, the first scribe line Of course, the cutting method of the present invention is also applicable to a case where a plurality of second scribe lines 52b are formed and then cut into a plurality of small-area substrates. In addition, the cutting method of the present invention is of course applicable to the case of making the intersection point at a desired angle in addition to the case of making two scribed lines perpendicular to each other.

【实施例】【Example】

实施例1Example 1

使用在图1显示的割断装置在厚度0.55mm的化学强化苏打玻璃基板形成互相正交的多条的刻划线以使其交点成为40个,沿着形成的一方的刻划线照射激光光束而将基板割断后,在割断线与另一方的刻划线的交点区域载置玻璃板(5mm*5mm*厚度0.4mm)。之后,沿着前述另一方的刻划线照射激光光束而将基板割断为多个。玻璃基板的割断是使用在图3显示的方法来进行。将结果显示于表1。另外,激光光束的具体照射条件如下述。Using the cutting device shown in FIG. 1, a plurality of scribed lines perpendicular to each other are formed on a chemically strengthened soda glass substrate with a thickness of 0.55 mm such that 40 intersection points are formed, and a laser beam is irradiated along one of the formed scribed lines. After cutting the substrate, a glass plate (5 mm*5 mm*thickness 0.4 mm) was placed on the intersection area of the cutting line and the other scribed line. Thereafter, a laser beam is irradiated along the other scribed line to cut the substrate into a plurality. Cutting of the glass substrate was performed using the method shown in FIG. 3 . The results are shown in Table 1. In addition, specific irradiation conditions of the laser beam are as follows.

(第1刻划线52a形成的激光光束照射条件)(Laser beam irradiation conditions for forming the first scribe line 52a)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:100WLaser output: 100W

相对移动速度:100mm/secRelative moving speed: 100mm/sec

激光点:椭圆形Laser spot: oval

(第2刻划线52b形成的激光光束照射条件)(Laser beam irradiation conditions for forming the second scribe line 52b)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:120WLaser output: 120W

相对移动速度:200mm/secRelative moving speed: 200mm/sec

激光点:椭圆形Laser spot: oval

(激光折断的激光光束照射条件)(Laser beam irradiation conditions for laser breakage)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:320WLaser output: 320W

相对移动速度:1500mm/secRelative moving speed: 1500mm/sec

激光点:椭圆形Laser spot: oval

比较例1Comparative example 1

在交点区域没有载置玻璃板以外是使与实施例1同样来进行基板的割断。将结果在表1一起显示。Cutting of the substrate was performed in the same manner as in Example 1 except that no glass plate was placed on the intersection region. The results are shown together in Table 1.

表1Table 1

「破裂」:在交点部分有破裂产生"Crack": There is a crack at the intersection point

「交点跳跃」:从交点往激光光束的相对移动方向下流侧割断线没有伸展"Intersection jump": The cutting line does not extend from the intersection point to the downstream side of the relative movement direction of the laser beam

如由表1理解,相对于以实施例1的方法是40个交点之中在所有交点为割断良好,以比较例1的割断方法只有3个交点为割断良好,在其余37个交点有破裂发生。As can be understood from Table 1, compared to the method of Example 1, all of the 40 intersections were well cut, while the cutting method of Comparative Example 1 was good at only 3 intersections, and cracks occurred at the remaining 37 intersections. .

实施例2Example 2

使代替玻璃板的水(附着量:0.04mL、直径8~10mm)对交点区域附着以外是使与实施例1同样来进行基板的割断。将结果在表2显示。另外,激光光束的具体照射条件如下述。The cutting of the substrate was carried out in the same manner as in Example 1, except that water (adhesion amount: 0.04 mL, diameter: 8 to 10 mm) was attached to the intersection area instead of the glass plate. The results are shown in Table 2. In addition, specific irradiation conditions of the laser beam are as follows.

(第1刻划线52a形成的激光光束照射条件)(Laser beam irradiation conditions for forming the first scribe line 52a)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:100WLaser output: 100W

相对移动速度:100mm/secRelative moving speed: 100mm/sec

激光点:椭圆形Laser spot: oval

(第2刻划线52b形成的激光光束照射条件)(Laser beam irradiation conditions for forming the second scribe line 52b)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:130WLaser output: 130W

相对移动速度:180mm/secRelative moving speed: 180mm/sec

激光点:椭圆形Laser spot: oval

(激光折断的激光光束照射条件)(Laser beam irradiation conditions for laser breakage)

激光种类:二氧化碳激光Laser Type: Carbon Dioxide Laser

激光输出:240WLaser output: 240W

相对移动速度:1500mm/secRelative moving speed: 1500mm/sec

激光点:椭圆形Laser spot: oval

比较例2Comparative example 2

在交点区域没有使水滴附着以外是使与实施例2同样来进行基板的割断。将结果在表2一起显示。Cutting of the substrate was performed in the same manner as in Example 2 except that water droplets were not adhered to the intersection region. The results are shown together in Table 2.

