CA1210824A - Dispositif et methode de stabilisation d'un arc d'evaporation - Google Patents

Dispositif et methode de stabilisation d'un arc d'evaporation

Info

Publication number: CA1210824A
Authority: CA; Canada
Prior art keywords: target; ring; arc; permeable; cathode
Prior art date: 1983-05-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000443298A

Other languages

English (en)

Inventor

William M. Mularie

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Vac Tec Systems Inc

Original Assignee

Vac Tec Systems Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-05-09

Filing date

1983-12-14

Publication date

1986-09-02

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27050887&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA1210824(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1983-05-09 Priority claimed from US06/492,831 external-priority patent/US4430184A/en

1983-09-12 Priority claimed from US06/531,287 external-priority patent/US4559121A/en

1983-12-14 Application filed by Vac Tec Systems Inc filed Critical Vac Tec Systems Inc

1986-09-02 Application granted granted Critical

1986-09-02 Publication of CA1210824A publication Critical patent/CA1210824A/fr

Status Expired legal-status Critical Current

Links

238000001704 evaporation Methods 0.000 title claims abstract description 13
230000008020 evaporation Effects 0.000 title claims abstract description 11
230000006641 stabilisation Effects 0.000 title claims abstract description 9
238000011105 stabilization Methods 0.000 title claims abstract description 9
238000000034 method Methods 0.000 title abstract description 11
239000000463 material Substances 0.000 claims abstract description 32
239000013077 target material Substances 0.000 claims abstract description 18
239000002245 particle Substances 0.000 claims abstract description 9
229910052582 BN Inorganic materials 0.000 claims abstract description 8
PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims abstract description 8
238000000576 coating method Methods 0.000 claims description 29
239000011248 coating agent Substances 0.000 claims description 23
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 18
239000000758 substrate Substances 0.000 claims description 9
-1 nitride compound Chemical class 0.000 claims description 5
NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 4
239000000356 contaminant Substances 0.000 claims description 4
229910000640 Fe alloy Inorganic materials 0.000 claims description 2
229910000889 permalloy Inorganic materials 0.000 claims description 2
230000005012 migration Effects 0.000 abstract description 2
238000013508 migration Methods 0.000 abstract description 2
230000003628 erosive effect Effects 0.000 description 8
238000010586 diagram Methods 0.000 description 7
229910052751 metal Inorganic materials 0.000 description 7
239000002184 metal Substances 0.000 description 7
238000004140 cleaning Methods 0.000 description 6
229910052742 iron Inorganic materials 0.000 description 6
230000000694 effects Effects 0.000 description 5
150000002739 metals Chemical group 0.000 description 5
150000004767 nitrides Chemical class 0.000 description 5
229910052782 aluminium Inorganic materials 0.000 description 4
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
230000008901 benefit Effects 0.000 description 4
230000004907 flux Effects 0.000 description 4
230000014759 maintenance of location Effects 0.000 description 3
239000000203 mixture Substances 0.000 description 3
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
238000013459 approach Methods 0.000 description 2
230000008859 change Effects 0.000 description 2
238000011109 contamination Methods 0.000 description 2
239000012212 insulator Substances 0.000 description 2
230000007246 mechanism Effects 0.000 description 2
239000011224 oxide ceramic Substances 0.000 description 2
229910052574 oxide ceramic Inorganic materials 0.000 description 2
230000008569 process Effects 0.000 description 2
239000010936 titanium Substances 0.000 description 2
229910052719 titanium Inorganic materials 0.000 description 2
229910000859 α-Fe Inorganic materials 0.000 description 2
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
240000007681 Catha edulis Species 0.000 description 1
235000006696 Catha edulis Nutrition 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
208000036993 Frustration Diseases 0.000 description 1
101100504379 Mus musculus Gfral gene Proteins 0.000 description 1
241001494501 Prosopis <angiosperm> Species 0.000 description 1
235000001560 Prosopis chilensis Nutrition 0.000 description 1
235000014460 Prosopis juliflora var juliflora Nutrition 0.000 description 1
244000180577 Sambucus australis Species 0.000 description 1
235000018734 Sambucus australis Nutrition 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
101150007148 THI5 gene Proteins 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
230000009471 action Effects 0.000 description 1
239000000654 additive Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910052787 antimony Inorganic materials 0.000 description 1
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
230000008033 biological extinction Effects 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
229910052796 boron Inorganic materials 0.000 description 1
239000002131 composite material Substances 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
238000010276 construction Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000000151 deposition Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000010891 electric arc Methods 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
238000004880 explosion Methods 0.000 description 1
230000008713 feedback mechanism Effects 0.000 description 1
238000009501 film coating Methods 0.000 description 1
230000000977 initiatory effect Effects 0.000 description 1
230000007774 longterm Effects 0.000 description 1
238000005259 measurement Methods 0.000 description 1
238000001883 metal evaporation Methods 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
239000003973 paint Substances 0.000 description 1
239000011164 primary particle Substances 0.000 description 1
108700001054 rat Hhex Proteins 0.000 description 1
230000002226 simultaneous effect Effects 0.000 description 1
239000007921 spray Substances 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000010959 steel Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1
238000009736 wetting Methods 0.000 description 1
229910052726 zirconium Inorganic materials 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)

CA000443298A 1983-05-09 1983-12-14 Dispositif et methode de stabilisation d'un arc d'evaporation Expired CA1210824A (fr)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
US06/492,831 US4430184A (en)	1983-05-09	1983-05-09	Evaporation arc stabilization
US492,831		1983-05-09
US06/531,287 US4559121A (en)	1983-09-12	1983-09-12	Method and apparatus for evaporation arc stabilization for permeable targets
US531,287		1990-05-31

