CN102501449A - Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof - Google Patents
Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof Download PDFInfo
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- CN102501449A CN102501449A CN2011103816713A CN201110381671A CN102501449A CN 102501449 A CN102501449 A CN 102501449A CN 2011103816713 A CN2011103816713 A CN 2011103816713A CN 201110381671 A CN201110381671 A CN 201110381671A CN 102501449 A CN102501449 A CN 102501449A
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- 239000011521 glass Substances 0.000 title claims abstract description 71
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 67
- 239000004332 silver Substances 0.000 title claims abstract description 67
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 239000010410 layer Substances 0.000 claims description 156
- 239000011241 protective layer Substances 0.000 claims description 71
- 230000005855 radiation Effects 0.000 claims description 26
- 238000004544 sputter deposition Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 19
- 238000000151 deposition Methods 0.000 claims description 18
- 230000008021 deposition Effects 0.000 claims description 18
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 12
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 238000013459 approach Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 230000009977 dual effect Effects 0.000 claims description 8
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 claims description 4
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 4
- 239000012300 argon atmosphere Substances 0.000 claims description 4
- 229910001120 nichrome Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 3
- 230000007704 transition Effects 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- GWVKDXOHXJEUCP-UHFFFAOYSA-N [N].[O].[Ar] Chemical compound [N].[O].[Ar] GWVKDXOHXJEUCP-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000003989 dielectric material Substances 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 abstract description 10
- 238000007254 oxidation reaction Methods 0.000 abstract description 10
- 238000012545 processing Methods 0.000 abstract description 9
- 230000003287 optical effect Effects 0.000 abstract description 4
- 230000004888 barrier function Effects 0.000 abstract 8
- 229910018487 Ni—Cr Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 6
- 238000005496 tempering Methods 0.000 description 6
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical group [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000013003 hot bending Methods 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910004286 SiNxOy Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000005344 low-emissivity glass Substances 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 239000005336 safety glass Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910019923 CrOx Inorganic materials 0.000 description 1
- 241000227425 Pieris rapae crucivora Species 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 1
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Abstract
The invention discloses a four-silver low emissivity coated glass capable of being processed in foreign places and a manufacturing method thereof. The four-silver low emissivity coated glass comprises a glass substrate and a film layer coated on the glass substrate. The four-silver low emissivity coated glass is characterized in that: the film layer comprises a basis layer dielectric medium layer, a first dielectric medium combination layer, a first barrier protection layer, a first silver layer, a second barrier protection layer, a first spaced dielectric medium combination layer, a third barrier protection layer, a second silver layer, a fourth barrier protection layer, a second spaced dielectric medium combination layer, a fifth barrier protection layer, a third silver layer, a sixth barrier protection layer, a third spaced dielectric medium combination layer, a seventh barrier protection layer, a fourth silver layer, an eighth barrier protection layer and a second dielectric medium combination layer which are arranged in sequence outwards from the glass substrate. According to the invention, the unique film layer structure and the manufacturing method are adopted, so that the product, namely the four-silver low emissivity coated glass, has the advantages of higher visible light transmissivity, extremely low emissivity, good photo-thermal ratio and optical stability, better weather resistance and oxidation resistance, and capabilities of realizing foreign-place processing and meeting the requirements of deep processing on product performance.
Description
Technical field
The present invention relates to building and automobile-used coated glass field, but specifically be that a kind of strange land processes four silver low radiation coated glass and manufacturing approaches thereof.