表2Table 2

如由表2理解,相对于以在交点区域使水滴附着的实施例2的割断方法是40个交点之中在所有交点为割断良好,以比较例2的割断方法只有2个交点为割断良好,在其余38个交点有破裂发生。As can be understood from Table 2, compared to the cutting method of Example 2 in which water droplets are attached to the intersection area, all of the 40 intersections are good at all intersections, and only 2 of the intersections are good at the cutting method of Comparative Example 2. Cracks occurred at the remaining 38 intersections.

[产业上的可利用性][industrial availability]

利用本发明的割断方法,在使用激光于互相交叉的两方向将脆性材料基板割断的场合可抑制交点部分的破裂的发生,甚为有用。The cutting method of the present invention is useful for suppressing the occurrence of cracks at intersections when cutting a brittle material substrate in two directions intersecting with each other using laser light.

Claims (11)

1.一种脆性材料基板的割断方法,包含:将互相交叉的由垂直裂痕构成的第1刻划线与第2刻划线在脆性材料基板形成的步骤、沿着第1刻划线与第2刻划线使激光光束相对移动同时照射而使前述垂直裂痕伸展并以第1刻划线与第2刻划线将前述基板割断的步骤,其特征在于:1. A cutting method for a brittle material substrate, comprising: forming a first scribe line and a second scribe line intersecting each other on a brittle material substrate, along the first scribe line and the second scribe line. 2. A step of irradiating the laser beam while relatively moving the scribe line to extend the vertical crack and cut the substrate with the first scribe line and the second scribe line, characterized in that: 在沿着第1刻划线及/或第2刻划线照射激光光束之际使往第1刻划线与第2刻划线的交点区域的激光光束照射量比交点区域以外的激光光束照射量减少。When irradiating the laser beam along the first ruled line and/or the second ruled line, the amount of laser beam irradiation to the intersection area of the first ruled line and the second ruled line is lower than that of the laser beam other than the intersection area. amount decreased. 2.如权利要求1所述的脆性材料基板的割断方法,其特征在于其中,2. The method for cutting a brittle material substrate according to claim 1, wherein, 使往第1刻划线与第2刻划线的交点区域的激光光束照射量为交点区域以外的激光光束照射量的50%以下。The laser beam irradiation amount to the intersection area of the first ruled line and the second ruled line is 50% or less of the laser beam irradiation amount other than the intersection area. 3.如权利要求1所述的脆性材料基板的割断方法,其特征在于其中,3. The method for cutting a brittle material substrate according to claim 1, wherein, 借由控制激光光束输出,使往第1刻划线与第2刻划线的交点区域的激光光束照射量减少。By controlling the output of the laser beam, the irradiation amount of the laser beam to the intersection area of the first scribed line and the second scribed line is reduced. 4.如权利要求2所述的脆性材料基板的割断方法,其特征在于其中,4. The method for cutting a brittle material substrate according to claim 2, wherein, 借由控制激光光束输出,使往第1刻划线与第2刻划线的交点区域的激光光束照射量减少。By controlling the output of the laser beam, the irradiation amount of the laser beam to the intersection area of the first scribed line and the second scribed line is reduced. 5.如权利要求1所述的脆性材料基板的割断方法,其特征在于其中,5. The method for cutting a brittle material substrate according to claim 1, wherein, 以吸收或反射激光光束的被覆构件覆盖第1刻划线与第2刻划线的交点区域,使往前述交点区域的激光光束照射量减少。Covering the intersection area of the first scribed line and the second scribed line with a covering member that absorbs or reflects the laser beam reduces the irradiation amount of the laser beam to the intersection area. 6.如权利要求2所述的脆性材料基板的割断方法,其特征在于其中,6. The method for cutting a brittle material substrate according to claim 2, wherein, 以吸收或反射激光光束的被覆构件覆盖第1刻划线与第2刻划线的交点区域,使往前述交点区域的激光光束照射量减少。Covering the intersection area of the first scribed line and the second scribed line with a covering member that absorbs or reflects the laser beam reduces the irradiation amount of the laser beam to the intersection area. 7.如权利要求1所述的脆性材料基板的割断方法,其特征在于其中,7. The method for cutting a brittle material substrate according to claim 1, wherein, 以吸收或反射激光光束的液体覆盖第1刻划线与第2刻划线的交点区域,使往前述交点区域的激光光束照射量减少。The intersection region of the first ruled line and the second ruled line is covered with a liquid that absorbs or reflects the laser beam, so that the irradiation amount of the laser beam to the aforementioned intersection region is reduced. 8.如权利要求2所述的脆性材料基板的割断方法,其特征在于其中,8. The method for cutting a brittle material substrate according to claim 2, wherein, 以吸收或反射激光光束的液体覆盖第1刻划线与第2刻划线的交点区域,使往前述交点区域的激光光束照射量减少。The intersection region of the first ruled line and the second ruled line is covered with a liquid that absorbs or reflects the laser beam, so that the irradiation amount of the laser beam to the aforementioned intersection region is reduced. 9.如权利要求1至8中任一权利要求所述的脆性材料基板的割断方法,其特征在于其中,9. The method for cutting a brittle material substrate according to any one of claims 1 to 8, wherein, 前述交点区域是在从第1刻划线与第2刻划线的交点往激光光束的相对移动方向上流侧与下流侧分别具有5mm以下的宽度的区域。The intersection region is a region having a width of 5 mm or less on the upstream and downstream sides of the relative movement direction of the laser beam from the intersection of the first ruled line and the second ruled line. 10.如权利要求1至8中任一权利要求所述的脆性材料基板的割断方法,其特征在于其中,10. The method for cutting a brittle material substrate according to any one of claims 1 to 8, wherein, 第1刻划线及第2刻划线是对前述基板使激光光束相对移动同时照射,将前述基板加热为熔融温度未满后,对前述基板吹送冷却媒体以冷却,以借由在前述基板产生的热应力形成。The first scribed line and the second scribed line are irradiated while moving the laser beam relatively to the aforementioned substrate, and after heating the aforementioned substrate until the melting temperature is lower than the melting temperature, the aforementioned substrate is blown with a cooling medium to cool the aforementioned substrate so that thermal stress formation. 11.如权利要求9所述的脆性材料基板的割断方法,其特征在于其中,11. The method for cutting a brittle material substrate according to claim 9, wherein, 第1刻划线与第2刻划线是对前述基板使激光光束相对移动同时照射,将前述基板加热为熔融温度未满后,对前述基板吹送冷却媒体以冷却,以借由在前述基板产生的热应力形成。The first scribed line and the second scribed line are irradiated while moving the laser beam relative to the aforementioned substrate, and after heating the aforementioned substrate until the melting temperature is lower than the melting temperature, the aforementioned substrate is blown with a cooling medium to cool the aforementioned substrate so that thermal stress formation.
CN201180005624.7A 2011-12-22 2011-12-22 The cut-off method of brittle substrate Expired - Fee Related CN103282317B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2011/079842 WO2013094059A1 (en) 2011-12-22 2011-12-22 Method for fracturing brittle material substrate

