WO2009047949A1 - Photosensitive graft polymer, and photosensitive resin composition comprising the same - Google Patents

Photosensitive graft polymer, and photosensitive resin composition comprising the same Download PDF

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Publication number
WO2009047949A1
WO2009047949A1 PCT/JP2008/065104 JP2008065104W WO2009047949A1 WO 2009047949 A1 WO2009047949 A1 WO 2009047949A1 JP 2008065104 W JP2008065104 W JP 2008065104W WO 2009047949 A1 WO2009047949 A1 WO 2009047949A1
Authority
WO
WIPO (PCT)
Prior art keywords
meth
acrylate
photosensitive
graft polymer
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/065104
Other languages
French (fr)
Japanese (ja)
Inventor
Takehiro Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Highpolymer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Highpolymer Co Ltd filed Critical Showa Highpolymer Co Ltd
Priority to CN2008801106928A priority Critical patent/CN101821299B/en
Priority to JP2009536952A priority patent/JP5638243B2/en
Publication of WO2009047949A1 publication Critical patent/WO2009047949A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/046—Polymers of unsaturated carboxylic acids or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Disclosed is a photosensitive graft polymer characterized by having, as a branch polymer, a macromonomer (a) produced by copolymerizing 30 to 80 mol% of a polymerizable monomer having a C10-20 bridged cyclic hydrocarbon group (e.g., dicyclopentenyl (meth)acrylate) with 20 to 70 mol% of a polymerizable monomer having no bridged cyclic hydrocarbon group (e.g., benzyl (meth)acrylate). The polymerizable monomer having a C10-20 bridged cyclic hydrocarbon group is preferably at least one member selected from the group consisting of dicyclopentenyl (meth)acrylate, dicyclopentanyl (meth)acrylate, isobornyl methacrylate, adamantyl (meth)acrylate, and a compound represented by the formula (1) and a compound represented by the formula (2). (1) (2) wherein R1 represents a hydrogen or a methyl group.
PCT/JP2008/065104 2007-10-09 2008-08-25 Photosensitive graft polymer, and photosensitive resin composition comprising the same Ceased WO2009047949A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2008801106928A CN101821299B (en) 2007-10-09 2008-08-25 Photosensitive graft polymer, and photosensitive resin composition comprising the same
JP2009536952A JP5638243B2 (en) 2007-10-09 2008-08-25 Graft polymer and photosensitive resin composition containing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-263124 2007-10-09
JP2007263124 2007-10-09

Publications (1)

Publication Number Publication Date
WO2009047949A1 true WO2009047949A1 (en) 2009-04-16

Family

ID=40549097

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065104 Ceased WO2009047949A1 (en) 2007-10-09 2008-08-25 Photosensitive graft polymer, and photosensitive resin composition comprising the same

Country Status (5)

Country Link
JP (1) JP5638243B2 (en)
KR (1) KR101473511B1 (en)
CN (1) CN101821299B (en)
TW (1) TWI421631B (en)
WO (1) WO2009047949A1 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012087212A (en) * 2010-10-19 2012-05-10 Kao Corp Graft polymer
CN102854742A (en) * 2011-06-30 2013-01-02 台湾永光化学工业股份有限公司 Black resin composition, black matrix and light shielding layer
JP2013237797A (en) * 2012-05-16 2013-11-28 Arakawa Chem Ind Co Ltd Active energy ray-curing resin, active energy ray-curing hard coat agent, cured films using these, plastic film with cured film laminated thereon, and processed product using plastic film
JP2014024919A (en) * 2012-07-25 2014-02-06 Dnp Fine Chemicals Co Ltd Energy ray-curable resin composition, protective film using the composition, touch panel component and touch panel component manufacturing method
JP2015011209A (en) * 2013-06-28 2015-01-19 太陽インキ製造株式会社 Photocurable composition and hardened product of the same
JP2018197318A (en) * 2017-05-24 2018-12-13 三菱ケミカル株式会社 Curable composition, cured product and laminate
US20200278610A1 (en) * 2017-12-27 2020-09-03 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices
CN115677939A (en) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 Photosensitive graft polymer and photosensitive resin composition containing same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5358005B2 (en) * 2011-09-22 2013-12-04 富士フイルム株式会社 Positive photosensitive acrylic resin and positive photosensitive resin composition
TWI603983B (en) * 2012-08-10 2017-11-01 Nippon Shokubai Co Ltd Hardening resin composition and its use
CN102827526B (en) * 2012-08-23 2015-04-15 京东方科技集团股份有限公司 High-impedance material, and display substrate black matrix and liquid crystal display apparatus containing same
JP5915956B2 (en) * 2013-07-25 2016-05-11 山栄化学株式会社 Resin composition for forming solder bumps and solder bump forming method
CN105037627B (en) * 2015-08-21 2017-01-25 深圳市联深化学技术有限公司 Oligomeric resin, preparation method thereof and application thereof in color photoresist
CN105669892B (en) * 2016-03-17 2019-07-26 上海昭和高分子有限公司 A kind of solvent type copolymer resins and combinations thereof
CN110419003B (en) * 2017-03-17 2023-04-18 大阪有机化学工业株式会社 Photosensitive resin composition
CN116917399B (en) * 2021-03-03 2025-08-29 日产化学株式会社 Composition for forming a release layer and release layer