Background technology
Four silver low radiation glass are as the high-end product in the present domestic low radiation coated glass of researching and developing; Silver layer by reaching four layers is formed; Have higher visible light transmissivity, very high infrared reflection rate; Can obtain splendid heat insulation and preservation effect, for ultraviolet stopping good effect arranged also in addition.But in the existing four silver low radiation glass processings, can only adopt the first tempering processing mode of plated film again, cause traditional four silver low radiation glass can not be generalized on the vehicle glass, can not large tracts of land be generalized to the residential houses glass.Main because: 1), modern architecture and windshield extensively adopt curved tempering and hot bending glass; And traditional off-line low radiation coated glass poor-performing; Can not bend subsequent thermal processing such as tempering and hot bending and handle, plated film is carried out in being implemented on curved tempering and the hot bending glass substrate that domestic existing Coated Glass Line also can't be good; 2), traditional processing mode efficient is low; Usually the plated film charging ratio of safety glass has only about 75%; Just can only bring into play 75% of plated film line production capacity, safety glass needs artificial loading, unloading sheet, needs the enough operative employees of configuration; Increased the labor wage expenditure, the speed of artificial loading, unloading sheet has restricted the plated film walking speed again simultaneously.The various sticking patch quantity of filming process are many, the production cycle is long; 3), the glass cost of transportation is high; Use because of the off-line low radiation coated glass must synthesize double glazing, and the transportation of double glazing has increased the transportation expenditure, for example; The double glazing of 6mm low emissivity glass+12mm air layer+6mm glass; The volume of shipping goods is the twice of monolithic glass, for these reasons, develops and a kind ofly can realize that four silver low radiation coated glasses of strange land processing are imperative.
Summary of the invention
Technical purpose of the present invention is to solve the problem that exists in the prior art, and a kind of good product performance is provided, and is wear-resisting, anticorrosive, anti-oxidant, but four silver low radiation coated glass and the manufacturing approaches thereof that the strange land processes behind plated film.
Technical scheme of the present invention is:
But a kind of strange land processes four silver low radiation coated glasses; Comprise glass substrate and be coated on the rete on the glass substrate; It is characterized in that said rete outwards comprises from glass substrate successively: basic unit's dielectric layer, first dielectric make up layer, first block protective layer, first silver layer, second block protective layer, the first interval dielectric combination layer, the 3rd block protective layer, second silver layer, dielectric combination layer, the 5th block protective layer, the 3rd silver layer, the 6th block protective layer, the 3rd interval dielectric make up layer, the 7th block protective layer, the 4th silver layer, the 8th block protective layer, second dielectric combination layer to the 4th block protective layer, second at interval.Each above-mentioned rete can be to constitute the composite bed that perhaps is made up of a plurality of film layer stacks by homogenous material.
Said basic unit dielectric layer is a silicon base compound, preferred Si
3N
4, SiO
2, a kind of among the SiOxNy.
Said first dielectric combination layer, second dielectric combination layer, first at interval dielectric combination layer, second at interval dielectric combination layer, the 3rd at interval dielectric combination layer by SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3One or more compositions in the film layer.
Rete that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is metal, metal oxide or metal nitride materials constitutes, a kind of in preferred Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx material.
But a kind of strange land processes the manufacturing approach of four silver low radiation coated glasses, adopts vacuum magnetic-control sputtering plated film mode, it is characterized in that, may further comprise the steps:
(1), with behind the glass substrate cleaning-drying, be placed on the vacuum sputtering district, carry out the forevacuum transition;
(2); Bottom-up deposition successively forms basic unit's dielectric layer on said glass substrate; First dielectric combination layer; First block protective layer; First silver layer; Second block protective layer; The first interval dielectric combination layer; The 3rd block protective layer; Second layer silver layer; The 4th block protective layer; The second interval dielectric combination layer; The 5th block protective layer; The 3rd layer of silver layer; The 6th block protective layer; The 3rd interval dielectric combination layer; The 7th block protective layer; The 4th silver layer; Eight block protective layer; Second dielectric combination layer;
(3), form product;
Said basic unit dielectric layer, first and second dielectrics combination layer, first to the 3rd wall dielectric combination layer all adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode to deposit; Said first to fourth silver layer, first to the 8th block protective layer all adopt the mode of planar cathode, d.c. sputtering to deposit.
Said dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode are in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, to carry out; Said magnetically controlled DC sputtering mode is in argon oxygen, argon nitrogen or straight argon atmosphere, to carry out.