Publications (2)

Publication Number Publication Date
CN103282317A CN103282317A (en) 2013-09-04
CN103282317B true CN103282317B (en) 2015-12-16

Family

ID=48667984

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180005624.7A Expired - Fee Related CN103282317B (en) 2011-12-22 2011-12-22 The cut-off method of brittle substrate

Country Status (3)

Country Link
KR (1) KR101442067B1 (en)
CN (1) CN103282317B (en)
WO (1) WO2013094059A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6387695B2 (en) * 2014-06-13 2018-09-12 三星ダイヤモンド工業株式会社 Breaking device for brittle material substrate
CN105436712B (en) * 2015-12-07 2017-12-12 武汉铱科赛科技有限公司 The fragility splinter method and system of a kind of brittle semiconductor materials
CN109080005B (en) * 2018-08-20 2020-10-02 衡阳恒裕轻质保温材料有限责任公司 High-precision cutting device for aerated concrete blocks
TWI681241B (en) * 2018-12-04 2020-01-01 友達光電股份有限公司 Manufacturing method for display device and display device utilized thereof
CN109873050B (en) * 2019-02-22 2024-08-02 上海祖强能源有限公司 Solar cell preparation method and system
JP7028820B6 (en) * 2019-03-18 2023-12-19 ファナック株式会社 Laser processing method for cutting workpieces
CN110465755A (en) * 2019-07-10 2019-11-19 阜宁苏民绿色能源科技有限公司 A method of improving mark point crack

