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Fig. 3 — Geometry of the electrochemical cell in the vicinity of the singularity (right) and the triangular surface mesh of the computational domain (left). The cell in the experimental set-up [2] and simulations [2, 7] is given in Fig 3 (left). The distance between the cathode and anode is 12 cm. The length of the cathode and anode is 19.9 respectively 30.7 cm. The reactor’s width is 0.79 cm.

Figure 3 — Geometry of the electrochemical cell in the vicinity of the singularity (right) and the triangular surface mesh of the computational domain (left). The cell in the experimental set-up [2] and simulations [2, 7] is given in Fig 3 (left). The distance between the cathode and anode is 12 cm. The length of the cathode and anode is 19.9 respectively 30.7 cm. The reactor’s width is 0.79 cm.

Related Figures (4)

The boundary conditions in equation (1) are divided into insulators an electrodes [2, 7, 8]. As no current can flow through the gaseous medium in contac with the electrolyte and electrochemical cells walls (the normal current density J, 1 zero, see Fig. 1): Fig. 1 — Boundary conditions at the electrodes [10].
The boundary conditions in equation (1) are divided into insulators an electrodes [2, 7, 8]. As no current can flow through the gaseous medium in contac with the electrolyte and electrochemical cells walls (the normal current density J, 1 zero, see Fig. 1): Fig. 1 — Boundary conditions at the electrodes [10].
Fig. 2 — Displacement of the boundary nodes.
Fig. 2 — Displacement of the boundary nodes.
Fig. 4 — Simulation of the 3D deposition profile (left) and the experimental result in [2] (right). The governing Laplace equation is solved using the 3D BEM, which yields the normal current density distribution at the electrode surface. In a second step using the equation (10), the nodal points are displaced proportional with the normal current density. The process is repeated until the total process time is achieved. The high non-uniform current density due to the edge effects on electrode surfaces near to the insulating substrate, transfers to a pronounced non-uniform deposition layer. Successive simulated layer thickness deposition profiles on the cathode, together with photography of the final copper deposition are presented in Fig. 4.
Fig. 4 — Simulation of the 3D deposition profile (left) and the experimental result in [2] (right). The governing Laplace equation is solved using the 3D BEM, which yields the normal current density distribution at the electrode surface. In a second step using the equation (10), the nodal points are displaced proportional with the normal current density. The process is repeated until the total process time is achieved. The high non-uniform current density due to the edge effects on electrode surfaces near to the insulating substrate, transfers to a pronounced non-uniform deposition layer. Successive simulated layer thickness deposition profiles on the cathode, together with photography of the final copper deposition are presented in Fig. 4.
Fig. 5 — Deformed plot representation of the numerical and experimental results: measured (¢) [2] simulated 2D NDM (=) [2], simulated 2D LSM (eee) [7], simulated 3D NDM (— =). underlying potential model does consider the mass transfer phenomena that occur in the diffusion layer near the electrode. These phenomena are more pronounced for the higher variations in the gradient of the field, e.g. at the neighbourhood of the cathode and insulator substrate.
Fig. 5 — Deformed plot representation of the numerical and experimental results: measured (¢) [2] simulated 2D NDM (=) [2], simulated 2D LSM (eee) [7], simulated 3D NDM (— =). underlying potential model does consider the mass transfer phenomena that occur in the diffusion layer near the electrode. These phenomena are more pronounced for the higher variations in the gradient of the field, e.g. at the neighbourhood of the cathode and insulator substrate.
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