The present invention improves traditional low radiation coated glass, and a kind of unique film layer structure is provided, and is but the strange land that is provided processes the beneficial effect of four silver low radiation coated glasses and production technology thereof:
1), traditional with the low radiation coated glass of Ag as the infrared external reflection rete; The basic reason that can not carry out subsequent heat treatment is: the Ag layer is prone to go to pot in heating process; Even lose the function of infrared external reflection; Damage (that rete face resistance significantly raises, face is white in color is vaporific, rete comes off, and face is the retaining layer), Ag layer oxidized (fuzzy vaporific, the full plate pin hole dress small particles of face sheet) etc. like the Ag layer; Therefore be the ruined phenomenon of Ag layer, four traditional silver low radiation coated glasses can't carry out subsequent heat treatment.The present invention is not destroyed in heat treatment process with protection Ag layer through before and after silver layer, increasing block protective layer and increasing resistant to elevated temperatures dielectric layer at the glass bottom, can realize first plated film, back tempering or hot bending;
2) high hardness material that, employing of the present invention and glass material are close is as basic unit's dielectric layer; Not only can between glass substrate and function Ag layer, play good bonding effect; And can offset the internal stress of composite film; Particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious, satisfy product behind the plated film in the demand of strange land processing.
The present invention has also solved traditional low emissivity glass silver thickness simultaneously and the number of plies increases problems such as the back visible light transmissive is lower, appearance color presents interference colour, the color selection is limited.Product has very high visible light transmissivity, extremely low radiance, good photo-thermal than LSG, has good optical stability, weatherability, and color is various, can satisfy different clients' demand, suitable vehicle glass and the building glass market of being widely applied to.
Description of drawings
Fig. 1 is a structural representation of the present invention.
The specific embodiment
In order to illustrate technical scheme of the present invention and technical purpose, the present invention is done further introduction below in conjunction with the accompanying drawing and the specific embodiment.
As shown in the figure, but strange land of the present invention processes the film layer structure and the thicknesses of layers of four silver low radiation coated glasses be:
Glass substrate/basic unit's dielectric layer; (10-80nm)/first dielectric makes up layer; (10-80nm)/first block protective layer; (0.5-5nm)/first silver layer; (5-40nm)/second block protective layer/first interval dielectric makes up layer; (10-100nm)/the 3rd block protective layer; (0.5-5nm)/second silver layer; (5-40nm)/the 4th block protective layer; (0.5-5nm)/second dielectric makes up layer at interval; (10-200nm)/the 5th block protective layer; (0.5-5nm)/the 3rd silver layer; (5-40nm)/the 6th block protective layer; (0.5-5nm)/the 3rd dielectric makes up layer at interval; (10-200nm)/the 7th block protective layer; (0.5-5nm)/the 4th silver layer; (5-40nm)/the 8th block protective layer; (0.5-5nm)/second dielectric makes up layer; (10-80nm).
Wherein first dielectric combination layer, second dielectric combination layer and first to the 3rd interval dielectric combination layer are by SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3Deng one or more compositions in the material.
Rete that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is metal, metal oxide or metal nitride materials constitutes, a kind of in preferred Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx material.
Be the film layer structure of a concrete application example of the present invention below:
Glass substrate/SiNxOy/ZnO/NiCrOx/Ag/NiCrOx/ZnSnOx/NiCrOx/Ag/NiCrOx/ZnSn Ox/NiCrOx/Ag/NiCrOx/ZnSnOx/NiCrOx/Ag/NiCrOx/ (ZnSnOx/Si
3N
4)
Wherein, basic unit's dielectric layer is silicon oxynitride (SiNxOy), and thicknesses of layers is: 46.0nm;
First dielectric combination layer is zinc oxide (ZnO), and thicknesses of layers is: 10nm;
First block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first silver layer thicknesses of layers is: 13.9nm;
Second block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 69.7nm;
The 3rd block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second silver layer thicknesses of layers is: 15.0nm;
The 4th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 58.6nm;
The 5th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 3rd silver layer thicknesses of layers is: 9.4nm;
The 6th block protective layer is oxidation nickel chromium triangle (Ni CrOx), and thicknesses of layers is: 0.3nm;
The 3rd interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 31.4nm;
The 7th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 4th silver layer thicknesses of layers is: 12.7nm;
The 8th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric combination layer is zinc-tin oxide (ZnSnOx) and silicon nitride (Si
3N
4) the rete formation, thickness is respectively: 15.2nm, 18.4nm.