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495409B (en) * 1999-06-18 2002-07-21 Three Masonry Work Co Ltd Scribing method using laser beam
CN101001729A (en) * 2004-07-30 2007-07-18 三星钻石工业股份有限公司 Vertical crack forming method and vertical crack forming device in substrate
JP2009090598A (en) * 2007-10-11 2009-04-30 Mitsuboshi Diamond Industrial Co Ltd Curved crack-forming method of brittle material substrate, and brittle material substrate
TW201031510A (en) * 2009-02-13 2010-09-01 Mitsuboshi Diamond Ind Co Ltd Method for cutting brittle material substrate
CN101910076A (en) * 2007-12-27 2010-12-08 三星钻石工业股份有限公司 Crack formation method for brittle material substrate
CN101939129A (en) * 2007-11-07 2011-01-05 陶瓷技术股份公司 Method for laser etching brittle components
JP2011230940A (en) * 2010-04-26 2011-11-17 Mitsuboshi Diamond Industrial Co Ltd Cutting method for brittle material substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3370310B2 (en) * 1999-06-18 2003-01-27 三星ダイヤモンド工業株式会社 Scribe method using laser
JP4256724B2 (en) * 2003-06-05 2009-04-22 三星ダイヤモンド工業株式会社 Method and apparatus for scribing brittle material substrate

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495409B (en) * 1999-06-18 2002-07-21 Three Masonry Work Co Ltd Scribing method using laser beam
CN101001729A (en) * 2004-07-30 2007-07-18 三星钻石工业股份有限公司 Vertical crack forming method and vertical crack forming device in substrate
JP2009090598A (en) * 2007-10-11 2009-04-30 Mitsuboshi Diamond Industrial Co Ltd Curved crack-forming method of brittle material substrate, and brittle material substrate
CN101939129A (en) * 2007-11-07 2011-01-05 陶瓷技术股份公司 Method for laser etching brittle components
CN101910076A (en) * 2007-12-27 2010-12-08 三星钻石工业股份有限公司 Crack formation method for brittle material substrate
TW201031510A (en) * 2009-02-13 2010-09-01 Mitsuboshi Diamond Ind Co Ltd Method for cutting brittle material substrate
JP2011230940A (en) * 2010-04-26 2011-11-17 Mitsuboshi Diamond Industrial Co Ltd Cutting method for brittle material substrate

Also Published As

Publication number Publication date
WO2013094059A1 (en) 2013-06-27
KR20130094173A (en) 2013-08-23
CN103282317A (en) 2013-09-04
KR101442067B1 (en) 2014-09-19

Similar Documents

Publication Publication Date Title
CN103282317B (en) The cut-off method of brittle substrate
JP5864988B2 (en) Tempered glass sheet cutting method
TWI647187B (en) Method of separating a glass sheet from a carrier
JP2011230940A (en) Cutting method for brittle material substrate
WO2006070825A1 (en) Method for cutting brittle material substrate and substrate cutting system
KR101440481B1 (en) Method for scribing brittle material substrate and device for scribing brittle material substrate
JP2019042925A (en) Method of cutting brittle material, device for cutting brittle material, method of manufacturing cut brittle material, and cut brittle material
JP2010150068A (en) Method for breaking brittle material substrate
CN1264768C (en) Device and method for scribing fragile material substrate
JP4134033B2 (en) Scribing apparatus and scribing method for brittle material substrate
CN100411825C (en) Scribing device for brittle material substrate and scribing method for brittle material substrate
JP4080484B2 (en) Scribing method and scribing apparatus for brittle material substrate
JP2010138046A (en) Method and device for working material to be cut
JP5590642B2 (en) Scribing apparatus and scribing method
JP2004042423A (en) Scribing apparatus
KR20100107253A (en) Substrate cutting appartus and method for cutting substrate using the same
JPWO2003013816A1 (en) Method and apparatus for scribing brittle material substrate
WO2010092964A1 (en) Method for cutting brittle material substrate
JP2010089143A (en) Method and device for cutting brittle material substrate
JP5554158B2 (en) Cleaving method of brittle material substrate
JP5444158B2 (en) Cleaving method of brittle material substrate
TWI587960B (en) Laser processing method and laser processing device
TWI461251B (en) Method for cutting brittle material substrates
JP2015160769A (en) Method of cutting glass substrate
JP2010253752A (en) Device and method of cutting brittle material

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151216

Termination date: 20171222