Publications (1)

Publication Number	Publication Date
CA1210824A true CA1210824A (fr)	1986-09-02

Family

ID=27050887

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000443298A Expired CA1210824A (fr)	1983-05-09	1983-12-14	Dispositif et methode de stabilisation d'un arc d'evaporation

Country Status (5)

Country	Link
CA (1)	CA1210824A (fr)
DE (1)	DE3345493C2 (fr)
FR (1)	FR2545840B1 (fr)
GB (1)	GB2140040B (fr)
NL (1)	NL181880C (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4448659A (en) *	1983-09-12	1984-05-15	Vac-Tec Systems, Inc.	Method and apparatus for evaporation arc stabilization including initial target cleaning
DE3901401C2 (de) *	1988-03-01	1996-12-19	Fraunhofer Ges Forschung	Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung
DE4006456C1 (en) *	1990-03-01	1991-05-29	Balzers Ag, Balzers, Li	Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
GB9108553D0 (en) *	1991-04-22	1991-06-05	Ion Coat Ltd	Ionised vapour source
DE4220588C2 (de) *	1992-06-24	2001-02-15	Leybold Ag	Lichtbogen-Verdampfungsvorrichtung
JP2002525431A (ja) *	1998-09-14	2002-08-13	ユナキス・トレーディング・アクチェンゲゼルシャフト	アーク蒸化室用ターゲット配置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3836451A (en) *	1968-12-26	1974-09-17	A Snaper	Arc deposition apparatus
US3793179A (en) *	1971-07-19	1974-02-19	L Sablev	Apparatus for metal evaporation coating
US3783231A (en) *	1972-03-22	1974-01-01	V Gorbunov	Apparatus for vacuum-evaporation of metals under the action of an electric arc
SU636266A1 (ru) *	1976-04-05	1978-02-10	Предприятие П/Я В-8851	Электродуговой испаритель металлов
CH631743A5 (de) *	1977-06-01	1982-08-31	Balzers Hochvakuum	Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
JPS54110988A (en) *	1978-01-31	1979-08-30	Nii Chiefunorogii Afutomobirin	Coating vacuum evaporation apparatus
GB2106545B (en) *	1981-02-23	1985-06-26	Rimma Ivanovna Stupak	Consumable cathode for electric-arc evaporator of metal

1983
- 1983-12-07 GB GB08332650A patent/GB2140040B/en not_active Expired
- 1983-12-14 CA CA000443298A patent/CA1210824A/fr not_active Expired
- 1983-12-15 FR FR8320123A patent/FR2545840B1/fr not_active Expired
- 1983-12-15 DE DE19833345493 patent/DE3345493C2/de not_active Expired
1984
- 1984-01-06 NL NL8400053A patent/NL181880C/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
DE3345493A1 (de)	1984-11-15
NL181880C (nl)	1993-01-18
DE3345493C2 (de)	1986-01-16
FR2545840A1 (fr)	1984-11-16
GB8332650D0 (en)	1984-01-11
NL181880B (nl)	1987-06-16
GB2140040A (en)	1984-11-21
FR2545840B1 (fr)	1985-11-29
NL8400053A (nl)	1984-12-03
GB2140040B (en)	1986-09-17

Legal Events

Date	Code	Title	Description
2003-12-14	MKEX	Expiry
2023-05-26	MKEX	Expiry	Effective date: 20031214

Publication	Publication Date	Title
CA1248493A (fr)	1989-01-10	Methode et dispositif de stabilisation d'un arc evaporateur, avec nettoyage initial du point vise
US4430184A (en)	1984-02-07	Evaporation arc stabilization
US6001227A (en)	1999-12-14	Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
KR100569044B1 (ko)	2006-06-21	캐소우드아크증착장치
Boxman et al.	2002	Principles and applications of vacuum arc coatings
US5279723A (en)	1994-01-18	Filtered cathodic arc source
US4559125A (en)	1985-12-17	Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
EP2788522B1 (fr)	2016-02-03	Appareil et procédé de dépôt sous vide par arc cathodique filtré et procédé
US5932078A (en)	1999-08-03	Cathodic arc vapor deposition apparatus
US4512867A (en)	1985-04-23	Method and apparatus for controlling plasma generation in vapor deposition
CA2284368A1 (fr)	2001-03-30	Production d'un plasma a arc electrique dans un guide curviligne et revetement de substrats
JPS6036468B2 (ja)	1985-08-20	真空ア−クプラズマ装置
US5227129A (en)	1993-07-13	Method for applying corrosion resistant metallic coating of zirconium nitride
CA1210824A (fr)	1986-09-02	Dispositif et methode de stabilisation d'un arc d'evaporation
US4600489A (en)	1986-07-15	Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
US4559121A (en)	1985-12-17	Method and apparatus for evaporation arc stabilization for permeable targets
GB2150947A (en)	1985-07-10	Evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
Spalvins	1986	Plasma assisted surface coating/modification processes: an emerging technology
Robinson et al.	1990	Characteristics of a dual purpose cathodic arc/magnetron sputtering system
Hurley et al.	1978	19. Electrode surface effects in the high voltage glow discharge
US5168504A (en)	1992-12-01	Be coated glass cathode with high concentration of beo
Sanders	1990	Vacuum arc-based processing
JPS60135570A (ja)	1985-07-18	ア−ク安定化方法および装置
Falabella	1995	Deposition Processes Utilizing a New Filtered Cathodic Arc Source
JPH01208460A (ja)	1989-08-22	スパッタ装置