The processing technology of above-mentioned rete is:
All silicon nitride (Si
3N
4) layer use sial (92: 8) target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-80kw, supply frequency is 20-40kHz;
All silicon oxynitrides (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
Zinc oxide (ZnO) layer uses zinc-aluminium (98: 2) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and supply frequency is 20-40kHz;
Zinc-tin oxide (ZnSnOx) layer uses Zinc-tin alloy (50: 50) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-70kw, and supply frequency is 20-40kHz;
Oxidation nickel chromium triangle (NiCrOx) layer uses the nichrome target, adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw;
All functions layer Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target, and power is 2-10kw;
Manufacturing approach idiographic flow of the present invention is:
(1), with behind the glass substrate cleaning-drying, be placed on the vacuum sputtering district, carry out the forevacuum transition;
(2), deposition forms basic unit's dielectric layer on said glass body;
(3), deposition first dielectric combination layer on said basic unit dielectric layer;
(4), deposition forms first block protective layer on said first dielectric combination layer;
(5), deposition forms first silver layer on said first block protective layer;
(6), deposition forms second block protective layer on said first silver layer;
(7), deposition forms first wall dielectric combination layer on said second block protective layer;
(8), deposition forms the 3rd block protective layer on said first wall dielectric combination layer;
(9), deposition forms second layer silver layer on said the 3rd block protective layer;
(10), deposition forms the 4th block protective layer on said second layer silver layer;
(11), deposition forms the 3rd interval dielectric combination layer on said the 4th block protective layer;
(12), deposit formation the 5th block protective layer on the dielectric combination layer at interval the said the 3rd;
(13), deposition forms the 3rd layer of silver layer on said the 5th block protective layer;
(14), deposition forms the 6th block protective layer on said the 3rd layer of silver layer;
(15), deposition forms the 4th interval dielectric combination layer on said the 6th block protective layer;
(16), deposit formation the 7th block protective layer on the dielectric combination layer at interval the said the 4th;
(17), deposition forms the 4th silver layer on said the 7th block protective layer;
(18), deposition forms the 8th block protective layer on said the 4th silver layer;
(19), deposition forms second dielectric combination layer on said the 8th block protective layer;
(20), form product;
(21), on-line measurement optical performance parameter;
(22), product inspection;
(22), the packing of product.
Use glass (behind the tempering) optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=60.8%;
Visible light glass reflectivity=10.2%;
Visible light glass chromaticity coordinates a* value=-2.3;
Visible light glass chromaticity coordinates b* value=-5.2;
Visible light face reflectivity=6.5%;
Visible light face chromaticity coordinates a*=-2.0;
Visible light face chromaticity coordinates b*=-3.0;
Glass radiance E=0.018;
Rete resistance is lower than 1.3 Ω cm
2
B, use the present invention to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=55.8%;
Visible light glass reflectivity (out)=12.4%;
Visible light glass reflectivity (in)=8.6%;
Solar energy transmitance T=16%;
Solar reflectance (out)=54%;
G-value＝0.23；
Shading coefficient SC=0.26;
U value=1.56W/m2K;
Photo-thermal compares LSG=2.44;
Below disclose the present invention with preferred embodiment, so it is not in order to restriction the present invention, and all employings are equal to replacement or the technical scheme that obtained of equivalent transformation mode, all drop within protection scope of the present invention.