Citations (7)

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Publication number Priority date Publication date Assignee Title
JPH08259876A (en) * 1995-03-24 1996-10-08 Japan Synthetic Rubber Co Ltd Organic pigment dispersion for color filters
JPH09146272A (en) * 1995-11-27 1997-06-06 Fuji Photo Film Co Ltd Radiatopm sensitive composition
JP2001089533A (en) * 1999-09-24 2001-04-03 Showa Highpolymer Co Ltd Photosensitive resin
JP2005316388A (en) * 2004-03-30 2005-11-10 Jsr Corp Radiation sensitive composition for color filter, color filter, and color liquid crystal display device
JP2006058821A (en) * 2004-08-24 2006-03-02 Mitsubishi Chemicals Corp Colored resin composition, color filter, and liquid crystal display device
JP2007070584A (en) * 2005-09-09 2007-03-22 Hitachi Chem Co Ltd Coloring composition, photosensitive coloring resin composition, photosensitive liquid for colored image formation, method for making colored image, method for producing color filter, and color filter
JP2007199685A (en) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd Photocuring coloring composition, color filter, and liquid crystal display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3087871B2 (en) * 1992-06-02 2000-09-11 東亞合成株式会社 Method for producing macromonomer having hyperbranched structure
JP4758652B2 (en) * 2004-01-19 2011-08-31 大日精化工業株式会社 Method for producing graft copolymer having excellent pigment dispersibility, method for producing emulsions using the graft copolymers, and pigment dispersions using the graft copolymers or emulsions
JP4539165B2 (en) * 2004-05-12 2010-09-08 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer, method for forming the same, and liquid crystal display device
JP4522915B2 (en) * 2005-06-24 2010-08-11 大日本印刷株式会社 Ink-jet ink for color filter, color filter, and liquid crystal display device
JP2008195768A (en) * 2007-02-09 2008-08-28 Canon Inc Liquid composition and inkjet ink

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08259876A (en) * 1995-03-24 1996-10-08 Japan Synthetic Rubber Co Ltd Organic pigment dispersion for color filters
JPH09146272A (en) * 1995-11-27 1997-06-06 Fuji Photo Film Co Ltd Radiatopm sensitive composition
JP2001089533A (en) * 1999-09-24 2001-04-03 Showa Highpolymer Co Ltd Photosensitive resin
JP2005316388A (en) * 2004-03-30 2005-11-10 Jsr Corp Radiation sensitive composition for color filter, color filter, and color liquid crystal display device
JP2006058821A (en) * 2004-08-24 2006-03-02 Mitsubishi Chemicals Corp Colored resin composition, color filter, and liquid crystal display device
JP2007070584A (en) * 2005-09-09 2007-03-22 Hitachi Chem Co Ltd Coloring composition, photosensitive coloring resin composition, photosensitive liquid for colored image formation, method for making colored image, method for producing color filter, and color filter
JP2007199685A (en) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd Photocuring coloring composition, color filter, and liquid crystal display device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012087212A (en) * 2010-10-19 2012-05-10 Kao Corp Graft polymer
CN102854742A (en) * 2011-06-30 2013-01-02 台湾永光化学工业股份有限公司 Black resin composition, black matrix and light shielding layer
JP2013237797A (en) * 2012-05-16 2013-11-28 Arakawa Chem Ind Co Ltd Active energy ray-curing resin, active energy ray-curing hard coat agent, cured films using these, plastic film with cured film laminated thereon, and processed product using plastic film
JP2014024919A (en) * 2012-07-25 2014-02-06 Dnp Fine Chemicals Co Ltd Energy ray-curable resin composition, protective film using the composition, touch panel component and touch panel component manufacturing method
JP2015011209A (en) * 2013-06-28 2015-01-19 太陽インキ製造株式会社 Photocurable composition and hardened product of the same
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices
JP2018197318A (en) * 2017-05-24 2018-12-13 三菱ケミカル株式会社 Curable composition, cured product and laminate
JP7052222B2 (en) 2017-05-24 2022-04-12 三菱ケミカル株式会社 Curable compositions, cured products and laminates
US20200278610A1 (en) * 2017-12-27 2020-09-03 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
US11703759B2 (en) * 2017-12-27 2023-07-18 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
CN115677939A (en) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 Photosensitive graft polymer and photosensitive resin composition containing same

Also Published As

Publication number Publication date
CN101821299A (en) 2010-09-01
JPWO2009047949A1 (en) 2011-02-17
TWI421631B (en) 2014-01-01
CN101821299B (en) 2012-10-10
TW200933293A (en) 2009-08-01
KR20100071092A (en) 2010-06-28
JP5638243B2 (en) 2014-12-10
KR101473511B1 (en) 2014-12-16

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