Claims (9)
1. but a strange land processes four silver low radiation coated glasses; Comprise glass substrate and be coated on the rete on the glass substrate; It is characterized in that said rete outwards comprises from glass substrate successively: basic unit's dielectric layer, first dielectric make up layer, first block protective layer, first silver layer, second block protective layer, the first interval dielectric combination layer, the 3rd block protective layer, second silver layer, dielectric combination layer, the 5th block protective layer, the 3rd silver layer, the 6th block protective layer, the 3rd interval dielectric make up layer, the 7th block protective layer, the 4th silver layer, the 8th block protective layer, second dielectric combination layer to the 4th block protective layer, second at interval.
2. but strange land according to claim 1 processes four silver low radiation coated glasses, it is characterized in that, said basic unit dielectric layer is a silicon base compound.
3. but strange land according to claim 2 processes four silver low radiation coated glasses, it is characterized in that, said basic unit dielectric layer is Si
3N
4, SiO
2, a kind of among the SiOxNy.
4. but strange land according to claim 1 processes four silver low radiation coated glasses; It is characterized in that, said first dielectric combination layer, second dielectric combination layer, first at interval dielectric combination layer, second at interval dielectric combination layer, the 3rd at interval dielectric combination layer by SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3One or more compositions in the film layer.
5. but strange land according to claim 1 processes four silver low radiation coated glasses; It is characterized in that the rete that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is metal, metal oxide or metal nitride materials constitutes.
6. but strange land according to claim 5 processes four silver low radiation coated glasses; It is characterized in that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is a kind of in Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx film layer.
7. but manufacturing approach that the strange land processes four silver low radiation coated glasses adopts the mode of vacuum magnetic-control sputtering plated film, it is characterized in that, may further comprise the steps:
(1), with behind the glass substrate cleaning-drying, be placed on the vacuum sputtering district, carry out the forevacuum transition;
(2); Bottom-up deposition successively forms basic unit's dielectric layer on said glass substrate; First dielectric combination layer; First block protective layer; First silver layer; Second block protective layer; The first interval dielectric combination layer; The 3rd block protective layer; Second layer silver layer; The 4th block protective layer; The second interval dielectric combination layer; The 5th block protective layer; The 3rd layer of silver layer; The 6th block protective layer; The 3rd interval dielectric combination layer; The 7th block protective layer; The 4th silver layer; Eight block protective layer; Second dielectric combination layer;
(3), form product.
8. but strange land according to claim 7 processes the manufacturing approach of four silver low radiation coated glasses; It is characterized in that said basic unit dielectric layer, first and second dielectrics combination layer, first to the 3rd wall dielectric combination layer all adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode to deposit; Said first to fourth silver layer, first to the 8th block protective layer all adopt the mode of planar cathode, d.c. sputtering to deposit.
9. but strange land according to claim 8 processes the manufacturing approach of four silver low radiation coated glasses, it is characterized in that, said dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode are in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, to carry out; The mode of said planar cathode, d.c. sputtering is in argon oxygen, argon nitrogen or straight argon atmosphere, to carry out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103816713A CN102501449A (en) | 2011-11-25 | 2011-11-25 | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103816713A CN102501449A (en) | 2011-11-25 | 2011-11-25 | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN102501449A true CN102501449A (en) | 2012-06-20 |
Family
ID=46213611
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| CN2011103816713A Pending CN102501449A (en) | 2011-11-25 | 2011-11-25 | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof |
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| CN104029440A (en) * | 2014-05-22 | 2014-09-10 | 杭州电子科技大学 | Offline low-emissivity glass coated film system |
| CN112125503A (en) * | 2020-09-02 | 2020-12-25 | 四川旭虹光电科技有限公司 | Method for hot bending and forming curved glass |
| CN117510093A (en) * | 2022-07-29 | 2024-02-06 | 江苏繁华应材科技股份有限公司 | High temperature resistance, ultraviolet resistance and high transmittance energy-saving coated glass and production method thereof |
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Application publication date: 20120620 |